[go: up one dir, main page]

TW200802887A - Liquid crystal display and method for fabricating the same - Google Patents

Liquid crystal display and method for fabricating the same

Info

Publication number
TW200802887A
TW200802887A TW095149352A TW95149352A TW200802887A TW 200802887 A TW200802887 A TW 200802887A TW 095149352 A TW095149352 A TW 095149352A TW 95149352 A TW95149352 A TW 95149352A TW 200802887 A TW200802887 A TW 200802887A
Authority
TW
Taiwan
Prior art keywords
pixel portion
region
forming
fabricating
liquid crystal
Prior art date
Application number
TW095149352A
Other languages
Chinese (zh)
Other versions
TWI332265B (en
Inventor
Young-Joo Kim
Seok-Woo Lee
Soo-Jeong Park
Original Assignee
Lg Philips Lcd Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Philips Lcd Co Ltd filed Critical Lg Philips Lcd Co Ltd
Publication of TW200802887A publication Critical patent/TW200802887A/en
Application granted granted Critical
Publication of TWI332265B publication Critical patent/TWI332265B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136213—Storage capacitors associated with the pixel electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/021—Manufacture or treatment of multiple TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/481—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs integrated with passive devices, e.g. auxiliary capacitors

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Geometry (AREA)
  • Power Engineering (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

A liquid crystal display and a method for fabricating the same are disclosed. The method for fabricating a liquid crystal display includes preparing an insulating substrate defining a TFT region of a pixel portion, forming an active layer on the substrate to cover the TFT region of the pixel region, forming a gate electrode of the pixel portion on the active layer, forming a source region of the pixel portion and a drain region of the pixel portion in the active layer at both sides of the gate electrode of the pixel portion, forming a passivation film having first and second contact holes on the substrate having the drain region of the pixel portion, the first and second contact holes respectively exposing the source region of the pixel portion and the drain region of the pixel portion, sequentially forming a transparent conductive film and a metal film on the passivation film, and selectively etching the metal film and the transparent conductive film to form a source electrode pattern of the pixel portion/a source electrode of the pixel portion, which are sequentially deposited to cover the first contact hole, and a drain electrode pattern of the pixel portion/a drain electrode of the pixel portion, which are sequentially deposited to cover the second contact hole.
TW095149352A 2006-06-30 2006-12-27 Liquid crystal display and method for fabricating the same TWI332265B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20060061669 2006-06-30
KR1020060124001A KR101338106B1 (en) 2006-06-30 2006-12-07 Liquid crystal display and method for fabricating the same

Publications (2)

Publication Number Publication Date
TW200802887A true TW200802887A (en) 2008-01-01
TWI332265B TWI332265B (en) 2010-10-21

Family

ID=39011287

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095149352A TWI332265B (en) 2006-06-30 2006-12-27 Liquid crystal display and method for fabricating the same

Country Status (3)

Country Link
KR (1) KR101338106B1 (en)
CN (1) CN100592180C (en)
TW (1) TWI332265B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI508269B (en) * 2013-06-20 2015-11-11 Au Optronics Corp Pixel structure

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100580938C (en) * 2008-03-25 2010-01-13 友达光电股份有限公司 Active element array substrate and liquid crystal display panel
CN101556415B (en) * 2008-04-10 2011-05-11 北京京东方光电科技有限公司 Pixel structure and preparation method thereof
KR102145279B1 (en) * 2013-12-31 2020-08-19 엘지디스플레이 주식회사 Thin Film Transistor Array Substrate and Method of manufacturing the same
CN103972242B (en) * 2014-04-22 2016-12-28 京东方科技集团股份有限公司 A kind of manufacture method of array base palte, display device and array base palte
KR102596210B1 (en) 2018-05-25 2023-10-30 엘지디스플레이 주식회사 TFT substrate and display device including the same
CN108878540A (en) * 2018-07-12 2018-11-23 南方科技大学 Bottom gate thin film transistor and preparation method thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002094064A (en) * 2000-09-11 2002-03-29 Matsushita Electric Ind Co Ltd Thin film transistor, method of manufacturing thin film transistor, liquid crystal display device, and electroluminescence display device
US7601994B2 (en) * 2003-11-14 2009-10-13 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same
KR20050067308A (en) * 2003-12-27 2005-07-01 엘지.필립스 엘시디 주식회사 Method for fabricating liquid crystal display panel improving process of making wires

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI508269B (en) * 2013-06-20 2015-11-11 Au Optronics Corp Pixel structure

Also Published As

Publication number Publication date
KR101338106B1 (en) 2013-12-06
TWI332265B (en) 2010-10-21
KR20080003180A (en) 2008-01-07
CN101097367A (en) 2008-01-02
CN100592180C (en) 2010-02-24

Similar Documents

Publication Publication Date Title
TW200744215A (en) Thin film transistor array substrate and method for fabricating the same
TW200725911A (en) Fabricating method for thin film transistor array substrate and thin film transistor array substrate using the same
TW200943421A (en) Method for manufacturing semiconductor device
FR2923622B1 (en) LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME
TW200703660A (en) TFT array panel, liquid crystal display including same, and method of manufacturing TFT array panel
GB2444379B (en) Array substrate for liquid crystal display device and method of manufacturing the same
GB2439586B (en) Liquid crystal display device and fabricating method thereof
TW200743216A (en) Liquid crystal display fabrication method
EP1865371A3 (en) Liquid crystal display panel and method of manufacturing the same
JP6359650B2 (en) Array substrate, display device, and method of manufacturing array substrate
TW200608576A (en) Method for fabricating organic thin film transistor and method for fabricating liquid crystal display device using the same
TW200734780A (en) Display device and manufacturing method therefor
TW200641496A (en) Organic thin film transistor array panel and method of manufacturing the same
TW200419811A (en) Method of fabricating a thin film transistor array panel
TW200709426A (en) Liquid crystal display device capable of reducing leakage current, and fabrication method thereof
TW200743218A (en) Liquid crystal display device and method of fabricating the same
TW200727487A (en) Structure of thin film transistor array and method for making the same
TW200633584A (en) Array substrate, methods for forming the same, and electrolumiscent display panel, display device and electronic device using the same
TW200802887A (en) Liquid crystal display and method for fabricating the same
TW200622996A (en) Method of fabricating a pixel structure of a thin film transistor liquid crystal display
TW200708870A (en) Manufacturing method of liquid crystal display
TW200709425A (en) Etching tape and method of fabricating array substrate for liquid crystal display using the same
TW200735229A (en) Method for manufacturing thin film transistor display array with dual-layer metal
TW200717819A (en) Manufacturing liquid crystal display substrates
TW200733399A (en) Thin film transistor array panel and method of manufacturing thereof

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees