200427546 (1) 玫、發明說明 【發明所屬之技術領域】 本發明係關於將壓電致動器作爲驅動源來使用的微動 載台裝置。 【先前技術】 在半導體製造的領域中，使用各種型式的的載台裝置 。例如’電子束曝光裝置中所採用的晶圓承載用的載台裝 置’大多採用：在晶圓搬送或晶片間移動時，進行動作的 粗動載台裝置；及進行數n m〜1 〇 n m程度的定位之微動載 □裟置的；ifl合之構成。此種載台裝置，係用來將所承載的 晶圓在水平面上往互相垂直的X軸方向、γ軸方向移動而 使用。又，此種載台裝置，可以在高度真空（1(r4Pa)下進 行動作，進而要求具有非磁性的特性。 微動載台裝置，大多採用使用彈性摺葉和壓電元件的 致動器（壓電致動器），例如參照專利文獻i。 微動載台裝置’被要求具有高停止穩定性，同時爲了 實現高產量而被要求在]0msec〜100msec的時間內實現 1 μηι〜數μηι的移動量之響應性。 另外，最近被承載在此種載台裝置中的微動載台裝置 上的負《30質量，由於晶圓、晶圓夾頭、雷射干涉計用鏡等 ，而達到15〜25kg程度。然而，目前爲止的微動載台裝 置的承載負載幾乎全部爲5kg程度。若將15〜25kg程度 的負載承載在承載負載爲5kg的微動載台裝置上，共振頻 -4 > (2) (2)200427546 率低，會有停止穩定性、響應性皆大幅地降低的問題。 舉例來說’若將15〜25k§程度的負載承載在承載 負載爲5kg的微動載台裝置上，χ軸方向、γ軸方向的固 有頻率（共振頻率）成爲3GHz程度，停止穩定性僅能確保 10〜30nm程度。而且，數μΐΏ程度的步級響應，至調定 爲止’需要數1 0 〇 m s e C程度的時間。 【專利文獻1】日本特開平〗2 7〗4 7 9號公報 【發明內容】 (發明所欲解決之課題） 因此’本發明的課題在於提供一種微動載台裝置，即 使承載負載超過5kg的情況，能夠實現高停止穩定性及高 響應性。 本發明的其他課題在於使上述微動載台裝置能夠具有 3自由度以上的多自由度。 進而，本發明的其他課題在於提供一種能夠提高振動 減衰性能的微動載台裝置。 (解決課題所用的手段） 若根據本發明的第1形態，可以提供〜種微動載台裝 置，係包含被構築在底座上的傾斜載台 '及X - Y載台之 形態的微動載台裝置，其特徵爲： 前述傾斜載台，具有傾斜板，而且在前述傾斜板和前 述底座之間，具備至少三個變換機構，該變換機構係藉由 (3) (3)200427546 第】壓電致動器和楔形載台的組合，將平行於前述底座的 運動，變換成垂直於前述底座之Z軸方向的運動； 則述X - Y載台，具有與前述傾斜板組合的χ _ Y板， 而且具有：往X軸方向、γ軸方向的其中一方相互平行地 延伸’而至少利用2點來驅動前述X _ γ板的至少二個第2 壓電致動器；及往X軸方向、γ軸方向的另一方延伸，用 來驅動前述Χ-Υ板的第3壓電致動器。 在根據弟1形恶的微動載台裝置中，其中藉由將前述 至少三個變換機構，在同一圓周上，隔開等間隔地配置， 前述傾斜板’被作成可以往Ζ軸方向、繞著X軸的θ X軸 方向、繞著Υ軸的Θ y軸方向，進行變位； 前述X - Y板，係被作成可以與前述傾斜板一起變位 ，而且被作成獨立於前述傾斜板，可以往X軸方向、γ軸 方向、繞著Z軸的θ ζ軸方向，進行變位。 又，在根據第1形態的微動載台裝置中，其中在前述 傾斜板和前述X- Y板之間，在複數處設置連桿摺葉；該 連桿摺葉係用來導引該X - Y板之X - γ平面內的運動，而 且在垂直於前述底座的方向，呈現高剛性。 進而，在根據第1形態的微動載台裝置中，其中在前 述傾斜板和前述底座之間，在複數處設置用來限制該傾斜 板的X-Y平面內的運動之板片彈簧。 進而，在根據第1形態的微動載台裝置中，其中使傾 斜摺葉，介於前述變換機構中的ζ軸方向的運動部的上部 和前述傾斜板之間。 -6- (4) (4)200427546 進而’在根據第1形態的微動載台裝置中，其中前述 第1壓電致動器，其互相平行地延伸的2根壓電致動器元 件’係藉由2連式載台而被組合在一起，使得其衝程被相 加。 若根據本發明的第2形態，其中在前述X_Y板上， 進而組裝用來承載被承載物的頂部平台； 在前述底座和前述頂部平台之間，配置複數個具有Ζ 軸方向的減衰作用之Ζ軸減衰器。 在根據第2形態的微動載台裝置中，其中在前述底座 和前述Χ-Υ板之間，將具有X軸方向、γ軸方向的減衰 作用之至少三個減衰器，配置在同一的χ-γ平面內。 又，在根據第2形態的微動載台裝置中，其中前述傾 斜板，在中央部具有第1開口，而具有比該第1開口小的 第2開口之前述Χ-Υ板，組合在該第丨開口中； 在對應前述第2開口之前述頂部平台的底面，設置對 應前述第2開口的大小之阻尼環； 在該阻尼環內，經由被設置在前述底座上的台，設置 比前述阻尼環的內徑小的減振器夾持具； 在該減振器夾持具和前述阻尼環之間，將具有X軸 方向的減衰作用之至少二個X軸減衰器，設置成在同軸 上而可以互相地往相反方向作用；並且將具有 Υ軸方向 的減衰作用之至少二個Υ軸減衰器，設置成在同軸上而 可以互相地往相反方向作用。 進而，在根據第2形態的微動載台裝置中，其中前述 -/ - (5) (5)200427546 X軸減衰器、Y軸減衰器、Z軸減衰器，係利用藉由非磁 性材料所形成的減振器來構成，分別內藏作爲減衰用的減 振油之真空用滑脂的基油，且包含恢復用的彈簧、活塞桿 前述X軸減衰器、Y軸減衰器，分別被配置成使得其 活塞桿的前端，連接至前述阻尼環； 前述Z軸減衰器，係被配置成使得其活塞桿的前端連 接至前述頂部平台的底面。 【實施方式】 以下’參照第1圖〜第8圖來說明關於根據本發明的 微動載台裝置的第1實施形態。根據本實施形態的微動載 台裝置，雖然也可以單獨地使用，通常係被組合在粗動載 台裝置亦即X-Y載台裝置中。χ-γ載台裝置，具備往χ 軸方向可動的X機台、及往γ軸方向可動的γ機台；例 如被構成X機台可以在γ機台上移動。當然，也可以被 構成Υ機台可以在X機台上移動。本微動載台裝置，係 被承載在Χ-Υ載台裝置中的X機台或γ機台上。 本微動載□裝置’係被構成：Χ-Υ-0Ζ軸載台（以下稱 爲Χ-Υ載台，但是與粗動載台裝置亦即Χ-Υ載台裝置相 異），被組裝於被構築在底板1 00上的Ζ-θχ-ey軸載台（以 下稱爲傾斜（t i】t)載台）上。 首先，就傾斜載台加以說明。如第1圖 '第2圖所示 ’傾斜載台具有傾斜板201。如第4圖所示，傾斜板2〇 1 (6) (6)200427546 ，藉由被配置在底板1 00上之互相平行地延伸之2根3組 總共6根的壓電致動器（壓電致動器元件）ZI-l、Z1 -2、 Z 2 - 1、Z 2 - 2、Z 3 - 1、Z 3 - 2及後述的楔形載台，相對於底板 100，往垂直方向（Z軸方向或是上下方向）被驅動。以下， 將壓電致動器Z 1-1、Z卜2的組合稱爲Z 1軸，將壓電致動 器Z2-1、Z2-2的組合稱爲Z2軸，將壓電致動器Z3-1、 Z3-2的組合稱爲Z3軸。 也參照第5圖及模式圖之第6圖、第7圖，就Z3軸 的構造和動作的詳細加以說明。壓電固定塊223被設置在 底板100上。壓電致動器Z3-2的一端被固定在壓電固定 塊2 2 3 ’且經由2連式載台2 2 4，與壓電致動器Z 3 -1連結 。藉此，使得壓電致動器Z3 -2的驅動衝程和壓電致動器 Z3 - 1的驅動衝程被相加，以被相加的驅動衝程來驅動楔 形載台2 2 5。 所謂的楔形載台，如眾所週知，係用來將水平方向的 運動變換成垂直方向的運動的構件。在本例中，楔形載台 22 5 ’具備45度的直角變換機構，藉由2根壓電致動器 、Z2-2所產生的水平變位輸入及楔形載台225的垂 直變位輸出，係被構成一對一。直角變換機構包含：在其 頂面側具有45度的傾斜面之傾斜塊22 5- 1、及在其底面 側具有45度的傾斜面之傾斜塊22 5 -2的組合體。傾斜塊 22 5 -1具有用來導引傾斜塊225-2的導引部。傾斜塊22 5-2 ’其傾斜面在藉由導引部而被導引的狀態下，可以沿著 傾斜塊2 2 5 - 1的傾斜面滑動。藉此，若傾斜塊2 2 5 d往水 (7) (7)200427546 +方向位，傾斜塊2 2 5 - 2伴隨著該變位而進行滑動，且 往垂直方向變位。 藉由如此的楔形載台22 5，被固定於其垂直運動部上 的傾斜摺葉226，被往Z軸方向驅動。而且，將被固定於 傾斜摺葉2 2 6的前端的傾斜板2 0 1，往Z軸方向驅動。再 者，傾斜板201在中央具有開口 201 a(參照第7圖）。X-Y 板3 0 1 (參照第2圖）被組合在開口 2 0 1 a內。頂部平台2 0 2 ( 參照第5圖）被固定於Χ-γ板301上。關於板3〇1、 頂部平台2 0 2，詳如後述。 Ζ1軸、Ζ2軸也具有與Ζ3軸相同的構成。也就是說 ，Ζ1軸具有壓電固定塊203、2連式載台204、楔形載台 205; Ζ2軸具有壓電固定塊213、2連式載台214、楔形載 台2 1 5。特別是Ζ1軸的楔形載台2 0 5、Ζ 2軸的楔形載台 215、Ζ3軸的楔形載台22 5，分別被配置在同一圓周上（在 弟4圖中以鍵線表不）。特別是在本例中，楔形載台205 、2 1 5、22 5，係被配置在對應正三角形的頂點的位置亦即 被配置成隔著1 2 0度的角度。這3軸的垂直運動部，可以 往同一方向變位。藉此，傾斜板2 0 1進行往Ζ軸方向的平 移運動、差動的運動’也就是說，若各軸的變位量給予差 異，傾斜板2 0 1進行θχ軸方向、0y軸方向的旋轉運動。 在此，θ X軸方向的旋轉運動意味著繞著X軸的旋轉運動 ，而0y軸方向的旋轉運動當然是意味著繞著Y軸的旋轉 運動。又，後述的θζ軸方向的旋轉運動，意味著繞著ζ 軸的旋轉運動。 -10- (8) (8)200427546 Z軸方向的位置，在此藉由靜電容量感測器來測量。 靜電容量感測器位於傾斜板20 1的上方。被配置在最終可 動部亦即頂部平台2 0 2和底板1 〇 〇之間。以下，將z 1軸 用的靜電容量感測器稱爲Z 1感測器2 0 7、將Z 2軸用的靜 電容量感測器稱爲Z2感測器2 1 7、將Z3軸用的靜電容量 感測器稱爲Z3感測器22 7。各感測器2 0 7、217、22 7，分 別被設置在鄰接楔形載台2 0 5、2 1 5、2 2 5的位置。靜電容 量感測器的測量原理爲眾所週知，簡單來說，係能夠將Z 軸方向的微小變位以靜電容量的變化來加以檢測。 在本形態中，藉由這些Z1感測器2 0 7、Z2感測器 217、Z3感測器22 7，測量最終可動部亦即頂部平台202 的高度，根據測量結果，進行頂部平台202的位置控制（ 全閉路控制）。 通常，在傾斜載台中，測量從底板1 0 0算起的傾斜板 20 1的高度，根據測量結果來進行位置控制（半閉路控制） 。但是，此種方式無法測量X-Y載台移動時的Z軸方向 的位置誤差。這意味著無法控制頂部平台202的Z軸方向 、θχ軸方向、0y軸方向的位置。然而，根據本形態的Z 軸方向位置位置測量系統的配置，頂部平台202的Z軸方 向、θχ軸方向、0y軸方向的位置控制，成爲可能。 傾斜載台的引導系統，係藉由被安裝在各楔形載台 2 05、215、22 5上的傾斜摺葉2 0 6、216、226及被安裝在 底板]00和傾斜板201之間的僅在Z軸方向可以變位的板 片彈簧208、21 8、2 2 8 (參照第4圖、第7圖）來構成。藉 -11 - (9) (9)200427546 由這些板片彈簧208、21 8、22 8，僅利用楔形載台的導引 部不可能實現之用來限制傾斜板2 0 1的X - γ平面內的運 動之高剛性引導系統，可以被構成。再者，板片彈簧208 、2 I 8、2 2 8係經由分別被設置在底板1 〇 〇上的彈簧安裝 部 208-1 、 218-1、 228-1，而被設置。 接著，參照第1圖〜第3圖及模式圖亦即第8圖，就 載台加以說明。頂部平台2 02，被固定於χ-γ板301 。X · Y板3 0 1，被裝配在傾斜板2 0 1的中央的開口 2 0 1 a。 x · Y板3 0 1可以與傾斜板2 0 1 —起往Z軸方向、θ X軸方 向、0y軸方向變位，但是尙被作成獨立於傾斜板201，而 可以往X軸方向、Y軸方向及θζ軸方向變位。也就是說 ，X - Υ板3 0 1，關於X軸方向，係利用往X軸方向互相平 行的2個的XI壓電致動器3 02、Χ2壓電致動器3 0 3，而 被驅動。X 1壓電致動器3 0 2、X 1壓電致動器3 0 2，被設 置成隔開規定的間隔，其各個一端側被固定於傾斜板2 0 1 ，另一端則與Χ-Υ板301連結。另一方面，Χ-Υ板301， 關於Υ軸方向，係利用往Υ軸方向延伸的1個Υ壓電致 動器304而被驅動。Υ壓電致動器3 04的一端側也被固定 於傾斜板201，另一端則與Χ-Υ板301連結。 載台的引導系統，如以下所述。在Χ-Υ平面的 引導系統中，被固定於XI壓電致動器3 02的一端上之XI 摺葉3 1 2，被固定於傾斜板20 1 ;被固定於X 1壓電致動 器3 02的另一端上之XI摺葉3 1 1則與Χ4板301連結。 同樣地，被固定於Χ2壓電致動器3 03的一端上之Χ2摺 -12 - (10) 200427546 茱3 1 4 ’被固定於傾斜板2 〇 1 ;被固定於χ 2壓電 3 〇 3的另一端上之X 2摺葉3〗3則與X _ γ板3 〇〗連 一方面’被固定於Υ壓電致動器3 〇4的一端上之 3 1 6被固定於傾斜板2 0 ];被固定於γ壓電致動器 另一端上之Υ摺葉3 1 5，則與X - γ板3 0 1連結。 Ζ軸方向的引導系統，係藉由被設置在χ_γ板 傾斜板2 0 1之間的三個主連桿摺葉3 2〗、3 2 2、3 2 3 副連桿摺葉3 2 4、3 2 5來實現。參照第5圖，就這 摺葉中的例如主連桿摺葉32 1加以說明。在傾斜板 設置往下方垂直地延伸的連桿摺葉塊3 2 1 - 1。在此 葉塊3 2 1· 1，設置從該處往上方延伸而與X - γ板3 ( 的摺葉321-2。摺葉321-2，具有眾所週知的球型 頭，使Χ-Υ板301可以在Χ-Υ平面內進行變位， 軸方向則支持著Χ-Υ板3 0 1，呈現高剛性。主連 322、323、副連桿摺葉324、325也具有完全相同 。再者，在第8圖中，顯不由連桿摺葉塊322-1 3 22-2所組成的主連桿摺葉3 22。 三個主連桿摺葉321、3 22、3 23，係被配置在 角形，在此爲對應等腰三角形的頂點的位置；二個 摺葉3 24、3 25，被配置在主連桿摺葉321的兩側 桿摺葉3 2 1〜3 2 3和副連桿摺葉3 2 4、3 2 5，具有使 3 0 1在Χ-Τ平面內自由自在地變位的功能，同時在 向具有高剛性。藉此，與習知的微動載台裝置相比 地提高剛性。 致動器 結。另 Υ摺葉 3 04的 30 1和 及二個 些連桿 201， 連桿摺 >1連結 關節接 而在Ζ 桿摺葉 的構造 和摺葉 對應三 副連桿 。主連 X-Υ板 ζ軸方 ，大幅 -13 - (11) 200427546 就Χ-Υ載台的動作加以說明。若XI壓 和X 2壓電致動器3 0 3往相同的方向動作，. 進行X軸方向的平移運動。X 1壓電致動器 電致動器3 0 3若進行差動地動作也就是變位 Χ-Υ板301進行θζ軸方向的動作。另一方ΐ 致動器3 0 4動作，則X - Υ板3 0 1往Υ軸方 動。 Χ-Υ板301的X軸方向的位置，係利用 板201和Χ-Υ板3 01之間的二個靜電容量 3 2 7 (以下稱爲X 1感測器、χ2感測器）來進 板3 0 1的Υ軸方向的位置，係利用被配置 和Χ-Υ板301之間的一個靜電容量感測器 Υ感測器）來進行測量。根據藉由這些X 1感 感測器3 2 7、Υ感測器3 2 8所測量的Χ-Υ平 訊’進行頂部平台2 0 2的半閉路位置控制。 如上述般，頂部平台202被固定於 傾斜載台中的傾斜板2 〇 1，可以往ζ軸方向 0y軸方向變位。而且，乂-丫載台中的χ_γ板 傾斜板2 0 1 —起變位，尙可以獨立於傾斜板 軸方向、Υ軸方向及θ ζ軸方向變位。藉此， 可以進行6自由度（Χ軸方向、γ軸方向、： 軸方向、Θ y軸方向、㊀ζ軸方向）的運動。 再者’ X-Y載台的位置測量（χ軸方向、 軸方向），係藉由安裝在頂部平台2〇2上而谷 電致動器3 0 2 則X-Y板301 302和X2壓 量有差異，則 目，若Y壓電 向進行平移運 被配置在傾斜 感測器3 26、 行測量。X-Y 在傾斜板2 0 1 3 2 8 (以下稱爲 測器326 > X2 面內的位置資 ~板301上， 、θχ軸方向、 3 〇 1，可以與 201，而往X 頂部平台2 0 2 乙軸方向、θχ Υ軸方向、θζ i Υ軸方向延 -14- (12) (12)200427546 長的X鏡325(第1圖）、往X軸方向延長的Y鏡326(第3 圖）、及雷射千涉計（未圖示）來進行。根據藉由此位置測 量所得到的位置資訊，能夠進行6自由度（X軸方向、γ 軸方向、Z軸方向、θχ軸方向、0y軸方向、θζ軸方向）的 全閉路控制。進而，關於θχ軸方向、0y軸方向，也可以 利用雷射干涉計來測量位置；根據此測量値，Z軸方向以 外，全部可以根據從雷射干涉計來的位置資訊，進行位置 控制。但是，此情況，由於鏡大型化且雷射干涉計的光學 零件等也增加，需要考慮成本增加等的問題。 接著，說明關於根據本發明的第2實施形態之微動載 台裝置。根據第2實施形態的微動載台裝置，係針對關於 弟1貫施形態的微動載台裝置’加上以下的改良。 根據第1實施形態的微動載台裝置，關於傾斜載台部 分，由於移動衝程大，壓電致動器的特性上，確保高剛性 是困難的。這是因爲：在根據第1實施形態的微動載台裝 置中，爲了增大衝程，係作成藉由2連式載台將二個壓電 致動器連結起來的構造。也就是說，作成2連式構造的壓 電致動器，其剛性模數等於是二個彈簧串聯地連接而成， 其衝程越大，驅動方向的剛性越低。 又’在根據第1實施形態的微動載台裝置中，爲了謀 求X - Y載台部分的高剛性化，質量增加。因此，傾斜載 台的負載質量增大；結果，固有値下降而使得響應性能降 低，數μιη的步級響應時的調定時間，有改善的餘地。 進而’根據第1實施形態的微動載台裝置，由於幾乎 -15- (13) (13)200427546 沒有對於振動的減衰要素，振動減衰性能有改善的餘地。 也就是說，載台的移動後至調定爲止，需要時間，且由於 外部千擾所產生的振動至調定爲止，也需要時間。 因此’根據第2實施形態的微動載台裝置，其特徵爲 :具備用來提高振動減衰性能之對應真空·非磁性的減衰 器。 參照第9圖〜第1 9圖，來說明關於根據第2實施形 態的微動載台裝置。本微動載台裝置，雖然也可以單獨地 使用’通常係被組合在粗動載台裝置亦即χ-γ載台裝置 中。也就是說，本微動載台裝置通常也被承載於載 台裝置中的X機台或γ機台上。 根據本形態的微動載台裝置的基本構成，雖然與根據 第1實施形態的微動載台裝置相同，但是爲了謀求Ζ軸方 向的高剛性化，將載台衝程從36〇μηι變更爲18〇[xm。結 果’相對於在根據第1實施形態的微動載台裝置中係使用 錯由2連式載台來串聯連結2根z軸驅動用壓電致動器的 糸口構’在第2實施形態中，使用1根z軸驅動用壓電致動 器便可以。 本微動載台裝置，係被構成：Χ-Υ-θζ軸載台（以下稱 爲χ-γ載台，但是與粗動載台裝置亦即χ_γ載台裝置相 異）’被組裝於被構築在作爲底座的底板】〇 〇上的Ζ _ θ χ _ θ y 軸載台（以下稱爲傾斜（tilt)載台）上。 目先’就傾斜載台加以說明。如第9圖〜第1 1圖所 示’傾斜載台具有傾斜板2 0 1。傾斜板2 (Π，藉由被配置 -16- (14) (14)200427546 在底板1 〇 〇上之互相平行地延伸之3根壓電致動器（壓電 致動器元件）z 1、Z2、Z3及後述的楔形載台，相對於底板 1 〇 0，往垂直方向（Z軸方向或是上下方向）被驅動。以下， 將藉由壓電致動器Z 1而往Z軸方向被驅動的軸稱爲z j 軸’將錯由壓電致動器Z2而往Z軸方向被驅動的軸稱爲 Z2軸，將藉由壓電致動器Z3而往z軸方向被驅動的軸稱 爲Z3軸。 就Z3軸的構造和動作的詳細加以說明。壓電固定塊 130被設置在底板1〇〇上。壓電致動器Z3，其一端被固定 在壓電固定塊1 3 0，用來驅動楔形載台1 3 5。所謂的楔形 載台，也被稱爲滑動斜楔，如前所述，係將水平方向的運 動變換成垂直方向的運動之機構。楔形載台1 3 5，在本例 中’具備4 5度的直角變換機構，如第]7圖所示，藉由壓 電致動器Z3所產生的水平變位輸入及楔形載台I 3 5的垂 直變位輸出，係被構成一對一。直角變換機構包含：在其 頂面側具有45度的傾斜面之第1傾斜塊〗3 5_丨、及在其 底面側具有4 5度的傾斜面之第2傾斜塊1 3 5 - 2的組合體 。第1傾斜塊135-1具有用來導引第2傾斜塊135-2的導 引部。第2傾斜塊1 3 5 -2，其傾斜面在藉由第1傾斜塊 1 3 5 - 1的導引部而被導引的狀態下，可以沿著第1傾斜塊 I 3 5 · 1的傾斜面滑動。藉此，若第1傾斜塊} 3 5 ^往水平 方向變位，第2傾斜塊1 3 5 -2伴隨著該變位而進行滑動， 且僅往垂直方向變位。再者，壓電致動器Z3，係藉由被 設置在底板1 〇〇上的支持構件1 3 ]而被支持。 -17 - (15) 200427546 藉由如此的楔形載台135，被固定於其垂直運 的傾斜摺葉1 3 7，被往Z軸方向驅動。而且，將被 傾斜摺葉1 3 7的前端的傾斜板2 0 1，往Z 1軸方向 再者，傾斜板2 0 1在中央具有開口 2 0 1 a (第1 ]圖 扳301 (第9圖）被組合在開口 201a內。頂部平台 1 3圖）被固定於X · Y板3 0 1上。關於X - γ板3 〇 !、 台2 0 2，詳如後述。 Z1軸、Z 2軸雖然也具有與Z 3軸相同的構成 相對於Z 3軸，係被配置成隔開規定的間隔而往相 向延伸。Z1軸具有壓電固定塊11〇、楔形載台115 摺葉117; Z2軸具有壓電固定塊120、楔形載台1 斜摺葉1 2 7。Z 1軸的楔形載台1 1 5、Z2軸的楔形載 、Z3軸的楔形載台1 3 5，分別被配置在同一圓周上 是在本例中，楔形載台1 1 5、1 2 5、1 3 5，係被配置 正三角形的頂點的位置也就是被配置成隔著〗2〇度 。這3軸的可以往同一方向（在此爲X軸方向）變位 運動部，也可以往同一方向（在此爲Z軸方向）變位 ，傾斜板2 0 1進行往Z軸方向的平移運動。另一方 動的運動，也就是說，若Zl、Z2、Z3各軸的變位 差異’傾斜板2 0 1進行θ X軸方向、Θ y軸方向的旋 。如前所述，Θ X軸方向的旋轉運動意味著繞著X 轉運動’ 軸方向的旋轉運動意味著繞著γ軸的 動。又’後述的Θ z軸方向的旋轉運動，意味著繞， 的旋轉運動。 動部上 固定於 驅動。 )〇 X-Y 202(第 頂部平 ，但是 反的方 、傾斜 25、傾 台125 。特別 在對應 的角度 ，垂直 。藉此 面，差 量給予 轉運動 軸的旋 旋轉運 f Z軸 -18· (16) (16)200427546 Z軸方向的位置’在此藉由靜電容量感測器來測量。 靜電容量感測器位於傾斜板2 0 1的上方。被配置在最終可 動部亦即頂部平台2 0 2和底板】〇 〇之間。以下，將第9圖 所示的Z 1軸用的靜電容量感測器稱爲z 1感測器2 0 7、將 Z2軸用的靜電容量感測器稱爲Z2感測器2 1 7、將Z3軸 用的靜電容量感測器稱爲Z 3感測器2 2 7。各感測器2 0 7、 2 1 7、2 2 7，分別被設置在鄰接楔形載台}丨5、1 2 5、I 3 5的 位置。靜電容量感測器的測量原理，如前所述。 在本形態中，藉由這些Z1感測器2 0 7、Z 2感測器 217、Z3感測器227，測量最終可動部亦即頂部平台2〇2 的高度，根據測量結果，進行頂部平台2 0 2的位置控制（ 全閉路控制）。 通常，在傾斜載台中，測量從底板1 0 〇算起的傾斜板 2 0 1的高度，根據測量結果來進行位置控制（半閉路控制） 。但是，此種方式無法測量X-Y板301往X-Y方向移動 時的Z軸方向的位置誤差。這意味著無法控制頂部平台 2 02的Z軸方向、θχ軸方向、0y軸方向的位置^然而， 在本形態中的Z軸方向位置位置測量系統的配置，頂部平 台2 02的Z軸方向、θχ軸方向、0y軸方向的位置控制， 成爲可能。 傾斜載台的引導系統，係藉由被安裝在各楔形載台 1 1 5、1 2 5、1 3 5上的傾斜摺葉1 1 7、1 2 7、1 3 7及被安裝在 底板1 0 〇和傾斜板2 0 1之間的僅在Z軸方向可以變位的板 片彈簧2 0 8、2 1 8、2 2 8 (參照第1 1圖，但是符號2 0 8參照 - 19- (17) 200427546 第18圖）來構成。藉由這些板片彈簧208、218 利用楔形載台的導引部不可能實現之用來限制傾 的X - Y平面內的運動之高剛性引導系統，可以 再者，板片彈簧20 8、218、22 8係經由分別被設 100上的彈簧安裝部20 8 -1(參照第18圖）、218· ，而被設置。 在本形態中，進而如第9圖所示，在被固 100上的支持台219-1、229-1、239_1上，設置j 減衰器的減振器219、229、239、249。各減振 塞桿，如第1 2圖所示，活塞桿的前端連接至: 202的底面。在此，四個減振器219、229、239、 置在靠近頂部平台202的外緣的位置，特別是在 載台1 3 5的位置，設置二個。這是考慮平衡的問 器只要至少配置三個便可以，根據情況，也可以 以上。 如上述般，減振器219、229、239、249的 前端，連接至頂部平台202的底面。藉由如此的 部平台202往θχ軸方向、0y軸方向旋轉時，必 以上的減振器變成壓入狀態，藉由減振器可以得 減衰作用。 關於頂部平台2 02的Z軸方向的運動，其下 減振器219、2 2 9 ' 2 3 9、249發揮減衰效果。