TW200739216A - Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device - Google Patents
Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display deviceInfo
- Publication number
- TW200739216A TW200739216A TW096107316A TW96107316A TW200739216A TW 200739216 A TW200739216 A TW 200739216A TW 096107316 A TW096107316 A TW 096107316A TW 96107316 A TW96107316 A TW 96107316A TW 200739216 A TW200739216 A TW 200739216A
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- crystal display
- photospacer
- display device
- resin composition
- Prior art date
Links
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 10
- 239000011342 resin composition Substances 0.000 title abstract 4
- 239000000758 substrate Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 2
- -1 acryl Chemical group 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
- C08L75/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C08L75/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Materials For Photolithography (AREA)
Abstract
The present invention provides a photosensitive resin composition for photospacer which has high deformation recovery characteristic, especially the display uniform in the 2 to 4μm liquid crystal display device could be eliminated, method for photospacer, substrate for liquid crystal display device which could prevent from the display uniform and display high quality picture, liquid crystal display element, and liquid crystal display device. The present invention relates to a photosensitive resin composition for photospacer which comprises an alkali soluble high molecular material, a polymeric monomer having urethane group and 5 to 15 acryl, and a photopolymerization initiator, a method by using the said photosensitive resin composition for photospacer, and a substrate for liquid crystal display device having the said photospacer, a liquid crystal display element and a liquid crystal display device.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006068237 | 2006-03-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200739216A true TW200739216A (en) | 2007-10-16 |
Family
ID=38509220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096107316A TW200739216A (en) | 2006-03-13 | 2007-03-03 | Photosensitive resin composition for photospacer and method of manufacturing photospacer, and substrate for liquid crystal display device, liquid crystal display element and liquid crystal display device |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TW200739216A (en) |
| WO (1) | WO2007105381A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120423985A (en) * | 2025-07-02 | 2025-08-05 | 深圳市贝特瑞新能源技术研究院有限公司 | A multifunctional monomer and preparation method thereof, solid electrolyte, lithium ion battery and electrical equipment |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4313840B2 (en) * | 2007-05-11 | 2009-08-12 | 積水化学工業株式会社 | Curable resin composition for column spacer, column spacer, and liquid crystal display element |
| JP2009084435A (en) * | 2007-09-28 | 2009-04-23 | Fujifilm Corp | Photosensitive resin composition, method for producing photospacer, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device |
| JP7283651B2 (en) * | 2018-05-22 | 2023-05-30 | 国立大学法人東北大学 | Liquid crystal display element and method for manufacturing liquid crystal display element |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3752916B2 (en) * | 1999-09-21 | 2006-03-08 | 凸版印刷株式会社 | Photosensitive composition for columnar spacer and color filter for liquid crystal display device using the same |
| JP4148404B2 (en) * | 2001-11-08 | 2008-09-10 | 富士フイルム株式会社 | Resin composition for spacer, spacer and liquid crystal display element |
| JP4137497B2 (en) * | 2002-04-19 | 2008-08-20 | 凸版印刷株式会社 | Photosensitive composition for color filter and color filter using the same |
| JP4016893B2 (en) * | 2003-06-12 | 2007-12-05 | Jsr株式会社 | Radiation sensitive resin composition and liquid crystal display element used for forming spacer for display panel |
| JP4706847B2 (en) * | 2005-03-02 | 2011-06-22 | Jsr株式会社 | Radiation sensitive resin composition and spacer for liquid crystal display element |
| JP2006259351A (en) * | 2005-03-17 | 2006-09-28 | Toppan Printing Co Ltd | Photosensitive composition and color filter |
-
2007
- 2007-01-30 WO PCT/JP2007/051459 patent/WO2007105381A1/en not_active Ceased
- 2007-03-03 TW TW096107316A patent/TW200739216A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN120423985A (en) * | 2025-07-02 | 2025-08-05 | 深圳市贝特瑞新能源技术研究院有限公司 | A multifunctional monomer and preparation method thereof, solid electrolyte, lithium ion battery and electrical equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007105381A1 (en) | 2007-09-20 |
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