TW200739255A - Colored composition for color filter, color filter and method of manufacturing color filter - Google Patents
Colored composition for color filter, color filter and method of manufacturing color filterInfo
- Publication number
- TW200739255A TW200739255A TW096107317A TW96107317A TW200739255A TW 200739255 A TW200739255 A TW 200739255A TW 096107317 A TW096107317 A TW 096107317A TW 96107317 A TW96107317 A TW 96107317A TW 200739255 A TW200739255 A TW 200739255A
- Authority
- TW
- Taiwan
- Prior art keywords
- color filter
- organic solvent
- less
- colored composition
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000003960 organic solvent Substances 0.000 abstract 8
- 238000009835 boiling Methods 0.000 abstract 2
- 238000004040 coloring Methods 0.000 abstract 2
- 239000003086 colorant Substances 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
The present invention provides a coloring composition for color filter, which comprises transparent resin, colorant, organic solvent. The above mentioned organic solvent comprises a organic solvent A that boiling point is 160 DEG C and more to less 250 DEG C at 760mmHg and conductivity is 0.001nS/cm and more to less 0.8nS/cm at 25 DEG C; and a organic solvent B that boiling point is 100 DEG C and more to less 160 DEG C at 760mmHg and conductivity is 0.8nS/cm and more to less 50nS/cm at 25 DEG C, wherein the amount of organic solvent A is 5wt% and more to less 60wt% based on the total of organic solvent, and the amount of organic solvent B is 40wt% and more to less 95wt% based on the total of organic solvent. Further, this invention discloses a color filter and the preparation method for color filter, and the said color filter has filter segment formed by using the said coloring composition.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006065686A JP4835210B2 (en) | 2006-03-10 | 2006-03-10 | Coloring composition for color filter, color filter, and method for producing color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200739255A true TW200739255A (en) | 2007-10-16 |
| TWI363930B TWI363930B (en) | 2012-05-11 |
Family
ID=38586634
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96107317A TWI363930B (en) | 2006-03-10 | 2007-03-03 | Colored composition for color filter, color filter and method of manufacturing color filter |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4835210B2 (en) |
| KR (1) | KR101352487B1 (en) |
| CN (1) | CN101033324B (en) |
| TW (1) | TWI363930B (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4904869B2 (en) * | 2006-03-22 | 2012-03-28 | Jsr株式会社 | Radiation-sensitive composition for forming colored layer and color filter |
| JP4987404B2 (en) * | 2006-09-28 | 2012-07-25 | 株式会社Dnpファインケミカル | Photosensitive resin composition for color filter |
| JP4959411B2 (en) * | 2007-04-27 | 2012-06-20 | 富士フイルム株式会社 | Colored photopolymerizable composition, color filter using the same, and method for producing color filter |
| WO2009141924A1 (en) * | 2008-05-23 | 2009-11-26 | 三菱化学株式会社 | Coloring curable resin composition, color filter, liquid-crystal display, and organic el display |
| JP4593638B2 (en) * | 2008-02-18 | 2010-12-08 | ダイセル化学工業株式会社 | Method for producing ester solvent |
| KR101608292B1 (en) * | 2008-02-22 | 2016-04-01 | 후지필름 가부시키가이샤 | Colored curable composition, colored pattern, color filter and method of manufacturing the same, and liquid crystal display device |
| JP5033695B2 (en) * | 2008-03-26 | 2012-09-26 | 株式会社Dnpファインケミカル | Thermosetting resin composition for color filter |
| CN102165338B (en) * | 2008-09-30 | 2014-03-26 | 大日本印刷株式会社 | Inkjet ink composition for color filter, color filter, method of producing color filter, and liquid crystal display |
| US20100151118A1 (en) * | 2008-12-17 | 2010-06-17 | Eastman Chemical Company | Carrier solvent compositions, coatings compositions, and methods to produce thick polymer coatings |
| JP5381682B2 (en) * | 2008-12-19 | 2014-01-08 | 三菱化学株式会社 | Colored resin composition, color filter, liquid crystal display device and organic EL display |
| JP5834379B2 (en) * | 2009-06-25 | 2015-12-24 | Jsr株式会社 | Coloring composition, color filter and color liquid crystal display element |
| JP2010275327A (en) * | 2010-09-15 | 2010-12-09 | Daicel Chem Ind Ltd | Ester solvent |
| KR20130120394A (en) * | 2012-04-25 | 2013-11-04 | 스미또모 가가꾸 가부시키가이샤 | Photosensitive resin composition |
| KR102475604B1 (en) * | 2016-08-25 | 2022-12-08 | 동우 화인켐 주식회사 | Colored photosensitive resin composition, color filter and image display device produced using the same |
| KR20190098374A (en) | 2018-02-14 | 2019-08-22 | 동우 화인켐 주식회사 | A blue colored photosensitive resin composition, color filter and image display device produced using the same |
| WO2019171998A1 (en) * | 2018-03-05 | 2019-09-12 | 住友化学株式会社 | Coloring curable resin composition, color filter and display device |
| KR102731965B1 (en) | 2022-02-24 | 2024-11-20 | 동우 화인켐 주식회사 | A colored curable resin composition, a color filter and a display device using the same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0667420A (en) * | 1992-08-19 | 1994-03-11 | Nippon Zeon Co Ltd | Positive resist composition |
| JPH086244A (en) * | 1994-06-17 | 1996-01-12 | Shin Etsu Chem Co Ltd | Radiation-sensitive resist composition |
| JP3852959B2 (en) * | 1994-08-11 | 2006-12-06 | ミヨシ油脂株式会社 | Antistatic agent for internal addition of synthetic resin |
| JPH0959336A (en) * | 1995-08-17 | 1997-03-04 | Toyo Tire & Rubber Co Ltd | Flexible polyuretrhane foam excellent in flexibility foamed with water and its production |
| TW454219B (en) * | 1998-04-02 | 2001-09-11 | Toshiba Corp | Dispersion composition for black matrix, display, and process for producing display |
| JP2003330174A (en) * | 2002-05-14 | 2003-11-19 | Sumitomo Chem Co Ltd | Colored photosensitive resin composition |
| JP4393051B2 (en) * | 2002-10-15 | 2010-01-06 | 昭和電工株式会社 | Hexaarylbiimidazole compound and photopolymerization initiator composition containing the same |
| JP4627617B2 (en) * | 2003-05-23 | 2011-02-09 | 東洋インキ製造株式会社 | Coloring composition, method for producing color filter, and method for producing black matrix substrate |
| JP4674048B2 (en) * | 2004-02-23 | 2011-04-20 | 東洋インキ製造株式会社 | Coloring composition for forming color filter and color filter |
| JP4479342B2 (en) * | 2004-05-21 | 2010-06-09 | 東洋インキ製造株式会社 | Coloring composition |
| JP2007148258A (en) * | 2005-11-30 | 2007-06-14 | Daicel Chem Ind Ltd | Resist composition |
-
2006
- 2006-03-10 JP JP2006065686A patent/JP4835210B2/en active Active
-
2007
- 2007-03-03 TW TW96107317A patent/TWI363930B/en active
- 2007-03-09 CN CN2007100862427A patent/CN101033324B/en active Active
- 2007-03-09 KR KR20070023412A patent/KR101352487B1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070092662A (en) | 2007-09-13 |
| CN101033324A (en) | 2007-09-12 |
| JP4835210B2 (en) | 2011-12-14 |
| CN101033324B (en) | 2010-07-21 |
| JP2007241051A (en) | 2007-09-20 |
| TWI363930B (en) | 2012-05-11 |
| KR101352487B1 (en) | 2014-01-17 |
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