TW200847867A - Printed wire board and manufacturing method thereof, and electrolytic copper foil for copper-clad lamination board used for manufacturing the same - Google Patents
Printed wire board and manufacturing method thereof, and electrolytic copper foil for copper-clad lamination board used for manufacturing the same Download PDFInfo
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- TW200847867A TW200847867A TW097111957A TW97111957A TW200847867A TW 200847867 A TW200847867 A TW 200847867A TW 097111957 A TW097111957 A TW 097111957A TW 97111957 A TW97111957 A TW 97111957A TW 200847867 A TW200847867 A TW 200847867A
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- copper
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- copper layer
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 250
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 58
- 239000011889 copper foil Substances 0.000 title claims description 14
- 238000003475 lamination Methods 0.000 title abstract description 3
- 229910052802 copper Inorganic materials 0.000 claims abstract description 237
- 239000010949 copper Substances 0.000 claims abstract description 237
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 238000005530 etching Methods 0.000 claims abstract description 38
- 239000013078 crystal Substances 0.000 claims description 116
- 238000000034 method Methods 0.000 claims description 45
- 238000007747 plating Methods 0.000 claims description 31
- 229910000831 Steel Inorganic materials 0.000 claims description 30
- 239000010959 steel Substances 0.000 claims description 30
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 20
- 238000010438 heat treatment Methods 0.000 claims description 20
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 18
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 230000002378 acidificating effect Effects 0.000 claims description 15
- 239000004020 conductor Substances 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 238000007639 printing Methods 0.000 claims description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 238000002425 crystallisation Methods 0.000 claims description 4
- 230000008025 crystallization Effects 0.000 claims description 4
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 2
- 239000008187 granular material Substances 0.000 claims description 2
- 238000005054 agglomeration Methods 0.000 claims 1
- 230000002776 aggregation Effects 0.000 claims 1
- 239000011095 metalized laminate Substances 0.000 claims 1
- 238000005452 bending Methods 0.000 abstract description 19
- 238000009413 insulation Methods 0.000 abstract description 7
- 238000012545 processing Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 204
- 238000012360 testing method Methods 0.000 description 35
- 239000007788 liquid Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 12
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000005868 electrolysis reaction Methods 0.000 description 9
- 239000004973 liquid crystal related substance Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 239000008151 electrolyte solution Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 235000013339 cereals Nutrition 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 238000001953 recrystallisation Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000002689 soil Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 235000014676 Phragmites communis Nutrition 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 229940021013 electrolyte solution Drugs 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000251468 Actinopterygii Species 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 244000241257 Cucumis melo Species 0.000 description 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 101000582320 Homo sapiens Neurogenic differentiation factor 6 Proteins 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- 101100208721 Mus musculus Usp5 gene Proteins 0.000 description 1
- 102100030589 Neurogenic differentiation factor 6 Human genes 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 244000273256 Phragmites communis Species 0.000 description 1
- 244000082204 Phyllostachys viridis Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical compound N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000033558 biomineral tissue development Effects 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- IGVXUBLWIFEMDL-UHFFFAOYSA-N copper(2+) Chemical compound [Cu+2].[Cu+2] IGVXUBLWIFEMDL-UHFFFAOYSA-N 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- ALKZAGKDWUSJED-UHFFFAOYSA-N dinuclear copper ion Chemical compound [Cu].[Cu] ALKZAGKDWUSJED-UHFFFAOYSA-N 0.000 description 1
- 239000003571 electronic cigarette Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000003203 everyday effect Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- 239000006259 organic additive Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/12—Electroforming by electrophoresis
- C25D1/14—Electroforming by electrophoresis of inorganic material
- C25D1/16—Metals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
200847867 '九、發明說明: 【發明所屬之技術領域】 •本發明係有關印刷線路板與該印刷線路板的製造方 法、及用於該印刷線路板之製造的覆銅積層板用電解抑 【先前技術】 冷。 隨著近年來手機、個人電腦、音樂播放器與可攜 戲機等行動式(mobile)機器的普及,電子機器的輕&小 _化傾向不斷持續。且該些行動式機器中有許多具有顯像、 示功能的機種,並採用各種顯示裝置,而主流的顯示裝置、 即為液晶顯示面板。作為安裝該液晶顯示面板的驅動^ 與LS^等電子零件之方式,係有使用電子零件絲用薄膜 載置帶(filmcarriertape)(以下,僅稱為「薄膜载置帶、」 或「TABCTape Automated bonding;捲帶自動接合)帶 J*」 與 FPC(Flexible printed Circuit;撓性印刷電之」安 裝方式,其中上述電子零件安裝用薄膜載置帶係包括有 鲁C0F(Chip On film ;薄膜覆晶)帶、200847867 '9. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a method for manufacturing a printed wiring board and the printed wiring board, and to electrolysis of a copper-clad laminate for use in the manufacture of the printed wiring board. Technology] Cold. With the popularity of mobile devices such as mobile phones, personal computers, music players, and portable devices in recent years, the lightness and smallness of electronic devices has continued. Moreover, the mobile devices have a plurality of types of display and display functions, and various display devices are used, and the mainstream display device is a liquid crystal display panel. As a method of mounting an electronic component such as a driver and an LS^ of the liquid crystal display panel, a film carrier tape (hereinafter referred to as a "film carrier tape", or "TABCTape Automated bonding") is used. ; tape reel automatic bonding) with J*" and FPC (Flexible Print Circuit) mounting method, wherein the above-mentioned electronic component mounting film mounting tape includes a C0F (Chip On film; film flip chip) band,
Package,·捲帶載置構裝)帶、BGA(BaU GHdArray ;球柵 > ASIC(Application Specific IntegratedPackage, tape carrier, BGA (BaU GHdArray; ball grid > ASIC (Application Specific Integrated
Circuit ;特定應用積體電路)帶等。因此,該些的印刷線 路板係被要求更進一步的微細線路。 在上述C0F帶等之製造中,係使用銅作為主導體,並 利用蝕刻法形成線路。要將此處所形成之線路予以微細 化,並使後面的表面安裝變得容易,係必須加大線路㈣ 刻因子(etching factc)r)。因此,有必要將祕刻(〇ver 320099 6 200847867 • etching)時間的設定予以縮短,而已試過將形成線路之銅 層與絕緣基板的接著面設成為平滑且採用較薄的鋼層。亦 .即’在電解銅箔中,已在其製造過程中使用各種有機系添 .加劑,將銅的結晶粒徑予以縮小,而謀求與絕緣基板之接 •著面的低輪廓(low profile)化。然而,即使是將^絕緣基 板的接著面設成平坦,仍會由於蝕刻過程中產生的底切現 象(undercut)而使所形成的線路其頂寬比底寬還窄。因 此,若使C0F帶等的線路間距(pitch)繼續更加窄化,便無 法確保元件的連接所需要的頂寬。亦即,必須以比習知^ 加良好的钱刻因子形成線路,否則便無法對應線路的微細 化。 另一方面,C0F帶、TCP帶等的TAB帶與Fpc之撓性線 路板係有以彎折狀態搭載於電子機器、重複進行彎曲動作 等的情形。此外,若該些線路板受到輸送中的振動、受到 伴隨電子機器的運作之振動等,則當以财彎曲性差的導體 鲁構成線路時’便會有在線路的彎折部等產生斷線之傾向。 此外,參相TAB帶為代表之液晶驅動用驅動器的歷 史,從最初便是追求財,彎曲性。然而如前所述,若將線路 的微細化視為優先’則係變成將電解銅fS的結晶粒徑予以 微細化以將與絕緣基板的接著面予以低輪廊化者。當如此 地將銅的結晶粒縮小的話,雖然抗拉強度會變大,但會出 ,伸展率降低的傾向。亦即,變成為使用了下述之銅箱: 又到被I為會在結晶粒邊界偏移之添加劑類的影響而即使 進行加熱亦難以獲得退火效果。如上所述,變成犧牲掉耐 320099 7 200847867 I T曲性’而將微細電路的形成能力視為首位。但例如在液 曰曰面板中為了縮小框架的面積,係在液晶面板端部將Tab π的輸出#j線路部回折連接至液晶面板的線路,因此能夠 .想見現=耐、彎曲性被要求要優於習知者的傾向係變強。 _而錄_因子成為良好之技術而言,專利文獻1已 揭不-種技術,係為了提供能約適當地形成微細間距的線 ==::!路板用覆銅板、及使用該覆銅板之印刷線 φ 、種令鋼箔的結晶粒的粒徑往從覆銅板表面 =緣基材側之厚度方向依序縮小之構造的印刷線= rs:;:c:::r,r^£p^^a"- 因示之技術的目的為提供使具有高 流密度往高電的銅箱圖案係藉由從低電 而連續地或階段性地形成流,之錢覆, 蝕刻構造的銅箱之不同構、告 ^ ^的銅箔至具有難 之銅箱侧進行钱刻在=、’s ν白’且從具有難钱刻構造 圖案施以not、30 ίΓ 斜鋼落的圖案時,對 態緩和。刀鐘以上的熱處理,使構造傾斜的狀 若使用上述專利文獻i及專利文獻 確是只要使用、相同厚产 i不的技術,的 因子之線路。 又、、一 ^ 便旎夠形成具有良好蝕刻 專利文獻1:日本特開簡.5δ號公報 320099 8 200847867 專利文獻2 :日本特開20〇4_19〇〇73號公報 【發明内容】 (發明所欲解決之課題) ;、、、、而’即使將上述專利文獻揭示的技術内容應用於 動式機器的液晶驅動器用線路板等的線路,仍未必可減小 如上述之線路斷線的危險性。Circuit; specific application integrated circuit) with etc. Therefore, these printed wiring boards are required to further finer lines. In the production of the above-mentioned COF tape or the like, copper is used as a main conductor, and a wiring is formed by an etching method. To miniaturize the lines formed here and to make the subsequent surface mounting easier, it is necessary to increase the wiring (etching factc) r). Therefore, it is necessary to shorten the setting of the secret engraving (〇ver 320099 6 200847867 • etching), and it has been tried to make the copper layer forming the line and the insulating substrate have smooth surfaces and a thin steel layer. Also, in the electrolytic copper foil, various organic additives have been used in the manufacturing process to reduce the crystal grain size of copper, and to achieve a low profile with the insulating substrate. ). However, even if the bonding surface of the insulating substrate is set to be flat, the line formed is narrower than the bottom width due to the undercut generated during the etching. Therefore, if the pitch of the C0F tape or the like is further narrowed, the top width required for the connection of the components cannot be ensured. That is, it is necessary to form a line with a better money engraving factor than conventional knowledge, otherwise the line may not be miniaturized. On the other hand, the TAB tape such as the COF tape and the TCP tape and the flexible circuit board of the FPC are mounted on the electronic device in a bent state, and the bending operation is repeated. In addition, when the circuit boards are subjected to vibration during transportation, vibrations accompanying the operation of the electronic device, etc., when the wiring is formed by the conductor Lu, which is poor in flexibility, there is a disconnection in the bent portion of the line. tendency. In addition, the history of the liquid crystal drive driver represented by the reference TAB tape is the pursuit of wealth and flexibility from the beginning. However, as described above, when the miniaturization of the line is regarded as a priority, the crystal grain size of the electrolytic copper fS is made finer to lower the surface of the insulating substrate. When the crystal grains of copper are reduced in this manner, the tensile strength is increased, but the elongation tends to decrease. In other words, it is difficult to obtain an annealing effect even if it is heated by the influence of an additive which is shifted at the boundary of the crystal grain by I. As described above, it becomes the first place to sacrifice the formation ability of the fine circuit by sacrificing the resistance of 320099 7 200847867. For example, in order to reduce the area of the frame in the liquid helium panel, the output line of the Tab π output is connected to the line of the liquid crystal panel at the end of the liquid crystal panel, so that it is possible to think about the current resistance and the bending property. The tendency to be better than the learner is stronger. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Printing line of the printing line φ, the grain size of the grain of the steel foil, and the structure of the structure of the surface of the copper-clad board = the thickness of the edge of the substrate is sequentially reduced = rs:;:c:::r, r^£ p^^a"- The purpose of the technique is to provide a copper box pattern having a high current density to a high power, which is formed by continuously or stepwise forming a flow from low electricity. The different configurations of the box, the copper foil of the ^ ^ to the side of the hard copper box, the money engraved in the =, 's ν white' and from the pattern with the hard-to-engraving pattern applied not, 30 ίΓ oblique steel falling, The state is moderated. In the heat treatment of the knives and the like, the structure is inclined. If the above-mentioned patent documents i and patent documents are used, it is a factor of the factor that is used as long as the technology is the same. Further, the invention is well formed and has a good etching. Patent Document 1: Japanese Patent Laid-Open No. 5 δ Publication No. 320099 8 200847867 Patent Document 2: Japanese Laid-Open Patent Publication No. Hei. The problem to be solved is that the technical contents disclosed in the above patent documents are applied to a circuit such as a circuit board for a liquid crystal driver of a movable machine, and the risk of disconnection of the line as described above may not be reduced.
