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TW200703626A - Composition for forming paraelectric thin film, paraelectric thin film and dielectric memory - Google Patents

Composition for forming paraelectric thin film, paraelectric thin film and dielectric memory

Info

Publication number
TW200703626A
TW200703626A TW095124714A TW95124714A TW200703626A TW 200703626 A TW200703626 A TW 200703626A TW 095124714 A TW095124714 A TW 095124714A TW 95124714 A TW95124714 A TW 95124714A TW 200703626 A TW200703626 A TW 200703626A
Authority
TW
Taiwan
Prior art keywords
thin film
composition
forming
paraelectric
paraelectric thin
Prior art date
Application number
TW095124714A
Other languages
English (en)
Inventor
Yoshiyuki Takeuchi
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200703626A publication Critical patent/TW200703626A/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G1/00Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
    • C01G1/02Oxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/003Titanates
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G25/00Compounds of zirconium
    • C01G25/006Compounds containing zirconium, with or without oxygen or hydrogen, and containing two or more other elements
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G29/00Compounds of bismuth
    • C01G29/006Compounds containing bismuth, with or without oxygen or hydrogen, and containing two or more other elements
    • H10P14/6342
    • H10P14/69398
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/40Electric properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Inorganic Insulating Materials (AREA)
  • Formation Of Insulating Films (AREA)
TW095124714A 2005-07-11 2006-07-06 Composition for forming paraelectric thin film, paraelectric thin film and dielectric memory TW200703626A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005202167 2005-07-11

Publications (1)

Publication Number Publication Date
TW200703626A true TW200703626A (en) 2007-01-16

Family

ID=37636957

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095124714A TW200703626A (en) 2005-07-11 2006-07-06 Composition for forming paraelectric thin film, paraelectric thin film and dielectric memory

Country Status (2)

Country Link
TW (1) TW200703626A (zh)
WO (1) WO2007007561A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116332628A (zh) * 2023-02-24 2023-06-27 齐鲁工业大学(山东省科学院) 一种低介电常数硼酸盐微波介质陶瓷及制备方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011078398A1 (en) 2009-12-25 2011-06-30 Ricoh Company, Ltd. Field-effect transistor, semiconductor memory, display element, image display device, and system
JP5899615B2 (ja) * 2010-03-18 2016-04-06 株式会社リコー 絶縁膜の製造方法及び半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3989414B2 (ja) * 2003-06-30 2007-10-10 沖電気工業株式会社 強誘電体キャパシタ、強誘電体キャパシタを具える半導体装置、強誘電体キャパシタの製造方法及び半導体装置の製造方法
JP4603254B2 (ja) * 2003-10-23 2010-12-22 日本曹達株式会社 金属酸化物ゾル液の製造方法、結晶質金属複酸化物ゾルおよび金属酸化物膜

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116332628A (zh) * 2023-02-24 2023-06-27 齐鲁工业大学(山东省科学院) 一种低介电常数硼酸盐微波介质陶瓷及制备方法

Also Published As

Publication number Publication date
WO2007007561A1 (ja) 2007-01-18

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