再 部平台202以水平狀態往上方運動的情況，則無 效的減衰。但是，頂部平台202並沒有以完全的 、228 ，僅 斜板2 0 1 被構成。 置在底板 -1、22 8 -1 定於底板 乍爲Z軸 器具有活 頂部平台 249，設 靠近楔形 題，減振 配置五個 活塞桿的 配置，頂 然有二個 到有效的 方全部的 者，在頂 法期待有 水平狀態 -20- (18) (18)200427546 往z軸方向運動，而必然伴隨著0)^軸方向、軸方向的 運動。因而，實際上，頂部平台2 02不論是往Z軸方向、 θχ軸方向、ey軸方向的任一方向，皆可以得到有效的減 衰作甩。 接著，參照第13圖就X-Y載台加以說明。頂部平台 2 〇 2，被固定於X - Y板3 0 1的頂面側。X _ γ板3 0 1，如第 1 3圖所示，被裝配在傾斜板2 0 1的中央部的開口 2 0 1 a。 X - Y板3 0 1可以與傾斜板2 0 1 —起往Z軸方向、θ X軸方 向、Θ y軸方向變位，但是尙被作成獨立於傾斜板2 〇 1，而 可以在X軸方向、Y軸方向及θζ軸方向變位。也就是說 ，X - Υ板3 0 1，關於X軸方向，係利用往X軸方向互相平 行的2個的XI壓電致動器3 02、Χ2壓電致動器3 03，而 被驅動。如第9圖所示，X1壓電致動器3 0 2、X1壓電致 動器3 02，被設置成隔開規定的間隔，其各個一端側，經 由安裝板3 02-1、3 03 -1，被固定於傾斜板201，另一端則 與Χ-Υ板30]連結。另一方面，Χ-Υ板301，關於Υ軸方 向，係利用往Υ軸方向延伸的1個Υ壓電致動器3 04而 被驅動。Υ壓電致動器3 04的一端側也經由安裝板3 04 -1 而被固定於傾斜板201，另一端則與Χ-Υ板301連結。 Υ載台的引導系統·，如以下所述。如第1 5圖所示 ，在Χ-Υ平面的引導系統中，被固定於XI壓電致動器 3 02的一端上之XI摺葉312，被固定於傾斜板20];被固 定於X1壓電致動器3 0 2的另一端上之X1摺葉3 Π則與 Χ-Υ板301連結。同樣地，被固定於Χ2壓電致動器303 -2卜 (19) 200427546 的一端上之X2摺葉314(未圖示），被固定於5 •，被固定於X2壓電致動器303的另一端上 3 ] 3(未圖示）則與X-Y板301連結。另一方面 Y壓電致動器304的一端上之Y摺葉316(未 於安裝板3 04」；被固定於γ壓電致動器304 之Y摺葉315(未圖示），則與X-Y板301連結 如第1 3圖所示，Z軸方向的引導系統， 置在X - Y板3 0 1和傾斜板2 0 1之間的三個主斐 、322、323及二個副連桿摺葉324、325來實 1 7圖，就這些連桿摺葉中的例如主連桿摺葉 明。在傾斜板2 0 1，設置往下方垂直地延伸的 3 2卜1。在此連桿摺葉塊3 2 1 - 1，設置從該處往 與X-Y板301連結的摺葉321-2。摺葉321·: 週知的球型關節接頭，使X-Y板301可以在 進行變位，而在Z軸方向則支持著X · Y板3 0 ] 性。主連桿摺葉3 2 2、3 2 3、副連桿摺葉3 2 4、 完全相同的構造。再者，第1 7圖僅表示出說 要的構成要素。又，在第9圖中，顯示由 3 22- 1和摺葉3 22 -2所組成的主連桿摺葉3 22。 如第1 3圖所示，三個主連桿摺葉3 2 1、 係被配置在對應等腰三角形的頂點的位置；二 葉3 24、3 2 5，被配置在主連桿摺葉321的兩 摺葉32 1〜3 2 3和副連桿摺葉3 24、3 2 5，具窄 30 1在X-T平面內自由自在地變位的功能，同 茫裝板3 03 -1 之 X2摺葉 丨，被固定於 圖示）被固定 的另一端上 〇 係藉由被設 |桿摺葉3 2 1 現。參照第 3 2 1加以說 連桿摺葉塊 ，上方延伸而 Z，具有眾所 X-Y平面內 ί，呈現高剛 3 2 5也具有 明所需的必 連桿摺葉塊 322 、 323 ， 個副連桿摺 側。主連桿 ί使Χ-Υ板 時在Ζ軸方 -22 > (20) (20)200427546 向具有高剛性。藉此，與習知的微動載台裝置相比，大幅 地提局剛性。 就X-Y載台的動作加以說明。若X1壓電致動器302 和X 2壓電致動器3 0 3往相同的方向動作，則X - γ板3 0 1 進行X軸方向的平移運動。XI壓電致動器302和X2壓 笔：tji[動益：>03右進丫了差動地動作也就是變位量有差異，則 X-Y板301進行θζ軸方向的動作。另一方面，若γ壓電 致動器3 04動作，則Χ-Υ板301往Υ軸方向進行平移運 動。 寥1照弟1 3圖’ X - Υ板3 0 1的X軸方向的位置，係利 用被配置在傾斜板2 0 1和X - Υ板3 0 1之間的二個靜電容 量感測器3 2 6、3 2 7 (以下稱爲XI感測器、Χ2感測器）來進 行測量。Χ-Υ板3 0 1的Υ軸方向的位置，係利用被配置在 傾斜板201和Χ-Υ板301之間的一個靜電容量感測器 j 2 8 (以下稱爲Υ感測器）來進行測量。根據藉由這些X 1感 測器3 26、Χ2感測器3 27、Υ感測器3 2 8所測量的Χ-γ平 面內的位置資訊，進行頂部平台202的半閉路位置控制。 接著，加入第1 3圖，也參照第14圖，來說明關於χ 軸方向、Υ軸方向的減衰器。二個夾持台2 5 1、2 5 2隔開 間隔地被固定配置於底板1 0 0上。四方形框狀的減振器夾 持具260被固定在這些夾持台251、252上。夾持台25ι 、2 5 2隔開間隔地被配置的原因，在於壓電致動器z 3 g 通過兩者之間。另一方面’ X-Y板301在中央具有開p 3〇]a(參照第9圖）。在對應開口 30]a的頂部平台2 02上 -23 - (21) (21)200427546 ’也設有開口 202a(弟13圖）。在開口 202a的內壁，安裝 阻尼環2 7 0，該阻尼環具有比開口 2 0 2 a的內壁小而比減 振器夾持具2 6 0大的內徑。作爲X軸方向減衰器的二個 減振器261、262，在X軸方向的同軸上，朝向相反方向 ，被安裝在減振器夾持具2 6 0中。作爲γ軸方向減衰器 的二個減振器2 6 3、2 6 4，在γ軸方向的同軸上，朝向相 反方向，被安裝在減振器夾持具260中。各減振器261〜 2 6 4的活塞桿，連接至阻尼環2 7 0的內徑面。 藉由在同一的 X-Y平面內之上述四個減振器 261〜 264的配置’當頂部平台202往X軸方向、γ軸方向運動 的情況，必然有一個以上的減振器成爲壓入狀態，可以得 到有效的減衰。又，關於頂部平台2 0 2的θ z軸方向的旋 轉運動，由於減振器夾持具2 6 0的中心和負載（頂部平台 、鏡等的可動部的負載）的重心不一致，在與減振器2 6 1 〜2 64的接觸點，進行平移變爲而作用，成爲能夠發揮減 衰性能的配置•構成。 再者，關於X軸方向、Y軸方向的減衰器，只要至少 配置三個便可以。也就是說，在上述例子中，係將四個減 振器隔開90度的角度間隔而配置在同一平面上。但是， 即使是將三個減振器配置在同一平面（理想爲1 2 0度的間 隔角度）的情況，也能夠發揮X軸方向、Y軸方向的減衰 性能。 減振器 219、 229、 239、 249、 26]〜264，全部使用 相同的東西。減振器的構造，一般係被稱爲避震器，市面 -24- (22) 200427546 上有各種型式。第]6圖顯示其中一例。 在第16圖中，符號401爲活塞桿 、符號4 03爲塞、符號404爲蓄壓器、 符號4 〇 6爲油、符號4 0 7爲活塞環、符 號4 09爲桿塡料、符號410爲油環、符 符號4 1 2爲六角螺帽。通常，在將此種 來使用的情況，活塞桿的前端剛性地被 上。但是，在本發明中，沒有將活塞桿 一事，爲其特徵。 在本發明中，作爲用來對應真空、 用的材質，係使用鈦、碟青銅、鈹青銅 又，減衰用的油，使用真空用滑脂的基 行利用伸縮囊之真空密封等的構造變更 實現真空·非磁性對應。 作爲參考用，在第1 8圖中，以俯f Z 3軸的壓電致動器Z 1〜Z 3和其關聯 321〜323及副連桿摺葉324、325、源 239、249及減振器261〜264等的配置f 圖中，以側面剖面圖來表示減振器2 6 1 。但是，在第〗8圖、第19圖中所示的 應弟9圖〜弟17圖所不的各元件。也 202 的開口 202A。 如上所述’頂部平台2 0 2被固定於 傾斜載台中的傾斜板2 0 1，可以往z軸： 、符號4 0 2爲套筒 符號4〇5爲彈簧、 號4 0 8爲軸環、符 號4 1 1爲小螺絲、 減振器作爲避震器 固定於被減衰元件 的前端剛性地固定 非磁性環境的構造 等的非磁性材料。 油。藉此，不必進 ，以最小的成本， 艺圖來表示Z 1軸〜 元件、主連桿摺葉 :振器 2 1 9、2 2 9、 _係。又，在第1 9 〜264的支持構造 各兀件，不一定對 可以沒有頂部平台 X-Y 板 301 上， ^'向、θχ軸方向、 -25- (23) (23)200427546 ey軸方向變位。而且’ χ-γ載台中的板3〇1，可以與 傾斜板2 ο 1 —起變位，並能獨立於傾斜板2 〇〗，而往X軸 方向、Υ軸方向、θ Ζ軸方向變位。藉此，頂部平台2 〇 2可 以進行6自由度（X軸方向、Υ軸方向、ζ軸方向、θχ軸 方向、ey軸方向、Θζ軸方向）的運動。 再者，Χ-Υ載台的位置測量（X軸方向、Υ軸方向、θ2 軸方向）’係藉由安裝在頂部平台202上而往γ軸方向延 長的X鏡331、往X軸方向延長的γ鏡3 3 2(參照第η圖 )、及雷射干涉計（未圖示）來進行。根據藉由此位置測量 所得到的位置資訊，能夠進行6自由度（χ軸方向、Υ軸 方向、Ζ軸方向、θχ軸方向' ey軸方向' θζ軸方向）的全 閉路控制。進而，關於θχ軸方向、ey軸方向，也可以利 用雷射干涉計來測量位置；根據此測量値，z軸方向以外 ，全部可以根據從雷射干涉計來的位置資訊，進行位置控 制。但是，此情況，由於鏡大型化且雷射干涉計的光學零 件等也增加，需要考慮成本增加等的問題。 以上’已經就本發明的二個實施形態加以說明，本發 明的各構成元件，係利用非磁性材料作成。又，上述微動 載台裝置，如前所述，係應用在與粗動載台裝置一起被配 置在1 0 (Pa)程度的真空度的真空容器內來使用，但是當 然也可以在大氣中使用。也就是說，根據本發明的微動載 台裝置的動作環境，並不被限定於真空環境下，也可以在 大氣、N2等的環境下進行動作。因此，根據本發明的微 動或□裝置的應用領域，也可以應用於半導體製造裝置、 - 26- (24) (24)200427546 液晶製造裝置中；進而，可以應用於雷射加工機、工作機 械等的需要在微小範圍內進行高精度定位之各種載台裝置 中 〇 【發明的效果】 若根據本發明的第1形態，能夠提供一種6自由度的 微動載台裝置，即使在將超過5kg例如25kg的負載承載 在可動部上的情況，也能夠實現高停止性和高響應性。具 體而言，根據第1實施形態的微動載台裝置，係將承載負 載設想爲2 5 k g，藉由實施高剛性的引導系統的設計，在 X - Y載台部分，能夠確保固有値爲1 5 0 Η z (以往的5倍）。 錯此’停止穩定性提局至5〜6 n m (3 σ値）。又，數μ m的 步級響應，調定時間實現爲2 1〜3 0 m s e c。 若根據本發明的第2形態，加上根據第1形態的微動 載台裝置的效果，可以得到以下的效果。也就是說，在習 知的微動載台裝置中，由於幾乎沒有對於振動的減振元件 (要素），在沒有進行位置控制的狀態中，由於外部干擾所 產生的振動至減哀爲止’需要8〇〇〜i200msec程度。相對 於此，根據第2形態的微動載台裝置，藉由承載減衰器， 振動在大約ιπο的時間內之70〜U5msec的時間內，便 已經減衰。藉由如此的效果，傾斜載台的停止穩定性成爲 白知的1 / 6以下之9 n m (3 σ)，數μηι步級移動時的調定時 間也實現爲15〜30m sec。又，關於χ_γ載台部分，停止 穩定性也提高至3.5〜4.5ηηι(：3σ)。 -27- (25) (25)200427546 微動載台裝置，在χ-γ方向具有大的衝程，大多被 承載在進行高加減速的步級重複（siep_and — repeat)運動的 粗動載台裝置中。粗動載台裝置的高加減速運動，對於微 動載□ I置而5 ,爲外部干擾。藉由提高對於此種外部千 擾的減哀性㉟’能夠謀求高產量化。又，也大幅地提高對 於從真空排氣系統來的振動、或是閘閥開閉時的振動等的 穩定性。 【圖式簡單說明】 第1圖係根據本發明的第丨實施形態之微動載台裝置 的前視圖。 弟2 Η係丫皮弟1圖的線B的局度位置來看第1圖的微 動載台裝置所得到的俯視圖。 第3圖係從第1圖的右方來看第〗圖的微動載台裝置 所得到的側視圖。 弟4圖係從弟1圖的線Α的局度位置來看第1圖的 微動載台裝置所得到的俯視圖。 第5圖係將第1圖的微動載台裝置，在第4圖的線I 處切斷所得到的正面剖面圖。 第6圖係用來說明在第1圖的微動載台裝置中的傾斜 載台的驅動機構之構成的模式圖。 