因此,在硬式印刷線路板及撓性印刷 總稱其全科健料「印财路板」)⑽財U -種旎夠維持良好的蝕刻因子之微細化的技術。並且,在 ⑽帶'TCP帶與FPC +,係要求_種在線路的 =Therefore, in the hard printed circuit board and the flexible printing, the general-purpose health material "Ink Cai Road Board" (10) is a technology that maintains a good etch factor. Also, in (10) with 'TCP band and FPC +, the system requires _ kind in the line =
時改善耐彎曲性之製品。 j U (解決課題的手段) 因此,本發日㈣發明人細使印職路板的線路的微 f匕、、與作為撓性印刷線路板時的耐、彎曲性兩立為目的而 想到以下的發明。 本發明之印刷線路板: 本發明之印刷線敗钯及^ .a I緣路板係於絕緣基板的表面形成有線 ,二、'、/、備積層有第1銅層與第2銅層之層構成, 且該第1銅層側係與前述 均結晶粒徑係具備比第=基板黏合;該第2銅層的平 結晶㈣。 鋼層的平均結晶粒徑還大之平均 在本發明之印刷 銅的平均結晶粒徑為 銅層的銅的平均結曰曰曰 線路板中,較佳為,前述第1銅層的 〇· ϊ β in以上、未滿1 · 〇 # m,前述第2 粒技為1· 〇 # m至5. 0 β m。 320099 9 200847867 在本發明之印刷線路板中义 厚度為前述第}銅芦的戸电 仏為’ W述第2銅層的 户太^ 厚度的5%至5_。 .在本發明之印刷線路板中 ,以η層的次金屬 :'為,丽述第2銅層係 比第(η-υ次金屬層的平 ’/弟〇次金屬層係具備 在本發明之印^還大的平均結晶粒徑。 横剖面形狀中,者入i = ’别述線路在其任意位置的 頂編丄=路的厚度為I令線路上表面的 計算而得之钱刻因子為25以上。 卩下述數式⑴ [數學式1] 蝕刻因子=A product that improves bending resistance. j U (Means for Solving the Problem) Therefore, the inventor of the present invention (4) invented the following points for the purpose of making the line of the printed circuit board and the resistance and bending properties as a flexible printed wiring board. Invention. The printed wiring board of the present invention: the printed wiring palladium of the present invention and the ?I edge plate are formed on the surface of the insulating substrate to form a wire, and the second layer and the second copper layer are formed in the first layer. In the layer configuration, the first copper layer side and the uniform crystal grain size are bonded to the first substrate; and the second copper layer is flat crystal (four). The average crystal grain size of the steel layer is also large. In the average tanned wiring board of the copper layer having the average crystal grain size of the printed copper of the present invention, it is preferable that the first copper layer is 〇·ϊ. β 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。. 320099 9 200847867 In the printed wiring board of the present invention, the thickness of the copper foil is 5% to 5 mm of the thickness of the second copper layer. In the printed wiring board of the present invention, the n-th sub-metal: ' is the second copper-layer ratio (the η-υ-metal layer of the ''/〇〇-metal layer is provided in the present invention The print has a large average crystal grain size. In the cross-sectional shape, the input i = 'the other end of the line at any position of the top 丄 = the thickness of the road is I to make the calculation of the upper surface of the line It is 25 or more. 卩 The following formula (1) [Math 1] Etch factor =
Wb_wt (1) 在本發明之印刷線路板中 板用基材作為㈣…撓性印刷線路 Γ 板Mg#備可錄曲加工 的印刷線路板。 匕夕J弓典加工 在本發明之印刷線路板中,係藉碌合 板用基材作,έ 便用更式印刷線路 為、、、e緣基板而成為板狀的硬式印刷線路板。 本發明之印刷線路板的製造方法: 驟Α 之印刷線路板的製造方法之特徵為含有下列步 …^驟D。為了說明上的方便,稱之為以製造方法。 繞其Γ/Α :準備覆金屬積層板,該覆金屬積層板係於絶 、^ =的表面具備積層有第i銅層與第2銅層之層構成的 組曰且該第.2銅層的平均結晶粒徑具備比該第工鋼層 320099 10 200847867 的平均結晶粒徑還大之平 與前述絕緣基板黏合;明粒役’且將該第1銅層侧 •劑圖:係於前料體層的第2銅層表面形成钱刻阻 進行nG:料具備前賴刻_®案之覆金屬積層板 J及理而將未形成蝕刻阻劑圖案體 以溶解去除㈣成線m 體層予 ’予以二Γ 將存在於前述線路的表面之钱刻阻劑圖案 予去除而獲得印刷線路板。 在上述第〗製造方法中,較佳為,將覆銅 為在珂述步驟A所用之覆全屬更用 用屬於梦择女外,積層板’該覆銅積層板係使 積層有弟1銅層與第2銅層之層構成且該第2銅層 ^均結晶粒徑具備比該第1鋼層的平均結晶粒徑還大之 黏:結晶粒控的電解銅箱,且將該第i銅層侧與絕緣基板 蚀田ί上述第1製造方法中,較佳為,將覆銅積層板 ^為在前;f步驟Α所用之覆金屬積層板,該覆銅積層板 '、為積層有弟1銅層與藉由以17〇。〇至18〇t進行π分鐘 以上的加熱而再結晶化的第2銅層之層構成的電解銅箱, 且在覆金屬積層板的成形時使第1銅層财受17代至1δ0 I皿度15刀鐘以上而將絕緣基板與該電解銅箔黏合,藉 此使該第2銅層的平均結晶粒徑具備比該第μ層的平^ 結晶粒徑還大之平均結晶粒徑。 又’在上述乐」製造方法中,較佳為,將覆銅積層板 320099 11 200847867 使用為在前述步驟A所用之覆金屬積層板,該覆銅積層板 係以無電解鐘覆法於絕緣基板之上形成第1銅層,且藉由 以170 c至180°c進行15分鐘以上的加熱而於該第丨銅層 之上形成再結晶化之第2銅層作為導體層,且之後施加i 7〇 C至180C的溫度15分鐘以上來進行加熱,藉此使該第2 銅層的平均結晶粒徑具備比該第丨銅層的平均結晶粒徑還 大之平均結晶粒徑。 並且,在上述第丨製造方法中,較佳為,前述第2銅 4的心成係採用使用酸性硫酸銅鐘液之電錢銅法,且該酸 性硫酸銅鍍液係使用銅濃度為〇.8m〇1/公升至Hoi/公 升、游離硫酸濃度為〇· 8m〇l/公升至I 2m〇1/公升、氯濃度 為5ppm至5〇ppm者,且使用業已將該酸性硫酸銅鏡液的 1 / 2各量以上予以活性碳處理者。 此外,作為本發明之其他的印刷線路板的製造方法1 車又為採用特徵為含有下列步驟a至步驟f之印刷線路板 的衣造方法。為了說明上的方便,稱之為第2製造方法。 、步驟a:係製造於絕緣基板的表面僅具備第丨銅層之 初步的覆銅積層板; 步驟b :係於前述初步的覆銅積層板的第丨銅層的表 面形成鍍覆阻劑圖案; ^步驟c:係於前述初步的覆銅積層板的未形成鍍覆阻 J圖木的第1銅層表面施行鍍銅而形成第2銅層; 乂驟d·係將剞述鍍覆阻劑圖案予以去除而作為初 的印刷線路板; 320099 12 200847867 y驟e.係對在步驟d所得之初步的印刷線路板進行 加熱處理而使前述第2銅層的結晶巨晶化;以及 .步驟f:係在之後對前述第2銅層的結晶已巨晶化之 .初步的印刷線路板進行钱刻處理,而將未形成第2銅層的 部分之顯露出之第丨_予以轉去除而作騎刷線路 板0 在該第2製造方法中’較佳為’前述第2銅層的形成 #係採用使用酸性硫酸銅鐘液之電鑛銅法,且該酸性硫酸銅 用銅濃度為G.8mc)1/公升至l 2mc)i/公升、游離硫 ppm者,且使用業已將該酸性硫酸銅鍍液的^容量以 上予以活性碳處理者。 在該弟2製造方法中,較佳為 ’ π,工π /刖迷步驟e中的力口 處理係以not至翁c的溫度加熱15分鐘以上者 本發明之電解銅箔·· 本發明之電解銅落係為用於前述覆金屬 者;該電解銅箱係具備積層有第i銅層衫 成,且在175°Cxl5分鐘的加埶後之第1 工θ ^ 徑為。」_上、未滿第均 徑為l.O/zni以上、5.Μπι以下。 千L日日粒 (發明的效果) 猎由本發明而獲得之印刷線路板係具 ::的線路者。並且,當作為撓性印刷線路 僮良好的㈣因子㈣路的㈣,亦發揮良好的=曲 320099 13 200847867 口此即使將仃動式機料之液晶驅動n安裝用印刷 線路板等的線路予以微細化,斷線的危險性仍低。此外, ,之印刷線路板的製造方法係最適合作為有效率地獲 得上述印刷線路板之方法者。 【實施方式】 以下 、 s兄明本發明之印刷線路板及印刷線路板的製造 方法的形態。其中’關於該製造方法,係分為第i製造方 法與第2製造方法來進行說明。、 <本發明之印刷線路板的形態> 本發明印刷線路板係於絕緣基板的表面形成有線路之 印刷線路板’該線路係具備積層有第i銅層與第2銅層之 層構造’且該第1銅層側係與前述絕緣基板黏合,且該第 2„銅層的平均結晶粒徑具備比該第i鋼層的平均結晶粒徑 遇大的平均結晶粒徑。具備如此的層構成的線路之印刷線 路板係藉由使用後述的製造方法而使線路的微細化變得容 易,且在作為撓性印刷線路板時獲得良好的耐彎曲性。 位於線路的外層側之第2銅層的平均結晶粒徑係具備 比該第1銅層的平均結晶粒徑還大的平均結晶粒徑,藉 此,作為撓性印刷線路板時的耐彎曲性能即顯著地提升。曰 在此,考慮對摻性印刷線路板進行耐彎曲性試驗,使宜承 受重複、彎曲應力直到電路斷線為止的過程。當承受重複彎 曲應力時,若以撓性印刷線路板的剖面内來考量時,則跟 隨彎曲而變化之位移量(跟隨伸展、收縮而變化之位移量) 係愈往外表面愈大,愈往中心部愈小。所以,通常能推測 320099 24 200847867 ==於撓性印刷線路板的-曲動作造 粒邊界發生而過中’破裂傳播會沿結晶 板中,侍考产。因此’在本發明之印刷線路 少有成為破裂傳播路徑的結晶粒邊界 為車父 較大的伸展率之線路。 …層而製作成具有 、立®,’若僅考慮耐彎曲性’而使第1銅層的平均έ士曰 亦成為與第2銅層的平均結晶粒徑相同程产,方 徑係與形成低輪廟平面二::=金屬層的結晶粒 曰月之印刷線路板的二二僅使構成本發 ::結晶粒徑小之結晶粒徑,以謀求導 =黏二面的低輪廊化,且能夠形成具有優異: -良好的:二:Γ是種能夠同時獲得良好㈣^ /、艮好的蝕刻特性之印刷線路板。Wb_wt (1) In the printed wiring board of the present invention, the substrate for the board is used as a (4) flexible printed wiring board, and a printed circuit board which can be recorded and processed. In the printed circuit board of the present invention, the base material for the laminated board is used, and the hard printed circuit board is formed into a plate shape by using the printed circuit board. The method of manufacturing a printed wiring board of the present invention is characterized in that the method of manufacturing a printed wiring board is characterized by the following steps. For convenience of explanation, it is called a manufacturing method.绕 Γ Α Α Α Α Α Α Α Α Α Α Α Α Α Α Α Α Α Α Α 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 准备 覆 覆 覆 覆 覆 覆 覆 覆 覆 覆The average crystal grain size is larger than the average crystal grain size of the steel layer 320099 10 200847867, and is bonded to the insulating substrate; the first copper layer side agent is attached to the front material. The surface of the second copper layer of the bulk layer forms a etched resistance to perform nG: the material has a metal-clad laminate J of the former etched pattern, and the etching resist pattern body is not formed to dissolve and remove the (four) line m layer. Second, the pattern of the money resist which is present on the surface of the aforementioned line is removed to obtain a printed wiring board. In the above-mentioned manufacturing method, it is preferable that the copper-clad layer is used in the description of the step A in the description, and the laminated board is made of the copper-clad laminate. a layer composed of a layer of a second copper layer and having a second crystal layer having a larger crystal grain size than the average crystal grain size of the first steel layer: a crystal grain controlled electrolytic copper box, and the i-th In the first manufacturing method, it is preferable that the copper-clad laminate is a front-end; the metal-clad laminate used in the step f, the copper-clad laminate is a laminate Brother 1 copper layer and by 17 〇. An electrolytic copper box made of a layer of a second copper layer which is heated by π minutes or more and recrystallized to 18 〇t, and the first copper layer is subjected to 17th generation to 1δ0I at the time of molding of the metal-clad laminate. When the insulating substrate is bonded to the electrolytic copper foil at a degree of 15 knives or more, the average crystal grain size of the second copper layer is larger than the average crystal grain size of the first μ layer. Further, in the manufacturing method of the above-mentioned music, it is preferable to use the copper-clad laminate 320099 11 200847867 as the metal-clad laminate used in the aforementioned step A, which is an electroless-time-coated method on an insulating substrate. Forming a first copper layer thereon, and forming a second copper layer which is recrystallized on the second copper layer as a conductor layer by heating at 170 c to 180 ° C for 15 minutes or more, and then applying i The temperature of 7 〇C to 180 C is heated for 15 minutes or more, whereby the average crystal grain size of the second copper layer is made larger than the average crystal grain size of the second copper layer. Further, in the above-described second method of manufacturing, it is preferable that the core of the second copper 4 is a copper copper method using an acidic copper sulfate liquid, and the copper sulfate plating liquid has a copper concentration of 〇. 8m〇1/liter to Hoi/liter, free sulfuric acid concentration 〇·8m〇l/liter to I 2m〇1/liter, chlorine concentration 5ppm to 5〇ppm, and the use of the acidic copper sulfate mirror solution 1 / 2 Each amount of activated carbon treatment. Further, as another method of manufacturing a printed wiring board of the present invention, the vehicle is a coating method using a printed wiring board characterized by the following steps a to f. For convenience of explanation, it is referred to as a second manufacturing method. Step a: manufacturing a preliminary copper-clad laminate having only a second copper layer on the surface of the insulating substrate; Step b: forming a plating resist pattern on the surface of the second copper layer of the preliminary copper-clad laminate ^Step c: copper plating is performed on the surface of the first copper layer of the preliminary copper-clad laminate which is not formed with the plating resist J to form a second copper layer; the step d· will be described as plating resistance The agent pattern is removed and used as an initial printed wiring board; 320099 12 200847867 y e. The first printed circuit board obtained by the step d is subjected to heat treatment to crystallize the second copper layer; and f: after the crystallization of the second copper layer has been macrocrystallized. The preliminary printed wiring board is subjected to the engraving treatment, and the exposed portion of the portion where the second copper layer is not formed is removed. In the second manufacturing method, 'preferably' the formation of the second copper layer is an electric ore method using an acidic copper sulfate clock solution, and the copper concentration of the acidic copper sulfate is G. .8mc) 1 liter to l 2mc) i / liter, free sulfur ppm, and the acidity has been used ^ Acid copper plating solution to the capacity of the person to be treated with activated carbon. In the manufacturing method of the second aspect, it is preferable that the force-handling treatment in the step π, the work π / the e e step e is heated at a temperature of not to the temperature of the c-c for more than 15 minutes. The electrolytic copper is used for the metallizing; the electrolytic copper box is provided with a layer of the i-th copper layer, and the first working angle after the twisting at 175 ° C for 15 minutes is . _ Upper and lower than the average diameter is l.O/zni or more, 5. Μπι below. Thousand L-day granules (effect of the invention) Hunting the circuit board of the invention obtained by the present invention. In addition, as a flexible printed circuit line, the (four) factor (four) of the road is good (4), and it also plays a good sound = 320099 13 200847867, even if the liquid crystal drive n of the smashing machine is mounted, the wiring such as the printed wiring board is fine. The risk of disconnection is still low. Further, the manufacturing method of the printed wiring board is most suitable as a method of efficiently obtaining the above printed wiring board. [Embodiment] The following is a form of a method of manufacturing a printed wiring board and a printed wiring board of the present invention. The "manufacturing method" is divided into an i-th manufacturing method and a second manufacturing method. <Form of Printed Wiring Board of the Present Invention> The printed wiring board of the present invention is a printed wiring board having a line formed on the surface of the insulating substrate. The wiring system has a layer structure in which an i-th copper layer and a second copper layer are laminated. And the first copper layer side is bonded to the insulating substrate, and the average crystal grain size of the second copper layer is larger than the average crystal grain size of the i-th steel layer. In the printed wiring board of the layer-structured wiring, it is easy to refine the wiring by using the manufacturing method described later, and it is excellent in bending resistance when it is used as a flexible printed wiring board. The average crystal grain size of the copper layer has an average crystal grain size larger than the average crystal grain size of the first copper layer, whereby the bending resistance as a flexible printed wiring board is remarkably improved. Consider the bending resistance test of the admixture printed circuit board, so that it is suitable to withstand repeated and bending stress until the circuit is broken. When subjected to repeated bending stress, if it is in the profile of the flexible printed circuit board At the time of the change, the amount of displacement that changes with the curvature (the amount of displacement that changes with the expansion and contraction) becomes larger as the outer surface becomes larger, and the smaller the center is, the smaller the center portion is. Therefore, it is usually estimated that 320099 24 200847867 == on the flexible printed circuit The plate-curved action granulation boundary occurs while the 'rupture propagation will occur along the crystal plate, so the tester produces. Therefore, in the printed circuit of the present invention, there are few crystal grain boundaries that become the fracture propagation path for the larger extension of the father. The line of the layer is formed into a layer, and the product is made to have the same resistance as the average crystal grain size of the second copper layer. The diameter system and the formation of the low-round temple plane 2::= metal layer of the crystal grain of the moon, the printed circuit board of the second layer only constitutes the hair: crystal grain size is small, in order to seek the guide = sticky surface Low wheel corridor, and can be formed with excellent: - Good: Two: Γ is a kind of printed circuit board that can obtain good (four) ^ /, 艮 good etching characteristics at the same time.
,本發明之印刷線路板中,前述第^銅層的平均粒徑 —· 以上、未滿l.Ovm,第2鋼層的平均粒徑為U 二m至5. 。此處所說之平均粒徑係指使用测In the printed wiring board of the present invention, the average particle diameter of the second copper layer is greater than or equal to 1.0 mvm, and the average particle diameter of the second steel layer is U 2 m to 5. The average particle size referred to here refers to the use of the test
anning Electron Microscope ;掃描電子顯微鏡)、nB 魂Ion Beam;聚焦離子束)裝置、或金屬顯微鏡對 ^路厚度取樣長度·㈣的剖面進行觀察,測定存在於該 乾圍的各銅層之結晶的長徑與短徑而取平均之值。在此, 時’使用上述結晶粒徑的觀察方法的 壬者皆热法進行正破的結晶粒徑的測定。因此,在嚴格 320099 15 200847867 之思我下,在第i鋼層中,平均結晶粒 排除者。相對於士 ' 井馬刼未滿0·^ u"以上時,“尺=銅層的平均結晶粒徑成為 .幻速^於弟1圖顯示構成第!銅層之結晶的代表例。 第2:二二平均結晶粒徑最佳為至“❹。 =幻層料均結絲徑亦相定存在於第 的長徑與短徑而取平均之值。當該平均結晶粒徑未^曰曰0 路。於2作為具備良好㈣刻因子之線 ^ %昂Z圖絲員不構成繁9 a 风昂z銅層之結晶的代表例。 ,由改!:i?的第1銅層、第2銅層各層之金屬係能狗 均結晶粒徑。另外,夢由力孰使2成為具備不同程度的平 =月:。即使剛製造出來時的結晶粒徑幾 i =加熱所致之再結晶動作來分別產生士且^ 關於這點,在後述的製造方法中會詳細說明。我。 明之印刷線路板中,前述第2銅層的厚度為前 述罘1銅層的厚度的5%至5 為月j 受,銅層與第2鋼層的 亦即,當第2銅層的平均結晶^斤f響。 時,考慮到與第i銅層的平::°又疋為取大的5.0" 之組合時,配合考;t久自;晶粒徑為最小的〇._ 第2銅層的厚度超過;丨鋼:^^二度。結果,若 j日的厗度的500%,則在以覆金 320099 16 200847867 屬積層板的&能、谷> 速度變快,心、仃蝕刻時’易蝕刻的第1銅層侧的侵蝕 『、 弟 1 鋼 j ® 盘 〇 >1-. t=? 同,龙恭々 9兵昂2銅層的蝕刻狀態會有顯著的不 '想。另:aJ面所觀察到之钱刻因子會變差,因此並不理 •層的厚度的5%時則無口 ==度未滿於雨述第1銅 板中’前述第2銅層係™ (η-。次金屬層的平…:::層次金屬層係具備比第 I 9 a ^ 、口日日粒仫逖大之平均結晶粒徑。在第 厚Γ的層的平均結晶粒徑的差異如上述般地大且 面的觀察時觀察到段差二的,變大’而有在線路剖 銅層之靠 又差的“。在這樣的情形中,將第2 於第1㈣9之部份时均結絲徑妓成為接近 弟1銅層的平均結晶粒 佼、 因此:層數_需㈣絲小❹上係、有效的。 並且,在本發明之印刷線路板中, 故+ 4 位置的横剖面形狀中, 枚 1 U、、、在/、任意 表面的頂寬為W的厚度為1、令線路上 、寸开而侍之蝕刻因子以 ,k要又 顯示線路的橫剖面形狀。·。於第3圖示意性 [數學式2] 飿刻因子 2 xTcAnning Electron Microscope; Scanning Electron Microscope), nB Soon Beam (Ion Beam) device, or metal microscope to observe the section length of the channel thickness (4), and determine the crystal length of each copper layer existing in the dry circumference. The average value of the diameter and the short diameter. Here, the measurement method using the above-described method for observing the crystal grain size was carried out by a thermal method to measure the crystal grain size of the broken crystal. Therefore, under the strict thought of 320099 15 200847867, in the i-th steel layer, the average crystal grain is excluded. In the case of the above, the average crystal grain size of the copper layer is changed to the magic speed. The figure 1 shows a representative example of the crystal of the copper layer. : The average crystal grain size of the 22nd is best to "❹. = The average layer diameter of the phantom layer is also determined by the average length and the short diameter of the first layer. When the average crystal grain size is not 曰曰0. In 2, as a line with a good (four) engraving factor, the representative of the crystal of the copper layer of the wind. , by change! : The metal layer of each layer of the first copper layer and the second copper layer of i is capable of having a uniform crystal grain size. In addition, the dream is made by the force of 2 to have a different degree of flat = month:. Even if the crystal grain size just after the production is i = the recrystallization operation due to heating is generated separately, this will be described in detail in the production method described later. I. In the printed wiring board of the present invention, the thickness of the second copper layer is 5% to 5 of the thickness of the 罘1 copper layer, and the average crystallization of the second copper layer is the copper layer and the second steel layer. ^ 斤f sounds. When considering the combination with the i-th copper layer::° and the larger 5.0" combination, the test is long; the crystal grain size is the smallest 〇._ The thickness of the second copper layer exceeds ;丨钢: ^^ 二度. As a result, if the enthalpy of the j-day is 500%, the speed of the layered plate of the gold plate 320099 16 200847867 is faster, and the first copper layer side of the etchable layer is etched during the etching of the core and the enamel. Erosion ", brother 1 steel j ® 〇 〇 1- 1- 1- 1- 1- 1- 1- 1- 同 同 同 同 同 同 同 同 同 龙 龙 龙 龙 龙 龙 龙 龙 々 々 々 々 々 々 々 々 々 々 々 In addition: the money engraving factor observed on the aJ surface will deteriorate, so if the thickness of the layer is 5%, then there is no mouth == degree is not satisfied with the second copper layer TM in the first copper plate. Η-. The level of the secondary metal layer:::: The stratified metal layer has an average crystal grain size larger than that of the I 9 a ^ and the 日 日 。. The difference in the average crystal grain size of the layer of the thicker Γ layer As shown above, when the observation is large and the surface is observed, the step difference is two, and it becomes larger, and there is a difference in the copper layer of the line. In this case, the second part of the first (four) 9 is The wire diameter 妓 becomes the average crystal grain size close to the copper layer of the brother 1 , and therefore, the number of layers is required to be (4) silk, and is effective. Also, in the printed wiring board of the present invention, the cross section of the + 4 position is obtained. In the shape, the thickness of the top 1 U, , and /, any surface has a thickness of 1, the etching factor of the line is opened, and the cross-sectional shape of the line is displayed again. Figure 3 Schematic [Math 2] Engraving factor 2 xTc
Wb_WtWb_Wt
CD 亦 此㈣因子係表示㈣剖面的形狀有多接近矩形' 320099 17 200847867 ,:線路上表面的頂寬與線路下表面的底寬之差如何地小 以線:上表面的頂細'線路下表面的底寬㈤為理 ’而此%㈣因子的值係接近無限大卜)。因此 H當為同時心⑷銅層與第2銅層之製造方法日_ 田、木用以下的第造方法),係將㈣因子設定為2 5 =上’更宜設定為3. G以上。另—方面,當以圖案鑛覆法 第2銅層時(相當於採用以下的第2製造方法)時, = 刻因子設定為3.〇以上,更宜設定為4.0以上。 =因:愈士’線路上表面的頂寬愈寬,能夠在將電子零 仃、面女衣¥獲得較寬廣的安裝面積’因此較為理想。 遞於線路的直線性亦重要。具體而言,在傳 ^ 的線路中’上端線(_ Une)與底端線(bott〇m 觀:;err^ 末看,無凹凸之形狀較為理想。此外, 在附力侧應力時,當有線路寬度變寬、 之起點的可能性增加。若考慮上述情 例如、對所形成之線路寬度所要求的變異度為10%左右。 左用於前述⑽帶的製造彻厚度係5"至心m ::線路的間距(線寬度+間隔寬度)為4。/z m -Γ1= 時,當線路寬度的變異度超過⑽時, 二電===.5之傾向。因此,為了作為容易 、、安裝且具優異耐彎曲性能的撓性印刷 320099 18 200847867 線路板,將上賴刻时設定為2 5以上係非常重要。 ^下’說明在本發明之印刷線路板中所㈣使用的絕 、土板。本發明之印刷線路板所具備的線路能夠適用於持 性印刷線路板、硬式印㈣路板任—者。當刻於捷^ 刷、=板時,絕絲板㈣廣泛使料醯亞胺(pQiyimide)CD (4) factor indicates that (4) the shape of the section is close to the rectangle ' 320099 17 200847867 , : how the difference between the top width of the upper surface of the line and the bottom width of the lower surface of the line is small: the top surface of the upper surface is thin The bottom width of the surface (five) is rational 'and the value of this % (four) factor is close to infinity). Therefore, H is the same as the method for producing the copper (II) copper layer and the second copper layer, and the following method is used. The factor of (4) is set to 2 5 = upper is preferably set to 3. G or more. On the other hand, when the second copper layer is coated by the pattern ore (corresponding to the following second manufacturing method), the = engraving factor is set to 3.〇 or more, and more preferably 4.0 or more. =: Because the top width of the upper surface of the line is wider, it is more desirable to obtain a wider mounting area for electronic cigarettes and women's clothing. The linearity of the line is also important. Specifically, in the line of the transmission ^, the upper end line (_ Une) and the bottom end line (bott〇m view:; err^ at the end, the shape without the unevenness is ideal. In addition, when the side stress is attached, when The possibility that the line width is widened and the starting point is increased. If the above situation is considered, for example, the variability required for the formed line width is about 10%. The left side is used for the manufacturing thickness of the aforementioned (10) band. ::The pitch of the line (line width + interval width) is 4. /zm -Γ1= When the line width variability exceeds (10), the second power ===.5 tends. Therefore, in order to be easy, install It is very important to set the flexible printing 320099 18 200847867 circuit board with excellent bending resistance, and it is very important to set it to 25 or more. ^Bee's description of the absolute and soil boards used in (4) of the printed wiring board of the present invention. The circuit provided by the printed circuit board of the present invention can be applied to a holding printed circuit board or a hard printed (four) circuit board. When engraved on the Czech brush and the = board, the silk screen (4) is widely used for the imine. (pQiyimide)
Mm mm ^(p〇iyimide-amide)#m *m >Mm mm ^(p〇iyimide-amide)#m *m >
pet樹脂㈣、液晶聚合物樹脂等具備可撓性之樹月旨薄 膜。而當適詩硬式印刷線路板時,能夠使用加熱後硬化 ^ =反狀者’含有骨材之玻璃_環氧(glass_epGxy)樹脂預浸 Prepreg)、玻璃-聚醯亞胺(glass_p〇lyimide)樹脂預浸 材、BT樹脂預浸材等公知的硬式絕緣基板材料。 <本發明之印刷線路板的製造形態1 > ^此,說明第1製造方法的形態。本發明之印刷線路 板的第1製造方法的特徵為含有以下的步驟A至步驟D。 以下,說明每一步驟。 •步驟A : /在此〆驟中,係準備覆金屬積層板,該覆金屬積層板 係於絶緣基板的表面具備積層有第1銅層與第2銅層之層 構成的‘體層,且該第2鋼層的平均結晶粒徑具備比該第 1銅層的平均結晶粒徑還大之平均結晶粒徑,且將該第1 銅層侧與$述絕緣基板黏合。該覆金屬積層板的製造方法 係志夠採用幾種方法。 第1種覆金屬積層板的製造方法係使用電解銅箔之方 法。 19 320099 200847867 、此時的電解鋼箔為積層有第1銅層與第2鋼層之層構 成,且該第2銅層的平均結晶粒徑具備比該第1銅層^ 均、-日日粒徑遇大之平均結晶粒#。此處所言兒之電解銅落係 ,指第1銅層的平均結晶粒徑與第2銅層的平均結晶粒徑在 階段:已明確地不同者。因此,該電解_係 --刀弟、’3層與第2銅層的形成條件、銅電解液等而铖2 的電解工程製造而得者。但此處所說之電解銅落:非 瘳υ把皆以電解法製造而得之銅落。例如,亦包括在 2解銅箱時’於其表面的單面側以無電解鑛覆法或物理 条鑛法來製造第1銅層或第2銅層的任-者之層的情形。 將上述之電解銅笛的具備較小的平均結晶粒徑之第!銅層 由熱壓製成形或接著劑層黏合於上述絕緣基板而!y: 覆金屬積層板。 土敗而衣成 第2種覆金屬積層板的製造方法’ ·】;:=:層而成之層構成的電解銅二= D 2銅層為精由以至isot進行15分鐘以上6“ 熱而再結晶化者。 ^ ^ 亦即,在電解銅箔的階段,$ j銅層的平均 與第2銅層的平均結晶粒徑之差並無法進行區分::在P 金屬積層。板的成形時,使電解銅箱的第i鋼層侧承受^ C至18Gt的溫度15分鐘以上而將絕緣基板與該電解 黏合,則該第2銅層的平均結晶粒徑便變為 :卿吉晶粒徑大。亦即,藉由進行積層時的加IS 2銅層的銅的結晶組織再結晶化,而變得比第^層的平 320099 20 200847867 ,均結晶粒徑還大。 為了獲得如上述之第2銅層的銅的結晶組織,係採用 •使用酸性硫酸銅鍍液之電鍍銅法,且該酸性硫酸銅鍍液係 、使用銅濃度為〇.8mol/公升至公升、游離硫酸濃度 為0. 8mol/公升至1· 2m〇i/公升、氯濃度為“聊至5〇卯瓜 者,且旎夠使用業已將該酸性硫酸銅鍍液的1/2容量以上 予以活性碳處理者。此處之特徵在於上述硫酸銅鍍液的一 部分係使用經活性碳處理者。亦即,使用比工業上用於電 解銅箱製造的一般銅電解液更清淨化之鍍銅液,藉此,能 狗獲得以17代至180ΐ進行15分鐘以上的加熱而進行再 結晶化之電解銅箔。將該酸性硫酸銅鍍液的1/2容量以上 予X活H石厌處理係扣,當準備1 公升的銅鑛液時,將 a升以上進行/舌性叙過濾再使用。當該酸性硫酸銅鍍液的 活性碳處理量未滿1/2容量時,即使以17〇它至i8〇t:加熱 15分鐘左右也不會發生再結晶化、或者即使發生再結晶 φ化,結晶粒徑的變異量也會較大而不理想。若進一步說明 電解條件,則較宜於陽極使用尺寸安定性陽極⑻― Stable Anode: DSA)且設液溫為 4〇。〇至 6(rc 並以 5A/dm2 至70^/dm的電流雄度來進行電解。關於形成發生再結晶 化的第2銅層時之酸性硫酸銅鐘液及電解條件,以下相同。 、此處,較宜將加熱處理設定為以17〇。〇至18(rc進行 15刀鐘以上。如此低溫退火性良好的銅層在以1加熱 10刀4里後其機械特性會巨大變化。亦即,以丨70〇c χ1 〇 分鐘之加熱使結晶粒徑的變化開始發生。而若以i7( 320099 21 200847867 上的溫度進行15分鐘以上的加 徑會變得比第i銅層的平均結晶師、=層=均結晶粒 過高、加熱時間過具, 但右加熱溫度 行再^t H、、出現第1鋼層的結晶組織也進 丁再、、、…化而巨晶化之傾向,因此加熱 170 C至180〇c,加埶眭p弓祆— 且口又疋為 若,…〜 _較宜設定為15分鐘至30分鐘。 iR ^ ^ m r 、乳(ep〇Xy)糸樹脂作為絕緣基 11! hane)系接著劑作為與絕緣層的接著 關於加熱條件,以下相同。 古弟3種覆金屬積層板的製造方法係不使用電解銅 万法。 :即’百先以無電解鍍覆法於絕緣基板上形成第!鋼 層。由於是使用無電解鐘覆法,因此能多句直接於絕緣基板 的表面形成第i銅層。此時的無電解鑛覆係適用銅的益電 解鍍覆、,使用公知的任何無電解鍍覆法皆可。接著,採用 上名方法’以17〇 c至180。(:進;ft 15分鐘以上的加熱,藉 •此於該第1銅層上形成第2銅層而作為導體層。 之後,如上述般承受1701:至18(rc的溫度15分鐘以 上的加熱,藉此使該第2銅層的平均結晶粒徑具備比該第 1銅層的平均結晶粒徑還大之平均結晶粒徑,而作為覆銅 積層板使用。 步驟B : 在此步驟中,於前述導體層的第2銅層表面形成蝕刻 阻劑圖案(etching resist pattern)。形成此蝕刻阻劑圖 案用的蝕刻阻劑係使用油墨、乾膜(dry film)、或液體阻 320099 22 200847867 劑等公知的任何阻劑皆& 微細化鱼直後性m , 為了顧及别迷的線路的 劑。备使用= 的解析度,較宜選擇液體阻 '洗::=:劑時,係對前述第2銅層的表面進行酸 尺洗將表面予以清潔並進行乾 、體阻職使之賴”成_塗/。接著塗佈液 上曝光輸且劑圖宰,且二:土接者於該阻劑塗膜 π卢生 剞㈡木且進仃頰像去除不需要的部分, 仔在表面上具備钱刻阻劑圖案的覆金屬 步驟C : 、 爲在^步驟中,係對具備前述钱刻阻劑圖案之覆 層板進行韻刻處理而將所古去 將所有未形成蝕刻阻劑圖案之部分# 夠直i使㈣成線路° ^刻處理中’係』 刻條Γ 板製造中所使用的韻刻步驟、爸 亦即’㈣使心氯化銅或氯化鐵調配成的酸季姓 液或鹼性蝕刻液等。具體 ’、 ❿較宜使用液質管理容易的料二t “疋的關處理’ ^ ' 勿的屬系蝕刻液。並且,在蝕刻虚理 =定刻?間係較宜使用從前㈣^ ::二㈣1二的資料為基準且設定為飯刻全體銅層所 生子以吾", 為了將對弟1銅層之底切現象的產 車取小化,過钱刻時間更宜設定為0%至10%。 步驟D . 中,係將存在於前述線路的表面之㈣阻劑 =…去除而獲得印刷線路板。糊圖 除的具體方法向來廣為周知,只要選擇對應钱刻阻劑之ί 320099 23 200847867 颁者來使用即可。例如,告 用後θ k A 田使用刖述的液體阻劑時,係使 用像疋可性納溶液的驗性 二係使 剝除。 竹蚀刻阻劑圖案予以膨脹 <本發明之印刷線路板的製造形態2> 步驟^發:二第2製造方法的特徵為含有以下的步驟a至 二驟f卩下’為避免重複記載,與第“造方法之說明 重稷的部分係儘可能省略其說明。 步驟a : 層之’係製造在絕緣基板的表面僅具備第1銅 :…一 ν、设鋼積層板。該第1銅層係具備較小的平均結 曰曰粒徑者,且能夠採用將電解銅羯與絕緣基板黏合之方 法。此外,亦能夠使用無電解㈣法、物理蒸鍍法等而直 接开/成於、、S緣基板。