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TW200827478A - Raw material for forming thin film and method for producing thin film - Google Patents

Raw material for forming thin film and method for producing thin film Download PDF

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Publication number
TW200827478A
TW200827478A TW096125152A TW96125152A TW200827478A TW 200827478 A TW200827478 A TW 200827478A TW 096125152 A TW096125152 A TW 096125152A TW 96125152 A TW96125152 A TW 96125152A TW 200827478 A TW200827478 A TW 200827478A
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Taiwan
Prior art keywords
zinc
raw material
bis
film
pentane
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TW096125152A
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Chinese (zh)
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TWI439564B (en
Inventor
Naoki Yamada
Atsuya Yoshinaka
Shinichi Tanaka
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Adeka Corp
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/407Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F3/00Compounds containing elements of Groups 2 or 12 of the Periodic Table
    • C07F3/06Zinc compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • C23C16/45525Atomic layer deposition [ALD]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

To provide a raw material suitable for producing a thin film containing zinc, and to provide a method for producing the thin film through a chemical vapor deposition technique using the same. The raw material for forming the thin film is formed of a solution in which bis(pentane-2, 4-dionate) zinc nonhydrate of 0.1 to 1 mol dissolves in an organic solvent containing no hydroxy group of 1,000 ml, as an essential component. The method for producing the thin film comprises the steps of: introducing a vapor containing the bis(pentane-2, 4-dionate) zinc nonhydrate, which has been obtained by vaporizing the raw material for forming the thin film, onto a substrate; and decomposing and/or chemically reacting the vapor to form the thin film containing zinc atoms on the substrate.

Description

200827478 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種含有鋅之薄膜形成用原料,更詳細而 言,本發明係關於-種由下述溶液構成之薄膜形成用原 料、及使用該原料之薄膜之製造方法,該溶液係將雙(戍 二酸根)鋅無水合物莫耳作為必須成分溶解於 有機溶劑1000 ml中。 【先前技術】[Technical Field] The present invention relates to a raw material for forming a film containing zinc, and more particularly, the present invention relates to a raw material for forming a film composed of the following solution, and use thereof A method for producing a film of the raw material, wherein the bis(sebacate) zinc anhydrate complex is dissolved as an essential component in 1000 ml of an organic solvent. [Prior Art]

