200831295200831295
• , r 你 s z t 〜 *·**·* , * c 、h \ 鐵發攀_资擊給健繁:淺繼^鹽)纖鱗襲 :各::、聲濟說明 【發明所屬之技術領域】 本發明是有關於一種微奈米壓印製程之壓印模仁之製 作,且特別是有關於一種滾輪式壓印製程之滾筒模仁的製作 (Roller Mold Fabrication by Roller-Based Nanoimprinting) ° 【先前技術】 奈米壓印技術(Nanoimprinting Technology)發明至今約 十年的歷1,但其重要性與發展潛力卻廣受重視,並且被視 為未來最有可能超越並取代現有之奈米製程技術的方法之 一。目前已開發的奈米壓印製程可大略地區分成熱阻式(Hot Embossing)、紫外光固化(UV Cured)、自組裝式 (Self-assembly)與雷射輔助式(Laser Assisted)奈米壓印技 術。已商業化之奈米壓印技術的奈米壓印機台可以壓印之晶 圓尺寸約為6-8吋,然而所需之壓印時間卻相當長,因此商 品的單位時間產出量相對較小,量產能力不佳。有鑑於此, 目前更發展出滾輪式奈米壓印技術,以期獲得高量產能力。 由於滾輪式奈米壓印技術可作為單位時間高產量之解 決方案之一,也因此,世界各大奈米壓印研究團隊無不對滾 印壓印技術做最深入的研發,以其早日使得滾輪式奈米壓印 技術可以達成各式商品的量產應用。然而,滾輪式奈米壓印 的關鍵突破技術在於滾筒模仁的製作上。滾筒模仁製作困難 的原因在於如何在滾筒的曲面上定義出次微米甚至奈米級 尺寸的圖案。就目前已發表的國際或者國内期刊在滾筒模仁 的製作發展現況可以簡單的區分為下列幾種。 5 200831295 _丨機械加工刀具在滾筒之圓柱曲面上做精 密雕刻加工,以國内目前最 茚上彳文精 2微米。 』取新的加工技術,其最小線寬可達 弟一種為錄金屬簿酿白芦 平面鎳金屬薄膜,再利用=\於/筒表面法’其係先提供一 特徵圖案。接著,==Γ金屬薄膜表面上定義出 筒之曲面上,而完成滾二1後之録金屬薄膜貼附於滾 以貼附的方式將金屬薄膜二然而,因為第二種方式係 子汽曲面卜合士屬薄膜而貼附在滾筒曲面上,因此在 :種方法的:屬薄膜之表面接縫不連續的現象。此外, 使得全屬薄膜表:難點在於金屬薄膜貼附的技術是否可以 合。這此因♦斟认又一滾同曲面的彎曲度二者相符 ::素對於此種滾筒模仁的製作都是很大的挑戰。 平面模仁表面上接著印^筒上的特徵圖线行製作在一 製程所需的墨水。再將平面模仁表面上塗佈自組裝壓印 上滾動,夢以伟工夺滾同在平面模仁上之欲轉印特徵圖案 阻擋層上之a安:行姓刻、電鍍等製程,而將抗姓刻 所定義的;移如至滾筒表面上,而在滾筒表面上成長出 裝墨水法製做^二此即完成滾筒的製作1而,以自組 印墨水會在滾=在於滾筒在平面模仁上滾動時,魔 管現象,而造上產生類似水在紙面上所產生之毛細 鍍等製程過程,靖:之圖案尺寸的不完整。再者’透過電 產方式。 貞且緩慢,因此並不適合作為滾筒模仁的量 6 200831295 【發明内容】 有繁於上述各種習知滾筒模仁之製作技術所面臨的種 種困難與缺點,本發明之實施例提出了一種新型製作滾筒模 ^的方法。本發明之目的就是在提供一種新型製作壓印滾筒 '的方法,可將设计的特徵圖案(pattern)順利地定義在滾 筒的曲面上。 、本發明之另一目的是在提供一種滾筒模仁之製造方 法,可使用準分子雷射來作為加熱光源,由於準分子雷射具 有加熱快速的特性,因此可大幅提升滾筒模仁的製作速度。 、、 '月之又一目的是在提供一種滾筒模仁之製造方 =,適用於滾輪式奈米壓印,可快速製作滾筒模仁,因此可 貝現滾輪式奈米壓印所帶來的快速且大面積壓印的優點。• , r you szt ~ *·**·* , * c , h \ iron hair climbing _ smuggling to Jianfan: shallow success ^ salt) fiber scale attack: each::, sound economy description [invention belongs to the technical field The invention relates to the manufacture of an imprinting mold for a micro-nano imprinting process, and in particular to a roller-type imprinting process (Roller Mold Fabrication by Roller-Based Nanoimprinting) ° Technology] Nanoimprinting Technology has been invented for about ten years, but its importance and development potential have been widely recognized, and it is considered as the most likely to surpass and replace the existing nano-process technology in the future. One of the methods. Currently developed nanoimprinting processes can be roughly divided into Hot Embossing, UV Cured, Self-assembly and Laser Assisted nanoimprinting. technology. The nanoimprinting machine of the commercial nano imprinting technology can imprint the wafer size of about 6-8 吋, but the required embossing time is quite long, so the output per unit time of the commodity is relatively Small, mass production capacity is not good. In view of this, roller type nano imprint technology has been developed in order to obtain high volume production capacity. Because the roller nano imprint technology can be used as one of the solutions for high throughput per unit time, the world's major nano imprint research teams have done the most in-depth research and development on the roll imprint technology, so that it can make the wheel as soon as possible. Nano-imprint technology can achieve mass production applications for a variety of products. However, the key breakthrough technology for roller-type nanoimprinting is the production of roller molds. The reason why the drum mold is difficult to fabricate is how to define a sub-micron or even nano-scale pattern on the curved surface of the drum. The current status of the development of roller molds in international or domestic journals that have been published can be easily divided into the following categories. 