200816262 九、發明說明： 【發明所屬之技術領域】 是 - ΐ::係:種場發射面板對嶋之光學系统，尤其 考深产=鏡頭以對於陰陽極基板之不同聚焦參 赫。又4成取像及對位之場發射面板對位1合之光學系 【先前技術】 作出之顯示陶用場發射原理所製 源尖端之電子吸引出’在:豕將陰極奈米碳管電子發射 基板上之陽極之：壓場發射電子 之能=撞擊對應之速，電子不斷累積本身 且高陰、陽極板構成’因此對於大尺寸 密且重要，繼 顯示面板與電漿顯示面板者 示的晝面像素，在結構上的垂直門心二^ 件且顯 Μ率，故在結構製作上除了對位 發 強度結構之對抗因素之休、m 紙”、所形成之真空 後，面板之平紐料平均===陰_板於封裝 空作業以形成一直★亚且對緣封閉區域作用抽真 ’而由於陰、陽極基板為-種大 7 200816262 尺寸之扁平之薄形扁平面柄， 陽極板需抵抗外環境大氣壓致使變免抽真空後陰 陽極板間配置一絕緣材料夂7衣片，必須在陰、 (nb)，以維繫陰、陽極板間之=柱（¾咖）或阻隔壁 陽極板之導線導通。 >力，亚且用以避免陰、 在習知技術中該险、 在該陰、陽極板分別=對位壓合製作方式，係 在對位封合上會有許多;對位封合作業，因此， 須考量以避免傷及該陰、陽=板=:在對位過程中，必 螢光粉層與陰極板之電子 yU (，陽極板之 板上分佈有-定數量的支^寺），此外，較限於面 在對位過程中必須要極度的細心的阻隔’因此’ 對位陽極面板與支撐桂的摩擦觸碰，因此在 間㈡’以避免碰觸導致損壞。 才％疋 對位壓合:業，係透過在該陰、陽板上設置之 】用光學檢測系統以泉敕 =使對位參考點疊合達成陰陽極 有數個支撐學對位技術上’由於陰、陽板間具 極板間隙可的支撐器高度還至少要讓陰、陽 以上)，因此=上(支撐器之高度至少為"麵 大於l.lmm〖U板之對位參考點的垂直距離必須至少 。而光學技術而言’聚焦之光學距離深度 8 200816262 兩者參考點之景深距離較大，甚至大於L 1讓，而一般而言 對位用之光學鏡頭取像範圍有限均在數百微米以内聚焦範 圍精度較高，因此景深範圍亦精確度較高且範圍較窄，所 以難以同時利用一光學鏡頭同時對各該陰陽極板之不同聚 焦深度之對位參考點取相。 請參閱第一圖所示，係為習知場發射面板對位壓合之 光學系統之示意圖，如圖所示，在200816262 IX. Description of the invention: [Technical field to which the invention pertains] Yes - ΐ:: System: The optical system of the field emission panel facing the ,, especially the deep production = lens for different focus of the anode and cathode substrates. Another 40% of the image acquisition and alignment of the field emission panel is aligned with the optical system. [Prior Art] The electrons at the tip of the source of the field emission principle are displayed. The anode of the emitter substrate: the energy of the electrons emitted by the pressure field = the speed corresponding to the impact, the electrons accumulate themselves and the high cathode and the anode plate are formed 'so it is dense and important for large size, followed by the display panel and the plasma display panel. In the facet pixel, the vertical door center of the structure is two parts and the display rate is obvious. Therefore, in addition to the countermeasure against the positional strength structure, the m paper is formed in the structure, and the vacuum is formed. Average ===Yin_Plates in the package to work to form a constant ★ and the edge of the closed area acts as a true ', and because the anion and anode substrates are a large flat 7 flat face handle of 200816262 size, the anode plate needs Resist the external atmospheric pressure to make the insulation between the anode and cathode plates, and the insulation material 夂7 pieces must be in the shade, (nb), to maintain the between the anode and the anode plate (3⁄4 coffee) or the barrier anode plate. The wire is turned on. > force, sub-use to avoid yin, in the conventional technology, the risk, in the yin, anode plate = aligning the production method, there will be many in the aligning sealing; Therefore, it is necessary to consider to avoid hurting the yin and yang = plate =: in the process of alignment, the electron yU of the phosphor layer and the cathode plate (the anode plate is distributed with a certain number of branches) In addition, it is more limited to the surface in the alignment process must be extremely careful to block 'so that' the contact anode panel and the support of the friction of the touch, so in the second (two) 'to avoid contact and lead to damage. Position pressing: industry, through the use of optical detection system on the yin and yang board to use the spring detection system = the alignment of the reference point to achieve the anode and cathode have several support learning technology on the 'because of the yin and yang The height of the support with the plate gap can be at least above the yin and yang, so = above (the height of the support is at least " the surface is larger than l.lmm. The vertical distance of the reference point of the U plate must be at least In terms of optical technology, 'focusing optical distance depth 8 200816262 The depth of field is relatively large, even larger than L 1 , and in general, the range of the optical lens used for alignment is limited within a few hundred micrometers, and the accuracy of the focus range is high, so the depth of field range is also accurate and narrow. Therefore, it is difficult to simultaneously use an optical lens to simultaneously phase the alignment reference points of different depths of focus of the anode and cathode plates. Referring to the first figure, it is a schematic diagram of a conventional field emission panel alignment press optical system. As shown, in
台1 a及第二移動平台2 a上，分別設置有陽極基板工〇 〇 a及陰極基板2 0 0 a，陽極、陰極基板丄〇 〇 a、2 〇 0 a係衫m有陽極參考點i i Q a及陰極參考點2丄 〇 a，第一及第二移動平台1 a、2 a係開設有一對應於 陽極參考點1 1。:之第—穿透孔1 〇 a及-對應於陰極 麥考點2 1 0 a之弟二穿透孔2 〇 a。 板對位壓合之光學系統係包括有: 第-光“a ^ 1 3謂應於第—穿透孔1 0 3之 先子鏡頭3 a，—設置於第二移動半么〇 第二穿透巩9 n a , 私動千台2 a且對應於 牙处孔2 0 a之弗二光學鏡頭4 a， 鏡頭3 a、4a係分別電性連接 $及弟二光學 二影像轉換單元5a係電性單元“’該 翏考對位單元6 a係電像“立早兀6 a ’ 像叠合單元7a係 於妾、:“象®合單元7a，影 , 逑知:衣一監視器8 a。 水=，透過第—移動平台^ 水千移動以對位陽極基 矛夕動平台2 a的 基板2〇〇a之陰 1 〇a 亏^103，當陽極參考 9 200816262 點1 1 0 a及陰極參考點2 1 〇 a於對位過 所產生之光學訊號可分別傳至第一光焦 學鏡頭4a，第-及第二光學鏡頭3 3、4以分 學‘唬傳至影像轉換單兀以轉換電子訊號、再透、尚= 位單，及影像疊合單元7 a以將電子訊號 位及豐合作業，並且將對位疊合之影像顯示於—哭只 a上，以達成模擬陰極、陽極基板1C)〇a、 σσ 光學對位效果， ' υ 〇 a之 據此，習知技術場發射面板對位壓合之光與/ ☆八 陽極之參考點進行對位取相時，光學系統可使二 之光學鏡頭，以分別取得該對位參考點影像，再_二組 考單兀及影像疊合技術，以達成模擬險苓 位效果； 陰M查板之光學對 然而，此習知之缺點為：在陰極、陽極參考點於 過程中，其聚焦對位時所產生之光學訊號係分別利用至少 1且利㈣影像轉換單元、參考對位單元及 早7"以將該二光學訊號轉成電子訊號並予以對位 ’因此’該參考對位單元的相對關係及精準度係極 為重要·，並且使用者必須經常性地校正參酌該參寺對位單 兀之相對m錢精準度，以確保能夠得取確之對位效果。 ，外丄另—習知技術係僅利用單一光學鏡頭内結合— 可餐焦之光學鏡頭對位 . 於其中之陰極輸其卿鏡頭聚焦 次％極基板之對位麥考點，並且水 移動平台料#鏡伽使對位參相可與光學鏡頭中心^ 10 200816262 - 生重豐效果，並且將該光學機構與面板機構固定，之後再 - 以該光學鏡頭重新取相而聚焦於另一基板之光學對位參考 點，此時另機構平移對位於該光學鏡頭中心。如此，即完 成該陰、陽極板之對位動作。 然而，對上述習知之作法，必須對參考對位單元必須 有極高的信賴性，同時，此光學對位系統的作業過程亦較 為繁複困難，因此，習知光學系統之操作技術是必須依賴 # ㈣者的高度操作技術與繁鎖的精密光學對位，使得習知 對位壓合技*a法有效且長期處在―較佳的壓合對位狀 態。 緣是，本發明人有感上述缺失之可改善，且依據多年 來從事此方面之相關經驗，悉心觀察且研究之，並配合學 理之運用，而提出-種設計合理且有效改善上述缺失之本 發明。 【發明内容】 <本發明之目的係在於提供—種場發射面板職壓合之 光學糸統。其洲共用於單—光學鏡筒之複數個光學鏡 頭’以達成可對於不同聚焦深度之對位面板的參考點，以 達成取像及對位之參考。 本舍月之另目的係在提供一種場發射面板對位壓合 之光子系、、4。其！^過在同„組對位參考點之複數光學鏡 頭，以共用於-同滅學影像，以使各該光學鏡頭之光學 取相共中心’以取得—相同之影像範圍，並結合影像疊合 11 200816262 處理系統技術，以使各光學鏡頭所取得之光學影像得以共 同輸入於同一顯示器内，以進行對位而達成定位之目的。 為了達成上述之目的，本發明係提供一種場發射面板 對位壓合之光學系統，係用於光學對位於陰極、陽極基板 之參考點，該陰極、陽極基板分別設置於相對應之第一及 第二平台上，該光學系統包括有：一光學鏡筒、——鏡頭單 元、一影像轉換單元，以及一影像處理及顯示單元。其中 該光學鏡筒係設置於第一平台上，該光學鏡筒具有一入口 端、一第一出口端、一第二出口端及一反射式半透鏡，該 入口端係對應於該陽極基板之參考點，該反射式半透鏡係 設置於該光學鏡筒内以分別對應該入口端、第一出口端及 第二出口端；該鏡頭單元係具有至少二分別對應於第一及 第二出口端之光學鏡頭；該影像轉換單元係連接於該鏡頭 單元，用以將該光學訊號轉換成一電子訊號；該影像處理 及顯示單元電性連接於該影像轉換單元，以將該電子訊號 產生並且呈現於同一晝面。 藉此，藉由該第一平台相對該第二平台水平移動，以 對位該陰極、陽極基板之參考點而分別產生二光學訊號， 藉由該入口端以將該二光學訊號傳至該反射式半透鏡，藉 由該反射式半透鏡以將該光學訊號分別地傳送到該第一出 口端及第二出口端之光學鏡頭，藉由該影像轉換單元以將 該光學訊號轉換成該電子訊號，藉由該影像處理及顯示單 元以將該電子訊號產生並且呈現於同一晝面，以達成光學 對位。 12 200816262 再者，使對於同一組對位參考點上，各面板之聚焦對 位參考點之該等光學鏡頭可透過該光學鏡筒，以取得同範 圍之共用中心及面積之取相範圍，達成對於不同聚焦深度 之對位面板的參考點，以達成取像及對位參考。 為了能更進一步瞭解本發明為達成預定目的所採取之 技術、手段及功效，請參閱以下有關本發明之詳細說明與 附圖，相信本發明之目的、特徵與特點，當可由此得一深 入且具體之瞭解，然而所附圖式僅提供參考與說明用，並 非用來對本發明加以限制者。 【實施方式】 請參閱第二圖所示，係為本發明場發射面板對位壓合 之光學系統之示意圖，由圖中可知，本發明係用以光學對 位於陽極基板1 0 0及陰極基板2 0 0之陽極參考點1 1 0與陰極參考點2 1 0，藉此，使陽極、陰極基板1 0 0、 2◦0達到對位效果，該光學系統包括有：一光學鏡筒1、 一鏡頭單元2、一影像轉換單元3以及一影像處理及顯示 單元4。 於本實施例中，陽、陰極基板1 0 0、2 0 0係分別 設置於第一平台5底面及相對應之第二平台6頂面上，其 中第一平台5及第二平台6係為活動式平台及固定式平台 (或者，第一平台5及第二平台6為固定式平台及活動式 平台；或者，第一平台5及第二平台皆為活動式平台），第 一平台5具有一對應於陽極參考點1 1 0之透孔5 1。 13 200816262 在本實施树中，光學鏡筒l·及鏡頭單元2係連結且固 定地設置於第一平台5頂面上，光學鏡筒1具有一對應於 透孔5 1之入口端10、一第一出口端1 1、一第二出口 端1 2及一反射式半透鏡1 3，入口端1 〇係透過透孔5 1以對應於1%極基板1 0 0之陽極參考點1 1 〇，反射式 半透鏡1 3係設置於光學鏡筒1内之歧路處2 4以分別對 應於入口端1〇、第一出口端及第二出口端12，反 射式半透鏡1 3係可接收陽極、陰極參考點丄1 〇、2 1 〇在聚焦對位時所產生的光學訊號，並且使光學訊號可分 別發射至第一出口端1丄及第二出口端工2。 ^鏡頭單元2係具有至少二光學鏡頭，在本實施例中， 該二光學鏡頭係為二分別設置於第一出口端丄丄之第一 :鏡頭21及設置於第二出口端12之第二光學鏡頭2 ，以分別地接收陽極參考點丄i 〇及陰極參考點2丄 所產生之光學訊號，第—及第二光學鏡頭2丨、2八 專換單元3,影像轉換單元3係可將第： =二光'"鏡頭2 1、2 2接㈣光學訊號㈣為電子訊 影像轉換單元3錢接於影像處理錢 ==rr_電子訊號產生共同‘ 疊合單元4 1*—像處理及顯示單元4具有1 2,影像#合單元4 ^影像疊合單元41之顯示累 子訊號作影像疊合2 =將影像轉換單元3_ t理作業，亚且於顯示器42内顯方 14 200816262 對位影像。 ·On the stage 1 a and the second moving platform 2 a, an anode substrate process a and a cathode substrate 2 0 0 a are respectively provided, and the anode and cathode substrates 丄〇〇a, 2 〇0 a shirt m have an anode reference point ii Q a and the cathode reference point 2 丄〇 a, the first and second mobile platforms 1 a, 2 a are provided with a corresponding reference point 11 to the anode. : the first - the penetration hole 1 〇 a and - corresponds to the cathode Mai test point 2 1 0 a brother two penetration holes 2 〇 a. The optical system of the plate alignment press includes: a first light "a ^ 1 3 is said to be the first through hole 1 3 3 of the first sub-lens 3 a, - set in the second moving half? Through the 9 nm, the private movement is 2 a and corresponds to the tooth hole 2 0 a of the two optical lens 4 a, the lens 3 a, 4a are respectively electrically connected $ and the second optical 2 image conversion unit 5a The unit "" refers to the alignment unit 6 a series of electric images "立早兀 6 a ' like the superimposing unit 7a is tied to 妾,: "象® unit 7a, shadow, know: clothing one monitor 8 a . Water =, through the first - mobile platform ^ water thousand moves to align the anode based on the base plate 2 a of the substrate 2 〇〇 a negative 1 〇 a loss ^ 103, when the anode reference 9 200816262 point 1 1 0 a and cathode The optical signals generated by the reference point 2 1 〇a in the opposite position can be respectively transmitted to the first optical lens 4a, and the first and second optical lenses 3 3 and 4 are divided into the image conversion unit to Converting the electronic signal, re-transmission, still = the order, and the image superimposing unit 7 a to display the electronic signal and the cooperation, and display the image of the overlapping image on the crying a to achieve the analog cathode, Anode substrate 1C) 〇a, σσ optical alignment effect, ' υ 之 a according to this, the conventional technology field emission panel alignment press light and / ☆ eight anode reference point phase alignment phase, optical system The optical lens of the second can be used to obtain the image of the alignment reference point, the second group of test sheets and the image overlay technology to achieve the effect of simulating the dangerous position; the optical of the negative M check board, however, this conventional knowledge The disadvantage is: the optics generated when the cathode and anode reference points are in the process of focusing the alignment The system uses at least 1 and the (4) image conversion unit and the reference alignment unit and 7" to convert the two optical signals into electronic signals and