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TW200619240A - Star polymer, acid-decomposable resin composition, resist composition, and di(meth) acrylate compound - Google Patents

Star polymer, acid-decomposable resin composition, resist composition, and di(meth) acrylate compound

Info

Publication number
TW200619240A
TW200619240A TW094127407A TW94127407A TW200619240A TW 200619240 A TW200619240 A TW 200619240A TW 094127407 A TW094127407 A TW 094127407A TW 94127407 A TW94127407 A TW 94127407A TW 200619240 A TW200619240 A TW 200619240A
Authority
TW
Taiwan
Prior art keywords
star polymer
meth
acid
acrylate compound
decomposable resin
Prior art date
Application number
TW094127407A
Other languages
English (en)
Inventor
Shinji Marumo
Original Assignee
Nippon Soda Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Soda Co filed Critical Nippon Soda Co
Publication of TW200619240A publication Critical patent/TW200619240A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C07C69/54—Acrylic acid esters; Methacrylic acid esters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
TW094127407A 2004-08-13 2005-08-12 Star polymer, acid-decomposable resin composition, resist composition, and di(meth) acrylate compound TW200619240A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004235905 2004-08-13

Publications (1)

Publication Number Publication Date
TW200619240A true TW200619240A (en) 2006-06-16

Family

ID=35839408

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094127407A TW200619240A (en) 2004-08-13 2005-08-12 Star polymer, acid-decomposable resin composition, resist composition, and di(meth) acrylate compound

Country Status (3)

Country Link
JP (1) JP4421614B2 (zh)
TW (1) TW200619240A (zh)
WO (1) WO2006016648A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106893053A (zh) * 2015-12-18 2017-06-27 陶氏环球技术有限责任公司 酸不稳定超支化共聚物和相关联的光致抗蚀剂组合物以及形成电子器件的方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4851140B2 (ja) * 2005-08-09 2012-01-11 三菱レイヨン株式会社 （メタ）アクリル酸エステル、重合体、レジスト組成物、およびパターンが形成された基板の製造方法
JP2007316508A (ja) 2006-05-29 2007-12-06 Tokyo Ohka Kogyo Co Ltd 分解性組成物およびその使用方法
JP5340158B2 (ja) * 2007-08-31 2013-11-13 日本曹達株式会社 スターポリマーの製造方法
JP5553488B2 (ja) * 2008-06-06 2014-07-16 株式会社ダイセル リソグラフィー用重合体並びにその製造方法
JP5663153B2 (ja) * 2008-08-27 2015-02-04 東京応化工業株式会社 ポジ型レジスト組成物及びレジストパターン形成方法
JP2010250278A (ja) * 2009-03-26 2010-11-04 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物、レジストパターン形成方法
JP5645495B2 (ja) * 2010-06-17 2014-12-24 東京応化工業株式会社 ポジ型レジスト組成物、レジストパターン形成方法
CN112125998A (zh) * 2020-09-30 2020-12-25 中国科学院宁波材料技术与工程研究所 一种缩醛型动态共价网络材料及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4746714A (en) * 1986-06-17 1988-05-24 E. I. Du Pont De Nemours And Company Stabilized acrylic resin
JPS63132914A (ja) * 1986-08-29 1988-06-04 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− ハイブリツドアクリル系星形ポリマ−およびその製法
EP0636156B1 (en) * 1992-04-14 1997-07-30 Cornell Research Foundation, Inc. Dendritic based macromolecules and method of production
JP4183293B2 (ja) * 1997-07-09 2008-11-19 日本曹達株式会社 （メタ）アクリル酸エステル系重合体及びその製造方法
JP2000063327A (ja) * 1998-08-17 2000-02-29 Toyo Ink Mfg Co Ltd 反応性ヘミアセタールエステルの製造方法、該方法で製造された反応性ヘミアセタールエステル、およびその硬化物
JP2002338535A (ja) * 2001-05-17 2002-11-27 Nitto Denko Corp ポリヒドロキシルデンドリマーおよびその製造法
JP4052904B2 (ja) * 2002-09-04 2008-02-27 株式会社日本触媒 （メタ）アクリレート化合物を含む水系組成物
US7736834B2 (en) * 2003-08-28 2010-06-15 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element employing it, resist pattern forming method, process for manufacturing printed circuit board and method for removing photocured product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106893053A (zh) * 2015-12-18 2017-06-27 陶氏环球技术有限责任公司 酸不稳定超支化共聚物和相关联的光致抗蚀剂组合物以及形成电子器件的方法
CN106893053B (zh) * 2015-12-18 2019-02-22 陶氏环球技术有限责任公司 酸不稳定超支化共聚物和相关联的光致抗蚀剂组合物以及形成电子器件的方法

Also Published As

Publication number Publication date
JP4421614B2 (ja) 2010-02-24
WO2006016648A1 (ja) 2006-02-16
JPWO2006016648A1 (ja) 2008-05-01

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