5 200831295 _丨Machining tools are precisely engraved on the cylindrical surface of the drum, which is the most popular in China. Take a new processing technology, the minimum line width can reach up to the younger one, for the recording of the metal book, the white nickel metal film, and then use the \ \ / / tube surface method to provide a characteristic pattern. Then, the surface of the cylinder is defined on the surface of the == Γ metal film, and the metal film after the completion of the roll 2 is attached to the roll to attach the metal film. However, the second method is a steam surface. Buheshi is attached to the curved surface of the drum, so in the method: the surface seam of the film is discontinuous. In addition, it makes all the film sheets: the difficulty lies in whether the technology of metal film attachment can be combined. This is because Φ recognizes that the curvature of the other roll is the same as the curvature of the surface. :: The production of this roller mold is a great challenge. On the surface of the planar mold, the characteristic lines on the cylinder are then used to make the ink required for a process. Then, the surface of the flat mold is coated on the surface of the self-assembled embossing, and the dream is to roll the same on the barrier layer of the pattern to be transferred on the planar mold core: the process of casting, electroplating, etc. The anti-surname is defined as follows; it is moved onto the surface of the drum, and the ink is grown on the surface of the drum to make the ink. The second step is to complete the production of the drum 1 and the self-assembled ink will be rolled in the drum. When the flat mold is rolled, the magic tube phenomenon, and the process of producing a capillary plating such as water produced on the paper surface, the pattern size of Jing: is incomplete. Furthermore, 'through the electricity industry.贞 缓慢 , 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 2008 The method of modulo ^. SUMMARY OF THE INVENTION It is an object of the present invention to provide a novel method of making an impression cylinder which can smoothly define a design pattern on the curved surface of the drum. Another object of the present invention is to provide a method for manufacturing a roller mold, which can use a pseudo-molecular laser as a heating source. Since the excimer laser has a fast heating characteristic, the manufacturing speed of the roller mold can be greatly improved. , 'Another purpose of the month is to provide a manufacturer of the roller mold core =, suitable for roller type nano imprinting, can quickly make the roller mold core, so it can be quickly brought by the roller type nano imprinting And the advantages of large area imprinting.
、、本背明之再一目的是在提供一種滾筒模仁之製造方 ,二可製作出一體成型的滾筒模仁,且可簡化像統滾筒模仁 製’技術所而要的多道製程,因此不僅可提高製程可靠度與 良率,更可提高滾筒模仁的精密度。 〃 、本發明之再一目的是在提供一種滾筒模仁之製造方 法I製作出抗磨耗性佳之滾筒模仁,可有效降低壓印製程 筒模仁之表面的損傷,因此可大幅延長滾筒模仁之使用 奇命,因此可大大降低奈米壓印製程的成本。 +根據本發明之上述目的,提出一種滾筒模仁之製造方法 =包括:提供一主體結構,其中主體結構呈圓柱狀·,形成 堅P材料層几全覆蓋在主體結構之一弧面上·,將主體結賴 平木β又於壓印載台上;設置一平面模仁於主體結構上 200831295 其中平面模仁具有相對之筮 七之第-m : 以及第二表面,且平面模 1一之第一表面没有一圖亲έ士操 τ> γ , 1 木結構,平面模仁之第一表面壓合在 壓印材料層之一區的一部分 矿 模仁之第二表面上,以使平面广:一壓印滾筒壓設在平面 進行一加熱步驟,以將平面模仁之圖 —構轉印至壓印材料層之經壓合之區的壓合部分上;以及 分離主體結構之壓印材料層與平面模仁。 熱源=發明一較佳實施例’上述之加熱步驟所使用之加 依,¾本發明另一較佳竇綠你| μ、+、 八名午u f 1土只靶例,上述之加熱步驟係使用準 刀子雷射,且壓印滾筒與平板模仁之材料包含準分子雷射波 段之光線可穿透之材料,較佳可例如為石 體結構的材料為準分子雷射波光 、^间旲一之主 材質,較佳可例如錄或銅之先線可加熱炼融之金屬 料=英壓印滾筒的使用,可對待壓印之滾筒模仁的壓印材 人二射^央平板模仁造成之線型局部應力集中的現象,再配 的投射與石英騎滾筒的曲面可使得準分子雷射 在滾同模仁之主體結構的弧面 、 ㈣面上♦焦,可順利完成直接在滾 同模仁之主體結構弧面上的壓印材料層上的壓印。另外,利 = 袞筒二滾筒模仁之主體結構的轉動特性,可連續壓印 仁之表面上的壓印材料層’直到完成圖形的定義。 【實施方式】 本發明揭露一種滾筒模仁之製g太 將特徵圖案定義在滾筒模仁的表方二可:速且精確地 上糟由轉動滾筒模仁, 200831295 而可連續進行大面積之試片的壓印’因此可使滾輪式奈米壓 印技術的構想實現。為了使本發明之敘述更加詳盡與完備, 可參照下列描述並配合第丨圖與第2圖之圖式。 。月參fe第1圖,其繪示依照本發明一較佳實施例的一種 ,筒模仁製作技術之裝置示意圖。進行本示範實施例之製程 時,首先提供圓柱狀之主體結構1〇〇,其中主體結構1〇〇之 材料可依據所使用之加熱源來加以選擇,主體結構1〇〇之材 料可例如為半導體材料、屢電材料、玻璃材料、陶曼材料、 金屬或導電材料。例如,在本發明之―較佳實施例中,選用 準分子雷射來作為加熱源,因此本發明之主體結構!⑽可包 3準/刀子雷射波段之光線可加熱而使之溶融的材料,較佳例 ==屬圓柱:戈銅金屬圓柱。在一實施例中,製作主體結 7 T先提供吸熱性良好的錄或銅金屬圓棒,並對全 :::之;周,面進行鏡面抛光處理,而完成主體結構二 之衣作。接f,即可利用例如壓印舆 100之孤面106進行圖案定義。 ㈣對主體結構 在本示範實施例中,進行主體結構100 案定義步驟時,先將此主體結構跡水平架設在^恭= 102之上。在本示範實施例中 二:、口 載台’且此自動㈣载台較佳係包4::=動昼印 力,亦即X軸方向、y軸方向與2軸方::自/度的移動能 俜包含丄個白命 向之移動能力’更佳 係…個自由度之移動能力,包含 更“ Z轴方向與旋轉軸方向,如第It轴、y轴、 台102可為飼服馬達驅動载台、 _斤不。屋印載 式移動載台、超導式移動巷 J …達驅動载台、磁浮 ㈣㈣载台、磁浮式轉 200831295 動載台、超導式轉動載台或氣壓式轉動載台。 