只要有在後述的步驟e巾結晶粒徑不 冒巨大變化的結晶組織即可。但為了於在第i銅層與絕緣 基板之間獲得-定程度的接著強度,在使用電解銅落、且 以熱壓製方法、且作為撓性印刷線路板時,係、較宜採用利 ,鑄造方法製造而得之覆銅積層板。並且,當獲得較薄的 笫1銅層時,亦較宜使用具有載置層電解銅The resin (four), the liquid crystal polymer resin, and the like are provided with a flexible film. When it is suitable for poetry hard printed circuit boards, it can be cured by heating. = = reversed glass containing glass - epoxy (glass_epGxy) resin prepreg Prepreg), glass-polyimide (glass_p〇lyimide) resin A known hard insulating substrate material such as a prepreg or a BT resin prepreg. <Production Mode 1 of Printed Wiring Board of the Present Invention> Here, the form of the first manufacturing method will be described. The first manufacturing method of the printed wiring board of the present invention is characterized by comprising the following steps A to D. Hereinafter, each step will be described. • Step A: / In this step, a metal-clad laminate is provided, and the metal-clad laminate has a body layer formed of a layer in which a first copper layer and a second copper layer are laminated on the surface of the insulating substrate, and The average crystal grain size of the second steel layer has an average crystal grain size larger than the average crystal grain size of the first copper layer, and the first copper layer side is bonded to the insulating substrate. The method of manufacturing the metal-clad laminate is intended to employ several methods. The method for producing the first metal-clad laminate is a method using an electrolytic copper foil. 19 320099 200847867 The electrolytic steel foil at this time is a layer in which a first copper layer and a second steel layer are laminated, and the average crystal grain size of the second copper layer is larger than that of the first copper layer. The average crystal size of the particle size is large. The electrolytic copper system as used herein means that the average crystal grain size of the first copper layer and the average crystal grain size of the second copper layer are clearly different at the stage. Therefore, the electrolysis is based on the formation conditions of the "three-layer" and the second copper layer, and the electrolytic solution of the copper electrolyte or the like. However, the electrolytic copper falling here refers to the copper which is produced by electrolysis. For example, a case where any one of the first copper layer or the second copper layer is produced by an electroless ore coating method or a physical mineralization method on one side of the surface of the copper unboxing case is also included. The above-mentioned electrolytic copper flute has the smaller average crystal grain size! The copper layer is formed by hot pressing or an adhesive layer adhered to the above insulating substrate! y: Metal-clad laminate. The manufacturing method of the second metal-clad laminate is made of the soil. ':】;:=: The electrolytic copper composed of the layer of the layer is two = D 2 copper layer is fine and even isot for 15 minutes or more 6" heat Recrystallization. ^ ^ That is, in the stage of electrolytic copper foil, the difference between the average of the $j copper layer and the average crystal grain size of the second copper layer cannot be distinguished: in the P metal layer. When the i-th steel layer side of the electrolytic copper box is subjected to a temperature of from C to 18 Gt for 15 minutes or more and the insulating substrate is bonded to the electrolytic layer, the average crystal grain size of the second copper layer becomes: That is, by recrystallizing the crystal structure of the copper added with the IS 2 copper layer at the time of lamination, the average crystal grain size is larger than that of the layer 320099 20 200847867. In order to obtain the above, The copper crystal structure of the second copper layer is an electroplated copper method using an acidic copper sulfate plating solution, and the copper sulfate plating solution has a copper concentration of 〇.8 mol/liter to liter, and a free sulfuric acid concentration of 0. 8mol / liter to 1 · 2m 〇 i / liter, chlorine concentration is "talk to 5 〇卯 melon, and enough to use The acidic copper sulfate plating solution has a capacity of 1/2 or more and is treated with activated carbon. It is characterized here that a part of the above copper sulfate plating solution is treated with activated carbon. In other words, a copper plating solution which is cleaner than a general copper electrolytic solution which is industrially used for the production of an electrolytic copper box is used, whereby the dog can obtain electrolysis which is recrystallized by heating from 17 to 180 Torr for 15 minutes or more. Copper foil. The 1/2 volume or more of the acidic copper sulfate plating solution is applied to the X-active H-rope treatment button. When 1 liter of copper ore liquid is prepared, a liter or more is subjected to / tongue-type filtration and reuse. When the amount of activated carbon treated in the acidic copper sulfate plating solution is less than 1/2 capacity, recrystallization does not occur even if it is heated at about 17 Torr to i8 〇t: for about 15 minutes, or even if recrystallization occurs, The amount of variation in crystal grain size will also be large and unsatisfactory. If the electrolysis conditions are further explained, it is preferable to use a dimensionally stable anode (8) - Stable Anode (DSA) for the anode and set the liquid temperature to 4 Torr. The electrolysis is carried out at a current male of 5 A/dm 2 to 70 μ/dm, and the acidic copper sulfate liquid and the electrolysis conditions in the case of forming the second copper layer in which recrystallization occurs are the same as follows. Preferably, the heat treatment is set to 17 〇. 〇 to 18 (rc is 15 knives or more. Such a copper layer having a good low-temperature annealing property greatly changes its mechanical properties after heating 10 knives for 4 knives. Heating with 丨70〇c χ1 〇 minutes causes the change in crystal grain size to start. However, if the temperature is increased by i7 (320099 21 200847867 for more than 15 minutes, it will become the average crystallizer of the i-th copper layer. , = layer = average crystal grain is too high, heating time is too high, but the right heating temperature is further ^ t H, the crystal structure of the first steel layer also appears to be Ding, then, ... and the tendency of macrocrystallization, Therefore, heating 170 C to 180 〇c, adding 埶眭p bow 祆 - and the mouth is 疋 若, ... ~ _ is preferably set to 15 minutes to 30 minutes. iR ^ ^ mr, milk (ep〇Xy) 糸 resin as The insulating base 11! hane is an adhesive next to the insulating layer, and the heating conditions are the same as the following. The manufacturing method of the laminated board does not use the electrolytic copper method. That is, the 'first layer is formed on the insulating substrate by the electroless plating method. The steel layer is formed by the electroless plating method, so it can be directly insulated from the insulation. The i-th copper layer is formed on the surface of the substrate. The electroless ore coating at this time is applied to the electrolytic plating of copper, and any known electroless plating method can be used. Next, the method of the above name is used to "17" to 180. (: In; ft 15 minutes or more heating, by which the second copper layer is formed on the first copper layer to serve as a conductor layer. Thereafter, as described above, the temperature is 1701: 18 (the temperature of rc is 15 minutes or longer). By heating, the average crystal grain size of the second copper layer is larger than the average crystal grain size of the first copper layer, and is used as a copper clad laminate. Step B: At this step An etching resist pattern is formed on the surface of the second copper layer of the conductor layer. The etching resist for forming the etching resist pattern is ink, dry film, or liquid resistance 320099 22 200847867 Any known agent such as a agent is & micro The fish is straightforward m, in order to take into account the agent of the other line. For the resolution of the use of =, it is better to select the liquid resistance 'wash::=: agent, the surface of the second copper layer is acid-washed. The surface is cleaned and dried, and the body is hindered by the work. _ Coating /. Then the coating liquid is exposed and the agent is slaughtered, and two: the soil is attached to the resist film π Lusheng 剞 (2) wood and Into the cheek image to remove the unnecessary portion, the metal-coated step C on the surface is provided with a money-etching resist pattern, in order to perform the rhyme processing on the cladding sheet having the aforementioned pattern of the resisting agent However, all the parts that have not formed the etch resist pattern will be straightened to make the line (4) into the line. The process is used in the manufacture of the stencil. The dad is also used in the manufacture of the slab. An acid acid salt or an alkaline etching solution prepared by mixing copper chloride or ferric chloride. The specific ', ❿ is more suitable to use the liquid quality management material 2 t "疋 处理 ' ' ^ ^ Do not belong to the etchant. And, in the etch imaginary = fixed time is better to use the former (four) ^ :: two (4) The data of 12 is the benchmark and is set to be the child of the copper layer of the rice cooker. In order to minimize the production of the undercut of the brother 1 layer, it is better to set the time to 0% to 10%. In step D., the printed circuit board is obtained by removing (4) resist == which exists on the surface of the aforementioned line. The specific method of paste removal has been widely known, as long as the corresponding money etching agent is selected ί 320099 23 200847867 It can be used by the presenter. For example, after using the liquid resist described in the θ k A field after the use, it is stripped using an inspective second system like a smectic solution. The bamboo etching resist pattern is given. Expansion <Production Form 2 of Printed Wiring Board of the Present Invention> Step 2: The second and second manufacturing methods are characterized by including the following steps a to 2, in order to avoid repeated description, and the description of the first method The part that is repeated is omitted as much as possible. In the step a: the layer is formed on the surface of the insulating substrate to have only the first copper: ... ν, and the steel laminate. The first copper layer has a small average tantalum grain size, and a method of bonding the electrolytic copper crucible to the insulating substrate can be employed. Further, it is also possible to directly open/form the S-edge substrate using an electroless (four) method, a physical vapor deposition method, or the like. As long as there is a crystal structure in which the crystal grain size of the towel is not changed greatly in the step described later. However, in order to obtain a certain degree of bonding strength between the i-th copper layer and the insulating substrate, when electrolytic copper is used, and the method is hot pressing, and is used as a flexible printed wiring board, it is preferable to use a casting. The method produces a copper clad laminate. Moreover, when a thinner 笫1 copper layer is obtained, it is also preferable to use a layer of electrolytic copper.