align them. Therefore, the relative relationship and accuracy of the reference alignment unit are extremely Important, and the user must constantly correct the relative m-money accuracy of the parade in the Sensi to ensure that the correct alignment effect can be obtained. The other is that the traditional technology is only combined with a single optical lens - the optical lens of the meal can be aligned. In the cathode, the cathode lens is focused on the counterpoint of the sub-base plate, and the water moving platform material #镜伽使对相相相 with optical lens center ^ 10 200816262 - The effect of the heavy weight, and the optical mechanism is fixed with the panel mechanism, and then - the optical lens re-phased to focus on the optical of the other substrate The alignment reference point, at which point the other mechanism translation pair is located at the center of the optical lens. In this way, the alignment of the anode and cathode plates is completed. However, the above-mentioned conventional practice must have extremely high reliability for the reference alignment unit. At the same time, the operation process of the optical alignment system is complicated and complicated. Therefore, the operation technology of the conventional optical system must be dependent on # (4) The high-level operation technology and the complicated optic alignment of the lock make the conventional alignment press-fit technique effective and long-term in the "preferred press-fit" state. The reason is that the inventor has felt that the above-mentioned deficiency can be improved, and based on the relevant experience in this field for many years, carefully observed and studied, and in conjunction with the application of the theory, it is proposed that the design is reasonable and effectively improves the above-mentioned deficiency. invention. SUMMARY OF THE INVENTION The object of the present invention is to provide an optical system for a field emission panel. It is used in a plurality of optical lenses of a single-optical lens barrel to achieve reference points for alignment panels of different depths of focus to achieve reference for imaging and alignment. Another purpose of this month is to provide a photon system in which the field emission panel is aligned, 4 . its! ^Multiple optical lenses that are in the same group as the reference point of the pair, for common use in the same image, so that the optical phases of the optical lenses are taken together to obtain the same image range, combined with image overlay 11 200816262 Processing system technology to enable optical images acquired by optical lenses to be commonly input into the same display for alignment to achieve positioning. To achieve the above object, the present invention provides a field emission panel alignment The optic system is used for optically opposing the reference points of the cathode and the anode substrate, and the cathode and anode substrates are respectively disposed on the corresponding first and second platforms, and the optical system comprises: an optical tube, a lens unit, an image conversion unit, and an image processing and display unit, wherein the optical lens barrel is disposed on the first platform, the optical lens barrel has an inlet end, a first outlet end, and a second outlet And a reflective half lens corresponding to a reference point of the anode substrate, the reflective half lens being disposed in the optical lens barrel The lens unit has at least two optical lenses respectively corresponding to the first and second outlet ends; the image conversion unit is connected to the lens unit, and is used for the entrance end, the first outlet end and the second outlet end; Converting the optical signal into an electronic signal; the image processing and display unit is electrically connected to the image conversion unit to generate and present the electronic signal on the same side. Thereby, the first platform is opposite to the second The platform moves horizontally to respectively generate a second optical signal by aligning the reference points of the cathode and the anode substrate, and the second optical signal is transmitted to the reflective half lens by the inlet end, and the reflective half lens is used to The optical signals are respectively transmitted to the optical lens of the first outlet end and the second outlet end, and the image conversion unit converts the optical signal into the electronic signal, and the image processing and display unit is used to The signals are generated and presented on the same side to achieve optical alignment. 12 200816262 Again, to focus on the panels for the same set of reference points The optical lens of the reference point can pass through the optical lens barrel to obtain a phase range of the common center and the area of the same range, and achieve a reference point of the alignment panel for different depths of focus to achieve the image capturing and alignment reference. In order to further understand the techniques, means, and effects of the present invention in order to achieve the intended purpose, refer to the following detailed description of the invention and the accompanying drawings. The drawings are only for the purpose of illustration and description, and are not intended to limit the invention. [Embodiment] Please refer to the second figure, which is the alignment of the field emission panel of the present invention. The schematic diagram of the optical system, as shown in the figure, is used to optically locate the anode reference point 1 1 0 and the cathode reference point 2 1 0 of the anode substrate 100 and the cathode substrate 200, thereby making the anode, The cathode substrate 1 0 0, 2◦0 achieves the alignment effect, and the optical system comprises: an optical lens barrel 1, a lens unit 2, an image conversion unit 3, and an image processing and display Unit 4. In this embodiment, the anode and cathode substrates 100 and 200 are respectively disposed on the bottom surface of the first platform 5 and the corresponding top surface of the second platform 6, wherein the first platform 5 and the second platform 6 are The movable platform and the fixed platform (or the first platform 5 and the second platform 6 are fixed platforms and movable platforms; or, the first platform 5 and the second platform are both movable platforms), and the first platform 5 has A through hole 5 1 corresponding to the anode reference point 110. 