接下來’先利用例如熱蒸鍍法(Thermal Evap〇rati〇n)、 化 4* 氣相沉積法(Chemical Vapor Deposition ; CVD)、低壓 化子氣相 /儿積法(Low Pres sure-Chemical VaporA further object of the present invention is to provide a drum mold core manufacturing method, and to produce an integrally formed roller mold core, and to simplify the multi-pass process of the technical system of the cylinder mold, so not only It can improve process reliability and yield, and improve the precision of the roller mold. Further, another object of the present invention is to provide a roller mold core which is excellent in abrasion resistance by providing a method for manufacturing a roller mold core, which can effectively reduce damage on the surface of the mold cylinder of the imprint process cylinder, thereby greatly extending the use of the roller mold core. Life, therefore, can greatly reduce the cost of the nanoimprint process. According to the above object of the present invention, a method for manufacturing a roller mold core is provided, which comprises: providing a main body structure, wherein the main body structure is cylindrical, and the layer of the hard P material is completely covered on one of the arc surfaces of the main structure. The main body is tied to the flat wood β on the imprinting stage; a flat mold is placed on the main structure 200831295, wherein the planar mold core has the opposite -m: and the second surface, and the planar mold 1 is the first There is no picture on the surface of the relatives, γ, 1 wood structure, the first surface of the planar mold is pressed on the second surface of a part of the mineral mold in a region of the embossed material layer, so that the plane is wide: one embossing Roller pressing is performed on the plane to perform a heating step to transfer the plane mold to the nip portion of the pressed region of the embossed material layer; and separating the embossing material layer and the planar mold brist of the main structure . Heat source = invention of a preferred embodiment of the above-mentioned heating step used in addition, 3⁄4 another preferred sinus green of the present invention | μ, +, eight noon uf 1 soil target example, the above heating step is used a quasi-knife laser, and the material of the impression cylinder and the flat mold core comprises a light-transmissive material in the excimer laser band, preferably a material such as a stone structure is excimer laser light, and The main material, preferably can be recorded, for example, or the first line of copper can be heated and smelted metal material = the use of the British impression cylinder, the embossed material of the cylinder mold to be embossed, the two-shot type The phenomenon of local stress concentration, the matching projection and the curved surface of the quartz riding roller can make the excimer laser in the arc surface and (4) surface of the main structure of the same mold core, and can smoothly complete the main structure directly on the same mold core. Embossing on the layer of embossed material on the curved surface. In addition, the rotation characteristic of the main structure of the two cylinders of the cylinder can continuously imprint the layer of imprint material on the surface of the cylinder until the definition of the pattern is completed. [Embodiment] The invention discloses a method for forming a roller mold, and defining a characteristic pattern on the surface of the roller mold. The speed and accuracy of the mold can be continuously performed by rotating the roller mold, 200831295. Embossing' thus enables the concept of roller-type nanoimprint technology to be realized. In order to make the description of the present invention more detailed and complete, reference is made to the following description in conjunction with the drawings of FIG. 2 and FIG. . FIG. 1 is a schematic view showing a device for manufacturing a cylinder mold according to a preferred embodiment of the present invention. When the process of the exemplary embodiment is performed, a cylindrical main structure 1 首先 is first provided, wherein the material of the main structure 1 