TW200603507A - VCSEL having an air gap and protective coating - Google Patents
VCSEL having an air gap and protective coatingInfo
- Publication number
- TW200603507A TW200603507A TW094103206A TW94103206A TW200603507A TW 200603507 A TW200603507 A TW 200603507A TW 094103206 A TW094103206 A TW 094103206A TW 94103206 A TW94103206 A TW 94103206A TW 200603507 A TW200603507 A TW 200603507A
- Authority
- TW
- Taiwan
- Prior art keywords
- vcsel
- gap
- protective layer
- mirror stack
- oxide
- Prior art date
Links
- 239000011253 protective coating Substances 0.000 title 1
- 239000011241 protective layer Substances 0.000 abstract 3
- 239000010410 layer Substances 0.000 abstract 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 230000007613 environmental effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 238000007789 sealing Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18344—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
- H01S5/1835—Non-circular mesa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/17—Semiconductor lasers comprising special layers
- H01S2301/176—Specific passivation layers on surfaces other than the emission facet
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
- H01S5/18313—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18316—Airgap confined
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18338—Non-circular shape of the structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/892,983 US20060013276A1 (en) | 2004-07-15 | 2004-07-15 | VCSEL having an air gap and protective coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200603507A true TW200603507A (en) | 2006-01-16 |
Family
ID=35599361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094103206A TW200603507A (en) | 2004-07-15 | 2005-02-02 | VCSEL having an air gap and protective coating |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20060013276A1 (zh) |
| JP (1) | JP2006032964A (zh) |
| KR (1) | KR101148287B1 (zh) |
| CN (1) | CN1722552A (zh) |
| DE (1) | DE102005011381A1 (zh) |
| TW (1) | TW200603507A (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI797931B (zh) * | 2020-12-31 | 2023-04-01 | 穩懋半導體股份有限公司 | 垂直腔面射型雷射及其形成方法 |
Families Citing this family (30)
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| US20070091961A1 (en) * | 2005-10-07 | 2007-04-26 | Chao-Kun Lin | Method and structure for low stress oxide VCSEL |
| US8178364B2 (en) * | 2005-10-31 | 2012-05-15 | Furukawa Electric Co., Ltd. | Testing method of surface-emitting laser device and testing device thereof |
| JP2007150274A (ja) * | 2005-10-31 | 2007-06-14 | Furukawa Electric Co Ltd:The | 面発光レーザ素子 |
| KR20080052197A (ko) | 2006-12-06 | 2008-06-11 | 한국전자통신연구원 | 장파장 표면 방출 레이저 소자 및 그 제조 방법 |
| US7871923B2 (en) * | 2007-01-26 | 2011-01-18 | Taiwan Semiconductor Maufacturing Company, Ltd. | Self-aligned air-gap in interconnect structures |
| JP4992503B2 (ja) * | 2007-03-27 | 2012-08-08 | ソニー株式会社 | 面発光型半導体レーザおよびその製造方法 |
| JP5228363B2 (ja) | 2007-04-18 | 2013-07-03 | ソニー株式会社 | 発光素子 |
| JP2009238832A (ja) * | 2008-03-26 | 2009-10-15 | Furukawa Electric Co Ltd:The | 面発光半導体レーザの製造方法 |
| JP2009277781A (ja) * | 2008-05-13 | 2009-11-26 | Ricoh Co Ltd | 面発光型レーザーアレイ素子、光走査装置及び画像形成装置 |
| WO2013110004A1 (en) * | 2012-01-20 | 2013-07-25 | The Regents Of The University Of California | Short cavity surface emitting laser with double high contrast gratings with and without airgap |
| EP2963744B1 (en) * | 2014-06-30 | 2019-04-03 | Canon Kabushiki Kaisha | Surface emitting laser and optical coherence tomography apparatus including the same |
| GB201503498D0 (en) * | 2015-03-02 | 2015-04-15 | Univ Lancaster | Vertical-cavity surface-emitting laser |
| US10825952B2 (en) | 2017-01-16 | 2020-11-03 | Apple Inc. | Combining light-emitting elements of differing divergence on the same substrate |
| US11381060B2 (en) * | 2017-04-04 | 2022-07-05 | Apple Inc. | VCSELs with improved optical and electrical confinement |
| CN119050806A (zh) | 2019-02-21 | 2024-11-29 | 苹果公司 | 具有电介质dbr的磷化铟vcsel |
| US11764544B2 (en) | 2019-02-28 | 2023-09-19 | Seoul Viosys Co., Ltd. | Vertical-cavity surface-emitting laser |
| US11441484B2 (en) | 2019-03-20 | 2022-09-13 | Seoul Viosys Co., Ltd. | Vertical-cavity surface-emitting laser device |
| JP2020167214A (ja) | 2019-03-28 | 2020-10-08 | セイコーエプソン株式会社 | 半導体レーザーおよび原子発振器 |
| JP2020167213A (ja) | 2019-03-28 | 2020-10-08 | セイコーエプソン株式会社 | 半導体レーザーおよび原子発振器 |
| CN113711450B (zh) | 2019-04-01 | 2025-02-18 | 苹果公司 | 具有紧密节距和高效率的vcsel阵列 |
| US11374381B1 (en) | 2019-06-10 | 2022-06-28 | Apple Inc. | Integrated laser module |
| CN110212407B (zh) * | 2019-07-08 | 2024-02-09 | 苏州长瑞光电有限公司 | 垂直腔面发射激光器及其功率调节方法 |
| CN111029901B (zh) * | 2019-12-11 | 2021-06-29 | 深圳博升光电科技有限公司 | 垂直腔面发射激光器的结构及制造方法 |
| CN110752509B (zh) * | 2019-12-23 | 2020-04-21 | 常州纵慧芯光半导体科技有限公司 | 一种具有非对称氧化结构vcsel单元 |
| TWI767598B (zh) * | 2020-03-20 | 2022-06-11 | 德商通快光電器件有限公司 | 形成垂直腔面發射雷射的光學孔徑之方法和垂直腔面發射雷射 |
| DE102020118824A1 (de) * | 2020-07-16 | 2022-01-20 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Optoelektronisches halbleiterbauelement, verfahren zur herstellung des optoelektronischen halbleiterbauelements und lidar-system |
| CN112310810A (zh) * | 2020-11-02 | 2021-02-02 | 宁波飞芯电子科技有限公司 | 一种半导体激光发射器 |
| CN113285352A (zh) * | 2021-07-23 | 2021-08-20 | 华芯半导体研究院(北京)有限公司 | 具有分拣保护结构的垂直腔面发射激光器 |
| US12494618B2 (en) | 2022-09-14 | 2025-12-09 | Apple Inc. | Vertical emitters with integrated final-stage transistor switch |
| CN119209203A (zh) * | 2024-09-18 | 2024-12-27 | 上海新微半导体有限公司 | 垂直腔面发射激光器的外延结构及其校验方法 |
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| US5359618A (en) * | 1993-06-01 | 1994-10-25 | Motorola, Inc. | High efficiency VCSEL and method of fabrication |
| US5980513A (en) * | 1994-04-25 | 1999-11-09 | Autonomous Technologies Corp. | Laser beam delivery and eye tracking system |
| JPH09293793A (ja) * | 1996-04-26 | 1997-11-11 | Mitsubishi Electric Corp | 薄膜トランジスタを有する半導体装置およびその製造方法 |
| JP3653912B2 (ja) * | 1997-01-27 | 2005-06-02 | 富士ゼロックス株式会社 | 面発光型半導体レーザ素子 |
| US5851849A (en) * | 1997-05-22 | 1998-12-22 | Lucent Technologies Inc. | Process for passivating semiconductor laser structures with severe steps in surface topography |
| JP2000164964A (ja) * | 1998-09-21 | 2000-06-16 | Atr Adaptive Communications Res Lab | 半導体レ―ザ装置の製造方法 |
| JP2000208872A (ja) | 1999-01-12 | 2000-07-28 | Toshiba Corp | 半導体素子及びその製造方法 |
| JP3225942B2 (ja) * | 1999-01-21 | 2001-11-05 | 日本電気株式会社 | 半導体光素子、その製造方法及び半導体光学装置 |
| US6577658B1 (en) * | 1999-09-20 | 2003-06-10 | E20 Corporation, Inc. | Method and apparatus for planar index guided vertical cavity surface emitting lasers |
| US6714572B2 (en) * | 1999-12-01 | 2004-03-30 | The Regents Of The University Of California | Tapered air apertures for thermally robust vertical cavity laser structures |
| US6794725B2 (en) * | 1999-12-21 | 2004-09-21 | Xerox Corporation | Amorphous silicon sensor with micro-spring interconnects for achieving high uniformity in integrated light-emitting sources |
| US6621844B1 (en) * | 2000-01-18 | 2003-09-16 | Xerox Corporation | Buried oxide photonic device with large contact and precise aperture |
| US6658040B1 (en) * | 2000-07-28 | 2003-12-02 | Agilent Technologies, Inc. | High speed VCSEL |
| US6696308B1 (en) * | 2000-10-27 | 2004-02-24 | Chan-Long Shieh | Electrically pumped long-wavelength VCSEL with air gap DBR and methods of fabrication |
| US6650683B2 (en) * | 2000-11-20 | 2003-11-18 | Fuji Xerox Co, Ltd. | Surface emitting semiconductor laser |
| US6774448B1 (en) * | 2000-11-30 | 2004-08-10 | Optical Communication Products, Inc. | High speed detectors having integrated electrical components |
| US6589805B2 (en) * | 2001-03-26 | 2003-07-08 | Gazillion Bits, Inc. | Current confinement structure for vertical cavity surface emitting laser |
| US6628694B2 (en) * | 2001-04-23 | 2003-09-30 | Agilent Technologies, Inc. | Reliability-enhancing layers for vertical cavity surface emitting lasers |
| US6680964B2 (en) * | 2001-12-07 | 2004-01-20 | Agilent Technologies, Inc. | Moisture passivated planar index-guided VCSEL |
| JP2003258378A (ja) * | 2002-03-04 | 2003-09-12 | Seiko Epson Corp | 面発光型半導体レーザおよびその製造方法、光モジュール、光伝達装置 |
| US6658041B2 (en) * | 2002-03-20 | 2003-12-02 | Agilent Technologies, Inc. | Wafer bonded vertical cavity surface emitting laser systems |
| JP4141172B2 (ja) * | 2002-04-30 | 2008-08-27 | 株式会社リコー | 面発光半導体レーザ素子の製造方法および面発光半導体レーザ素子および光伝送システム |
| JP2004158664A (ja) * | 2002-11-07 | 2004-06-03 | Sony Corp | 面発光半導体レーザ素子及びその製造方法 |
| KR100487224B1 (ko) * | 2002-12-18 | 2005-05-03 | 삼성전자주식회사 | 수직공동 표면방사 레이저 및 그 제조방법 |
| US6862309B2 (en) * | 2003-02-06 | 2005-03-01 | Agilent Technologies, Inc. | Passivation scheme for oxide vertical cavity surface-emitting laser |
| US6979582B2 (en) * | 2003-09-22 | 2005-12-27 | National Chung-Hsing University | Vertical-cavity surface emitting laser diode and method for producing the same |
| JP2005277172A (ja) * | 2004-03-25 | 2005-10-06 | Toshiba Corp | 半導体装置及びその製造方法 |
-
2004
- 2004-07-15 US US10/892,983 patent/US20060013276A1/en not_active Abandoned
-
2005
- 2005-02-02 TW TW094103206A patent/TW200603507A/zh unknown
- 2005-02-24 CN CNA2005100089124A patent/CN1722552A/zh active Pending
- 2005-03-11 DE DE102005011381A patent/DE102005011381A1/de not_active Withdrawn
- 2005-07-14 KR KR1020050063653A patent/KR101148287B1/ko not_active Expired - Fee Related
- 2005-07-15 JP JP2005206639A patent/JP2006032964A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI797931B (zh) * | 2020-12-31 | 2023-04-01 | 穩懋半導體股份有限公司 | 垂直腔面射型雷射及其形成方法 |
| US12149049B2 (en) | 2020-12-31 | 2024-11-19 | Win Semiconductors Corp. | Vertical-cavity surface-emitting laser and method for forming the same |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060050164A (ko) | 2006-05-19 |
| KR101148287B1 (ko) | 2012-05-22 |
| DE102005011381A1 (de) | 2006-02-16 |
| JP2006032964A (ja) | 2006-02-02 |
| US20060013276A1 (en) | 2006-01-19 |
| CN1722552A (zh) | 2006-01-18 |
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