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TW200811599A - Curable composition, cured object, color filter, and liquid-crystal display - Google Patents

Curable composition, cured object, color filter, and liquid-crystal display Download PDF

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Publication number
TW200811599A
TW200811599A TW96125023A TW96125023A TW200811599A TW 200811599 A TW200811599 A TW 200811599A TW 96125023 A TW96125023 A TW 96125023A TW 96125023 A TW96125023 A TW 96125023A TW 200811599 A TW200811599 A TW 200811599A
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Taiwan
Prior art keywords
acid
compound
group
acrylate
meth
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TW96125023A
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Chinese (zh)
Inventor
Makoto Fukui
Yuji Mizuho
Toshiyuki Tanaka
Junji Mizukami
Kouji Yamauchi
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Mitsubishi Chem Corp
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Publication of TW200811599A publication Critical patent/TW200811599A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/02Materials and properties organic material
    • G02F2202/022Materials and properties organic material polymeric

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

A curable composition which, when applied by die coating, gives a cured object having excellent evenness in height. The curable composition comprises an ethylenic compound (ingredient A), a photopolymerization initiator (ingredient B), a polymerizable monomer having a high viscosity (ingredient C), and a solvent (ingredient D). The curable composition as a coating fluid has a leveling resistance RL expressed with the viscosity μ of the coating fluid and the solid concentration C thereof (RL=μxC3) of 0.01-0.05 and a sagging resistance (RS=μxC2) of 0.1 or more.

Description

200811599 九、發明說明: 【考X明所屬之技術領域】 本發明係關於-種硬化性組成物等,更詳細而言,係關 於-種適合形成液晶顯示裝置等之彩 組成物等。 旺 【先前技術】 近年來,關於液晶顯示裝置等所用之彩色遽光片,為達 成要求性能’而開發一種製造均勾性高的彩色遽光片之方 法0 < ]々4知,硬化性組成物(光阻劑)之塗佈步驟之主流 係:於基板中央部滴下光阻劑,藉由旋塗法而均勾化。瓜 然而’伴隨以電視用途料中心的液晶面板製造時之基 板尺寸大型化,光阻劑之使用晋 狀 刎又便用里乓大,進而,存在旋塗機 衣置上的限制(馬達之能力等),因此最近開發一種利用模 塗方式之塗佈技術,且部分得以實用化(參照專利文獻小 [專利文獻1]曰本專利特開2005-266783號公報 【發明内容】 (發明所欲解決之問題) 但是,感光性間隔件(phot〇spacer)係為了於液晶面板 中使2片基板保持一定之間隔而使用者,若基板間隔不均 勻則成為顯示器顯示不良等之原目,因此與其他彩色遽光 片用硬化性組成物相比,要求高度的高度均勻性。^ /然而,於利用模塗方式之塗佈的情況,由於模頭前端之 形狀的不均勻、或模頭安裝狀態、吐出流量的不均勻等, 3(補件)/96_Q9/96l25G23 200811599In the present invention, the present invention relates to a curable composition and the like, and more particularly to a color composition suitable for forming a liquid crystal display device or the like.旺 [Prior Art] In recent years, a color ray-receiving sheet for liquid crystal display devices and the like has been developed to develop a high-density color grading sheet for achieving the required performance. The main step of the coating step of the composition (photoresist) is to drop the photoresist in the central portion of the substrate and to coat it by spin coating. However, the size of the substrate used in the manufacture of the liquid crystal panel of the TV center is large, and the use of the photoresist is in the shape of a large pong, and further, there is a limitation on the coating of the spin coater (the ability of the motor) In the meantime, a coating technique using a die coating method has recently been developed, and some of them have been put into practical use (refer to the patent document [Patent Document 1], Japanese Patent Laid-Open Publication No. 2005-266783 (Invention). The problem is that the photosensitive spacer (phot〇 spacer) is used to keep the two substrates at a constant interval in the liquid crystal panel, and if the substrate spacing is not uniform, the display is defective, and the like. The color calender sheet requires a high degree of high uniformity compared with the hardenable composition. However, in the case of coating by the die coating method, the shape of the front end of the die is uneven, or the die is mounted, Uneven flow rate of discharge, 3 (supplement) /96_Q9/96l25G23 200811599

而存在塗佈後之腺:PAnd there is a coated gland: P

動方向上分布的傾向?、於模頭之寬度方向及模頭之移 又’模塗方式中,;g A 重力之影響而塗;況,存在如下問題:由於 厚分布容易變大。 且U,其結果’塗佈膜之膜 H我們之研究’得知:該等塗佈膜之膜厚分布,美板 越,越顯著’由於塗佈臈上產生 ; 損及例如作為間隔件之必要性能的高度均勾性布而顯者 本發明係為解決上述課題而完成者。 ^本u之目的在於提供—種於模塗方式之塗佈中, 可&得高度均句性優異的硬化物之硬㈣組成物。 物他目的在於提供-種由此種硬化性組成 彩=之其他目的在於提供-種高度均勻性優異的 進而’本發明之其他目的在於提供—種具有高度均句性 優異的彩色濾光片之液晶顯示裝置。 (解決問題之手段) 、本發明者等人對上述課題努力研究之結果發現:若根據 以下觀點調整硬化性組成物之塗佈液則可解決問題。 即,根據本發明,提供一種硬化性組成物,其特徵在於 滿足下述(a)及(b)。 、 (a)使用塗佈液之黏度(# )以及固形分濃度(c)而表示 312XP/發明說明書(補件)/96-09/96125023 7 200811599 為RTL:=)之調平阻力值嶋於0.01〜。·05之範圍。 (式:1)中’ RL係調平阻力值,"係塗佈液之黏度(單 .mPa.s),C係固形分濃度(單位:kg/kg)。) (b)以下述式(2)表示之下流阻力值(RS)為0. 1以上。 RS=^xC2 (2) (式⑵中,RS係下流阻力值,"係、塗佈液之黏度(單 H) ’ c係固形分濃度(單位:kg/kg)。) 、I用於本發明之硬化性組成物,較佳為用於模塗方 :之塗佈’更佳為用於形成液晶顯示裝置等之彩色濾光 又 X 發明,提供一種硬化物,其特徵在於:使上 述硬化性組成物硬化而成。 進而根據本發明,提供一種彩色滤光片,其特徵在於·· 含有該硬化物。 進而又’根據本發明,提供一種液晶顯示裝置,其 在於·具備該彩色濾光片。 八、 (發明效果) 根據轉明之硬化性組成物,可藉由模塗方式之塗佈, 而形成咼度均勻性優異的硬化物。 【實施方式】 以下,對用以實施本發明之最佳形態(以下,發明之杏 施形態)加以詳細說明。再者,本發明並不限定於以下二 施形悲’可於其主旨範圍内進行各種變化而實施。 312XP/發明說明書(補件)/96-09/96125023 8 200811599 [1]調平阻力值(RL)、下流阻力值(RS) 適用於本實施形態的硬化性組成物,根據塗佈液之黏度 [# (mPa,s)]以及固形分濃度[C(kg/kg)],而表示為下述 式(1)之調平阻力值(RL)之值較佳為0.01〜〇〇5之|爸 | 圍,更佳為〇· 01〜0· 045之範圍,尤佳為〇· 〇1〜〇· 〇4之 . 範圍。 RL= μ xC1 (1 ) , 於塗佈液為牛頓流體之情況,將塗佈後之凹凸調平時的 阻力以下式(3)表示。 調平阻力 〇c(3/z )/(167r h1)〇c(3;r /16)x/z xC1 (3) 此處,上式中,/z :塗佈液之黏度,h :濕塗佈膜厚,c ·· 塗佈液之固形分濃度。 本實施形態中,將# xC1定義為調平阻力值(RL)(式 (1))。根據該式(1),黏度(# )越低、濕塗佈膜厚越厚, 換言之,固形分濃度(C)越低,則將模塗塗佈時所產生的 凹凸調平(平滑化)時的阻力越小,調平性越佳。 進而,適用於本實施形態的硬化性組成物,根據塗佈液 之黏度[// (mPa.s)]以及固形分濃度[c(kg/kg)],而表示 為下述式(2)之下流阻力值(RS)之值較佳為〇1以上,更 佳為0.13以上,尤佳為〇15以上。The tendency to distribute in the direction of motion? In the width direction of the die and the movement of the die, in the 'die coating method, g A is applied by the influence of gravity; the problem is that the thickness distribution tends to become large. And U, the result 'film of coating film H our research' knows: the film thickness distribution of the coating film, the more beautiful the board, the more significant 'because of the coating on the crucible; damage, for example, as a spacer The present invention has been made to solve the above problems. The purpose of the present invention is to provide a hard (four) composition of a cured product which is excellent in highly uniformity in the coating of the mold coating method. The purpose of the invention is to provide a color filter having such a high degree of uniformity. The other object of the present invention is to provide a color filter excellent in high uniformity. Liquid crystal display device. (Means for Solving the Problem) As a result of intensive studies on the above-mentioned problems, the present inventors have found that the problem can be solved by adjusting the coating liquid of the curable composition according to the following points. That is, according to the present invention, there is provided a curable composition which satisfies the following (a) and (b). (a) using the viscosity (#) of the coating liquid and the solid concentration (c) to indicate that the 312XP/invention specification (supplement)/96-09/96125023 7 200811599 is the RTL:=) leveling resistance value 0.01~. · The scope of 05. (Formula: 1) ' RL is the leveling resistance value, " viscosity of the coating liquid (single mPa.s), C system solid concentration (unit: kg / kg). (b) The lower flow resistance value (RS) is represented by the following formula (2): 0.1 or more. RS=^xC2 (2) (In the formula (2), the RS resistance value of the flow resistance, "the viscosity of the coating liquid (single H) 'c solid concentration (unit: kg/kg).), I is used for The curable composition of the present invention is preferably a coating for coating: a color filter for forming a liquid crystal display device or the like, and a cured product, characterized in that: The hardenable composition is hardened. Further, according to the present invention, there is provided a color filter characterized by comprising the cured product. Further, according to the present invention, there is provided a liquid crystal display device comprising the color filter. VIII. (Effect of the Invention) According to the curable composition of the invention, it is possible to form a cured product excellent in uniformity of twist by coating by a die coating method. [Embodiment] Hereinafter, the best mode for carrying out the invention (hereinafter, the apricot form of the invention) will be described in detail. Further, the present invention is not limited to the following two modifications, and various modifications can be made without departing from the spirit and scope of the invention. 312XP/Invention Manual (Supplement)/96-09/96125023 8 200811599 [1] Leveling resistance value (RL), downflow resistance value (RS) Applicable to the curable composition of the present embodiment, depending on the viscosity of the coating liquid [# (mPa, s)] and the solid concentration [C (kg / kg)], and the value of the leveling resistance value (RL) expressed by the following formula (1) is preferably 0.01 to 〇〇 5 | Dad | Wai, better for the range of 01~0· 045, especially for 〇·〇1~〇·〇4. Scope. RL = μ x C1 (1 ) , and when the coating liquid is a Newtonian fluid, the resistance when the unevenness after coating is leveled is expressed by the following formula (3). Leveling resistance 〇c(3/z)/(167r h1)〇c(3;r /16)x/z xC1 (3) Here, in the above formula, /z : viscosity of the coating liquid, h: wet Coating film thickness, c ·· The solid content concentration of the coating liquid. In the present embodiment, #xC1 is defined as a leveling resistance value (RL) (formula (1)). According to the formula (1), the lower the viscosity (#), the thicker the wet coating film thickness. In other words, the lower the solid content concentration (C), the flattening (smoothing) of the unevenness generated during the die coating application. The smaller the resistance, the better the leveling. Further, the curable composition of the present embodiment is expressed by the following formula (2) according to the viscosity [//(mPa.s)] of the coating liquid and the solid content concentration [c (kg/kg)]. The value of the flow resistance value (RS) is preferably 〇1 or more, more preferably 0.13 or more, and particularly preferably 〇15 or more.

Rs= // xC2 (2) 塗佈於具有傾斜之面的塗佈液流動,產生不均勻的條紋 或積留,塗佈膜部分變厚,將此種情況稱為下流,其原因 要為重力。於塗佈液為牛頓流體之情況,因重力作用而 1Rs= // xC2 (2) The coating liquid applied to the inclined surface flows, causing uneven streaks or accumulation, and the coating film is partially thickened. This condition is called downflow, and the reason is gravity. . In the case where the coating liquid is a Newtonian fluid, due to gravity 1

發明說明書(補件)/96-09/96125023 Q 200811599 產生流動時的表面速度以下式(4)表示。 表面速度=(l/2)x( p g/# )xh2 (4) 此處’上式(4)中,// :塗佈液之黏度,h··濕塗佈膜厚, g為重力《數,p為密度。因此對於下流之阻力以下式(5) 表示。 下流阻力 〇c2///(pgh2)〇c//Xc2 (5) 本實施形態中,將// xC2定義為下流阻力值(RS)(式 (2))。根據該式(2),黏度越高,濕塗佈膜厚越薄,換言 之固形分濃度越高,則對於因重力作用而產生之流動的^ 力越高,越難產生塗佈膜之不均勻。 根據上述理由,提升調平性與提升抑制下流之方法相 反,但藉由著眼於各阻力值之與固形分濃度[c(kg/kg)] 有關的指數之差異,調整塗佈液之黏度[# (mPa.s)]以及 固形分濃度[C(kg/kg)],則可兼顧調平性之提升與下流之 抑制。 1_2」黏度(//)之下_ —丨/々敬/又、ία卜 於適用於本實施形態的硬化性組成物中,塗佈液之黏度 (#)通常為ImPa.s以上。尤其於模塗塗佈法中,製 燥後(即,最終步驟後)之塗佈膜厚為薄膜的彩色濾^片: 情況下,塗佈液之黏度較佳為h5 mPa.s以上,‘更佳為2 mPa.s以上’尤佳為2.5 mPa.s以上。但,塗佈液之黏声 通常為10 mPa^s以下。 & 通常係指塗佈膜 「薄膜」。)之情 此處,所謂乾燥後之塗佈膜厚為薄膜, 厚之膜厚未滿1.5 //m(以下,有時記^ 312XP/發明說明書(補件)/96-09/96125023 10 200811599 況。 又’於製造乾燥後之塗佈膜厚為 件之厚膜之彩色滹. 如感光性間隔 〜巴德尤片的情況,塗佈 mPa · s以上,更佳Λ q 9 ^度’較佳為3 更佳為3· 2 mpa.s以上。 之塗佈膜厚為厚膜,通常 此處,所_後 以卜[以丁 士士 糸才日塗佈膜厚之膜厚為1 5 以士 (以下,有時記為「厚膜」。)之情況。 " 藉由將塗佈液之固宏多上疮 從黏度设為上述範圍内,於模塗涂你 法中有以下優點,即,於舆 犋土 土佈 彩色濾光片的情況,即使描古泠 、為潯胺之 :凡即使“塗佈極限速度亦無塗佈液之 又’可㈣降低了由於模唇前端之不 塗佈條紋的彩色濾光片。 生的 再者,所謂塗佈極限速度,係指於固定塗佈部上不形成 由於脫液而引起的條紋狀塗佈膜,而可進行一致之塗佈的 上限塗佈速度。塗佈速度,通常為01 m/秒鐘,ς佳為 0· 2 m/秒鐘,更佳為〇· 3 jn/秒鐘。 另一方面,適用於本實施形態的硬化性組成物之塗佈液 的固形分濃度(C) ’較佳為設為2重量%〜5〇重量%,更佳 為10重量%〜30重量%,尤佳為15重量%〜25重量%之範 圍。若硬化性組成物之固形分濃度(C)過高,則存在易於 產生塗佈條紋之傾向。又,若固形分濃度(c)過低,則存 在黏度(#)降低之傾向。 適用於本實施形態的硬化性組成物,於起因於模塗塗佈 法的塗佈液之黏度(//)、固形分濃度(C)之範圍中,為使 調平阻力值(RL)處於0·01〜0.05之範圍,且,下流阻力 312ΧΡ/發明說明書(補件)/96-09/96125023 11 200811599 值(RS)為〇·1以上,較佳為減小固形分濃度((:)以降低調 平阻力值(RL),另一方面,提高黏度(// )以提升下流阻力 值(RS)。 即,調平阻力值(RL)因與固形分濃度((:)之3次方成比 例,故藉由減小固形分濃度(c)可使調平阻力值(RL)大大 減少。 另一方面,下流阻力值(RS)因與固形分濃度((:)之2次 方成比例,故即使固形分濃度(c)變小亦不會如調平阻力 值(RL)般減少,可藉由提高黏度(#)而抑制下流阻力值 (RS)之減少。 作為具體的數值舉例於以下之表1。 [表1] 固形分濃度(C) _ (kg/kg) 黏度(# ) ---»(jnPa · s) 0. 25 -Ll~ 3. 2 0.2 2. h ~ ft 9C; 0. 15 —1ιΛ1^14. 81 法,例如可列舉以下(a)〜(〇之方法。 (a)使用南黏度之黏合劑樹脂。 此處,作為高黏度之黏合劑樹脂,可列舉重量平均分子Disclosure of the Invention (Repair)/96-09/96125023 Q 200811599 The surface velocity at which the flow is generated is expressed by the following formula (4). Surface speed = (l/2)x(pg/#)xh2 (4) Here, in the above formula (4), //: viscosity of the coating liquid, h··wet coating film thickness, g is gravity Number, p is the density. Therefore, the resistance to the downflow is expressed by the following formula (5). Downstream resistance 〇c2///(pgh2)〇c//Xc2 (5) In the present embodiment, //xC2 is defined as a downflow resistance value (RS) (formula (2)). According to the formula (2), the higher the viscosity, the thinner the wet coating film thickness, in other words, the higher the solid content concentration, the higher the flow force due to the action of gravity, and the more difficult the unevenness of the coating film is. . For the above reasons, the improvement of the leveling property is the opposite of the method of suppressing the downflow, but the viscosity of the coating liquid is adjusted by focusing on the difference between the index values of the respective resistance values and the solid concentration [c(kg/kg)] [ # (mPa.s)] and the solid concentration [C (kg / kg)], both the improvement of the leveling and the suppression of the downflow. 1_2" Below the viscosity (//) _ 丨 々 々 又 又 又 ί ί ί 于 于 于 于 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 适用 。 。 。 。 。 。 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布 涂布In particular, in the die coating method, after the drying (that is, after the final step), the coating film having a thickness of the film is a color filter of the film: in the case where the viscosity of the coating liquid is preferably h5 mPa.s or more, More preferably 2 mPa.s or more 'more preferably 2.5 mPa.s or more. However, the viscosity of the coating liquid is usually 10 mPa^s or less. & usually refers to the coating film "film". Here, the coating film thickness after drying is a film, and the thickness of the film is less than 1.5 //m (hereinafter, it is noted that 312XP/invention specification (supplement)/96-09/96125023 10 200811599 In addition, the thickness of the coating film after drying is a thick film of the thickness of the film. For example, in the case of photosensitive interval~Badyou film, coating mPa · s or more, better Λ q 9 ^ degree' Preferably, the thickness of 3 is more than 3. 2 mpa.s. The thickness of the coating film is thick film, usually here, after the film is thicker, the thickness of the film is 15 lbs. (The following may be referred to as "thick film".) " By setting the viscosity of the coating liquid to the above range from the viscosity, the following advantages are obtained in the die coating method, that is, In the case of the earthenware color filter in the earthworm, even if it is a sputum, it is a guanamine: even if the coating speed is not the same as the coating liquid, it can be lowered (4) because the front end of the lip is not coated. The color filter of the stripe stripe. The so-called coating limit speed means that a stripe-like coating film due to deliquoring is not formed on the fixed coating portion. The upper limit coating speed of uniform coating can be performed. The coating speed is usually 01 m/sec, preferably 0·2 m/sec, more preferably 〇·3 jn/sec. The solid content concentration (C)' of the coating liquid applied to the curable composition of the present embodiment is preferably 2% by weight to 5% by weight, more preferably 10% by weight to 30% by weight, particularly preferably In the range of 15% by weight to 25% by weight, if the solid content concentration (C) of the curable composition is too high, there is a tendency that coating streaks are liable to occur. Further, if the solid content concentration (c) is too low, it exists. The tendency of the viscosity (#) to be lowered is applied to the curable composition of the present embodiment in the range of the viscosity (//) and the solid content concentration (C) of the coating liquid resulting from the die coating method. The leveling resistance value (RL) is in the range of 0·01 to 0.05, and the downflow resistance 312ΧΡ/invention specification (supplement)/96-09/96125023 11 200811599 value (RS) is 〇·1 or more, preferably minus Small solids concentration ((:) to lower the leveling resistance value (RL), on the other hand, increase the viscosity (//) to increase the downstream resistance value (RS). That is, the leveling resistance value (RL) is proportional to the solid concentration ((:) to the third power, so the leveling resistance value (RL) can be greatly reduced by reducing the solid concentration (c). On the other hand, the downstream resistance value (RS) is proportional to the solid concentration ((:) to the second power, so even if the solid concentration (c) becomes smaller, it will not decrease as the leveling resistance value (RL). The decrease in the resistance value (RS) is suppressed by increasing the viscosity (#). Specific examples are shown in Table 1 below. [Table 1] Solid concentration (C) _ (kg/kg) Viscosity (#) -- -»(jnPa · s) 0. 25 -Ll~ 3. 2 0.2 2. h ~ ft 9C; 0. 15 -1ιΛ1^14. 81 Method, for example, the following methods (a) to (〇) can be cited. (a) Use a binder resin of south viscosity. Here, as a high-viscosity binder resin, a weight average molecule can be cited.

量(Mw)較佳為5000以上、爭祛盔]nnnn ·、,L L 工更仏為1 0000以上、尤佳為ι5〇〇〇 以上之樹脂。 尤佳 該情況下,酸價較佳為20以上’更佳為4〇以上 為60以上。 作為該高黏度之黏合劑樹脂,可自後述之⑷乙稀性不 312XP/發明說明書(補件)/96-09/96125023 12 200811599 飽和化合物、或⑻不具有乙烯性不飽和基之樹脂之中選 擇,更佳為可自[A-1]於侧鏈具有乙烯性不飽和基之含有 叛基之乙烯系樹脂、⑻不具有乙烯性不餘和基之樹脂之 中選擇。 (b )使用高黏度之聚合性單體。 此處’作為高黏度之聚合性單體,可列舉黏度較佳為 lOmPa.s以上、更佳為100mPa.s以上、尤佳為i〇〇〇mpa s 以上之單體。 作為該高黏度之聚合性單體,於後述之(c)聚合性單體 中’就聚合性、交聯性等方面而言’可自分子内較佳為具 有2個以上乙烯性不飽和基之化合物、更佳為具有3個以 上乙烯性不飽和基之化合物之中進行選擇。又,藉由添加 少量如黏度超過1 0000 mpa.s之聚合性單體,而使硬化性 組成物之各種特性不太變化,僅控制其黏度的方法亦較 佳。 (C)使用高黏度之溶劑。 此處’作為高黏度之溶劑,可列舉黏度較佳為1 mPa · s 以上、更佳為1 · 2 mPa · S以上、尤佳為1 · 5 fflPa · s以上之 溶劑。但,溶劑並非僅根據黏度進行選擇,亦根據所使用 之材料、各自的溶解性、蒸氣壓、乾燥速度、氣味等各種 要素的平衡進行選擇。 [3 ]硬化性組成物之構成成分及組成 適用於本實施形態的硬化性組成物,並無特別限定,可 藉由調配以下(A)成分〜(D)成分之各成分、以及視需要之 312XP/發明說明書(補件)/96-09/96125023 13 200811599 其他成分((E)成分〜(η)成分)而獲得。以下,對各成分加 以說明。 刀口 (A )乙稀性不飽和化合物 (B)光聚合起始劑及/或熱聚合起始劑 • (C)聚合性單體 , (D )溶劑 其他成分 (E)環氧化合物 (F )胺基化合物 (G)界面活性劑 (Η )不具有乙稀性不飽和基之樹脂 再者,本實施形態中,所謂「(甲基)丙烯酸」,意指「丙 烯酸及/或曱基丙烯酸」,又,所謂「總固形分」,意指除 去溶劑之硬化性組成物之成分的總量。 示 (A)乙烯性不飽和化合物 〔 適用於本實施形態的硬化性組成物中所使用之乙烯性 :不飽和化合物係分子内具有至少1個自由基聚合性乙烯 性不飽和鍵的化合物,該自由基聚合性乙烯性不飽和鍵係 於硬化性組成物受到活性光線之照射時,或經加熱時,可 藉由包含後述之光聚合起始劑及/或熱聚合起始劑之聚合 引發系之作用而加成聚合,視情況產生交聯、硬化者。 關於該乙烯性不飽和化合物,為了使本實施形態之硬化 性組成物之上述調平阻力值(RL)或下流阻力值(Rs)滿足 本發明之要求,且由該硬化性組成物獲得的硬化物具有必 312XP/發明說明書(補件)/96-09/96125023 14 200811599 需之特性,可自下述中適當選擇使用。 又,該乙烯性不飽和化合物,於使用由本實施形態之石更 化性組成物獲得的硬化物作為感光性間隔件之情況下,為 達成其機械特性,較佳為含有雙鍵當量通常為4〇〇以下、 :較佳為350以下、更佳為300以下之乙烯性不飽和化合 •物。其雙鍵當量越小,即每單位重量的雙鍵越多,則所獲 得的硬化物之彈性復原率及恢復率越大。該乙烯性不飽和 化合物之雙鍵當量的下限,通常為1〇〇以上。 此處’所謂雙鍵當量,係指化合物之每1莫耳雙鍵的重 i ’其係以下述式(6)算出,每單位重量之雙鍵越多,則 雙鍵當量之值越小。 雙鍵當量=化合物之重量(g)/化合物之含有雙鍵之莫 耳數 (6/ 再者,本實施形態中,硬化性組成物總體之雙鍵當量越 小’根據與上述乙烯性不飽和化合物之雙鍵當量相同之理 由,所獲得的硬化物之彈性復原率及恢復率越大,故較 佳。具體而言,作為硬化性組成物溶解或分散於溶劑之狀 悲(以下,有時稱為「硬化組成物溶液」。)下的固形分總 體的雙鍵當量,較佳為300以下,更佳為250以下。但, 作為該硬化性組成物溶液之固形分總體的雙鍵當量之下 限,通常為10 0以上。 此處,硬化性組成物溶液中之固形分總體之雙鍵當量, 亦可藉由上述式(6),根據製備硬化性組成物時的具有乙 烯性雙鍵之化合物的投入量而進行計算。 312ΧΡ/發明說明書(補件)/96-09/96125023 15 200811599 鍵^量定硬化性組成物溶液之雙 f糟由么知之方法測定硬化性組成物之固形分濃 度’猎由下述式(7)算出。 雙鍵當量=硬化性組成物溶液之雙鍵當量X固形分濃度 3, , ,, (7) 、’述乙烯性不飽和化合物,於使用本發明之硬化性 =物作為鹼性顯影型之情況,尤佳為具有酸基。此處所 :/、有馱基」’係指具有賦予藉由Κ0Η(氫氧化鉀)之滴 =而確定之酉夂仏大於〇之值的基。具體而言’係指具有羧 土、、酚性羥基、磺酸基、磷酸基等,其中尤佳為具有羧基。 適用於本實施形態的硬化性組成物中之(A)乙婦性不飽 ^化合物的含量’相對於硬化性組成物中之總固形分,通 為25重量%以上、較佳為3〇重量%以上、更佳為4〇重 量%以上。若(A)乙烯性不飽和化合物之含量過多,則硬化 性組成物溶液之黏度變得過高,或損及硬化性,故欠佳。 另一方面,若含量過少,則有時該硬化物無法獲得充分的 機械特性。 作為該乙烯性不飽和化合物,可使用丨種或2種以上於 公知的彩色濾光片用樹脂組成物中所用之樹脂内,具有至 少1個乙烯性不飽和基之樹脂。 作為此種樹脂,例如可列舉··(曱基)丙烯酸等不飽和羧 酸與乙烯化合物之共聚物、酸改質型環氧(曱基)丙烯酸 酯、聚醯胺、聚酯、聚醚、聚胺基曱酸酯、聚乙烯丁醛、 聚乙烯醇、聚乙烯氫u比咯_、乙酸纖維素等。 312XP/發明說明書(補件)/96-09/96125023 16 200811599 該等中,就鹼性顯影性等方面而言,較佳為[4_1;|於侧 鏈具有乙稀性不飽和基之含有絲之乙烯系樹脂、[a_2] 酸改質型環氧(甲基)丙烯酸酯。 [A 1]於侧鏈具有乙稀性不飽和基之含有羧基之乙婦系樹 脂 作為本實施形態中所使用的[A_n於側鏈具有乙稀性不 乾矛基之§有缓基之乙烯系樹脂,可列舉:[A_ 1 一 1 ]含有 羧基之乙埽系樹脂與含有€氧基之不飽和化合物之反應 產物、[A-卜2]具有2種以上不飽和基之化合物與不飽和 羧酸或不飽和羧酸酯之共聚物、樹脂」。 [A-:l -1 ]合有羧基之乙烯系樹脂與含有環氧基之不飽和化 合物之反應產物 作為本實施形態中所使用的含有絲之乙烯系樹脂,具 體可列舉不飽和羧酸與乙烯化合物之共聚物。 此處,作為不飽和羧酸,例如可列舉:(甲基)丙烯酸、 巴丑酸、異巴豆酸、順丁烯二酸、順丁婦二酸肝、衣康酸、 檸康酸等。 又,作為乙烯化合物,例如可列舉:苯乙烯、α _甲基 苯乙烯、經基苯乙烯、(甲基)丙烯酸甲醋、(甲基)丙稀酸 乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(曱基) 丙烯酸戊酯、(甲基)丙烯酸己酯、(曱基)丙烯酸十二烷 酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸二環戊酯、 (甲基)丙烯酸金剛烷酯、(甲基)丙烯酸異葙酯、(甲基)丙 烯酸羥甲酯、(甲基)丙稀酸經乙醋、(甲基)丙稀酸環氧丙 312ΧΡ/發明說明書(補件)/96-09/96125023 200811599 酯、(f基)丙烯酸苄酯、(甲基)丙烯酸N,N_二甲胺基乙 醋、n-(甲基)丙烯醯味琳、(甲基)丙埽腈、(甲基)丙ς酿 胺、Ν-經f基(甲基)丙稀醯胺、Ν,Ν一二甲基(甲基)丙婦酿 胺、Ν’Ν-二甲胺基乙基(甲基)丙烯醯胺、乙酸乙烯酯等。 於含有羧基之乙稀系樹脂中,較佳為(甲基)丙稀酸醋 -(甲基)丙稀酸共聚物、苯乙烯_(曱基)丙稀酸(甲基) 丙烯酸共聚物。 於(甲基)丙烯酸酯-(甲基)丙烯酸共聚物中,更佳為含 有5〜80莫耳%(甲基)丙烯酸酯以及2〇〜95莫耳%(甲基) 丙烯酸之共聚物,尤佳為含有10〜90莫耳%(曱基)丙烯酸 酯以及10〜90莫耳%(甲基)丙烯酸之共聚物。 又,於苯乙烯-(甲基)丙烯酸酯一(甲基)丙烯酸共聚物 中’更佳為含有3〜60莫耳%苯乙烯、1〇〜莫耳%(甲基) 丙烯酸酯以及10〜60莫耳%(甲基)丙烯酸之共聚物,尤佳 為含有5〜50莫耳。/◦苯乙烯、20〜60莫耳%(甲基)丙烯酸 酯以及15〜55莫耳%(甲基)丙烯酸之共聚物。 又’該等含有叛基之乙烯系樹脂之酸價,係根據與該等 反應的含有壤氧基之不飽和化合物之量及於所獲得的反 應產物中所必需的酸價而進行調整者,通常為5〇 mg - KOH/g〜500 mg-KOH/g。含有羧基之乙烯系樹脂之標準 聚苯乙烯換算的重量平均分子量(Mw),較佳為1,〇〇〇〜 300, 000 0 再者’重量平均分子量(Mw)係,藉由凝膠滲透層析法 (Gel Permeation Chromatography,GPC),作為換算成標 312XP/發明說明書(補件)/96-09/96125023 18 200811599 準聚苯乙烤的分子量而測定。 又作為該含有環氧基之不飽和化合物,τ列舉含有脂肪 族環氧基之不飽和化合物及含有脂環式環氧基之不飽和 化合物,作為該含有脂肪族環氧基之不飽和化合物,例如 可列舉:婦丙基環氧丙基輕、(甲基)丙烯酸環氧丙醋、(甲 基)丙烯酸α -乙基環氧丙酯、巴豆酸環氧丙酯、異巴豆 酸裱氧丙酯、巴五醯基環氧丙基醚、衣康酸單烷酯單環氧 丙酯、反丁烯二酸單烷酯單環氧丙酯、順丁烯二酸單烷酯 單環氧丙酯等。 又,作為含有脂環式環氧基之不飽和化合物,例如可列 舉:(甲基)丙烯酸3, 4-環氧環己基甲酯、(甲基)丙烯酸 2, 3-環氧環戊基甲酯、(甲基)丙烯酸7 [5.2.L0]癸-2-基]氧甲醋等。 " 含有羧基之乙烯系樹脂與含有環氧基之不飽和化合 物,以如下之量比進行反應,5莫耳%〜9〇莫耳%之含有羧 基之乙烯系樹脂所具有的羧基、較佳為3〇〜7〇莫耳%左右 之含有環氧基之不飽和化合物。再者,反應可藉由公知之 方法實施。 [A-1 -1 ]含有羧基之乙浠系樹脂與含有環氧基之不飽和 化合物的反應產物之酸價,較佳為3〇 mg-K〇H/g〜25〇 mg-KOH/g。又,標準聚苯乙烯換算之重量平均分子量(Mw) 較佳為 1,000 〜300, 〇〇〇。 [A-1 -2 ]具有2種以上不飽和基之化合物與不飽和羧酸 或不飽和羧酸酯之共聚物 312XP/發明說明書(補件)/96-09/96125023 19 200811599 作為[A-l]於側鏈具有乙烯性不飽和基之含有羧基之乙 烯系樹脂,亦可列舉具有2種以上不飽和基之化合物、與 不飽和羧酸或不飽和羧酸酯之共聚物。 作為該具有2種以上不飽和基之化合物,例如可列舉: ··(曱基)丙烯酸烯丙酯、(曱基)丙烯酸3-烯丙氧基-2-羥丙 ; 酯、(甲基)丙烯酸桂皮酯、(甲基)丙烯酸巴豆酯、(曱基) 丙烯酸甲基烯丙酯、N,N-二烯丙基(曱基)丙烯醯胺、(曱 基)丙烯酸乙烯酯、(曱基)丙烯酸丨一氯乙烯酯、(甲基)丙 稀酸2 -苯基乙烯酯、(甲基)丙烯酸1 —丙烯酯、巴豆酸乙 _酯、乙婦基(曱基)丙烯醯胺等。 作為該不飽和叛酸或不飽和羧酸醋,例如可列舉(曱基) 丙烯酸或(曱基)丙烯酸酯等。 具有2種以上不飽和基之化合物於共聚物總體中所占 之比例’為10莫耳%〜90莫耳%、較佳為30莫耳%〜80莫 耳%左右。 [A-1-2]具有2種以上不飽和基之化合物與不飽和羧酸 • 或不飽和羧酸酯之共聚物的酸價,較佳為3〇 mg—K〇H/g〜 250 mg-KOH/g。又,標準聚苯乙烯換算之重量平均分子量 (Mw),較佳為 1,〇〇〇 〜3〇〇, 〇〇〇。 [A-1-3]「E-R-N-T 樹脂」 所謂E-R-N-T樹脂,係將5莫耳%〜90莫耳。/Q「(E)成分: 含有環氧基之(曱基)丙烯酸酯」、與1〇莫耳%〜95莫耳% 「(R)成分·可與(E)成分共聚合的其他自由基聚合性化合 物」進行共聚合,於10莫耳%〜1〇〇莫耳%之所獲得的共 312ΧΡ/發明說明書(補件)/96-09/96125023 20 200811599 m所t的環氧基上加成「(n)成分:不飽和—元酸」, A上Λ、:「%〜1〇°莫耳%之加成上述(N)成分時所生成的經 土加成⑺成分··多元酸酐」而得之樹脂。 ::該⑻成分:含有環氧基之(甲基)丙烯酸醋,例如 产列牛.(甲基)丙烯酸環氧丙酉旨、(甲基)丙稀酸3,4一環 乳η旨、(甲基)丙婦酸(3, 4一環氧環己基)甲酉旨、(甲幻 丙婦酉夂4红丁 gB &氧丙基醚等。其中較佳為(甲基)丙稀 ,環氧_。該#⑻成分’可單獨使用!種,亦可以任 意之組合及比率並用2種以上。 (E)成分與(R)成分之共聚物十的(E)成分之共聚合比 例如上述,通常為5莫耳%以上、較佳為2〇莫耳%以上、 更佳為30莫耳%以上。又,通常為9〇莫耳%以下、較佳為 80莫耳%以下、更佳為7〇莫耳%以下。此處,(“成分係, 可與(E)成分共聚合的其他自由基聚合性化合物。 右(E)成分之共聚合比例過多,則存在({^成分減少,耐The amount (Mw) is preferably 5,000 or more, and the refractory helmet is nnnn, and the L L is more than 1,000,000, and more preferably ι5 〇〇〇 or more. In this case, the acid value is preferably 20 or more, and more preferably 4 or more and 60 or more. As the high-viscosity binder resin, it can be described as (4) ethylene non-312XP/invention specification (supplement)/96-09/96125023 12 200811599 saturated compound, or (8) resin having no ethylenic unsaturated group. More preferably, it is selected from the group consisting of [A-1] a vinyl group-containing resin having an ethylenically unsaturated group in the side chain and (8) a resin having no ethyl group and a group. (b) Using a highly viscous polymerizable monomer. Here, the high-viscosity polymerizable monomer may, for example, be a monomer having a viscosity of preferably 10 mPa·s or more, more preferably 100 mPa·s or more, and still more preferably i mp a s or more. As the polymerizable monomer having a high viscosity, it is preferable that the polymerizable monomer (c) described later has two or more ethylenically unsaturated groups from the viewpoint of polymerizability and crosslinkability. The compound, more preferably a compound having three or more ethylenically unsaturated groups, is selected. Further, by adding a small amount of a polymerizable monomer having a viscosity of more than 1,000,000 mpa.s, the various properties of the curable composition are not changed, and only the method of controlling the viscosity is preferable. (C) Use a solvent with a high viscosity. Here, the solvent having a high viscosity is preferably a solvent having a viscosity of preferably 1 mPa·s or more, more preferably 1 · 2 mPa · S or more, and still more preferably 1 · 5 fflPa · s or more. However, the solvent is not selected only in terms of viscosity, but also in accordance with the balance of various materials such as materials used, solubility, vapor pressure, drying speed, and odor. [3] The constituents and compositions of the curable composition are not particularly limited as long as they are applied to the curable composition of the present embodiment, and the components of the following components (A) to (D) and, if necessary, may be blended as needed. 312XP/Invention Manual (Supplement)/96-09/96125023 13 200811599 Other components ((E) component to (η) component) are obtained. Hereinafter, each component will be described. Knife edge (A) ethylenically unsaturated compound (B) photopolymerization initiator and / or thermal polymerization initiator · (C) polymerizable monomer, (D) solvent other components (E) epoxy compound (F) The amine-based compound (G) surfactant (Η) is a resin which does not have an ethylenically unsaturated group. In the present embodiment, the term "(meth)acrylic acid" means "acrylic acid and/or methacrylic acid". Further, the term "total solid content" means the total amount of components of the curable composition from which the solvent is removed. (A) Ethylene unsaturated compound (Ethylene used in the curable composition of the present embodiment: an unsaturated compound having at least one radically polymerizable ethylenically unsaturated bond in the molecule, The radically polymerizable ethylenically unsaturated bond may be a polymerization initiating system containing a photopolymerization initiator and/or a thermal polymerization initiator described later when the curable composition is irradiated with active light or when heated. The effect is additive polymerization, and cross-linking and hardening occur depending on the situation. In the ethylenically unsaturated compound, the leveling resistance value (RL) or the downflow resistance value (Rs) of the curable composition of the present embodiment satisfies the requirements of the present invention, and the hardening obtained from the curable composition is hardened. The product has the characteristics of 312XP / invention manual (supplement) / 96-09/96125023 14 200811599, which can be appropriately selected from the following. Further, in the case where the cured product obtained from the stone-reforming composition of the present embodiment is used as the photosensitive spacer, the ethylenically unsaturated compound preferably has a double bond equivalent of 4 in order to achieve mechanical properties. 〇〇 The following: an ethylenically unsaturated compound which is preferably 350 or less, more preferably 300 or less. The smaller the double bond equivalent, that is, the more double bonds per unit weight, the greater the elastic recovery rate and recovery rate of the hardened material obtained. The lower limit of the double bond equivalent of the ethylenically unsaturated compound is usually 1 Å or more. Here, the term "double bond equivalent" means that the weight i' of every 1 mole of the double bond of the compound is calculated by the following formula (6), and the more the double bond per unit weight, the smaller the value of the double bond equivalent. Double bond equivalent = weight of compound (g) / mole number of double bond containing compound (6 / Further, in the present embodiment, the smaller the double bond equivalent of the entire curable composition is 'according to the above-mentioned ethylenic unsaturated The reason why the double bond equivalent of the compound is the same is preferable because the elastic recovery rate and the recovery rate of the obtained cured product are larger. Specifically, the curable composition is dissolved or dispersed in a solvent (hereinafter, sometimes The double bond equivalent of the solid portion under the so-called "hardened composition solution" is preferably 300 or less, more preferably 250 or less. However, as a solid bond of the hardenable composition solution, the double bond equivalent is The lower limit is usually 10 or more. Here, the double bond equivalent of the solid content in the hardening composition solution may be an ethylenic double bond according to the above formula (6) according to the formula (6). The amount of the compound is calculated and calculated. 312ΧΡ/Invention Manual (Supplement)/96-09/96125023 15 200811599 The amount of the solid component of the hardenable composition is determined by the method of the method. The hunting is calculated by the following formula (7): double bond equivalent = double bond equivalent of the hardening composition solution X solid concentration 3, ,,, (7), 'described ethylenically unsaturated compound, using the hardening of the present invention Where the substance is an alkali-developing type, it is particularly preferable to have an acid group. Here, //, a fluorenyl group means that the enthalpy determined by giving a drop of Κ0Η (potassium hydroxide) is larger than The term "specifically" means a carboxylate, a phenolic hydroxyl group, a sulfonic acid group, a phosphoric acid group, etc., and particularly preferably a carboxyl group. It is suitable for use in the curable composition of the present embodiment (A) The content of the compound of the feminine compound is '25% by weight or more, preferably 3% by weight or more, more preferably 4% by weight or more, based on the total solid content in the curable composition. A) When the content of the ethylenically unsaturated compound is too large, the viscosity of the curable composition solution is too high or the curability is deteriorated, which is not preferable. On the other hand, if the content is too small, the cured product may not be obtained. Sufficient mechanical properties. As the ethylenically unsaturated compound, hydrazine can be used. And a resin having at least one ethylenically unsaturated group in the resin used in the resin composition for a known color filter. Examples of such a resin include (meth)acrylic acid. Copolymer of saturated carboxylic acid and ethylene compound, acid-modified epoxy (mercapto) acrylate, polyamine, polyester, polyether, polyamino phthalate, polyvinyl butyral, polyvinyl alcohol, poly Ethylene hydrogen ratio _, cellulose acetate, etc. 312XP / invention manual (supplement) / 96-09/96125023 16 200811599 In the above, in terms of alkali developability, etc., it is preferably [4_1; A wire-containing vinyl resin having an ethylenically unsaturated group and a [a_2] acid-modified epoxy (meth) acrylate. [A1] A vinyl group-containing resin having a carboxyl group having an ethylenically unsaturated group in the side chain is used as an ethylene group in the present embodiment as used in the present embodiment [A_n has a vinyl group in the side chain The resin may, for example, be a reaction product of an ethyl hydrazine resin having a carboxyl group and an unsaturated compound containing an oxy group, [A-Bu 2] a compound having two or more kinds of unsaturated groups and an unsaturated group. Copolymer or resin of carboxylic acid or unsaturated carboxylic acid ester. [A-:l-1] The reaction product of the carboxyl group-containing vinyl resin and the epoxy group-containing unsaturated compound is the silk-containing vinyl resin used in the present embodiment, and specific examples thereof include an unsaturated carboxylic acid and a copolymer of a vinyl compound. Here, examples of the unsaturated carboxylic acid include (meth)acrylic acid, barley acid, isocrotonic acid, maleic acid, cis-butanoic acid liver, itaconic acid, and citraconic acid. Further, examples of the vinyl compound include styrene, α-methylstyrene, styrene styrene, methyl methacrylate, ethyl (meth) acrylate, and propyl (meth) acrylate. , (butyl) (meth) acrylate, amyl (meth) acrylate, hexyl (meth) acrylate, dodecyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, (methyl Dicyclopentyl acrylate, adamantyl (meth) acrylate, isodecyl (meth) acrylate, hydroxymethyl (meth) acrylate, (meth) acrylate, ethyl acetate, (methyl) propyl Dilute acid propylene 312 ΧΡ / invention specification (supplement) / 96-09/96125023 200811599 ester, (f-) benzyl acrylate, (meth) acrylate N, N dimethyl acetamide, n- (a Base) propylene oxime, (meth) acrylonitrile, (meth) propylamine, hydrazine-f-based (meth) acrylamide, hydrazine, hydrazine monomethyl (meth) propyl Emulsion amine, Ν'Ν-dimethylaminoethyl (meth) acrylamide, vinyl acetate, and the like. Among the ethylenic resins containing a carboxyl group, a (meth)acrylic acid-(meth)acrylic acid copolymer and a styrene-(mercapto)acrylic acid (meth)acrylic acid copolymer are preferred. More preferably, in the (meth) acrylate-(meth)acrylic acid copolymer, a copolymer containing 5 to 80 mol% of (meth) acrylate and 2 〇 to 95 mol% of (meth)acrylic acid. More preferably, it is a copolymer containing 10 to 90 mol% of (meth) acrylate and 10 to 90 mol% of (meth)acrylic acid. Further, in the styrene-(meth)acrylate-(meth)acrylic acid copolymer, it is more preferable to contain 3 to 60 mol% of styrene, 1 〇 to mol% (meth) acrylate, and 10 to 10 A copolymer of 60 mole % (meth)acrylic acid, particularly preferably containing 5 to 50 moles. / styrene, 20 to 60 mole % (meth) acrylate and 15 to 55 mole % (meth) acrylic acid copolymer. Further, the acid value of such a vinyl group-containing resin is adjusted according to the amount of the phosphotium-containing unsaturated compound reacted with the reaction and the acid value necessary for the obtained reaction product. It is usually 5 〇 mg - KOH / g ~ 500 mg - KOH / g. The standard polystyrene-equivalent weight average molecular weight (Mw) of the carboxyl group-containing vinyl resin is preferably 1, 〇〇〇~300, 000 0 and the 'weight average molecular weight (Mw) system, by gel permeation layer Gel Permeation Chromatography (GPC) was measured as the molecular weight of the standard 312XP/invention specification (supplement)/96-09/96125023 18 200811599 quasi-polystyrene baking. Further, as the epoxy group-containing unsaturated compound, τ includes an aliphatic epoxy group-containing unsaturated compound and an alicyclic epoxy group-containing unsaturated compound as the aliphatic epoxy group-containing unsaturated compound. For example, propylene propyl epoxy propyl, (meth)acrylic acid propylene vinegar, (meth)acrylic acid α-ethyl epoxypropyl acrylate, crotonyl butyl acrylate, isocrotonate oxime Ester, barium decyl epoxy propyl ether, itaconic acid monoalkyl ester monoglycidyl ester, fumaric acid monoalkyl ester monoglycidyl ester, maleic acid monoalkyl ester monoepoxypropyl Ester and the like. Further, examples of the unsaturated compound containing an alicyclic epoxy group include 3,4-epoxycyclohexylmethyl (meth)acrylate and 2,3-epoxycyclopentyl (meth)acrylate. Ester, (meth)acrylic acid 7 [5.2.L0] indol-2-yl] oxymethyl vinegar and the like. " The carboxyl group-containing vinyl resin and the epoxy group-containing unsaturated compound are reacted in the following ratio, and a carboxyl group of a carboxyl group-containing vinyl resin of 5 mol% to 9 mol% is preferably used. It is an epoxy group-containing unsaturated compound of about 3 〇 to 7 〇 mol%. Further, the reaction can be carried out by a known method. [A-1 -1 ] The acid value of the reaction product of the ethylenic resin containing a carboxyl group and the unsaturated compound containing an epoxy group is preferably 3 〇 mg-K 〇 H / g 〜 25 〇 mg-KOH / g . Further, the weight average molecular weight (Mw) in terms of standard polystyrene is preferably 1,000 to 300, 〇〇〇. [A-1 -2] Copolymer of a compound having two or more kinds of unsaturated groups and an unsaturated carboxylic acid or an unsaturated carboxylic acid ester 312XP / Invention specification (supplement) / 96-09/96125023 19 200811599 As [Al] The carboxyl group-containing vinyl resin having an ethylenically unsaturated group in the side chain may be a compound having two or more kinds of unsaturated groups and a copolymer with an unsaturated carboxylic acid or an unsaturated carboxylic acid ester. Examples of the compound having two or more kinds of unsaturated groups include: ·(mercapto)acrylic acid allyl ester, (mercapto)acrylic acid 3-allyloxy-2-hydroxypropionate; ester, (meth) Cinnamyl acrylate, crotonyl (meth)acrylate, methylallyl (meth) acrylate, N,N-diallyl (mercapto) acrylamide, vinyl (mercapto) acrylate,丨 chlorovinyl acrylate, 2-phenylvinyl (meth) acrylate, 1-propenyl (meth) acrylate, ethyl crotonate, ethenyl (decyl) acrylamide. Examples of the unsaturated ortho-acidic or unsaturated carboxylic acid vinegar include (mercapto)acrylic acid or (fluorenyl)acrylate. The ratio of the compound having two or more kinds of unsaturated groups to the total amount of the copolymer is from 10 mol% to 90 mol%, preferably from about 30 mol% to about 80 mol%. [A-1-2] The acid value of the copolymer of the compound having two or more kinds of unsaturated groups and the unsaturated carboxylic acid or unsaturated carboxylic acid ester is preferably 3 〇 mg - K 〇 H / g 〜 250 mg - KOH / g. Further, the weight average molecular weight (Mw) in terms of standard polystyrene is preferably 1, 〇〇〇 〜 3 〇〇, 〇〇〇. [A-1-3] "E-R-N-T resin" The so-called E-R-N-T resin is 5 mol% to 90 mol. /Q "(E) component: an epoxy group-containing (mercapto) acrylate", and 1 mol% % to 95 mol % "(R) component · other radicals copolymerizable with (E) component The polymerizable compound is copolymerized and added to the epoxy group of 312 ΧΡ/invention specification (supplement)/96-09/96125023 20 200811599 m obtained at 10 mol% to 1 mol%. "(n) component: unsaturated-acidic acid", A upper Λ, "%~1 〇 °% molar addition of the above-mentioned (N) component produced by the addition of (7) component · polybasic anhydride The resin that comes with it. :: The component (8): an epoxy group-containing (meth)acrylic acid vinegar, for example, a cow, a (meth)acrylic acid acrylonitrile, a (meth)acrylic acid 3,4 ringworm η, ( Methyl) propyl benzoic acid (3, 4-epoxycyclohexyl) methyl hydrazine, (M-Ming 酉夂 酉夂 4 red butyl gB & oxypropyl ether, etc. Among them, preferably (meth) propylene, Epoxy _. The #(8) component can be used singly or in combination of two or more kinds in any combination and ratio. The copolymerization ratio of the component (E) of the copolymer (E) and the component (R) is, for example, The above is usually 5 mol% or more, preferably 2 mol% or more, more preferably 30 mol% or more. Further, it is usually 9 mol% or less, preferably 80 mol% or less, and more preferably It is preferably 7 〇 mol% or less. Here, ("component system, other radical polymerizable compound copolymerizable with (E) component. If the right (E) component has too much copolymerization ratio, there is ({^ component Reduce, resist

熱性或強度降低之傾向。若(E)成分之共聚合比例過少, 則存在聚合性成分及鹼可溶性成分之加成量變得不充分 之傾向。 另一方面,(E)成分與(R)成分之共聚物中的(R)成分之 共聚合比例,如上述,為10莫耳%以上、較佳為2〇莫耳% 以上、更佳為30莫耳%以上。又,通常為g5莫耳%、較佳 為80莫耳%以下、更佳為70莫耳%以下。若(R)成分之共 聚合比例過多,則存在(E)成分減少,聚合性成分及驗可 溶性成分之加成量變得不充分之傾向。又,若成分之 312XP/發明說明書(補件)/96-09/96125023 21 200811599 共聚合比例過少,則存在耐 此處,作為⑻成分,例如,=二低之傾向。 酯。 [化1 式()表不之部分構造之單(甲基)丙稀酸The tendency to reduce heat or strength. When the copolymerization ratio of the component (E) is too small, the amount of addition of the polymerizable component and the alkali-soluble component tends to be insufficient. On the other hand, the copolymerization ratio of the (R) component in the copolymer of the component (E) and the component (R) is, as described above, 10 mol% or more, preferably 2 mol% or more, more preferably 30% or more. Further, it is usually g5 mol%, preferably 80 mol% or less, more preferably 70 mol% or less. When the copolymerization ratio of the (R) component is too large, the component (E) is decreased, and the amount of addition of the polymerizable component and the insoluble component tends to be insufficient. Further, if the copolymerization ratio of the component 312XP/invention specification (supplement)/96-09/96125023 21 200811599 is too small, there is a tendency that the component (8) is, for example, = two low. ester. a single (meth)acrylic acid of a part of the formula ()

(式(13)中’ Rid〜R6d ’分別獨立表示氣原子或者甲基、 乙基:丙基等碳數為卜3的炫基,R7d以及R8d,分別獨立 t 丁^^子ί者曱基、乙基、丙基等碳數為1〜3的烷基。 、 ” R可連結形成環。广與R8d連結形成之環,較 :仏為舳肪私%,飽和或不飽和均可,較佳為碳數為5〜6。) 於上述式(13)中,較佳為具有以下述式(14)、式(15)、 或式(16)表示之構造的單(曱基)丙烯酸酯。可藉由導入該 等部分構造,而增加單(曱基)丙烯酸酯之耐熱性或強度。 再者,該等單(曱基)丙烯酸酯,可使用1種,亦可以任章 之組合及比率並用2種以上。 [化2] 312XP/發明說明書(補件)/96-09/96125023 22 (14) 200811599(In the formula (13), ' Rid~R6d ' independently represent a gas atom or a methyl group, an ethyl group: a propyl group such as a propyl group, and R7d and R8d are independently independent. An alkyl group having a carbon number of 1 to 3 such as an ethyl group or a propyl group, and "R" may be bonded to form a ring. The ring formed by the connection with R8d is more than: % is saturated or unsaturated, or saturated or unsaturated. Preferably, the carbon number is 5 to 6. In the above formula (13), a mono(indenyl) acrylate having a structure represented by the following formula (14), formula (15), or formula (16) is preferred. The heat resistance or strength of the mono(indenyl) acrylate can be increased by introducing the partial structures. Further, the mono(indenyl) acrylate can be used alone or in combination. Two or more ratios are used in combination. [Chem. 2] 312XP/Invention Manual (supplement)/96-09/96125023 22 (14) 200811599

(15) (16) 作為具有以上述式(13)表示之部分構造的單(曱基)丙 烯酸酯,可使用公知之各種者,尤佳為以下式(17)表示者。 [化3] R如 (17) H2C=Lro—RlOd Ο (式(Π)中,R9d表示氫原子或甲基,RlDd表示上 (13) 〇 ) 八 本實施形態中’(E)成分與(R)成分之共聚物中之具有以 j述式U3)表示之部分構造的單(甲基)丙烯酸酯之含 置,通常為5莫耳%以上、較佳為1〇莫耳%以上、更佳為 15莫耳%以上。又,通常為9〇莫耳%以下、較佳為^莫 312XP/發明說明書(補件)/96-09/96125023 〇3 200811599 耳%以下、更佳為50莫耳%以下。 (二E!成二與⑻成分之共聚物中之以式(13)表示的單 又Λ 之含量過少,則存在耐熱性不足之傾向。 右以/ 13)表不之單(甲基)丙烯酸酯之含量過多,則 ^在更化f生組成物之成分彼此的相容性變差之傾向,可能 引起制膜時的白化等。 又,本實施形態中,作為〇〇成分,可列舉如以下所示, 除具有以上述式(13)表示之部分構造的單(曱基)丙婦酸 酯以外之自由基聚合性化合物。 具體而言,例如可列舉··苯乙稀,·苯乙稀之α、鄰、 間、對烷基,硝基,氰基,醯胺,酯衍生物;丁二烯、2, 3一 二甲基丁二烯、異戊二烯、氯丁二烯等二烯; (曱基)丙烯酸曱酯、(曱基)丙烯酸乙酯、(曱基)丙烯酸 正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲 基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(曱基)丙 烯酸戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸異戊酯、 (甲基)丙婦酸己酯、(曱基)丙烯酸2 -乙基己酯、(曱基) 丙烯酸月桂酯、(曱基)丙烯酸十二烷酯、(曱基)丙烯酸環 戊酯、(曱基)丙烯酸環己酯、(曱基)丙烯酸2-曱基環己 酯、(曱基)丙烯酸二環己酯、(曱基)丙烯酸異萡酯、(曱 基)丙烯酸金剛烷酯、(曱基)丙烯酸烯丙酯、(曱基)丙稀 酸炔丙酯、(甲基)丙烯酸苯酯、(曱基)丙烯酸萘酯、(甲 基)丙烯酸蒽酯、(曱基)丙烯酸蒽醌酯、(曱基)丙烯酸向 曰葵酯、(曱基)丙烯酸柳酯、(曱基)丙烯酸呋喃酯、(甲 312ΧΡ/發明說明書(補件)/96-09/96125023 24 200811599 基)丙烯酸糠酯、(甲基)丙烯酸四氫呋喃酯、(甲基)丙烯 酸哌喃酯、(甲基)丙烯酸苄酯、(曱基)丙烯酸苯乙酯、(甲 基)丙烯酸甲苯酯、(甲基)丙烯酸-1,1,;[—三氟乙酯、(甲 基)丙細酸全氟乙醋、(曱基)丙烯酸全氟正丙醋、(曱基) : 丙細酸全氟異丙醋、(曱基)丙烯酸三苯基曱醋、(曱基) ; 丙烯酸異丙苯酯、(甲基)丙烯酸3-(N, N-二甲胺基)丙醋、 (曱基)丙烯酸-2-备乙酯、(曱基)丙烯酸—2-經丙醋等(曱 基)丙烯酸酯; (曱基)丙稀醯胺、(曱基)丙稀N,N-二曱基驢胺、(曱基) 丙烯N,N-二乙基醯胺、(曱基)丙烯N,N 一二丙基醯胺、(甲 基)丙烯N,N-一異丙基醯胺、(曱基)丙烯蒽基醯胺等(曱 基)丙烯醯胺;(甲基)丙烯醯苯胺、(曱基)丙烯醯腈、丙 烯醛、氯乙烯、偏二氯乙烯、氟乙烯、偏二氟乙烯、N— 乙烯氫吡咯酮、乙烯吡啶、乙酸乙烯酯等乙烯化合物; #康酸二乙酯、順丁烯二酸二乙酯、反丁烯二酸二乙 、、衣康酸一乙醋專不飽和二羧酸二酯;N-苯基順丁稀二 :醯亞胺、N—環己基順丁烯二醯亞胺、N-月桂基順丁烯二醯 亞胺、N_(4-羥基苯基)順丁烯二醯亞胺等單順丁烯二醯亞 胺;N-(甲基)丙稀醯基鄰苯二曱醯亞胺等。 該等中,為了賦予更優異的耐熱性及強度,有效的是使 用自苯乙烯、(甲基)丙烯酸苄酯及單順丁烯二醯亞胺中所 選擇的至少1種作為(R)成分。 該情況下,自苯乙烯、(甲基)丙烯酸苄酯及單順丁烯二 醯亞胺中所選擇的至少一種之共聚合比例,通常為丨莫耳 312XP/發明說明書(補件)/96-09/96125023 25 200811599 %以上、較佳為3莫耳%以上 較佳為5 0莫耳%以下。 又,通常為70莫耳%以下、 繼而’作為於⑻成分與⑻成分之共聚物中所含 上加成之⑻成分(不飽和—元酸),可❹公知者。\乍; 此種不飽和-元酸,例如可列舉:(甲基)丙稀酸、巴豆酸、 異巴丑酸、順丁烯二酸、順丁婦二 ^ ^ ^ 耵衣康齩、柃康酸 荨具有乙烯性不飽和雙鍵之不飽和羧酸。 该荨(N)成分,可單獨你用彳播 __ t…田9從 早獨使用1種,亦可以任意之組合及 比率並用2種以上。 進而,使(N)成分加成於⑻成分與(R)成分之共聚合反 應以中所獲得的共聚物中所含之環氧基上。於共聚物上:成 (N)成分之量,加成至上述共聚物中所含的環氧基之 耳%、較佳為30莫耳%以上、更佳為50莫耳%以上。若⑻ 加成比例過少,則存在經時穩定性降低等、由於殘 存%氧基而產生的不良影響之傾向。 八再者、’作為於⑻成分與⑻成分之共聚物上加成⑻成 刀之方法,可採用公知之方法。 、、鏖而使(τ)成分(多元酸酐)加成於,於(E)成分與(R) 成刀U物上加成(N)成分時所生成的經基上。作為多 兀酉夂酐’並無特別限定,可使用公知者。作為其具體例, :列舉.琥轴酸酐、順丁烯二酸酐、衣康酸if、四氫鄰苯 二甲酸::曱基四氫鄰苯二甲酸酐、六氫鄰苯二曱酸酐、 甲基::鄰苯二甲酸酐、曱基内亞甲基四氫鄰苯二曱酸 肝 '鄰苯、氣橋料飽和或不飽和二㈣之酸 312XP/發明說明書(補件)/96-09/96125023 26 200811599 酐;偏苯三甲酸酐;均苯四甲酸酐、二苯基酮四羧酸酐、 聯苯四羧酸酐、聯苯醚四羧酸酐、丨,2, 3, 4_丁烷四羧酸酐 等四羧酸之酸酐等。該等(T)成分,可單獨使用j種,亦 可以任意之組合及比率並用2種以上。 加成之(T)成分之量,係於(E)成分與(R)成分之共聚物 上加成(N)成分時所生成的羥基之通常為1〇莫耳%二上、 較佳為20莫耳%以上、更佳為30莫耳%以上。又,通常為 100莫耳%以下、較佳為90莫耳%以下、更佳為8〇莫耳% 以下。 、 若(T)成分之加成量過多,則存在顯影時之殘膜率降低 之傾向。若(T)成分之加成量過少,則存在溶解性變得不 充分之傾向。 又,作為於(E)成分與(R)成分之共聚合物上加成(N)成 刀日守所生成的羥基上加成(T)成分之方法,可任意採用公 知之方法。 EHT樹脂’可藉由於⑺成分加成後所生成的幾基 之部分上,進一步加成(甲基)丙烯酸環氧丙酯或且有 合性不飽和基之環氧丙㈣化合物,而進一步 度。 再者,作為上述E-R-N-T樹脂,例如可列舉曰本專利特 開平8-29讓號公報或特開驗,挪號公報所揭示之 樹脂。 又’上述E-R-N-T樹脂之平均分子量,並無特別限定, 乍為藉由GPC測定的換算成標準聚苯乙烯之重量平均分 312XP/發明說明書(補件)/96-09/96125023 0Ί 200811599 子量(Mw),通常為3, 〇〇〇以上、較佳為5,〇〇〇以上,又,(15) (16) As the mono(indenyl) acrylate having a partial structure represented by the above formula (13), various known ones can be used, and those represented by the following formula (17) are particularly preferable. R (17) H2C = Lro - RlOd Ο (In the formula (R), R9d represents a hydrogen atom or a methyl group, and R1Dd represents an upper (13) 〇) In the eighth embodiment, the '(E) component and The content of the mono(meth)acrylate having a partial structure represented by the formula U3) in the copolymer of the component R) is usually 5 mol% or more, preferably 1 mol% or more, more preferably The best is 15% or more. Further, it is usually 9 〇 mol% or less, preferably 莫 312XP/invention specification (supplement)/96-09/96125023 〇3 200811599 ear% or less, more preferably 50% by mole or less. (The content of the mono-xanthene represented by the formula (13) in the copolymer of the two E! bis and (8) components tends to be insufficient, and the heat resistance is insufficient. The right (13) is represented by the single (meth)acrylic acid. When the content of the ester is too large, the compatibility of the components of the composition of the composition of the composition is deteriorated, and whitening or the like at the time of film formation may occur. In the present embodiment, a radical polymerizable compound other than mono(indenyl)glycolate having a partial structure represented by the above formula (13) is exemplified as the oxime component. Specific examples include, for example, styrene, α, o-, m-, p-alkyl, nitro, cyano, decyl, ester derivatives; butadiene, 2, 3, 2 Diene such as methylbutadiene, isoprene, chloroprene; decyl acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, (meth) acrylate Propyl ester, n-butyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, neopentyl (meth)acrylate, Isoamyl methacrylate, hexyl (methyl) propyl acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, dodecyl (mercapto) acrylate, (曱Cyclopentyl acrylate, cyclohexyl (decyl) acrylate, 2-mercaptocyclohexyl (decyl) acrylate, dicyclohexyl (decyl) acrylate, isodecyl (decyl) acrylate, (曱Adamantyl acrylate, allyl (mercapto) acrylate, propargyl (meth) acrylate, phenyl (meth) acrylate, ) naphthyl acrylate, decyl (meth) acrylate, decyl acrylate, decyl acrylate to eugenol, decyl acrylate, furyl acrylate, (a) 312ΧΡ/Invention Manual (supplement)/96-09/96125023 24 200811599 base) decyl acrylate, tetrahydrofurfuryl (meth) acrylate, methyl methacrylate, benzyl (meth) acrylate, Benzyl acrylate, toluene (meth)acrylate, (meth)acrylic acid-1,1,;[-trifluoroethyl ester, (methyl)propionic acid perfluoroacetic acid, (decyl)acrylic acid Fluorinated vinegar, (fluorenyl): perfluoroisopropyl isopropyl acrylate, triphenyl sulfonate (mercapto) acrylate, (fluorenyl); cumene acrylate, 3-(N) , N-dimethylamino) propyl vinegar, 2-ethylidene ethyl (meth) acrylate, (mercapto) acrylic acid - 2-(propyl) acrylate, etc.; (mercapto) acrylamide , (mercapto) propylene N,N-didecyl decylamine, (fluorenyl) propylene N,N-diethyl decylamine, (mercapto) propylene N,N-dipropyl hydrazine , (meth) propylene N,N-isopropyl isopropyl amide, (fluorenyl) propylene decyl amide or the like (mercapto) acrylamide; (meth) acryl anilide, (mercapto) acrylonitrile , acrolein, vinyl chloride, vinylidene chloride, vinyl fluoride, vinylidene fluoride, N-vinyl hydropyrrolidone, vinyl pyridine, vinyl acetate and other vinyl compounds; #康酸 diethyl, maleic acid II Ethyl ester, diethyl fumarate, itaconic acid monoethyl acrylate monounsaturated dicarboxylic acid diester; N-phenyl cis-butyl diamide: quinone imine, N-cyclohexyl-n-butylene A mono-n-butenylene imine such as an amine, N-lauryl maleimide, N-(4-hydroxyphenyl) maleimide or the like; N-(methyl) acrylonitrile Benzodiazepine and the like. In order to impart more excellent heat resistance and strength, it is effective to use at least one selected from the group consisting of styrene, benzyl (meth) acrylate, and mono-n-butylene diimide as the (R) component. . In this case, the copolymerization ratio of at least one selected from the group consisting of styrene, benzyl (meth) acrylate, and mono-n-butylene diimide is usually 丨 Moer 312XP / invention specification (supplement) / 96 -09/96125023 25 200811599% or more, preferably 3 mol% or more, preferably 50 mol% or less. Further, it is usually 70 mol% or less, and then the component (8) (unsaturated-carboxylic acid) which is added to the copolymer of the component (8) and the component (8) can be known. \乍; Such an unsaturated-acid acid, for example, (meth)acrylic acid, crotonic acid, iso-baric acid, maleic acid, cis-butan 2 ^ ^ 耵衣康齩, 柃An anhydrous carboxylic acid having an ethylenically unsaturated double bond. The 荨(N) component can be used alone. __ t... Tian 9 can be used alone or in combination of two or more types. Further, the component (N) is added to the epoxy group contained in the copolymer obtained by the copolymerization reaction of the component (8) and the component (R). In the copolymer, the amount of the (N) component is added to the ear % of the epoxy group contained in the copolymer, preferably 30 mol% or more, more preferably 50 mol% or more. When the addition ratio of (8) is too small, there is a tendency that the stability is deteriorated with time and the like, and the adverse effect is caused by the residual % oxygen. Further, as a method of adding (8) a copolymer to the copolymer of the component (8) and the component (8), a known method can be employed. Further, the (τ) component (polybasic acid anhydride) is added to the base formed by adding the (N) component to the (E) component and the (R) forming U-material. The polyanhydride is not particularly limited, and a known one can be used. As specific examples thereof, there are listed: succinic anhydride, maleic anhydride, itaconic acid, tetrahydrophthalic acid: fluorenyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, and Base:: phthalic anhydride, decyl endomethylene tetrahydrophthalic acid liver 'o-benzene, gas bridge saturated or unsaturated di(tetra) acid 312XP / invention manual (supplement) / 96-09 /96125023 26 200811599 Anhydride; trimellitic anhydride; pyromellitic anhydride, diphenyl ketone tetracarboxylic anhydride, biphenyl tetracarboxylic anhydride, diphenyl ether tetracarboxylic anhydride, hydrazine, 2, 3, 4-butane tetracarboxylate An acid anhydride such as an acid anhydride or the like. These (T) components may be used singly or in combination of two or more kinds in any combination and ratio. The amount of the (T) component to be added is usually 1 〇 mol% of the hydroxyl group formed when the (N) component is added to the copolymer of the component (E) and the component (R), preferably 20 mol% or more, more preferably 30 mol% or more. Further, it is usually 100 mol% or less, preferably 90 mol% or less, more preferably 8 mol% or less. When the amount of addition of the component (T) is too large, the residual film ratio at the time of development tends to decrease. When the amount of addition of the component (T) is too small, the solubility tends to be insufficient. Further, as a method of adding (N) a hydroxyl group addition (T) component formed by the formation of the (E) component and the (R) component to the copolymer of the component (R), a known method can be arbitrarily employed. The EHT resin can be further added to a part of a group formed by the addition of the component (7), and further added with a glycidyl (meth)acrylate or a compound having a condensed unsaturated group, and further . In addition, as the above-mentioned E-R-N-T resin, for example, the resin disclosed in Japanese Laid-Open Patent Publication No. Hei. Further, the average molecular weight of the above ERNT resin is not particularly limited, and is a weight average of 312 XP/invention specification (supplement)/96-09/96125023 0Ί 200811599 by the GPC. Mw), usually 3, 〇〇〇 or more, preferably 5, 〇〇〇 or more, again,

通常為100, 000以下、較佳為50, 〇〇〇以下。若E-R-N-T 樹脂之重量平均分子量(Mw)過小,則存在耐熱性、膜強度 差之傾向。若E-R-N-T樹脂之重量平均分子量qjw)過大, 則存在對顯影液之溶解性降低之傾向。又,分子量分布(重 量平均分子量(Mw)/數量平均分子量(Mn)),較佳為2· 〇〜 5· 0。 [A - 2 ]酸改質型環氧(曱基)丙烯酸酯 作為本實施形態中之酸改質環氧(甲基)丙烯酸酯,可列 舉以下述通式(A- I )表示之化合物。作為其製造方法,例 如可列舉如下方法:使含有環氧基之化合物與含有乙烯性 不飽和基之羧酸反應,進而與自由多元羧酸、其酸酐以及 具有異氰酸酯基之化合物所組成之群組中所選擇的丨種 以上之化合物反應,但並不限定於此。 [化4]Usually it is 100,000 or less, preferably 50 or less. When the weight average molecular weight (Mw) of the E-R-N-T resin is too small, heat resistance and film strength tend to be inferior. When the weight average molecular weight qjw) of the E-R-N-T resin is too large, the solubility in the developer tends to decrease. Further, the molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) is preferably 2·〇~5·0. [A - 2 ] Acid-modified epoxy (fluorenyl) acrylate The acid-modified epoxy (meth) acrylate in the present embodiment may be a compound represented by the following formula (A-I). The method for producing the same may, for example, be a method in which a compound containing an epoxy group is reacted with a carboxylic acid having an ethylenically unsaturated group, and further with a group of a free polycarboxylic acid, an acid anhydride thereof, and a compound having an isocyanate group. The compound selected from the above species is reacted, but is not limited thereto. [Chemical 4]

R 12 CH2-j;FhCH2™(〇i V〇 (A- I) 13R 12 CH2-j; FhCH2TM (〇i V〇 (A- I) 13

[式(Ad )中’ 示可具有取代基之伸烧基或可且有 取:基之伸芳基。:表示可具有取代基之含有乙稀性不飽 1 Rl4,分別獨立表示任意取代基。n 為〇〜10之整數。…以上之整數。χ 基之任意有機基。] 八有取代 312Χρ/發明說明書(補件)/96-09/96125023 200811599 〜Γ者通式=::為RI1之伸燒基,較佳為碳數為1 更么為亞甲基、伸乙基、伸丙基、伸丁美。又, Π伸較佳為碳數為6〜10者’更佳為伸i基。該 #中,於本貫施形態中,較佳為伸烷基。 作=之伸烧基或伸芳基可具有的取代基,例如可列 原子,聽,碳數為1〜15、較佳為碳數為卜10 二:反數為2〜10之烯基’苯基,羧基,硫基 Csulfanyl),膦基,胺基,硝基等。 又,η為〇〜1〇之整數,較佳為〇〜5,更佳 『η超過上述範圍,則存在如下傾向:將所獲得的硬化性 等且成:=硬化物時,於顯影時作為影像部分產生膜減耗 等’或耐熱性降低。 ,式„)中之Rl2之可具有取代基之含有乙稀性不飽 口 土的㈣基之碳數,下限通常為3、較佳為5、更佳 1〇。上限並無特別限定,較佳為50、更佳為4〇、尤佳為 35。於上述碳數過大或碳數過小之任一情況下 盈 ^得由本實施形態之硬化性組成物形成的硬化物之^ 械特性。 作為以R12表示之可具有取代基之含有乙稀性不飽和基 的碳氧基,更佳為以下述通式(Α—Π )表示之基。 土 [化 5] ”土。 312ΧΡ/發明說明書(補件)/96-09/96125023 200811599[In the formula (Ad), a stretching group which may have a substituent or an exoaryl group which may be derived from a group. : represents an ethylidene-rich 1 Rl4 which may have a substituent, and each independently represents an arbitrary substituent. n is an integer of 〇~10. ...the above integer. Any organic group of thiol. ] Eight substituted 312Χρ/Invention manual (supplement)/96-09/96125023 200811599 ~ 通式 General formula =:: is the stretching base of RI1, preferably the carbon number is 1 and more is methylene, stretching Base, propyl, and butyl. Further, the stretching is preferably a carbon number of 6 to 10, and more preferably a stretching base. In the present embodiment, the alkyl group is preferably an alkyl group. a substituent which may have a stretching group or an aryl group, for example, an atom which can be listed, a carbon number of 1 to 15, preferably a carbon number of 10: 2: an alkenyl group having an inverse of 2 to 10' Phenyl, carboxyl, thiolsulfanyl, phosphino, amine, nitro, and the like. Further, η is an integer of 〇~1〇, preferably 〇~5, and more preferably η exceeds the above range, and there is a tendency that when the obtained hardenability or the like is formed: = when the cured product is formed, The image portion is caused to have a film depletion or the like, or the heat resistance is lowered. The carbon number of the (tetra) group containing the ethylenic unsaturated soil of R1 in the formula „), the lower limit is usually 3, preferably 5, more preferably 1 〇. The upper limit is not particularly limited. Preferably, it is 50, more preferably 4, and particularly preferably 35. In the case where the carbon number is too large or the carbon number is too small, the mechanical properties of the cured product formed of the curable composition of the present embodiment are obtained. The carbonoxy group having an ethylenically unsaturated group which may have a substituent represented by R12 is more preferably a group represented by the following formula (Α-Π). 312ΧΡ/Invention Manual (supplement)/96-09/96125023 200811599

[式(Α- Π )中,R15、R16、R17 合别想 n^^ . ^ ^ 刀另J獨立表不氣原子或甲基, Q可不存在或表示任意之2價基。] 再者,式α-π)巾,Q較佳為不存在,或表示含有可且 有取代基之伸烧基及/或可具有取代基之伸芳基、氧 基之y。更佳為,Q不存在,或表示含有可料^ 基之叙數為1〜1〇之伸燒基或/及可具有取代基之破數為 1〜10之伸芳基、與羰氧基之2價基。 式(A-I )中,F較佳為表示氫原子、以丁述通式 a)表示之取代基、或以下述通式(A_mb)表示之取代基。 [化6] 0 n) 0 (A-DIb) II Η _ q _各淨及22 [式(八-111&)、(八-11113)中,1?21、尺22表示可具有取代基之 312XP/發明說明書(補件)/96-09/96125023 30 200811599 烷基、可具有取代基之烯基、可具有取代基之環烷基、可 具有取代基之環烯基或可具有取代基之芳基。] 此處,,為之烷基,較佳為碳數為卜別者。 又,作為烯基,較佳為碳數為2〜2〇者。又,作為環烷美 較佳為碳數為3〜20者。又,作為環烯基,較佳為 3〜20者。又,作為芳基,較佳為碳數為6〜2〇者。’、'、 又,作為R21、β可具有之取代基,例如可列舉 子、羥基、碳數為1〜10之烷基、碳數為2〜1〇 隶 苯基、羥基、幾基、硫基、膦基、胺基、確基等^ 為,於該等中具有羥基作為取代基者。 父佳 作為以上述通式(Α—Ϊ )表示之化合物中的以一 之取代基,並無特別限定,例如可列舉以下表示 表示之取代基。 武(A〜IV) [化7] (A-iv) R -gh2-ch-ch2- (orIi) a— ! a ο[In the formula (Α- Π ), R15, R16, and R17 are combined to think n^^ . ^ ^ The knife is J independently of a gas atom or a methyl group, and Q may not exist or represent an arbitrary two-valent group. Further, in the formula α-π), Q is preferably absent or represents a stretching group having a substituent and/or a aryl group having an substituent and an oxy group. More preferably, Q is absent or represents a stretching group having a number of 1 to 1 Å or a substituent having a substituent of 1 to 10 and a carbonyloxy group. The 2 price base. In the formula (A-I), F is preferably a hydrogen atom, a substituent represented by the formula a), or a substituent represented by the following formula (A_mb). 0 n) 0 (A-DIb) II Η _ q _ each net and 22 [in the formula (eight-111 &), (eight-11113), 1?21, ruler 22 indicates that it may have a substituent 312XP/Inventive Specification (Supplement)/96-09/96125023 30 200811599 An alkyl group, an alkenyl group which may have a substituent, a cycloalkyl group which may have a substituent, a cycloalkenyl group which may have a substituent or may have a substituent Aryl. Here, the alkyl group is preferably a carbon number. Further, as the alkenyl group, a carbon number of 2 to 2 is preferred. Further, as the cycloalkane, it is preferred that the carbon number is from 3 to 20. Further, the cycloalkenyl group is preferably 3 to 20 members. Further, as the aryl group, those having a carbon number of 6 to 2 are preferred. And the substituents which R21 and β may have, and examples thereof include a subgroup, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, a carbon number of 2 to 1 phenyl group, a hydroxyl group, a group, and sulfur. The group, the phosphino group, the amine group, the exact group, etc., have a hydroxyl group as a substituent in the group. The compound which is one of the compounds represented by the above formula (Α-Ϊ) is not particularly limited, and examples thereof include the substituents shown below.武(A~IV) [化7] (A-iv) R -gh2-ch-ch2- (orIi) a- ! a ο

I R13 [式(A—IV)中,R11、R12 義。] 及n與上述通式(A〜 )中同 以上述通式(A-I )表示之化合物中的χ,表厂、 代基之任意有機基。,亥X,具有使含有雙鐽::::有取 本作用,為不使作為化合物總體的雙鍵當旦你 、、、Q的基 田里增大,而具有 312XP/發明說明書(補件)/96-09/96125023 200811599 提供成為鍵結適度分子量及適度個數之取代基之位置的 官能基之功能。 作為以通式(A-I )表示之化合物中的乂之分子量,通常 為14以上、較佳為28以上,通常為3000以下、較佳為 2 0 0 0以下。 本實施形態中,作為可用作乂之有機基,具 鏈狀或環狀有機基 =為直鏈狀之有機基,例如可列舉··來自烧烴、稀煙之 =基,來自(曱基)丙烯酸、(曱基)丙烯酸酯、(曱基) 1睛(甲基)丙稀酉篮胺、順丁稀二酸、苯乙烯、乙酸乙 右1旨盆偏二氯乙稀、順丁稀二酿亞胺等之單獨或共聚物之 基;來自酸改質型環氧丙婦酸醋、聚烯烴、聚酸胺、 醚、聚胺基甲酸酯、聚乙烯丁酸、聚乙稀醇、聚 乙烯氣吡咯酮、乙酸纖維素等之有機基。 脂二:為環環二列舉:來自脂環式環、芳香環、 以及來自該進行縮環而得者之有機基, 1 人衣、、、工由連結基而鍵結者等之有機基。 環w产作為脂環式環,可列舉··環㈣環、環己院環、 衣已烯%、三環癸烷環等。 環作=香:可巧:苯環、聯苯環、蔡環'葱環、菲 第衣、厄核、伸聯苯環、茚環等。 作為脂環式雜環或雜 嘻環” f哇環、1 了㈣.夫0南核、售吩環、吡 。比唾環、〜坐環、心坐環、異_環、味唾環、 衣二0坐比喃環、口比0定環、塔畊環、嘧 312ΧΡ/發明說明書(補件)/96侧612簡 32 200811599 啶環、吡畊環等。 作為%狀有機基之鍵結所經由的# 結,或2價以上之連結基。作為=結基:列舉直接鍵 公知者,例如可列舉:伸燒^/以上連結基,可使用 S原子,㈣/ / 來氧㈣基,胺,〇原子, 子Π基,硫酮基,)〇_,醯胺,I R13 [In the formula (A-IV), R11 and R12 are defined. And n in the above formula (A to ) are the same as those in the compound represented by the above formula (A-I), any of the organic groups of the watch factory and the substituent. , Hai X, has the effect of taking the double 鐽:::: to take the role, in order not to make the double bond of the compound as a whole, the base of your, Q, Q is increased, and has 312XP / invention manual (supplement )/96-09/96125023 200811599 provides a function as a functional group that bonds a moderate molecular weight and a moderate number of substituents. The molecular weight of ruthenium in the compound represented by the formula (A-I) is usually 14 or more, preferably 28 or more, and usually 3,000 or less, preferably 2, 000 or less. In the present embodiment, as the organic group which can be used as the organic group of fluorene, the organic group having a chain or a cyclic organic group = a linear chain, for example, may be exemplified by a hydrocarbon-based or a dilute smoke-based group. Acrylic acid, (fluorenyl) acrylate, (fluorenyl) 1 eye (methyl) acesulfame amide, cis-butane dicarboxylic acid, styrene, acetic acid, ethyl, right, pot, vinylidene chloride, butadiene Separate or copolymer base of di-iminoimide; from acid-modified propylene glycol vinegar, polyolefin, polyamine, ether, polyurethane, polyvinyl butyric acid, polyethylene glycol An organic group such as polyvinylpyrrolidone or cellulose acetate. Lipid 2: is a ring-ring 2: an organic group derived from an alicyclic ring, an aromatic ring, and an organic group derived from the condensed ring, and a person who is bonded by a linking group. The ring w is produced as an alicyclic ring, and examples thereof include a ring (tetra) ring, a cyclohexyl ring, a hexene, and a tricyclodecane ring.环作=香: It can be as follows: benzene ring, biphenyl ring, Caihuan's onion ring, Philippine clothing, Erhe nuclear, extended benzene ring, anthraquinone ring and so on. As an alicyclic heterocyclic or heterocyclic ring, f w wah ring, 1 (four). Fu 0 south nucleus, phenocyclic ring, pyridinium, than saliva ring, ~ ring, heart ring, hetero-ring, taste ring,衣二0坐比环环,口比0定环,塔耕环,素素312ΧΡ/invention specification (supplement)/96 side 612 Jane 32 200811599 pyridine ring, pyridin ring, etc. as a bond of the % organic group The #结结, or a linking group of two or more valences. As a = base group: a direct bond is known, for example, a stretching atom / a linking group, and an S atom, (4) / / an oxygen (tetra) group can be used. Amine, hydrogen atom, sulfhydryl group, thioketo group, 〇, guanamine,

As Sb Bi、Si、B等金屬,雜严P 該等之任意組合等。 方s裱,雜芳香環及 作為以X表示之有機基,例如可. 較佳為碳數為2〜10之伸烷基;碳數:6二4 1〜20、 碳數為2〜50、較佳為碳數為2〜3〇之聚越伸芳基; ::A、雙紛F#雙盼;三紛;除去紛酸清漆等,所:之 &物之經基的殘基等夕凡醇化 [化 8] ° 312xw 發明說明書(補件)/96-〇9/96125〇23 33 200811599As Sb Bi, Si, B and other metals, any combination of these, etc. The square 裱, the heteroaromatic ring and the organic group represented by X, for example, may preferably be an alkylene group having a carbon number of 2 to 10; a carbon number of 6 2 4 1 to 20, and a carbon number of 2 to 50; Preferably, the carbon number is 2 to 3 Å, and the more the aryl group; the ::A, the double F# double hope; the third; the removal of the acid varnish, etc., the residue of the base of the substance, etc. Alcoholization [Chemical 8] ° 312xw Invention Manual (supplement) /96-〇9/96125〇23 33 200811599

312XP/發明說明書(補件)/96-09/96125023 34 200811599 [化9]312XP/Invention Manual (supplement)/96-09/96125023 34 200811599 [Chemistry 9]

再者,上述以X表示之有機基之例示式中,z表示0以 312XP/發明說明書(補件)/96-09/96125023 35 200811599 鍵。於該等例示構造中’鍵※為3個以上之情 /兄下’作為連結基X的鍵之個數 料金&达 数Θ荨中至少2個鍵變成 對象。该情況下,作為連結於殘留 、夕戈邊的1個以上之鍵的取代 基,可列舉任意取代基,並盔特 μ“、、符別限疋,較佳為可列舉以 上述通式(A-IV)表示之基。 况再=於:上述通式(Η )表示之化合物具有苯環之情 況,作為該苯環可具㈣取代基,例如可列舉:碳數為工 :之烷基、碳數為卜15之烷氧基、碳數為2〜以 ‘基:碳數為6〜14之芳基、竣基、經基、碳數為卜“ 之烧乳碳基、羧基、鹵原子等。該等中,更佳為碳數為i 〜5之烧基、苯基、鹵原子。 作為以上述通式U])表示之化合物之製造方法,若為 可獲得具有以通式(H )表示之構造的化合物之製造方 法,則並無特別限定,可列舉使用以下述通式(A_v)表示 之含有環氧基之化合物的製造方法為例加以說明。即,將 以下述通式(A-V)表示之化合物作為原料,於其上形成含 有乙烯性不飽和基之羰氧基,繼而,使該形成有含有乙烯 性不飽和基之m氧基的化合物、與自由多元羧酸及其酸軒 以及具有異氰酸酯基之化合物所組成之群組中所選擇的1 種以上之化合物反應,可藉此製造以通式(A-I)表示之化 合物。 312XP/發明說明書(補件)/96-09/96125023 36 200811599 [化 ίο] q^CH-CHriOiThrO、Further, in the above formula of the organic group represented by X, z represents 0 to 312XP/invention specification (supplement)/96-09/96125023 35 200811599 key. In the above-mentioned exemplary structures, the 'key* is three or more. / the lower one' is the number of the keys of the joint X. At least two of the keys & In this case, examples of the substituent which is bonded to one or more bonds of the remaining and the sigma side may be any substituents, and the ringer is "", and the ring is limited to, and preferably, the above formula ( A-IV). Further, the compound represented by the above formula (Η) has a benzene ring, and the benzene ring may have a (iv) substituent, and for example, an alkyl group having a carbon number of , the carbon number is a 15 alkoxy group, the carbon number is 2 to 'the base: the carbon number is 6 to 14 aryl group, fluorenyl group, the base group, the carbon number is the "burning carbon group, carboxyl group, halogen" Atoms, etc. Among these, a pyridyl group having a carbon number of i to 5, a phenyl group or a halogen atom is more preferred. The method for producing the compound represented by the above formula (U)) is not particularly limited as long as it can obtain a compound having a structure represented by the formula (H), and the following formula (A_v) can be used. The method for producing the epoxy group-containing compound is described as an example. In other words, a compound represented by the following formula (AV) is used as a raw material, and a carbonyloxy group having an ethylenically unsaturated group is formed thereon, and then a compound having an m-oxy group having an ethylenically unsaturated group is formed. The compound represented by the formula (AI) can be produced by reacting one or more compounds selected from the group consisting of a free polycarboxylic acid and a compound thereof and a compound having an isocyanate group. 312XP/Invention Manual (supplement)/96-09/96125023 36 200811599 [化 ίο] q^CH-CHriOiThrO,

(A-V) [式(A-V)中,R11、X及n分別與通式(A— J )中同義。 R18與通式(A- I )之R"同義。] 作為以上述通式(A-v)表示之含有環氧基之化合物,例 如可列舉·(聚)乙二醇聚環氧丙基醚、(聚)丙二醇聚環氧 ^基醚、(聚)1,4-丁二醇聚環氧丙基醚、(聚)丨,5-戊二醇 聚環氧丙基醚、(聚)新戊二醇聚環氧丙基醚、(聚)丨,6一 己二醇聚環氧丙基鱗、(聚)三經甲基丙烧聚環氧丙基鍵、 ^油聚環氧丙基醚、(聚)山梨醇聚環氧丙基輕等脂肪 無聚裱氧化合物; 化2祕清漆聚環氧化合物1化“祕清漆聚環氧 化a物、(鄰,間,對)甲酚酚(A-V) [In the formula (A-V), R11, X and n are synonymous with the formula (A-J), respectively. R18 is synonymous with R" of the general formula (A-I). Examples of the epoxy group-containing compound represented by the above formula (Av) include (poly)ethylene glycol polyepoxypropyl ether, (poly)propylene glycol polyepoxyether, and (poly)1. , 4-butanediol polyepoxypropyl ether, (poly) fluorene, 5-pentanediol polyepoxypropyl ether, (poly) neopentyl glycol polyepoxypropyl ether, (poly) fluorene, 6 Monohexylene glycol polyepoxypropyl scale, (poly) trimethyl methacrylate polyepoxypropyl bond, ^ oil polyepoxypropyl ether, (poly) sorbitol polyepoxypropyl light, etc. Oxide compound; 2 secret varnish polyepoxide 1 "secret varnish polyepoxidized a, (o, m, p) cresol