第7圖係用來說明傾斜板設置在第6圖中所示的傾斜 載台的驅動機構上的設置形態之模式圖。 第8圖係表示在第7圖中所示的傾斜板和XI板之 -28- (26) (26)200427546 間的組合之模式圖。 第9圖係係表示根據本發明的第2實施形態的微動載 台裝置之主要部分的構成之立體圖。 第1 〇圖係表示第9圖的微動載台裝置中的z軸驅動 機構之主要部分的構成例之立體圖。 第11圖係在第1 0圖的構成中，進而追加Z軸驅動機 構的構成要素，與傾斜板一起表示的立體圖。 第1 2圖係用來說明第9圖的微動載台裝置中的z軸 方向的減衰作用的部分立體圖。 第1 3圖係第9圖的微動載台裝置的俯視圖。 第14圖係用來說明第9圖的微動載台裝置中的X軸 方向、Y軸方向的減衰構造之部分擴大立體匾）。 第15圖係用來說明關於第9圖的微動載台裝置中的 X-Y載台的引導系統的俯視圖。 第16圖係用來說明在第9圖的微動載台裝置中作爲 減衰器來使用的減振器之構造例的剖面圖。 第1 7圖係用來以Z軸驅動機構的構成要素亦即z 3 軸致動器爲中心來說明第9圖的微動載台裝置之側面剖面 圖。 第1 8圖係以俯視圖來表示Z 1軸〜z 3軸用的壓電致 動器Z和其相關元件、三個主連桿摺葉3和二個副連桿摺 葉、Z軸減衰用的四個減振器及X軸、Y軸減衰用的四個 減衰器等的配置關係之圖。 第1 9圖係X軸減衰用、Y軸減衰用的四個減振器的 >29- (27) (27)200427546 支持構造之側面剖面圖。 【符號說明】 1 〇 〇 :底板 110、 120、 130、 203、 213、 223 ：壓電固定塊 115、 125、 135、 205、 215、 225 ：楔形載台 2 0 1 :傾斜板 202 :頂部平台 204 、 214 、 224 ： 2 連式載台 207、217、2 2 7 : Z1感測器、Z2感測器、Z3感測器 219、 229、 239、 249、 261〜264:減振器 226 :傾斜摺葉 20 8 ' 218、228、2 3 8 ：板片彈簧 260 :減振器夾持具 2 7 0 :阻尼環 3 0 1 : X - Y 板 3 02 : XI壓電致動器 303 : X2壓電致動器 3 04 : Y壓電致動器 3 2 1、3 2 2、3 2 3 :主連桿摺葉3 2 1 3 24、3 2 5 :副連桿摺葉200427546 (1) Description of the invention [Technical field to which the invention belongs] The present invention relates to a micro-motion stage device using a piezoelectric actuator as a driving source. [Prior Art] In the field of semiconductor manufacturing, various types of stage devices are used. For example, a 'stage device for wafer loading used in an electron beam exposure apparatus' is often used: a coarse movement stage device which operates when a wafer is transferred or moved between wafers; and performs a range of several nm to 100 nm The positioning of the micro-moving load is set; ifl combined. This stage device is used to move the wafers carried on the horizontal plane to the X-axis direction and the γ-axis direction which are perpendicular to each other. In addition, such a stage device can be operated under a high vacuum (1 (r4Pa)), and further requires non-magnetic characteristics. Most of the micro-movement stage devices use actuators (compressive elements) that use elastic hinges and piezoelectric elements. Electric actuator), for example, refer to Patent Document i. The micro-motion stage device 'is required to have high stopping stability, and at the same time, in order to achieve high yield, it is required to achieve a movement amount of 1 μm to several μm within a time of 0 msec to 100 msec In addition, the negative "30 mass" of the micro-motion stage device recently carried in such a stage device reaches 15 to 25 kg due to wafers, wafer chucks, and laser interferometer mirrors. However, the load of the micro-motion stage device so far is almost 5 kg. If a load of 15 to 25 kg is carried on the micro-motion stage device with a load of 5 kg, the resonance frequency -4 > (2) (2) 200427546 If the rate is low, there will be a significant decrease in stopping stability and responsiveness. For example, 'if a load of 15 ~ 25k§ is carried on a micro-motion stage device with a load of 5kg, the χ axis direction The natural frequency (resonant frequency) in the γ-axis direction is about 3 GHz, and the stop stability can only be ensured to about 10 to 30 nm. In addition, a step response of a few μΐΏ degree is required to be set to a number of 10 〇mse C [Patent Document 1] Japanese Patent Application Laid-Open No. 2 7〗 4 7 9 [Summary of the Invention] (Problems to be Solved by the Invention) Therefore, the object of the present invention is to provide a micro-motion stage device, even if the load exceeds 5 kg. In this case, high stopping stability and high responsiveness can be achieved. Another object of the present invention is to enable the above-mentioned micro-motion stage device to have multiple degrees of freedom of 3 degrees or more. Furthermore, another object of the present invention is to provide a vibration that can be improved. Micromotion stage device with attenuation reduction performance. (Means for solving the problem) According to the first aspect of the present invention, there can be provided a micromotion stage device including an inclined stage 'and an X-Y stage built on a base. The micro-movement stage device in the form of a stage is characterized in that: the tilt stage has an inclined plate, and between the inclined plate and the base, Prepare at least three transformation mechanisms. The transformation mechanism uses (3) (3) 200427546) the combination of a piezoelectric actuator and a wedge-shaped stage to transform the movement parallel to the aforementioned base into Z perpendicular to the aforementioned base. Movement in the axial direction; the X-Y stage has a χ_Y plate combined with the inclined plate, and has: one of the X-axis direction and the γ-axis direction extending parallel to each other, and using at least two points to Driving at least two second piezoelectric actuators of the X _ γ plate; and third piezoelectric actuators extending to the other of the X-axis direction and the γ-axis direction to drive the X-Χ plate. According to the brotherhood-shaped micro-movement stage device, by arranging the at least three transforming mechanisms on the same circumference at equal intervals, the inclined plate 'is made to move in the direction of the Z axis and around the X The θ X-axis direction of the axis and the Θ y-axis direction around the Υ axis are displaced; the X-Y plate is made to be displaceable together with the inclined plate, and is made independent of the inclined plate, and can be moved to X-axis direction, γ-axis direction, θ ζ-axis direction around Z-axis, advance Variable Bit. Furthermore, in the micro-motion stage device according to the first aspect, a plurality of link flaps are provided between the inclined plate and the X-Y plate, and the link flaps are used to guide the X- The movement in the X-γ plane of the Y plate is high in rigidity in the direction perpendicular to the aforementioned base. Further, in the micro-motion stage device according to the first aspect, a leaf spring is provided between the inclined plate and the base at a plurality of positions to restrict movement in the X-Y plane of the inclined plate. Furthermore, in the micro-motion stage device according to the first aspect, the inclined hinge is interposed between the upper part of the moving part in the z-axis direction in the conversion mechanism and the inclined plate. -6- (4) (4) 200427546 Furthermore, in the micro-motion stage device according to the first aspect, the first piezoelectric actuator described above includes two piezoelectric actuator elements extending in parallel with each other. The two stages are combined so that their strokes are added. According to the second aspect of the present invention, a top platform for carrying a load is assembled on the X_Y plate, and a plurality of Z having a Z-axis direction attenuation effect is arranged between the base and the top platform. Shaft Attenuator. In the micromotion stage device according to the second aspect, at least three attenuators having attenuating effects in the X-axis direction and the γ-axis direction are arranged between the base and the X-axis plate at the same χ- in the γ plane. Further, in the micro-motion stage device according to the second aspect, the inclined plate has a first opening in a central portion and the X-Υ plate having a second opening smaller than the first opening is combined in the first丨 In the opening; On the bottom surface of the top platform corresponding to the second opening, a damping ring of a size corresponding to the second opening is provided; In the damping ring, a damper ring is provided through the platform provided on the base, than the damping ring A damper holder with a small inner diameter; between the damper holder and the damping ring, at least two X-axis dampers having a damping effect in the X-axis direction are arranged on a coaxial axis, and They can act in opposite directions to each other; and at least two Z-axis attenuators with attenuation in the Z-axis direction are arranged on the same axis and can act in opposite directions to each other. Furthermore, in the micromotion stage device according to the second aspect, the aforementioned-/-(5) (5) 200427546 X-axis attenuator, Y-axis attenuator, and Z-axis attenuator are formed by using a non-magnetic material. The shock absorber is composed of a base grease for vacuum grease, which is a damping damping oil, and includes a spring for recovery, a piston rod, and an X-axis damper and a Y-axis damper. The front end of the piston rod is connected to the damping ring; the Z-axis attenuator is configured so that the front end of the piston rod is connected to the bottom surface of the top platform. [Embodiment] Hereinafter, a first embodiment of a micro-motion stage device according to the present invention will be described with reference to Figs. 1 to 8. Although the micro-motion stage device according to this embodiment can be used alone, it is usually combined with an X-Y stage device, which is a coarse-motion stage device. The χ-γ stage device includes an X machine that moves in the χ-axis direction and a γ machine that moves in the γ-axis direction; for example, the X-machine can be configured to move on the γ-machine. Of course, it can also be configured that the machine can be moved on the X machine. The micro-movement stage device is carried on the X machine or the γ machine in the X-Χ stage device. The micro-moving carrier device is composed of an AX-Z-0Z axis stage (hereinafter referred to as an X-Z stage, but different from a coarse-motion stage device, that is, an X-Z stage device), and is assembled in It is constructed on a Z-θχ-ey axis stage (hereinafter referred to as a tilt (ti) t stage) on the bottom plate 100. First, the tilt stage will be described. As shown in FIG. 1 ′ and FIG. 2 ′, the tilt stage has a tilt plate 201. As shown in FIG. 4, the tilting plate 2101 (6) (6) 200427546 has a total of 6 piezoelectric actuators (pressure actuators) arranged in two groups of 3 and extending parallel to each other on the bottom plate 100. Electric actuator element) ZI-l, Z1 -2, Z 2-1, Z 2-2, Z 3-1, Z 3-2 and the wedge-shaped stage described later, are perpendicular to the base plate 100 (Z Axis direction or vertical direction). Hereinafter, the combination of the piezoelectric actuators Z 1-1 and Z 2 is referred to as the Z 1 axis, the combination of the piezoelectric actuators Z2-1 and Z 2-2 is referred to as the Z 2 axis, and the piezoelectric actuator The combination of Z3-1 and Z3-2 is called the Z3 axis. The structure and operation of the Z3 axis will be described in detail with reference to FIGS. 5 and 6 of the schematic diagram. The piezoelectric fixing block 223 is provided on the base plate 100. One end of the piezoelectric actuator Z3-2 is fixed to a piezoelectric fixing block 2 2 3 ′, and is connected to the piezoelectric actuator Z 3 -1 via a two-stage stage 2 2 4. Thereby, the driving stroke of the