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TW200801831A - Exposure apparatus, exposure method, and exposure system - Google Patents

Exposure apparatus, exposure method, and exposure system

Info

Publication number
TW200801831A
TW200801831A TW96105788A TW96105788A TW200801831A TW 200801831 A TW200801831 A TW 200801831A TW 96105788 A TW96105788 A TW 96105788A TW 96105788 A TW96105788 A TW 96105788A TW 200801831 A TW200801831 A TW 200801831A
Authority
TW
Taiwan
Prior art keywords
exposure
liquid
exposure apparatus
oxygen
substrate
Prior art date
Application number
TW96105788A
Other languages
Chinese (zh)
Inventor
Keita Sakai
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of TW200801831A publication Critical patent/TW200801831A/en

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

An exposure apparatus has a projection optical system configured to project an image of a reticle pattern onto a reticle pattern onto a substrate, and exposed the substrate and the projection optical system. The exposure apparatus includes an oxygen removal unit configured to reduce dissolved oxygen in the liquid by bringing the liquid into contact with a gas other than oxygen, and a degassing unit configured to reduce a dissolved gas in the liquid.
TW96105788A 2006-02-15 2007-02-15 Exposure apparatus, exposure method, and exposure system TW200801831A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006037423 2006-02-15
JP2006353587 2006-12-28
JP2007026405A JP2008182167A (en) 2006-02-15 2007-02-06 Exposure apparatus, exposure method, and exposure system

Publications (1)

Publication Number Publication Date
TW200801831A true TW200801831A (en) 2008-01-01

Family

ID=39725814

Family Applications (1)

Application Number Title Priority Date Filing Date
TW96105788A TW200801831A (en) 2006-02-15 2007-02-15 Exposure apparatus, exposure method, and exposure system

Country Status (2)

Country Link
JP (1) JP2008182167A (en)
TW (1) TW200801831A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4490459B2 (en) 2007-06-29 2010-06-23 キヤノン株式会社 Exposure apparatus and device manufacturing method
US8629970B2 (en) 2008-01-23 2014-01-14 Asml Netherlands B.V. Immersion lithographic apparatus with immersion fluid re-circulating system
NL2003820A (en) * 2008-12-22 2010-06-23 Asml Netherlands Bv Fluid handling structure, table, lithographic apparatus, immersion lithographic apparatus, and device manufacturing methods.
TW201227178A (en) * 2010-11-02 2012-07-01 Nikon Corp Liquid supply apparatus, liquid supply method, management apparatus, management method, exposure apparatus, exposure method, device fabricating system, device fabricating method, program and recording medium

Also Published As

Publication number Publication date
JP2008182167A (en) 2008-08-07

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