ArAc 泊0 步驟b · 在此步驟中,係於前述初步的覆銅積層板的第1鋼層 的表面形成鍍覆阻劑圖案。此處所說之鍍覆阻劑圖案係與 蝕刻阻劑同樣地,能夠使用油墨、乾膜或液體阻劑等公知 阻劑。當形成較薄的鍍銅層時,若使用液體阻劑便易於獲 24 32〇〇99 200847867 •得微細的線路圖案。但鍍鋼芦的卢南 考慮到之後的步驟中將會進;“二二= •、宜使用乾膜。在使用乾;,:’若考慮解析度等,係 '鮮❹以t 係利賴洗等將前述第1 =層的表面予以清潔並進行乾燥,且使用貼合機 (laminating machine)將乾膜+LV 日卜 βλχ R . 膜予以貼附。於該乾膜上曝光 鍍後阻^圖案,且進行顯影去除不要的部分,而 鍍覆阻劑圖案之覆銅積層板。 … 步驟C : η ί =驟中,係於前述初步的覆銅積層板的未形成鍍 覆阻劑圖案的第1銅声# s衣面鞑仃鍍銅而沿線路形狀形成第 Ϊ成:::形成。藉由使用圖案鐘覆法,作為第2銅層而 形成之線路的剖面形狀係能夠形成為接近於理想形狀者。 說’即成為容易獲得具有優異_因子的 此時的第2銅層的形成之手法只要為能夠形成 承又〇 C至!80t:的溫度15分鐘以上的加熱後進 晶化之低溫退火性佳的銅層之手法,則使用電解鐘鋼法了 無電^鍍鋼法、物理蒸鑛法等之中的任一方法皆可。但若 考慮1產性與成本,則較宜使用上述的酸性硫酸 以同樣的條件進行鍍銅。 / 仗且 步驟d ·· 在此步驟中,係將前述鍍覆阻劑圖案予以去除而作為 初步的印刷線路板。由於該鑛覆阻劑圖案的去除能夠適用 320099 25 200847867 ,與蝕刻阻劑圖案的去除同樣的概念,因此為了避免重複記 載故省略其說明。 步驟e : ·、隹-ft射’係對在㈣㈣得之初步的刷線路板 κ丁加熱處理而使前述第2銅層的結晶巨晶化。此時的加 熱條件係與前述相同,故此處省略說明。 步驟f : 在此步驟中,係在之後對前述第2鋼層的結晶已巨曰 =步的印刷線路板進行钕刻處理’將未形成第2銅; 板第1銅層予以溶解去除而作為印刷線路 L i !亦能約在沿電路形狀而形成之第2銅層 二=成广薄鑛有錫等金屬之金屬阻劑層以 可。:=二:先蝕刻法時,只要使用前述的銅蝕刻方法即 鍍覆阻劑之功能 銅層係發揮作為第1銅層的 地钱Γ卩,具備較大时均結晶粒徑之第2_純奸 :在二可r具—因子之線路= 丨理中設定的軸料㈣較宜使用以對 崎;==而獲得的資料為基準且設定為 減及對第1銅層之广:切現象=°:;:為7將鑛銅層的耗 豕丁以取小化,過蝕刻時間更宜 320099 26 200847867 設定為0%至10%。 退有,不論是何種製造形態,皆在線路的形成後,於 .鍍覆,、Sn-Bi、Au等金屬或者鍍覆含有該些金屬之 、σ至。接著,除了線路的端子部分之外使用阻焊遮罩 (solder mask)或覆膜(c〇verlay)以於線路上形成絕緣保 護層,而獲得印刷線路板。另夕卜,上述端子部分的鍵覆亦 可在絕緣保護膜的形成後進行。 籲 〈本發明之電解銅箔的形態〉 本發明之電解銅箔係用於前述覆金屬積層板的製造之 私解銅癌’在175 Cxl5分鐘的加熱後之第丨銅層的平均結 晶粒控為0· l#m以上^滿以私^第之銅層的平均結 晶粒徑為1.0/ζιη以上、5〇//m以下。 、° 具備前述構成的電解銅箔係能夠藉由使用電解液成分 相異的兩種類作為用於電解鋼箔的製造之電解液且採用2 階段的電解步驟來製造。例如,第Μ層係㈣使用銅濃 眷度為0.8m〇l/公升至公升、游離硫酸濃度為〇.8m〇i /公升至1. 2mol/公升、氯離子濃度為3至1〇卯m、且明膠 (gelatine)系添加劑濃度為〇. 3至5ppm的銅電解液,並以 40至60 C的液溫、5至50A/dm2的電流密度進行電解來形 成。而第2銅層的形成係使用銅濃度為〇8m〇1/公升至 1.2m〇l/公升、游離硫酸濃度為〇 8m〇1/公升至12邮I〆公 升、氯離子濃度為5ppm至50ppm的銅電解液。並且,在將 該酸性硫酸銅電解液供給至電解槽時係使供給量的1/2以 上業已經活性碳處理之電解液,且以4〇至6〇。〇的液溫、5 320099 27 200847867 ’至―的電流密度進行電解,藉此而能夠形成第2銅 層。 _· ®造如上述的電解銅fi所需之設備,係可採用以用於 製造具載置層的電解銅箱之設傷為首的各種已被提幸之設 -備加以調整後所得者。並且,要於第i銅層之上形成第2 銅層、或者於第2銅層之上形成第i銅層係視各層的厚度 的5又疋與¥ 的步驟的狀況來作選擇即。 [實施例] 籲以下,顯示本發明之實施例來綱本發明,但本發明 並非由以下的實施例所限定。 [實施例1] —在實施例1中’係使用在厚度35㈣的長形聚醯亞胺 脂薄膜的表面具備平均結晶粒徑為G 5#m且厚度為心 的第1銅層、以及平均結晶粒徑為2 ()口且厚度為 FCCL(Flexible Copper clad Laminate ; ^ •性覆銅積層板)。 將前述FCCL以硫酸濃度3〇§/公升的稀硫酸進行酸诜 後,再進行水洗並予以乾燥,且將市售的液體光阻油墨(蝕 刻阻劑油墨)塗佈於第2銅層表面。將形成有該液體阻劑塗 膜的FCCL予以乾燥,投影線路圖案而進行曝光。 用於評價的線路圖案為線路間距3〇_的直線線路。 在曝光後係使用碳酸鈉水溶液進行顯影,將不需要的 部分之阻劑予以剝離去除,水洗後予以乾燥而獲得具備蝕 刻阻劑圖案之FCCL。 320099 28 200847867 ’ 對别述所得之具備蝕刻阻劑圖案之FCCL·進行蝕刻處 理,而獲得具有線路間距30"的直線線路之印刷線ς .板。對此印刷線路板之線路的剖面形狀進行滿分為10分 評價’並求取蝕刻因子。 此外,實施ΜΙΤ耐折試驗取得其他的特性。 在ΜΙΤ耐折試驗中係製作如第4圖所示的試驗片4來 使用,該試驗片4係於絕緣基板6上形成線路圖宰 實施耐折試驗的部分8形成有絕緣保護層5。使用第5圖 所不之ΜΙΤ耐折試驗裝置,設定彎折曲率r : 咐的條件,對該試驗片實施耐折試驗。M;;何重. ^的斷裂與否係藉由檢測兩端的導通檢測端子9:= 严产,於=1平價及試驗結果,钱刻因子平均為5.3(銅層 :又#頂見12/Zm/底寬1一)。以MIT耐折試驗使之 發生斷線之條件為2〇〇次。 祈社使之 示於^上内容且與比較例1的評價·試驗結果合併顯 [比較例1] 在比較例1中,係具備具有與 ^度的結晶粒徑以作為_,且以用於=: 造用途之FCCL為起始材料。 用於C0F㈣製 評價用的線路的形成方法私 例1通用。為了避免重複說明 上述評償及試驗結果係如们所示,银刻因子平均為 320099 29 200847867 2·0(銅層厚度8/zm/頂寬7// m/底寬15 // m)。 以MIT耐折試驗使之發生斷線之條件為15〇次。 [表1] 線路電路剖面 ----— ΜIΤ耐折 試驗 銅層厚度 頂寬 底寬 钱刻因子 β m β m 次 --—---_ 200 實施例1 β m 丨 --- 15 5· 3 比較例1 8 7 15 2· 0 150 〈貫施例1與比較例1的對照> 依據上表,係顯示實施例丨所得之線路的剖面形狀為 良好的矩形形狀,其㈣因子係2.7倍於比較例〗所得之 以習知技術所製得之線路的剖面形狀的蝕刻因子。並且, 在MIT試驗中的耐彎曲性,係顯示13倍左右的耐久性。 因此’顯然地,具備具有結晶粒徑從絕緣基板侧往全屬芦 的表面變大之構成的金屬層來作為線路之印刷線路^ 鲁線路的形狀及耐彎曲性上具有優勢。 ,、 [實施例2] 使用除了設定第1銅層的銅的平均結晶粒徑 Π1、設定第2銅層的平均結晶粒徑為1;1_ · β 實施例1相同的fccl。 “ I*與 除了使用上述的FCCL之外,其他皆與實施例 進行而獲得具有線路間距3Mm的直線圖案的線问 =:對此印刷線路板之線路的剖面形狀進行滿心 刀的评仏,並求取蝕刻因子。 為 32〇〇99 30 200847867 此外’實施MIT耐折試驗取得其他的特性。 此印刷線路板的姓刻因+主q U于為5.0,且到發生斷線為止 的MIT耐折試驗的彎折次數為165次。 [實施例3] 使用除了設定第1銅層的銅的平均結晶粒徑為 m、設定第2銅層的平均結晶粒徑為35_之外其他皆盘 實施例1相同的FCCL。 ’、 • 除了使用上述的肌之外,其他皆與實施例!相同地 進行而獲得具有線路間距30纽的直線圖案的線路之印刷 線路板。對此印刷線路板之線路的剖面形狀進行滿分為 分的評價,並求取餘刻因子。 此外,實施MIT耐折試驗取得其他的特性。 且到發生斷線為止 此印刷線路板的蝕刻因子為4 6 的MIT耐折試驗的彎折次數為23·〇次 [實施例4 ]ArAc Poise 0 Step b In this step, a plating resist pattern is formed on the surface of the first steel layer of the preliminary copper-clad laminate. The plating resist pattern referred to herein can be a known resist such as an ink, a dry film or a liquid resist, similarly to the etching resist. When a thin copper plating layer is formed, if a liquid resist is used, it is easy to obtain 24 32 〇〇 99 200847867 • A fine wiring pattern is obtained. However, Lunan, which is coated with steel reed, will be considered in the following steps; "two two = •, dry film should be used. In the use of dry;,: 'If considering the resolution, etc., the system is 'sweet to t The surface of the first layer is cleaned and dried by washing, and the film is attached by using a laminating machine to dry film + LV β λ χ R. The film is exposed on the dry film. a pattern, and performing development to remove unnecessary portions, and plating a copper-clad laminate of a resist pattern. Step C: η ί = in the middle of the preliminary copper-clad laminate which is not formed with a plating resist pattern The first copper sound # s clothing surface is plated with copper and formed along the shape of the line:::: By using the pattern clock method, the cross-sectional shape of the line formed as the second copper layer can be formed close to In the case of the ideal shape, it is said that it is easy to obtain the formation of the second copper layer having an excellent _ factor at this time as long as it is capable of forming a temperature of 15 minutes or more after heating and then crystallization. For the method of low-temperature annealing of copper layer, the method of using electrolytic bell steel is no electricity ^ Any of the steel method and the physical vapor deposition method may be used. However, in consideration of the productivity and cost, it is preferable to use the above acidic sulfuric acid to perform copper plating under the same conditions. / 步骤 and step d ·· In this step, the plating resist pattern is removed as a preliminary printed wiring board. Since the removal of the mineral resist pattern can be applied to 320099 25 200847867, the same concept as the removal of the etching resist pattern, The explanation is omitted, and the description thereof is omitted. Step e: · 隹-ft shot' is to heat the crystal of the second copper layer by the preliminary brushing of the brush board obtained in (4) (4). The conditions are the same as described above, and thus the description thereof is omitted here. Step f: In this step, the printed wiring board of the second steel layer has been subjected to a etch process of the step 2, and the second copper is not formed. The first copper layer of the plate is dissolved and removed, and the printed circuit line L i can also be formed in the second copper layer formed along the circuit shape, and the metal resist layer of a metal such as tin can be formed into a thin ore. Two: When using the first etching method, just use The copper etching method, that is, the functional copper layer of the plating resist, functions as the first copper layer, and has the second time of the larger average crystal grain size. Line = the shaft material set in the tamper (4) is better to use the data obtained by 对崎; == as the benchmark and set to reduce the width of the first copper layer: cut phenomenon = °:;: 7 is the copper The consumption of the layer is reduced, and the etching time is more suitable for 320099 26 200847867. It is set to 0% to 10%. Retirement, regardless of the manufacturing form, after the formation of the line, plating, Sn -Bi, Au, etc. metal or plating containing σ to the metal. Then, in addition to the terminal portion of the line, a solder mask or a film is used to form an insulation on the line. Protect the layer and get a printed circuit board. Further, the key pad of the above terminal portion may be formed after the formation of the insulating protective film. 