piezoelectric actuator Z3-2 and the driving stroke of the piezoelectric actuator Z3-1 are added to drive the wedge-shaped stage 2 2 5 with the added driving stroke. The so-called wedge-shaped stage is, as is well known, a member for converting horizontal motion into vertical motion. In this example, the wedge-shaped stage 22 5 ′ is provided with a 45-degree right-angle conversion mechanism. With two piezoelectric actuators, the horizontal displacement input generated by Z2-2, and the vertical displacement output of the wedge-shaped stage 225, Departments are constructed one-to-one. The right-angle conversion mechanism includes a combination of an inclined block 22 5- 1 having a 45-degree inclined surface on its top surface side, and an inclined block 22 5 -2 having a 45-degree inclined surface on its bottom surface side. The tilting block 22 5 -1 has a guide portion for guiding the tilting block 225-2. The inclined block 22 5-2 ′ can be slid along the inclined surface of the inclined block 2 2 5-1 in a state where the inclined surface is guided by the guide portion. Therefore, if the tilting block 2 2 5 d moves toward the water (7) (7) 200427546 + direction, the tilting block 2 2 5-2 slides along with the displacement and shifts in the vertical direction. With such a wedge-shaped stage 22 5, the inclined hinge 226 fixed to the vertical moving portion thereof is driven in the Z-axis direction. The inclined plate 2 01 fixed to the tip of the inclined hinge 2 2 6 is driven in the Z-axis direction. The inclined plate 201 has an opening 201a in the center (see Fig. 7). The X-Y plate 3 0 1 (see Fig. 2) is combined in the opening 2 0 1 a. The top platform 2 0 2 (see FIG. 5) is fixed to the X-γ plate 301. The details of the board 301 and the top platform 2 02 will be described later. The Z1 axis and the Z2 axis also have the same configuration as the Z3 axis. In other words, the Z1 axis has a piezoelectric fixed block 203, a 2-connected stage 204, and a wedge-shaped stage 205; the Z2 axis includes a piezoelectric fixed block 213, a 2-connected stage 214, and a wedge-shaped stage 215. In particular, the wedge-shaped stage 205 of the Z1 axis, the wedge-shaped stage 215 of the Z2-axis, and the wedge-shaped stage 225 of the Z3-axis are arranged on the same circumference, respectively (indicated by key lines in Fig. 4). In particular, in this example, the wedge-shaped stages 205, 2 1 5 and 22 5 are arranged at positions corresponding to the vertices of the regular triangle, that is, at an angle of 120 degrees. The three-axis vertical moving part can be displaced in the same direction. Thereby, the tilting plate 2 0 1 performs translational motion and differential motion toward the Z-axis direction. That is, if the displacement amount of each axis is different, the tilting plate 2 0 1 performs the θχ-axis direction and the 0y-axis direction. Rotary motion. Here, the rotation motion in the θ X axis direction means a rotation motion around the X axis, and the rotation motion in the 0 y axis direction certainly means a rotation motion about the Y axis. The rotational movement in the θζ axis direction described later means a rotational movement around the ζ axis. -10- (8) (8) 200427546 The position in the Z axis direction is measured by a capacitance sensor here. The electrostatic capacity sensor is located above the inclined plate 201. It is arranged between the final movable part, that is, the top platform 202 and the bottom plate 100. Hereinafter, the capacitance sensor for the z 1 axis is referred to as a Z 1 sensor 2 0, and the capacitance sensor for the Z 2 axis is referred to as a Z 2 sensor 2 1 7. The electrostatic capacity sensor is called Z3 sensor 22 7. Each of the sensors 2 0 7, 217, and 22 7 is disposed at positions adjacent to the wedge-shaped stages 2 0 5, 2 1 5, 2 2 5. The measuring principle of electrostatic capacity sensors is well known. In simple terms, it can detect small displacements in the Z-axis direction with changes in electrostatic capacity. In this form, with these Z1 sensors 2 0 7, Z2 sensors 217, and Z3 sensors 22 7, the height of the final movable part, that is, the top platform 202 is measured, and the top platform 202 is measured based on the measurement results. Position control (full-closed control). Generally, in a tilt stage, the height of the tilt plate 20 1 from the bottom plate 100 is measured, and position control (semi-closed control) is performed based on the measurement results. However, this method cannot measure the position error in the Z-axis direction when the X-Y stage moves. This means that the positions in the Z-axis direction, θχ-axis direction, and 0y-axis direction of the top stage 202 cannot be controlled. However, according to the arrangement of the position measurement system in the Z-axis direction in the present embodiment, position control in the Z-axis direction, θχ-axis direction, and 0y-axis direction of the top stage 202 becomes possible. The guidance system of the tilting platform is based on the tilting flaps 2 06, 216, 226 installed on each of the wedge-shaped stages 2 05, 215, 22 5 and the bottom plate] 00 and the tilting plate 201. The leaf springs 208, 21 8, and 2 2 8 that can be displaced only in the Z-axis direction are configured (refer to FIGS. 4 and 7). Borrow -11-(9) (9) 200427546 These plate springs 208, 21 8, 22 8 cannot be achieved by using only the guide of the wedge-shaped stage to