TW200639930A - Inner tube for furnace and furnace apparatus using the same - Google Patents
Inner tube for furnace and furnace apparatus using the sameInfo
- Publication number
- TW200639930A TW200639930A TW094115370A TW94115370A TW200639930A TW 200639930 A TW200639930 A TW 200639930A TW 094115370 A TW094115370 A TW 094115370A TW 94115370 A TW94115370 A TW 94115370A TW 200639930 A TW200639930 A TW 200639930A
- Authority
- TW
- Taiwan
- Prior art keywords
- inner tube
- furnace
- same
- boat
- exhaust
- Prior art date
Links
Abstract
A furnace apparatus is disclosed, comprising: a boat for carrying at least one semiconductor wafer; a inner tube for encapsulating the boat and defining a reacting region; a gas injector for injecting gas reactants disposed in the inner tube; and a outer tube with a exhaust at one side thereof, wherein the inner tube is a hollow cylinder with a bottom opening and at least one slit opening on one side thereon, allowing the reactant gases flow through the slit opening to the exhaust.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94115370A TWI260679B (en) | 2005-05-12 | 2005-05-12 | Inner tube for furnace and furnace apparatus using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94115370A TWI260679B (en) | 2005-05-12 | 2005-05-12 | Inner tube for furnace and furnace apparatus using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI260679B TWI260679B (en) | 2006-08-21 |
| TW200639930A true TW200639930A (en) | 2006-11-16 |
Family
ID=37874826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94115370A TWI260679B (en) | 2005-05-12 | 2005-05-12 | Inner tube for furnace and furnace apparatus using the same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI260679B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112030140A (en) * | 2020-06-05 | 2020-12-04 | 中国科学院微电子研究所 | A vertical chemical vapor deposition furnace and its application |
| CN113373522A (en) * | 2021-05-31 | 2021-09-10 | 北海惠科半导体科技有限公司 | Diffusion device and diffusion system |
| WO2023138210A1 (en) * | 2022-01-24 | 2023-07-27 | 盛美半导体设备(上海)股份有限公司 | Furnace tube for thin film deposition, thin film deposition method and processing apparatus |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101760316B1 (en) | 2015-09-11 | 2017-07-21 | 주식회사 유진테크 | Substrate Processing Apparatus |
| CN112575312B (en) * | 2019-09-30 | 2023-08-29 | 长鑫存储技术有限公司 | Film preparation equipment and film preparation method |
-
2005
- 2005-05-12 TW TW94115370A patent/TWI260679B/en not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112030140A (en) * | 2020-06-05 | 2020-12-04 | 中国科学院微电子研究所 | A vertical chemical vapor deposition furnace and its application |
| CN113373522A (en) * | 2021-05-31 | 2021-09-10 | 北海惠科半导体科技有限公司 | Diffusion device and diffusion system |
| WO2023138210A1 (en) * | 2022-01-24 | 2023-07-27 | 盛美半导体设备(上海)股份有限公司 | Furnace tube for thin film deposition, thin film deposition method and processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI260679B (en) | 2006-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |