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TW200726818A - Film forming composition, dielectric insulating film using the composition, and electronic device having the dielectric insulating film - Google Patents

Film forming composition, dielectric insulating film using the composition, and electronic device having the dielectric insulating film

Info

Publication number
TW200726818A
TW200726818A TW095145351A TW95145351A TW200726818A TW 200726818 A TW200726818 A TW 200726818A TW 095145351 A TW095145351 A TW 095145351A TW 95145351 A TW95145351 A TW 95145351A TW 200726818 A TW200726818 A TW 200726818A
Authority
TW
Taiwan
Prior art keywords
composition
film
insulating film
dielectric insulating
electronic device
Prior art date
Application number
TW095145351A
Other languages
Chinese (zh)
Inventor
Yutaka Adegawa
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW200726818A publication Critical patent/TW200726818A/en

Links

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Insulating Bodies (AREA)
  • Inorganic Insulating Materials (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

This invention relates to a composition having excellent dielectric constant, machine strength in film and long time storage for film formation in electric device; to an isolated film made of the composition; and to an electric device containing the isolated film. This invention relates to a composition for film formation, wherein the said film contains compound having cage-shape, and the amount of halogen of the film obtained by coating the composition is less than 100x10<SP>10</SP>atom/cm<SP>2</SP>; to an isolated film made of the composition; and to an electric device containing the isolated film.
TW095145351A 2005-12-09 2006-12-06 Film forming composition, dielectric insulating film using the composition, and electronic device having the dielectric insulating film TW200726818A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005356811A JP2007161782A (en) 2005-12-09 2005-12-09 Film forming composition, insulating film and electronic device using the composition

Publications (1)

Publication Number Publication Date
TW200726818A true TW200726818A (en) 2007-07-16

Family

ID=38245060

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095145351A TW200726818A (en) 2005-12-09 2006-12-06 Film forming composition, dielectric insulating film using the composition, and electronic device having the dielectric insulating film

Country Status (2)

Country Link
JP (1) JP2007161782A (en)
TW (1) TW200726818A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI500695B (en) * 2010-02-03 2015-09-21 Showa Denko Kk Thermosetting composition

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5012372B2 (en) * 2007-09-27 2012-08-29 住友ベークライト株式会社 Organic insulating film and semiconductor device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004204010A (en) * 2002-12-25 2004-07-22 Sumitomo Chem Co Ltd Adamantane resin and coating liquid for forming insulating film using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI500695B (en) * 2010-02-03 2015-09-21 Showa Denko Kk Thermosetting composition

Also Published As

Publication number Publication date
JP2007161782A (en) 2007-06-28

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