含有鋅之薄膜因具有光學特性、電氣特性、觸媒活性等 各種特性,故可作為電子零件或光學零件之部件而使用。 作為上述薄膜之製造方法,可列舉火焰堆積法、滅鍛 法、離子電鍍法、塗佈熱解法、或溶膠 (Metai 〇rganic Depositi〇n’有機金屬分解)法及化學氣相 沈積法等’該等方法具有良好的組成控制性、表面覆蓋 性,並適合大量生產’可集成(hybrid integme)等多種優 點,故而’包含ALD (Atomic Layer De—,原子層沈 積)法之化學氣相沈積(以下有時亦簡稱為c v D)法係最佳製 造製程。 二酸 程中 根)辞有水合物及非水合物(無水合物) ’自結晶性及再現性之方面考慮, 於CVD過程中’業者多自穩定性、安全性方面對於作為 前驅體之β_二酮錯合物進行了研究。例如,於專利文獻i 至3中’揭不有使用容易揮發之固體前驅體即雙(戊烧·2,4· 二酸根)鋅之CVD。於專利文獻3中揭示有,雙(戊烧从 ,於薄膜製作過 較好的是1水合 122675.doc 200827478 為'二:=獻有將溶劑為⑽ w 力烷衣戊烷、環己烷、環庚烷、環辛户、β J衣壬燒’作為醇例示有甲醇、乙醇、 70 前驅體例示有譬 及丁酵,作為 有雙(戊烷-2,4-二酸根)鋅,但對於 二酸根⑽液並無具體說明。於非專 (=,4_ 二(戍坑从二酸根)鋅之二乙二醇單甲鍵溶液作為原料之 又,於專利文獻5中揭示#25t之液體之雙(β•二於 根)鋅即雙(辛院·2,4-二酸根)辞、及雙(2,2·二甲基‘二 癸烷-3,5-二酸根)鋅。 土 雙(戊院·2,4·二酸根)辞係,無水合物之炼點為13(rc左 右、水合物之熔點為!抓左右之高溶點固體;於需要 CVD等氣化工程之製程中,存在伴隨昇華而揮發時揮發量 不足的問題’以及揮發量之經時變化等原料氣體供給^上 存在問題。使用溶液CVD等及M〇D法等之溶液之製程中有 下述問題:以適合使用之濃度,無法得到於溶液原料中不 存在固相之溶液。脂肪族煙系溶劑有無法賦予充分溶解性 之情形,醇系溶劑因雙(戊烷_2,4_二酸根)鋅與醇之羥基之 反應’而存在前驅體變質之問題。專利文獻5中揭示之液 體的雙(β-二酸根)辞因亦具有充分之可溶解性,故可避免 上述問題’但前驅體自身之揮發性不一定可避免上述變質 之問題。 [專利文獻1]曰本專利特公平6-64738號公報(尤其是[請 求項9]) 122675.doc 200827478 [專利文獻2]曰本專利特開2003-236376號公報(尤其是 [實施例]) [專利文獻3]曰本專利特開2003-3 1846號公報(尤其是段 落[0015]、[0016]) [專利文獻4]曰本專利特開2005-298874號公報(尤其是 [請求項1]、段落[0012]) [專利文獻5]曰本專利特開2005-350423號公報(尤其是 [請求項1]至[請求項6]) [非專利文獻 1] NREL/SR-520-3179 December 2001(尤其 是3頁) 【發明内容】 [發明所欲解決之問題] 本發明之目的係提供一種較好地適用於製造含鋅之薄膜 的原料、及使用該原料並利用化學氣相沈積法之薄膜的製 造方法。 [解決問題之技術手段] 本發明者們經過認真討論後,得出以下結論:將特定之 有機溶劑作為溶劑之雙(戊烷_2,4-二酮)鋅無水合物之溶液 具有高濃度且表現出良好的穩定性,從而可達成本發明。 亦即,本發明提供一種由下述溶液組成之薄膜形成用原 料以達成上述目的,該溶液係將雙(戊烷·2,4_二酸根)鋅無 水合物0.1〜1莫耳作為必須成分溶解於不具有羥基之有機 溶劑1000 ml中而獲得。 又,本發明藉由提供一種薄膜製造方法以達成上述目 122675.doc 200827478 的,該方法係將上述薄膜形成用 有雙(戊烧·2,4_二酸根 、並將獲得之含 該含有雙(戊尸24 U 口物之^導入基體上’將 凡,·一酸根)鋅無水合物之基汽分解 行化學反應,並於基艘上形成含有鋅原子:;解及/或進 [發明之效果] Μ于之4膜 的ίί:之:膜形成用原料’因具有高濃度且表現出良好 揮發性声好賦予生產性良好之薄膜製造製程。又,因 ^良好,故作為伴隨CVD等之氣化的製程的原料尤盆 且有光ίΓ利用本發明之薄膜形成用原料所製造之薄臈 地作為電子零件或光學零件之料。 有效 【實施方式】 2發明之薄膜形成用原料係將雙(戊烧_2,4-二酸根)鋅無 口物作為薄膜之前驅體,並將該雙(戊燒_2,4_二酸根)辞 =水合物料必須成分溶解於不具有㈣之有機溶劑中所 侍。其特徵為’因鋅前驅體充分溶解,故可給出生產性良 好之薄膜製造製程’並且,因揮發性良好,故作為伴隨 eVD等之氣化之製程的原料尤其有效。 通^,可自市場獲得之雙(戊烷_2,4_二酸根)鋅係水合 物、或水合物與無水合物之混合物,關於水合物,已知有 1水合物。化合水之有無可根據IR分析中化合水之吸收而 確5忍。試著將該雙(戊燒_2,4-二酸根)鋅投入各種有機溶劑 中進仃溶解,則會產生懸浮液及溶解殘餘物。懸浮及溶解 殘餘物難以完全去除,故無法自含有水合物之雙(戊烷_ 122675.doc 200827478 ’4 一魷根)鋅獲得具有充分濃度之不存在固相之溶液。 再者作為本發明之必須成分的雙(戊烷_2,4-二酸根)辞 …'水口物之製造方法並無特別限制,可使用周知之一般方 法。例如:於已排除水之非水系環境中,使鹵化鋅(IU匕 鋅氯化鋅、溴化鋅、碘化辞)、硫酸鋅、硝酸鋅等無機 辞鹽賤存在下與戊烧二酮發生反應之方法;於^水 系%&中’使無機鋅鹽與戊烧·2,4_:酸納、戊烧_2,4-二酸 卸戊烧-2,4-一酸鐘等驗金屬錯合物發生反應之方法;於 非水系環境中,使二甲氧基辞、二乙氧基辞等烧氧化物與 ’4 一酮發生反應之方法;於非水系之環境中,雙 (乙胺基)鋅、雙(丙胺基)鋅等之鋅的醯胺與戊烧·2,4·二酮 發生反應之方法等直接製造無水合物的方法;以及將水 作為溶劑,並將無機鋅或無機舞之水合物與戍院n 於虱氧化㈣驗之存在下進行反應等而獲得之去除驗雙 二戊烷_2,4:二酸根)鋅水合物之化合水的方法。作為去除化 ^之方法’可列舉使用脫水劑之方法、藉由加熱及減塵 去除水之方法、及將該等2種方法以上加以組合之方 水合物中去除化合水而獲得無水合物之情形時’ 包:= 且穩定之溶液即薄膜形成用原料,作為雜質而 、又(、烷·2,4·二酸根)鋅水合物,換 較好的是1莫耳%以下,更好的是0.3莫耳%以下'。 之㈣造^中’將溶解固體前驅體所得 對於= 驅體而使用之情形時,固體前驅體相 、〜須要具有充分之溶解性。若溶解性較低,則無法 122675.doc 200827478 得到充分之成膜速度及溶解容限,且因濃度變化及部分有 機各劑之稀釋等,故容易產生固體析出,並引起成膜速度 之經時變化、膜質之劣化。Since the film containing zinc has various characteristics such as optical characteristics, electrical characteristics, and catalytic activity, it can be used as a component of an electronic component or an optical component. Examples of the method for producing the film include a flame deposition method, a forging method, an ion plating method, a coating pyrolysis method, a sol (Metai 〇rganic Depositi〇n'organometallic decomposition) method, and a chemical vapor deposition method. The method has good composition controllability, surface coverage, and is suitable for mass production of 'hybrid integme' and other advantages, so 'chemical vapor deposition by ALD (Atomic Layer De-, Atomic Layer Deposition) method (below) Sometimes referred to as cv D) the best manufacturing process in the legal system. The diacid process has a hydrate and a non-hydrate (anhydrate). From the viewpoint of self-crystallinity and reproducibility, in the CVD process, the industry has multiple self-stability and safety, and β_ as a precursor. Diketone complexes were studied. For example, in Patent Documents i to 3, there is no CVD in which a solid precursor which is easily volatilized, that is, bis(pentane-s, 2,4-dicarboxylate) zinc is used. It is disclosed in Patent Document 3 that bis (e.g., the film is preferably produced in the form of 1 hydrate 122675.doc 200827478 is 'two:= the solvent is (10) w alkane pentane, cyclohexane, Cycloheptane, cyclooxygen, and βJ 壬 壬 ' as an alcohol, exemplified by methanol, ethanol, 70 precursors, such as hydrazine and butyl, as bis (pentane-2,4-diacid) zinc, but for The diacid (10) liquid is not specifically described. In addition to the non-special (=, 4_2 (戍 pit from diacid) zinc diethylene glycol monomethyl bond solution as a raw material, Patent Document 5 discloses a liquid of #25t Double (β•二于根) zinc is double (Xinyuan·2,4-diacid) and bis(2,2·dimethyl 'dioxane-3,5-diacid) zinc. (Essence of 2,4 · diacid), the refining point of anhydrate is 13 (circle rc, the melting point of hydrate is! The high melting point solid is grasped; in the process of gasification engineering such as CVD There is a problem in the supply of the raw material gas such as the problem that the amount of volatilization is insufficient when volatilization occurs with sublimation, and the change in the amount of volatilization. The use of solutions such as solution CVD and M〇D method is used. There is a problem in that a solution in which a solid phase does not exist in a solution raw material cannot be obtained at a concentration suitable for use. An aliphatic flue solvent does not provide sufficient solubility, and an alcohol solvent is due to bis(pentane-2, There is a problem that the precursor is deteriorated by the reaction of 4_diacid) zinc with the hydroxyl group of the alcohol. The bis (β-diacid) cause of the liquid disclosed in Patent Document 5 also has sufficient solubility, so the above can be avoided. The problem is that the volatility of the precursor itself does not necessarily avoid the problem of the above deterioration. [Patent Document 1] Japanese Patent Publication No. Hei 6-64738 (especially [Request Item 9]) 122675.doc 200827478 [Patent Document 2 Japanese Laid-Open Patent Publication No. 2003-236376 (especially [Embodiment]) [Patent Document 3] Japanese Patent Laid-Open No. 2003-3 1846 (especially paragraphs [0015], [0016]) [Patent Literature 4] Japanese Patent Laid-Open Publication No. 2005-298874 (especially [Request Item 1], paragraph [0012]) [Patent Document 5] Japanese Patent Laid-Open No. 2005-350423 (especially [Request Item 1] to [Request Item 6]) [Non-Patent Document 1] NREL/SR-520-3179 December 2001 (especially [Survey of the Invention] [Problems to be Solved by the Invention] An object of the present invention is to provide a raw material which is preferably used for producing a film containing zinc, and a film which is produced by using the chemical vapor deposition method using the raw material. [Technical means for solving the problem] After careful discussion, the present inventors came to the conclusion that a solution of bis(pentane-2,4-dione)zinc anhydrate having a specific organic solvent as a solvent has It has a high concentration and exhibits good stability, so that it can reach the cost of the invention. That is, the present invention provides a raw material for film formation comprising a solution of bis(pentane·2,4-diate) zinc anhydrate 0.1 to 1 mol as an essential component. It is obtained by dissolving in 1000 ml of an organic solvent which does not have a hydroxyl group. Further, the present invention provides a method for producing a film to achieve the above-mentioned object 122675.doc 200827478, which is obtained by forming a film of the above-mentioned film with bis(pentene-2,4-diacid) and obtaining the containing double (The pentium 24 U mouth of the ^ introduced into the substrate 'will be, · one acid base) zinc anhydrate decomposition of the base of the chemical reaction, and formed on the base boat containing zinc atoms:; solution and / or advance [invention效果 4 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜 膜In the gasification process, the raw material produced by the raw material for film formation of the present invention is used as an electronic component or an optical component. [Embodiment] The raw material for film formation of the invention will be Bis(pentazone-2,4-diacid) zinc no-mouth as a film precursor, and the bis(pentane-2,4-diacidate) = hydrated material essential component is dissolved in the organic solvent without (4) Served in the middle. It is characterized by 'zinc precursor charging By dissolving, it is possible to give a film manufacturing process with good productivity' and, because of its good volatility, it is particularly effective as a raw material for a process that is accompanied by gasification of eVD, etc. ^, a bis (pentane) which can be obtained from the market a 2,4-diacid)zinc hydrate or a mixture of a hydrate and an anhydrate, and a hydrate is known for a hydrate. The presence or absence of the combined water can be determined according to the absorption of the combined water in the IR analysis. Trying to put the bis(pentazone-2,4-diacidate) zinc into various organic solvents and dissolve it, it will produce a suspension and dissolved residue. The suspension and dissolved residue are difficult to completely remove, so it cannot be self-contained. The hydrate bis (pentane _ 122675.doc 200827478 '4 鱿 root) zinc obtains a solution having a sufficient concentration of the solid phase in the absence of the solid phase. Further, as an essential component of the present invention, bis(pentane-2,4-di) The method of manufacturing the squid is not particularly limited, and a well-known general method can be used. For example, in a non-aqueous environment in which water has been removed, zinc halide (IU 匕 zinc zinc chloride, zinc bromide, iodine) is used. Chemical, zinc sulfate, zinc nitrate, etc. The method of reacting with pentanedione in the presence of salt hydrazine; in the water system %& in the 'inorganic zinc salt and pentane 2,4_: sodium sulphate, pentane 2,4-diacid -2,4-acid clock, etc. method for reacting a metal complex; in a non-aqueous environment, a method of reacting a dimethoxy group, a diethoxy group, etc. with a '4 ketone A method for directly producing an anhydrate without reacting a guanamine such as bis(ethylamino)zinc or bis(propylamino)zinc with a pentane bromide 2,4·dione in a non-aqueous environment And removing water by using water as a solvent and reacting the inorganic zinc or inorganic dance hydrate with the brothel n in the presence of ruthenium oxidation (4), and removing the di-dipentane 2,4:diacid) zinc A method of combining water with hydrates. As a method of removing the chemical, a method of using a dehydrating agent, a method of removing water by heating and dust reduction, and a method of removing the combined water from a square hydrate in which the two methods are combined or more are used to obtain an anhydrate. In the case of a package: = and the stable solution is a raw material for film formation, and as an impurity, (, alkane 2,4 · diacidate) zinc hydrate, preferably 1 mol% or less, more preferably It is 0.3% or less below. (4) In the case where the solid precursor is dissolved, the solid precursor phase and the solid precursor phase must have sufficient solubility. If the solubility is low, sufficient film formation speed and dissolution tolerance can not be obtained, and the concentration of the organic component and the dilution of some organic agents are likely to cause solid precipitation and cause the film formation speed to elapse. Change, deterioration of membranous quality.

因此,本發明之薄膜形成用原料係,使用不具有羥基之 有機溶劑作為上述溶劑,於該有機溶劑1〇〇〇 ml中,溶解 又(戊烷-2,4-二酸根)鋅無水合物〇. hi莫耳,較好的是 〇.2〜1莫耳。當雙(戊烷_2,4·二酸根)鋅無水合物小於0.1莫 耳:’則無法得到充分之生產性,而當其大於!莫耳時, 自溶解度上限開始,溶解容限變小,有可能產生固 出〇 作為賦予本發明之薄膜形成用原料所使用之上述濃度的 不具有备基之有機溶劑,可列舉酮系化合物、醚系化合 =、西旨系化合物、芳香族系化合物、或具有氣基之煙系化 合物’該等有機溶劑可單獨使用,亦可混合2種以上進行 作為上述酮系化合物可列舉丙酮、甲基乙基酮、甲基丁 基酮、甲基異丁基酮、乙基丁基酮、二丙基酮、二異丁基 酮、甲基戊基酮、環己酮、甲基環己酮等。 作為上述醚系化合物,可列舉四氫吱喃、四氫吼喃、嗎 啉、,乙—醇二甲基醚、i乙二醇二甲基醚、三乙二醇二甲 基醚、二丁醚、二乙醚、二噁烷等。 J乍為上述酯系化合物可列舉:甲酸甲酯、甲酸乙酯、乙 酸甲酷、乙酸乙醋、乙酸異丙醋、乙酸丁醋、乙酸異丁 醋、乙酸第二丁酯、乙酸第三丁酯、乙酸戊酯、乙酸異戊 122675.doc -11- 200827478 酯、乙酸第三戊_、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙 酸異丙s曰、丙酸丁 _、丙酸異丁酯、丙酸第二丁酯、丙酸 第二丁醋、丙酸戊酯、丙酸異戊酯、丙酸第三戊酯、丙酸 苯醋、礼酸甲s旨、乳酸乙酯、甲氧基丙酸甲酯、乙氧基丙 酸甲醋、甲氧基丙酸乙酯、乙氧基丙酸乙酯、乙二醇單甲 鍵乙酸自曰、二乙二醇單曱醚乙酸酯、乙二醇單乙醚乙酸 醋、乙一醇單丙醚乙酸酯、乙二醇單異丙醚乙酸酯、乙二 醇單丁鱗乙酸_、乙二醇單第二丁醚乙酸酯、乙二醇單異 丁謎乙酸醋、乙二醇單第三丁醚乙酸酯、丙二醇單甲醚乙 酸酉曰、丙一醇單乙醚乙酸酯、丙二醇單丙醚乙酸酯、丙二 醇單異丙醚乙酸酯、丙二醇單丁醚乙酸酯、丙二醇單第二 丁鍵乙酸醋、丙二醇單異丁醚乙酸酯、丙二醇單第三丁醚 乙酸g曰、丁二醇單甲醚乙酸酯、丁二醇單乙醚乙酸酯、丁 一醇單丙醚乙酸酯、丁二醇單異丙醚乙酸酯、丁二醇單丁 醚乙酸酯、丁二醇單第二丁醚乙酸酯、丁二醇單異丁醚乙 酸酯、丁二醇單第三丁醚乙酸酯、乙醯乙酸甲酯、乙醯乙 酉文乙S曰乳代丁酸甲醋、氧代丁酸乙醋、γ-内醋、内酉旨 等。 作為上述芳香族系化合物可列舉苯、甲苯、乙基苯、二 甲苯、均三甲苯、二乙基苯、異丙基苯、異丁基苯、異丙 基曱苯、四氫化萘、苯甲醚。 作為上述具有氰基之烴系化合物,可列舉1-氰基丙院、 1-氰基丁烷、1-氰基己烷、氰基環己烷、氰基苯、 氰基丙烷、丨,‘二氰基丁烷、l,6-二氰基己烷、丨,4_二氰基 122675.doc -12- 200827478 環己烷、1,4-二氰基苯等 作為上述不且右 之溶解性及“ 溶劑,自靖予較佳濃度範圍 合物或若夭 面考慮’更好的是醚系化合物、醋系化 二物h香族系化合物。又.,更好的 機溶劑於大氣r訂彿點為㈣贼。八有』之有 本發明之薄艇^上、 含有雙(戊燒24原料,根據製造之薄膜之組成亦可 i蚀田旦 ,-一酸根)鋅無水合物以外之薄膜前驅體, 里根據所期望之薄膜組成而設定。Therefore, the raw material for film formation of the present invention uses an organic solvent having no hydroxyl group as the above solvent, and dissolves (pentane-2,4-diacid) zinc anhydrate in 1 〇〇〇ml of the organic solvent. 〇. hi Moer, it is better to 〇. 2~1 Mo Er. When bis(pentane-2,4-diate) zinc anhydrate is less than 0.1 mol: ', sufficient productivity cannot be obtained, and when it is larger than !mol, the solubility limit becomes smaller from the upper limit of solubility. There is a possibility that the organic solvent having no reserve at the above-mentioned concentration used for the raw material for forming a film of the present invention is produced, and examples thereof include a ketone compound, an ether compound, an anthracene compound, and an aromatic compound. The organic solvent may be used alone or in combination of two or more. Examples of the ketone compound include acetone, methyl ethyl ketone, methyl butyl ketone, and methyl butyl ketone. Ketone, ethyl butyl ketone, dipropyl ketone, diisobutyl ketone, methyl amyl ketone, cyclohexanone, methyl cyclohexanone and the like. Examples of the ether compound include tetrahydrofuran, tetrahydrofuran, morpholine, ethyl alcohol dimethyl ether, i ethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and dibutyl. Ether, diethyl ether, dioxane, and the like. J乍 is the above ester compound, and examples thereof include methyl formate, ethyl formate, methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate, isobutyl acetonate, second butyl acetate, and third acetic acid. Ester, amyl acetate, isoamyl acetate 122675.doc -11- 200827478 ester, acetic acid third pentyl, phenyl acetate, methyl propionate, ethyl propionate, isopropyl sulfonate propionate, butyl phthalate Isobutyl propionate, second butyl propionate, second butyl vinegar, amyl propionate, isoamyl propionate, third amyl propionate, phenyl vinegar propionate, lactic acid, lactic acid Ethyl ester, methyl methoxypropionate, methyl acetoacetate, ethyl methoxypropionate, ethyl ethoxy propionate, ethylene glycol monomethyl acetate, bismuth ethylene glycol Ethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monopropyl ether acetate, ethylene glycol monoisopropyl ether acetate, ethylene glycol monobutyl sulphate acetic acid, ethylene glycol single second Ether acetate, ethylene glycol monoisobutyl acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propanol monoethyl ether acetate, propylene glycol monopropyl ether acetate ester Propylene glycol monoisopropyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol single second butyl acetate, propylene glycol monoisobutyl ether acetate, propylene glycol monobutyl ether acetate g曰, butanediol monomethyl Ether acetate, butanediol monoethyl ether acetate, butanol monopropyl ether acetate, butanediol monoisopropyl ether acetate, butanediol monobutyl ether acetate, butanediol single Dibutyl ether acetate, butanediol monoisobutyl ether acetate, butanediol mono-tert-butyl acetate, methyl acetate, ethyl acetate, ethyl sulphate, butyrate Oxygen butyrate ethyl vinegar, γ-endo vinegar, internal sputum, etc. Examples of the aromatic compound include benzene, toluene, ethylbenzene, xylene, mesitylene, diethylbenzene, cumene, isobutylbenzene, isopropyl benzene, tetrahydronaphthalene, and benzene. ether. Examples of the hydrocarbon compound having a cyano group include 1-cyanopropyl, 1-cyanobutane, 1-cyanohexane, cyanocyclohexane, cyanobenzene, cyanopropane, and hydrazine. Dicyanobutane, 1,6-dicyanohexane, hydrazine, 4-dicyano 122675.doc -12- 200827478 cyclohexane, 1,4-dicyanobenzene, etc. as the above-mentioned not dissolved Sex and "solvent, self-contained to a preferred concentration range or if the surface is considered" better ether compound, vinegar two-component h-fragrance compound. Also, better machine solvent in the atmosphere r The order of the Buddha is (four) thief. Eight has the thin boat of the present invention, containing double (the raw material of the sulphur 24, according to the composition of the film produced can also be etched, the monoacid) zinc anhydrate The film precursor is set according to the desired film composition.

例如,存為LV T ^ , 隹乂下方法:由CVD而製造含有多成 辛 薄膜:情形時’將多成分薄膜前驅體以各成分獨立之方式 :仃虱化:供給之方法(以下稱為單-來源法),及將多成 刀之薄膜_驅體以預期之組成進行混合後獲得混合原料, 原料氣化、供給之方法(以下稱為複合來源法); :為複合來源之情形時,本發明之薄膜形成用原料則成為 、一 ’ ^根)鋅無水物與其它薄膜前驅體之混合溶 液0 關於上述之情形時所使用之鋅無水物以外之薄膜前驅 體’並無特別限制,可使用CVD用原料中周知之—般的前 驅體。 列舉鎮、約、銷 作為上述前驅體,可列舉醇化合物及/或二醇化合物及/ 或β - _及/或環戊二烯化合物、有機胺化合物等之一種或 一種以上之有機配位化合物與金屬之化合物、烷基金屬化 合物、芳基金屬化合物等。又,作為前驅體之金屬種類可 鋇、鈦、锆、铪、釩、鈮、鈕、錳、 122675.doc -13- 200827478 鐵、釘、鈷、鍺、銥、鎳、鈀、白金、銅、銀、金、鎵、 銦、鍺、錫、鉛、銻、鉍、矽、釔、鑭、鈽、镨、歛、 鈑、彭、銪、此、轼、鏑、鈥、铒、録、鏡。 作為上述有機配位基而使用之醇化合物,可列舉甲醇、 乙醇、丙醇、異丙醇、丁醇、2-丁醇、異丁醇、第三丁 醇、戊醇、異戊醇、第三戊醇等烷基醇類;2_甲氧基乙 醇、2-乙氧基乙醇、2_丁氧基乙醇、2·(2_甲氧基乙氧基)乙 醇、2-甲氧基甲基乙醇、2_甲氧基二甲基乙醇、孓 乙氧基-1,1-二甲基乙醇、2_異丙氧基二甲基乙醇、2· 丁氧基-1,1-二甲基乙醇、2-(2•甲氧基乙氧基卜丨,^二甲基 乙醇、2-丙氧基二乙基乙醇、第二丁氧基二乙 基乙醇、甲氧基-u-二甲基丙醇等醚醇類;給予本發明 之煙氧基金屬化合物的二烷基胺醇。 作為上述有機配位基而使用之乙二醇化合物,可列舉 1,2_ 乙二醇、L2-丙二醇、1,3-丙二醇、2,4-己二醇、2,2_ 甲基1,3-丙一醇、2,2 -二乙基_1,3_丙二醇、ι,3 -丁二 醇 丁 一醇、2,2,二乙基-1,3-丁 二醇、2-乙基·2_ 丁基· ’丙一醇、2,4_戊二醇、2-甲基- ΐ,3 -丙二醇、2_甲基-2,4· 戊一醇、2,4-己二醇、2,4-二甲基_2,4·戊二醇。 作為上述有機配位基而使用之β-二酮化合物,可列舉乙 血丙酮、己燒·2,4_二酮、5_甲基己烧-2,4-二酮、庚燒_2,4、 同甲基庚烧-3,5·二酮、5 -甲基庚烧-2,4-二酮、6 -甲 庚燒2,4- 一 _、2,2-二甲基庚烧- 3,5·二酮、2,6-二甲基 庚烷_3,5_二酉同、2,2,6-三甲基庚烷-3,5-二酮、2,2,6,6-四甲 122675.doc -14- 200827478 基庚烷-3,5-二酮、辛烷-2,4-二酮、2,2,6_三甲基辛烷-3,5· 二酮、2,6-二甲基辛烷-3,5-二酮、2,9-二甲基壬烷-4,6-二 酮,2-甲基-6-乙基癸烷,5-二酮、2,2-二甲基-6-乙基癸 烧-3,5-二酮等烧基取代0-二酮類;1,1,1-三貌戊烧-2,4-二 酮、1,1,1-三氟-5,5-二曱基己烷-2,4-二酮、1,1,1,5,5,5-六 氟戊烧-2,4-二酮、1,3-二全氟己基丙烧-1,3-二酮等氟素取 代烧基0_二酮類;1,1,5,5-四甲基-1-甲氧基己烧-2,4-二 酮、2,2,6,6-四甲基-1-甲氧基庚烷-3,5-二酮、2,2,6,6-四甲 基-1-(2-甲氧基乙氧基)庚烷-3,5-二酮等醚取代β-二酮類。 作為上述有機配位基而使用之環戊二烯化合物,可列舉 環戊二稀、甲基環戊二烯、乙基環戊二烯、丙基環戊二 烯、異丙基環戊二烯、丁基環戊二稀、第二丁基環戊二 烯、異丁基環戊二烯、第三丁基環戊二烯、二甲基環戊二 烯、四甲基環戊二烯等,作為有機配位基而使用之有機胺 化合物可列舉甲基胺、乙基胺、丙基胺、異丙基胺、丁基 胺、第二丁基胺、第三丁基胺、異丁基胺、二甲基胺、二 乙基胺、二丙基胺、二異丙基胺、乙基甲基胺、丙基甲基 胺、異丙基甲基胺尊,作為烷基金屬化合物之烷基可列舉 甲基、乙基、丙基、異丙基、丁基、第二丁基、第三丁 基、異丁基、戊基、第三戊基、異戊基等,作為芳基金屬 之芳基可列舉苯基、甲基苯基、二甲基苯基、乙基苯基 等。 土 本發明之薄膜形成用原料儘量不具有構成該膜形成用原 料之前驅體成分以外的雜f金屬元素成分、雜冑氯等雜質 122675.doc -15- 200827478 i素、及雜質有機成分。雜質金屬元素分較好的是,於每 個元素中有100 ppb以下,更好的是1〇 ppb以下。較好的是 於總量中有1 ppm以下,更好的是1GG ppb以下。雜質函素 成分較好的是loo ppm以下,更好的是1〇 ppm以下,進而 更好的疋1 ppm以下。雜質有機分較好的是於總量中有5〇〇 ppm以下或50 ppm以下,更好的是1〇沖顶以下。又,作為 CVD原料❿使用之情形時,因水分會導致使用雙(戊烧_For example, it is stored as LV T ^ , the underarm method: manufacturing a film containing a plurality of symplectic films by CVD: in the case of a multi-component film precursor in a manner independent of each component: deuteration: a method of supply (hereinafter referred to as Single-source method), and a method in which a plurality of knives are mixed with a desired composition to obtain a mixed raw material, a raw material is vaporized and supplied (hereinafter referred to as a composite source method); The raw material for forming a film of the present invention is a mixed solution of a zinc anhydrate and another film precursor. The film precursor other than the zinc anhydrate used in the above case is not particularly limited. A well-known precursor which is well known in the raw materials for CVD can be used. Examples of the precursor, the above-mentioned precursors include one or more organic complex compounds such as an alcohol compound and/or a diol compound and/or a β-- and/or a cyclopentadiene compound or an organic amine compound. A compound with a metal, an alkyl metal compound, an aryl metal compound, or the like. Moreover, the metal species as the precursor may be niobium, titanium, zirconium, hafnium, vanadium, niobium, niobium, manganese, 122675.doc -13- 200827478 iron, nail, cobalt, ruthenium, rhodium, nickel, palladium, platinum, copper, Silver, gold, gallium, indium, antimony, tin, lead, antimony, bismuth, antimony, antimony, bismuth, antimony, bismuth, convergent, 钣, Peng, 铕, this, 轼, 镝, 鈥, 铒, recorded, mirror. Examples of the alcohol compound used as the organic ligand include methanol, ethanol, propanol, isopropanol, butanol, 2-butanol, isobutanol, tert-butanol, pentanol, isoamyl alcohol, and Alkyl alcohols such as triamyl alcohol; 2-methoxyethanol, 2-ethoxyethanol, 2-butoxyethanol, 2·(2-methoxyethoxy)ethanol, 2-methoxymethyl Ethanol, 2-methoxycarbonylethanol, decyloxy-1,1-dimethylethanol, 2-isopropyloxydimethylethanol, 2·butoxy-1,1-dimethyl Ethanol, 2-(2. methoxyethoxydipin, ^dimethylethanol, 2-propoxydiethylethanol, second butoxydiethylethanol, methoxy-u-di An ether alcohol such as methyl propanol; a dialkylamine alcohol to which a nicotinyl metal compound of the present invention is administered. Examples of the ethylene glycol compound used as the above organic ligand include 1,2_ethylene glycol and L2- Propylene glycol, 1,3-propanediol, 2,4-hexanediol, 2,2-methyl1,3-propanol, 2,2-diethyl-1,3-propanediol, iota, 3-butanediol Butanol, 2,2, diethyl-1,3-butanediol, 2-ethyl-2-butylene, 'propanol, 2,4-pentanediol , 2-methyl-hydrazine, 3-propanediol, 2-methyl-2,4·pentanol, 2,4-hexanediol, 2,4-dimethyl-2,4·pentanediol. Examples of the β-diketone compound used in the above organic ligand include acetyl blood acetone, hexanone-2,4-dione, 5-methylhexan-2,4-dione, and gypsum-2,4. , with methyl heptane-3,5·dione, 5-methylheptane-2,4-dione, 6-methylheptane 2,4-mono-, 2,2-dimethylheptane- 3,5·dione, 2,6-dimethylheptane_3,5-dioxa, 2,2,6-trimethylheptane-3,5-dione, 2,2,6, 6-四甲122675.doc -14- 200827478 hexeptane-3,5-dione, octane-2,4-dione, 2,2,6-trimethyloctane-3,5·dione 2,6-Dimethyloctane-3,5-dione, 2,9-dimethyldecane-4,6-dione, 2-methyl-6-ethyldecane, 5-di Ketone, 2,2-dimethyl-6-ethyloxime-3,5-dione, etc., substituted 0-diketones; 1,1,1-trimorphic pentane-2,4-dione 1,1,1-Trifluoro-5,5-dimercaptohexane-2,4-dione, 1,1,1,5,5,5-hexafluoropentane-2,4-dione , 1,3-diperfluorohexylpropane-1,3-dione and other fluorocarbon substituted alkyl 0-diketones; 1,1,5,5-tetramethyl-1-methoxyhexanone- 2,4-two , 2,2,6,6-tetramethyl-1-methoxyheptane-3,5-dione, 2,2,6,6-tetramethyl-1-(2-methoxyethoxy The β-diketone is substituted with an ether such as heptane-3,5-dione. Examples of the cyclopentadiene compound used as the above organic ligand include cyclopentadiene, methylcyclopentadiene, and B. Cyclopentadiene, propylcyclopentadiene, isopropylcyclopentadiene, butylcyclopentadiene, second butylcyclopentadiene, isobutylcyclopentadiene, tert-butyl ring Examples of the organic amine compound used as an organic ligand for pentadiene, dimethylcyclopentadiene, tetramethylcyclopentadiene, etc., may be exemplified by methylamine, ethylamine, propylamine, isopropylamine. , butylamine, second butylamine, tert-butylamine, isobutylamine, dimethylamine, diethylamine, dipropylamine, diisopropylamine, ethylmethylamine, C Methylamine, isopropylmethylamine, and the alkyl group as the alkyl metal compound may, for example, be a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a second butyl group, a third butyl group or a different group. Butyl, pentyl, third pentyl, isopentyl, etc., as the aryl group of the aryl metal, phenyl, A Phenyl, dimethylphenyl, ethylphenyl and the like. The raw material for forming a film of the present invention does not have impurities such as a hetero atom metal component other than the precursor component of the film forming material, and impurities such as ruthenium chloride, and the organic component of the impurity. The impurity metal element component is preferably 100 ppb or less, more preferably 1 Å ppb or less per element. It is preferably 1 ppm or less in the total amount, more preferably 1 GG ppb or less. The impurity element component is preferably loo ppm or less, more preferably 1 〇 ppm or less, and further preferably 疋 1 ppm or less. The impurity organic component is preferably 5 〇〇 ppm or less or 50 ppm or less in the total amount, more preferably 1 〇 or less. In addition, when it is used as a CVD raw material, it will cause the use of double (eating)

2,4-二酸根)辞之水合物之⑽原料中產生顆粒或使用咖 ,時產生顆粒,故較佳為預先儘量去除所有的水分。水分 量較好的是1GG ppm以下,更好的是1G ppm以下,進而更 好的是1 ppm以下。 又’本發明之薄膜形成用原料,為減少或防止製造之薄 膜之顆粒受污染,而在使用液相之光散射式液中粒子檢測 器進行顆粒測定過程中’較好的是,大於0.3㈣之粒子數 量為1〇0個以下,更好的是,於液相⑽大於〇.2 _之粒 子數量為1G00個以下,進而更好的是,於液相i⑷中大於 〇·2 μιη之粒子數量為1〇〇個以下。 本發明之薄狀製造方法係,將本發日狀薄膜形成用原 枓、及根據須要而使用之其它前驅體氣化,並將氣化後所 得之蒸汽、及根據需要而使用之反應性氣體導入至基板 上’然後’於基板上將前驅體進行分解及/或化學反應, 並使用CVD法使薄膜於基板上進行沈積、堆積而獲得杨 明之薄膜。原料之輸送供給方法、堆積方法、製造條件、 製造裝置等均無特別限制’可使用周知之一般條件、方 122675.doc -16- 200827478 法。 作為根據上述需要而使用之反應性氣體,例如 物可列舉氧、臭、氧、-®於务 邗馬乳化 ρ 心—虱化虱、一魏氮、水蒸氣、過氧 虱、甲酸、乙酸、無水乙酸等’作為還原物可列舉氯, ^作為製造氣化物者可列舉單烧基胺、二燒基胺、=基 胺n胺等有機胺化合物,#、氨等,作為製造硫化 物者可列舉硫化氫。2,4-diacid) hydrated (10) granules are produced in the raw materials or granules are produced when using coffee, so it is preferred to remove all the moisture as much as possible in advance. The water content is preferably 1 GG ppm or less, more preferably 1 G ppm or less, and still more preferably 1 ppm or less. Further, the raw material for forming a film of the present invention is used to reduce or prevent contamination of the particles of the film to be produced, and in the process of particle measurement by using a particle detector in a liquid-scattering liquid liquid, it is preferably more than 0.3 (d). The number of particles is 1〇0 or less, and more preferably, the number of particles in the liquid phase (10) is larger than 〇.2 _ is 1 G00 or less, and more preferably, the particles in the liquid phase i(4) are larger than 〇·2 μιη. The number is less than one. The thin manufacturing method of the present invention is to vaporize the original film for forming a daily film and other precursors used as needed, and to obtain a vapor obtained by vaporization and a reactive gas used as needed. It is introduced onto the substrate and then the precursor is decomposed and/or chemically reacted on the substrate, and the film is deposited and deposited on the substrate by CVD to obtain a film of Yang Ming. The raw material supply and supply method, the deposition method, the production conditions, the production equipment, and the like are not particularly limited. The general conditions known in the art, and the method of 122675.doc -16-200827478 can be used. Examples of the reactive gas used in accordance with the above-mentioned needs include oxygen, odor, oxygen, -®, emulsification, sputum, sputum, sulphur, peroxy hydrazine, formic acid, acetic acid, Examples of the anhydrous product such as anhydrous acetic acid include chlorine, and examples of the production of vaporized compounds include organic amine compounds such as monoalkylamine, dialkylamine and =amineamine, #, ammonia, etc., as a sulfide. List hydrogen sulfide.