可 can be selected according to the heating source used, and the material of the main structure 1 可 can be, for example, a semiconductor. Materials, electrical materials, glass materials, Tauman materials, metals or conductive materials. For example, in the preferred embodiment of the present invention, an excimer laser is selected as the heating source, and thus the main structure of the present invention! (10) A material that can be heated by the laser beam of the quasi-knife/knife can be heated, and the preferred example == is a cylinder: a copper-copper metal cylinder. In one embodiment, the main body is formed to provide a recording or copper metal round rod with good heat absorption, and the surface of the whole:::, the surface is mirror-polished, and the main structure is finished. By f, the pattern definition can be performed using, for example, the orphan 106 of the stamp 100. (4) The main structure In the present exemplary embodiment, when the main structure 100 is defined, the main structural trace is first erected on top of ^^=102. In the exemplary embodiment, the second: the port carrier 'and the automatic (four) carrier is preferably a package 4::= 昼 printing force, that is, the X-axis direction, the y-axis direction and the 2-axis side:: self/degree The movement can include the movement ability of a white life direction. The better the movement degree of a degree of freedom, including the more "Z-axis direction and the direction of the rotation axis, such as the It axis, the y-axis, the table 102 can be a feeding service. Motor drive stage, _ jin not. House-printed mobile stage, super-conducting moving lane J ... to drive the stage, magnetic float (four) (four) stage, magnetic floating type 200831295 moving stage, superconducting rotating stage or air pressure Rotate the stage. Next, use, for example, thermal evaporation (Thermal Evap〇rati〇n), Chemical Vapor Deposition (CVD), Low Pressure Neutral/Gas (Low) Pres sure-Chemical Vapor
Deposition ’ LPCVD)、旋塗法(R0tary Spindle)、印刷法 (Printing)、或化學沉積法(Chemical ⑽),形成待壓Deposition ' LPCVD), R0tary Spindle, Printing, or Chemical (10), forming a pressure to be pressed
印之壓印材料層U8覆蓋在主體結構100之整個弧面1〇6 上。其中,壓印材料層i i 8之材料可例如為半導體材料、壓 電材料、玻璃材料、陶瓷材料、金屬或導電材料。在一實施 例中,壓印材料層118可例如金屬薄膜層或光阻等高分子材 料層。在一較佳貫施例中,壓印材料層118與主體結構 之材料均為鎳金屬。此時,壓印材料層118包覆在主體結構 100之弧面106外,並且由壓印載台1〇2所承載。 在此同時,提供平面模仁1〇4,其中此平面模仁1〇4】 有相對之表面122與表面124。平面模仁1〇4之表面122言 有欲轉印之圖案結構1〇8,其中此圖案結構1〇8可為具有糕 米尺寸或奈米尺寸之特徵圖案的凹凸狀結構。再將平面模七 104放置在主體結構1〇〇上,並對平面模仁施加預壓乂 而使平面模仁104之表面122上之圖案結構1〇8舆主體結相 100之弧面1〇6上的壓印材料層118緊密貼合。在一實施你 中,平面模仁104之材料可選用透光性佳的材料,例如石 英。此外’平面壯1{)4之材料的溶點必須高於主體社損 ⑽上之壓印材料層118的熔點,以利順利的將平面模仁… 上凸設之®案結構1()8的圖案轉印至壓印材料層ιΐ8上。將 圖案結構H)8凸設於平面模仁1〇4之表面122後,可依 200831295 m順利脫離的不沾黏材料,例如氯♦甲烧(叫削a·)。 接下來,提供壓印滾筒116,其中壓印滾筒116較佳可 為透光性佳之圓柱體’且壓印滾筒116之材料的選擇係依據 需求,選擇性地塗佈脫模劑於平面模仁1〇4之表面122上, 其中脫模劑的作用是為了壓印完成脫模時,使平面模仁1〇4 與壓印材料層11 8間保持不沾黏,以確保圖案轉印的完整 性。因此,脫模劑一般為可協助半面模仁1〇4與壓印材料層The imprinted material layer U8 is overlaid on the entire curved surface 1〇6 of the main structure 100. The material of the imprint material layer i i 8 may be, for example, a semiconductor material, a piezoelectric material, a glass material, a ceramic material, a metal or a conductive material. In one embodiment, the imprinting material layer 118 may be, for example, a metal film layer or a polymer material layer such as a photoresist. In a preferred embodiment, the material of the imprint material layer 118 and the body structure are both nickel metal. At this time, the imprinting material layer 118 is wrapped outside the arc surface 106 of the main body structure 100, and is carried by the imprinting stage 1〇2. At the same time, a planar mold core 1 is provided, wherein the planar mold core has an opposite surface 122 and surface 124. The surface of the planar mold core 1 122 4 has a pattern structure 1 〇 8 to be transferred, wherein the pattern structure 1 〇 8 may be a concave-convex structure having a characteristic pattern of a cake size or a nanometer size. Then, the planar mold 7104 is placed on the main structure 1〇〇, and the planar mold is pre-compressed so that the pattern structure on the surface 122 of the planar mold core 104 is 1〇8舆the curved surface of the main body phase 100〇1〇 The layer of imprint material 118 on 6 is in close contact. In one implementation, the material of the planar mold core 104 may be selected from materials having good light transmittance, such as quartz. In addition, the melting point of the material of 'Plane 1{) 4 must be higher than the melting point of the layer 118 of the imprinting material on the main body loss (10), in order to smoothly smooth the planar mold... The structure of the upper convex structure 1 () 8 The pattern is transferred onto the layer of imprint material ι 8 . After the pattern structure H)8 is protruded from the surface 122 of the planar mold core 1〇4, the non-stick material which can be smoothly separated according to 200831295 m, for example, chlorine/yarn (called a·). Next, an impression cylinder 116 is provided, wherein the impression cylinder 116 is preferably a cylinder having good light transmission, and the material of the impression cylinder 116 is selectively selected to apply a release agent to the planar mold core according to requirements. On the surface 122 of 1〇4, the role of the release agent is to keep the flat mold core 1〇4 and the imprint material layer 118 from being adhered when the mold is released for printing, so as to ensure the integrity of the pattern transfer. Sex. Therefore, the release agent is generally used to assist the half-faced mold 1〇4 and the imprinting material layer.
主體結構1〇〇上之壓印材料層U8之間。藉由調整壓印滚筒 116與壓印材料層118之間的距離,使得壓印滚冑ιΐ6、平 面模仁104與壓印材料厣1】X - | +阳上 , 尖f河竹層118二者之間相互擠壓,藉以提供 壓印所需的外加壓力。 所使用之加熱源而定。在一較佳實施例中,係選用準分子霍 射來作為加熱源,因而此時壓印滾筒丨16可選擇高透光性的 石英材料。職’將壓印滾筒116財平的方式架設於平面 模仁104之上,並使壓印滾筒116與平面模仁1〇4之表面 124緊密貼合,此時,平面模仁1〇4夾設在壓印滚筒i 16與 接著,提供加熱源110於壓印滾筒116之上方。在本示 範實施例中,將平面模仁1〇4之圖案結構1〇8的圖案轉印至 主體結構_上之壓印材㈣118_用之微/奈来壓印技 術可為雷射辅助熱壓印技術、電阻式熱壓印技術、或紫外光 壓印技術。因此’加熱源11G可例如為光能式加熱t電阻 式加熱源、渦電流式加熱源'或電磁式加熱源。雖然上述之 實施例中加熱源1U)係設在壓印滾筒116之上方,並透過壓 印滾筒116以及平面模仁104對壓印材料層進行加敎, 然而在其他實施例中加熱源110亦可不經由壓印滾筒;;6 11 200831295 與平面模仁104,而直接對壓印材料層118進行加熱。通常, 對2光能式加熱源而言,較佳係使加熱之光束126穿透壓印 滾同116而使光束126產生聚焦效果,經聚焦後之光束us ,再通過平面模仁104而對壓印材料層118進行加熱作用。因 ,此可依貝際製程需求以及加熱源型式,來調整加熱方式。 凊苓照第2圖,在本發明之一較佳實施例中,加熱源 110採用光能式加熱源,例如雷射,且加熱源11〇所發射出 之光束126的波長介於實質lnm至實質1〇〇μηι之間,並可 _於加熱源110與平面模仁104之間選擇性地架設一組光學鏡 組112(僅繪不其中之一反射透鏡12〇與一聚焦透鏡作 為代表以供說明用),光束126通過光學鏡組112之投射與 聚焦,並經壓印滾筒116做最後聚焦後穿透平面模仁1〇4, 而在平面模仁104下方且與平面模仁1〇4接鱗之壓印材料層 118表面上形成咼能量分布的壓印區,進而使壓印材料層 118之壓印區的表面溫度可瞬間升高至溶點以上。其中,光 學鏡組112可包括數個反射鏡與透鏡,可依實際需求調整光 • 學鏡組U2之組成與各光學鏡之數量。由於平面模仁1〇4 已預壓在壓印材料層11 8上而造成之局部應力集中,因此經 加熱源100加熱後,即可將平面模仁i 〇4上之凸設圖案結構 .108順利地轉印至壓印材料層118上。在一示範實施例中, • 加熱源110較佳可為準分子脈衝雷射。在其他實施例中,加 熱源110可採用雷射波長為氟化氪-248nm(KrF_248nm)、氟 化氬-193nm(ArF-193nm)、氯化氤-308nm(XeCl-308nm)、或 氟化氙-351nm(XeF-351nm)之準分子脈衝雷射,亦可使用連 縯式雷射,例如二氧化碳雷射、鈥釔鋁石榴石(Nd-YAG)雷 12 200831295 射等。 此時’若已完成料材料層118所需之 成滾筒模仁114之製作,而可將壓印完成之滾筒模:114: 壓印載台102上移除。或者,若尚未完成所需之壓 =可依實際製程需求而制料載台叱的自動移動功 與f Μ性’繼續對主體結構_上之壓印材料層118之不 同部分進打圖案壓印。在_較佳實施例中,更可利用一 器(未繪示)來控制壓印載A〗 戟口 102之移動以及啟動加熱源110 以加熱磨:材料層118之步驟,以使兩者能同步運作。 “在貝靶例中’進行滾筒模仁114之製程時,先利用平 面模仁104與加熱源11〇在壓印材料層ιΐ8之第一區的第一 部分上進行壓印。接著,操控壓印載台1〇2使其轉動一單位 角度的距離’此時,由於壓印滚筒116、平面模仁1〇4 :壓:材料層118之間因先前外加之預壓力所形成的摩擦 而▼動主體結構1GG的旋轉,並帶動平面模仁104往y 方向移動’進而移動到下一個定位點,而使平面模仁刚 2壓印材料層118之第一區的第一部分朝Θ方向的第一區 弟—部分接觸。在此同時,再次啟動加熱源1U),例如擊發 準分子雷射,以加熱壓印材料層118之與平面模仁104接觸 的表面,而使平面模仁10 4之圖案結牙冓10 8順利地轉印至壓 印材料層118表面之第一區的第二部分上。重複轉動壓印載 台1〇2使主體結構100㈣方向轉動一單位的距離以及啟動 加熱源110 <步驟,終至完成主體結# H)〇上之壓印材料層 Η 8之第一區的0方向壓印。 …、後可再操控平面模仁104使其朝壓印材料層j j 8 13 200831295 第一區的X方向歩進一單位的距離,而使平面模仁1〇4移動 到壓印材料層118之第二區,並啟動加熱源11〇,以將平面 模仁104之圖案結構108順利地轉印至壓印材料層之與 平面杈仁104接觸之表面的第二區的第一部分上。接下來, 重複轉動主體結構刚使其㈣方向轉動—單位的距離以 及啟動加熱源U0之步驟,終至完成主體結構1〇〇上之壓印 材料層118之第二區的θ方向壓印。 接著’可依實際製程需求,重複移動平面模仁1〇4使其 朝X方向歩進一單位的距離,而使平面模仁104移動到主體 結構H)〇上之壓印材料層118之第二區的下—區,並依昭盘 上述相同之程序進行壓印材料層118之下一區的直寫壓 印。如此依序重複以上步驟終至完成主體結構丨⑽之整個弧 面1〇6上的圖錢印,然後移開主體結構1G0,使主體結構 100與平面模仁104完全脫離,即完成壓印,而可達到連續 的滾輪式壓印之滾筒模仁114的製作。製作完成之滾筒模紅 "I由主體結構1〇〇與貼覆在主體結構1〇〇之弧面上之 經壓印後之壓印材料層u 8所構成。 