¥ ^ ^ ^ ,肖漆聚%乳化合物、雙酚A 來衣乳化合物、雙紛F聚環氧 聚環氧化合物等芳香族聚梦u人物&(匕基本基)第型 基喊、異氰尿酸三環氧丙酿、 山:私酐丙 異氰尿酸醋等雜環式聚環氧 =土二(2_幾乙基) 以通式U-ν)表示之含聚環氧化合物等。 1種,亦可並用2種以上。衣虱土之化合物,可單獨使用 又,形成於以上述通式(A〜 」表不之含有環氧基之化合 312XP/發明說明書(補件)/96-09/96125023 37 200811599 物的含有乙烯性不飽和基之幾氧基之碳數,下限通常為 3、較佳為5、更佳為1〇。上限並無特別限定,較佳為5〇、 更么為40、尤佳為35。若碳數未滿上述範圍,則將硬化 性組成物製成硬化物時,存在柔軟性不足而對基板之密著 性差之傾向。另-方面,若碳數過多,則存在耐熱性降低 之傾向。 該等含有乙烯性不鮮基之㈣基,較佳為以上述通式 (A- Π )表示之基。 此處,作為以上述通式(A_n)表示之含有乙烯性不飽和 基之羰氧基的形成方法,若為將以上述通式(A_v)表示之 化合物作為原料的反應結果,可形成含有乙稀性不飽和基 之羰氧基的方法,則並無特別限定,例如可列舉:使以上 述通式(A-V)表示之化合物、與含有乙烯性不飽和基之缓 酸(A-2-a)反應之方法等。 作為該含有乙烯性不飽和基之羧酸u_2_a),例如可列 舉.(甲基)丙稀酸,·(甲基)丙稀酸與内醋或聚内醋之反應 產物;使飽和或不飽和二羧酸酐、與丨分子中具有丨個以 上羥基之(甲基)丙烯酸酯衍生物反應而得之半酯;使飽和 或不飽和二羧酸酐、與含有不飽和基之環氧丙基化合物反 應而得之半酯等。 作為飽和或不飽和二幾_,例如可列舉:琥%酸肝、 己二酸針、順丁稀二_、衣康酸肝、四氫鄰苯二甲酸野、 :基四氫鄰苯二甲酸酐、六氫鄰苯二甲酸軒、甲基六氫鄰 本二?酸酐、甲基内亞甲基四氫鄰苯二甲酸酐、鄰苯二甲 312XP/發明說明書(補件)/96-09/96125023 38 200811599 酸酐等。 乍為1刀子tj?具有1個以上經某之(甲其、& 物,例如可歹im .mi、 (甲基)丙細酸醋衍生 J + ·(甲基)丙烯酸羥乙酯、(甲基)丙烯酸羥 西匕-曰甘^基)丙烯酸經丁酯、聚乙二醇單(甲基)丙烯酸 於曰西匕^(甲基)丙烯酸酯、三經甲基丙燒二(甲基)丙稀 文知、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(曱基) 丙烯S文酯、二季戊四醇五(甲基)丙烯酸酯等。 作為含有不飽和基之環氧丙基化合物,例如可列舉:(甲 基)丙稀酸環氧丙§旨、(甲基)丙烯冑3,4-環氧環己基甲 酉旨、一=環W雙環[4.3.0]壬_3_基](甲基)丙烯酸酉旨甲 望%虱[雙裱[4. 3. 0]壬-3-基]氧甲基(甲基)丙烯酸酯 等。 本貫施形態中,作為「含有乙烯性不飽和基之竣酸 U-2-a)」,於該等中,較佳為(曱基)丙烯酸、或者使飽和 或不飽和二羧酸酐與丨分子中具有丨個以上羥基之(曱基) 丙烯酸酯衍生物反應而得之半酯。 忒情況下’作為飽和或不飽和二羧酸酐,較佳為琥珀酸 酐、順丁烯二酸酐、四氫鄰苯二曱酸酐、鄰苯二曱酸酐。 又’作為1分子中具有1個以上經基之(甲基)丙烯酸醋衍 生物,較佳為(甲基)丙烯酸羥乙酯、(甲基)丙烯酸羥丙 酯、(甲基)丙烯酸羥丁酯、季戊四醇三(甲基)丙烯酸酯、 一季戊四醇五(甲基)丙烯酸酯。 该等含有乙烯性不飽和基之羧酸(A —2 —a),可單獨使用 1種,亦可並用2種以上。 312Χρ/發明說明書(補件)/96-09/96125023 39 200811599 與ί旦含有乙烯性不飽和基之羧酸(A-2—a),相對於1化 +當量之成為原料的含有環氧基之化合物的環氧基,通常 添加0.8化學當量〜h 5化學當量、較佳為〇 9化學當量 〜1· 1化學當量之量。 胳2 J乍為將以上述通式(A-V )表示之含有環氧基之化合 、:原料’於其上形成含有乙稀性不飽和基之幾氧基 進—步進行反應的多元羧酸或其酸Sf,可列舉以下化 合物。 例如可列舉:破賴、順丁稀二酸、衣康酸、四氫鄰苯 ::二=四氯鄰苯二甲酸、六氣鄰苯二甲酸、甲基六 “本一甲酉夂、甲基内亞甲基四氫鄰苯二甲酸、鄰苯二甲 酸、氯橋酸等飽和或不飽和二羧酸及彼等之酸酐;偏苯三 :酸及,酸酐’·均苯四甲酸、二苯基,四錢、聯苯 之酸酐等。 ’,3士丁燒四幾酸等四竣酸及彼等 該等中,就作為硬化性組成物,於驗性 部分的溶解除去性之觀點而言,較佳為號轴酸、四= -甲酸、鄰苯二甲酸等二缓酸及其酸野,偏苯三甲主 酸酐,均苯四甲酸、聯苯四羧酸 ^ 四幾酸及其酸二酐等。 u’3’4—丁燒四⑽等 進而,該等—中,較佳為酸解離常數(第一解離 3· 5以上之多兀鲮酸的酸酐。酸解離… 上、尤佳為4.。以上。作為此種酸解離數常仏^ 數)為3·5以上之多元叛酸的酸肝 书 夂酐例如可列舉:琥珀酸 312ΧΡ/發明說明書(補件)/96-09/96125023 4〇 200811599 之酸酐、四氫鄰苯二甲酸之酸酐、1,2, 3, 4-丁烧四羧酸之 酸一酐。其中’尤佳為琥珀酸之酸酐、四氫鄰苯二甲酸之 酸酐。 此處,酸解離常數可參照Determination of Organic :Structures by Physical Methods, Academic Press, New • Y〇rk,1 955 (Brown,H. C·等)。 又’就硬化性組成物之保存穩定性之觀點而言,較佳為 使用琥珀酸、四氫鄰苯二甲酸、鄰苯二甲酸等二羧酸及其 酸酐,偏苯三甲酸及其酸酐。 上述羧酸及其酸酐之選擇,可根據硬化性組成物所要求 的性質進行適當調整。 本Λ施形態中’該等多元羧酸及其酸酐可單獨使用1 種’亦可並用2種以上。 又,夕元叛酸或其酸酐,相對於1化學當量之於含有環 氧基之化合物與含有乙烯性不飽和基之羧酸的加成反應 、中所生成的羥基,通常添加〇 〇5化學當量〜1〇化學當 里、較佳為〜〇·9化學當量之量。 又,作為於以上述通式(Α—ν)表示之含有環氧基之化合 物上,形成含有乙烯性不飽和基之羰氧基後,進一步進行 反應之具有異氰酸酯基的化合物,可列舉以下化合物。 班例如可列舉··異氰酸丁酯、異氰酸3—氯苯_、異氛酸 %己酯、3-異丙烯酉蓝基一α,α—二甲基节基異氛酸醋等有 機單異氰酸醋,·對苯二異氰酸酷(p—phenylene dHS〇Cyanate)、2, 4一甲苯二異氰酸醋(2, 4 — t〇lyiene 312XP/發明說明書(補件)/96-09/96125023 41 200811599 diiS〇^yanate)、2, 6一甲苯二異氰酸酯、4, 4, _二苯基甲烷 -異氰酸醋、奈-1,5-二異氰酸醋、聯甲苯胺二異氛酸醋 等芳香族二異氰酸酯; 六亞甲基二異氰酸醋、2, 4,4一三甲基六亞甲基二異氮酸 酉曰一水酸一異氰酸酯等脂肪族二異氰酸酯;異佛酮二異 氰酸酯、4, 4,-亞甲基雙(環己基異氰酸酯)、二異 氰酸酯二甲基環己烷等脂環族二異氰酸酯;苯二甲基二異 鼠酸酯、α,α,α’,α,-四甲基苯二甲基二異氰酸酯等具 有芳香裱之脂肪族二異氰酸酯;離胺酸酯三異氰酸酯、 1,6, 1卜十一烷三異氰酸酯、丨,8-二異氰酸酯—4 —異氰酸酯 曱基辛烷、1,3, 6-六亞甲基三異氰酸酯、雙環庚烷三異氰 酸酯、二(異氰酸酯苯基曱烷)、三(異氰酸酯苯基)硫代磷 酸酯等三異氰酸酯;進而,上述異氰酸酯化合物之三聚 物、水加成物、及該等之多元醇加成物等。 該等中,較佳為有機二異氰酸酯之二、三聚物,更佳為 曱笨二異氰酸酯之三羥甲基丙烷加成物、甲苯二異氰酸酯 之二聚物、異佛酮二異氰酸酯之三聚物。上述化合物可單 獨使用1種,亦可並用2種以上。 又’遠專具有異氰酸醋基之化合物,相對於1化學當量 之於含有環氧基之化合物與含有乙烯性不飽和基之羧酸 的加成反應中所生成的羥基,通常添加〇·〇5化學當量〜 1· 〇化學當量、較佳為〇· 1化學當量〜〇· 5化學當量之量。 再者’本貫施形態中之以上述通式(A- I )表示之化合物 的酸價,較佳為30 mg-KOH/g〜150 mg-KOH/g,更佳為4〇 312XP/發明說明書(補件)/9卜〇9/96125023 42 200811599 mg-K^H/g〜l〇〇mg_K〇H/g。又,以通式(A—j )表示之化合 物之藉由GPC測定的標準聚苯乙烯換算之重量平均分子 量〇^),較佳為1,000〜1 00 000、更佳為15〇〇〜 10, 000、尤佳為 2, 〇〇〇〜1〇, 〇〇〇。 本實施形態中所使用之以通式(H )表示之化合物的 具體合成方法之一例,例如揭示於日本專利特開平 4-355450號公報等。¥ ^ ^ ^ , Xiao lacquer poly% milk compound, bisphenol A to the latex compound, double F polyepoxy poly epoxy compound and other aromatic poly dream u character & (匕 basic base) type base shout, different Cyanuric acid triglycol propylene, mountain: private anhydride, propyl isocyanuric acid vinegar, etc. Heterocyclic polyepoxy = earthy (2_monoethyl) The polyepoxide-containing compound represented by the formula U-ν). One type can also be used in combination of two or more types. The compound of the bentonite may be used alone or in the form of ethylene containing the epoxy group-containing compound 312XP/invention specification (supplement)/96-09/96125023 37 200811599 which is represented by the above formula (A~). The lower limit of the number of carbon atoms of the oxy group of the unsaturated group is usually 3, preferably 5, more preferably 1 Å. The upper limit is not particularly limited, and is preferably 5 Å, more preferably 40, and particularly preferably 35. When the carbon number is less than the above range, when the curable composition is made into a cured product, the flexibility is insufficient and the adhesion to the substrate tends to be poor. On the other hand, if the carbon number is too large, the heat resistance tends to decrease. The (tetra) group having an ethylenic acid group is preferably a group represented by the above formula (A- Π ). Here, the carbonyl group having an ethylenically unsaturated group represented by the above formula (A-n) The method for forming the oxy group is not particularly limited as long as it can form a carbonyloxy group containing an ethylenically unsaturated group as a result of the reaction of the compound represented by the above formula (A-v) as a raw material, and examples thereof include, for example, : a compound represented by the above formula (AV), and a vinyl group A method of reacting an unsaturated acid (A-2-a) with an unsaturated group, etc. As the carboxylic acid u_2_a) containing an ethylenically unsaturated group, for example, (meth)acrylic acid, (meth)propyl a reaction product of a dilute acid with an internal vinegar or a polyacetic acid; a saturated or unsaturated dicarboxylic anhydride, a half ester obtained by reacting a (meth) acrylate derivative having more than one hydroxy group in the oxime molecule; An unsaturated dicarboxylic anhydride, a half ester obtained by reacting with an epoxy group-containing compound having an unsaturated group, and the like. As a saturated or unsaturated two, for example, succinic acid liver, adipic acid needle, cis-butadiene bis, itaconic acid liver, tetrahydrophthalic acid field,: tetrahydrophthalic acid Anhydride, hexahydrophthalic acid, methyl hexahydro- ortho-? Anhydride, methyl endomethylenetetrahydrophthalic anhydride, o-phthalene 312XP/invention specification (supplement)/96-09/96125023 38 200811599 Anhydride or the like.乍 is 1 knife tj? has more than one (A, it, for example, 歹im.mi, (methyl) propyl acrylate-derived J + · (meth) hydroxyethyl acrylate, ( Methyl) hydroxy hydroxy hydrazide - 曰 ^ )) butyl acrylate, polyethylene glycol mono (meth) acrylate in 曰 匕 ^ (meth) acrylate, tri-methyl propylene bis (methyl Acrylic, pentaerythritol di(meth)acrylate, pentaerythritol tris(fluorenyl) propylene S-ester, dipentaerythritol penta (meth) acrylate, and the like. Examples of the epoxy group-containing epoxy group-containing compound include (meth)acrylic acid epoxide, (meth)acryl oxime 3,4-epoxycyclohexylmethyl hydrazine, and one ring. W bicyclo[4.3.0]壬_3_yl](meth)acrylic acid 酉 甲 甲 虱 裱 [裱 裱 [4. 3. 0] 壬-3-yl] oxymethyl (meth) acrylate, etc. . In the present embodiment, it is preferably "mercapto)acrylic acid or saturated or unsaturated dicarboxylic anhydride and hydrazine as "the ethyl ketone U-2-a containing an ethylenically unsaturated group". A half ester obtained by reacting a (mercapto) acrylate derivative having more than one hydroxyl group in the molecule. In the case of hydrazine, as the saturated or unsaturated dicarboxylic anhydride, succinic anhydride, maleic anhydride, tetrahydrophthalic anhydride or phthalic anhydride is preferred. Further, 'as a (meth)acrylic acid vinegar derivative having one or more warp groups in one molecule, preferably hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, or hydroxybutyl (meth)acrylate Ester, pentaerythritol tri(meth) acrylate, pentaerythritol penta (meth) acrylate. These carboxylic acids (A-2a) having an ethylenically unsaturated group may be used alone or in combination of two or more. 312Χρ/发明发明(补件)/96-09/96125023 39 200811599 A carboxylic acid containing an ethylenically unsaturated group (A-2—a), which contains an epoxy group as a raw material with respect to 1 + equivalent The epoxy group of the compound is usually added in an amount of 0.8 chemical equivalents to hr 5 chemical equivalents, preferably 〇9 chemical equivalents to 1:1 chemical equivalents. 2 J乍 is a polycarboxylic acid which is subjected to a reaction in which an epoxy group is represented by the above formula (AV): a raw material is formed thereon to form a hydroxyl group containing an ethylenically unsaturated group. The acid Sf is exemplified by the following compounds. For example, it can be exemplified by: ruthenium, succinic acid, itaconic acid, tetrahydroortylene:: bis = tetrachlorophthalic acid, hexaphthalic phthalic acid, methyl hexa" A saturated or unsaturated dicarboxylic acid such as a methyltetrahydrophthalic acid, a phthalic acid or a chlorinated acid, and an anhydride thereof; a benzoic acid: an acid and an anhydride, a pyromellitic acid, Benzene, tetrakisole, biphenyl anhydride, etc. ', tetracycline, tetracycline, tetraterpenic acid, etc., and the like, as a curable composition, in view of the solubility removal of the test part In other words, it is preferably succinic acid, tetra--formic acid, phthalic acid and the like, and acid field, trimellitic anhydride, pyromellitic acid, biphenyltetracarboxylic acid, tetraacrylic acid and acid thereof. a dianhydride or the like. u'3'4-butadiene tetra(10), etc. Further, among these, an acid dissociation constant is preferred (an acid anhydride of a polydecanoic acid having a first dissociation of 3.5 or more. Acid dissociation... For example, the above-mentioned polyacid-reactive acid liver phthalic anhydride having a number of acid-dissociation numbers of 3.5 or more is exemplified by: succinic acid 312 ΧΡ / invention specification (supplement) / 96- 0 9/96125023 4〇200811599 Anhydride, an anhydride of tetrahydrophthalic acid, an acid anhydride of 1,2,3,4-butanetetracarboxylic acid, of which 'especially succinic acid anhydride, tetrahydroortylene benzene An acid anhydride of dicarboxylic acid. Here, the acid dissociation constant can be referred to the Determination of Organic: Structures by Physical Methods, Academic Press, New • Y〇rk, 1 955 (Brown, H. C., etc.) From the viewpoint of storage stability, it is preferred to use a dicarboxylic acid such as succinic acid, tetrahydrophthalic acid or phthalic acid and an acid anhydride thereof, trimellitic acid and an anhydride thereof. The selection can be appropriately adjusted according to the properties required for the curable composition. In the present embodiment, 'the above polycarboxylic acid and its anhydride may be used singly or in combination of two or more kinds. The acid anhydride is usually added with a chemical equivalent of 1 eq. to the hydroxyl group formed by the addition reaction of the epoxy group-containing compound and the carboxylic acid having an ethylenically unsaturated group. Preferably, it is an amount of ~〇·9 chemical equivalent. In addition, as the compound having an epoxy group-containing compound represented by the above formula (Α-ν), a compound having an isocyanate group which is further reacted after forming a carbonyloxy group having an ethylenically unsaturated group, and the following compounds For example, butyl isocyanate, 3-chlorobenzene isocyanate, % hexyl hexanoate, 3-isopropene indigo-α, α-dimethyl ketone vinegar Etc. organic monoisocyanate, p-phenylene dHS〇Cyanate, 2,4-toluene diisocyanate (2, 4 — t〇lyiene 312XP/invention manual (supplement) )/96-09/96125023 41 200811599 diiS〇^yanate), 2,6-toluene diisocyanate, 4, 4, _diphenylmethane-isocyanate, naphthalene-1,5-diisocyanate, An aromatic diisocyanate such as tolidine diisocyanate; a fat such as hexamethylene diisocyanate or 2,4,4-trimethylhexamethylene diisoxazone monohydrate or isocyanate Group of diisocyanates; isophorone diisocyanate, 4, 4,-methylene bis(cyclohexyl isocyanate), diisocyanate dimethylcyclohexane, etc. Cyanate ester; benzodiazepine acid ester, α,α,α',α,-tetramethylbenzenedimethyl diisocyanate and the like, an aliphatic diisocyanate having an aromatic oxime; an isocyanate triisocyanate, 1,6,1 undecane triisocyanate, hydrazine, 8-diisocyanate 4-isocyanate decyl octane, 1,3,6-hexamethylene triisocyanate, bicycloheptane triisocyanate, di(isocyanate benzene a triisocyanate such as a decane or a tris(isocyanate phenyl) phosphorothioate; a trimer of the above isocyanate compound, a water adduct, and a polyol adduct thereof. Among these, a dimer or a trimer of an organic diisocyanate is preferred, and a trimethylolpropane adduct of a diisocyanate, a dimer of toluene diisocyanate, and a trimer of isophorone diisocyanate are more preferred. Things. The above compounds may be used singly or in combination of two or more. Further, a compound having an isocyanate group is generally added with respect to a hydroxyl group formed in an addition reaction of a compound having an epoxy group and a carboxylic acid having an ethylenically unsaturated group. 〇5 chemical equivalent 〜1· 〇 chemical equivalent, preferably 〇·1 chemical equivalent 〇·5 chemical equivalent amount. Further, the acid value of the compound represented by the above formula (A-I) in the present embodiment is preferably 30 mg-KOH/g to 150 mg-KOH/g, more preferably 4〇312XP/inventive Instruction manual (supplement) / 9 dip 9/96125023 42 200811599 mg-K^H/g~l〇〇mg_K〇H/g. Further, the weight average molecular weight 〇^) in terms of standard polystyrene measured by GPC of the compound represented by the general formula (A-j) is preferably 1,000 to 1,000 00, more preferably 15 Å. 10,000, especially good for 2, 〇〇〇~1〇, 〇〇〇. An example of a specific synthesis method of the compound represented by the formula (H) used in the present embodiment is disclosed in, for example, JP-A-4-355450.

再者,本實施形態中,於如此合成的以上述通式(A—工) 表示之化合物中,有時由於原料中所含的混合物之影響或 雙鍵於反應中之熱聚合,而含有除以通式(A—j )表化 合物以外的化合物。 / NFurther, in the present embodiment, the compound represented by the above formula (A-form) thus synthesized may be contained in addition to the influence of the mixture contained in the raw material or the thermal polymerization of the double bond in the reaction. A compound other than the compound represented by the formula (A-j). / N

[A-2]酸改質型環氧(曱基)丙烯酸酯 本實施形態中,作為[A—2]酸改質型環氧(甲基)丙烯酸 酯,除以上述通式(A- I )表示之化合物外,例如可列夹 下述通式(A-VI)表示之化合物。 [化 11][A-2] Acid-modified epoxy (fluorenyl) acrylate In the present embodiment, the [A-2] acid-modified epoxy (meth) acrylate is divided by the above formula (A-I). In addition to the compound represented by the formula, for example, a compound represented by the following formula (A-VI) can be added. [化11]

R1 R13 [式以-⑴中’^^^分別與式⑹”中同義。 作為以通式(A- VI )表示之化合物之製造方法,#、 ] / ,右為可獲 312XP/發明說明書(補件)/96-09/96125023 43 200811599 特別j^通式(A幻表不之構造的化合物之方法,則並無 、:方匕與以上述通式(A-"表示之化合物的製 :乍為況相同,可列舉如下製造方法:將二環氧丙基 2料原料,於其上形成含有乙職不飽和基之羰氧基, 進而與自多元_酸 物及具有異氛酸醋基之化合 物t所、擇的!種以上之化合物反應。 二:Γ本實施形態的硬化性組成物中,⑴乙婦性不 二口务’可早獨使用1種或作為2種以上之混合物而 便用。 (Β)光聚合起始劑及/或熱聚合起始劑 本=形態中所使用之光聚合起始劑及/或熱聚合起始 =,右為可洲活性光線及/或熱而使乙烯性不飽和 合的化合物,則並無特別限定,可使用公知 劑及/或熱聚合起始劑。 几Κ 口匙始 作為光聚合起始劑之具體例,例如可列舉:2-( 苯基)-u-雙(三氯甲基)_均三啡、2普甲氧萘羊一 雙(三氯甲基)-均三讲、2-(4-乙氧幾基萘基)_46_"一 氯甲基)-均三畊等齒甲基化三啡衍生物;2_三氣又= -5-(2’-苯并咬喃基h,3,4h、2_三氯甲二 基化哼二唑衍生物; 矛函甲 安息香甲喊、安息香苯趟、安息香異丁喊、安息香 醚等安息香烷基醚;2-甲基蒽醌、2一乙基蒽醌、2_第三 基蒽醌、卜氯蒽醌等蒽醌衍生物;二苯基酮、米其勒:、 312XP/發明說明書(補件)/96-09/96125023 200811599 4, 4 -雙(二乙胺基)二苯基酮、2一甲基二苯基酮、曱基 二苯基酮、4-甲基二苯基酮、2一氯二苯基 = 酮、基二苯基酮等二苯基s同衍生物; 臭-本基 2, 2-一曱氧基-2-苯基苯乙酮、2,2 —二乙氧基苯乙自同、 卜羥基環己基苯基酮、羥基—2—曱基苯基丙酮、卜羥基 -1-甲基乙基-(對異丙苯基)酮、卜羥基—丨气對十二烷基笨 基)酮、2-节基-2-二甲胺基-丨—(4—咪啉基苯基)—丁燒 酮^-甲基-[4-(甲硫基)苯基]-2—咪啉基一卜丙酮、,卜 二氯甲基-(對丁基苯基)酮等苯乙酮衍生物; 噻噸酮、2-乙基噻噸酮、2_異丙基噻噸酮、2_氯噻噸酮、 2, 4-二甲基噻噸酮、2, 4_二乙基噻噸g同、2,4—二異丙基噻 噸,等噻噸酮衍生物;對二甲胺基苯甲酸乙酯、對二乙ς 基苯甲酸乙酯等苯曱酸酯衍生物;9_苯基吖啶、9一(對甲 氧苯基)吖啶等吖啶衍生物;9, 10_二曱基苯并啡畊等啡啡 衍生物;苯并蒽酮等蒽酮衍生物; 一裱戊二烯基二氣化鈦、二環戊二烯基雙苯基鈦、二環 戊一浠基雙(2,3,4,5,6-五氟苯-1 —基)鈦、二環戊二烯美 卿,5, 6-四氟苯+基)鈦、二環戊二烯基(2二^ -3 -(吡咯-1 —基)—苯—;[_基)鈦等二茂鈦衍生物; 日本專利特開2000-80068號公報、特開2〇〇6-〇3675〇 號公報(特願2004 -183593號說明書)等中所揭示之苯乙 酮肟-鄰乙酸酯、1,2-辛二酮-1-[4-(苯硫基2 —(鄰苯甲 醯基肟)]、丨―[9—乙基一 6 —(2-苯曱醯基)— 9Η—咔唑—3—基] 乙酮-1-(〇-乙醯基肟)等肟酯系化合物等。該等可單獨使 312ΧΡ/發明說明書(補件)/96-09/96125023 45 200811599 用1種,或並用2種以上。 此外例如亦可列舉·精細化學(以⑽Chemicai)、1 gw 年3月1曰號、ν〇1· 2〇、Ν〇· 4、ρ· 16〜ρ· 26,或曰本專利 特開昭59-152396號公報、特開昭61_151197號公報、特 公昭45-37377號公報、特開昭58 —4〇3〇2號公報、特開平 1 0-39503號公報等所揭示之起始劑。 又,除该等光聚合起始劑外,亦可並用作為聚合加速劑 的供氫性化合物。作為該供氫性化合物,例如可列舉·· 2 一 鲢基苯并噻唑、2-巯基苯并咪唑、2-巯基苯并崎唑、3一 工爪基1,2,4二唑、2-酼基-4(3Η)-喹唑琳、万―巯基萘、 乙二醇二硫代丙酸酯、三羥甲基丙烷三硫代丙酸酯、季戊 四醇四硫代丙酸酯等含有巯基之化合物;己二硫醇、三羥 甲基丙烷三硫代葡萄糖酸酯、季戊四醇四硫代丙酸酯等多 官能硫醇化合物;Ν,Ν-二烷基胺基苯甲酸酯、Ν—苯甘胺 酸、Ν-苯甘胺酸之銨鹽或鈉鹽等衍生物;苯丙胺酸、苯丙 胺酸之銨鹽或鈉鹽等衍生物;苯丙胺酸之酯等衍生物等。 該等可單獨使用1種,或並用2種以上。 、 其中,就硬化性組成物之靈敏度之觀點而言,作為供言 性化合物,較佳為2-巯基苯并噻唑、2-巯基苯并咪唑Τ 2-疏基苯并哼唑等含有巯基之雜環狀化合物。 ,、 繼而,作為熱聚合起始劑之具體例,例如可列舉偶氮系 化合物、有機過氧化物以及過氧化氫等。該等可單獨使糸 1種,或並用2種以上。 作為偶氮系化合物,可列舉:2, 2,-偶氮雙異丁猜、2 2, 312ΧΡ/發明說明書(補件)/96-09/96125023 46 200811599 偶氮雙(2-曱基丁腈)、;[,i,—偶氮雙(環己烯一i-i —甲腈)、 2, 2’ -偶氮雙(2, 4一二曱基戊腈)、卜[(1_氰基一i—曱基乙基) 偶氮]甲醯胺(2-(胺甲醯基偶氮)異丁腈)、2, 2-偶氮雙[2-曱基-N-[1,1-雙(羥甲基)一2一羥乙基]丙醯胺]、2, 2,—偶氮 :雙[N-(2-丙烯基)—2—甲基丙醯胺]、2,2,—偶氮雙[N-(2一 :丙烯基)-2-乙基丙醯胺]、2, 2,-偶氮雙[N-丁基-2-甲基丙 醯胺]、2,2’-偶氮雙<^—環己基一2—曱基丙醯胺)、2,2,一 偶氮雙(二甲基-2-甲基丙醯胺)、2, 2, 一偶氮雙(二曱基一2一 曱基丙酸酯)、2, 2,-偶氮雙(2, 4, 4一三曱基戊烯)等。 其中,較佳為2,2’-偶氮雙異丁腈、2,2,一偶氮雙(2,4一 一甲基戊腈)等。 作為有機過氧化物,例如可列舉:過氧化苯甲醯、過氧 化一(第三丁基)、氫過氧化異丙苯等。具體可 二 :::氧::二新癸酸異丙苯 丁基)醋、過氧化新癸酸广;;(弟一 碳酸二U-第三丁基環己基)醋 ^丁=、過氧化二 ♦甲基乙酯、過氧化二碳:::癸酸1-環己基 化二碳酸二(2-乙美p且、 虱基乙基)酯、過氧 火夂U乙基己基)酯、過氧化 :化二碳酸二甲氧基丁醋、過氧化新癸酸第4二己^、過 化特戊酸第三己酿、過氧化特戊酸第三;二二丁醋、過氧 過氧化二(3,5,5-三甲基己醯)、過二-曰、 化二月桂醯、過氧化二硬脂酿、匕:正辛醯、過氧 四甲基丁略、過氧化二 乙基己醆 3ΐ2χΡ/發明說明書(補件)/96·09/96125023 nv _ 文2,5〜二甲基-2,5〜 47 200811599 一(過虱化2-乙基己醯)己烷、 酯、過氧化二(扣甲A &乳化2_乙基己酸第三己 丁醋、過氧化- 過氧化2_乙基己酸第三 】,乳化:本,醯、過氧化異丁酸第三丁醋、 ㈣三己心化/5了基)句基環已^卜二_ 己基)環己貌、;,卜二己燒、卜二(過氧化第三 (4, 4-二(過氧化第二'化弟三丁基)環己烷、2, 2-二 石山舻楚 —土)環己基)丙燒、過氧化昱丙其罝 a "5 2, 5-二心Γ巧二丁酿、過氧化月桂酸第三丁酯、 過氧化異丙基二:基 碳酸第二丁π π 丁醋、過氧化2一乙基己基單 技第-丁酉曰、過氧化苯甲酸第 二(過氧化苯甲醯)己燒、過氧 ;:甲基= 氧化第一丁 ⑨心化苯甲酸第三丁醋、4,4-二(過 基)苯、過氧化二異丙苯、迅气2弟二丁基異丙 甲其9R ,产 過虱化二(第三己基)、2,5-二 土 2,5 一(過氧化第三丁基)己烷、 上氧化一(第二丁基)、過氧化氫對薄荷烧、2, 5一二甲基 广二_(過氧化第三丁基)己块-3、過氧化氳二異丙苯、 ’、’」四甲基丁基過氧化氫、過氧化氫異丙苯、第三丁 二過氧化氳、第二丁基二甲基石夕燒基過氧化物、2, 3一二甲 3-二苯基丁烧、過氧化二(3_f基苯甲醯)與過氧化 本甲醯(3-甲基苯甲醯)與過氧化二苯甲醯之混合物等。 再者,適用於本實施形態的硬化性組成物中,⑻光聚 312XP/發明說明書(補件)/96-09/96125023 48 200811599 口起始劑及/或熱聚合起始劑(使用2種以上之情況下 與聚合加速劑並用之情況下’指其總量。)之含有率二 對於硬化性組成物之總固形分,通常為q qi重量%以上、 較佳為0. 1重量%以上、更佳為〇· 5重量%以上。但,通常 為30重量%以下、較佳為2〇重量%以下。若光聚合起始劑 及/或熱聚合起始劑之含有率過大,則存在對基板之密著 性降低之情況。另-方面,若過少,則存在硬化性 情況。 又’作為⑻光聚合起始劑及/或熱聚合起始劑相對於 乙稀性不飽和化合物之㈣比,作為(乙烯性不飽和化合 物)/(光聚合起始劑及/或熱聚合起始劑)(重量比)之值, 通常為〇/1)〜(1〇〇/1)、較佳為(2/1)〜(50/1)。若調配 比脫離上述範圍,則存在密著性或硬化性降低之情況。 (C)聚合性單體 口口適用於本實施形態的硬化性組成物中所使用之聚合性 早體二係指與所謂的高分子物質相對的概念,係指除狹義 的「單體」以外,亦包含「二聚物」、「三聚物」、「寡聚物」 之概心(以下’有時總稱該等而記為乙婦性單體) 作為聚合性單體,可列舉分子内具有至少i個乙稀性不 飽和基之化σ物。作為分子内具有乙烯性不飽和基之化合 物之具體例’例如可列舉:(甲基)丙稀酸、(甲基)丙稀酸 之烧基酯、㈣腈、苯乙烯、具有i個乙烯性不飽和鍵之 羧酸與多(一)元醇之單酯等。 本實施形態中’較理想的是使用1分子中具有二個以上 312XP/發明說明書(補件)/96-09/96125023 49 200811599 ί烯性不飽和基之多官能乙婦性單體。作為多官能乙烯性 単體之例例如可列舉:脂肪族多經基化合物與不飽和幾 之自曰芳香私夕羥基化合物與不飽和羧酸之酯;藉由脂 肪族多經基化合物、芳香族多經基化合物等多價經基化合 物與不飽和幾酸及多元綾酸之醋化反應而獲得之醋等。 • 作為脂肪族多羥基化合物與不飽和羧酸之酯,例如可列 舉.^二醇二丙烯酸醋、三乙二醇二丙烯酸酯、三經甲基 三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯 酉夂g日、一季戊四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、 :季戊四醇六丙烯酸酯等脂肪族多羥基化合物之丙烯酸 酉旨,將該等例示化合物之丙烯酸酯替代成甲基丙烯酸醋之 曱基丙烯酸酯;同樣地替代成衣康酸酯之衣康酸酯;替代 成巴旦酸醋之巴豆酸酯;替代成順丁烯二酸酯之順丁稀二 酸醋等。 作為芳香族多羥基化合物與不飽和羧酸之酯,例如可列 ,·對苯一酚二丙烯酸酯、對苯二酚二曱基丙烯酸酯、間 :苯一酝一丙烯酸酯、間苯二酚二曱基丙烯酸酯、鄰苯三酚 三丙烯酸酯等芳香族多羥基化合物之丙烯酸酯及甲基丙 烯酸酯等。 作為藉由多價羥基化合物與多元羧酸及不飽和羧酸之 酯化反應而得之酯,未必為單一物,若列舉代表性具體 例’則例如有:丙烯酸、鄰笨二甲酸及乙二醇之縮合物, 丙,酸、順丁烯二酸及二乙二醇之縮合物,曱基丙烯酸、 對本一曱酸及季戊四醇之縮合物,丙稀酸、己二酸、丁二 312XP/發明說明書(補件)/96·09/96125023 50 200811599 醇及甘油之縮合物等。 另外,作為多官能乙烯性單體之例,例如有用的是··如 使聚異氰酸酯化合物與含有羥基之(甲基)丙烯酸酯或者 聚異氰酸酯化合物與多元醇以及含有羥基之(甲基)丙烯 酸酯反應而得之(甲基)丙烯酸胺基f酸酯;伸乙基雙丙烯 醯胺等丙烯醯胺;鄰苯二甲酸二烯丙酯等烯丙酯;^苯二 曱酸一乙稀酯等含有乙烯基之化合物等。 作為適用於本實施形態的硬化性組成物中之(c)聚合性 單體之含有率,相對於總固形分,通常未滿8〇重量%、較 佳為未滿70重量%,較佳為1〇重量%以上。若聚合性單體 之含有率脫離上述範圍,則難以獲得圖案良好的影像。 又,作為(C)聚合性單體相對於(A)乙烯性不飽和化合物 之調配比,(乙烯性不飽和化合物)/(聚合性單體)(重量比) 之值,通常為(10八)〜(1/10)、較佳為(5/1)〜(1/5)。) 對適用於本實施形態的硬化性組成物中所使用之聚合 性單體加以進一步詳述。 作為分子内具有1個乙烯性不飽和鍵之化合物,例如可 列舉·(甲基)丙烯酸、巴豆酸、異巴豆酸、順丁烯二酸、 衣康酸、檸康酸等不飽和羧酸及其烷基酯,(曱基)兩婦 月月’(甲基)丙烯醯胺,苯乙烯等。 又’作為分子内具有2個以上乙烯性不飽和鍵之化合 物,例如可列舉·· (a)不飽和羧酸與多羥基化合物之酯(以下,有時記為 「醋(甲基)丙烯酸酯」。)、 312XP/發明說明書(補件)/96-09/96125023 51 200811599 (b) 含有(甲基)丙烯醯氧基之磷酸酯、 (c) (甲基)丙烯酸羥基酯化合物與聚異氰酸酯化合物之 (甲基)丙烯酸胺基甲酸酯、 (d) (甲基)丙烯酸或(f基)丙烯酸羥基酯化合物與聚環 氧化合物之環氧(甲基)丙烯酸酯等。該等可單獨使用玉 種,或並用2種以上。 其中,就聚合性、交聯&、及可擴大伴隨其之曝光部與 非曝光部之顯影液溶解性的差異等方面而言,較佳為分子 内具有2個以上乙浠性不飽和鍵之化合物,又,尤佳為其 不飽和鍵來自(甲基)丙烯醯氧基之丙烯酸酯化合物。 作為上述(a)酯(甲基)丙烯酸酯,例如可列舉··不飽和 羧酸與,乙二醇、聚乙二醇(加成數2〜14)、丙二醇、聚 丙二醇(加成數2〜14)、1,3-丙二醇、ι,4-丁二醇、1,6一 己二醇、三羥曱基丙烷、甘油、季戊四醇、二季戊四醇、 及彼等之環氧乙烷加成物、環氧丙烷加成物、二乙醇胺、 二乙醇胺等脂肪族多羥基化合物之反應物。 更具體而言,例如可列舉:乙二醇二(甲基)丙烯酸酯、 二乙二醇二(曱基)丙烯酸酯、丙二醇二(曱基)丙烯酸酯、 二羥曱基丙烷二(甲基)丙烯酸酯、三羥曱基丙烷三(曱基) 丙烯酸酯、二羥甲基丙烷環氧乙烷加成三(甲基)丙烯酸 酯、甘油二(甲基)丙烯酸酯、甘油三(曱基)丙烯酸酯、甘 油壞氧丙烧加成三(曱基)丙烯酸酯、季戊四醇二(甲基) 丙烯酸酯、季戊四醇三(曱基)丙烯酸酯、季戊四醇四(甲 基)丙烯酸酯、二季戊四醇五(曱基)丙烯酸酯、二季戊四 312XP/發明說明書(補件)/96-09/96125023 52 200811599 醇六(甲基)丙稀酸西t榮 文®曰專,及同樣的巴豆酸酯、異巴豆酸 s曰、順丁烯二酸酯、衣康酸酯、檸康酸酯等。 挪〇作為⑷& (甲基)丙稀酸酯’可列舉不飽和羧酸, “二酚、間笨二酚、鄰苯三酚、雙酚F、雙酚A等芳 香族多羥基化合物、戋彼笼夕卢β 7 a A攸4之裱乳乙烷加成物之反應物。 雔,=言,例如可列舉:雙紛A:(甲基)丙烯酸醋、 雙盼A雙[氧乙稀(甲基)丙婦酸醋]、雙紛八雙[環氧丙基 醚(甲基)丙稀酸酯]等;如里羞 」寻,如異虱尿酸三(2-羥乙基)酯之二 (甲基)丙烯㈣、三(甲基)㈣酸料,不齡㈣、與 異尿酸二(2-M乙基)酷等雜環式多經基化合物之反應 物;如(甲基)丙烯酸與鄰苯二甲酸及乙二醇之縮合物、 基)丙烯酸與順丁烯二酸及二乙— 〇 — S予之鈿合物、(曱基) 浠酸與對苯二曱酸及季戊四醇之墙人 予I細合物、(甲基)丙烯酸盥 己^~酸及丁 ,^ δ?*及甘油之缩人·必7楚 . 稚σ物荨,不飽和羧酸與多元游 酸及多羥基化合物之反應物。 义 (b)作為含有(甲基)丙烯醯氧基之磷酸酯,若為含有 基)丙稀酿氧基之麟酸醋化合物,則並無特別限定, 為以下述通式(la)〜(Ic)表示者。 乂 [化 12] 312XP/發明說明書(補件)/96-09/96125023 53 200811599 H2C: ^10 〇R1 R13 [wherein '^^^ is synonymous with '(6)' respectively. As a method for producing a compound represented by the general formula (A-VI), #, ] / , right is available for 312XP/invention specification ( Supplement) /96-09/96125023 43 200811599 In particular, there is no method for the compound of the structure of the A magical structure, and the method of the compound represented by the above formula (A-" In the same manner, the following production method can be exemplified: a raw material of a diepoxypropyl 2 material is formed thereon, and a carbonyloxy group having a ethylenically unsaturated group is formed thereon, and further, a self-poly-acid and an oleic acid vinegar are formed. The compound of the compound t or the compound of the above-mentioned compound is reacted. 2. In the curable composition of the present embodiment, (1) the woman's sexual remedy may be used alone or as a mixture of two or more. (Β) Photopolymerization initiator and/or thermal polymerization initiator. The photopolymerization initiator used in the form and/or thermal polymerization initiation =, right is the active light of the continent and / or The compound which is thermally unsaturated and is unsaturated is not particularly limited, and a known agent and/or a thermal polymerization initiator may be used. Specific examples of the photopolymerization initiator include 2-(phenyl)-u-bis(trichloromethyl)-trimethylmorphine and 2-p-methoxynaphthalene-mono-(trichloromethyl)- All three, 2-(4-ethoxymethylnaphthyl)_46_"monochloromethyl)-average three-till and other tooth methylated trimorphine derivatives; 2_three gas again = -5-(2'- Benzoindolyl h, 3, 4h, 2_trichloromethylenediamine oxadiazole derivatives; spears, benzoin, benzoin, benzoin, benzoin, and benzoin alkyl ether; - anthracene derivatives such as methyl hydrazine, 2-ethyl hydrazine, 2_third hydrazine, and chloropurine; diphenyl ketone, Michelin:, 312XP / invention specification (supplement) / 96-09/96125023 200811599 4,4-bis(diethylamino)diphenyl ketone, 2-methyldiphenyl ketone, decyldiphenyl ketone, 4-methyldiphenyl ketone, 2-chloro Diphenyl s-iso-derivatives such as diphenyl = ketone and ketodiphenyl ketone; odor-based 2, 2-monodecyloxy-2-phenylacetophenone, 2,2-diethoxybenzene B, hydroxycyclohexyl phenyl ketone, hydroxy-2-methyl phenyl ketone, hydroxy-1-methylethyl - (p- cumene) Ketone, hydroxy-helium to dodecyl phenyl) ketone, 2-pyryl-2-dimethylamino-indole-(4-quinolinylphenyl)-butanone-methyl- Acetophenone derivatives such as [4-(methylthio)phenyl]-2- morpholinyl-bupropion, dichloromethyl-(p-butylphenyl) ketone; thioxanthone, 2-B Thiophenone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthene, 2,4-diiso Propyl thioxanthene, isothioxanthone derivative; phenyl phthalate derivative such as ethyl p-dimethylaminobenzoate or ethyl p-diethyl benzoate; 9-phenyl acridine, 9-(pair) Acridine derivatives such as methoxyphenyl)acridine; morphine derivatives such as 9,10-dimercaptobenzophenone; anthrone derivatives such as benzofluorenone; , dicyclopentadienyl bisphenyltitanium, dicyclopentamethylene bis(2,3,4,5,6-pentafluorophenyl-1-yl)titanium, dicyclopentadiene meringue, 5, 6-tetrafluorobenzene+yl)titanium, dicyclopentadienyl (2di^-3-(pyrrole-1-yl)-benzene-;[_base) titanium and other titanocene derivatives; Japanese patent Bulletin 2000-80068, special Acetophenone oxime-o-acetate, 1,2-octanedione-1-[4-(phenyl sulphide) disclosed in the publication of Japanese Patent Publication No. 2004-183593 (Japanese Patent Application No. 2004-183593) Base 2 —(o-benzylidene fluorenyl)], 丨-[9-ethyl-6-(2-phenylhydrazinyl)-9-9-carbazole-3-yl] Ethyl ketone-1-(〇-B An oxime ester compound or the like. These may be used alone or in combination of two or more kinds in the 312 ΧΡ/invention specification (supplement)/96-09/96125023 45 200811599. In addition, for example, fine chemistry ((10) Chemicai), 1 gw year March 1 、, ν〇1· 2〇, Ν〇·4, ρ·16~ρ·26, or 曰本专利公开昭59 An initiator disclosed in, for example, Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Further, in addition to the photopolymerization initiators, a hydrogen-donating compound as a polymerization accelerator may be used in combination. As the hydrogen-donating compound, for example, 2-mercaptobenzothiazole, 2-mercaptobenzimidazole, 2-mercaptobenzazole, 3-indolyl 1,2,4-diazole, 2- Mercapto-4(3Η)-quinazoline, valinophthalene, ethylene glycol dithiopropionate, trimethylolpropane trithiopropionate, pentaerythritol tetrathiopropionate, etc. a compound; a polyfunctional thiol compound such as hexanedithiol, trimethylolpropane trithiogluconate or pentaerythritol tetrathiopropionate; hydrazine, hydrazine-dialkylamino benzoate, hydrazine-benzene a derivative such as a glycine acid, an ammonium salt or a sodium salt of stilbene phenylglycine; a derivative such as an ammonium salt or a sodium salt of phenylalanine or phenylalanine; a derivative such as an ester of phenylalanine or the like. These may be used alone or in combination of two or more. Among them, from the viewpoint of the sensitivity of the curable composition, as the suggestive compound, a mercapto group such as 2-mercaptobenzothiazole or 2-mercaptobenzimidazolium 2-sulfenylbenzoxazole is preferred. Heterocyclic compound. Specific examples of the thermal polymerization initiator include azo compounds, organic peroxides, and hydrogen peroxide. These may be used alone or in combination of two or more. As the azo compound, 2, 2, - azobisisobutyl, 2 2, 312 ΧΡ / invention specification (supplement) / 96-09/96125023 46 200811599 azobis(2-mercaptobutyronitrile) ),[,i,-azobis(cyclohexene-ii-carbonitrile), 2,2'-azobis(2,4-didecyl valeronitrile), Bu [(1_cyano) I-mercaptoethyl) azo]carbamamine (2-(aminomethyl azo azo) isobutyronitrile), 2, 2-azobis[2-indolyl-N-[1,1-double (hydroxymethyl)-2-hydroxyethyl]propanamine], 2, 2,-azo: bis[N-(2-propenyl)-2-methylpropionamide], 2,2,- Azobis[N-(2-propenyl)-2-ethylpropanamide], 2, 2,-azobis[N-butyl-2-methylpropanamide], 2,2' - azobis <^-cyclohexyl-2-mercaptopropionamide, 2,2, azobis(dimethyl-2-methylpropionamide), 2, 2, monoazo (dimercapto-indenyl propionate), 2, 2,-azobis(2,4,4-tridecylpentene), and the like. Among them, preferred are 2,2'-azobisisobutyronitrile, 2,2, azobis(2,4-monomethylvaleronitrile) and the like. Examples of the organic peroxide include benzamidine peroxide, peroxymono(tert-butyl), and cumene hydroperoxide. Specifically, it can be as follows::: oxygen:: cumene butyl chlorate, vinegar, peroxynonanoic acid;; (di-U-tert-butylcyclohexyl) vinegar ^, peroxidation Dimethylethyl ester, carbon dioxide peroxide::: 1-cyclohexyldicarbonate di(2-ethylpyryl, decylethyl) ester, peroxynonyl U ethylhexyl), Peroxidation: dimethoxy butyl sulphate, peroxy neodecanoic acid 4 nd hexyl, peroxidized pivalic acid third brewed, peroxidized pivalic acid third; dibutyl vinegar, peroxygen Oxidized di(3,5,5-trimethylhexanide), trans-di-anthracene, dilaurin, peroxydisteal, rhodium: n-octyl, peroxytetramethylbutyrate, peroxidation Ethylhexanide 3ΐ2χΡ/Invention Manual (supplement)/96·09/96125023 nv _ 2,5~Dimethyl-2,5~ 47 200811599 One (over 2, 2-ethylhexyl) hexane, Ester, peroxide II (Buckle A & emulsified 2-ethylhexanoic acid third butyl vinegar, peroxidation - 2 - ethylhexanoic acid peroxide third), emulsification: Ben, bismuth, peroxidic isobutyric acid The third vinegar, (four) three-hearted /5 base) sentence base ring has ^ 卜 _ hexyl) ring appearance,;, Dihexidine, Buji (peroxidized third (4, 4-two (peroxidized second 'di-tributyl) cyclohexane, 2, 2-two-stone mountain Chu- soil) cyclohexyl) propyl, Bismuth peroxide, a "5 2, 5-dicentric, dibutyl, butyl laurate, isopropyl peroxydicarbonate, second π π butyl vinegar, peroxidation 2 monoethylhexyl monomethane - butyl hydrazine, benzoic acid benzoic acid second (benzophenone peroxide) hexane, peroxy; methyl = oxidized first butyl 9 cardinic benzoic acid third vinegar, 4 , 4-di(peryl)benzene, dicumyl peroxide, Xunqi 2 dibutyl isopropanyl 9R, produced by bismuth (third hexyl), 2,5-di 2,5 a (t-butylperoxy) hexane, an upper oxidation of a (second butyl), hydrogen peroxide to peppermint, 2,5-dimethyl dimethyl bis (peroxidized tert-butyl) hexa- 3. Dicumyl peroxide, ','" tetramethylbutyl hydroperoxide, cumene hydroperoxide, tributyl ruthenium peroxide, second butyl dimethyl sulphur Oxide, 2,3-dimethyl-3-diphenylbutane, bis(3_f-benzamide) and Peroxidation A mixture of methacrylate (3-methylbenzhydramidine) and benzoic acid peroxide. Further, it is suitable for use in the curable composition of the present embodiment, (8) Photopolymerization 312XP/Invention Manual (Supplement)/96-09/96125023 48 200811599 Oral initiator and/or thermal polymerization initiator (using 2 kinds) In the above case, the total solid content of the hardening composition is usually q qi weight% or more, preferably 0.1% by weight or more, in the case where it is used together with the polymerization accelerator. More preferably, it is 5% by weight or more. However, it is usually 30% by weight or less, preferably 2% by weight or less. When the content ratio of the photopolymerization initiator and/or the thermal polymerization initiator is too large, the adhesion to the substrate may be lowered. On the other hand, if it is too small, there is a case of hardenability. Further, as the (four) ratio of the (8) photopolymerization initiator and/or the thermal polymerization initiator to the ethylenically unsaturated compound, as (ethylenically unsaturated compound) / (photopolymerization initiator and/or thermal polymerization) The value of the starting agent) (weight ratio) is usually 〇/1)~(1〇〇/1), preferably (2/1)~(50/1). If the blending ratio is out of the above range, the adhesion or the curability may be lowered. (C) The polymerizable monomer mouth is suitable for the concept of the polymerizable early dindolic finger used in the curable composition of the present embodiment as opposed to a so-called high molecular substance, and means a term other than the narrowly defined "monomer". It also includes the "dimer", "trimer", and "oligomer" (hereinafter referred to as "women's monomers"). a sigma species having at least one ethylidene unsaturated group. Specific examples of the compound having an ethylenically unsaturated group in the molecule include, for example, (meth)acrylic acid, alkyl (meth)acrylic acid ester, (iv) nitrile, styrene, and i-ethylation. A monoester of a carboxylic acid and an unsaturated monohydric alcohol of an unsaturated bond. In the present embodiment, it is preferred to use a polyfunctional ethylenic monomer having two or more 312XP/inventive instructions (supplement)/96-09/96125023 49 200811599 olefinic unsaturated group in one molecule. Examples of the polyfunctional ethylenic steroid include, for example, an aliphatic poly-based compound and an unsaturated mono- oxime aromatic hydroxy compound and an unsaturated carboxylic acid ester; by an aliphatic poly-based compound, aromatic A vinegar obtained by a valence reaction of a polyvalent group-based compound such as a polybasic compound with an unsaturated acid and a polybasic acid. • Examples of the ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid include diol diol diacrylate, triethylene glycol diacrylate, trimethyl methacrylate, pentaerythritol triacrylate, and pentaerythritol tetrapropene. Acrylic acid of an aliphatic polyhydroxy compound such as pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, or the like, and the acrylate of the exemplified compounds is replaced by a methacrylic acid sulfonate group. Acrylate; likewise replaces the itaconate of the itaconate; replaces the crotonate of balsam vinegar; replaces the maleic acid succinate with maleic acid ester, and the like. As an ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid, for example, p-phenylene phenol diacrylate, hydroquinone dimercapto acrylate, benzoyl acrylate, resorcin Acrylates and methacrylates of aromatic polyhydroxy compounds such as dimercapto acrylate and pyrogallol triacrylate. The ester obtained by the esterification reaction of a polyvalent hydroxy compound with a polyvalent carboxylic acid and an unsaturated carboxylic acid is not necessarily a single substance, and examples of the representative specific examples include acrylic acid, o-p-dicarboxylic acid and ethylene. Alcohol condensate, condensate of C, acid, maleic acid and diethylene glycol, methacrylic acid, condensate of nitric acid and pentaerythritol, acrylic acid, adipic acid, dibutyl 312XP / invention Instruction manual (supplement)/96·09/96125023 50 200811599 A condensate of alcohol and glycerin, etc. Further, as an example of the polyfunctional ethylenic monomer, for example, a polyisocyanate compound and a hydroxyl group-containing (meth) acrylate or polyisocyanate compound and a polyol and a hydroxyl group-containing (meth) acrylate are useful. (meth)acrylic acid amine-based f-ester; propylene phthalamide such as ethyl bis acrylamide; allyl ester such as diallyl phthalate; monoethyl phthalate A compound containing a vinyl group or the like. The content of the (c) polymerizable monomer to be used in the curable composition of the present embodiment is usually less than 8% by weight, preferably less than 70% by weight, based on the total solid content, preferably 1% by weight or more. When the content of the polymerizable monomer is out of the above range, it is difficult to obtain an image having a good pattern. Further, the ratio of (C) polymerizable monomer to (A) ethylenically unsaturated compound, (ethylenically unsaturated compound) / (polymerizable monomer) (weight ratio) is usually (10) ) (1/10), preferably (5/1) to (1/5). The polymerizable monomer to be used in the curable composition of the present embodiment will be described in further detail. Examples of the compound having one ethylenically unsaturated bond in the molecule include unsaturated carboxylic acids such as (meth)acrylic acid, crotonic acid, isocrotonic acid, maleic acid, itaconic acid, and citraconic acid. Its alkyl ester, (mercapto) two women's moon month '(meth) acrylamide, styrene and the like. Further, as a compound having two or more ethylenically unsaturated bonds in the molecule, for example, (a) an ester of an unsaturated carboxylic acid and a polyhydroxy compound (hereinafter, sometimes referred to as "vinegar (meth) acrylate) ()) Phosphate containing (meth) propylene oxime, (c) hydroxy (meth) acrylate compound and polyisocyanate. 312XP/Invention Manual (Supplement)/96-09/96125023 51 200811599 (b) An epoxy (meth) acrylate of a compound (meth) acrylate, (d) a (meth)acrylic acid or a (f-) hydroxy acrylate compound, and a polyepoxy compound. These may be used alone or in combination of two or more. Among them, in terms of polymerizability, crosslinking, and expansion, it is preferable to have two or more ethylenically unsaturated bonds in the molecule in terms of the difference in solubility of the developing solution and the non-exposed portion. The compound, in addition, is preferably an acrylate compound derived from a (meth) propylene oxime group whose unsaturated bond is derived. Examples of the (a) ester (meth) acrylate include an unsaturated carboxylic acid, ethylene glycol, polyethylene glycol (addition number 2 to 14), propylene glycol, and polypropylene glycol (addition number 2 to 14) ), 1,3-propanediol, iota, butanediol, 1,6-hexanediol, trihydrocarbylpropane, glycerin, pentaerythritol, dipentaerythritol, and their ethylene oxide adducts, epoxy A reactant of an aliphatic polyhydroxy compound such as a propane adduct, diethanolamine or diethanolamine. More specifically, for example, ethylene glycol di(meth)acrylate, diethylene glycol di(decyl)acrylate, propylene glycol bis(indenyl)acrylate, dihydroxydecylpropane di(methyl) Acrylate, trihydroxymercaptopropane tris(decyl) acrylate, dimethylolpropane ethylene oxide addition tris(meth) acrylate, glycerol di(meth) acrylate, glycerol Acrylate, glycerol, oxypropylene, tris(decyl) acrylate, pentaerythritol di(meth) acrylate, pentaerythritol tris(decyl) acrylate, pentaerythritol tetra(meth) acrylate, dipentaerythritol曱 )) acrylate, dipentaquat 312XP / invention manual (supplement) / 96-09/96125023 52 200811599 Alcohol hexa(methyl) acrylate acid t rong Wen 曰 曰, and the same crotonate, different Crotonic acid s hydrazine, maleic acid ester, itaconate acid ester, citraconate, and the like. Examples of (4) & (meth) acrylates include unsaturated carboxylic acids, aromatic polyhydroxy compounds such as diphenol, m-diphenol, pyrogallol, bisphenol F, and bisphenol A, and hydrazine. The reaction product of the lactine ethane adduct of β 7 a A攸4. 雔,=言, for example, a: A: (meth)acrylic acid vinegar, double hope A double [oxyethylene (Methyl) propyl vinegar vinegar], double bismuth [epoxy propyl ether (methyl) acrylate], etc.; such as ruthy, such as isoindole uric acid tris (2-hydroxyethyl) ester a reaction product of a heterocyclic polycarbophilic compound such as di(meth)propene (tetra), tris(methyl)(tetra) acid, age (four), and diuritic acid di(2-Methyl); a condensate of acrylic acid with phthalic acid and ethylene glycol, a base of acrylic acid and maleic acid, and a bismuth-sodium sulphate, (mercapto) decanoic acid and terephthalic acid and The wall of pentaerythritol is I, the (meth)acrylic acid, the acid and the butyl, the δ?* and the glycerin are shortened. The sputum, the unsaturated carboxylic acid and the polyacid And a reactant of a polyhydroxy compound. The (b) is a phosphate ester containing a (meth) acryloxy group, and is not particularly limited as long as it contains a propyl acetoacetate compound, and is represented by the following formula (la) to ( Ic) Representation.乂 [Chem. 12] 312XP/Invention Manual (supplement)/96-09/96125023 53 200811599 H2C: ^10 〇

°^CH2^〇--S 十 OH 3-q (la) R10 C H2C—C一C-i 〇 jcH2-CH2—--p-^-i -P十OH丨㈣ (lb) >10 H2C=c—C-i 0^GH2^GH2-〇^〇C(«〇)CH2CH2CH2CH2CH2^— j 十 OH ) (Ic) (式(^、(…^(^^,『表示氫原子或曱基, P、P’為1〜25之整數,q為卜2、或3。) 此處,p、p,為M0、尤佳為卜4。作為此種化合物 之具體例’例如可列舉:(甲基)丙烯醯氧基乙基磷酸酯、 雙[(曱基)丙烯It氧基乙基]麟酸醋、(甲基)丙烯醯氧基乙 二醇石粦酸S旨等,該等可分別單獨使用,亦可作為混合物使 用。 (C)作為(曱基)丙烯酸胺基曱酸酯,例如可列舉(曱基) 丙烯酸羥基酯化合物與聚異氰酸酯化合物之反應物。 作為(甲基)丙烯酸羥基酯化合物,例如可列舉:(曱美) 丙烯酉文备曱酉旨、(曱基)丙烯酸經乙醋、四經曱基乙烧二(曱 基)丙烯酸酯等。 又’作為聚異氰酸酯化合物,例如可列舉:1 6 —六亞曱 基一異氰酸醋、1,8-二異氰酸酯-4-異氰酸酯曱基辛燒等 月曰肪私聚異氣酸g旨,j辰己烧^一異氣酸g旨、二曱基淨己产二 異氛酸酷、4,4-亞曱雙(異氰酸環己酯)、異佛酮二異 312xp/發明說明書(補件)/96-09/96125023 54 200811599 酉曰又環庚燒二異氰酸酯等脂環式聚異氰酸酯;4, 4-二苯 基曱烷二異氰酸酯、三(異氰酸酯苯基)硫代磷酸酯等芳香 族聚異氰酸酯;異氰尿酸酯等雜環式聚異氰酸酯等聚異氰 酸酯化合物。 (C)作為(曱基)丙烯酸胺基甲酸酯,較佳為1分子中具 有4個以上(較佳為6個以上、更佳為8個以上)胺基曱酸 醋鍵[-NH-C0-〇-]、及4個以上(較佳為6個以上、更佳為 8個以上)(曱基)丙烯醯氧基之化合物。該化合物,例如 可藉由使下述(I )之化合物、與下述⑴之化合物反應而 得。 (i )1分子中具有4個以上異氰酸酯基之化合物 例如可列舉:使季戊四醇、聚甘油等丨分子中具有4個 以上經基之化合物,與丨,6 —六亞甲基二異氰酸酯、三甲 基1,6 /、亞甲基二異氰酸酯、異佛酮二異氰酸酯、甲苯 二異氰酸酯等二異氰酸酯化合物反應而得的化合物(丨 -1),使乙二醇等1分子中具有2個以上羥基之化合物, 與旭化成工業股份有限公司製造之「Duranate24A-丨〇〇」、 厂 Duranate22A-75PX 」、「 Duranate21s—75E 」、 「 DuranatelSH - 70B 」等縮二脲型, 「 DuranateP-301-75E 」、「 DuranateE—4〇2—9〇τ 」、 「DuranateE-405-80Τ」等加成物型等丨分子中具有3個 以上異氰酸酯基之化合物反應而得的化合物(丨—2);使異 氰酸酯(甲基)丙烯酸乙酯等聚合或共聚合而得的化合物 (i -3)等 。 312XP/發明說明書(補件)/96-09/96125023 55 200811599 作為此種化合物,可傕用市隹 業股份有限公司製造之化成工 醯匕)=子合I具有1個以上經基及2個以上(?基)丙烯 一例如可列舉:季戊四醇二(甲基)丙婦酸醋、二季戊四醇 三(甲基)丙烯酸醋、二季戊四醇四(甲基)丙婦酸醋、二季 戊四醇五(甲基)丙烯酸酯等1分子中具有1個以上羥基及 2個以上、較佳為3個以上(曱基)丙烯酿氧基之化合物。 此處,作為上述(i )之化合物的分子量,作為使用凝膠 今透層析法(GPC法)而測定的標準聚苯乙烯換算之重量平 均分子量(Mw),較佳為500〜200,000,尤佳為〗,〇〇〇〜 150,000。又’作為(甲基)丙烯酸胺基甲酸酯之標準聚苯 乙烯換异之重量平均分子量(Mw),較佳為600〜150, 〇〇〇。 再者,此種(甲基)丙烯酸胺基曱酸酯,例如可藉由如下 方法製造:使上述(i )之化合物與上述(jj)之化合物,於 曱苯或乙酸乙酯等有機溶劑中,於l〇°C〜150°C反應5分 鐘〜3小時左右。該情況下,較佳為將前者之異氰酸酯基 與後者之羥基的莫耳比設為(1/10)〜(10/1)之比例,視需 要使用二月桂酸正丁基錫等觸媒。 本實施形態中,(曱基)丙烯酸胺基甲酸酯中,尤佳為使 用以下述通式(Π )表示者。 [化 13]°^CH2^〇--S 十 OH 3-q (la) R10 C H2C—C—Ci 〇jcH2-CH2—--p-^-i-P 十 OH丨(4) (lb) >10 H2C=c —Ci 0^GH2^GH2-〇^〇C(«〇)CH2CH2CH2CH2CH2^—j 十 OH ) (Ic) (Formula (^, (...^(^^, “ represents a hydrogen atom or a sulfhydryl group, P, P' It is an integer of 1 to 25, and q is 2, or 3.) Here, p and p are M0, and particularly preferably 4. As a specific example of such a compound, for example, (meth)acrylic acid oxime Oxyethyl phosphate, bis[(indenyl) propylene Itoxyethyl] linoleic acid, (meth) propylene methoxy ethoxy sulphate S, etc., these can be used separately, It can be used as a mixture. (C) The (mercapto) acrylamide phthalate may, for example, be a reaction product of a (hydroxy) hydroxy acrylate compound and a polyisocyanate compound. Illustrative examples include: (comparable to propylene), acetonitrile, acetoacetate, acetoacetate, bis(indenyl) acrylate, etc. Further, as the polyisocyanate compound, for example, 1 6 — 六亚曱基Isocyanic acid vinegar, 1,8-diisocyanate-4-isocyanate thiol octyl sulphate and other moon-shaped fat poly-glycolic acid g, j Chen has burned ^ an isogas acid g, two 曱 base net two different Cool acid, 4,4-Azain bis(cyclohexyl isocyanate), Isophorone diiso 312xp/Invention Manual (supplement)/96-09/96125023 54 200811599 酉曰 环 环 烧 二 diisocyanate An alicyclic polyisocyanate; an aromatic polyisocyanate such as 4, 4-diphenyldecane diisocyanate or tris(isocyanate phenyl) phosphorothioate; or a polyisocyanate compound such as a heterocyclic polyisocyanate such as isocyanurate. (C) The (mercapto)acrylic acid urethane preferably has 4 or more (preferably 6 or more, more preferably 8 or more) amino citrate bonds in one molecule [-NH- C0-〇-], and 4 or more (preferably 6 or more, more preferably 8 or more) (mercapto) acryloxy compounds. The compound can be, for example, made by the following (I) The compound is obtained by reacting the compound of the following (1). (i) A compound having four or more isocyanate groups in one molecule, for example, pentaerythritol, polyglycol a compound having four or more mesogenic groups in an anthracene molecule such as oil, and anthracene, 6-hexamethylene diisocyanate, trimethyl 1,6 /, methylene diisocyanate, isophorone diisocyanate, toluene diisocyanate, etc. A compound (丨-1) obtained by reacting a diisocyanate compound, a compound having two or more hydroxyl groups in one molecule such as ethylene glycol, and "Duranate 24A-丨〇〇" manufactured by Asahi Kasei Kogyo Co., Ltd., and Duranate 22A-75PX , "Duranate21s-75E", "DuranatelSH-70B" and other biuret type, "DuranateP-301-75E", "DuranateE-4〇2-9〇τ", "DuranateE-405-80Τ" and other adducts A compound (i-2) obtained by reacting a compound having three or more isocyanate groups in an isomer molecule, and a compound (i-3) obtained by polymerizing or copolymerizing ethyl isocyanate (meth)acrylate or the like. 312XP/Inventive Manual (Repair)/96-09/96125023 55 200811599 As such a compound, it can be used in the chemical industry manufactured by Shisei Co., Ltd.) = Sub-I has more than one base and 2 Examples of the above (?) propylene include pentaerythritol di(methyl) propylene vinegar, dipentaerythritol tris(meth) acrylate vinegar, dipentaerythritol tetrakis(methyl) propyl acetonate, dipentaerythritol pentoxide (methyl) A compound having one or more hydroxyl groups and two or more, preferably three or more (fluorenyl) acryloxy groups in one molecule such as an acrylate. Here, the molecular weight of the compound (i) is preferably 500 to 200,000, as a weight average molecular weight (Mw) in terms of standard polystyrene measured by gel chromatography (GPC method). Good for 〗, 〇〇〇 ~ 150,000. Further, as the standard polystyrene of (meth)acrylic acid urethane, the weight average molecular weight (Mw) is preferably 600 to 150, 〇〇〇. Further, such an amino acid methacrylate may be produced, for example, by subjecting the compound of the above (i) to the compound of the above (jj) in an organic solvent such as toluene or ethyl acetate. , react at l ° ° C ~ 150 ° C for 5 minutes ~ 3 hours or so. In this case, it is preferred to set the molar ratio of the former isocyanate group to the hydroxyl group of the latter to a ratio of (1/10) to (10/1), and a catalyst such as n-butyltin dilaurate is used as needed. In the present embodiment, the (mercapto)acrylic acid urethane is preferably used in the following formula (?). [Chem. 13]

(π) 312XP/發明說明書(補件)/96-09/96125023 56 200811599(π) 312XP/Invention Manual (supplement)/96-09/96125023 56 200811599

土 [式(π)中,Ra表示具有伸烷氧基或伸芳氧基之重複構 造,且具有4〜20個可與Rb鍵結之氧基的基。肋及Rc, 分別獨立表示碳數為之伸烷基,如表示具有 個(甲基)丙烯醯氧基之有機殘基。Ra、Rb、Rc&RdM 有取代基。X為4〜20之整數、7為〇〜15之整數” 〜15之整數。] 此處’作為式⑴中之伸燒氧基的重複構造 如可列舉來㈣丙三醇、甘油、季戊四醇等者。又,作為 1 Ra之伸方基的重複構造,例如可列舉來自 1,3, 5-苯三酚等者。 一、 又’Rb及RC之伸烷基的碳數,較佳為分別獨立 Rd中之(甲基)丙烯醯氧基較佳為卜?個。:〜5。 〜15、y為1〜1〇、2為1〜1〇。 土马X為4 進而,作為Ra,較佳為下述式[再者, 1〇之整數。]。又,作為此及以,較佳為分別猶^ 2〜 亞甲基、單甲基二亞曱基、或三亞曱基。別獨立為二 較佳為下述式。 而作為Rd, [化 14] 312XP/發明說明書(補件)/96-09/96125023 57 200811599 fH2. 分 GHf^GH^O-Q 9¾Soil [In the formula (π), Ra represents a repeating structure having an extended alkoxy group or an extended aryloxy group, and has 4 to 20 groups which are bondable to Rb. The ribs and Rc, each independently represent an alkyl group having a carbon number, such as an organic residue having a (meth) propylene fluorenyloxy group. Ra, Rb, Rc & RdM have a substituent. X is an integer of 4 to 20, and 7 is an integer of 〇 15 to an integer of -15. Here, 'the repeating structure of the alkylene oxide in the formula (1) is exemplified by (iv) glycerin, glycerin, pentaerythritol, and the like. Further, examples of the repeating structure of the stretching group of 1 Ra include those derived from 1,3, 5-benzenetriol, etc. 1. The carbon number of the alkyl group of 'Rb and RC is preferably respectively The (meth) propylene oxime group in the independent Rd is preferably a ruthenium: 〜5. 〜15, y is 1 to 1 〇, 2 is 1 to 1 〇. The soil horse X is 4, and further, as Ra, It is preferably the following formula [again, an integer of 1 。.] Further, as such and preferably, it is preferably a methylene group, a monomethyldiindenylene group or a triadenylene group. The independent second is preferably the following formula. As Rd, [Chem. 14] 312XP / invention specification (supplement) / 96-09/96125023 57 200811599 fH2. GHf^GH^OQ 93⁄4

R<i r-ChCHa卞CHi_0-CH2—p-CHa_0-Q H 9¾ ? 9R<i r-ChCHa卞CHi_0-CH2—p-CHa_0-Q H 93⁄4 ? 9

