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TW200503823A - Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases - Google Patents

Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Info

Publication number
TW200503823A
TW200503823A TW093113633A TW93113633A TW200503823A TW 200503823 A TW200503823 A TW 200503823A TW 093113633 A TW093113633 A TW 093113633A TW 93113633 A TW93113633 A TW 93113633A TW 200503823 A TW200503823 A TW 200503823A
Authority
TW
Taiwan
Prior art keywords
treatment
section
chlorine trifluoride
reagent
containing chlorine
Prior art date
Application number
TW093113633A
Other languages
Chinese (zh)
Other versions
TWI361104B (en
Inventor
Yoichi Mori
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of TW200503823A publication Critical patent/TW200503823A/en
Application granted granted Critical
Publication of TWI361104B publication Critical patent/TWI361104B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/16—Alumino-silicates
    • B01J20/18—Synthetic zeolitic molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
    • B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
    • B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)

Abstract

The improved apparatus for treating emissions containing chlorine trifluoride (ClF3) and other inorganic halogenated gases comprises a first section of treatment (10) packed with a chlorine trifluoride decomposer and a second section of treatment (20) packed with a chlorine remover. The first section of treatment (10) is provided upstream of the second section of treatment (20) so that the emission gas passes through the first section of treatment (10) before passing through the second section of treatment (20).
TW093113633A 2003-05-30 2004-05-14 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases TWI361104B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003154219A JP4564242B2 (en) 2003-05-30 2003-05-30 Treatment method, treatment agent and treatment apparatus for exhaust gas containing inorganic halogenated gas containing chlorine trifluoride

Publications (2)

Publication Number Publication Date
TW200503823A true TW200503823A (en) 2005-02-01
TWI361104B TWI361104B (en) 2012-04-01

Family

ID=34048944

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113633A TWI361104B (en) 2003-05-30 2004-05-14 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Country Status (4)

Country Link
JP (1) JP4564242B2 (en)
KR (1) KR101178179B1 (en)
SG (1) SG111184A1 (en)
TW (1) TWI361104B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114538380A (en) * 2021-01-29 2022-05-27 福建德尔科技有限公司 Electronic-grade chlorine trifluoride purification system and temperature difference power control method thereof

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553705B2 (en) * 2004-12-02 2010-09-29 大陽日酸株式会社 Abatement device and its management method
MY151251A (en) 2007-10-26 2014-04-30 Asahi Kasei Chemicals Corp Supported composite particle material, production process of same and process for producing compounds using supported composite particle material as catalyst for chemical synthesis
JP5471313B2 (en) * 2008-12-11 2014-04-16 セントラル硝子株式会社 Methods for removing chlorine trifluoride
JP5626849B2 (en) * 2010-05-07 2014-11-19 学校法人 関西大学 Method for decomposing fluorine gas with zeolite
JP6252153B2 (en) * 2013-12-12 2017-12-27 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP2015112544A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP2015112545A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP2015112546A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP2016221428A (en) * 2015-05-28 2016-12-28 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP7253132B2 (en) * 2018-07-30 2023-04-06 クラリアント触媒株式会社 Halogen gas remover, method for producing same, and method for monitoring consumption of remover
CN116902922B (en) * 2023-09-13 2023-12-05 福建省巨颖高能新材料有限公司 Device and method for preparing industrial grade chlorine pentafluoride

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217217A (en) * 1990-01-19 1991-09-25 Central Glass Co Ltd Treatment of waste gas containing chlorine trifluoride
JPH06177B2 (en) * 1990-02-05 1994-01-05 株式会社荏原総合研究所 Method for treating exhaust gas containing C1F (bottom 3)
JPH0716583B2 (en) * 1990-08-10 1995-03-01 セントラル硝子株式会社 Method for dry treatment of exhaust gas containing chlorine fluoride
JPH10263367A (en) * 1997-03-27 1998-10-06 Aiwa Co Ltd Deodorization device
JPH10290920A (en) * 1997-04-22 1998-11-04 Hitachi Ltd High Corrosion Resistant Exhaust Body Decomposition Equipment and Semiconductor Manufacturing Equipment
JP3981206B2 (en) * 1997-06-20 2007-09-26 株式会社荏原製作所 Method and apparatus for treating exhaust gas containing inorganic halogenated gas
JP2000117053A (en) * 1998-10-16 2000-04-25 Tomoe Shokai:Kk Chlorine trifluoride treating cylinder and treatment of gas to be treated containing chlorine trifluoride
JP4913271B2 (en) * 1999-07-07 2012-04-11 ズードケミー触媒株式会社 Halogen gas treatment agent
JP3600073B2 (en) 1999-07-14 2004-12-08 セントラル硝子株式会社 Improved microbial pesticide formulation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114538380A (en) * 2021-01-29 2022-05-27 福建德尔科技有限公司 Electronic-grade chlorine trifluoride purification system and temperature difference power control method thereof
CN114538380B (en) * 2021-01-29 2022-10-14 福建德尔科技股份有限公司 Electronic-grade chlorine trifluoride purification system and temperature difference power control method thereof

Also Published As

Publication number Publication date
JP4564242B2 (en) 2010-10-20
TWI361104B (en) 2012-04-01
KR101178179B1 (en) 2012-08-29
JP2004351364A (en) 2004-12-16
KR20040103406A (en) 2004-12-08
SG111184A1 (en) 2005-05-30

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Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent