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TW200739216A - Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device - Google Patents

Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device

Info

Publication number
TW200739216A
TW200739216A TW096107316A TW96107316A TW200739216A TW 200739216 A TW200739216 A TW 200739216A TW 096107316 A TW096107316 A TW 096107316A TW 96107316 A TW96107316 A TW 96107316A TW 200739216 A TW200739216 A TW 200739216A
Authority
TW
Taiwan
Prior art keywords
liquid crystal
crystal display
photospacer
display device
resin composition
Prior art date
Application number
TW096107316A
Other languages
Chinese (zh)
Inventor
Katsuya Takemasa
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200739216A publication Critical patent/TW200739216A/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L75/00Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
    • C08L75/04Polyurethanes
    • C08L75/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C08L75/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • G02F1/13394Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)

Abstract

The present invention provides a photosensitive resin composition for photospacer which has high deformation recovery characteristic, especially the display uniform in the 2 to 4μm liquid crystal display device could be eliminated, method for photospacer, substrate for liquid crystal display device which could prevent from the display uniform and display high quality picture, liquid crystal display element, and liquid crystal display device. The present invention relates to a photosensitive resin composition for photospacer which comprises an alkali soluble high molecular material, a polymeric monomer having urethane group and 5 to 15 acryl, and a photopolymerization initiator, a method by using the said photosensitive resin composition for photospacer, and a substrate for liquid crystal display device having the said photospacer, a liquid crystal display element and a liquid crystal display device.
TW096107316A 2006-03-13 2007-03-03 Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device TW200739216A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006068237 2006-03-13

Publications (1)

Publication Number Publication Date
TW200739216A true TW200739216A (en) 2007-10-16

Family

ID=38509220

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096107316A TW200739216A (en) 2006-03-13 2007-03-03 Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device

Country Status (2)

Country Link
TW (1) TW200739216A (en)
WO (1) WO2007105381A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120423985A (en) * 2025-07-02 2025-08-05 深圳市贝特瑞新能源技术研究院有限公司 A multifunctional monomer and preparation method thereof, solid electrolyte, lithium ion battery and electrical equipment

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4313840B2 (en) * 2007-05-11 2009-08-12 積水化学工業株式会社 Curable resin composition for column spacer, column spacer, and liquid crystal display element
JP2009084435A (en) * 2007-09-28 2009-04-23 Fujifilm Corp Photosensitive resin composition, method for producing photospacer, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device
JP7283651B2 (en) * 2018-05-22 2023-05-30 国立大学法人東北大学 Liquid crystal display element and method for manufacturing liquid crystal display element

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3752916B2 (en) * 1999-09-21 2006-03-08 凸版印刷株式会社 Photosensitive composition for columnar spacer and color filter for liquid crystal display device using the same
JP4148404B2 (en) * 2001-11-08 2008-09-10 富士フイルム株式会社 Resin composition for spacer, spacer and liquid crystal display element
JP4137497B2 (en) * 2002-04-19 2008-08-20 凸版印刷株式会社 Photosensitive composition for color filter and color filter using the same
JP4016893B2 (en) * 2003-06-12 2007-12-05 Jsr株式会社 Radiation sensitive resin composition and liquid crystal display element used for forming spacer for display panel
JP4706847B2 (en) * 2005-03-02 2011-06-22 Jsr株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element
JP2006259351A (en) * 2005-03-17 2006-09-28 Toppan Printing Co Ltd Photosensitive composition and color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120423985A (en) * 2025-07-02 2025-08-05 深圳市贝特瑞新能源技术研究院有限公司 A multifunctional monomer and preparation method thereof, solid electrolyte, lithium ion battery and electrical equipment

Also Published As

Publication number Publication date
WO2007105381A1 (en) 2007-09-20

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