limit the X-γ plane of the inclined plate 2 0 1 The high rigidity guiding system within the movement can be constructed. The leaf springs 208, 2 I 8, and 2 2 8 are provided via spring mounting portions 208-1, 218-1, and 228-1, which are provided on the bottom plate 100, respectively. Next, the stage will be described with reference to Figs. 1 to 3 and Fig. 8 which is a schematic diagram. The top platform 2 02 is fixed to the χ-γ plate 301. The X · Y plate 3 0 1 is fitted in an opening 2 0 1 a in the center of the inclined plate 2 0 1. The x · Y plate 3 0 1 can be shifted with the inclined plate 2 0 1 from the Z-axis direction, θ X-axis direction, and 0y-axis direction, but 尙 is made independent of the inclined plate 201 and can be moved to the X-axis direction and Y Displacement in axial direction and θζ axis direction. In other words, the X-diaphragm 3 0 1 is related to the X-axis direction by using two XI piezoelectric actuators 3 02 and X 2 piezoelectric actuators 3 0 3 which are parallel to each other in the X-axis direction. drive. X 1 piezoelectric actuators 3 0 2 and X 1 piezoelectric actuators 3 0 2 are arranged at predetermined intervals, and one end of each is fixed to the inclined plate 2 0 1, and the other end is connected to the X- The fascia board 301 is connected. On the other hand, the X-Υ plate 301 is driven by a single Y piezoelectric actuator 304 extending in the Y direction with respect to the Y axis direction. One end of the Y-piezoelectric actuator 304 is also fixed to the inclined plate 201, and the other end is connected to the X-Y plate 301. The guidance system of the stage is as follows. In the guidance system of the X- ， plane, the XI flap 3 1 2 fixed to one end of the XI piezoelectric actuator 3 02 is fixed to the inclined plate 20 1; it is fixed to the X 1 piezoelectric actuator. The XI hinge 3 1 1 on the other end of 3 02 is connected to the X4 plate 301. Similarly, the X2 fold fixed to one end of the X2 piezoelectric actuator 303 is -12-(10) 200427546 Ju 3 1 4 'is fixed to the inclined plate 2 〇1; is fixed to the χ 2 piezoelectric 3 〇 X 2 fold 3 on the other end of 3 3 is connected to X _ γ plate 3 〇 3 on one side 'is fixed to the piezoelectric actuator 3 〇 3 1 6 is fixed to the inclined plate 2 0]; The hinge leaf 3 1 5 fixed on the other end of the γ piezoelectric actuator is connected to the X-γ plate 3 0 1. The guide system in the direction of the Z axis is based on the three main link leaves 3 2, 3 2 2, 3 2 3 and the auxiliary link leaves 3 2 4 which are arranged between the χ_γ plate inclined plate 2 01. 3 2 5 to achieve. Referring to Fig. 5, for example, among the flaps, the main link flap 321 will be described. A link flap 3 2 1-1 extending vertically downward is provided on the inclined plate. Here, the leaf block 3 2 1 · 1 is provided with a folding leaf 321-2 extending from above to the X-γ plate 3 (. The folding leaf 321-2 has a well-known ball-shaped head, so that the X-Υ plate The 301 can be displaced in the X-Y plane, and the axis direction supports the X-Y plate 3 01, showing high rigidity. The main links 322, 323, and the auxiliary link flaps 324, 325 also have exactly the same. In Figure 8, the main link leaf 3 22 composed of the link leaf block 322-1 3 22-2 is shown. The three main link leafs 321, 3 22, and 3 23 are arranged. In the corner shape, here is the position corresponding to the apex of the isosceles triangle; two folding leaves 3 24, 3 25 are arranged on both sides of the main link folding leaf 321 and the rod folding leaves 3 2 1 ~ 3 2 3 and the auxiliary joint The lever hinges 3 2 4 and 3 2 5 have the function of freely displacing 3 0 1 in the X-T plane, and at the same time have high rigidity. By this, compared with the conventional micro-motion stage device The rigidity of the actuator is increased. In addition, the hinge 1 of the hinge 3 04 and the two links 201 are connected, and the link fold > 1 is connected to the joint. Connecting rod. Main connection X-ζplate ζ axis Significantly -13-- (11) 200 427 546 will be described operation of Χ-Υ pressure stage of the XI and X 2 if the piezoelectric actuator 303 toward the same direction operation. Performs translational movement in the X-axis direction. X 1 piezoelectric actuator Electric actuator 3 0 3 performs differential operation, that is, displacement. X-Υ plate 301 operates in the θζ axis direction. On the other side, the actuator 3 0 4 moves, and the X-diaphragm 3 0 1 moves toward the axis. The position of the X-axis plate 301 in the X-axis direction is obtained by using two electrostatic capacitances 3 2 7 (hereinafter referred to as X 1 sensor and χ 2 sensor) between the plate 201 and the XY plate 3 01. The position in the Z axis direction of the plate 301 is measured using an electrostatic capacity sensor (sensor (sensor) disposed between the X-Q plate 301). The semi-closed position control of the top platform 2 0 2 is performed based on the X-axis flat signals ′ measured by these X 1 sensors 3 2 7 and Υ sensors 3 2 8. As described above, the top platform 202 is fixed to the inclined plate 201 in the inclined stage, and can be displaced in the z-axis direction and the y-axis direction. In addition, the χ_γ plate in the 乂 -Ya stage is tilted and shifted by 2 0 1. 