[go: up one dir, main page]

TW200506511A - Liquid crystal display unit and its manufacturing method - Google Patents

Liquid crystal display unit and its manufacturing method

Info

Publication number
TW200506511A
TW200506511A TW093109963A TW93109963A TW200506511A TW 200506511 A TW200506511 A TW 200506511A TW 093109963 A TW093109963 A TW 093109963A TW 93109963 A TW93109963 A TW 93109963A TW 200506511 A TW200506511 A TW 200506511A
Authority
TW
Taiwan
Prior art keywords
liquid crystal
crystal display
technique
forming
display unit
Prior art date
Application number
TW093109963A
Other languages
Chinese (zh)
Other versions
TWI300873B (en
Inventor
Kiyohiro Kawasaki
Original Assignee
Quanta Display Inc
Quanta Display Japan Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quanta Display Inc, Quanta Display Japan Inc filed Critical Quanta Display Inc
Publication of TW200506511A publication Critical patent/TW200506511A/en
Application granted granted Critical
Publication of TWI300873B publication Critical patent/TWI300873B/zh

Links

Landscapes

  • Liquid Crystal (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)

Abstract

The present invention provides a liquid crystal display and its manufacturing method for solving the problem that, in the conventional manufacturing method which curtails the number of production steps, if channel length is shortened, the production margin becomes small and the production yield is lowered. The four-mask process plan or the third-mask process plan of an TN (twist nematic) type liquid crystal display unit and an IPS type liquid crystal display unit is constructed by combination of techniques which consist of a technique of rationalizing a step of forming a scan line, and a step of forming an etch stop layer by introducing a half tone exposure technique; a technique of rationalizing a step of forming a protection layer of an electrode terminal, by introducing the half tone exposure technique into a step of oxidizing an anode of a source/drain wiring which is a known technology; and a rationalizing technique of forming simultaneously a picture element which is a known technology and the scan line.
TW093109963A 2003-06-26 2004-04-09 Liquid crystal display unit and its manufacturing method TW200506511A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003182107A JP2005019664A (en) 2003-06-26 2003-06-26 Liquid crystal display device and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TW200506511A true TW200506511A (en) 2005-02-16
TWI300873B TWI300873B (en) 2008-09-11

Family

ID=34182581

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093109963A TW200506511A (en) 2003-06-26 2004-04-09 Liquid crystal display unit and its manufacturing method

Country Status (2)

Country Link
JP (1) JP2005019664A (en)
TW (1) TW200506511A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5342731B2 (en) * 2005-03-25 2013-11-13 エーユー オプトロニクス コーポレイション Liquid crystal display device and manufacturing method thereof
CN101283388B (en) 2005-10-05 2011-04-13 出光兴产株式会社 TFT substrate and method for manufacturing TFT substrate
US8263977B2 (en) 2005-12-02 2012-09-11 Idemitsu Kosan Co., Ltd. TFT substrate and TFT substrate manufacturing method
CN101416320B (en) 2006-01-31 2011-08-31 出光兴产株式会社 TFT substrate, reflective TFT substrate, and manufacturing method thereof
JP2007212699A (en) 2006-02-09 2007-08-23 Idemitsu Kosan Co Ltd Reflective TFT substrate and manufacturing method of reflective TFT substrate
JPWO2008136505A1 (en) 2007-05-08 2010-07-29 出光興産株式会社 Semiconductor device, thin film transistor, and manufacturing method thereof
TWI508282B (en) * 2008-08-08 2015-11-11 Semiconductor Energy Lab Semiconductor device and method of manufacturing same
US8461630B2 (en) * 2010-12-01 2013-06-11 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

Also Published As

Publication number Publication date
JP2005019664A (en) 2005-01-20
TWI300873B (en) 2008-09-11

Similar Documents

Publication Publication Date Title
TW200512525A (en) Liquid crystal display (LCD) device and manufacturing method thereof
US9893091B2 (en) Array substrate and fabricating method thereof, display panel and display apparatus
TWI263826B (en) Liquid crystal device, method for fabricating liquid crystal device, and electronic apparatus
KR20110113581A (en) LCD and its driving method
TW200500754A (en) Panel for display device, manufacturing method thereof and liquid crystal display
KR102314509B1 (en) TFT substrate manufacturing method and TFT substrate
TW200506511A (en) Liquid crystal display unit and its manufacturing method
US9684213B2 (en) BOA liquid crystal panel and manufacturing method thereof
TW200500721A (en) Upper substrate, liquid crystal display apparatus having the same and method of manufacturing the same
US9876039B2 (en) Thin-film transistor substrate, thin-film transistor substrate manufacturing method, and liquid crystal display
TW200743216A (en) Liquid crystal display fabrication method
TW200500762A (en) Liquid crystal display device and its manufacturing method
TW200617550A (en) Substrate for display device, manufacturing method for same and display device
TW200701474A (en) Liquid crystal display and method of making the same
TW200625651A (en) Thin film transistor, method of manufacturing the same, display apparatus having the same and method of manufacturing the display apparatus
TW200510884A (en) Liquid crystal display and its manufacturing method
TW200419811A (en) Method of fabricating a thin film transistor array panel
US9502576B2 (en) Thin film transistor and method for manufacturing the same, array substrate, display device
TW200601571A (en) Liquid crystal display and fabricating the same
TW200629566A (en) Thin film transistor array panel and method of manufacturing the same
CN104538408B (en) A kind of array substrate and preparation method thereof and display device
TW200642081A (en) Thin film transistor and process thereof
TW200628946A (en) Thin film transistor array panel and repairing method therefor
TW200515355A (en) Thin film transistor circuit device, production method thereof and liquid crystal display using the thin film transistor circuit device
TW200501024A (en) Liquid crystal display device having a thin film transistor substrate with a multi-cell gap structure and method of manufacturing same

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees