TW200703427A - Method of thinning a wafer - Google Patents
Method of thinning a waferInfo
- Publication number
- TW200703427A TW200703427A TW094122412A TW94122412A TW200703427A TW 200703427 A TW200703427 A TW 200703427A TW 094122412 A TW094122412 A TW 094122412A TW 94122412 A TW94122412 A TW 94122412A TW 200703427 A TW200703427 A TW 200703427A
- Authority
- TW
- Taiwan
- Prior art keywords
- wafer
- thinning
- carrier
- front surface
- back surface
- Prior art date
Links
Classifications
-
- H10P52/00—
Landscapes
- Mechanical Treatment Of Semiconductor (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW094122412A TWI310583B (en) | 2005-07-01 | 2005-07-01 | Method of thinning a wafer |
| US11/163,505 US20070004172A1 (en) | 2005-07-01 | 2005-10-20 | Method of thinning a wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW094122412A TWI310583B (en) | 2005-07-01 | 2005-07-01 | Method of thinning a wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200703427A true TW200703427A (en) | 2007-01-16 |
| TWI310583B TWI310583B (en) | 2009-06-01 |
Family
ID=37590145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094122412A TWI310583B (en) | 2005-07-01 | 2005-07-01 | Method of thinning a wafer |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20070004172A1 (zh) |
| TW (1) | TWI310583B (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI602217B (zh) * | 2016-08-05 | 2017-10-11 | 上海新昇半導體科技有限公司 | 一種晶圓薄化方法及薄化的晶圓結構 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2935537B1 (fr) * | 2008-08-28 | 2010-10-22 | Soitec Silicon On Insulator | Procede d'initiation d'adhesion moleculaire |
| FR2943177B1 (fr) | 2009-03-12 | 2011-05-06 | Soitec Silicon On Insulator | Procede de fabrication d'une structure multicouche avec report de couche circuit |
| EP2442720B1 (en) * | 2009-06-17 | 2016-08-24 | 3Shape A/S | Focus scanning apparatus |
| FR2947380B1 (fr) | 2009-06-26 | 2012-12-14 | Soitec Silicon Insulator Technologies | Procede de collage par adhesion moleculaire. |
| US8859424B2 (en) | 2009-08-14 | 2014-10-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor wafer carrier and method of manufacturing |
| WO2014177612A1 (en) * | 2013-04-30 | 2014-11-06 | Abb Technology Ag | Method for manufacturing a semiconductor device comprising a thin semiconductor wafer |
| US10727216B1 (en) | 2019-05-10 | 2020-07-28 | Sandisk Technologies Llc | Method for removing a bulk substrate from a bonded assembly of wafers |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7535100B2 (en) * | 2002-07-12 | 2009-05-19 | The United States Of America As Represented By The Secretary Of The Navy | Wafer bonding of thinned electronic materials and circuits to high performance substrates |
| TW200743146A (en) * | 2006-05-02 | 2007-11-16 | Touch Micro System Tech | Method of thinning a wafer |
-
2005
- 2005-07-01 TW TW094122412A patent/TWI310583B/zh not_active IP Right Cessation
- 2005-10-20 US US11/163,505 patent/US20070004172A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI602217B (zh) * | 2016-08-05 | 2017-10-11 | 上海新昇半導體科技有限公司 | 一種晶圓薄化方法及薄化的晶圓結構 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20070004172A1 (en) | 2007-01-04 |
| TWI310583B (en) | 2009-06-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |