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TW200734818A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
TW200734818A
TW200734818A TW095142040A TW95142040A TW200734818A TW 200734818 A TW200734818 A TW 200734818A TW 095142040 A TW095142040 A TW 095142040A TW 95142040 A TW95142040 A TW 95142040A TW 200734818 A TW200734818 A TW 200734818A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
polymer
scarcely
giving
Prior art date
Application number
TW095142040A
Other languages
English (en)
Inventor
Nobuaki Otsuki
Original Assignee
Nippon Catalytic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Catalytic Chem Ind filed Critical Nippon Catalytic Chem Ind
Publication of TW200734818A publication Critical patent/TW200734818A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW095142040A 2005-11-16 2006-11-14 Photosensitive resin composition TW200734818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005332101A JP4464907B2 (ja) 2005-11-16 2005-11-16 感光性樹脂組成物

Publications (1)

Publication Number Publication Date
TW200734818A true TW200734818A (en) 2007-09-16

Family

ID=38041779

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095142040A TW200734818A (en) 2005-11-16 2006-11-14 Photosensitive resin composition

Country Status (5)

Country Link
US (1) US20070112106A1 (zh)
JP (1) JP4464907B2 (zh)
KR (1) KR20070052218A (zh)
CN (1) CN1967383A (zh)
TW (1) TW200734818A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111149056A (zh) * 2017-10-11 2020-05-12 东丽株式会社 感光性导电糊剂及导电图案形成用膜

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101009733B1 (ko) * 2007-05-15 2011-01-20 주식회사 엘지화학 전자파 차폐층 제조시 무전해도금에 대한 촉매 전구체수지조성물, 이를 이용한 금속패턴 형성방법 및 이에 따라제조된 금속패턴
KR101032275B1 (ko) * 2007-11-08 2011-05-06 주식회사 엘지화학 착색 분산액, 감광성 수지조성물 및 블랙매트릭스
JP5370727B2 (ja) * 2008-11-28 2013-12-18 日立化成株式会社 感光性樹脂組成物、これを用いた感光性フィルム及び永久レジスト
JP5263603B2 (ja) * 2009-01-09 2013-08-14 日立化成株式会社 感光性樹脂組成物、感光性フィルム、レジストパターンの形成方法及びそれを用いた永久レジスト。
JP5556990B2 (ja) * 2009-06-04 2014-07-23 日立化成株式会社 感光性樹脂組成物及び感光性エレメント
JP5403545B2 (ja) * 2009-09-14 2014-01-29 太陽ホールディングス株式会社 ソルダーレジスト組成物、そのドライフィルム及び硬化物並びにそれらを用いたプリント配線板
JP5765729B2 (ja) * 2011-01-11 2015-08-19 学校法人 関西大学 光応答性高分子が形成されてなる成形物およびその利用
JP5671369B2 (ja) * 2011-02-23 2015-02-18 株式会社日本触媒 アルカリ現像性を有する硬化性樹脂組成物およびこの組成物から得られる硬化物
US8968586B2 (en) * 2012-02-15 2015-03-03 Jsr Corporation Pattern-forming method
JP6234864B2 (ja) * 2014-03-28 2017-11-22 富士フイルム株式会社 感光性樹脂組成物、積層体、半導体デバイスの製造方法、半導体デバイス
TWI614573B (zh) * 2016-12-30 2018-02-11 臻鼎科技股份有限公司 水溶性感光樹脂組合物及覆蓋膜
CN106933036B (zh) * 2017-04-12 2020-06-26 安徽强邦印刷材料有限公司 一种热敏阳图感光组合物的制备方法
CN107045260B (zh) * 2017-04-12 2020-06-26 安徽强邦印刷材料有限公司 一种热敏阳图ctp版的感光层
CN107632498A (zh) * 2017-09-20 2018-01-26 浙江福斯特新材料研究院有限公司 一种感光性树脂组合物及由其制成的层压体

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59508640D1 (de) * 1994-06-22 2000-09-21 Ciba Sc Holding Ag Positiv-Photoresist
EP1033625A1 (en) * 1997-07-24 2000-09-06 JSR Corporation Radiation sensitive composition
JP4218999B2 (ja) * 1998-02-19 2009-02-04 富士フイルム株式会社 カラーフィルター用感光性着色組成物
JP3940523B2 (ja) * 1999-04-27 2007-07-04 セイコーエプソン株式会社 インクジェット方式カラーフィルタ用樹脂組成物、カラーフィルタおよびカラーフィルタの製造方法
WO2002025378A1 (en) * 2000-09-16 2002-03-28 Goo Chemical Co., Ltd. Ultraviolet-curable resin composition and photosolder resist ink containing the composition
JP2002258027A (ja) * 2001-02-28 2002-09-11 Jsr Corp カラーフィルタ用感放射線性組成物とその製造方法、カラーフィルタおよびカラー液晶表示素子
KR20040030534A (ko) * 2001-05-15 2004-04-09 쇼와 덴코 가부시키가이샤 감광성 착색 조성물, 이 조성물을 사용한 컬러필터 및 그제조방법
CN100541327C (zh) * 2004-05-21 2009-09-16 明德国际仓储贸易(上海)有限公司 液晶显示元件散乱层光阻组成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111149056A (zh) * 2017-10-11 2020-05-12 东丽株式会社 感光性导电糊剂及导电图案形成用膜
CN111149056B (zh) * 2017-10-11 2023-07-25 东丽株式会社 感光性导电糊剂及导电图案形成用膜

Also Published As

Publication number Publication date
JP2007139991A (ja) 2007-06-07
KR20070052218A (ko) 2007-05-21
JP4464907B2 (ja) 2010-05-19
CN1967383A (zh) 2007-05-23
US20070112106A1 (en) 2007-05-17

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