200535396 九、發明說明： 【發明戶斤屬之技術領域3 發明領域 本發明涉及用顯微鏡放大在基板上形成的圖形尺寸後 5 、檢測透明導電膜圖形的尺寸的尺寸測量裝置等檢查裝置。200535396 IX. Description of the invention: [Technical field of the inventor 3] Field of the invention The present invention relates to inspection devices such as a size measuring device that detects the size of a transparent conductive film pattern after magnifying the size of a pattern formed on a substrate with a microscope.
L· J 發明背景 基板（例如LCD(液晶）基板）的尺寸測量裝置是如下的 檢查裝置··用顯微鏡放大向在玻璃等基板(試樣)上形成的圖 10 形照射照明光而得到的圖形像，對用CCD(電荷搞合器件) 攝像機拍攝該圖像而獲得的圖形像進行圖像處理，來測量 尺寸。 向試樣照射照明光的方式，有從顯微鏡以同軸落射方 式照射並處理由其反射光獲得的圖像的反射照明方式、和 15 從試樣的背面側對顯微鏡照射照明光並處理由其透射光獲 得的圖像的透射式照明方式。但是，在LCD基板的測量中 通常具備貫現兩種照明方式的機構，根據被檢查對像的圖 形來區分使用。 在LCD用的基板製造過程中，測量用於生成目的圖形 20 的抗蝕劑膜圖形和生成的金屬膜、透明或半透明膜的尺寸。 這些圖形的尺寸測量是作爲現有技術以第8圖所示的 結構實現的。第8圖是表示現有測量裝置的大致結構的框圖 。1疋反射照明方式的知、明機構’ 3是投光管，2是將從照明 機構1輸出的照明導向投光管3的光纖，4是透射照明方式的 200535396 照明單元，6是透射照明頭，5是將從照明單元4輸出的照明 導向透射照明頭6的光纖，7是物鏡轉換器，8是物鏡，9是 试樣’ 10是錯射自動對焦单元’ 11和12是透鏡，13是自動 調光機構，14是CCD攝像機，15是圖像處理單元，2〇是透 5 射照明頭6内的反射鏡，21是投光管3内的半透半反鏡，22 是鐳射自動對焦單元10内的半透半反鏡，23是照明單元1的 燈，24是照明單元4的燈。並且，顯微鏡至少大致包括：照 明單元1、4，光纖2、5，投光管3，透射照明頭6，安裝在 透射照明頭6上的反射鏡20，物鏡轉換器7，安裝在物鏡轉 10 換器7上的物鏡8，鐳射自動對焦單元1〇，半透半反鏡21、 22，透鏡11、12，以及固定試樣9的試樣台（未圖示）。 在第8圖中，從同轴落射照明用的照明單元1照射的光 ’通過光纖2後，經投光管3的半透半反鏡21、物鏡8照射試 樣9。並且，照明單元1内的燈23例如是鹵素燈等産生白色 15 光的燈。 從試樣9反射的光通過投光管3的半透半反鏡21、鐳射 自動對焦單元10的半透半反鏡22之後，通過透鏡11和12， 從而在CCD攝像機14的攝像面上成像。 错射自動對焦單元丨〇是用於處理從試樣9反射的反射 20光來自動進行顯微鏡對焦的機構。此外，顯微鏡和CCD攝 像機14之間設有自動調光單元13，利用該自動調光單元13 將入射到CCD攝像機14中的光量控制爲固定量。 而且’物鏡轉換器7用於切換物鏡8來改變倍率。 在利用透射照明方式進行測量的情況下，從透射照明 6 200535396 用的照明裝置4照射的光，通過光纖5後，經透射照明頭6的 半透半反鏡20fl?、射试樣9。並且，照明單元4内的燈24例如 是鹵素燈等産生白色光的燈。 照射的光透射試樣9的透明或半透明部分後，入射到物 5 鏡8，與上述同樣地在CCD攝像機14上成像。 所成的像由CCD攝像機拍攝，轉換成圖像信號後，作 爲试樣9的圖像輸出到圖像信號圖像處理單元15。 圖像信號圖像處理單元15對輸入的圖像進行圖像處理 ，測量規定圖形的尺寸。並且，照明單元丨、4、投光管3、 10鐳射自動對焦單元1〇、物鏡轉換器7以及自動調光單元13， 通過用於改變測量條件等，由圖像處理單元15控制。 在本結構中，照明單元1和4的照明燈一般使用具有如 第9圖所示的接近白色光的連續光譜且低價的齒素燈。第9 圖是表示用作照明單itl或4的照明燈23或24的光源所發出 15 的光的光譜一個例子的圖。 專利文獻1:日本特開2003-279318號公報 例如在LCD用等基板中，作爲生成的圖形有透明導電 膜(透明電導膜），但是，這樣的在可見光區透明的材質的圖 形中’以前是利用在透明導電膜的圖形邊沿部反射的光不 2 〇入射到顯微鏡中而變暗的作絲測量圖形邊沿部。此時， 如果透明導電膜厚，則圖形邊沿部的對比度大，因此，可 充^則量。但是，隨著最近的材料成本降低和圖形的微細 化等使透明導電膜變薄，圖形邊沿部的對比度降低，以現 有技術難以測量。 7 200535396 【發明内容3 發明概要 本發明的目的在於解決上述問題，增加透明導電膜部 分和其他以外部分的對比度，容易地實現膜厚度小的透明 5 導電膜圖形的尺寸測量。 爲了實現上述目的，本發明第一方案的檢查裝置，用 顯微鏡放大在基板上形成的圖形的尺寸，進行尺寸測量， 其包括：燈，具有可見光以下的波長區的光譜；以及光學 濾光器，遮斷波長比可見光長的波長區的光成分。 10 第一方案的檢查裝置中，上述光學濾光器僅使大約 600nm以下的波長的光透射。 第一方案的檢查裝置中，上述燈在大約6〇〇11111以下的 波長下至少具有一個輝線。 第一方案的檢查裝置中，上述檢查裝置使用反射照明 15 和透射照明中的至少一種。 第一方案的檢查裝置中，上述燈在大約4〇〇11111、45〇nm 、550nm、580nm附近至少具有一個輝線。 第一方案中的上述濾光器至少具有一個輝線。 此外，本發明的第二方案的檢查裝置，用顯微鏡放大 20在基板上形成的圖形的尺寸，進行尺寸測量，其包括：燈 ，在規定的波長區内具有輝線；以及光學濾光器，使規定 波長區的光成分通過。 第二方案的檢查裝置中，上述光學濾光器通過的規定 波長區，與上述燈具有輝線的規定波長區至少重合。 200535396 、2二方案的檢查裝置中’具有多個上述燈和上述光學 濾光器’根據檢查的試樣種類切換爲任一個燈或任一個光 學濾光器。 第二方案的檢查裝置中’使用反射照明和透射照明的 5至少一種進行檢查。 圖式簡單說明 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。 第2圖是表示在本發明第一實施例的照明單元中使用 1〇的光源所發出的光的光譜一個例子的圖。 第3圖是在本發明第一實施例的照明單元中使用的光 學渡光器的透射特性圖。 第4圖是表示試樣的透明導電膜的透射特性的一個例 子的圖。 15 第5八圖、第犯圖、第5C圖是用於說明使用本發明時的 效果一個例子的圖。 第6圖是表示本發明第二實施例的尺寸測量裝置的大 致結構的框圖。 第7圖是在本發明第二實施例的照明單元中使用的光 20學濾光器的透射特性圖。 第8圖是表示現有的測量裝置大致結構的框圖。 第9圖是在現有的照明單元中使用的光源所發出的光 的光譜一個例子的圖。 9 200535396 較佳實施例之詳細說明 本發明的實施例利用透明導電膜的透射率在可見光以 下的短波長區降低的特性，通過將從照明單元照射的光限 定在透明導電膜的透射率降低的波長區，可增加透明導電 5膜和其他以外部分的對比度來測量尺寸。 因此，本發明的實施例中，冑現有的具有連續光譜的 燈變換爲具有輝線光譜的、例如水銀氣燈或齒化金屬燈， 還追加僅使從燈發出的輝線光譜内的、透明導電膜的透射 率降低的波長區透射的光學濾光器。 10 例如，在使用了水銀51燈或_化金屬燈的情況下，透 明導電膜的透射特性爲第4圖的曲線J時，使用其透射率降 低、具有可見到輝線的45〇nm附近波長的光；當透明導電膜 的透射特性爲第4圖的曲線Π的情況下，使用其透射率降低 、具有可見到輝線的55〇11111附近波長的光。 15 (第一實施例） 以下，利用第1圖至第5C圖說明該發明的實施例。 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。第2圖是表示在第一實施例的照明單元丨，及 4’中使用的燈（光源)所發出的光的光譜一個例子的圖。此外 20 ’第3圖是在第一實施例的照明單元1’及4’中使用的光學濾 光器的透射特性圖。此外，第4圖的曲線I是表示試樣9的 透明導電獏的透射特性一個例子的圖。此外，第5A圖、第 5B圖、第5C圖是用於說明使用本發明時的效果的圖。 在第1圖中，對具有與現有的第8圖相同功能的構件付 10 200535396 與相同的附圖標記。另外，丨，是反射照明方式的照明單元 ，4’是透射照明方式的照明單元，23,是照明單元丨，的燈， 24,是照明單元4,的燈，16是光學濾光器，17是渡光器切換 機構。 5 照明單兀丨’及4’内置例如水銀氙或鹵化金屬燈等在大 致400nm至600nm之間的波長區（例如4〇5腿、436腿、546咖 、578nm)具有輝線的燈23,和24,，在照明單元的射出部附 近配置僅使透明導電膜的透射率降低的波長區透射（例如 遮斷比450nm長的波長）的光學濾光器16。光學濾光器“安 10裝在濾光器切換機構17上，在進行由具有第4圖的曲線工那 樣的透射特性的透明導電膜形成的圖形的尺寸測量時，切 換至光學濾光器16。 從照明單元1，或4,的燈照射的光通過光學遽'光器16時 ，根據第3_示的光學濾光器的透射特性，僅使在比45〇· 15波長短的波長區具有輝線的光透射。這樣，從照明單元1， 照射的光通過光纖2後，經投光管3的半透半反鏡21照射試 樣9 ’或者’從從照明單元4,照射的光通過光纖谱，經透 射照明頭6的反射鏡2〇照射試樣9。 照射的光，如果是同軸落射照明則是來自試樣9的反射 2〇光，或者’如果是透射照明則是來自試樣9的透射光，入射 刻物叙8中’與現有例中記載的情況相同地在c⑶攝像機^ 上成像。 CCD攝像機14拍攝的試樣9的圖形圖像作爲圖像信號 輸出到圖像處理單元15，圖像處理單元⑸艮據輸入的圖像 11 200535396 信號進行圖像處理，測量圖形的尺寸。 這裏，鐳射自動對焦單元10、自動調光裝置13、物鏡 轉換裔7、物鏡8、半透半反鏡21、22、透鏡u、以及 圖像處理單元15，與現有例相同地動作。並且，在現有例 、土楚上圖像處理單元15的控制物件還有濾光器切換機 構17的控制。 从r况叨該作用。 如第4圖所示’透明導電膜的透射特性在可見區顯示出 10 15 大致80%的透㈣性，但在比可疏更靠近短波長一側， 透射特性急劇下降。 因此’反射照明的情況下，在透明導電膜存在於反射 率高的金屬膜上時，如果從試樣9的上部只照射波長比 〇nm短的波長區的光’雖然無透明導電膜部分(金屬膜部 分)因高反射率使反射光量多，但在透明導電膜部分，在照 射的光-旦人射透明導電膜後在金相上反射、並再次通 過電導膜後射出的㈣衰減，因此反射光量 低反射 率）。 ^因此，無透明導電膜部分和透明導電膜部分的明暗差 艾大，可根據圖形邊緣部的明暗差檢测邊緣、進行尺寸測 20 量。 在玻璃基材上直接存在透明導電膜的情況下，玻璃基 材的反射率本身低，但按照同上述相同的原理，存在透明 ‘ ％膜的。卩分變得更暗’因此，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。#，由於在透日月導電膜的 12 200535396 下面有玻璃基材，即使在玻璃基材上反射的光量哪一方都 相同，同直接入射玻璃基材後反射的光量相比’由於透射 率小於100%(在可見區也是80%)，所以通過透明導電膜射 出的光量變小。 5 再者，透射照明方式的情況下，如果從試樣9的下部只 透射照射波長比450nm短的波長區的光，由於玻璃基材部分 具有高透射特性而明亮，但存在透明導電膜的部分因透射 率低而變暗。因此，産生無透明導電膜部分和透明導電膜 部分的明暗差，可根據圖形邊緣部的明暗差檢測出邊緣， 10 進行尺寸測量。 利用第5A圖、第5B圖、第5C圖比較說明實施本發明得 到的圖像和用現有技術得到的圖像。用於取得圖像的試樣 ，使用了完全相同的試樣。 第5A圖是在照明單元中使用了現有的鹵素燈時的圖像 15 ，使用相同的試樣，金屬膜上的透明導電膜、玻璃基材上 的透明導電膜都完全不産生明暗差，因此，難以檢測邊緣 來進行尺寸測量。第5B圖是照明單元中使用鹵化金屬燈時 的圖像，同第5A圖相比，産生了金屬膜上的透明導電膜的 明暗差，但玻璃基材上的透明導電膜幾乎沒産生明暗差。 20因此，難以檢測出邊緣進行尺寸測量。第5C圖是在照明單 元中使用_化金屬燈且追加光學渡光器而得到的圖像。金 屬膜上的透明導電膜、玻璃基材上的透明導電·膜都産生明 暗差，可容易地根據圖形邊緣部的明暗差檢測出邊緣，進 行尺寸測量。 13 200535396 第5C圖的圖像是組合了内置有鹵化金屬燈的照明單元 和具有第3圖所示透射特性的光學濾、光器的一個例子，但並 不限定於此。例如，如果使用僅透射紫外線區的光學濾光 器、並在照明單元中使用水銀氙燈，則照射紫外線區的照 5 明，因此，透明導電膜的透射特性進一步降低，可得到明 暗差更明顯的圖像。 作爲光源，也考慮了用光學濾光器將具有連續光譜的 燈的光切出特定波長，但此時有光量不足的缺點，如果使 用具有輝線的燈，可有效地取出特定波長的光，可獲得檢 10 查所需的光量。 並且，在上述實施例中，在很多部分沒特意區別反射 照明和透射照明進行說明，但是，也可以同時使用反射照 明和透射照明進行檢查、或者使用任一個進行檢查。 再者，也可以利用濾光器切換機構17來切換不遮斷可 15 見光以上的長波長區的光而使用的情況和使用遮斷它的光 學濾光器的情況來使用，並進行檢查。此外，也可以具備 多個光學濾、光器的遮斷波長區進行切換控制’利用波長區 的組合進行檢查。 此外，更進一步，還可以對光學濾光器的組合、和反 20 射照明與透射照明的組合進行組合使用，進行檢查。 (第二實施例） 參照第1圖、第4圖的曲線Π、第6圖及第7圖說明本發 明的第二實施例。第4圖的曲線Π是在第二實施例使用的試 樣9’(參照第6圖）的透明導電膜的透射特性圖，第6圖是表示 14 200535396 第二實施例的尺寸測量裝置大致結構的樞圖，第7圖是第二 實施例涉及的光學濾光器16’（參照第6圖）的透射特性圖。 弟一貫施例使用透明導電膜具有弟4圖的曲線]j所示 透射特性的試樣9，，第一實施例採用了僅透射45〇nm以下波 5 長的光的光學濾光器16，但是，除了採用僅透射具有大約 550nm以下波長的光的光濾光器16，這一點，其他是相同的 。因此，在以下的第二實施例的說明中，省略與第一實施 例相同部分的說明。 參照第1圖，光學濾光器16,通過濾光器切換機構17，被 10 配置在照明單元1，或4,的射出部附近。 通過這樣的結構，從照明單元Γ或4’的燈23,或24,照射 的光’在通過光學渡光器16 ’時，根據第7圖所示的光學濾、 光器的透射特性，僅使在550nm波長附近的波長區具有輝線 的光透射。這樣，從照明單元1，照射的光中，只有55〇nm波 15 長附近的光通過光纖2後經投光管3的半透半反鏡21照射試 樣9’，或者，從照明單元4,照射的光中，只有55〇nm波長附 近的光通過光纖5後、經透射照明頭6的半透半反鏡照射試 樣9,。 照射的光，若是同軸落射照明則是來自試樣9,的反射 20光、若是透射照明則是來自試樣9,的透射光，入射到物鏡8 ，與在現有例中記載的情況相同地在CCD14上成像。 CCD攝像機14拍攝的試樣9,的圖形圖像，作爲圖像信 號輸出給圖像處理單元15，圖像處理單元15根據輸入的圖 像信號進行圖像處理，測量圖形的尺寸。 15 200535396 這裏，鐳射自動對焦單元10、自動調光裝置13、物鏡 轉換器7、物鏡8、半透半反鏡21、22、透鏡11、12以及圖 像處理單元15，與第1圖的實施例同樣地動作。 以下說明它的作用。 5 透明導電膜的透射特性如第4圖的曲線Π所示，因此， 在透明導電膜存在於反射率高的金屬膜上的情況下，如果 從試樣9’的上部只照射550nm附近的波長區的光，則無透明 導電膜部分（金屬膜部分）因高反射率而使反射光量增多，但 在透明導電膜部分，在照射的光一旦入射透明導電膜後在 10 金屬膜上反射、並再次通過電導膜射出的期間衰減，因此 反射光量少（成爲低反射率）。 因此，無透明導電膜部分和透明導電膜部分的明暗差 變大，可根據圖形邊緣部的明暗差檢測出邊緣，進行尺寸 測量。 15 在玻璃基材上直接存在透明導電膜的情況下’玻璃基 材的反射率本身低，但根據與上述相同的原理，存在透明 導電膜的部分更加變暗，因此，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。 再者，如果從試樣9’的下部只透射照射550nm波長區的 20 光，玻璃基材因具有高透射特性而明亮，但存在透明導電 膜的部分因透射率低而變暗。因此，産生無透明導電膜部 分和透明導電膜部分的明暗差，可根據圖形邊緣部的明暗 差檢測出邊緣，進行尺寸測量。 並且，在上述實施例中說明了在可見光以下的短波長 16 200535396 區的光源及濾光器的切換。但是，上述實施例以外，對於 在各種波長區具有輝線的光源的組合，以及使波長比可見 光短或長的波長區的光不通過的濾光器、或者在規定的波 長區使光通過的濾光器的組合，可根據電導膜的種類，切 5 換光源或渡光器的至少一個而使用。 此外，並不限於透明導電膜，也可適用於用各種材料 、各種制法制做的膜圖形。 發明效果 根據本發明，能夠將用現有技術無法得到的透明導電 10 膜視覺化，因此，可以根據在現有技術中無法實現的透明 導電膜的圖形邊緣部的明暗差來檢測出邊緣，進行尺寸測 量。本發明在具有透明導電膜圖形的LCD基板等的基板尺 寸測量中使有效的。 L圖式簡單說明3 15 第1圖是表示本發明第一實施例的尺寸測量裝置的大 致結構的框圖。 第2圖是表示在本發明第一實施例的照明單元中使用 的光源所發出的光的光譜一個例子的圖。 第3圖是在本發明第一實施例的照明單元中使用的光 20 學濾光器的透射特性圖。 第4圖是表不試樣的透明導電膜的透射特性的^一個例 子的圖。 第5A圖、第5B圖、第5C圖是用於說明使用本發明時的 效果一個例子的圖。 17 200535396 第6圖是表示本發明第二實施例的尺寸測量裝置的大 致結構的框圖。 第7圖是在本發明第二實施例的照明單元中使用的光 學濾光器的透射特性圖。 第8圖是表示現有的測量裝置大致結構的框圖。 第9圖是在現有的照明單元中使用的光源所發出的光 的光譜一個例子的圖。 【主要元件符號說明】L · J Background of the Invention The size measuring device of a substrate (such as an LCD (liquid crystal) substrate) is an inspection device as follows: · A figure obtained by illuminating a figure 10 formed on a substrate (sample) such as glass by illuminating it with a microscope. For image processing, image processing is performed on a graphic image obtained by capturing the image with a CCD (Charge Mixing Device) camera to measure the size. Examples of the method of irradiating the sample with illumination light include a reflection illumination method in which an image obtained by the reflected light is irradiated with a coaxial epi-illumination method from a microscope, and 15 is a method of irradiating the microscope with illumination light from the back surface of the sample and processing the transmission. Transmitted illumination of images obtained by light. However, in the measurement of LCD substrates, there are usually two mechanisms that implement two types of illumination, and they are distinguished according to the pattern of the object to be inspected. During the manufacturing process of the substrate for LCD, the sizes of the resist film pattern used to generate the target pattern 20 and the generated metal film, transparent or translucent film are measured. The dimensional measurement of these figures is realized as a prior art with the structure shown in FIG. Fig. 8 is a block diagram showing a schematic configuration of a conventional measurement device. 1 疋 Knowledge and light mechanism of the reflection illumination method '3 is a light-emitting tube, 2 is an optical fiber led from the lighting mechanism 1 to the light-emitting tube 3, 4 is a 200535396 lighting unit of a transmission lighting method, and 6 is a transmission lighting head , 5 is the optical fiber output from the lighting unit 4 to the transillumination head 6, 7 is the objective lens converter, 8 is the objective lens, 9 is the sample '10 is the misfire autofocus unit' 11 and 12 are lenses, 13 is Automatic dimming mechanism, 14 is a CCD camera, 15 is an image processing unit, 20 is a reflecting mirror in a 5-light illumination head 6, 21 is a semi-transparent mirror in a light pipe 3, and 22 is a laser autofocus A half mirror in the unit 10, 23 is a lamp of the lighting unit 1, and 24 is a lamp of the lighting unit 4. In addition, the microscope at least roughly includes: illumination units 1, 4, optical fibers 2, 5, a light pipe 3, a transillumination head 6, a reflector 20 mounted on the transillumination head 6, an objective lens converter 7, and an objective lens 10 The objective lens 8 on the converter 7, the laser autofocus unit 10, the half mirrors 21 and 22, the lenses 11 and 12, and a sample stage (not shown) for fixing the sample 9. In Fig. 8, light ′ irradiated from the illumination unit 1 for coaxial epi-illumination is passed through the optical fiber 2, and then the sample 9 is irradiated through the half mirror 21 and the objective lens 8 of the light-emitting tube 3. The lamp 23 in the lighting unit 1 is, for example, a lamp that generates white 15 light such as a halogen lamp. The light reflected from the sample 9 passes through the half mirror 21 of the light-emitting tube 3 and the half mirror 22 of the laser autofocus unit 10, and then passes through the lenses 11 and 12 to form an image on the imaging surface of the CCD camera 14. . The stray autofocus unit is a mechanism for automatically performing microscope focusing by processing the reflected 20 light reflected from the sample 9. Further, an automatic dimming unit 13 is provided between the microscope and the CCD camera 14, and the amount of light incident on the CCD camera 14 is controlled to a fixed amount by the automatic dimming unit 13. The 'objective converter 7 is used to switch the objective lens 8 to change the magnification. In the case of measurement using the transmission illumination method, the light irradiated from the illumination device 4 for transmission illumination 6 200535396 passes through the optical fiber 5 and passes through the transflective mirror 20fl of the transmission illumination head 6 and the sample 9 is shot. The lamp 24 in the lighting unit 4 is, for example, a lamp that generates white light, such as a halogen lamp. The irradiated light passes through the transparent or translucent portion of the sample 9 and enters the objective lens 8 to form an image on the CCD camera 14 as described above. The resulting image is captured by a CCD camera, and after being converted into an image signal, it is output to the image signal image processing unit 15 as an image of the sample 9. The image signal image processing unit 15 performs image processing on an input image, and measures a size of a predetermined pattern. In addition, the illumination units 丨, 4, the light emitting tubes 3, 10, the laser autofocus unit 10, the objective lens converter 7, and the automatic dimming unit 13 are controlled by the image processing unit 15 for changing measurement conditions and the like. In this configuration, the lighting units of the lighting units 1 and 4 generally use a low-priced gear element lamp having a continuous spectrum close to white light as shown in FIG. Fig. 9 is a diagram showing an example of a spectrum of light emitted by a light source of a lighting lamp 23 or 24 used as a lighting unit it1 or 4; Patent Document 1: Japanese Patent Application Laid-Open No. 2003-279318 For example, in a substrate such as an LCD, a transparent conductive film (transparent conductive film) is used as a generated pattern. However, in a pattern made of a material that is transparent in the visible light region, such a pattern was previously The edge of the pattern was measured using a wire that was reflected by the transparent conductive film at the edge of the pattern and did not enter the microscope and darkened. At this time, if the thickness of the transparent conductive film is large, the contrast of the edge portion of the pattern is large, so it can be sufficient. However, with the recent reduction in material costs and the miniaturization of patterns, the thickness of the transparent conductive film has been reduced, and the contrast at the edges of the patterns has been reduced, making it difficult to measure with the existing technology. 