〈Present of the electrolytic copper foil of the present invention> The electrolytic copper foil of the present invention is used for the average crystal grain control of the second copper layer after heating at 175 Cxl for 5 minutes for the preparation of the above-mentioned metal-clad laminate The average crystal grain size of the copper layer of 0·l#m or more and the private layer is 1.0/ζιη or more and 5〇//m or less. The electrolytic copper foil having the above-described configuration can be produced by using two types of electrolytic solutions having different electrolyte solutions as electrolytic solutions for the production of electrolytic steel foil and using a two-stage electrolytic step. For example, the second layer system (4) uses a copper concentration of 0.8 m〇l/liter to liter, a free sulfuric acid concentration of 〇.8 m〇i / liter to 1.2 mol/liter, and a chloride ion concentration of 3 to 1 〇卯m. And gelatin is a copper electrolyte having a concentration of 〇3 to 5 ppm, and is formed by electrolysis at a liquid temperature of 40 to 60 C and a current density of 5 to 50 A/dm 2 . The second copper layer is formed using a copper concentration of 〇8 m〇1/liter to 1.2 m〇l/liter, a free sulfuric acid concentration of 〇8 m〇1/liter to 12 liters, and a chloride ion concentration of 5 ppm to 50 ppm. Copper electrolyte. Further, when the acidic copper sulfate electrolyte solution is supplied to the electrolytic cell, 1/2 of the supply amount is applied to the electrolytic solution which has been treated with activated carbon, and is 4 Torr to 6 Torr. The second liquid layer can be formed by electrolysis of the liquid temperature of 〇 and the current density of 5 320099 27 200847867. _· ® The equipment required for the electrolytic copper fi described above can be obtained by adjusting various types of materials that have been fortunately used for the manufacture of electrolytic copper boxes with mounting layers. Further, the second copper layer is formed on the i-th copper layer, or the second copper layer is formed on the second copper layer to select the thickness of each layer. [Examples] The present invention is shown by the following examples, but the present invention is not limited by the following examples. [Example 1] - In Example 1, 'the first copper layer having an average crystal grain size of G 5 #m and a thickness of a core, and an average of the surface of the elongated polyimine film having a thickness of 35 (four) was used. The crystal grain size is 2 () and the thickness is FCCL (Flexible Copper clad Laminate; ^ • Copper-clad laminate). The FCCL was acidified with dilute sulfuric acid having a sulfuric acid concentration of 3 〇 / liter, then washed with water and dried, and a commercially available liquid photoresist ink (etching resist ink) was applied to the surface of the second copper layer. The FCCL on which the liquid resist coating film was formed was dried, and the wiring pattern was projected to expose. The line pattern used for evaluation is a straight line with a line spacing of 3 〇. After the exposure, development was carried out using an aqueous solution of sodium carbonate, and an unnecessary portion of the resist was peeled off, washed with water, and dried to obtain an FCCL having an etching resist pattern. 320099 28 200847867 ' The FCCL· having an etching resist pattern obtained by etching is subjected to etching treatment to obtain a printed wiring board having a line pitch of 30". The cross-sectional shape of the line of the printed wiring board was subjected to a perfect score of 10 points and an etching factor was obtained. In addition, the ΜΙΤ folding test was carried out to obtain other characteristics. In the ΜΙΤ folding test, the test piece 4 shown in Fig. 4 was produced, and the test piece 4 was formed on the insulating substrate 6 to form a wiring pattern. The portion 8 of the folding end test was formed with the insulating protective layer 5. The test piece was subjected to a folding test using the ΜΙΤ folding test apparatus of Fig. 5, setting the bending curvature r: 咐. M;; 何重. ^ The fracture is detected by detecting the conduction terminals 9 at both ends: = strict production, at 1 parity and test results, the average engraving factor is 5.3 (copper layer: again #顶见12/ Zm / bottom width 1). The condition for breaking the wire by the MIT folding test was 2 times. The contents of the above-mentioned contents are combined with the evaluation and test results of Comparative Example 1 [Comparative Example 1] In Comparative Example 1, the crystal grain size having a degree of 以 is provided as _, and is used for =: The FCCL used for the purpose is the starting material. The method for forming the line for the evaluation of the C0F (four) system is common to the case 1. In order to avoid repeated explanations, the above evaluations and test results are shown as follows. The silver engraving factor averages 320099 29 200847867 2·0 (copper layer thickness 8/zm/top width 7//m/bottom width 15 // m). The condition for breaking the wire by the MIT folding test was 15 times. [Table 1] Line circuit profile----- ΜIΤ folding test copper layer thickness top width bottom width engraving factor β m β m times -------- 200 Example 1 β m 丨--- 15 5 3 Comparative Example 1 8 7 15 2· 0 150 <Control of Comparative Example 1 and Comparative Example 1> According to the above table, the cross-sectional shape of the line obtained in Example 为 is a good rectangular shape, and (4) the factor system 2.7 times the etching factor of the cross-sectional shape of the line obtained by the prior art obtained by the comparative example. Further, the bending resistance in the MIT test showed a durability of about 13 times. Therefore, it is apparent that it is advantageous to have a metal layer having a crystal grain size from the side of the insulating substrate to the surface of all the reeds, and to have a shape and a bending resistance of the printed wiring line. [Example 2] The average crystal grain size 铜1 of copper in addition to the first copper layer was set, and the average crystal grain size of the second copper layer was set to 1; 1_·β The same fccl as in Example 1. "I* and the line pattern obtained with the line spacing of 3Mm except for the use of the above-mentioned FCCL, the line pattern of the line pattern having a line spacing of 3 Mm =: a full-hearted evaluation of the cross-sectional shape of the line of the printed wiring board, and The etching factor is obtained. It is 32〇〇99 30 200847867 In addition, the other characteristics of the MIT folding test are obtained. The name of the printed circuit board is + the main q U is 5.0, and the MIT is broken until the disconnection occurs. The number of times of the test was 165. [Example 3] The disk was used in addition to the average crystal grain size of copper in which the first copper layer was set to m and the average crystal grain size of the second copper layer was set to 35 mm. Example 1 The same FCCL. ', • A printed wiring board having a line pattern having a line pitch of 30 New points was obtained in the same manner as in the example except that the above-described muscle was used. The cross-sectional shape is evaluated as a perfect score, and the residual factor is obtained. In addition, the MIT folding test is performed to obtain other characteristics. The MIT folding test with an etching factor of 4 6 until the disconnection occurs. of Off-times of 23 billion times [Example 4]
m 實 使用除了設定第1銅層的銅的平均結晶粒徑為i 、設定第2銅層的平均結晶粒庐兔9 』。日日桠仏為2· 0 # m之外其他皆盥 施例1相同的FCCL。 /、 造=使用上述的FCCL之外’其他皆與實施们相同地 =仃而獲得具有線路間距,m的直線圖案的線路之印刷 線路板。對此印刷線路板之線路的剖面形狀進行滿分為^ 为的評價,並求取蝕刻因子。 此外,實施MIT耐折試驗取得其他的特性。 此印刷線路板的钕刻因子為2.6。但當第、銅層的平 320099 31 200847867 均結晶粒徑成為1.0/zm以上時,結晶尺寸的分佈會變廣, 個別的飿刻因子的值會因此而在2·〇至3.6的範圍内變 異’變異範圍係變大。 此外,到發生斷線為止的MIT耐折試驗的彎折次數為 180 次。 ' [實施例5] 使用除了設定第1銅層的銅的平均結晶粒徑為〇 5# m、設定第2銅層的平均、结晶粒㈣〇 9//m之外其他皆與 實施例1相同的FCCL。 …除了使用上述的FCCL之外,其他皆與實施例!相同地 進订而獲得具有線路間距3G#m的直線圖案的線路之印刷 :路板。對此印刷線路板之線路的剖面形狀進行滿分為ι〇 为的评價,並求取蝕刻因子。 此外,實施MIT耐折試驗取得其他的特性。 為止=印刷線路板的兹刻因子為3.°,但到發生斷線 為止的ΜΠ耐折試驗的f曲次數為155次, 声 的平均結晶粒徑未滿一時*銅層 性銥P古% Α Μ 了雖…ΜΙΤ耐折武驗中的耐折 U,但並無法說該改善效果已足夠。 在試著研究後,發料使 弟2銅層之銅結晶的平士曰 乂成 曰从τ 十勾、、、σ阳粒徑比形成第1銅層之钿έ士 晶的平均結晶粒徑還大的愔 ι 〗層之銅結 粒徑超過^而較大時^田#銅層的平均結晶 的範_,但子的平均值位於良好 變廣的傾向,而容易變得::蝕刻因子的值的分佈範圍 易又侍難以形成均質的線路,此外,當 320099 32 200847867 弟2銅層的平均結晶粒徑比丨㈣低時m耐折試驗中的 到發生斷線為止的料次數較善效果亦未必能夠說是已 足狗。而在第i銅層的銅結晶的平均結晶粒徑為 以上、未滿Ι.Ο/zm,且第2鋼層的銅結晶的平均結晶粒徑 在5/zm的範圍内時並不會有上述的傾向。因此, 對於形成第1㈣及第2_之銅結晶的平均結晶粒徑, 1. 0 /z m的平均結晶粒徑係使所製得的線路產生各 變化的界限點。 [產業上的利用可能性] 藉由本發明而獲得之印刷線路板,形成於絕緣基 板:t:r系具備良好的蝕刻因子,且作為撓性印刷線路 成為具有優異耐彎曲性之製品。因此,在使針對行 式機4之液晶驅動器安裝用印刷線路板等的線路 細線路化變得容易的同時,電路斷線的危險性亦變少。^ t,該印刷線路板的製程係能夠使用習知的製造設備來: 鲁,’而由於不需要投資新的設備,因此能約提供經濟且二 良好品質的印刷線路板。 /、 【圖式簡單說明】 第1圖係顯示具有微細結晶之銅層的例之照片 弟2圖係頌示巨晶化之銅層的例之照片。 第3圖係顯示線路的橫剖面形狀之示意圖。 第4圖係顯示MIT耐折試驗用試驗片之示意圖 第5圖係MIT試驗裝置的概略圖。 