Q o 一 O-CftrCH^CHjrCh^g (其中,Q 為 ϋΗ^% ) 作為上述(d)環氧(甲基)丙烯酸酯,可列舉(甲基)丙埽 酸或(甲基)丙烯酸羥基酯化合物、與聚環氧化合物之反應 物。 作為聚環氧化合物,例如可列舉:(聚)乙二醇聚環氧丙 基醚、(聚)丙二醇聚環氧丙基醚、(聚)丨,4_ 丁二醇聚产 ,基喊、(聚”,5-戊二醇聚環氧丙㈣、(聚)新戊二I 環氧丙基_、(聚)1,6-己二醇聚環氧丙基_、(聚 : 基丙烧聚環氧丙基鱗、(聚)甘油聚環氧丙基鱗 广 醇聚環氧丙基醚等脂肪族聚環氧化人 Α)山柒 苯酴㈣清漆聚環氧化合物、^苯㈣搭 3物;二間’對)甲盼_清漆聚環氧化合物雙Γα 4氧化合物、雙盼F聚環氧化合物等芳香 广私a 物;山梨醇酐聚環氧丙基醚、里 、Λ衣虱化合 氧丙基三(2-經乙幻里氰展响、鼠认二%氧丙顆、三環 等聚環氧化合物。"尿酸料雜環式聚環氧化合物 312ΧΡ/發明說明書(補件)/9W)9/96125〇23 58 200811599 _ 2為(甲基)丙烯酸或(曱基)丙烯酸羥基酯化合物、與聚 =氧化合物之環氧(曱基)丙烯酸酯,可列舉如該等之聚環 氧化a物、與上述(甲基)丙烯酸或上述(甲基)丙烯酸羥基 酯化合物之反應物等。 作為其他乙埽性不飽和化合物,例如可列舉··伸乙基雙 曱基)丙烯醯胺等(甲基)丙烯醯胺、鄰苯二甲酸二烯丙ί :烯丙酯、鄰笨二曱酸二乙烯酯等含有乙烯基之化合物; 藉由利用五石瓜化一磷等將含有鱗鍵之乙烯性不飽和化合 物之醚鍵硫化而變為硫醚鍵,而提升交聯速度的含有硫醚 鍵之化合物。 又,例如可列舉··使用含有異氰酸酯基或巯基之矽烷偶 合劑,使日本專利第3164407號公報及特開平9-100111 號公報等所揭示之多官能(曱基)丙烯酸酯化合物、與粒徑 為5〜30 nm之矽溶膠[例如,異丙醇分散有機矽溶膠(曰 產化學股份有限公司製造之「IPA—ST」)、甲基乙基酮分 散有機矽溶膠(曰產化學股份有限公司製造之 「MEK-ST」)、甲基異丁基酮分散有機矽溶膠(日產化學股 伤有限公司製造之「MIBK-ST」)鍵結而成的化合物(藉由 矽烷偶合劑而使乙烯性不飽和化合物與矽溶膠反應而鍵 結’藉此提升作為硬化物的強度或耐熱性之化合物)。 本實施形態中,就硬化物之力學強度之觀點而言,其 中,較佳為(a)醋(甲基)丙烯酸酯、(b)含有(甲基)丙烯醯 氧基之磷酸酯、或(c)(甲基)丙烯酸胺基甲酸酯,更佳為 (a)酯(甲基)丙烯酸酯。 312XP/發明說明書(補件)/96-09/96125023 59 200811599 又,(a)酯(甲基)丙烯酸酯中,特佳的是含有聚乙二醇、 聚丙二醇、雙酚A之聚環氧乙烷加成物等聚氧伸烷基、含 有2個以上(甲基)丙烯醯氧基之酯(曱基)丙烯酸酯。 (D)溶劑 作為適用於本實施形態的硬化性組成物中所使用之溶 劑’並無特別限定。例如具體可列舉:水、二異丙醚、礦 油知、正戊烧、戊_、辛酸乙醋、正己烧、二乙醚、異戊 二烯、乙基異丁醚、硬脂酸丁酯、正辛烷、Vars〇1 # 2、 Apco# 18 Solvent、二異丁烯、乙酸戊酯、丁酸丁酯、Apc〇 稀釋劑(Apco thinner)、丁醚、二異丁基酮、曱基環己烯、 曱基壬基酮、丙酸、十二烧、Q o -O-CftrCH^CHjrCh^g (wherein Q is ϋΗ^%) As the above (d) epoxy (meth) acrylate, (meth) propionate or hydroxy (meth) acrylate may be mentioned. a compound, a reactant with a polyepoxide. Examples of the polyepoxy compound include (poly)ethylene glycol polyepoxypropyl ether, (poly)propylene glycol polyepoxypropyl ether, (poly)pyrene, and 4-butanediol. Poly", 5-pentanediol polyepoxypropyl (IV), (poly) neopentadiene I epoxypropyl _, (poly) 1,6-hexanediol polyepoxypropyl _, (poly: propyl propylene Polyepoxypropyl scale, (poly)glycerol polyepoxypropyl scale polyvinyl alcohol polyepoxypropyl ether and other aliphatic polyepoxidized human Α) Hawthorn benzoquinone (four) varnish polyepoxide, benzene (four) take 3 Two pairs of 'pairs' ga _ varnish polyepoxide bismuth α 4 oxygen compound, bispan F polyepoxy compound and other aromatic wide and private a; sorbitan polyepoxypropyl ether, Li, Λ 虱Combination of oxypropyl three (2-p-cyanide cyanide, rat dioxin, hexa-cyclohexane, etc.) quot; uric acid heterocyclic polyepoxide 312 ΧΡ / invention manual (supplement /9W)9/96125〇23 58 200811599 _ 2 is a (meth)acrylic acid or a (hydroxy) hydroxy acrylate compound, and an epoxy (fluorenyl) acrylate of a poly-oxygen compound, such as these Gather An epoxidized a substance, a reaction product with the above (meth)acrylic acid or the above-mentioned (meth)acrylic acid hydroxyester compound, etc. As another ethylenically unsaturated compound, for example, ethyl bis-indenyl acrylonitrile is exemplified. a compound containing a vinyl group such as a (meth) acrylamide such as an amine, a diallyl phthalate, an allyl ester or a divinyl phthalate; and a phosphorus-containing compound such as phosphorus a compound containing a thioether bond which is sulfided by an ether bond of a scaly ethylenically unsaturated compound to form a thioether bond, and which has a crosslinking rate, and a decane coupling agent containing an isocyanate group or a fluorenyl group, for example, A polyfunctional (fluorenyl) acrylate compound disclosed in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 9-100111, and a bismuth sol having a particle diameter of 5 to 30 nm [for example, an isopropanol-dispersed organic cerium sol. ("IPA-ST" manufactured by Seiko Chemical Co., Ltd.), methyl ethyl ketone dispersed organic sol ("MEK-ST" manufactured by Seiko Chemical Co., Ltd.), and methyl isobutyl ketone dispersed organic oxime Sol (day a compound ("MIBK-ST") manufactured by Chemicals Co., Ltd.) (the ethylenically unsaturated compound is reacted with a ruthenium sol by a decane coupling agent to bond" to enhance the strength or heat resistance of the cured product. Sex compound). In the present embodiment, from the viewpoint of the mechanical strength of the cured product, (a) vinegar (meth) acrylate, (b) phosphate containing (meth) propylene decyloxy group, or ( c) (meth)acrylic acid urethane, more preferably (a) ester (meth) acrylate. 312XP/Invention Manual (Supplement)/96-09/96125023 59 200811599 Also, among (a) ester (meth) acrylate, polyethylene oxide, polypropylene glycol, bisphenol A polyepoxy is particularly preferred. A polyoxyalkylene group such as an ethane adduct or an ester (mercapto) acrylate containing two or more (meth) acryloxy groups. (D) Solvent The solvent used in the curable composition of the present embodiment is not particularly limited. Specific examples thereof include water, diisopropyl ether, mineral oil, n-pentyl alcohol, pentyl ketone, octoate vinegar, n-hexyl alcohol, diethyl ether, isoprene, ethyl isobutyl ether, and butyl stearate. N-octane, Vars〇1 # 2, Apco# 18 Solvent, diisobutylene, amyl acetate, butyl butyrate, Apc 〇 thinner (Apco thinner), dibutyl ether, diisobutyl ketone, decyl cyclohexene , mercapto ketone, propionic acid, twelve burning,

Socal solvent No· 1 及 No· 2、曱酸戊酯、二己醚、二 異丙基酮、Sol vesso# 150、乙酸(正、第二、第三)丁酯、 己烯、She 11 TS28 Solvent、氯丁烷、乙基戊基酮、苯曱 酸乙酯、氯戊烷、乙二醇二乙醚、原曱酸乙酯、曱氧基曱 基戊酮、曱基丁基酮、甲基己基酮、異丁酸甲酯、苯曱腈、 丙酸乙酯、曱基溶纖劑乙酸酯、曱基異戊基酮、甲基異丁 基酮、 乙酸丙S旨、乙酸戊S旨、曱酸戊酯、乙酸環己酯、雙環己 烷、二乙二醇單乙醚乙酸酯、二乙二醇單乙醚、二乙二醇 單丁醚乙酸酯(黏度3· 1 mPa · sec、25°C)、二乙二醇單丁 醚(黏度4· 9 mPa-sec、25°C)、二戊烯、曱氧基甲基戊醇、 曱基戊基酮、曱基異丙基酮、丙酸丙酯、丙二醇第三丁_、 甲基乙基酮、曱基溶纖劑、乙基溶纖劑、乙基溶纖劑乙酸 60 312XP/發明說明書(補件)/96-09/96125023 200811599 酯、卡必醇、環己酮、 乙酸乙酯、丙二醇、丙二醇單乙酸酯、丙二醇二乙酸酯、 丙二醇單甲醚(黏度1. 7 mPa.sec、25°C )、丙二醇單甲醚 乙酸醋(黏度1 · 1 mPa · sec、25°C)、丙二醇單乙謎、丙二 醇單乙醚乙酸酯、二丙二醇單乙醚、二丙二醇單甲醚、丙 二醇單乙醚乙酸g旨、二丙二醇單甲醚乙酸醋、 3-甲氧基丙酸、3-乙氧基丙酸、3-乙氧基丙酸乙酯(黏 度1· 2 mPa.sec、25°C )、3-甲氧基丙酸甲酯、3-甲氧基 丙酸乙酯、3-甲氧基丙酸丙酯、3—甲氧基丙酸丁酯、二乙 一醇二甲醚(黏度0.98 mPa · sec、25°C )、二乙基卡必醇(黏 度1. 4 mPa.sec、25°C )、二乙二醇甲基乙醚(黏度1· 2 mPa-sec、20°C)、二丙二醇單曱醚、乙二醇乙酸酯、甲基 卡必醇(黏度3· 5 mPa.sec、25°C )、乙基卡必醇(黏度3· 9 mPa .sec、25C)、丁基卡必醇(黏度 4.9 mPa · sec、25°C )、 乙二醇單丁醚、丙二醇第三丁醚、3-曱氧基丁醇(黏度2.9 mPa · sec、25°C )、3-甲基-3-甲氧基丁醇、三丙二醇甲醚、 乙酸3-曱基-3-曱氧基丁酯、乙酸3一甲氧基丁酯(黏度1· 2 mPa.sec、25°C )等溶劑。 溶劑若為可使各成分溶解或分散者,則並無特別限定, 根據硬化性組成物之使用方法適當選擇。其中,較佳為選 擇沸點為60°C〜280°C之範圍的溶劑。更佳為具有7〇°c〜 260°C之沸點者。該等溶劑可單獨或混合使用。該等溶劑, 使用如本實施形悲之硬化性組成物中之總固形分的比 例,通常達到2重量%以上、5〇重量%以下之量。 31ZXP/發明說明書(補件)/96-09/96125023 61 200811599 於適用於本實施形態的硬化性組成物中,可視需要調配 八他成分((E)環氧化合物、(F)胺基化合物、(G)界面活性 Μ )以下’對其他成分加以說明。 (Ε)環氧化合物 作為裱氧化合物,可列舉··構成環氧樹脂之重複單位 =使夕羥基化合物與表氯醇反應而得的聚環氧丙基醚化 2物;使多羧酸化合物與表氯醇反應而得的聚環氧丙酯化 合物,使聚胺化合物與表氯醇反應而得的聚環氧丙基胺化 合物等自低分子量物至高分子量物的化合物。 作為聚環氧丙基醚化合物,例如可列舉··聚乙二醇之二 環氧丙基醚型環氧;雙(4-經基苯基)之二環氧丙基驗型= ,·’雙(3,5-二甲基羥基苯基)之二環氧丙基醚型環 F之二環氧丙基趟型環氧;雙紛Α之二環氧丙基 ·、辰氧,四甲基雙酚Α之二環氧丙基醚型環氧;環氣 燒加成雙盼A之二環氧丙基_環氧;㈣雙紛之二' 2喊型環氧;苯㈣酸清漆型環氧;甲盼祕清漆型環 聚環氧丙基驗化合物,可為使殘存之經基與酸 酐或一几馱化合物等反應,而導入羧基者。 甲:之作3環氧丙酯化合物,例如可列舉:六氫鄰苯二 J酉夂之一裱氧丙酯型環氧;鄰苯二甲酸之二 以? ’作為聚環氧丙基胺化合物,例如可_二衣 ^苯基)曱烷之二環氧丙基胺型環氧;異三 又 環氧丙基胺型環氧等。 Λ *文之二 作為環氧化合物之含量,相對於總固形分,通常為4〇 312ΧΡ/發明^;明書(補件)/96-09/96125023 62 200811599 重量%以下、較佳為30重 具有硬化性組成物之料穩定性t 之情況下, ⑺胺基化合物 弋Μ之了月“生。 於適用於本實施形態的硬 製程中的熱收縮之觀點而▲/、成物中’就抑制熱硬化 藉由添加胺基化合物,而‘進:佳為含有胺基化合物。可 度變動。 促進熱硬化,抑制熱硬化時之高 二為胺基化合物之含量,相對於 較佳為30重量%以下。又,通常為:ί量 以上、車父佳為1重哥% ·室里% 右含量過大,則具有硬化性 組成物之保存穩定性惡& =錄 存=述熱硬化中之熱收縮抑制效果變低之;, 作為胺基化合物,例如可列舉:具有至少二兄 基的羥甲基、聛甘、隹 > 作為吕月匕 ^將其進仃碳數為1〜8之醇缩人汝所ΑβΜ 烧氧基甲基之胺基化合物。 &口改貝而付的 八體而D ’例如可列舉:使三聚氰胺一 聚氛胺樹脂,·使苯代三聚氛胺與甲盤聚縮合之; 縮入⑽w ”甲5"合之甘脲樹脂;使脲與甲醛聚 脲树脂;使三聚氰胺、苯代三聚氰胺、甘脲、戈胪 算之?插IV L A ™ ^f朋^、或脲 甲其進行醇以酿共聚縮合之樹脂;或對彼等樹脂之羥 土進仃_合改f而得之改質樹脂等。 1種,或。 f J早獨使用 其=二較佳為三聚氰胺樹脂及其改質樹脂,更佳為料 土文貝比例為7⑽以上之改質樹脂,尤佳為議以上之 312XIV翻說明書(補件)/96猶9612湖 63 200811599 改質樹脂。 士1為胺基化合物之具體例’至於三聚氰胺樹脂及其改質 ,脂,例如可列舉:Mitsui Cytec股份有限公司製造之 「Cymel」(註冊商標)3〇〇、3(Π、3〇3、35〇、736、⑽、 37〇 、 771 、 325 、 327 、 703 、 701 、 266 、 267 、 285 、 232 、 、238、1141、2?2、254、202、1156、1158 ;三和化 =(Sanwa-Chemical)股份有限公司之rNIKALAC」(註冊商 # )MW-390 ^ MW-100LM > MX-750LM ^ MW-30M > MX-45 > MX-302 又 為本代二聚氰胺樹脂及其改質樹脂,例如可列 牛·「Cymel」(註冊商標)1123、1125、1128 等。 作為甘脲樹脂及其改質樹脂,例如可列舉:「q此 :商標)1170、1171、1174、1172、及「 冊 商標)MX-270等。 」V»王册 作為脲樹脂及其改質樹脂,例如可列舉:价別 二=「_」(註冊商標)65、_、及「_Socal solvent No. 1 and No. 2, amyl citrate, dihexyl ether, diisopropyl ketone, Sol vesso # 150, acetic acid (positive, second, third) butyl ester, hexene, She 11 TS28 Solvent , chlorobutane, ethyl amyl ketone, ethyl benzoate, chloropentane, ethylene glycol diethyl ether, ethyl orthophthalate, decyl decyl ketone, decyl butyl ketone, methyl hexyl Ketone, methyl isobutyrate, benzoquinone, ethyl propionate, mercapto cellosolve acetate, mercaptoisoamyl ketone, methyl isobutyl ketone, acetonitrile acetate, acetic acid Amyl decanoate, cyclohexyl acetate, bicyclohexane, diethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether acetate (viscosity 3 · 1 mPa · sec, 25 ° C), diethylene glycol monobutyl ether (viscosity 4 · 9 mPa-sec, 25 ° C), dipentene, decyloxymethylpentanol, decyl amyl ketone, mercapto isopropyl ketone , propyl propionate, propylene glycol tert-butyl, methyl ethyl ketone, thiol cellosolve, ethyl cellosolve, ethyl cellosolve acetate 60 312XP / invention manual (supplement) / 96-09 / 96125023 200811599 Ester, carbitol, cyclohexanone, acetic acid , propylene glycol, propylene glycol monoacetate, propylene glycol diacetate, propylene glycol monomethyl ether (viscosity 1. 7 mPa. sec, 25 ° C), propylene glycol monomethyl ether acetate vinegar (viscosity 1 · 1 mPa · sec, 25 ° C), propylene glycol monolithic, propylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, propylene glycol monoethyl ether acetate g, dipropylene glycol monomethyl ether acetate vinegar, 3-methoxypropionic acid, 3 - ethoxypropionic acid, ethyl 3-ethoxypropionate (viscosity 1 · 2 mPa. sec, 25 ° C), methyl 3-methoxypropionate, ethyl 3-methoxypropionate, Propyl 3-methoxypropionate, butyl 3-methoxypropionate, diethyl ether dimethyl ether (viscosity 0.98 mPa · sec, 25 ° C), diethyl carbitol (viscosity 1. 4 mPa) .sec, 25 ° C), diethylene glycol methyl ether (viscosity 1 · 2 mPa-sec, 20 ° C), dipropylene glycol monoterpene ether, ethylene glycol acetate, methyl carbitol (viscosity 3 · 5 mPa.sec, 25 ° C), ethyl carbitol (viscosity 3 · 9 mPa · sec, 25 C), butyl carbitol (viscosity 4.9 mPa · sec, 25 ° C), ethylene glycol monobutyl Ether, propylene glycol tert-butyl ether, 3-decyloxybutanol (viscosity 2.9 mP a · sec, 25 ° C), 3-methyl-3-methoxybutanol, tripropylene glycol methyl ether, 3-mercapto-3-methoxybutyl acetate, 3-methoxybutyl acetate ( A solvent such as a viscosity of 1·2 mPa.sec or 25° C.). The solvent is not particularly limited as long as it can dissolve or disperse the respective components, and is appropriately selected depending on the method of using the curable composition. Among them, a solvent having a boiling point in the range of 60 ° C to 280 ° C is preferably selected. More preferably, it has a boiling point of 7 〇 ° c to 260 ° C. These solvents may be used singly or in combination. The solvent is usually used in an amount of 2% by weight or more and 5% by weight or less based on the ratio of the total solid content in the curable composition of the present embodiment. 31ZXP/Invention Manual (Supplement)/96-09/96125023 61 200811599 In the curable composition applicable to the present embodiment, an eight-component ((E) epoxy compound, (F) amine compound, (G) Interface activity Μ) The following 'describes other components. (Ε) Epoxy compound As the oxime compound, a repeating unit constituting an epoxy resin = a polyepoxypropyl etherified product obtained by reacting a hydroxy group compound with epichlorohydrin; a polycarboxylic acid compound A polyglycidyl ester compound obtained by reacting with epichlorohydrin, a polyepoxypropylamine compound obtained by reacting a polyamine compound with epichlorohydrin, or a compound derived from a low molecular weight substance to a high molecular weight substance. Examples of the polyepoxypropyl ether compound include a diepoxypropyl ether type epoxy resin of polyethylene glycol; a diepoxypropyl type test of bis(4-phenylphenyl) = , · ' Di-glycidyl propyl ether of bis(3,5-dimethylhydroxyphenyl) bis-epoxypropyl ether type ring; di-epoxypropyl group, ox oxygen, four Di-epoxypropyl ether type epoxy of bisphenolphthalein; cycloglycol addition and double-anti-epoxypropyl_epoxy; (4) double-disc 2' shouting epoxy; benzene (tetra) acid varnish Epoxy; a smear-type varnish-type cyclic polyepoxypropyl compound, which can be introduced into a carboxyl group by reacting a residual radical with an acid anhydride or a few hydrazine compounds. A: The 3 epoxypropyl ester compound, for example, may be exemplified by: a oxime propyl epoxide type hexahydro phthalate; the phthalic acid bis is a polyepoxypropylamine compound For example, it may be a di-epoxypropylamine type epoxy of pentylene or decane; an iso-tri-epoxypropylamine type epoxy or the like. Λ * The content of the second compound as the epoxy compound is usually 4〇312ΧΡ/inventive^ relative to the total solid content; the book (supplement)/96-09/96125023 62 200811599 wt% or less, preferably 30 In the case where the material has a stability t of the hardenable composition, (7) the amine compound is "successful", and is applied to the viewpoint of heat shrinkage in the hard process of the present embodiment. Inhibition of thermal hardening by adding an amine-based compound, and it is preferable to contain an amine-based compound. The degree of change is high. The thermal hardening is promoted, and the higher the temperature of the thermosetting is the content of the amine-based compound, preferably 30% by weight. In addition, it is usually: ί以上以上,车家佳为一重哥% ·Room%% The right content is too large, the storage stability of the hardenable composition is bad & = Recording = the heat in the heat hardening The anti-shrinkage-inhibiting effect is low. Examples of the amino-based compound include a hydroxymethyl group having at least two dichroyl groups, a ruthenium glycoside, and a ruthenium as an alcohol-reducing group having a carbon number of 1 to 8.汝βΜ Alkyl compound of alkoxymethyl group. & The eight-body and D' can be exemplified by: melamine-polyamine resin, condensing benzotrimerol with a plate; condensing (10)w "a 5" with a glycoluril resin; Formaldehyde polyurea resin; make melamine, benzene melamine, glycoluril, gourd count? A resin which is subjected to a copolymerization condensation of an alcohol, or a modified resin obtained by changing the hydroxyl group of the resin, or the like. 1 kind, or. f J used alone for the second time, preferably melamine resin and its modified resin, more preferably the modified resin with a ratio of 7 (10) or more, especially the 312XIV rewrite specification (supplement) / 96 Jue 9612 Lake 63 200811599 Modified resin. "1" is a specific example of an amine-based compound, and the melamine resin and its modification are, for example, "Cymel" (registered trademark) manufactured by Mitsui Cytec Co., Ltd. 3, 3, Π, 3, 3, 35〇, 736, (10), 37〇, 771, 325, 327, 703, 701, 266, 267, 285, 232, 238, 1141, 2?2, 254, 202, 1156, 1158; Sanwa-Chemical Co., Ltd. rNIKALAC" (Registry #) MW-390 ^ MW-100LM > MX-750LM ^ MW-30M > MX-45 > MX-302 and this generation of melamine resin And the modified resin, for example, can be listed as "Cymel" (registered trademark) 1123, 1125, 1128, etc. Examples of the glycoluril resin and its modified resin include "q: trademark" 1170, 1171, 1174. , 1172, and "registered trademark" MX-270, etc. "V» 王册 as a urea resin and its modified resin, for example, price 2 = "_" (registered trademark) 65, _, and "_

商標)MX-290等。 W ’就降低熱收縮率、提升熱硬化速度之觀點而言, “圭為使用二和化學股份有限公司之 ;:;r9〇'Mff-i〇〇LM'Mx'75〇LM'-----x-3:" (G)界面活性劑 作為界面活性劑,例如可與· ^ ^ ^ 了列舉·聚氧乙烯烷基醚、聚惫 乙婦烧基芳基醚、聚氧乙嫌俨其 虱 甘油㈣基醋等非二梨醇針烧基醋、單 子系界面活性劑;燒基苯石黃酸鹽、貌 312XP/發明說明書(補件)/96〇9/96125〇23 64 200811599 基萘續酸鹽、㈣碰鹽L㈣鹽、續基㈣酸醋鹽 等陰離子性界面活性劑,统基甜菜驗、胺基酸等兩性界面 活性劑。 (Η )不具有乙稀性不飽和基之樹脂 於適用於本實施形態的硬化性組成物中,為了調整硬化 性組成物料之黏度纽善硬㈣之频雜,可調配⑻ 不具有乙烯性不飽和基之樹脂。 ^為w成分之不具有乙烯性不飽和基之樹脂,例如可 列牛.上述[A+U中所揭示之含有縣之乙烯系樹脂等。 X可列舉日本專利㈣μ_133_號公報中所揭示 之含有羧基及環氧基之共聚物等。 ▲再者,於適用於本實施形態的硬化性組成物中,可適备 =著色劑、塗佈性提升劑、顯影改良劑、紫外線吸收二 承&抑制劑、抗氧化劑、矽烷偶合劑等。 作為著色劑,可使用顏料、染料等公知之著色劑。又, 1如,於使用顏料時,可以該顏料不凝集而可穩定存在於 硬化性組成物中之方式,祐、Trademark) MX-290 and so on. W 'In terms of reducing the heat shrinkage rate and increasing the heat hardening rate, "Kui is using the second chemical company;:;r9〇'Mff-i〇〇LM'Mx'75〇LM'--- --x-3:" (G) Surfactant as a surfactant, for example, can be listed with · ^ ^ ^ · Polyoxyethylene alkyl ether, polyethyl epoxide aryl ether, polyoxyethylene俨 虱 虱 虱 ( 四 四 四 四 四 四 四 四 四 四 四 针 针 针 针 ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 312 Anionic surfactants such as naphthoate, (4) salt L (tetra) salt, contiguous (tetra) acid vinegar, etc., an amphoteric surfactant such as a beet test, an amino acid, etc. (Η) does not have an ethylenically unsaturated group In the curable composition suitable for the present embodiment, in order to adjust the viscosity of the curable composition material, the viscosity of the material is good (4), and it is possible to adjust (8) a resin having no ethylenic unsaturated group. The resin having an ethylenically unsaturated group, for example, can be listed as the above-mentioned [A+U-containing ethylene-based resin disclosed in the above. A copolymer containing a carboxyl group and an epoxy group, which is disclosed in the Japanese Patent No. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ A development improving agent, an ultraviolet absorbing agent, an inhibitor, an antioxidant, a decane coupling agent, etc. As the coloring agent, a known coloring agent such as a pigment or a dye can be used. Further, for example, when a pigment is used, the pigment can be used. Non-aggregating and stable in the hardening composition,

作為塗佈性料劑或顯影改M 離子性、陰離子性、非離子# Μ 知之知 子陡、齓糸、矽糸界面活性劑。 又,亦可使用有機羧酸或其酸 劑。又,其含量,相對㈣固/n者2為顯影改良 較佳為Π)重量%以下。…通吊為20重量%以下、 作為聚合抑制劑,可列舉對苯二驗、甲氧 為抗氧化劑,可列舉2 6_ -( m m j *作 ,b 一(第二丁基)-4-甲酚(βητ)等。 312ΧΡ/發明說明書(補件)/96-〇9/96125〇23 仍 200811599 作為該等之含量,相對於總固形分,通常為5 ppm以上 1000 ppm以下較佳為1 〇 ppm以上卯瓜以下之範圍。 若含量過小,則有穩定性惡化之傾向。另一方面,若過多, 2例如於藉由熱及/或光之硬化時,具有硬化不充分之可 能性。尤其’於用於通f的光微影法之情況,必須設定為 馨於硬化性組成物之保存穩定性及$敏度之兩方面的最 佳量。 /作為矽烷偶合劑之種類,可使用環氧系、曱基丙烯酸 =、胺基系等各種者’尤佳為環氧系之矽烷偶合劑。其含 里,相對於總固形分,通常為2〇重量%以下、較佳為15 重量%以下。 [4 ]硬化性組成物之使用方法 、適用於本實施形態的硬化性組成物,藉由與公知之彩色 濾光片用硬化性組成物相同之方法而使用,以下,對用作 間隔件之情況加以說明。 通常,於需設置間隔件之基板上,藉由塗佈等方法,將 溶解或分散於溶劑的硬化性組成物,供給成膜狀或圖案 狀,使浴劑乾燥。供給成膜狀後,視需要可藉由進行曝光 7顯影之光微影等方法而進行圖案形成。其後,視需要進 行追加曝光或熱硬化處理,藉此於基板上形成間隔件。 [4-1 ]供給至基板之方法 適用於本實施形態的硬化性組成物,通常於溶解或分散 於溶劑之狀態下,供給至基板上。作為該供給方法,可藉 由先前公知之方法,例如旋塗法、線棒法、流塗法、模塗 312XP/發明說明書(補件)/96-09/96125023 66 200811599 法、幸昆塗法、噴塗法等進行。其中,若利用模塗法,則就 可大幅減少塗佈液之使用量,且,完全不存在 : 時所附著之霧氣等之影響,可抑制異物產生等綜合觀4 言,㈣,適詩本實施職的硬化性組絲,係尤其= 合於藉由模塗法之塗佈方法的組成物。 。,佈量根據用途而不同,例如於間隔件之情況,作As a coating material or development, it is known that it is an ionic, anionic, nonionic, known, astringent, ruthenium, or osmium surfactant. Further, an organic carboxylic acid or an acid thereof can also be used. Further, the content thereof is preferably Π) by weight or less with respect to (four) solid/n. ...the hanging weight is 20% by weight or less, and examples of the polymerization inhibitor include a benzoic acid test and a methoxy group as an antioxidant, and examples thereof include 2 6 — — ( mmj *, b a (second butyl)-4-cresol. (βητ), etc. 312ΧΡ/Invention specification (supplement)/96-〇9/96125〇23 still 200811599 As such content, it is usually 5 ppm or more and 1000 ppm or less, preferably 1 〇ppm, based on the total solid content. When the content is too small, the stability tends to be deteriorated. On the other hand, if it is too large, for example, when it is cured by heat and/or light, it may have insufficient hardening. In the case of the photolithography method for the pass-f, it is necessary to set the optimum amount of the storage stability and the sensitivity of the sclerosing composition. / As the type of the decane coupling agent, epoxy can be used. Any of various types, such as a thiol acrylate = an amine group, is preferably an epoxy decane coupling agent, and the content thereof is usually 2% by weight or less, preferably 15% by weight or less based on the total solid content. [4] The method of using the curable composition, and the hardening applicable to the embodiment The composition is used in the same manner as the known color filter for the curable composition. Hereinafter, the case of use as a spacer will be described. Usually, on the substrate on which the spacer is to be provided, by coating In a method such as cloth, a curable composition dissolved or dispersed in a solvent is supplied into a film or a pattern to dry the bath, and after being supplied into a film form, a photolithography such as development by exposure 7 may be performed as needed. Then, pattern formation is performed. Thereafter, an additional exposure or a heat hardening treatment is performed as needed to form a spacer on the substrate. [4-1] The method of supplying to the substrate is applied to the curable composition of the present embodiment, and is usually It is supplied to the substrate in a state of being dissolved or dispersed in a solvent. As the supply method, a conventionally known method such as spin coating, wire bar method, flow coating method, die coating 312XP/invention specification (supplement) can be used. /96-09/96125023 66 200811599 The method, the coating method, the spraying method, etc., wherein the use of the die coating method can greatly reduce the amount of the coating liquid used, and it does not exist at all: Fog, etc. The influence can suppress the occurrence of foreign matter, etc. (4), the hardening group of the appropriate poetry, especially the composition of the coating method by the die coating method. Different, for example in the case of spacers