7 200535396 [Summary of the invention 3 Summary of the invention The purpose of the present invention is to solve the above-mentioned problems, increase the contrast of the transparent conductive film portion and other portions, and easily realize the measurement of the size of the transparent conductive film pattern with a small film thickness. In order to achieve the above object, the inspection device of the first aspect of the present invention uses a microscope to magnify the size of a pattern formed on a substrate and perform dimensional measurement, which includes: a lamp having a spectrum in a wavelength region below visible light; and an optical filter, Blocks light components in a wavelength region longer than visible light. 10 In the inspection device according to the first aspect, the optical filter transmits only light having a wavelength of approximately 600 nm or less. In the inspection device according to the first aspect, the lamp has at least one glow line at a wavelength of about 60011111 or less. In the inspection apparatus according to the first aspect, the inspection apparatus uses at least one of reflected illumination 15 and transmitted illumination. In the inspection device according to the first aspect, the lamp has at least one bright line in the vicinity of about 40011111, 4500nm, 550nm, and 580nm. The filter in the first aspect has at least one glow line. In addition, the inspection device of the second aspect of the present invention uses a microscope to magnify 20 the size of a pattern formed on a substrate and performs dimensional measurement, which includes: a lamp having a glow line in a predetermined wavelength region; and an optical filter to make Light components in a predetermined wavelength region pass. In the inspection device according to the second aspect, the predetermined wavelength region through which the optical filter passes coincides at least with the predetermined wavelength region in which the lamp has a glow line. In the inspection device of the 200535396 and 22nd schemes, 'the plurality of lamps and the optical filters' are switched to any one of the lamps or any of the optical filters according to the type of the sample to be inspected. In the inspection apparatus of the second aspect, the inspection is performed using at least one of reflected illumination and transmitted illumination. Brief Description of the Drawings Fig. 1 is a block diagram showing a general configuration of a size measuring device according to a first embodiment of the present invention. Fig. 2 is a diagram showing an example of a spectrum of light emitted from a light source of 10 in the lighting unit according to the first embodiment of the present invention. Fig. 3 is a transmission characteristic diagram of an optical crossing device used in the lighting unit according to the first embodiment of the present invention. Fig. 4 is a diagram showing an example of the transmission characteristics of a transparent conductive film of a sample. 15 Figs. 5A to 8C, 5C to 5C are diagrams for explaining an example of the effect when the present invention is used. Fig. 6 is a block diagram showing a general configuration of a size measuring device according to a second embodiment of the present invention. Fig. 7 is a transmission characteristic diagram of an optical filter used in a lighting unit according to a second embodiment of the present invention. Fig. 8 is a block diagram showing a schematic configuration of a conventional measurement device. Fig. 9 is a diagram showing an example of a spectrum of light emitted from a light source used in a conventional lighting unit. 9 200535396 Detailed description of the preferred embodiment The embodiment of the present invention utilizes the characteristic that the transmittance of the transparent conductive film is reduced in a short wavelength region below visible light, and limits the light transmittance of the transparent conductive film to be reduced by limiting the light emitted from the lighting unit to the transparent conductive film. In the wavelength region, the size can be increased by increasing the contrast of the transparent conductive 5 film and other parts. Therefore, in the embodiment of the present invention, a conventional lamp with a continuous spectrum is converted into a glow-ray spectrum, such as a mercury gas lamp or a toothed metal lamp, and a transparent conductive film is added to only the glow-ray spectrum emitted from the lamp. Optical filters that transmit light in a region of reduced wavelength. 10 For example, when using a mercury 51 lamp or a metallized metal lamp, when the transmission characteristic of the transparent conductive film is the curve J in Fig. 4, use the one with a reduced transmittance and a wavelength of around 45nm with visible bright lines. Light; when the transmission characteristic of the transparent conductive film is the curve Π in FIG. 4, light having a wavelength in the vicinity of 5501111 where the transmittance is reduced is used. 15 (First Embodiment) Hereinafter, embodiments of the present invention will be described with reference to Figs. 1 to 5C. Fig. 1 is a block diagram showing a general configuration of a size measuring device according to a first embodiment of the present invention. Fig. 2 is a diagram showing an example of a spectrum of light emitted from a lamp (light source) used in the lighting unit 丨 and 4 'of the first embodiment. 20 'FIG. 3 is a transmission characteristic diagram of the optical filters used in the lighting units 1' and 4 'of the first embodiment. The curve I in FIG. 4 is a diagram showing an example of the transmission characteristics of the transparent conductive plate of the sample 9. 5A, 5B, and 5C are diagrams for explaining the effects when the present invention is used. In Fig. 1, components having the same functions as those in the conventional Fig. 8 are assigned with the same reference numerals. In addition, 丨 is a lighting unit of a reflection lighting method, 4 'is a lighting unit of a transmission lighting method, 23, is a lamp of the lighting unit, 24, is a lamp of the lighting unit 4, and 16 is an optical filter, 17 It is a light switch mechanism. 5 Illumination units: 'and 4' Built-in lamps with glow lines in the wavelength range of approximately 400nm to 600nm (such as legs of 405, 436, 546, and 578nm) such as mercury xenon or metal halide lamps 23, and 24. An optical filter 16 is disposed near the emission portion of the lighting unit to transmit only the wavelength region in which the transmittance of the transparent conductive film is reduced (for example, to block a wavelength longer than 450 nm). The optical filter "A10" is mounted on the filter switching mechanism 17, and is switched to the optical filter 16 when measuring the size of a pattern formed by a transparent conductive film having a transmission characteristic such as that of the graph of Fig. 4 When the light irradiated from the lamps of the lighting unit 1, or 4, passes through the optical filter 16, the transmission characteristics of the optical filter shown in FIG. The light with the glow line is transmitted. In this way, after the irradiated light passes through the optical fiber 2 from the illuminating unit 1, the sample 9 is irradiated through the half mirror 21 of the light projection tube 3 or the irradiated light passes from the illuminating unit 4. Optical fiber spectrum, irradiate the sample 9 through the reflection mirror 20 of the transillumination head 6. The irradiated light, if it is coaxial epi-illumination, is the reflected 20 light from the sample 9, or 'if it is transmitted illumination, it is from the sample The transmitted light of 9 is incident on the inscription 8 and is imaged on the cCCD camera ^ as in the case described in the conventional example. The graphic image of the sample 9 captured by the CCD camera 14 is output to the image processing unit as an image signal. 15, the image processing unit ⑸ according to the input image 11 2 00535396 signal to perform image processing and measure the size of the graphics. Here, the laser autofocus unit 10, the auto-dimming device 13, the objective conversion lens 7, the objective lens 8, the transflective mirrors 21 and 22, the lens u, and image processing The unit 15 operates in the same manner as the conventional example. In addition, in the conventional example, the control object of the image processing unit 15 and the control of the filter switching mechanism 17 are controlled by the filter. This effect is shown in r. As shown in FIG. 4 It shows that the transmission characteristics of the transparent conductive film show a permeability of 10 15 and about 80% in the visible region, but the transmission characteristics decrease sharply closer to the short wavelength