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TW200600981A - Exposing apparatus - Google Patents

Exposing apparatus

Info

Publication number
TW200600981A
TW200600981A TW094121819A TW94121819A TW200600981A TW 200600981 A TW200600981 A TW 200600981A TW 094121819 A TW094121819 A TW 094121819A TW 94121819 A TW94121819 A TW 94121819A TW 200600981 A TW200600981 A TW 200600981A
Authority
TW
Taiwan
Prior art keywords
exposure
optical system
image
equipment
color filter
Prior art date
Application number
TW094121819A
Other languages
Chinese (zh)
Other versions
TWI397776B (en
Inventor
Miyoshi Ito
Original Assignee
Intergrated Solutions Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intergrated Solutions Co Ltd filed Critical Intergrated Solutions Co Ltd
Publication of TW200600981A publication Critical patent/TW200600981A/en
Application granted granted Critical
Publication of TWI397776B publication Critical patent/TWI397776B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Color Television Image Signal Generators (AREA)

Abstract

Exposure equipment (1) is provided with an exposure optical system for irradiating a color filter board with exposure light from a light source, and a transfer means, on which the color filter board arranged to face the exposure optical system is placed to be transferred at a fixed speed. The exposure equipment exposes an image on an opening part of a mask arranged on an optical path of the exposure optical system. The exposure equipment is provided with an image pickup means, which performs image pickup of a black matrix previously formed on the color filter board, having the front side of an exposure position of the exposure optical system in a shifting direction of the transfer means as an image pickup apposition. The equipment is also provided with a control means, which detects a previously set reference position in the black matrix of which image has been picked up by the image picked up means, controls irradiation timing of the exposure light of the exposure optical system with the reference position as the standard, and exposes the image of the opening part of the mask at a prescribed position on the color filter board. Thus, the exposure equipment which performs efficient exposure to a large exposure area by using the small mask is provided.
TW094121819A 2004-06-30 2005-06-29 Exposing apparatus TWI397776B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004194023A JP2006017895A (en) 2004-06-30 2004-06-30 Aligner

Publications (2)

Publication Number Publication Date
TW200600981A true TW200600981A (en) 2006-01-01
TWI397776B TWI397776B (en) 2013-06-01

Family

ID=35782672

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094121819A TWI397776B (en) 2004-06-30 2005-06-29 Exposing apparatus

Country Status (5)

Country Link
JP (1) JP2006017895A (en)
KR (1) KR101149089B1 (en)
CN (1) CN1981244B (en)
TW (1) TWI397776B (en)
WO (1) WO2006003863A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI422981B (en) * 2006-08-31 2014-01-11 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
TWI470379B (en) * 2009-02-05 2015-01-21 凸版印刷股份有限公司 Exposure method, method for manufacturing color filter, and exposure device
US9030646B2 (en) 2009-11-12 2015-05-12 V Technology Co., Ltd. Exposure apparatus and photomask used therein
TWI490657B (en) * 2009-11-26 2015-07-01 V Technology Co Ltd Exposure apparatus and photomask to be used for same

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101503992B1 (en) 2003-04-09 2015-03-18 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TWI511179B (en) 2003-10-28 2015-12-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
TWI512335B (en) 2003-11-20 2015-12-11 尼康股份有限公司 Beam conversion element, optical illumination device, exposure device, and exposure method
TWI379344B (en) 2004-02-06 2012-12-11 Nikon Corp Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
KR101452145B1 (en) 2005-05-12 2014-10-16 가부시키가이샤 니콘 Projection optical system, exposure apparatus and exposure method
JP2008076709A (en) * 2006-09-21 2008-04-03 V Technology Co Ltd Exposure equipment
US8431328B2 (en) 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus
JP4971835B2 (en) * 2007-03-02 2012-07-11 株式会社ブイ・テクノロジー Exposure method and exposure apparatus
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2009251290A (en) * 2008-04-07 2009-10-29 V Technology Co Ltd Exposure apparatus
US8804075B2 (en) 2009-02-26 2014-08-12 Toppan Printing Co., Ltd. Color filter and color filter manufacturing method
JP5185158B2 (en) * 2009-02-26 2013-04-17 Ｈｏｙａ株式会社 Multi-tone photomask evaluation method
JP5261847B2 (en) 2009-06-16 2013-08-14 株式会社ブイ・テクノロジー Alignment method, alignment apparatus, and exposure apparatus
TWI428688B (en) * 2009-07-29 2014-03-01 Ｈｏｙａ股份有限公司 Method for manufacturing multi - modal mask and pattern transfer method
US8988653B2 (en) 2009-08-20 2015-03-24 Asml Netherlands B.V. Lithographic apparatus, distortion determining method, and patterning device
JP5630864B2 (en) * 2010-12-06 2014-11-26 凸版印刷株式会社 Exposure equipment
KR101711726B1 (en) * 2015-03-06 2017-03-03 아주하이텍(주) Exposure apparatus and exposure method using the same
JP6940873B2 (en) * 2017-12-08 2021-09-29 株式会社ブイ・テクノロジー Exposure equipment and exposure method
CN115278000B (en) * 2022-06-24 2025-01-24 维沃移动通信有限公司 Image sensor, image generation method, camera module and electronic device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56105634A (en) * 1980-01-25 1981-08-22 Fujitsu Ltd X rays transcription device
JPS60257521A (en) * 1984-06-04 1985-12-19 Nippon Telegr & Teleph Corp <Ntt> Exposure apparatus for forming pattern
JPS6289328A (en) * 1985-10-16 1987-04-23 Canon Inc Exposure device
US4780615A (en) * 1985-02-01 1988-10-25 Canon Kabushiki Kaisha Alignment system for use in pattern transfer apparatus
JPH0677112A (en) * 1992-08-28 1994-03-18 Nec Kyushu Ltd Glare protection region control mechanism in aligner
JPH09127702A (en) * 1995-10-30 1997-05-16 Dainippon Printing Co Ltd Exposure apparatus and exposure method for large size substrate
AU2746799A (en) * 1998-03-09 1999-09-27 Nikon Corporation Scanning exposure method, scanning exposure apparatus and its manufacturing method, and device and its manufacturing method
US6710847B1 (en) * 1998-11-06 2004-03-23 Nikon Corporation Exposure method and exposure apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI422981B (en) * 2006-08-31 2014-01-11 尼康股份有限公司 Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method
TWI470379B (en) * 2009-02-05 2015-01-21 凸版印刷股份有限公司 Exposure method, method for manufacturing color filter, and exposure device
US9030646B2 (en) 2009-11-12 2015-05-12 V Technology Co., Ltd. Exposure apparatus and photomask used therein
TWI490657B (en) * 2009-11-26 2015-07-01 V Technology Co Ltd Exposure apparatus and photomask to be used for same

Also Published As

Publication number Publication date
JP2006017895A (en) 2006-01-19
WO2006003863A1 (en) 2006-01-12
CN1981244A (en) 2007-06-13
CN1981244B (en) 2010-11-10
KR20070024685A (en) 2007-03-02
TWI397776B (en) 2013-06-01
KR101149089B1 (en) 2012-05-25

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