13 200816262 In the present embodiment, the optical lens barrel 1 and the lens unit 2 are connected and fixedly disposed on the top surface of the first platform 5, and the optical lens barrel 1 has an inlet end 10 corresponding to the through hole 51. The first outlet end 1 1 , a second outlet end 1 2 and a reflective half lens 13 , the inlet end 1 is transmitted through the through hole 5 1 to correspond to the anode reference point 1 1 of the 1% pole substrate 1 0 〇 The reflective half lens 13 is disposed at the intersection 24 of the optical lens barrel 1 to correspond to the inlet end 1〇, the first outlet end and the second outlet end 12, respectively, and the reflective half lens 13 is capable of receiving the anode. The cathode reference point 丄1 〇, 2 1 〇 optical signal generated when the alignment is focused, and the optical signal can be respectively transmitted to the first outlet end 1 丄 and the second outlet end 2 . The lens unit 2 has at least two optical lenses. In this embodiment, the two optical lenses are respectively disposed at the first end of the first outlet end: the lens 21 and the second end disposed at the second outlet end 12 The optical lens 2 is configured to respectively receive the optical signals generated by the anode reference point 丄i 〇 and the cathode reference point 2丄, the first and second optical lenses 2丨, 28, the replacement unit 3, and the image conversion unit 3 No.: = 二光'"Lens 2 1、2 2 (4) Optical signal (4) is the electronic image conversion unit 3 money is connected to the image processing money == rr_ electronic signal generates a common 'lamination unit 4 1*—image processing And the display unit 4 has 12, the image #合合 unit 4, the image superimposing unit 41 displays the tired sub-signal for image superimposition 2 = the image conversion unit 3_t operates, and the display 42 shows the display 14 200816262 Bit image. ·
藉此，在陽極、陰極基板1 0 0、2 0 0對位過程中， 第一及第二光學鏡頭2 1、2 2經過校正後，可連同光學 鏡筒1-體地固定在第—平台5上作為調整位置之參考， 同時將陽極基板！ 〇 〇之陽極參考點丄工◦對庫於光學 ^1之入口端1 0 ’進而使陽極參考點1 1 0對應於反射 式半透鏡1 3，制第-平台5於水平方向相對第二平台 6水平移動，以帶觸極基板丄QQ及光學鏡筒丄水平： 藉以使陽極參考點i ! ◦能移動以聚焦對位於 考點2 1 〇。 " 當陽極參考點11〇於聚焦而對位於陰極來考點2工 0時’陽極、陰極參考點11〇、210可分別發射陽、 陰極之光學訊號至對應的光學鏡筒丄之入口端丄〇，並且 該二光學訊號可透過人口端i◦以傳至反射式半透鏡1 3 ’利用反射式半透鏡工3之半透光特性，使得陽極及陰 極光學訊號分別地發射至第―出口端“及第二出口 ^ 2—，利用該設置於第-出口端i丄之第—光學鏡頭』丄而及 弟二出口端1 2之第二光學鏡頭2 2，以分別 及陰極光學訊號。 」^%極 利用連接於第-及第二光學鏡頭21、22之影像轉 換早兀3 ’使得光學訊號可轉換成該電子訊號，利用該: 像處理及顯示單元4以將電子訊號產生並且呈現於同= 面，以達成光學對位。 、 旦 其中反射式半透鏡1 3係有角度地設置於光學鏡筒工 15 200816262 之歧路處1 4 (在本實施例中，該反射式半透鏡1 3係呈 45度角·當然亦可為其他角度），利用反射式半透鏡1 3之 光學特性且配合反射式半透鏡13於歧路處14擺設角度 之設置以將陰陽極訊光學發射至對應之第一及第二出口端 1 1、1 2，第一及第二光學鏡頭2 1、2 2皆為一可調 式光學鏡頭，藉此調整而對位於陽極、陰極參考點1 1 0、 2 1 0所形成之聚焦影像中心，以變化陽極、陰極參考點 1 1 0、2 1 0之取相範圍之大小，影像轉換單元3係具 有二分別連接於第一及第二光學鏡頭2 1、2 2之影像轉 換裝置。 據此，本發明係利用將複數光學鏡頭經校正後以對應 地設置於光學鏡筒之複數端口，並且將光學鏡筒固定於水 平移動之第一平台上，利用第一平台作為調整之對位位置 參考且將陽極基板之參考點放置在對應光學鏡頭之取相範 圍内，並利用真空吸附的方式，將陽極基板設置於在第一 平台，而透過移動第一平台以及影像疊合單元之處理作 業，使得第二平台上之陰極基板之參考點顯示於顯示器之 工作範圍内，透過調整該等光學鏡頭以焦距於陰極、陽極 參考點，使得該疊合影像更加地清楚，以達成陽極、陰極 基板之光學對位。 此外，本發明之該等光學鏡頭係藉由設置於光學鏡 筒，進而固定於第一平台上，因此，使用者在操作過程時， 該等光學鏡頭係與陽極基板連結以產生位移，故不須要額 外設置另一參考點，但同時又可以利用該第二平台以平移 16 200816262 或旋轉陰極基板，除了可有效達成對位作業外，亦可使對 位作業過程較為簡化。 綜合以上所述，本發明係將複數光學鏡頭對應地設置 於光學鏡筒之複數端口上，並且利用光學鏡筒内之反射式 半透鏡，使得本發明具有下列優點： 1、 利用形成具有共光軸之複數光學鏡頭，以對於不 同聚焦深度之陰極、陽極參考點，達到取像及對位之參考。 2、 對於共同用於對位陰極、陽極參考點之複數光學 鏡頭，透過對應於光學鏡筒之複數端口，而可取得單一同 軸光學影像，使得各光學鏡頭可取得相同之共用影像，並 且使得取用影像範圍較為寬廣。 3、 將光學鏡頭所取得之光學影像訊號，透過影像疊 合單元之處理作業，使得各光學鏡頭所取得之光學影像可 共同輸入於同一顯示器内，以進行對位，達到陰極、陽極 基板之對位效果。 惟，以上所述，僅為本發明最佳之一的具體實施例之 詳細說明與圖式，惟本發明之特徵並不偈限於此，並非用 以限制本發明，本發明之所有範圍應以下述之申請專利範 圍為準，凡合於本發明申請專利範圍之精神與其類似變化 之實施例，皆應包含於本發明之範疇中，任何熟悉該項技 藝者在本發明之領域内，可輕易思及之變化或修飾皆可涵 蓋在以下本案之專利範圍。 【圖式簡單說明】 17 200816262 第一圖係為習知場發射面板對位壓合之光學系統之示意 圖。 第二圖係為、本發明場發射面板對位壓合之光學系統之示意 圖。 【主要元件符號說明】 [習知] 1%極基板 1 0 0 3 陽極參考點 ll〇a 陰極基板 200a 陰極參考點 210a 第一移動平台 la 第一穿透孔 .10a 第二移動平台 2a 第二穿透孔 20a _ 第一光學鏡頭 3a 第二光學鏡頭 4a 影像轉換單元 5a 參考對位單元 6 a 影像疊合單元 7 a • 監視器 8a [本創作] 陽極基板 100 18 200816262Thereby, during the alignment of the anode and cathode substrates 100 and 2000, the first and second optical lenses 2 1 and 2 2 are corrected, and can be fixed to the first platform together with the optical lens barrel 1 5 as a reference for adjusting the position, and the anode substrate at the same time! The anode reference point is ◦ ◦ 库 库 于 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学 光学6 horizontal movement, with the contact substrate 丄QQ and optical tube 丄 level: so that the anode reference point i ! ◦ can move to focus on the test point 2 1 〇. " When the anode reference point 11 is focused on the cathode and the cathode is located at the test point 2, the anode and cathode reference points 11〇, 210 can respectively emit the optical signals of the anode and the cathode to the entrance end of the corresponding optical lens barrel. 〇, and the two optical signals are transmitted through the population terminal to the reflective half lens 13 3 'using the semi-transmissive characteristic of the reflective half lens 3, so that the anode and cathode optical signals are respectively transmitted to the first-outlet end "And the second exit ^ 2 -, using the first optical lens disposed at the first end of the first end - and the second optical lens 2 of the second end of the second end of the second optical lens 2 2, respectively, and the cathode optical signal." The ^% pole uses the image conversion connected to the first and second optical lenses 21, 22 to convert the optical signal into the electronic signal, and the image processing and display unit 4 is used to generate and present the electronic signal. Same as = face to achieve optical alignment. The reflecting half-lens 13 is angularly disposed at the intersection of the optical lens 15 15 16 16262 (in the present embodiment, the reflective half lens 13 is at a 45 degree angle. Of course, Other angles), using the optical characteristics of the reflective half lens 13 and the arrangement of the angle of the reflective half lens 13 at the intersection 14 to optically transmit the cathode and cathode signals to the corresponding first and second outlet ends 1 1 and 1 2. The first and second optical lenses 2 and 2 are both adjustable optical lenses, thereby adjusting the center of the focused image formed by the anode and cathode reference points 1 1 0 and 2 1 0 to change the anode. The image conversion unit 3 has two image conversion devices respectively connected to the first and second optical lenses 2 1 and 2 2 , and the phase of the phase range of the cathode reference points 1 1 0 and 2 1 0 . Accordingly, the present invention utilizes a plurality of optical lenses that have been calibrated to be correspondingly disposed at a plurality of ports of the optical lens barrel, and the optical lens barrel is fixed to the first platform that is horizontally moved, and the first platform is used as the alignment of the adjustment. Positioning and placing the reference point of the anode substrate in the phase range of the corresponding optical lens, and vacuum-adsorbing the anode substrate on the first platform, and moving through the first platform and the image superimposing unit The operation is such that the reference point of the cathode substrate on the second platform is displayed in the working range of the display, and the focal length is more clearly defined by adjusting the optical lens to focus on the cathode and the anode reference point to achieve the anode and the cathode. Optical alignment of the substrate. In addition, the optical lens of the present invention is fixed on the first stage by being disposed on the optical lens barrel. Therefore, when the user operates, the optical lens is coupled to the anode substrate to generate displacement, so It is necessary to additionally set another reference point, but at the same time, the second platform can be used to translate 16 200816262 or rotate the cathode substrate, in addition to effectively achieving the alignment work, the alignment operation can be simplified. In summary, the present invention provides a plurality of optical lenses correspondingly disposed on a plurality of ports of the optical lens barrel, and utilizes a reflective half lens in the optical lens barrel, so that the present invention has the following advantages: 1. Using a common light to form Axial complex optical lens for reference to the image and alignment of the cathode and anode reference points for different depths of focus. 2. For a plurality of optical lenses commonly used for the reference cathode and anode reference points, a single coaxial optical image can be obtained through the plurality of ports corresponding to the optical lens barrel, so that the optical lenses can obtain the same common image and make the same The range of images used is relatively wide. 3. The optical image signals obtained by the optical lens are processed by the image superimposing unit, so that the optical images obtained by the optical lenses can be input into the same display to perform alignment, and the cathode and anode substrates are matched. Bit effect. However, the above description is only a detailed description of the preferred embodiments of the present invention, and the present invention is not limited thereto, and is not intended to limit the present invention. The scope of the patent application is subject to the scope of the present invention, and any one skilled in the art can easily include it in the field of the present invention. Any changes or modifications considered may be covered by the patents in this case below. [Simple description of the diagram] 17 200816262 The first diagram is a schematic diagram of an optical system for aligning the field emission panel. The second figure is a schematic view of an optical system for aligning the field emission panel of the present invention. [Main component symbol description] [Practical] 1% pole substrate 1 0 0 3 anode reference point 11〇 cathode substrate 200a cathode reference point 210a first moving platform la first through hole. 10a second moving platform 2a second Penetration hole 20a_first optical lens 3a second optical lens 4a image conversion unit 5a reference alignment unit 6a image superimposing unit 7a • monitor 8a [this creation] anode substrate 100 18 200816262
陽極參考點 110 陰極基板 2 0 0 陰極參考點 2 10 光學鏡筒 1 入口端 10 第一出口端 11 反射式半透鏡 13 鏡頭單元 2 第一光學鏡頭. 2 1 第二光學鏡頭 2 2 影像轉換單元 3 影像處理與顯示單元4 影像疊合單元 4 1 顯示器 4 2 第一平台 5 透孔 5 1 第二平台 6 第二出口端 12 歧路處 14 19Anode reference point 110 cathode substrate 2 0 0 cathode reference point 2 10 optical tube 1 inlet end 10 first outlet end 11 reflective half lens 13 lens unit 2 first optical lens. 2 1 second optical lens 2 2 image conversion unit 3 Image processing and display unit 4 Image overlay unit 4 1 Display 4 2 First platform 5 Through hole 5 1 Second platform 6 Second exit end 12 Crossroads 14 19