side than Kosho. Therefore, in the case of reflective lighting, the transparency is transparent. When a conductive film is present on a metal film with high reflectance, if only light in a wavelength region shorter than 0 nm is irradiated from the upper portion of the sample 9, although the transparent conductive film portion (metal film portion) is reflected by the high reflectance, The amount of light is large, but in the transparent conductive film part, after the irradiated light-once the transparent conductive film is emitted, it is reflected on the metallographic phase and the radon emitted after passing through the conductive film attenuates again, so the reflected light amount is low and the reflectance is low. ^ Therefore The brightness difference between the transparent conductive film part and the transparent conductive film part is large, and the edge can be detected based on the brightness difference between the graphic edge part and the size measurement. 20 When the transparent conductive film is directly on the glass substrate, the glass-based The reflectivity of the material itself is low, but according to the same principle as above, there is a transparent '% film. The moisture content becomes darker'. Therefore, the edge can be detected based on the difference between the light and dark of the edge of the figure, and the size can be measured. #, Because There is a glass substrate under the transparent solar film 12 200535396. Even if the amount of light reflected on the glass substrate is the same, compared with the amount of light reflected after directly incident on the glass substrate, the transmittance is less than 100% (in The visible area is also 80%), so the amount of light emitted through the transparent conductive film becomes small. 5 Furthermore, in the case of the transmission illumination method, if only light with a wavelength range shorter than 450 nm is transmitted from the lower portion of the sample 9, the glass substrate portion has high transmission characteristics and is bright, but a portion having a transparent conductive film is present. Darkness due to low transmittance. Therefore, there is a difference in brightness between the transparent conductive film portion and the transparent conductive film portion, and the edge can be detected based on the difference between the brightness and darkness in the edge portion of the pattern, and the size can be measured. 5A, 5B, and 5C are used to compare and explain an image obtained by implementing the present invention and an image obtained by a conventional technique. The sample used to obtain the image used the exact same sample. Fig. 5A is an image 15 when a conventional halogen lamp is used in the lighting unit. Using the same sample, the transparent conductive film on the metal film and the transparent conductive film on the glass substrate do not produce a difference in brightness at all, so It is difficult to detect edges for dimensional measurement. Fig. 5B is an image when a metal halide lamp is used in the lighting unit. Compared with Fig. 5A, the brightness difference between the transparent conductive film on the metal film is generated, but the brightness difference between the transparent conductive film on the glass substrate is hardly generated. . 20 Therefore, it is difficult to detect an edge for dimensional measurement. Fig. 5C is an image obtained by using a metalized lamp in an illumination unit and adding an optical crossover. Both the transparent conductive film on the metal film and the transparent conductive film on the glass substrate produce a difference in light and dark. The edge can be easily detected based on the difference in light and dark on the edge of the pattern, and the size can be measured. 13 200535396 The image in FIG. 5C is an example of a combination of a lighting unit with a built-in metal halide lamp and an optical filter and optical filter having the transmission characteristics shown in FIG. 3, but it is not limited thereto. For example, if an optical filter that transmits only the ultraviolet region is used, and a mercury-xenon lamp is used in the lighting unit, the illumination of the ultraviolet region is illuminated. Therefore, the transmission characteristics of the transparent conductive film are further reduced, and a more significant difference in brightness and darkness can be obtained. image. As a light source, it is also considered that the light of a lamp with a continuous spectrum is cut to a specific wavelength with an optical filter, but there is a disadvantage of insufficient light quantity at