【主要元件符號說明】 320099 33 200847867 -1 頂寬(Wt) 2 下端寬度(Wb) 3 銅層的合計厚度(Tc) 4 ΜIT耐折試驗用試驗片 5 絕緣保護層 6 絕緣基材 7 銅線路 8 耐折試驗部 9 導通檢測端子 10 試驗片 11 彎折裝置 12 彎折裝置安裝台 13 柱塞 14 施加荷重之夾具 15 導線 16 試驗片露出部(長度50mm至70mm) 17 彎折角度(135°±5°) 18 彎折角度(135°±5°) 34 320099m The average crystal grain size of copper in addition to the first copper layer was set to i, and the average crystal grain of the second copper layer was set to be "9". Every day is the same FCCL as in Example 1. /, = Printed wiring board using a line pattern having a line pitch of m, which is the same as that of the above-mentioned FCCL. The cross-sectional shape of the line of the printed wiring board was evaluated as a perfect value, and an etching factor was obtained. In addition, the MIT folding test was carried out to obtain other characteristics. The printed circuit board has an engraving factor of 2.6. However, when the average crystal grain size of the third and third layers of the copper layer is 1.0/zm or more, the distribution of the crystal size becomes wider, and the value of the individual engraving factor is thus varied within the range of 2·〇 to 3.6. 'The range of variation is getting bigger. In addition, the number of bends of the MIT folding test up to the occurrence of the breakage was 180 times. [Example 5] Example 1 was used except that the average crystal grain size of copper in which the first copper layer was set was 〇5 #m, the average of the second copper layer was set, and the crystal grains (4) 〇9//m were used. The same FCCL. ...other than the FCCL described above, the other examples! The printing of the line having the line pattern of the line pitch 3G#m is obtained in the same manner: the road board. The cross-sectional shape of the line of the printed wiring board was evaluated as a perfect value, and an etching factor was obtained. In addition, the MIT folding test was carried out to obtain other characteristics. Up to now = the printing factor of the printed circuit board is 3.°, but the number of f-curves of the ΜΠ folding test until the occurrence of the broken wire is 155 times, and the average crystal grain size of the sound is less than one time. Α Μ 虽 虽 虽 虽 虽 ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ ΜΙΤ After trying to study, the average crystal grain size of the gentleman crystals forming the first copper layer from the τ ten-hook, and σ-yang particle size ratios If the particle size of the larger 愔ι 〗 layer exceeds ^ and is larger, the average crystal of the copper layer is _, but the average value of the sub-particles tends to be broader and wider, and it becomes easy to become:: etch factor The distribution of the values is easy to form and it is difficult to form a homogeneous line. In addition, when the average crystal grain size of the 2nd copper layer of 320099 32 200847867 is lower than that of 丨(4), the number of times of the breakage in the m-folding test is better. The effect may not be able to say that it is already a dog. On the other hand, when the average crystal grain size of the copper crystal of the i-th copper layer is not more than Ο.Ο/zm, and the average crystal grain size of the copper crystal of the second steel layer is in the range of 5/zm, there is no The above tendency. Therefore, for the average crystal grain size of the copper crystals forming the first (fourth) and the second, the average crystal grain size of 1. 0 /z m is a limit point at which the obtained line is changed. [Industrial Applicability] The printed wiring board obtained by the present invention is formed on an insulating substrate: the t:r system has a good etching factor and is a product having excellent bending resistance as a flexible printed wiring. Therefore, it is easy to make the wiring of the printed wiring board or the like for the liquid crystal driver mounting of the line machine 4 thin, and the risk of disconnection of the circuit is also reduced. ^ t, the process of the printed wiring board can use conventional manufacturing equipment to: Lu, and because it does not need to invest in new equipment, it can provide economical and good quality printed circuit boards. /, [Simplified description of the drawings] Fig. 1 is a photograph showing an example of a copper layer having fine crystals. Fig. 2 is a photograph showing an example of a copper layer having a giant crystal. Figure 3 is a schematic diagram showing the cross-sectional shape of the line. Fig. 4 is a schematic view showing a test piece for the MIT folding test. Fig. 5 is a schematic view showing the MIT test device. [Main component symbol description] 320099 33 200847867 -1 Top width (Wt) 2 Lower end width (Wb) 3 Total thickness of copper layer (Tc) 4 Μ IT test piece for folding test 5 Insulation protective layer 6 Insulation substrate 7 Copper line 8 Fold-resistant test part 9 Conduction detection terminal 10 Test piece 11 Bending device 12 Bending device mounting table 13 Plunger 14 Clamp for applying load 15 Conductor 16 Test piece exposed portion (length 50mm to 70mm) 17 Bending angle (135° ±5°) 18 bending angle (135°±5°) 34 320099
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| CN109952674A (en) * | 2016-11-11 | 2019-06-28 | 日进材料股份有限公司 | Secondary cell electrolytic copper foil and its production method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2010090394A2 (en) * | 2009-02-06 | 2010-08-12 | 주식회사 엘지화학 | Method for manufacturing an insulated conductive pattern |
| JP5255496B2 (en) * | 2009-03-26 | 2013-08-07 | 古河電気工業株式会社 | Metal-clad laminate and method for producing metal-clad laminate |
| KR101126969B1 (en) | 2009-08-18 | 2012-03-23 | 엘에스엠트론 주식회사 | High flexuous copper foil and method for producing the same |
| KR101234589B1 (en) * | 2010-05-24 | 2013-02-19 | 한국생산기술연구원 | Copper plated layer for forming pattern of printed circuit board and method of manufacturing the same |
| JP2012038823A (en) * | 2010-08-04 | 2012-02-23 | Nitto Denko Corp | Wiring circuit board |
| TWI617225B (en) * | 2010-12-24 | 2018-03-01 | Lg伊諾特股份有限公司 | Printed circuit board and method for manufacturing the same |
| JP5520848B2 (en) * | 2011-01-28 | 2014-06-11 | 新日鉄住金化学株式会社 | Method for manufacturing flexible circuit board |
| KR101528444B1 (en) * | 2012-03-16 | 2015-06-11 | 스미토모 베이클리트 컴퍼니 리미티드 | Laminate and method for manufacturing printed circuit board |
| JP6476686B2 (en) * | 2014-09-24 | 2019-03-06 | 東レ株式会社 | Metal laminated film |
| KR102402759B1 (en) * | 2015-05-29 | 2022-05-31 | 삼성디스플레이 주식회사 | Flexible display device and fabrication method of the same |
| DE102015224464A1 (en) * | 2015-12-07 | 2017-06-08 | Aurubis Stolberg Gmbh & Co. Kg | Copper-ceramic substrate, copper semi-finished product for producing a copper-ceramic substrate and method for producing a copper-ceramic substrate |
| JP6842229B2 (en) * | 2016-04-05 | 2021-03-17 | 住友金属鉱山株式会社 | Conductive substrate, manufacturing method of conductive substrate |
| JP7067114B2 (en) * | 2018-02-27 | 2022-05-16 | 三菱マテリアル株式会社 | Insulated circuit board and its manufacturing method |
| JP7103006B2 (en) * | 2018-07-18 | 2022-07-20 | 住友金属鉱山株式会社 | Copper-clad laminate |
| WO2023117126A1 (en) * | 2021-12-24 | 2023-06-29 | Circuit Foil Luxembourg | Double layered electrolytic copper foil and manufacturing method thereof |
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| JPS6210291A (en) * | 1985-07-05 | 1987-01-19 | Mitsui Mining & Smelting Co Ltd | Electrolytic copper foil |
| JPH0732544A (en) * | 1993-07-22 | 1995-02-03 | Mitsui Mining & Smelting Co Ltd | Paper base copper clad laminate and method for producing the same |
| JP2003324258A (en) * | 2002-05-01 | 2003-11-14 | Nippon Mektron Ltd | Copper-clad board for printed wiring board |
| JP4196662B2 (en) * | 2002-12-10 | 2008-12-17 | 凸版印刷株式会社 | Structure inclined copper foil and method for producing the same, etching method, copper foil pattern, storage method |
| JP4298597B2 (en) * | 2004-07-01 | 2009-07-22 | 日東電工株式会社 | Wiring circuit board and method for manufacturing wiring circuit board |
| JP2007317782A (en) * | 2006-05-24 | 2007-12-06 | Sumitomo Metal Mining Co Ltd | Flexible wiring board |
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| CN109952674A (en) * | 2016-11-11 | 2019-06-28 | 日进材料股份有限公司 | Secondary cell electrolytic copper foil and its production method |
| CN109952674B (en) * | 2016-11-11 | 2022-03-01 | 日进材料股份有限公司 | Electrolytic copper foil for secondary battery and method for producing the same |
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| KR20080096415A (en) | 2008-10-30 |
| JP4691573B2 (en) | 2011-06-01 |
| JP2008294432A (en) | 2008-12-04 |
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