又,作為上述堆積方法,可列舉使原料氣體或原料氣體 與反應性氣體僅藉由熱而反應並堆積薄膜之熱CVD,使用 熱及電漿之電漿CVD,使用熱及光之光CVD,使用熱、 光、及t漿之光電裂CVD,將CVD之堆積反應分為基本過 程並以分子位準進行階段性堆積之ALD (Atomic Layer Deposition,原子層沈積)。 又,作為上述製造條件,可列舉反應溫度(基板溫度)、 反應壓力、堆積速度等。關於反應溫度,較好的是本發明 之上述化合物之充分反應溫度即16〇〇c以上,更好的是 25 0 C 800 C。又,較好的是,反應壓力為大氣壓〜1〇 Pa,更好的是大氣壓〜5〇〇 pa。堆積方法及反應壓力之組 合係任意的,可列舉減壓熱CVD、減壓電漿CVD、減壓光 CVD、減壓光電漿cvd、大氣壓熱CVD、大氣壓電漿 CVD、大氣壓光CVD、大氣壓光電漿cVD。堆積速度可根 據原料之供給條件(氣化溫度、氣化壓力)、反應溫度、反 應壓力而進行控制。當堆積速度較大時所獲得之薄膜之特 性可能會惡化,而於堆積速度較小時生產性可能會出現問 122675.doc -17- 200827478 題,故而,堆積速度較好的是05~5000 nm/分鐘,更好的 是1〜1000 nm/分鐘。又,當使用ALD之情形時,為獲得所 期望之膜厚,根據循環之次數而進行控制。 又,本發明之薄膜之製造方法中,於薄膜堆積後,為了 獲得更好的電氣特性亦可進行退火處理,當須要埋入階差 . 之情形時,亦可設置回焊步驟。該情形時之溫度為 , 500〜1200°C,較好的是 6〇〇〜8〇〇。〇。 根據使用本發明之薄膜形成用原料之本發明之薄膜的製 造方法所製造之薄膜,藉由適當選擇其它成分之前驅體、 反應性氣體及製造條件,可選擇金屬、合金、硫化物、氧 化物陶瓷、氮化物陶瓷、玻璃等所期望之種類的薄膜。作 為製造之薄膜之種類,例如可列舉鋅、ZnSe、氧化鋅、硫 化鋅、鋅-銦複合氧化物、添加鐘的氧化辞、添加辞的鐵 氧體、鉛-鋅複合氧化物、鉛_鋅_鈮複合氧化物、鉍-鋅-鈮 複合氧化物、鋇-辞-钽複合氧化物、錫-鋅複合氧化物,作b • 為該等薄膜之用途,例如可用於透明導電體、發光體、螢 光體、光觸媒、磁性體、導電體、高介電體、強介電體、 壓電體、微波介電體、光導波路、光增幅器、光開關、電 磁波屏蔽、太陽電池等中。 • [實施例] 以下’根據製造例、評價例、及實施例更詳細地說明本 發明。然而,本發明並不受以下之實施例等之任何限制。 [製造例]雙(戍烧-2,4-二酸根)鋅無水合物之製造 對市售之雙(戊烧-2,4-二酸根)鋅(關東化學公司製) 122675.doc -18· 200827478 由使用加熱及減壓之昇華純化操作而去除化合水,且自 130°C、30 Pa之溶離份以60%的收率獲得雙(戊烷-2,4-二酸 根)鋅無水合物。對獲得之結晶進行IR、^-NMR、碳及氫 之元素分析、及測定TG-DTA,鑑定為雙(戊烷_2,4_二酸 根)鋅無水合物。 • IR測定 ’ 雙(戊烷-2,4-二酸根)鋅無水合物之IR圖如[圖1]所示,去 除化合水前之市售品雙(戊烷-2,4_二酸根)鋅之IR圖如[圖2] ^ 所示。去除化合水前之雙(戊烷-2,4-二酸根)鋅之IR圖中, 可確認化合水之吸收於3324 cnT1達到頂點,但於去除化合 水後之雙(戊烷-2,4-二酸根)鋅無水合物之結晶中,確認該 吸收不存在。 • b-NMR測定(1重量%之重苯溶液) 未檢出於0.28 ppm附近所檢出之雙(戊烷-2,4-二酸根)鋅 水合物之化合水的峰值。 φ •元素分析 所獲得之雙(戊烷-2,4-二酸根)辞無水合物之碳含有量為 45.5質量%(理論值:45.56質量%),氫含有量為5.3質量 • °/〇(理論值:5.35質量%),與雙(戊烷-2,4-二酸根)鋅無水合 - 物之理論值一致。再者,市售品之雙(戊烷_2,4_二酸根)鋅 之碳含有量為42.4質量%,氫含有量為5.9質量%。1水合物 之理論值為碳42.65質量%、氫5.73質量%,故與上述111測 定之結果符合,可鑑定市售品為1水合物。 • TG-DTA (Ar 100 ml/min、10〇C/min升溫,試料量··戶斤獲 122675.doc -19- 200827478 得之無水合物9.495 mg,市售品7.354 mg) 可4認·獲得之雙(戊燒_2,4_二酸根)鋅無水合物藉由} 階段之揮發而表現出重量減少,市售品當達到1 〇(rc時因 化合水之脫離而導致重量減少、且藉由揮發而導致重量減 少之2階段的重量減少。 [評價例1 ]揮發性之評價 ’ 對於上述製造例中獲得之雙(戊烷-2,4-二酸根)鋅無水合 φ 物、雙(辛烷-2,4_二酸根)鋅、雙(2,2-二甲基乙基癸烷一 3,5·二酸根)辞,於Ar 100 ml/min、l〇°C/min之升溫條件下 進行TG測定,測定出質量50%之減少溫度。於上述條件下 根據TG測疋所獲得之質量5〇%之減少溫度分別係,雙(戊 烧―2,4 —二酸根)鋅無水合物(使用試料9.495 mg進行測定)為 202 C ’雙(辛烷-2,4-二酸根)辞(使用試料1〇·561邮進行測 疋)為245 C,雙(2,2-二甲基-6-乙基癸烷_3,5-二酸根)鋅(使 用試料9.282 11^進行測定)為263。(:。 H [評價例2]溶解性之評價 對上述製造例中獲得之雙(戊烷_2,4_二酸根)鋅無水合物 及化合水去除前之雙(戊烷-2,4-二酸根)鋅,於不具有羥基 之有機溶劑,即具有異丁基甲酮、四氫吱喃、乙二醇二甲 基醚、二乙二醇二甲基醚、乙酸丁酯、及甲苯、以及具有 羥基之有機溶劑即二乙二醇單甲醚中之溶解性進行評價。 # &係以下述方法而進行’於有機溶劑i 〇⑽ml中,混合 含有量為(M、0.2、0.3、〇.5、〇·7、1〇莫耳之雙(戍烷_2,4· 二酸根)鋅無水合物及化合水去除前之雙(戊烷_2,各二酸根) 122675.doc -20- 200827478 鋅’密閉靜置24 A & 〇 卢… 測確認固相之有益m 存在固相之透 另…、保持為不 還明冷液1000 nu有機溶 所示。再者,溶解了不足 的广周配!如表1 莫耳者表示為 >卜 4耳者“為<〇.丨’溶解了工 [表1]Further, examples of the deposition method include thermal CVD in which a raw material gas or a material gas and a reactive gas are reacted only by heat to form a thin film, and plasma CVD using heat and plasma, and CVD using heat and light. The photo-cracking CVD of heat, light, and t-pulp is used to divide the CVD stacking reaction into a basic process and perform ALD (Atomic Layer Deposition) at a molecular level. Further, examples of the production conditions include a reaction temperature (substrate temperature), a reaction pressure, a deposition rate, and the like. With respect to the reaction temperature, it is preferred that the above-mentioned compound of the present invention has a sufficient reaction temperature of 16 〇〇c or more, more preferably 25 0 C 800 C. Further, it is preferred that the reaction pressure is atmospheric pressure ~ 1 〇 Pa, more preferably atmospheric pressure ~ 5 〇〇 pa. The combination of the deposition method and the reaction pressure is arbitrary, and examples thereof include reduced pressure thermal CVD, reduced pressure plasma CVD, reduced pressure photo CVD, reduced pressure photo-paste cvd, atmospheric pressure thermal CVD, atmospheric piezoelectric CVD, atmospheric pressure photo CVD, and atmospheric pressure photoelectric. Pulp cVD. The stacking speed can be controlled according to the supply conditions of the raw materials (gasification temperature, vaporization pressure), reaction temperature, and reaction pressure. The characteristics of the film obtained may be deteriorated when the stacking speed is large, and the productivity may occur when the stacking speed is small. Therefore, the stacking speed is preferably 05 to 5000 nm. /min, better is 1~1000 nm/min. Further, when ALD is used, in order to obtain a desired film thickness, control is performed in accordance with the number of cycles. Further, in the method for producing a film of the present invention, after the film is deposited, an annealing treatment may be performed in order to obtain better electrical characteristics, and when a step is required to be buried, a reflow step may be provided. In this case, the temperature is 500 to 1200 ° C, preferably 6 to 8 Torr. Hey. According to the film produced by the method for producing a film of the present invention using the raw material for forming a film of the present invention, a metal, an alloy, a sulfide, or an oxide can be selected by appropriately selecting a precursor of the other component, a reactive gas, and a production condition. A desired type of film such as ceramics, nitride ceramics, or glass. Examples of the type of the film to be produced include zinc, ZnSe, zinc oxide, zinc sulfide, a zinc-indium composite oxide, an oxidation word of an addition clock, a ferrite added, a lead-zinc composite oxide, and a lead-zinc. _铌 composite oxide, yttrium-zinc-yttrium composite oxide, ytterbium-rhodium-yttrium composite oxide, tin-zinc composite oxide, as b • for the use of such films, for example, for transparent conductors, illuminants , phosphors, photocatalysts, magnetic materials, electrical conductors, high dielectrics, ferroelectrics, piezoelectrics, microwave dielectrics, optical waveguides, optical amplifiers, optical switches, electromagnetic shielding, solar cells, etc. [Examples] Hereinafter, the present invention will be described in more detail based on production examples, evaluation examples, and examples. However, the present invention is not limited by the following examples and the like. [Production Example] Manufacture of bis(anthraquinone-2,4-diacid) zinc anhydrate. Commercially available bis(pentane-2,4-dicarboxylate) zinc (manufactured by Kanto Chemical Co., Ltd.) 122675.doc -18 · 200827478 The combined water was removed by sublimation purification using heating and depressurization, and bis(pentane-2,4-diacid) zinc anhydrous was obtained in a yield of 60% from 130 ° C, 30 Pa. Things. The obtained crystals were subjected to IR, ^-NMR, elemental analysis of carbon and hydrogen, and TG-DTA, and identified as bis(pentane-2,4-diacid) zinc anhydrate. • IR measurement 'IR diagram of bis(pentane-2,4-diacid) zinc anhydrate as shown in [Figure 1], the commercial product bis(pentane-2,4-diate) before removal of the combined water The IR image of zinc is shown in [Fig. 2] ^. In the IR diagram of the bis(pentane-2,4-diacid) zinc before the removal of the combined water, it can be confirmed that the absorption of the combined water reaches the apex of 3324 cnT1, but after the removal of the combined water, the bis(pentane-2,4) In the crystal of the -diacid)zinc anhydrate, it was confirmed that the absorption was not present. • b-NMR measurement (1 wt% heavy benzene solution) The peak value of the combined water of bis(pentane-2,4-diacid)zinc hydrate detected in the vicinity of 0.28 ppm was not detected. φ • The carbon content of the bis(pentane-2,4-diacid) anhydrate obtained by elemental analysis was 45.5% by mass (theoretical value: 45.56 mass%), and the hydrogen content was 5.3 mass•°/〇. (Theoretical value: 5.35 mass%), which is consistent with the theoretical value of the bis(pentane-2,4-diacid) zinc anhydrous product. Further, the commercially available bis(pentane-2,4-diacid)zinc has a carbon content of 42.4% by mass and a hydrogen content of 5.9% by mass. The theoretical value of the monohydrate is 42.65% by mass of carbon and 5.73 mass% of hydrogen, so that it is in conformity with the result of the above 111 measurement, and the commercially available product can be identified as a monohydrate. • TG-DTA (Ar 100 ml/min, 10 〇C/min, the amount of sample, ······························································ The obtained bis(ephthene-2,4-diacidate) zinc anhydrate exhibits a weight reduction by volatilization of the stage, and when the commercial product reaches 1 〇 (rc, the weight is reduced due to the detachment of the combined water, And the weight loss of the two stages of the weight reduction by volatilization. [Evaluation Example 1] Evaluation of Volatilization 'The bis(pentane-2,4-diacid) zinc anhydrous φ substance obtained in the above production example, Bis(octane-2,4-diacid) zinc, bis(2,2-dimethylethyldecane-3,5-diate), at Ar 100 ml/min, l〇°C/min The TG measurement was carried out under the temperature rising condition, and the temperature at which the mass was reduced by 50% was measured. Under the above conditions, the temperature at which the mass obtained by TG measurement was reduced by 5% was bis(pentanol-2,4-diacidate). Zinc anhydrate (measured using sample 9.495 mg) is 202 C 'bis(octane-2,4-diacid) (using sample 1〇·561 postal measurement) to 245 C, double (2, 2) -dimethyl -6-ethylnonane_3,5-diacid) zinc (measured using the sample 9.282 11^) was 263. (: H) [Evaluation Example 2] Evaluation of solubility The double obtained in the above production example ( Pentane 2,4-diacid) zinc anhydrate and bis(pentane-2,4-diacid) zinc before removal of compound water, in an organic solvent having no hydroxyl group, ie having isobutyl ketone, tetrahydrogen The solubility in decyl, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, butyl acetate, and toluene, and an organic solvent having a hydroxyl group, i.e., diethylene glycol monomethyl ether, was evaluated. It is carried out in the following method: 'In the organic solvent i 〇 (10) ml, the mixed content is (M, 0.2, 0.3, 〇.5, 〇·7, 1 〇 Mo Er double (decane_2, 4·2 Acidate) Zinc anhydrate and bis(pentane-2, each diacid) before removal of compound water 122675.doc -20- 200827478 Zinc 'closed static 24 A & 〇Lu... Test to confirm the usefulness of solid phase The solid phase is transparent to the other..., and it is not shown in the cold liquid 1000 nu organic solution. In addition, the insufficient broadening is dissolved! As shown in Table 1, the Moer is expressed as > ≪. Shu square 'work by dissolving [Table 1]

根據表i可確認’雙(戊烧_2,4_二酸根)鋅無水合物對各 種有,溶劑表現出充分之溶解性,不含有固相,並給予了 充分濃度之溶液。相對於此,可確認含有水合物之市售品 雙(戊炫·2,4·:酸根)辞,於…莫耳溶液中亦存在微粉ϋ 解殘餘物留物。再者,收集該溶解殘餘物並進行測定IR 後,可鑑定為雙(戊烷_2,4-二酸根)鋅之1水合物。 [評價例3] 於上述評價例2所調製之雙(戊烷_2,4-二酸根)鋅無水合 物溶液中’對各種有機溶劑中之最大濃度的溶液,於Ar 100 ml/rnin、10°C/min之升溫條件下進行tg_DTA測定。將 雙(戊烧-2,4_一酸根)鋅無水合物以相對具有經基之有機溶 劑即二乙二醇單甲醚1000…為〇·7莫耳之比例進行混合而 獲得組成物’該組成物之結果如圖3所示。根據圖3可確 認,於271.8°C時有7·22%之殘留。使用不具有羥基之有機 122675.doc -21 - 200827478 /合劑之溶液時,無法確認表示嗲反庫4 &铷产 殘涪,僅m τ該反應生成物之存在的揮發 =僅可觀察到因有機溶劑及雙(戊【2,4_二酸根)辞之 揮發而導致之重量減少。自上述内容可確認〜乙 甲起之f:基與雙(戊烧_2,4_二酸根)鋅無水合物反應,並給 予不易揮發之反應生成物。 ^According to Table i, it was confirmed that the bis(ephthene-2,4-diacid)zinc anhydrate had sufficient solubility for each solvent, did not contain a solid phase, and was given a solution having a sufficient concentration. On the other hand, it was confirmed that a commercial product containing hydrates was bis (pentan 2,4·:acid), and a fine powder was also present in the molar solution. Further, after collecting the dissolved residue and measuring IR, it was identified as bis(pentane-2,4-diacid) zinc monohydrate. [Evaluation Example 3] The solution of the maximum concentration in various organic solvents in the bis(pentane-2,4-diacid) zinc anhydrate solution prepared in the above Evaluation Example 2, in Ar 100 ml/rnin, The tg_DTA measurement was carried out under the temperature rising condition of 10 ° C / min. The bis(pentane-2,4-acidate) zinc anhydrate is mixed with a relative organic solvent having a base group, that is, diethylene glycol monomethyl ether 1000..., to obtain a composition' The results of this composition are shown in Figure 3. It can be confirmed from Fig. 3 that there is a 7.22% residue at 271.8 °C. When using a solution of organic 122675.doc -21 - 200827478 / mixture without a hydroxyl group, it is impossible to confirm the volatilization indicating the presence of the reaction product of only the m τ of the reaction product of the antimony 4 & The weight loss caused by the volatilization of the organic solvent and bis(penta-2,4-diate). From the above, it was confirmed that the f: group from the acetonitrile reacted with the bis(ephthene-2,4-diacid)zinc anhydrate and gave a nonvolatile reaction product. ^