this time. If a lamp with a bright line is used, light of a specific wavelength can be effectively taken out. Obtain the amount of light needed for inspection. Moreover, in the above-mentioned embodiment, many parts are not specifically distinguished from the reflection illumination and the transmission illumination for explanation. However, the inspection may be performed by using the reflection illumination and the transmission illumination at the same time, or by using either of them. In addition, the filter switching mechanism 17 can also be used when switching between using the light without blocking the light in the long wavelength range above 15 visible light and when using the optical filter that blocks it, and check it. . In addition, a plurality of optical filters and optical devices may be provided for switching the cut-off wavelength region to perform switching control. The inspection may be performed using a combination of wavelength regions. Furthermore, a combination of an optical filter and a combination of reflective and transmitted illumination can be used for inspection. (Second Embodiment) A second embodiment of the present invention will be described with reference to the curves Π, 6 and 7 of Figs. The curve Π in FIG. 4 is a transmission characteristic diagram of the transparent conductive film of the sample 9 ′ (refer to FIG. 6) used in the second embodiment, and FIG. 6 is a diagram showing the general structure of a dimensional measuring device according to the second embodiment. FIG. 7 is a transmission characteristic diagram of the optical filter 16 ′ (see FIG. 6) according to the second embodiment. The conventional example uses a transparent conductive film having a transmission characteristic of the curve shown in Figure 4.] Sample 9, the first embodiment uses an optical filter 16 that transmits only light having a wavelength of less than 5 nm and a wavelength of 5 However, it is the same except that the optical filter 16 that transmits only light having a wavelength of about 550 nm or less is used. Therefore, in the following description of the second embodiment, the description of the same parts as those of the first embodiment is omitted. Referring to FIG. 1, the optical filter 16 is disposed near the emitting portion of the lighting unit 1, or 4, by the filter switching mechanism 17, through the filter switching mechanism 17. With such a structure, when the light 'or 23' or 24 'from the lighting unit Γ or 4' passes through the optical cross-over device 16 ', according to the transmission characteristics of the optical filter and optical device shown in Fig. 7, only Light having a bright line in a wavelength region near a wavelength of 550 nm is transmitted. In this way, from the illumination unit 1, only light having a wavelength of about 55 nm and a wavelength of 15 passes through the optical fiber 2 and then irradiates the sample 9 ′ through the half mirror 21 of the light pipe 3, or from the illumination unit 4 Of the irradiated light, only light having a wavelength of about 55 nm passes through the optical fiber 5 and then irradiates the sample 9 through the transflective lens of the transillumination head 6. If the irradiated light is coaxial epi-illumination, it is reflected 20 light from the sample 9, and if it is transmitted illumination, it is transmitted light from the sample 9, and enters the objective lens 8 as in the case described in the conventional example. Imaged on the CCD14. The graphic image of the sample 9, taken by the CCD camera 14, is output as an image signal to the image processing unit 15, and the image processing unit 15 performs image processing according to the input image signal, and measures the size of the graphic. 15 200535396 Here, the laser autofocus unit 10, the auto-dimming device 13, the objective lens converter 7, the objective lens 8, the transflective mirrors 21 and 22, the lenses 11, 12 and the image processing unit 15 are implemented as shown in FIG. The example operates in the same way. The effect is explained below. 5 The transmission characteristics of the transparent conductive film are as shown by the curve Π in FIG. 4. Therefore, when the transparent conductive film exists on a metal film with high reflectance, if the wavelength near 550 nm is irradiated from the upper part of the sample 9 ′ In the area where there is no transparent conductive film portion (metal film portion), the amount of reflected light increases due to high reflectance, but in the transparent conductive film portion, once the irradiated light enters the transparent conductive film, it is reflected on the 10 metal film, and Attenuation during the period when it passes through the conductive film again, the amount of reflected light is small (low reflectance). Therefore, the difference between light and dark in the non-transparent conductive film portion and the transparent conductive film portion becomes large, and the edge can be detected based on the difference in light and dark in the edge portion of the pattern, and the size can be measured. 