一曰由上述本發明較佳實施例可知,本發明實施例之一優點 就是因:滾筒模仁的製作係使用表面凸設有特徵圖案結構 之千面模仁,並可搭配自動化壓印載台,因此可達到快速、 大:積、自動化製作滾筒模仁上之奈米結構或圖案的目桿, 相备有利於滾筒模仁的量產。 由上述本發明較佳實施例可知,本發明實施例之另一優 ^是因為滾輪式壓印之滚筒模仁的製作可使用準分子, 士來作為加熱光源,利用準分子雷射之加熱快速特性,可: 14 200831295 幅提升壓印速度。 由上述本發明較佳實施例可知,本發明實施例之又— 點就是因為其係滾輪式直接麼印技術製作滾筒模仁,二 筒模仁在直接壓印的過程形成—體成型模仁,減少滾筒製作、 程序,完成的滾筒模仁表面平順無任何不連續接面, 提升滾筒模仁上圖案的精確。 田 由上述本發明較佳實施例可知,本發明實施例之再— :就是因為其可以耐磨耗材質’例如鎳金屬,來作為製作二 筒模仁的材質,因此可提高滚筒模仁的耐用性。 〜 由上述本發明較佳實施例可知,本發明實施例之再—停 點就是因為滾輪式直接壓印製作滾筒模仁製程可搭配運二 自動化壓印載台,因此可提高滾筒模仁的製作精度與便科Between the imprinting material layers U8 on the main structure 1 . By adjusting the distance between the impression cylinder 116 and the embossing material layer 118, the embossing roll 胄6, the planar dies 104 and the embossing material 厣1]X - | + yang, the tip f river layer 118 Extrusion between each other to provide the applied pressure required for imprinting. Depending on the heating source used. In a preferred embodiment, excimer bombing is used as the heating source, so that the impression cylinder 16 can be selected from a highly transmissive quartz material. The job is to erect the impression cylinder 116 on the flat mold core 104, and the impression cylinder 116 is closely attached to the surface 124 of the plane mold 1 〇 4, at this time, the plane mold 1 〇 4 clip Provided on the impression cylinder i 16 and subsequently, a heat source 110 is provided above the impression cylinder 116. In the exemplary embodiment, the pattern of the pattern structure 1 〇 8 of the planar mold core 1 〇 4 is transferred to the embossed material (4) 118 on the main structure _ the micro/Nan embossing technology can be laser assisted hot pressing Printing technology, resistive hot stamping technology, or UV imprinting technology. Therefore, the heat source 11G can be, for example, a light energy type heating electric resistance source, an eddy current type heat source, or an electromagnetic heat source. Although the heating source 1U) is disposed above the impression cylinder 116 in the above embodiment, and the imprint material layer is twisted through the impression cylinder 116 and the planar mold core 104, in other embodiments, the heating source 110 is also The imprinting material layer 118 can be directly heated without passing through the impression cylinder; 6 11 200831295 with the planar mold core 104. Generally, for a 2 light energy heating source, it is preferred that the heated light beam 126 penetrates the embossing roll 116 to cause the light beam 126 to have a focusing effect, and the focused light beam us is then passed through the planar mold core 104. The embossed material layer 118 is heated. Because of this, the heating method can be adjusted according to the requirements of the process and the type of heating source. Referring to FIG. 2, in a preferred embodiment of the present invention, the heating source 110 uses a light energy heating source, such as a laser, and the wavelength of the light beam 126 emitted by the heating source 11 is substantially from 1 nm to Between 1 〇〇μηι, and a set of optical mirrors 112 can be selectively disposed between the heating source 110 and the planar mold core 104 (only one of the reflective lenses 12 〇 and a focusing lens are represented as representative) For illustrative purposes, the beam 126 is projected and focused by the optical lens assembly 112, and is finally focused by the impression cylinder 116 to penetrate the planar mold core 1〇4, and below the planar mold core 104 and with the planar mold core 1〇 4 The embossed area of the enamel energy distribution is formed on the surface of the embossed material layer 118, so that the surface temperature of the embossed area of the embossed material layer 118 can be instantaneously raised above the melting point. The optical mirror group 112 can include a plurality of mirrors and lenses, and the composition of the optical mirror group U2 and the number of optical mirrors can be adjusted according to actual needs. Since the planar mold core 1〇4 has been pre-stressed on the imprinting material layer 187 to cause local stress concentration, after heating by the heating source 100, the convex pattern structure on the planar mold core i 〇4 can be formed. It is smoothly transferred onto the imprint material layer 118. In an exemplary embodiment, • heating source 110 is preferably an excimer pulsed laser. In other embodiments, the heating source 110 can employ a laser wavelength of cesium fluoride-248 nm (KrF_248 nm), argon fluoride-193 nm (ArF-193 nm), cesium chloride-308 nm (XeCl-308 nm), or cesium fluoride. An excimer pulsed laser of -351 nm (XeF-351 nm) can also be used with a continuous laser such as carbon dioxide laser, yttrium aluminum garnet (Nd-YAG) Ray 12 200831295. At this time, if the preparation of the roller mold core 114 required for the material layer 118 is completed, the embossed roller mold: 114: the imprinting stage 102 can be removed. Alternatively, if the required pressure has not been completed = the automatic movement work of the loading stage can be performed according to the actual process requirements, and the printing of the different portions of the imprinting material layer 118 on the main structure is continued. . In the preferred embodiment, a device (not shown) can be used to control the movement of the imprinting port A and the heating source 110 to heat the grind: material layer 118 to enable the two Synchronous operation. In the process of performing the roller mold core 114 in the shell target, the flat mold core 104 and the heat source 11 are first embossed on the first portion of the first region of the imprint material layer ι 8 . The stage 1〇2 is rotated by a unit angle distance. At this time, due to the friction between the impression cylinder 116 and the planar mold core 1〇4: pressure: the material layer 118 due to the previously applied pre-pressure. The rotation of the main structure 1GG drives the planar mold core 104 to move in the y direction and moves to the next positioning point, so that the first portion of the first portion of the first region of the planar mold layer 2 imprint material layer 118 faces the first direction In the meantime, the heating source 1U) is activated again, for example, by firing a excimer laser to heat the surface of the imprinting material layer 118 in contact with the planar mold core 104, thereby patterning the planar mold core 104. The knot 冓 10 8 is smoothly transferred onto the second portion of the first region of the surface of the embossed material layer 118. The embossing stage 1 〇 2 is repeatedly rotated to rotate the main structure 100 (four) direction by a unit distance and the heating source 110 is activated. <Steps, to complete the main body knot # H)〇 The embossed material layer 压 8 is embossed in the 0 direction of the first region. After that, the planar mold core 104 can be manipulated to make a distance of one unit toward the X direction of the first region of the embossed material layer jj 8 13 200831295. The planar mold core 1〇4 is moved to the second region of the imprinting material layer 118, and the heating source 11〇 is activated to smoothly transfer the pattern structure 108 of the planar mold core 104 to the plane of the imprinting material layer. The first portion of the second region of the surface in contact with the core 104. Next, repeating the rotation of the body structure just in the direction of (iv) rotation - the distance of the unit and the step of starting the heating source U0, to complete the pressure on the main structure 1 The second region of the printed material layer 118 is embossed in the θ direction. Then, according to the actual process requirements, the planar mold core 1重复4 is repeatedly moved to make a unit distance in the X direction, and the planar mold core 104 is moved to the main body. Structure H) the lower region of the second region of the imprinting material layer 118, and the direct embossing of a region below the imprinting material layer 118 is performed according to the same procedure as described above. The above steps are repeated in this order. Finishing the entire surface of the main structure 丨 (10) 1〇6 The figure is printed, and then the main structure 1G0 is removed, so that the main structure 100 and the planar mold core 104 are completely separated, that is, the embossing is completed, and the continuous roller embossing roller mold core 114 can be produced. The red mold "I is composed of a main structure 1 〇〇 and an embossed embossed material layer u 8 attached to the curved surface of the main structure 1 。. One of the above preferred embodiments of the present invention is known. One of the advantages of the embodiment of the present invention is that the drum mold core is manufactured by using a thousand-faced mold with a characteristic pattern structure on the surface, and can be combined with an automatic imprinting stage, thereby achieving fast, large, and automated. The production of a nano-structure or pattern on the drum mold core is advantageous for mass production of the drum mold. It can be seen from the above preferred embodiment of the present invention that another advantage of the embodiment of the present invention is that the roller-imprinted roller mold can be fabricated by using an excimer, which is used as a heating source, and is rapidly heated by a quasi-molecular laser. Features, available: 14 200831295 Increased embossing speed. It can be seen from the above preferred embodiments of the present invention that the embodiment of the present invention is based on the fact that the roller type direct printing technology is used to manufacture the roller mold core, and the two-barrel mold core is formed into a body-molding mold in the process of direct imprinting. Reduce the drum making and program, and finish the smooth surface of the roller mold without any discontinuous joints, and improve the precision of the pattern on the cylinder mold. According to the preferred embodiment of the present invention described above, the embodiment of the present invention is further characterized in that it can be used as a material for making a two-cylinder mold by using a wear-resistant material such as nickel metal, thereby improving the durability of the roller mold. Sex. ~ It can be seen from the above preferred embodiment of the present invention that the re-stop point of the embodiment of the present invention is that the roller type direct imprinting roller mold process can be combined with the second automatic imprinting stage, thereby improving the production of the roller mold core. Precision and convenience
性。 J 雖然本發明已以一較佳實施例揭露如上,然其並非用以 限定本發明,任何在此技術領域中具有通常知識者,在不脫 離本發明之精神和範圍内,當可作各種之更動與潤飾,因此 本發明之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 第1圖係繪不依照本發明一較佳實施例的一種滾 仁製作之裝置示意圖。 ^ 第2圖係繪示依照本發明一較佳實施例的一種滾筒槿 仁製作之光學系統架設示意圖。 、 【主要元件符號說明】 15 200831295 100 :主體結構 104 :平面模仁 108 :圖案結構 . Π2 :光學鏡組 116 :壓印滾筒 120 :反射透鏡 124 :表面 128 :聚焦透鏡 102 : 106 : 110 : 114 : 118 : 122 : 126 壓印載台 5瓜面 加熱源 滾筒模仁 壓印材料層 表面 光束Sex. Although the present invention has been disclosed in a preferred embodiment as described above, it is not intended to limit the invention, and any one of ordinary skill in the art can make various kinds without departing from the spirit and scope of the invention. The scope of protection of the present invention is defined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing a device for manufacturing a roller without according to a preferred embodiment of the present invention. ^ Fig. 2 is a schematic view showing the erection of an optical system for making a roller cylinder according to a preferred embodiment of the present invention. [Major component symbol description] 15 200831295 100: Main structure 104: planar mold core 108: pattern structure. Π2: optical lens group 116: impression cylinder 120: reflective lens 124: surface 128: focusing lens 102: 106: 110: 114 : 118 : 122 : 126 Imprinting stage 5 melon heating source roller mold embossed material layer surface beam
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