[go: up one dir, main page]

TW200501145A - Optical recording medium, method for manufacturing the same and target used for sputtering process - Google Patents

Optical recording medium, method for manufacturing the same and target used for sputtering process

Info

Publication number
TW200501145A
TW200501145A TW093107341A TW93107341A TW200501145A TW 200501145 A TW200501145 A TW 200501145A TW 093107341 A TW093107341 A TW 093107341A TW 93107341 A TW93107341 A TW 93107341A TW 200501145 A TW200501145 A TW 200501145A
Authority
TW
Taiwan
Prior art keywords
recording medium
optical recording
manufacturing
same
sputtering process
Prior art date
Application number
TW093107341A
Other languages
English (en)
Inventor
Yasuo Hosoda
Ayumi Mitsumori
Megumi Sato
Masataka Yamaguchi
Tetsuya Iida
Hiroyasu Inoue
Koji Mishima
Masaki Aoshima
Original Assignee
Tdk Corp
Pioneer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tdk Corp, Pioneer Corp filed Critical Tdk Corp
Publication of TW200501145A publication Critical patent/TW200501145A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/266—Sputtering or spin-coating layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302—Metals or metalloids
    • G11B2007/24306—Metals or metalloids transition metal elements of groups 3-10
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302—Metals or metalloids
    • G11B2007/24312—Metals or metalloids group 14 elements (e.g. Si, Ge, Sn)
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/21—Circular sheet or circular blank

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
TW093107341A 2003-03-24 2004-03-18 Optical recording medium, method for manufacturing the same and target used for sputtering process TW200501145A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003080745A JP2004284241A (ja) 2003-03-24 2003-03-24 光記録媒体及び光記録媒体用スパッタリングターゲット

Publications (1)

Publication Number Publication Date
TW200501145A true TW200501145A (en) 2005-01-01

Family

ID=32821429

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093107341A TW200501145A (en) 2003-03-24 2004-03-18 Optical recording medium, method for manufacturing the same and target used for sputtering process

Country Status (5)

Country Link
US (1) US6929840B2 (zh)
EP (1) EP1463044A3 (zh)
JP (1) JP2004284241A (zh)
CN (1) CN1299285C (zh)
TW (1) TW200501145A (zh)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040073617A1 (en) 2000-06-19 2004-04-15 Milliken Walter Clark Hash-based systems and methods for detecting and preventing transmission of unwanted e-mail
US20030190551A1 (en) * 2002-04-05 2003-10-09 Tdk Corporation Optical recording medium and method for optically recording information in the same
US7479363B2 (en) * 2002-04-26 2009-01-20 Tdk Corporation Optical recording medium and method for optically recording data in the same
US7231649B2 (en) * 2002-05-31 2007-06-12 Tdk Corporation Optical recording medium and method for optically recording data in the same
JP4092147B2 (ja) * 2002-07-04 2008-05-28 Ｔｄｋ株式会社 光記録媒体及び光記録方法
JP4282285B2 (ja) * 2002-08-12 2009-06-17 Ｔｄｋ株式会社 光記録媒体及び光記録方法
US20040076907A1 (en) * 2002-10-22 2004-04-22 Tdk Corporation Optical recording medium and method for manufacturing the same
US7781146B2 (en) 2002-11-22 2010-08-24 Tdk Corporation Optical recording medium
US7932015B2 (en) * 2003-01-08 2011-04-26 Tdk Corporation Optical recording medium
JP4084674B2 (ja) * 2003-01-28 2008-04-30 Ｔｄｋ株式会社 光記録媒体
JP4053916B2 (ja) * 2003-03-24 2008-02-27 Ｔｄｋ株式会社 光記録媒体及び光記録媒体用スパッタリングターゲット
TW200615935A (en) * 2004-11-02 2006-05-16 Ritek Corp One-time writing high-density optical information recording medium
TWI267846B (en) * 2004-11-25 2006-12-01 Ritek Corp Dual-layer recordable optical disc and manufacturing method thereof
US7235501B2 (en) 2004-12-13 2007-06-26 Micron Technology, Inc. Lanthanum hafnium oxide dielectrics
US7560395B2 (en) 2005-01-05 2009-07-14 Micron Technology, Inc. Atomic layer deposited hafnium tantalum oxide dielectrics
US7410910B2 (en) 2005-08-31 2008-08-12 Micron Technology, Inc. Lanthanum aluminum oxynitride dielectric films
US7972974B2 (en) 2006-01-10 2011-07-05 Micron Technology, Inc. Gallium lanthanide oxide films
US7563730B2 (en) 2006-08-31 2009-07-21 Micron Technology, Inc. Hafnium lanthanide oxynitride films
US7776765B2 (en) 2006-08-31 2010-08-17 Micron Technology, Inc. Tantalum silicon oxynitride high-k dielectrics and metal gates
US7605030B2 (en) 2006-08-31 2009-10-20 Micron Technology, Inc. Hafnium tantalum oxynitride high-k dielectric and metal gates
US7432548B2 (en) 2006-08-31 2008-10-07 Micron Technology, Inc. Silicon lanthanide oxynitride films
US7544604B2 (en) 2006-08-31 2009-06-09 Micron Technology, Inc. Tantalum lanthanide oxynitride films
US7759747B2 (en) 2006-08-31 2010-07-20 Micron Technology, Inc. Tantalum aluminum oxynitride high-κ dielectric
JP4678062B2 (ja) 2008-09-22 2011-04-27 Ｔｄｋ株式会社 光メディア、およびその製造方法
JP5012984B2 (ja) * 2008-09-22 2012-08-29 Ｔｄｋ株式会社 光メディアの反射層用スパッタリングターゲット、及び、その製造方法
JP4735734B2 (ja) * 2009-04-02 2011-07-27 Ｔｄｋ株式会社 光メディア用スパッタリングターゲット、その製造方法、ならびに、光メディア、およびその製造方法
KR20160044049A (ko) 2011-09-30 2016-04-22 제이엑스 킨조쿠 가부시키가이샤 Ｆｅ－Ａｌ계 합금 스퍼터링 타깃