15 When a transparent conductive film is directly on a glass substrate 'The reflectance of the glass substrate itself is low, but according to the same principle as above, the portion where the transparent conductive film is present becomes darker. The difference between light and dark is used to detect the edge and the size is measured. Furthermore, if only 20 light irradiating the 550 nm wavelength region is transmitted from the lower portion of the sample 9 ', the glass substrate is bright due to its high transmission characteristics, but the portion where the transparent conductive film is present becomes dark due to its low transmittance. Therefore, there is a difference in light and dark between the non-transparent conductive film portion and the transparent conductive film portion, and the edge can be detected based on the difference in light and dark in the edge portion of the pattern, and the size can be measured. Moreover, in the above embodiment, the switching of the light source and the filter in the short-wavelength region 16 200535396 below the visible light was described. However, in addition to the above embodiments, a combination of light sources having glow lines in various wavelength ranges, and a filter that does not allow light in a wavelength range shorter or longer than visible light to pass, or a filter that passes light in a predetermined wavelength range The combination of light devices can be used by changing at least one of the light source or the light source according to the type of the conductive film. In addition, it is not limited to transparent conductive films, and can also be applied to film patterns made of various materials and various manufacturing methods. ADVANTAGE OF THE INVENTION According to this invention, since the transparent conductive 10 film which cannot be obtained with the prior art can be visualized, the edge can be detected based on the brightness difference of the edge part of the pattern of the transparent conductive film which cannot be achieved with the prior art, and dimension measurement can be performed. . The present invention is effective for measuring the size of a substrate such as an LCD substrate having a transparent conductive film pattern. Brief Description of L Drawings 3 15 FIG. 1 is a block diagram showing a general configuration of a size measuring device according to a first embodiment of the present invention. Fig. 2 is a diagram showing an example of a spectrum of light emitted from a light source used in the lighting unit according to the first embodiment of the present invention. Fig. 3 is a transmission characteristic diagram of an optical filter used in the lighting unit according to the first embodiment of the present invention. Fig. 4 is a diagram showing an example of the transmission characteristics of a transparent conductive film of a sample. 5A, 5B, and 5C are diagrams for explaining an example of the effect when the present invention is used. 17 200535396 Fig. 6 is a block diagram showing a general configuration of a size measuring device according to a second embodiment of the present invention. Fig. 7 is a transmission characteristic diagram of an optical filter used in a lighting unit according to a second embodiment of the present invention. Fig. 8 is a block diagram showing a schematic configuration of a conventional measurement device. Fig. 9 is a diagram showing an example of a spectrum of light emitted from a light source used in a conventional lighting unit. [Description of main component symbols]
13.. .自動調光機構 14.. .CCD攝像機 15…圖像處理單元 16，16’…光學濾光器 17，17’..·切換機構 20.. .反射鏡 21，22...半透半反鏡 23,24,23’，24’...燈 1，4，1’，4’...照明單元 2.5.. .光纖 3.. .投光管 6.. .透射照明頭 7…物鏡轉換器 8.. .物鏡 9,9’...試樣 10…鐳射自動對焦單元 11，12...透鏡 1813 .. Auto-dimming mechanism 14 .. CCD camera 15 ... Image processing unit 16, 16 '... Optical filter 17, 17' ... Switching mechanism 20. Reflector 21, 22 ... Half mirrors 23,24,23 ', 24' ... lights 1,4,1 ', 4' ... lighting unit 2.5..optical fiber 3..light tube 6..transmitted illumination Head 7 ... objective converter 8..objective lens 9,9 '... sample 10 ... laser autofocus unit 11,12 ... lens 18