TW200612197A - Radiation sensitive resin composition - Google Patents
Radiation sensitive resin compositionInfo
- Publication number
- TW200612197A TW200612197A TW094125160A TW94125160A TW200612197A TW 200612197 A TW200612197 A TW 200612197A TW 094125160 A TW094125160 A TW 094125160A TW 94125160 A TW94125160 A TW 94125160A TW 200612197 A TW200612197 A TW 200612197A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- radiation sensitive
- sensitive resin
- solvent
- formula
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000011342 resin composition Substances 0.000 title abstract 2
- -1 quinonediazide compound Chemical class 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 235000019256 formaldehyde Nutrition 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
A radiation sensitive resin composition comprising (A) an alkali-soluble resin having a hardening property, (B) a quinonediazide compound and (C) a solvent, wherein the solvent (C) contains a compound of the formula (1) and alkyl lactate. R1-O-[CH(CH3)CH2O]n-R2 (1) [In the formula (1), R1 and R2 independently represent alkyl group having 1-4 carbon atoms, n represents an integer of 1-4.]
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004220012A JP2006039269A (en) | 2004-07-28 | 2004-07-28 | Radiation sensitive resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200612197A true TW200612197A (en) | 2006-04-16 |
Family
ID=35904323
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094125160A TW200612197A (en) | 2004-07-28 | 2005-07-25 | Radiation sensitive resin composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2006039269A (en) |
| KR (1) | KR20060046729A (en) |
| CN (1) | CN1903942A (en) |
| TW (1) | TW200612197A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4905700B2 (en) * | 2007-05-16 | 2012-03-28 | Ｊｓｒ株式会社 | Radiation-sensitive resin composition, interlayer insulating film, microlens and method for forming them |
-
2004
- 2004-07-28 JP JP2004220012A patent/JP2006039269A/en active Pending
-
2005
- 2005-07-25 CN CNA2005100849279A patent/CN1903942A/en active Pending
- 2005-07-25 KR KR1020050067158A patent/KR20060046729A/en not_active Withdrawn
- 2005-07-25 TW TW094125160A patent/TW200612197A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006039269A (en) | 2006-02-09 |
| CN1903942A (en) | 2007-01-31 |
| KR20060046729A (en) | 2006-05-17 |
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