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5764596A (en) * 1980-10-06 1982-04-19 Fuji Photo Film Co Ltd Heat mode recording material
JPS59154643A (ja) * 1983-02-24 1984-09-03 Fuji Photo Film Co Ltd 磁気記録媒体
JPS62183042A (ja) * 1986-02-06 1987-08-11 Toshiba Corp 情報記録再生方法
JPS62204442A (ja) 1986-03-03 1987-09-09 Toshiba Corp 光記録媒体および光記録媒体の記録方法
DE3783353D1 (de) * 1986-07-22 1993-02-11 Mitsubishi Electric Corp Optische speicherplatte.
JPH05214524A (ja) * 1992-02-05 1993-08-24 Toshiba Corp 磁性スパッタターゲットおよびそれを用いて形成した 磁性薄膜
JP2911687B2 (ja) * 1992-09-25 1999-06-23 キヤノン株式会社 磁気ヘッドの製造方法
US5549953A (en) * 1993-04-29 1996-08-27 National Research Council Of Canada Optical recording media having optically-variable security properties
US5589221A (en) * 1994-05-16 1996-12-31 Matsushita Electric Industrial Co., Ltd. Magnetic thin film, and method of manufacturing the same, and magnetic head
US5958649A (en) * 1995-03-27 1999-09-28 Hitachi, Ltd. Information recording medium and information memory apparatus
US6479121B1 (en) * 1999-09-21 2002-11-12 Ricoh Company, Ltd. Optical recording medium and method of fabricating same
JP3731640B2 (ja) * 1999-11-26 2006-01-05 株式会社日立グローバルストレージテクノロジーズ 垂直磁気記録媒体及び磁気記憶装置
JP2004013947A (ja) * 2002-06-04 2004-01-15 Victor Co Of Japan Ltd 情報記録担体、再生装置、記録装置、記録再生装置、再生方法、記録方法及び記録再生方法
TWI220523B (en) * 2003-05-26 2004-08-21 Ritek Corp Write once recording medium

Also Published As

Publication number Publication date
JP2004284241A (ja) 2004-10-14
EP1463044A3 (en) 2005-06-01
EP1463044A2 (en) 2004-09-29
CN1542792A (zh) 2004-11-03
CN1299285C (zh) 2007-02-07
US6929840B2 (en) 2005-08-16
US20040191462A1 (en) 2004-09-30

Similar Documents

Publication Publication Date Title
TW200501145A (en) Optical recording medium, method for manufacturing the same and target used for sputtering process
TW200501143A (en) Optical recording medium, method for manufacturing the same and target used for sputtering process
CA2521007A1 (en) Particulate material containing thermoplastic elastomer and methods for making and using same
ATE483830T1 (de) Verbesserte pulvermetallurgiezusammensetzung
WO2006007841A3 (en) Heat-induced antigen retrieval methods and compositions therefor
WO2002072605A3 (en) Expression technology for proteins containing a hybrid isotype antibody moiety
WO2002066603A3 (en) Chemically defined medium for cultured mammalian cells
BRPI0409569A (pt) chapa de aço revestida de zinco fundido de alta resistência e processo de produção da mesma
GB2392674A (en) Mesenchymal cells and osteoblasts from human embryonic stem cell
MY122641A (en) Polishing composition and method for producing a memory hard disks
ZA200700040B (en) Stainless steel powder
CA2446178A1 (en) Inoculants for intermetallic layer
EP2261310A3 (en) High solids content dispersions and grease compositions containing them
Hsu et al. Peptidyl-prolyl cis-trans isomerase activity of cyclophilin studied by one-dimensional proton nuclear magnetic resonance spectroscopy
WO2003029425A3 (en) Whole cell engineering using real-time metabolic flux analysis
Franck et al. Comparison of size‐dependent carbon, nitrate, and silicic acid uptake rates in high‐and low‐iron waters
WO2003099780A3 (en) Luminogenic protease substrates
AU2003237241A1 (en) Composition, kit and method for cleaning and/or treating surfaces
DE69621455D1 (de) Verfahren zur herstellung von indium-zinn-oxod (ito) legierungsgegenständen
AU5657996A (en) Method and apparatus for qualifying an object
Dham et al. Nitrogen uptake by size-fractionated phytoplankton in mangrove waters
EP1348767A3 (en) Polymer chip and method for identifying an ionic polymer
JPS6335757A (ja) 耐食軟磁性鋼
JPS5672146A (en) Decorative monel alloy material
JPS6465240A (en) High corrosion-resistant amorphous alloy