燥膜厚,通常為〇. 5 # m〜1 〇 # 較& A υ 較仏為1 #m〜g 、 士仏為1 P〜7 “之範圍…重要的是乾燥膜厚或 最終所形成的間隔件之高度,於基板整體上均句。於不均 較大之情況下’於液晶面板上會產生不均缺陷。又,可 由贺墨法或印刷法等,而供給成圖案狀。 再者,作為基板,可使用玻璃基板等公知之基板。又, 較佳為基板表面為平面。 [4-2]乾燥方法 將硬化性組成物供給至基板上後之乾燥,較佳為採用使 ::熱板、IR烘箱、對流烘箱之乾燥法。又,可組合不 提高溫度、且於減壓腔室内進行乾燥的減壓乾燥法。 乾燥條件,可根據溶劑成分之種類、所使用之乾燥機的 性能等而適當選擇。乾料間,根據溶劑成分之種類、所 使用之乾燥機的性能等,通常於4(rc 〜13(rc之溫度下於 =秒鐘〜5分鐘之範圍内選擇,較佳為於5(rc〜11〇它之 /皿度下於30秒鐘〜3分鐘之範圍内選擇。 f4 一 3]曝光方法 曝光係於硬化性組成物之塗佈膜上,重疊負型之光罩圖 312XP/發明說明書(補件)/96-09/96125023 67 200811599 案,透過該光罩圖案’照射紫外線或可見光線之光源。又, 亦可採用不使用光罩圖案之藉由雷射光的掃描曝光方 此時,視需要,為防止由於氧氣而導致光聚合性層之 靈敏度降低’而於脫氧環境下進行,或亦可於光聚合^層 上形成聚乙烯醇層等隔氧層後進行曝光。 " 用於上述曝光之光源’並無特別限定。作為光源,例如 可列舉:a燈、_素燈、嫣燈、高壓水銀燈、超高壓水銀 燈、金屬鹵素燈、中壓水銀燈、低壓水銀燈、碳弧、營^ 燈,燈光源,或氬離子雷射、抓雷射、激生分子雷射、 乳乳雷射、氦-锅雷射、藍紫色半導體雷射、近紅外半導 體雷射等雷射光源等。於照射使用特定波長之光之情況, 亦可利用光學濾光片。 作為光學滤光片,例如可為可藉由薄膜控制曝光波長之 透光率之類型。該情況下,作為用於光學濾光片之材質, 例如可列舉:Cr化合物(Cr之氧化物、氮化物、氮氧化物、 氣化物等)、趟、^1、八1等。若使用將此種光學滅 光片任意配置於光罩圖案之開口部(透光部)的光罩(即, 適田配置有设有光學據光片之開σ部以及未設有光學滤 光片之開口邛的光罩),則可藉由一次曝光步驟而形成相 f開口部之透光率的光聚合率不同的圖案。又,例如,可 猎由一次曝光步驟而同時形成高度不同的圖案。 作為曝光里’通常為! mJ/cm2以上、較佳為5 mJ/cm2 以上、更佳為10mJ/cm2以上,通常為1〇〇〇mj/cm2以下、 較佳為80G nJ/cm2以下、更佳為_ mJ/cm2以下。 312XP/發明說明書(補件)/96-09/96125023 200811599 又,作為曝光對象與光罩圖案之距離,通常為 以上、較佳為50 z/m以上、更佳為75 //m以上,通常為 500 //m以下、較佳為400 //m以下、更佳為3〇〇 以 下。 [4 - 4]顯影方法 進行上述曝光後,可藉由使用鹼性化合物之水溶液、或 有機溶劑之顯影,而於基板上形成影像圖案。於該水溶液 中,進而可含有界面活性劑、有機溶劑、緩衝劑、錯合劑、 染料或顏料。 作為驗性化合物,可列舉:氫氧化納、氫氧化鉀、氣氧 化鋰、碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、 石夕酸鉀、偏石夕酸鈉、磷酸納、磷酸鉀、磷酸氫鈉、磷酸氫 卸、碌酸二氫納、磷酸二氫鉀、氫氧化料無機驗性化合 ^單.二或三乙醇胺、單.二或三甲胺、單.二或三乙胺、 早或二異丙胺、正丁胺、單.二或三異丙醇胺、乙烯亞胺、 胺(ethylenediimine)、氫氧化四甲基銨(刪)、 膽驗專有機驗性化合物。該等驗性化合物可為2種以上之 混合物。 作為界面活性劑,可列舉與上述相同者。 作=機溶劑,例如可列舉:異丙醇、㈣、乙基 纖劑、苯基溶纖劑、内二醇、二丙嗣醇等。有 、岭㈣丨可早獨使用,亦可與水溶液合併使用。 4 5 ]追加曝光及熱硬化處理 對於顯影後之基板,可視需要藉由與上料光方法相同 312XP/發明說明書(補件)/96-09/96125023 69 200811599 之方法進行追加曝光,又, 埶硬化處理㈣a 亦可進行熱硬化處理。此時的 ;;=。為’溫度於iGG°c〜·。c之範圍、較佳 為 15〇C 〜25〇C 之篇 ^ 夕々々円^ 之乾圍内選擇,時間於5分鐘〜60分鐘 之耗圍内選擇。 [4-6]總變形量、彈性復原率、恢復率 形態中之硬化性組絲之特徵在於:用於間 用=之情況下,於利用顯微硬度計(mi⑽如如咖 =9負荷—除荷試驗中,可形成滿足下述⑴,且滿 足(2)及/或(3)之硬化物。 (1) 總變形量為1·35 /ζιη以上 (2) 彈性復原率為50%以上 (3) 恢復率為8〇%以上 =如’供至大型液晶晝面電視之液晶顯示裝置(以下, 有時稱為「面板」。)等的間隔件,存在如下之傾向··於該 :板之製造步驟中,易於產生荷重,故間隔件之總變形量 义大。又,尤其於大晝面之面板之情況,於各部上易於引 起荷重不均。本發明之硬化性組成物,於如下方面有意 義·即使於此種情況下硬化物(間隔件)之彈性復原率及/ 或恢復率亦較高。 此處’利用顯微硬度計之負荷—除荷試驗,以如下之方 式進行。 對藉由上述[4 ]之方法所形成的間隔件圖案中,高度為 4 /zm、上部截面積為8〇±1〇 # m2之1個圖案,使用顯微 硬度計進行測定。 312XP/發明說明書(補件)/96-09/96125023 70 200811599 所謂間隔件圖案之上部截 jL· , . 、 保ί日以下之面積。首 ::-個間隔件圖案’使用超深度彩 、== 縱剖面。將所縱剖之位置表示於圖2。 言位置Li :縱剖之圖形(圖3為示意圖)之基板面至最 二=二=度Γ⑽之高度的、平行於間隔件圖案 首栌的鬥, 、線AA的長度。將以該直線AA,為 工、p面積作為間隔件圖案之上部截面積。 中:者13::中’ 11為間隔件圖案,12為間隔件圖案之 縱剖位置。又’圖3中,“為間隔件圖案之 自A柘而’郭15為自基板面至最高位置的高度,16為The thickness of the dry film is usually 〇. 5 # m~1 〇# 较与一; A 仏 仏 is 1 #m~g, 士仏 is 1 P~7 "The range... It is important to dry the film thickness or eventually form The height of the spacer is uniform on the entire substrate. When the unevenness is large, unevenness is generated on the liquid crystal panel. Further, it can be supplied into a pattern by a method such as a helium method or a printing method. A known substrate such as a glass substrate can be used as the substrate. Further, it is preferable that the surface of the substrate is a flat surface. [4-2] Drying method After the curable composition is supplied onto the substrate and dried, it is preferably used: : Drying method of hot plate, IR oven, and convection oven. Further, it can be combined with a vacuum drying method which does not raise the temperature and is dried in a vacuum chamber. The drying conditions can be based on the type of solvent component and the dryer used. The performance is appropriately selected, etc. Between the dry materials, depending on the type of the solvent component and the performance of the dryer to be used, it is usually selected in the range of 4 seconds from rc to 13 (rc temperature = sec to 5 minutes). Preferably, it is 5 (rc~11〇/ it is in the range of 30 seconds to 3 minutes) F4 - 3] Exposure method is exposed on the coating film of the hardening composition, overlapping the negative mask 312XP / invention manual (supplement) / 96-09/96125023 67 200811599 case, through The reticle pattern 'illuminates the light source of the ultraviolet ray or the visible ray. Alternatively, the scanning exposure by the laser light without using the reticle pattern may be employed. In this case, the sensitivity of the photopolymerizable layer may be prevented from being lowered due to oxygen as needed. In the deoxidation environment, an oxygen barrier layer such as a polyvinyl alcohol layer may be formed on the photopolymerization layer and then exposed. The light source used for the above exposure is not particularly limited. Examples of the light source include a light source. :a lamp, _su lamp, xenon lamp, high pressure mercury lamp, ultra high pressure mercury lamp, metal halide lamp, medium pressure mercury lamp, low pressure mercury lamp, carbon arc, camping lamp, lamp source, or argon ion laser, laser strike, laser Laser light sources such as green lasers, milk lasers, 氦-pot lasers, blue-violet semiconductor lasers, and near-infrared semiconductor lasers. Optical filters can also be used when irradiating light of a specific wavelength. . For the optical filter, for example, a type in which the light transmittance of the exposure wavelength can be controlled by the film can be used. In this case, as a material for the optical filter, for example, a Cr compound (oxide of Cr, nitrogen) can be cited. a compound, an oxynitride, a vapor, etc., 趟, ^1, 八1, etc., if a reticle that arbitrarily arranges such an optical glazing sheet in an opening portion (light transmitting portion) of a reticle pattern is used (ie, The field is provided with a photomask having an opening σ portion of the optical light sheet and an opening 未 without an optical filter. The photopolymerization rate of the light transmittance of the opening portion of the phase f can be formed by one exposure step. Different patterns. Again, for example, one exposure step can be used to simultaneously form a pattern of different heights. As an exposure, 'usually! mJ/cm2 or more, preferably 5 mJ/cm2 or more, more preferably 10 mJ/cm2 or more, and usually 1 〇〇〇mj/cm2 or less, preferably 80 G nJ/cm2 or less, more preferably _mJ/cm2 or less. . 312XP/Invention Manual (Supplement)/96-09/96125023 200811599 Further, the distance between the exposure target and the mask pattern is usually more than 50 z/m, more preferably 75 // m or more, usually It is 500 // m or less, preferably 400 // m or less, and more preferably 3 or less. [4 - 4] Development method After the above exposure, an image pattern can be formed on the substrate by using an aqueous solution of an alkaline compound or an organic solvent. Further, the aqueous solution may contain a surfactant, an organic solvent, a buffer, a binder, a dye or a pigment. Examples of the test compound include sodium hydroxide, potassium hydroxide, lithium gas oxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, potassium hydrogencarbonate, sodium citrate, potassium aspartate, sodium metasilicate, and phosphoric acid. Nano, potassium phosphate, sodium hydrogen phosphate, hydrogen phosphate dehydrogenate, dihydrogen sodium dihydrogen phosphate, potassium dihydrogen phosphate, inorganic hydroxide, inorganic compound, mono- or triethanolamine, mono- or di-methylamine, single. Triethylamine, early or diisopropylamine, n-butylamine, mono- or di-isopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (deletion), specific test compound . These test compounds may be a mixture of two or more kinds. The same as the above may be mentioned as a surfactant. Examples of the solvent include, for example, isopropyl alcohol, (iv), ethyl cellulose, phenyl cellosolve, internal glycol, and dipropanol. Yes, Ling (4) can be used alone or in combination with an aqueous solution. 4 5 ] Additional exposure and thermal hardening treatment For the developed substrate, additional exposure may be performed by the same method as the loading method 312XP/invention manual (supplement)/96-09/96125023 69 200811599, and , Hardening treatment (4) a can also be thermally hardened. At this time; ;=. For 'temperature at iGG °c ~ ·. The range of c is preferably 15 〇C 〜25 〇C ^ 々々円 々々円 ^ 之 干 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择 选择[4-6] The total amount of deformation, the elastic recovery rate, and the rate of recovery of the sclerosing group are characterized by the use of a microhardness tester (mi(10) such as coffee = 9 load). In the charge-removal test, a cured product satisfying the following (1) and satisfying (2) and/or (3) can be formed. (1) The total deformation amount is 1·35 /ζιη or more (2) The elastic recovery rate is 50% or more. (3) The recovery rate is 8% or more. = For example, the spacers for liquid crystal display devices (hereinafter sometimes referred to as "panels") for large-size liquid crystal screen TVs have the following tendency: In the manufacturing step of the board, the load is liable to be generated, so that the total deformation amount of the spacer is large. Moreover, especially in the case of the panel of the large surface, the load is unevenly caused in each part. The curable composition of the present invention is It is meaningful in the following cases. Even in this case, the elastic recovery rate and/or the recovery rate of the cured product (spacer) are also high. Here, the load-de-loading test using the microhardness tester is carried out as follows. In the spacer pattern formed by the method of the above [4], the height is 4 /zm A pattern with an upper cross-sectional area of 8〇±1〇# m2 is measured using a microhardness tester. 312XP/Invention Manual (Supplement)/96-09/96125023 70 200811599 The upper part of the spacer pattern is cut off jL· The area below the guaranteed date. First::- a spacer pattern 'Using the ultra-deep color, == longitudinal section. The position of the longitudinal section is shown in Figure 2. The position Li: the longitudinal section of the figure (Figure 3 The length of the hopper, line AA parallel to the height of the spacer pattern is the height of the substrate surface of the schematic diagram to the height of the second=two=degree Γ(10). The line AA is used as the spacer pattern. The upper cross-sectional area. Medium: 13:: Medium '11 is the spacer pattern, 12 is the longitudinal section position of the spacer pattern. Also in 'Fig. 3, 'is the spacer pattern from A柘' and Guo 15 is the self-substrate. The height from the face to the highest position, 16 is

St ?最高位置的高度之9〇%的高度,17為上剖面之 圓的直徑AA’。 用Dynamic超顯微硬度計(島津製作所股 刀义a 3製造·島津Dynamic超顯微硬度計duh—W2〇1 而進行。 y 試驗條件為,測定溫度為23t: ’適用直徑為5〇 ^之 :面”,以固定速度(0.22gf/sec)對間隔件施加荷 重’於達到既定最大荷重5 gf時保持5秒鐘,繼而以相 同速度進行除荷。藉由利用該試驗而求得的荷重一變位曲 線(圖/為示意圖。),而測定最大變位H[最大卜最終變 位Η[最終]。將上述最大變位H[最大]作為總變形量。 再者,圖4係表示間隔件之負荷__除荷試驗中之荷重— 變位曲線之示意圖。圖4中,橫軸為變位H(單位:#瓜), 312ΧΡ/發明說明書(補件)/96_〇9/96125023 71 200811599 縱轴為荷重L (單位·· g f )。 總變形量,較佳為1·4 以上、更佳為15 以上, 較佳為5 以下、更佳為3 以下。 若總變形量過大,則彈性恢復率及/或恢復率惡化。另 方面,若總變形量過小,則硬化物無法與面板之製造時 的荷重之不均對應。 ^,彈性復原率、恢復率係,基於藉由利用上述顯微硬 度計之負荷-除荷試驗而測定之值,分別以如下方式計算。 乂恢復率(%)=丨(試驗前之圖案高度)一Η[最終]}/(試驗 前之圖案高度)xl〇〇 彈性復原率= (Η[最大]— Η[最終])/Η[最大]χΐ〇〇 f火设率’較佳為8 5 %以上、更佳為9 〇 %以上。 彈性復原率,較佳為60%以上、更佳為80%以上。 若恢復率及/或彈性復原率過小,則硬化物無法與面板 之製造時的荷重不均對應。 t用於本Λ施形怨的硬化性組成物係,於模塗方式之塗 佈中,可供給高度均勻性優異的硬化物之硬化性組成物。 且,根據本實施形態,可實現平衡良好地兼顧此種高度均 勻性、與習知用於彩色濾光片用等之硬化性組成物所要求 之各種性能的硬化性組成物。 適用於本實施形態的硬化性組成物係,於液晶顯示器等 之彩色濾光片等中,於形成黑色矩陣、保護層、突壁(rib) ^間隔件等時可較佳使用的硬化性樹脂組成物。根據本實 加形恶’可提供高品質的彩色濾光片或液晶顯示裝置等。 312XP/發明說明書(補件)_/96125023 72 200811599 [5]彩色濾光片 繼而,對彩色濾光片加以說明。 圖5係表示彩色濾光片之一例的概略圖。如圖5所示, 彩色濾光片20,於作為透明基板的玻璃基板21上,積層 有黑色矩陣22、像素著色層23、保護層24。 黑色矩陣22,阻斷外光而提升黑顯示之品質及對比度。 像素著色層23係,塗佈用以顯示RGB(紅、綠、藍)3色之 色彩的顏料或染料而形成。保護層24,填埋像素著色層 23部分之高低差異,進行平坦化。 至於具有與作為透明基板的玻璃基板21同等性質之材 料,例如可列舉:聚對苯二甲酸乙二酯等聚酯系樹脂;聚 丙烯、聚乙烯等聚烯烴系樹脂;聚碳酸酯、聚曱基丙烯酸 甲酯、聚砜之熱可塑性樹脂製片材;環氧樹脂、不飽和聚 酯樹脂、聚(甲基)丙烯酸系樹脂等熱硬化性樹脂片材等。 於作為透明基板的玻璃基板21上,視需要,可進行電 暈放電處理、臭氧處理、我偶合劑或胺基?酸§旨系樹脂 等各種樹脂之薄膜形成處理等’而可改良接著性等表面物 性。玻璃基板21之厚度,通常為0 05職〜1〇咖、較佳 為0· 1 mm〜7 mm之範圍。 黑色矩陣22,使用遮光金屬薄膜或黑色矩陣用 散液,形成於玻璃基板21上。 於使用黑色矩陣㈣之遮光金屬薄膜之情況, 光性金屬薄膜材料,可使用金屬鉻,氧化鉻 等贫 化合物,錄㈣合金等,亦可為使料積層為複數層狀者°。 312XP/發明說明書(補件)/96-09/96125023 73 200811599 通常,藉由蒸鍍法或濺鍍法,將該等遮光性金屬薄膜材 料形成於玻璃基板21上,繼而,藉由正型光阻劑,將所 期望的圖案形成為膜狀後,對於鉻,使用混合硝酸鈽銨與 過氯酸之蝕刻液,對於其他材料,使用適合於材料的蝕刻 液而進行蝕刻,最後藉由專用剝離劑剝離正型光阻劑,^ 藉此而形成黑色矩陣22。 於利用黑色矩陣22用之顏料分散液之情況,使用含有 黑色之色材的硬化性組成物,形成黑色矩陣22。例如, 可使用含有碳黑、石墨、鐵墨、苯胺黑、花青黑、鈦黑等 黑色色材單獨或複數種,或者藉由自無機或有機之顏料、 染料中適當選擇的紅色、綠色、藍色等之混合而得的黑色 色材的硬化性組成物,與形成紅色、綠色、藍色之像素著 色層23的方法相同,形成黑色矩陣μ。 繼而,於設置有黑色矩陣22之玻璃基板21上,藉由適 用於本實施形態的硬化性組成物之硬化物,形成RGB(紅、 綠、藍)3色之像素著色層23,進而,形成保護層24而填 埋像素著色層23部分之高低差異,進行平坦化而製造彩 色濾光片20。 用以形成像素著色層23的硬化性組成物,可作為紅 色、綠色、藍色中至少一種光阻劑形成用塗佈液而使用。 對於紅色、綠色、藍色,於形成於玻璃基板21上之樹脂 黑色矩陣形成面上,或使用鉻化合物以及其他遮光金屬材 料而形成的金屬黑色矩陣形成面上,塗佈光阻劑形成用塗 佈液,乾燥後,將光罩重疊於塗佈膜上,藉由透過該光罩 312XP/發明說明書(補件)/96-09/96125023 74 200811599St? is the height of 9最高% of the height of the highest position, and 17 is the diameter AA' of the circle of the upper section. It was carried out using a Dynamic Ultra Micro Hardness Tester (Shimadzu Corporation's 刀 knife a 3 manufactured by Shimadzu Dynamic Ultra Micro Hardness Tester duh-W2〇1. y Test conditions: the measured temperature was 23t: 'Applicable diameter is 5〇^ "face", applying a load to the spacer at a fixed speed (0.22 gf/sec) for 5 seconds when the predetermined maximum load is 5 gf, and then de-loading at the same speed. The load obtained by using the test A displacement curve (Fig. / is a schematic diagram), and the maximum displacement H is determined [maximum displacement final Η [final]. The above maximum displacement H [maximum] is taken as the total deformation amount. Furthermore, Fig. 4 shows Load of the spacer __ Load in the load-removal test - a schematic diagram of the displacement curve. In Figure 4, the horizontal axis is the displacement H (unit: #瓜), 312ΧΡ/invention specification (supplement)/96_〇9/ 96125023 71 200811599 The vertical axis is the load L (unit··gf). The total deformation amount is preferably 1·4 or more, more preferably 15 or more, preferably 5 or less, more preferably 3 or less. If the total deformation is too large , the elastic recovery rate and/or the recovery rate deteriorate. On the other hand, if the total deformation is too small, the cured product The method corresponds to the unevenness of the load at the time of manufacture of the panel. ^, the elastic recovery rate and the recovery rate are calculated based on the values measured by the load-de-loading test using the above-described microhardness tester, respectively. Recovery rate (%) = 丨 (pattern height before test) Η [final]} / (pattern height before test) xl 〇〇 elastic recovery rate = (Η [maximum] - Η [final]) / Η [maximum The χΐ〇〇f ignition rate is preferably 85% or more, more preferably 9% or more. The elastic recovery rate is preferably 60% or more, more preferably 80% or more. If the recovery rate and/or elasticity When the recovery rate is too small, the cured product cannot correspond to the load unevenness at the time of manufacture of the panel. t The curable composition for the application of the mold is capable of supplying a high degree of uniformity in the application of the die coating method. Further, according to the present embodiment, it is possible to achieve such a high degree of uniformity in balance and to perform various hardening properties required for a curable composition such as a color filter. Sex composition. Applicable to the curable composition of the present embodiment, in liquid In a color filter such as a display, a curable resin composition which can be preferably used in forming a black matrix, a protective layer, a rib, a spacer, etc., can provide high quality according to the present invention. Color filter or liquid crystal display device, etc. 312XP/Invention manual (supplement)_/96125023 72 200811599 [5] Color filter, then, color filter is explained. Fig. 5 shows color filter As shown in FIG. 5, the color filter 20 has a black matrix 22, a pixel colored layer 23, and a protective layer 24 laminated on a glass substrate 21 as a transparent substrate. The black matrix 22 blocks external light and enhances the quality and contrast of the black display. The pixel colored layer 23 is formed by coating a pigment or a dye for displaying colors of three colors of RGB (red, green, and blue). The protective layer 24 fills in the difference in height between the portions of the pixel colored layer 23 and planarizes it. Examples of the material having properties equivalent to those of the glass substrate 21 as a transparent substrate include polyester resins such as polyethylene terephthalate; polyolefin resins such as polypropylene and polyethylene; and polycarbonate. A sheet made of a thermoplastic resin such as methyl acrylate or polysulfone; a thermosetting resin sheet such as an epoxy resin, an unsaturated polyester resin or a poly(meth)acrylic resin. On the glass substrate 21 as a transparent substrate, if necessary, can it be subjected to corona discharge treatment, ozone treatment, or a coupling agent or an amine group? The acid § is intended to form a film forming treatment of various resins such as a resin, and the surface properties such as adhesion can be improved. The thickness of the glass substrate 21 is usually in the range of 0 05 to 1 Å, preferably 0 to 1 mm to 7 mm. The black matrix 22 is formed on the glass substrate 21 using a light-shielding metal film or a black matrix dispersion. In the case of using a light-shielding metal film of the black matrix (4), the light metal film material may be a poor compound such as metal chromium or chromium oxide, a (four) alloy or the like, or a laminate layer of a plurality of layers. 312XP/Invention Manual (Supplement)/96-09/96125023 73 200811599 Generally, the light-shielding metal thin film material is formed on the glass substrate 21 by vapor deposition or sputtering, and then by positive light In the resist, after the desired pattern is formed into a film shape, an etching solution of ammonium cerium nitrate and perchloric acid is used for the chromium, and an etching solution suitable for the material is used for the etching of the other material, and finally the special etching is performed. The agent strips the positive photoresist, thereby forming a black matrix 22. In the case of using the pigment dispersion liquid for the black matrix 22, a black matrix 22 is formed using a curable composition containing a black color material. For example, a black color material containing carbon black, graphite, iron ink, nigrosine, cyanine black, titanium black, or the like may be used alone or in plural, or red or green, which is appropriately selected from inorganic or organic pigments and dyes. The curable composition of the black color material obtained by mixing blue or the like is formed in the same manner as the method of forming the red, green, and blue pixel colored layer 23, and a black matrix μ is formed. Then, on the glass substrate 21 provided with the black matrix 22, the pixel colored layer 23 of three colors of RGB (red, green, and blue) is formed by the cured product of the curable composition of the present embodiment, and further formed. The protective layer 24 fills in the difference in height of the portion of the pixel colored layer 23, and planarizes it to produce the color filter 20. The curable composition for forming the pixel colored layer 23 can be used as at least one coating liquid for forming a resist of red, green or blue. For red, green, and blue, a photoresist black forming surface is formed on a resin black matrix forming surface formed on the glass substrate 21, or a metal black matrix forming surface formed using a chromium compound and other light shielding metal materials, and a photoresist forming coating is applied. After the cloth is dried, the mask is superposed on the coating film by passing through the mask 312XP/invention manual (supplement)/96-09/96125023 74 200811599

之影像曝光、顯影,視雲I η ,…、更化或光硬化而形成含有硬 ::組=勿之硬化物的像素著色,23。可藉由對紅色、 像 : 3色分別進行該操作,而形成彩色濾光片影 再者將光阻劑形成用塗佈液供給至玻璃基板2工上之 =理乾曝光方法、顯影方法、追加曝光及熱硬 、处 仃人於上述間隔件之形成方法中所說明的操作 以及條件相同的處理。 ’、 此處本貝施形態中之硬化性組成物,如上述,流變特 Ά異’利用杈塗方式之塗佈性優異,故適用於本實施形 態的彩色濾光片20,就製造良率、產品品質之方面而言, 車乂“為使用上述硬化性組成物經由利用模塗法之塗佈步 驟而製造。 [6 ]液晶顯示裝置 繼而’對液晶顯示裝置加以說明。 圖6係表示液晶顯示裝置(面板)LCD之層構成之一例的 概略圖。如圖6所示,液晶顯示裝置(面板)LCD具有如下 構造:於藉由於設置有透明電極25之彩色濾光片2〇與薄 膜電晶體(TFT,Thin Fi lm Transistor)陣列基板3〇之間 5又置間隔件28而形成的液晶元件4〇中充滿液晶29。 彩色濾光片20,於玻璃基板21上,積層有黑色矩陣22、 像素著色層23、保護層24。於保護層24上,配置含有 IT0(氧化銦錫)之透明電極25。於透明電極25上,配置 有液晶配向控制突起(突壁)27與間隔件28,進而,於彼 312Xp/發明說明書(補件)/96-09/96125023 75 200811599 等之上積層有配向膜26。透明電極25,對液晶29施加電 麼而控制液晶分子之方向。配向膜26,係為了將液晶29 之分子扭轉成特殊的形態而被設置。 薄膜電晶體陣列基板30係,於玻璃基板31上,依序配 置有:控制液晶顯示裝置(面板)LCD之顯示的薄膜電晶體 32、絕緣膜33、含有no之透明電極34、液晶配向控制 突起(突壁)37、配向膜35。 再者,於玻璃基板21、31之各自之外側,貼有偏光板(未 圖示)。又,於薄膜電晶體陣列基板3〇之外侧具備照明I 置(BL)。 ....... 如上述,液晶顯示裝置(面板)LCD之彩色濾光片2〇,其 中像素著色層23使用本實施形態之硬化性組成物,形成 作為顯示RGB(紅、綠、藍)之彩色的像素影像。又,液晶 顯示衣置(面板)LCD之液晶配向控制突起(突壁)27、37以 及間隔件28,均使用本實施形態之硬化性組成物而形成。 再者,配向膜26、35較佳為聚醯亞胺等樹脂膜。作為 配向膜26、35之形成方法,通常採用凹板印刷法、柔版 印刷法等,藉由熱焙燒而進行硬化處理。配向膜26、35 之厚度’通常為數10 nm。 液晶顯示裝置(面板)LCD ,例如藉由以下之操作進行製 彩色濾光片20係,於玻璃基板21上形成黑色矩陣22 以及像素著色層23。繼而,視需要以保護層24覆蓋像素 著色層23,施加透明電極25。繼而,形成液晶配向控制 312XP/發明說明書(補件)/96-09/96125023 76 200811599 犬起(突壁)27以及間隔件28。進而,於液晶配向控制突 起(犬壁)2 7及間隔件2 8上施加配向膜2 β。 溥膜電晶體陣列基板3〇係,於玻璃基板31上,形成薄 膜電晶體32、絕緣膜33、透明電極34、液晶配向控制突 起(犬壁)37及配向膜35。繼而,使彩色濾光片2〇與薄膜 電晶體陣列基板30、彩色渡光片2〇之配向膜26與薄膜 電晶體陣列基板30之配向膜35對向貼合,形成液晶元件 40。並且,於所形成的液晶元件4〇中注入液晶29,與對 向電極(未圖示)接線而製造液晶顯示裝置(面板)LCD。 (實施例) 以下’基於實施例對本發明加以更具體說明。再者,本 發明只要不超出其主旨,則並不限定於以下實施例。 (1)化合物之合成例 (合成例1 ·乙稀性不飽和化合物(A1)) 將180份丙二醇單甲醚(黏度l 7 mPa.sec、25它)、7· 3 伤偶氮系聚合起始劑(和光純藥股份有限公司製造之 「V—59」)投入反應容器,於氮氣環境下,升溫至8(rc, 滴下4份甲基丙烯酸τ酯、7〇份甲基丙烯酸以及31份甲 基丙烯酸異萡酯,進而進行攪拌4小時。 繼而’對反應容器内進行空氣置換,投入〇. 1份對甲氧 基苯紛、103· 8份甲基丙烯酸環氧丙酯以及4. 2份四乙基 氯化銨,於85°C連續反應1〇小時。 於所獲得的反應液中添加丙二醇單甲驗,製成固形分濃 度為50重量%之溶液。 312XP/發明說明書(補件)/96-09/96125023 ηη 200811599 所獲付的乙烯性不飽和化合物(A1)之固形分酸價為22 mgKOH/g,重量平均分子量(.)為16,〇〇〇。(雙鍵當量為 286) (合成例2:乙烯性不飽和化合物(A2)) : 將90份丙二醇單甲醚乙酸酯、6· 1份偶氮系聚合起始 •,(和光純藥股份有限公司製造之「V—59」)投入反應容 器,於氮氣環境下,升溫至8(rc,滴下15份苯乙烯、42 知曱基丙烯酸環氧丙酯以及份具有三環癸烧骨架之單 曱基丙烯酸酯(日立化成股份有限公司製造之 「FA-513M」),進而進行攪拌4小時。 矣k而’對反應容器内進行空氣置換,投入〇 · 〇 $份對甲 氧基苯酚、21.3份丙烯酸以及2.丨份四乙基氯化銨,於 8 0 °C連續反應8小時。 其後,添加12.5份四氫鄰苯二曱酸酐,於奶^反應4 小時。 、 於所獲得的反應液中添加丙二醇單曱醚乙酸酯,製成固 形分濃度為50重量%之溶液。 所獲得的乙烯性不飽和化合物(A2)之固形分酸價為38 • m§K〇H/g,重量平均分子量(Mw)為1〇,000。(雙鍵當量為 409) (化合物(H) ··藉由以下製造例而獲得的化合物(日本專 利特開平1 1-133600號公報中,合成例3(段落〇〇43段) 所揭示之丙稀酸樹脂)) 於具備冷卻管、攪拌機之燒瓶中,投入7重量份2, 2,一 312XP/發明說明書(補件)/96-09/96125023 78 200811599 偶氮=(2, 4-二甲基戊腈)、2〇〇重量份二乙二醇二曱醚。 繼續投入ίο重量份苯乙烯、20重量份甲基丙稀酸、45 重量份甲基丙烯酸環氧丙酯、25重量份曱基丙烯酸二環 戊S旨,通氣氣後,開始缓慢搜拌。 使溶液溫度上升至7(TC,將該溫度保持5小時,獲得 含有共聚物(H)之聚合物溶液。所獲得的聚合物溶液之固 形分濃度為33%,固形分酸價為11〇 mgK〇H/g,重量平均 分子量(Mw)為18, 〇〇〇。 (合成例3 :乙烯性不飽和化合物(A4)) 於γ.5重量份三乙胺、及〇.25重量份對苯二酚存在下, 於85°C,使118重量份琥珀酸酐與596重量份市售之季 戊四醇三丙烯酸酯反應5小時。反應後,獲得包含:%之 1分子中具有1個羧基及2個以上丙烯醯基之多官能丙烯 酸酯、以及34%之季戊四醇四丙烯酸酯之多官能丙烯酸酯 混合物(含有乙烯性不飽和基之羧酸混台物AA〇。該多官 能丙烯酸酯混合物之酸價為9 2. 7。 繼而,於1000 ml之四口燒瓶中,投入231 g之9 9_ 雙(4’ -羥基苯基)第之二環氧丙基醚化物 231)、605 g上述含有乙嫌祕尤私$甘 局 4 3百乙烯性不飽和基之鲮酸混合物 (AA1) 6. 06 g二乙基卞基氯化銨、〇. 15 g對甲氧基苯盼、 no g丙二醇單甲醚乙酸酯。繼而,使該等於7〇。。〜8〇 ◦°C加熱溶解,進而,溶液於白濁之狀態下緩慢升溫至π °C而完全溶解。繼而,將變為透明黏稠之溶液繼續加孰授 拌8小時直至酸價達到3』_rog/g,獲得無色透明之反 312XP/發明說明書(補件)/96-09/96125023 79 200811599 應產物。進而,於所獲得的反應產物中添加丙二醇單曱醚 乙酸酯進行製備以使固形分達到50%。 繼而,於100 g所獲得的固形分為50%之溶液中,添加 8· 7 g之1,2, 3, 6-四氫鄰苯二曱酸酐,缓慢升溫而於8〇 8 5 C使之反應3小時,藉此獲得化合物(A4)之溶液。(該 溶液之固形分濃度為54%)所獲得的化合物(A4),固形分 酸價為55 KOHmg/g,重量平均分子量(Mw)為2,5〇〇。 (2)硬化性組成物之評價 (i )黏度 以表2所示之調配比例,於室溫下攪拌上述乙烯性不飽 和化合物U1)〜U4)((A)成分)、光聚合起始劑(〇)成 分)、聚合性單體((c)成分)、溶劑((D)成分)、界面活性 劑((G)成分)及不具有乙烯性不飽和基之樹脂((H)成 分)’而調製塗佈液’於溫& 23t,使用黏度計(東京計 器股份有限公司製造之E型黏度計)進行測定。The image is exposed, developed, and visualized by cloud I η , ..., or by photohardening to form a pixel coloring containing a hard :: group = hardened material, 23 . By performing the operation on the red color, the image, and the like, respectively, the color filter is formed, and the coating liquid for forming a photoresist is supplied to the glass substrate 2, the dry exposure method, the development method, The exposure and the heat hardening are the same as the operations and conditions described in the method of forming the spacer described above. In the case where the curable composition in the present embodiment of the present invention is excellent in the coating property by the smear coating method, the color filter 20 of the present embodiment is preferably produced. In terms of rate and product quality, the rutting is "made by using the above-mentioned curable composition by a coating step by a die coating method. [6] The liquid crystal display device will then be described with respect to the liquid crystal display device. Fig. 6 shows A schematic diagram of an example of a layer configuration of a liquid crystal display device (panel) LCD. As shown in FIG. 6, the liquid crystal display device (panel) LCD has a configuration in which a color filter 2 and a film are provided by a transparent electrode 25. The liquid crystal element 4 is formed between the array substrate 3 of the transistor (TFT) and the spacer 28 is filled with the liquid crystal 29. The color filter 20 is laminated on the glass substrate 21 with a black matrix. 22. A pixel colored layer 23 and a protective layer 24. A transparent electrode 25 containing IT0 (indium tin oxide) is disposed on the protective layer 24. On the transparent electrode 25, a liquid crystal alignment control protrusion (bump) 27 and a spacer are disposed. 28, into An alignment film 26 is laminated on the 312Xp/invention specification (supplement)/96-09/96125023 75 200811599, etc. The transparent electrode 25 controls the direction of the liquid crystal molecules by applying electricity to the liquid crystal 29. The alignment film 26 is In order to twist the molecules of the liquid crystal 29 into a special form, the thin film transistor array substrate 30 is provided with a thin film transistor 32 for controlling the display of the liquid crystal display device (panel) LCD on the glass substrate 31, The insulating film 33, the transparent electrode 34 containing no, the liquid crystal alignment control protrusion (projecting wall) 37, and the alignment film 35. Further, a polarizing plate (not shown) is attached to each of the glass substrates 21 and 31. Illumination I (BL) is provided on the outer side of the thin film transistor array substrate 3. As shown above, the color filter 2 of the liquid crystal display device (panel) LCD, in which the pixel colored layer 23 is used The curable composition of the present embodiment forms a pixel image as a color showing RGB (red, green, and blue). Further, the liquid crystal alignment control protrusions (bumps) 27, 37 and the spacer of the liquid crystal display (panel) LCD Item 28, both use this Further, the alignment films 26 and 35 are preferably resin films such as polyimine. For the formation of the alignment films 26 and 35, a gravure printing method or a flexographic printing method is usually used. The curing process is performed by thermal baking. The thickness of the alignment films 26 and 35 is usually 10 nm. The liquid crystal display device (panel) LCD is subjected to color filter 20, for example, by the following operation, on a glass substrate. A black matrix 22 and a pixel colored layer 23 are formed on 21. Then, the pixel colored layer 23 is covered with a protective layer 24 as needed, and the transparent electrode 25 is applied. Then, a liquid crystal alignment control 312XP/invention specification (supplement)/96-09/96125023 76 200811599 can be formed (dog wall) 27 and a spacer 28. Further, the alignment film 2 β is applied to the liquid crystal alignment control protrusion (dog wall) 27 and the spacer 28. The enamel film array substrate 3 is formed on the glass substrate 31, and a thin film transistor 32, an insulating film 33, a transparent electrode 34, a liquid crystal alignment control protrusion (dog wall) 37, and an alignment film 35 are formed. Then, the color filter 2 is bonded to the alignment film 26 of the thin film transistor array substrate 30 and the color light-receiving sheet 2, and the alignment film 35 of the thin film transistor array substrate 30 to form a liquid crystal element 40. Further, a liquid crystal 29 is injected into the formed liquid crystal element 4, and is connected to a counter electrode (not shown) to manufacture a liquid crystal display device (panel) LCD. (Embodiment) Hereinafter, the present invention will be described more specifically based on examples. Further, the present invention is not limited to the following embodiments as long as the gist of the invention is not exceeded. (1) Synthesis Example of Compound (Synthesis Example 1 · Ethylene-Unsaturated Compound (A1)) 180 parts of propylene glycol monomethyl ether (viscosity of 7 mPa.sec, 25 it), 7.3 injured azo polymerization The starting agent ("V-59" manufactured by Wako Pure Chemical Co., Ltd.) was put into a reaction vessel, and the temperature was raised to 8 (rc, 4 parts of methacrylate methacrylate, 7 parts of methacrylic acid, and 31 parts) under nitrogen atmosphere. The isodecyl methacrylate was further stirred for 4 hours. Then, the inside of the reaction vessel was replaced with air, and 1 part of p-methoxybenzene, 103.8 parts of glycidyl methacrylate and 4. 2 were placed. The tetraethylammonium chloride was continuously reacted at 85 ° C for 1 hour. A propylene glycol monomethyl group was added to the obtained reaction solution to prepare a solution having a solid concentration of 50% by weight. 312XP/Invention Manual (Repair) /96-09/96125023 ηη 200811599 The ethylenically unsaturated compound (A1) obtained has a solid content acid value of 22 mgKOH/g and a weight average molecular weight (.) of 16, 〇〇〇. 286) (Synthesis Example 2: ethylenically unsaturated compound (A2)): 90 parts of propylene glycol monomethyl ether acetate, 6 1 part of azo-based polymerization start-up, ("V-59" manufactured by Wako Pure Chemical Co., Ltd.) was put into a reaction vessel, and the temperature was raised to 8 (rc, dropping 15 parts of styrene, 42 曱 曱Glycidyl acrylate and a monodecyl acrylate having a tricyclic terrible skeleton ("FA-513M" manufactured by Hitachi Chemical Co., Ltd.), and further stirred for 4 hours. 矣k and 'air in the reaction vessel Displacement, input 〇· 〇$ parts of p-methoxyphenol, 21.3 parts of acrylic acid, and 2. 丨 parts of tetraethylammonium chloride, and continuously reacted at 80 ° C for 8 hours. Thereafter, 12.5 parts of tetrahydroortylene was added. The phthalic anhydride was reacted in the milk for 4 hours. propylene glycol monoterpene ether acetate was added to the obtained reaction solution to prepare a solution having a solid concentration of 50% by weight. The obtained ethylenically unsaturated compound (A2) The solid content acid value is 38 • m § K 〇 H / g, and the weight average molecular weight (Mw) is 1 〇 000. (double bond equivalent is 409) (Compound (H) · · obtained by the following manufacturing examples Compound (Japanese Patent Laid-Open No. Hei 1-133600, Synthesis Example 3 (Section) 〇〇 43)) The acrylic resin disclosed)) In a flask equipped with a cooling tube and a stirrer, put 7 parts by weight 2, 2, a 312XP / invention manual (supplement) / 96-09/96125023 78 200811599 Nitrogen = (2, 4-dimethylvaleronitrile), 2 parts by weight of diethylene glycol dioxime. Continue to input ί parts by weight of styrene, 20 parts by weight of methacrylic acid, 45 parts by weight of methacrylic acid Glycidyl ester, 25 parts by weight of dicyclopentanyl methacrylate, after aeration, began to slowly mix. The temperature of the solution was raised to 7 (TC, and the temperature was maintained for 5 hours to obtain a polymer solution containing the copolymer (H). The obtained polymer solution had a solid content concentration of 33% and a solid acid value of 11 〇 mgK. 〇H / g, weight average molecular weight (Mw) is 18, 〇〇〇. (Synthesis Example 3: ethylenically unsaturated compound (A4)) in γ. 5 parts by weight of triethylamine, and 〇.25 parts by weight of benzene In the presence of diphenol, 118 parts by weight of succinic anhydride was reacted with 596 parts by weight of commercially available pentaerythritol triacrylate for 5 hours at 85 ° C. After the reaction, a molecule containing: % of one molecule had one carboxyl group and two or more were obtained. a polyfunctional acrylate of propylene fluorenyl, and a polyfunctional acrylate mixture of 34% pentaerythritol tetraacrylate (a carboxylic acid mixture AA oxime containing an ethylenically unsaturated group. The acid value of the multifunctional acrylate mixture is 9 2. 7. Then, in a 1000 ml four-necked flask, 231 g of 9 9_bis(4'-hydroxyphenyl)di-epoxypropyl etherate 231), 605 g of the above contains B. Private $Gan 4 3 hundred ethylenically unsaturated decanoic acid mixture (AA1) 6. 06 g diethyl Ammonium chloride, ruthenium 15 g p-methoxybenzene, no g propylene glycol monomethyl ether acetate. Then, make this equal to 7 〇. ~ 8 〇◦ ° C heated to dissolve, and then, the solution is white turbid Slowly warm up to π °C and completely dissolve. Then, it will become a transparent and viscous solution and continue to stir for 8 hours until the acid price reaches 3』_rog/g, and obtain the colorless transparent anti-312XP/invention manual (supplement) )/96-09/96125023 79 200811599 The product should be prepared. Further, propylene glycol monoterpene ether acetate was added to the obtained reaction product to prepare a solid fraction of 50%. Then, the solid fraction obtained at 100 g was classified. In a 50% solution, 8·7 g of 1,2,3,6-tetrahydrophthalic anhydride was added, and the temperature was slowly raised and reacted at 8〇85 C for 3 hours, thereby obtaining a compound (A4). The solution (the solid content concentration of the solution was 54%) obtained the compound (A4) having a solid acid value of 55 KOHmg/g and a weight average molecular weight (Mw) of 2,5 Å. (2) Sturability Evaluation of composition (i) Viscosity The above-mentioned ethylenically unsaturated compound U1)~U4 was stirred at room temperature in the proportion shown in Table 2. ((A) component), photopolymerization initiator (〇) component, polymerizable monomer (component (c)), solvent (component (D)), surfactant (component (G)), and The ethylenically unsaturated group-containing resin ((H) component) was prepared and the coating liquid was prepared at a temperature of < 23 t, and measured using a viscometer (E-type viscometer manufactured by Tokyo Keiki Co., Ltd.).

(Η )調平阻力值、下流阻力值 基於以表2所示之調配比例而製備的硬化性組成物之 固形分濃度及黏度之值,算出以上述式⑴表示之調平阻 力值⑽、以及以式⑵表示之下流阻力值(rs)。 (iii )調平特性、下流特性評價 凋配比例所製備的硬化性組成物(彩色 光阻劑4),自將圖i(a)所干* 以_ 斤不之具有犬起部la的填隙片1 以圖1(b)所不之方式後入的^ $ 550 mm覓度之狹縫模頭2之 吐出口 2a吐出,於塗佈速声糸 迷又為100 mm/s、塗佈間隙為][〇〇 312XP/發明說明書(補件)/96-09/96125023 80 200811599 、乾煉膜厚為4. 5 /zm之條件下,塗佈於玻璃基板3 上。 再者’圖l(a)中之尺寸單位為mm,填隙片1之厚度為 • 05 mm又’圖1 (a)中之點線I - I ’表示歧管邊緣,點 線Π - Π ’表示狹縫模頭前端位置。 又圖l(b)中,2表示狹缝模頭,3表示玻璃基板,4 表示彩色光阻劑,5表示條紋不均。 j於調平特性之「高度均句性」,於塗佈後藉由減壓乾 秌衣置處理〇· 5 Torrxl20秒鐘後,於對流烘箱中於23〇 =處理30分鐘,測定所獲得的塗佈基板之塗佈固定部之 寬度方向的膜厚分布,評價高度分布(標準偏差)。又,藉 由Na燈宏觀觀察塗佈基板之條紋不均5的產生,藉由二 下基準進行評價。 〇··除距離塗佈端i cm〜2 cm之範圍外,整面無干涉 條紋。 X :基板整面可見強干涉條紋。 對於下流特性之「下流」,將塗佈後之塗佈基板傾斜保 持30度、1〇秒鐘後’藉由減壓乾燥裝置處理〇.5 秒鐘後,於對流烘箱中於23{rc處理3〇分鐘,測定所獲 得的塗佈基板之傾斜方向的膜厚分布’藉由以下基準評^ 由於下流而產生的膜厚變動。 〇:距離塗佈基板之傾斜方向之兩端部2⑽之點的膜 厚差為0· 4 mm以下。 △:距離塗佈基板之傾斜方向之兩端部2 cin之點的膜 312XP/發明說明書(補件)/96-09/96125023 〇, 200811599 厚差超過0. 4 mm。 (iv)總變形量、恢復率、彈性復原率之評價 (iv-Ι)間隔件圖案之形成 於表面形成有ΙΤ0膜之玻璃基板的該IT〇膜上,使用旋 轉塗佈機塗佈以表2所示之調配比例而製備的硬化性組 成物後,於80 c於加熱板上加熱乾燥3分鐘而形成塗膜。 於所獲得的塗膜上使用既定圖案光罩,使用挪⑽之強 度為32 mW/cm2之紫外線,以曝光量達到i〇〇 mj/cm2之方 式進行曝光。此時的紫外線照射於空氣下進行。繼而,以 23C之G.1重量%氫氧化鉀水溶液,以最小顯影時間之2 ^時間進行噴射顯影後,以純水清洗1分鐘。此處,所 f最小顯影時間,係指於相同顯影條件下,未曝光部完全 溶解的時間。藉由該等操作,而除去多餘部分,使形成有 =件圖案之玻璃基板’於供箱中於23代加熱硬化加 刀在里,獲得高度為4 之圓柱狀間隔件圖案。 (iv -2)間隔件圖案之形狀計測 對上述(Μ)中所獲得的圖案’使用超深度彩色3D形 狀測定顯微鏡«eyence股份有限公司製造·· νκ_95〇〇), 如,2所示,^剖通過間隔件圖案之中轴的縱剖面,計測 上部截面積及高度。將自所縱剖之圖形(圖3為示意圖) 的基板面至最高位置之點㈣高度之9〇%的高度作為間隔 件之高度,測定該高度之、平行於間隔件圖案之圖形内的 基板面之直線ΑΑ,的長度,將以直線ΑΑ,為直徑的圓之面 積作為間隔件圖案之上部截面積。 312ΧΡ/發明說明書(補件)/96-09/96125023 82 200811599 (iv -3)間隔件之機械特性之評價 對上述Πν-。,所獲得的間隔 #m、上部截面積為训ϊη 2 Τ同度為4 丨戰㈣為80土1〇 ^的“固圖案 孝Dynamic超顯微硬度計(,、袁 曰 " ^ . ΠίίΗ W9nic, 又島孝製作所股份有限公司製 化· DUH-W201S)的負荷—除莅舛私 ^ ^ %、目丨Λ 貝仃除何4驗,而評價其機械特性。 於測定溫度231:,藉由直徑為π " . r m ^ ^ .Λ οο 仏馮5〇 # m之平面壓頭,以 u又(0.22 gf/sec)對間隔件圖案施加荷重[,於達 到既定最大荷重5 。^ — gf %保持5秒鐘,繼而以相同速度進 订除荷。 糟由利用該試驗而求得的荷重—變位曲線(圖4為示意 圖),測定最大變位(總變形量)H[最大]及最終變位Η[最 終],恢復率〇〇、彈性復原率(%),基於上述測定值,以 如下方式進行計算,將結果表示於表2。 —恢復率(%)={(試驗前之圖案高度)_ H[最終(試驗 前之圖案高度)χ1〇〇 彈性復原率(%) = (Η[最大]_H[最終])/H [最大]χ1〇() (實施例1〜6、比較例1〜3 ) 對使用乙烯性不飽和化合物(Ai )〜(Α4)((Α)成分)、光 聚合起始劑((Β)成分)、聚合性單體((C)成分)、溶劑((D) 成分)、界面活性劑((G)成分)及不具有乙烯性不飽和基之 樹脂((Η)成分),以表2所示之調配比例而製備的硬化性 組成物,求得黏度(μ )、調平阻力值(RL)、下流阻力值 (RS) ’又,評價高度均勻性及下流特性。將結果表示於表 2 〇 312XP/發明說明書(補件)/96-09/96125023 83 200811599 [表2 ] 實施例 比較例 硬化性組成物 1 2 3 4 5 6 1 2 3 (A)乙嫦性不飽和 化合物 A1 100 - 一 100 100 - 一 - - A2 - 100 一 - - 70 - - 一 A4 - - 92.6 一 一 - 一 92.6 92.6 (B)光聚合起始劑 B 3 3 3 3 3 3 3 3 3 (C)聚合物性單體 C1 40 40 40 30 40 40 40 40 40 C2 - - - 10 - 一 一 - 一 (D)溶劑 D1 374 415 330 322 334 389 228 241 485 D2 - - - 一 40 - - _ - (G)界面活性劑 G 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 (H)不具有乙烯性 不飽和基之樹脂 Η - 一 一 - - 45 152 - 一 固形分濃度C kg/kg 0.18 0.17 0.20 0. 20 0.18 0.17 0.22 0.25 0.15 硬化性組成物之特性 黏度# mPa-s 4.7 3.3 3.2 5.4 5.3 3.7 5.0 4.0 2.5 調平阻力值RL 0. 027 0.016 0. 026 0.043 0.031 0.018 0.053 0.060 0. 008 下流阻力值RS 0.15 0.10 0.13 0. 22 0.17 0.11 0. 24 0.24 0. 06 評價結果 高度均勻性 高度 分布 (1〇2) 0. 76 0. 60 0.81 0. 77 0.76 0. 63 1.50 1.60 1.65 評價 〇 〇 〇 〇 〇 〇 X X X 下流 〇 Δ △ 〇 〇 Δ 〇 〇 Δ 總變形量Η[最大](/zm) 1.50 1.45 1.45 1.62 1.51 1.60 1.50 1.45 1.44 最終變位ΗΪ最終ί (// m) 0.65 0. 65 0. 60 0. 75 0. 65 0.80 0. 85 0.59 0. 58 恢復率⑻ 84 84 85 81 84 80 79 85 86 彈性復原率(%) 57 55 59 53 57 50 43 59 60 此處,表2中,(B)成分(光聚合起始劑)、(C)成分(聚 合性單體)、(D)成分(溶劑)、(G)成分(界面活性劑),如 下所述。 (B)光聚合起始劑:千葉精化(Ciba Specialty Chemicals)股份有限公司製造「Irgacure907」 (Cl)二季戊四醇六丙烯酸酯:日本化藥股份有限公司製 造「KAYARAD DPHA」(黏度 5500〜8000 mPa.sec、25°C ) (C2)季戊四醇三丙烯酸酯1,6-六亞曱基二異氰酸酯 胺基甲酸酯預聚物:共榮社化學股份有限公司製造 312XP/發明說明書(補件)/96-09/96125023 84 200811599 「1^-30611」(黏度 10000〜40000 11^&.36。、25°(:) (D1)丙二醇單曱醚乙酸酯(黏度1· 1 mPa· sec、25°C ) (D2)3-曱氧基丁醇(黏度 2· 9 mPa-sec、25°C ) (G)界面活性劑:大日本油墨化學工業公司製造 MEGAFACE F475」 根據表2之結果,可知:使用乙烯性不飽和化合物(A1) 〜(A4)((A)成分)、光聚合起始劑((B)成分)、聚合性單體 ((C)成分)、溶劑((D)成分)及界面活性劑((g)成分)而製 備的硬化性組成物中,調平阻力值(RL)處於〇· 〇1〜〇.〇5 之範圍’且下流阻力值(RS)為〇· 1以上者(實施例1〜6), 模塗之南度均勻性良好,調平特性優異,且下流特性良好。 另一方面,可知:調平阻力值(RL)超過〇· 〇5之情況(比 較例1、2)或未滿〇· 01之情況(比較例3),模塗之高度均 勻性欠佳,調平特性受損。 【圖式簡單說明】 ^圖uw係表示用於評價試驗之填隙片的平面圖,圖 =不猎由安裝有該填隙片之狹縫模頭之塗佈狀態的立 體圖。 立=2 #'表示自上方看間隔件圓案時之縱剖的位置之示 圖3係表示間隔件圖幸之 圖"、表示間隔件之負Γ之輪靡的示意圖。 線之示意圖。 負t除荷試驗中之荷重-變位曲 圖5係表示彩线光片之—例的概略圖。 312XP/發明說明書(補件)/96-09/96125023 85 200811599 圖6係表示液晶顯示裝置(面板)之層構成之一例的概 略圖。 【主要元件符號說明】 1 la 2 2a 填隙片 突起部 狹縫模頭 吐出π 31玻璃基板 21 4 彩色光阻劑 5 條紋不均 11 間隔件圖案 12 間隔件圖案之中轴 13 縱剖位置 14 間隔件圖案之縱剖面之輪廓 15 自基板面至最高位置的高度 16 自基板面至最高位置的高度 17 上剖面之圓的直徑AA’ 20 彩色濾光片 22 黑色矩陣 23 像素著色層 24 保護層 25、34 透明電極 26、35 配向膜 27、37 液晶配向控制突起(穸辟、 312XP/發明說明書(補件)/96-09/96125023 86 200811599 28 間隔件 29 液晶 30 薄膜電晶體陣列基板 32 薄膜電晶體 33 絕緣膜 40 液晶元件 312XP/發明說明書(補件)/96-09/96125023 87(Η) The leveling resistance value and the downflow resistance value are calculated based on the solid content concentration and the viscosity value of the curable composition prepared in the mixing ratio shown in Table 2, and the leveling resistance value (10) expressed by the above formula (1), and The lower flow resistance value (rs) is expressed by the formula (2). (iii) The leveling property and the downflow characteristic are evaluated for the hardening composition (color resist 4) prepared by the proportion of the ratio, which is filled with the dog's starting part la from the figure i(a) The slit 1 is spouted out at the discharge port 2a of the slot die 2 of the ^ 550 mm twist which is not in the manner shown in Fig. 1(b), and is coated at a speed of 100 mm/s. The gap was applied to the glass substrate 3 under the conditions of [〇〇312XP/invention specification (supplement)/96-09/96125023 80 200811599 and a dry film thickness of 4.5/zm. Furthermore, the unit of dimension in Fig. 1(a) is mm, the thickness of the shims 1 is • 05 mm, and the point line I - I in Fig. 1 (a) indicates the edge of the manifold, the dotted line Π - Π 'Represents the position of the front end of the slit die. In Fig. 1(b), 2 denotes a slit die, 3 denotes a glass substrate, 4 denotes a color photoresist, and 5 denotes unevenness of stripes. j "Height uniformity" of the leveling property, after coating, it was treated by decompression dry-coating for 20·5 Torrx for 20 seconds, and then treated in a convection oven at 23 〇 = 30 minutes, and the obtained was measured. The film thickness distribution in the width direction of the coating fixing portion of the coated substrate was evaluated, and the height distribution (standard deviation) was evaluated. Further, the occurrence of streak unevenness 5 of the coated substrate was macroscopically observed by a Na lamp, and evaluation was performed by the following two criteria. 〇··Without the range of i cm~2 cm from the coated end, there is no interference fringe on the entire surface. X: Strong interference fringes are visible on the entire surface of the substrate. For the "downflow" of the downflow characteristics, the coated substrate after coating was tilted at 30 degrees for 1 〇 second, and then treated by a vacuum drying apparatus for 5 seconds, and then treated in a convection oven at 23 {rc In 3 minutes, the film thickness distribution in the oblique direction of the obtained coated substrate was measured, and the film thickness variation due to the downstream flow was evaluated by the following criteria. 〇: The film thickness difference from the point of the both end portions 2 (10) in the oblique direction of the coated substrate is 0·4 mm or less. △: film 312XP/invention manual (supplement)/96-09/96125023 〇, 200811599 The thickness difference exceeds 0.4 mm from the edge of the coated substrate. (iv) Evaluation of total deformation amount, recovery rate, and elastic recovery rate (iv-Ι) The spacer pattern was formed on the IT tantalum film on which the glass substrate on which the ΙΤ0 film was formed, and coated with a spin coater. After the curable composition prepared by mixing the ratio shown in 2, it was heat-dried at 80 c on a hot plate for 3 minutes to form a coating film. A predetermined pattern mask was used on the obtained coating film, and ultraviolet rays having a intensity of 32 mW/cm2 were used for exposure, and exposure was performed at an exposure amount of i 〇〇 mj/cm 2 . The ultraviolet ray at this time is irradiated under the air. Then, it was spray-developed with a G.1% by weight aqueous potassium hydroxide solution of 23 C at a minimum development time of 2 碌, and then washed with pure water for 1 minute. Here, the minimum development time f refers to the time during which the unexposed portion is completely dissolved under the same development conditions. By the operation, the excess portion was removed, and the glass substrate ' having the pattern of the pattern formed was heat-hardened in the pass box in the 23rd generation to obtain a cylindrical spacer pattern having a height of 4. (iv - 2) The shape of the spacer pattern is measured by using the ultra-deep color 3D shape measuring microscope «manufactured by eyence Co., Ltd. · νκ_95〇〇), as shown in 2, ^ The upper cross-sectional area and height are measured by cutting through the longitudinal section of the shaft in the spacer pattern. The height from the substrate surface of the longitudinal section (the schematic view of FIG. 3) to the point (4) of the highest point (4) is taken as the height of the spacer, and the substrate in the pattern parallel to the spacer pattern is measured. The length of the line is ΑΑ, and the length of the circle is ΑΑ, and the area of the circle of the diameter is taken as the cross-sectional area of the upper part of the spacer pattern. 312ΧΡ/Invention Manual (supplement)/96-09/96125023 82 200811599 (iv-3) Evaluation of mechanical properties of spacers For the above Πν-. The obtained interval #m, the upper cross-sectional area is the training η 2 Τ the same degree is 4 丨 war (four) is 80 soil 1 〇 ^ "solid pattern filial Dynamic ultra-micro hardness tester (,, Yuan Yu " ^. ΠίίΗ W9nic, and the load of the company (DUH-W201S) - In addition to the 舛 舛 ^ ^ ^, 目 丨Λ 仃 仃 仃 4 4 4 4 4 4 仃 仃 仃 231 测定 231 231 231 231 231 231 231 The plane indenter of diameter π " . rm ^ ^ .Λ οο 仏 von 5〇# m applies a load to the spacer pattern by u (0.22 gf/sec) [to reach the established maximum load of 5. ^ — Gf% is held for 5 seconds, and then the load is released at the same speed. The load-displacement curve (Fig. 4 is a schematic diagram) obtained by the test is used to determine the maximum displacement (total deformation) H [maximum] And the final displacement Η [final], recovery rate 弹性, elastic recovery rate (%), based on the above measured values, calculated in the following manner, the results are shown in Table 2. - Recovery rate (%) = { (before the test Pattern height) _ H [final (pattern height before test) χ 1 〇〇 elastic recovery rate (%) = (Η [maximum] _H [final]) / H [maximum] χ 1 〇 () (Examples 1 to 6 and Comparative Examples 1 to 3) The use of an ethylenically unsaturated compound (Ai) to (Α4) ((Α) component), a photopolymerization initiator ((Β a component), a polymerizable monomer ((C) component), a solvent ((D) component), a surfactant ((G) component), and a resin ((Η) component) having no ethylenically unsaturated group, The curable composition prepared by the blending ratio shown in Table 2 was evaluated for viscosity (μ), leveling resistance value (RL), and downflow resistance value (RS). Further, the height uniformity and the downflow characteristics were evaluated. Table 2 〇 312XP / Invention Manual (Supplement) / 96-09/96125023 83 200811599 [Table 2] Example Comparative Example Curable Composition 1 2 3 4 5 6 1 2 3 (A) Acetate Unsaturated Compound A1 100 - a 100 100 - a - - A2 - 100 a - - 70 - - an A4 - - 92.6 one - one 92.6 92.6 (B) photopolymerization initiator B 3 3 3 3 3 3 3 3 3 (C ) Polymeric monomer C1 40 40 40 30 40 40 40 40 40 C2 - - - 10 - One-one (D) Solvent D1 374 415 330 322 334 389 228 241 485 D2 - - - One 40 - - _ - ( G) surfactant G 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 (H) Resin without ethylenic unsaturated group 一 - One-to-45 152 - One solid concentration C kg/kg 0.18 0.17 0.20 0. 20 0.18 0.17 0.22 0.25 0.15 Intrinsic viscosity of the hardenable composition # mPa-s 4.7 3.3 3.2 5.4 5.3 3.7 5.0 4.0 2.5 Leveling resistance RL 0. 027 0.016 0. 026 0.043 0.031 0.018 0.053 0.060 0. 008 Downflow resistance value RS 0.15 0.10 0.13 0. 22 0.17 0.11 0. 24 0.24 0. 06 Evaluation results Highly uniformity Height distribution (1〇2) 0. 76 0. 60 0.81 0. 77 0.76 0. 63 1.50 1.60 1.65 Evaluation 〇〇〇〇〇〇XXX Lower flow 〇 Δ △ 〇〇Δ 〇〇Δ Total deformation Η[maximum](/zm) 1.50 1.45 1.45 1.62 1.51 1.60 1.50 1.45 1.44 Final displacement ΗΪ final ί (// m) 0.65 0. 65 0. 60 0. 75 0. 65 0.80 0. 85 0.59 0. 58 Recovery rate (8) 84 84 85 81 84 80 79 85 86 Elastic recovery rate (%) 57 55 59 53 57 50 43 59 60 Here, in Table 2, component (B) Starting agent), (C) component (polymerizable monomer), (D) component (solvent), and (G) component (surfactant) are as follows . (B) Photopolymerization initiator: "Irgacure 907" (C) Dipentaerythritol hexaacrylate manufactured by Ciba Specialty Chemicals Co., Ltd.: "KAYARAD DPHA" manufactured by Nippon Kayaku Co., Ltd. (viscosity 5500 to 8000 mPa) .sec, 25°C) (C2) pentaerythritol triacrylate 1,6-hexamethylene diisocyanate urethane prepolymer: manufactured by Kyoeisha Chemical Co., Ltd. 312XP / invention manual (supplement) / 96-09/96125023 84 200811599 "1^-30611" (viscosity 10000~40000 11^&.36., 25°(:) (D1) propylene glycol monoterpene ether acetate (viscosity 1 · 1 mPa· sec, 25°C) (D2) 3-methoxybutanol (viscosity 2·9 mPa-sec, 25°C) (G) Surfactant: MEGAFACE F475 manufactured by Dainippon Ink Chemical Industry Co., Ltd. According to the results of Table 2, It is understood that an ethylenically unsaturated compound (A1) to (A4) (component (A)), a photopolymerization initiator (component (B)), a polymerizable monomer (component (C)), and a solvent ((D) are used. In the curable composition prepared by the component) and the surfactant (component (g)), the leveling resistance value (RL) is at 〇·〇1~〇.〇 In the range of 5' and the downflow resistance value (RS) is 〇·1 or more (Examples 1 to 6), the uniformity of the southness of the die coating is good, the leveling property is excellent, and the downflow characteristics are good. When the leveling resistance value (RL) exceeds 〇·〇5 (Comparative Examples 1, 2) or the case where 〇·01 is not satisfied (Comparative Example 3), the height uniformity of the mold coating is poor, and the leveling property is impaired. BRIEF DESCRIPTION OF THE DRAWINGS ^ Figure uw shows a plan view of a shim for evaluation test, and Fig. = a perspective view of a coated state of a slit die to which the shim is attached. FIG. 3 is a view showing the position of the longitudinal section when the spacer case is viewed from above, and FIG. 3 is a schematic view showing the rim of the spacer. The schematic diagram of the line. Negative t de-loading test Fig. 6 is a schematic view showing a layered structure of a liquid crystal display device (panel). Fig. 6 is a schematic view showing a layered structure of a liquid crystal display device (panel). A schematic diagram of an example. [Description of main component symbols] 1 la 2 2a Shrug protrusions Slit die spit π 31 glass substrate 21 4 color photoresist 5 stripe unevenness 11 spacer pattern 12 spacer pattern middle axis 13 longitudinal section position 14 profile of longitudinal section of spacer pattern 15 height from substrate surface to highest position 16 self-substrate Height to face to the highest position 17 Diameter of the circle of the upper profile AA' 20 Color filter 22 Black matrix 23 Pixel colored layer 24 Protective layer 25, 34 Transparent electrode 26, 35 Alignment film 27, 37 Liquid crystal alignment control protrusion 312XP/Invention Manual (Supplement)/96-09/96125023 86 200811599 28 Spacer 29 Liquid Crystal 30 Thin Film Transistor Substrate 32 Thin Film Transistor 33 Insulation Film 40 Liquid Crystal Element 312XP/Invention Manual (Supplement)/96-09 /96125023 87

Claims (1)

200811599 十、申請專利範園·· 1· 一種硬化性組成物,其特徵在於··滿足下述(a)及(b), (a)使用塗佈液之黏度(#)以及固形分濃度(c)而以下 述式(1)表示之調平阻力值(RL)處於〇· 〇1〜〇· 05之範圍, ; RL = // xC3 (1) • (式(1)中,RL係調平阻力值,#係塗佈液之黏度(單 位:mPa.s),C係固形分濃度(單位:kg/kg)), r (b)以下述式(2)表示之下流阻力值(RS)為〇·丨以上, β xc2 (2) (式(2)中,RS係下流阻力值,#係塗佈液之黏度(單 位·· mPa.s),C係固形分濃度(單位·· kg/kg))。 2·如申明專利範圍第1項之硬化性組成物,其可用於模 塗方式之塗佈。 、 3·如申請專利範圍第丨或2項之硬化性組成物,其可用 於形成彩色濾光片。 〃 之 4· 一種硬化物,其特徵在於··使申請專利範圍第1項 硬化性組成物硬化而成。 、 範圍第 5 ·種彩色濾光片,其特徵在於:含有申請專利 項之硬化物。 第置,其特徵在於:具備申請專利範圍 312XP/發明說明書(補件)/96-〇9/96125023200811599 X. Patent application Fan Park·· 1· A curable composition characterized in that it satisfies the following (a) and (b), (a) the viscosity (#) of the coating liquid and the solid concentration ( c) The leveling resistance value (RL) expressed by the following formula (1) is in the range of 〇· 〇1 to 〇· 05; RL = // xC3 (1) • (in the formula (1), the RL system is adjusted The flat resistance value, the viscosity of the coating liquid (unit: mPa.s), the solid concentration of the C system (unit: kg/kg), and r (b) the lower flow resistance value (RS) expressed by the following formula (2) ) is 〇·丨 or more, β xc2 (2) (in equation (2), RS system downflow resistance value, #system coating liquid viscosity (unit··mPa.s), C system solid concentration (unit·· Kg/kg)). 2. A sclerosing composition according to claim 1 of the patent scope, which can be used for coating in a molding manner. 3. A sclerosing composition as claimed in claim 2 or 2, which can be used to form a color filter. 〃 4· A cured product characterized in that the curable composition of the first application of the patent scope is cured. The fifth color filter is characterized in that it contains a cured product of the patent application. The first set is characterized by: the patent application scope 312XP / invention manual (supplement) / 96-〇 9/96125023
TW96125023A 2006-07-27 2007-07-10 Curable composition, cured object, color filter, and liquid-crystal display TW200811599A (en)

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