藉由上述評價例1至3,可確認雙(戊烧-2,4-二酸根)鋅無 水合物與不具有羥基之有機溶劑之組成物,尤其該有機溶 劑係醚系溶劑、醋系溶劑、芳香族系溶劑之組成物,可給 予充分濃度且穩定之溶液,可較好地作為CVD用原料。 [實施例]氧化辞薄膜之製造 使用圖4所示之CVD裝置,於矽晶圓上,根據以下條 件將由上述製造例所獲得之雙(戊烧-2,4-二酸根)辞0.5 mol溶解於1000 ml四氫呋喃中,並將該溶液作為薄臈形成 用原料,製造氧化鋅薄膜。使用螢光χ線鑑定製造後之薄 膜之膜厚及組成。 (製造條件) 氣化室溫度·· 140°C,原料流量·· 〇·5 sccm,氧氣流量: 500 seem,反應壓力:1〇〇〇 pa,反應時間·· 2〇分鐘,基板 溫度:450°C,載體氣體:氬氣500 seem (結果) 膜厚:240 nm,組成:氧化鋅 【圖式簡單說明】 圖1表示雙(戊烷_2,4·二酸根)鋅無水合物之IR圖。 圖2表示市售品雙(戊燒-2,4-二酸根)鋅之IR圖。 122675.doc -22- 200827478 圖3表示雙(戊烷-2,4-二酸根)鋅無水合物與具有羥基之 有機溶劑即二乙二醇單甲醚之組成物的TG-DTA測定結 果。 圖4係表示於實施例中使用於本發明之薄膜之製造方法 中的CVD裝置之一例的概要圖。According to the above evaluation examples 1 to 3, it was confirmed that a composition of a bis(pentane-2,4-diacid)zinc anhydrate and an organic solvent having no hydroxyl group, in particular, an organic solvent-based ether solvent or a vinegar solvent The composition of the aromatic solvent can be supplied to a sufficiently concentrated and stable solution, and can be preferably used as a raw material for CVD. [Example] Production of Oxidation Film The bismuth (pentane-2,4-diacid) obtained by the above production example was dissolved on a ruthenium wafer by using a CVD apparatus shown in Fig. 4 under the following conditions. A zinc oxide film was produced by using this solution as a raw material for forming a thin crucible in 1000 ml of tetrahydrofuran. The film thickness and composition of the film after manufacture were identified using a fluorescent twist line. (Manufacturing conditions) Gasification chamber temperature··140°C, raw material flow rate···5 sccm, oxygen flow rate: 500 seem, reaction pressure: 1〇〇〇pa, reaction time·· 2〇 minutes, substrate temperature: 450 °C, carrier gas: argon gas 500 seem (result) film thickness: 240 nm, composition: zinc oxide [schematic description] Figure 1 shows the IR of bis(pentane-2,4·diate) zinc anhydrate Figure. Fig. 2 shows an IR chart of a commercially available bis(pentane-2,4-dicarboxylate) zinc. 122675.doc -22- 200827478 Fig. 3 shows the results of TG-DTA measurement of a composition of bis(pentane-2,4-diacid) zinc anhydrate and a solvent having an organic solvent of dihydroxyethylene glycol monomethyl ether. Fig. 4 is a schematic view showing an example of a CVD apparatus used in the method for producing a film of the present invention in the examples.

122675.doc -23-122675.doc -23-

Claims (1)

200827478 十、申請專利範園:200827478 X. Applying for a patent garden: 一種薄膜形成用原料,其係包含下述溶液··將雙(戊烷_ 2,4_二酸根)鋅無水合物〇·丨〜〗莫耳作為必須成分而溶解於 不具有羥基之有機溶劑1〇〇〇 m丨中所得者。 如凊求項1之薄膜形成用原料,其中,不具有上述羥基 之有機溶劑係選自醚化合物、酯化合物、或芳香族化合 物。 3 ·如明求項1或2之薄膜形成用原料,其中,不具有上述羥 基之有機溶劑於大氣壓下之沸點係6〇〜18(rc。 4· 一種薄膜之製造方法,該方法係將如請求項丨至3中任一 項之薄膜形成用原料氣化後所獲得之含有雙(戊烷_2,心二 酸根)辞無水合物的蒸汽導人至基體上,將該含有雙(: 烷·2’4-二酸根)鋅無水合物之蒸汽分解及/或使其進行化 學反應,從而於基體上形成含有辞原子之薄膜。A raw material for forming a thin film comprising the following solution: bis (pentane-2,4-diacid) zinc anhydrate, 〇·丨~〗, as an essential component, dissolved in an organic solvent having no hydroxyl group 1所得m丨 obtained. The raw material for film formation according to Item 1, wherein the organic solvent not having the above hydroxyl group is selected from an ether compound, an ester compound, or an aromatic compound. 3. The raw material for film formation according to claim 1 or 2, wherein the organic solvent having no hydroxyl group has a boiling point of 6 〇 18 (at a pressure of atmospheric pressure) (rc. 4) a method for producing a film, the method The vapor containing bis(pentane-2, dodecanoate) anhydrate obtained after gasification of the raw material for forming a film of any one of claims 3 to 3 is introduced onto the substrate, and the double is contained: The alkane 2'4-diacid)zinc anhydrate is decomposed by steam and/or chemically reacted to form a film containing a radical. 122675.doc122675.doc
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