尙 can be displaced independently of the tilt plate axis direction, the Υ-axis direction, and the θ-ζ axis direction. Thereby, 6 degrees of freedom (X-axis direction, γ-axis direction,: -axis direction, Θ y-axis direction, ㊀ζ-axis direction) can be moved. Furthermore, the position measurement of the XY stage (x-axis direction, axis direction) is installed on the top platform 202 and the valley electric actuator 3 0 2 has a difference in pressure between the XY plate 301 302 and X2. In this case, if the Y piezoelectric direction is moved in parallel, it is arranged at the tilt sensor 3 26 to perform measurement. The position of XY on the inclined plate 2 0 1 3 2 8 (hereinafter referred to as the detector 326 > X2 plane ~ plate 301, θχ axis direction, 3 〇1, and 201 can go to the X top platform 2 0 2 B-axis direction, θχ Υ-axis direction, θζ i Υ-axis direction extends -14- (12) (12) 200427546 Long X-mirror 325 (Fig. 1), Y-mirror 326 extending toward X-axis (Fig. 3) ), And laser sensor (not shown). Based on the position information obtained from this position measurement, 6 degrees of freedom (X-axis direction, γ-axis direction, Z-axis direction, θχ-axis direction, 0y axis direction, θζ axis direction) full closed circuit control. Furthermore, regarding the θχ axis direction and 0y axis direction, a laser interferometer can also be used to measure the position; according to this measurement, all except the Z axis direction can be determined from The position information from the radio interferometer is used for position control. However, in this case, since the size of the mirror is increased and the optical components of the laser interferometer are also increased, it is necessary to consider the problem of increased cost and the like. Next, the first aspect of the present invention will be described. The micro-movement stage device of the second embodiment. The micro-movement stage device according to the second embodiment The moving stage device is for the micro-moving stage device according to the first embodiment, and the following improvements are added. According to the micro-moving stage device of the first embodiment, the tilting stage part has a large moving stroke and is piezoelectrically induced. In the characteristics of the actuator, it is difficult to ensure high rigidity. This is because, in the micro-motion stage device according to the first embodiment, in order to increase the stroke, a two-stage stage is used to form two piezoelectric actuators. In other words, a two-piece piezoelectric actuator has a rigid modulus equal to two springs connected in series. The larger the stroke, the lower the rigidity in the driving direction. Further, in the micro-motion stage device according to the first embodiment, in order to increase the rigidity of the X-Y stage portion and increase the mass. Therefore, the load mass of the tilt stage is increased; as a result, the inherent performance is reduced and the response performance is reduced There is room for improvement in reducing the setting time when responding in steps of several μιη. Furthermore, according to the micro-motion stage device according to the first embodiment, since -15- (13) (13) 200427546 has almost no attenuation for vibration There is room for improvement in vibration attenuation performance. In other words, it takes time until the adjustment after the movement of the stage, and it also takes time until the adjustment due to external interference. Therefore, according to the second The micro-motion stage device according to the embodiment is characterized by including a vacuum and non-magnetic attenuator for improving vibration attenuation performance. The micro-motion load according to the second embodiment will be described with reference to FIGS. 9 to 19. Platform device. Although this micro-motion stage device can also be used alone, it is usually combined in a coarse-motion stage device, that is, a χ-γ stage device. That is, this micro-motion stage device is usually also carried in The X or γ machine in the stage device. The basic structure of the micro-motion stage device according to this embodiment is the same as that of the micro-motion stage device according to the first embodiment, but in order to achieve high rigidity in the Z-axis direction, the stage stroke was changed from 36 μm to 18 0 [ xm. As a result, in the micro-movement stage device according to the first embodiment, a zigzag structure in which two z-axis driving piezoelectric actuators are connected in series using a two-stage stage is used. In the second embodiment, A single z-axis driving piezoelectric actuator is sufficient. This micro-movement stage device is configured as: χ-Υ-θζ axis stage (hereinafter referred to as χ-γ stage, but is different from the coarse-motion stage device, that is, χ_γ stage device) is assembled in the structure The Z_θ χ _ θ y axis stage (hereinafter referred to as a tilt stage) on the bottom plate as the base. At first, the tilt stage will be described. As shown in Fig. 9 to Fig. 11, the 'tilt stage has a tilt plate 201. Inclined plate 2 (Π, by placing -16- (14) (14) 200427546 three piezoelectric actuators (piezoelectric actuator elements) z extending parallel to each other on the bottom plate 1000) 1, Z2, Z3 and the wedge-shaped stage described later are driven in a vertical direction (Z-axis direction or up-down direction) with respect to the bottom plate 100. Hereinafter, the piezoelectric actuator Z 1 will be driven in the Z-axis direction. The driven axis is called the zj axis. The axis driven by the piezoelectric actuator Z2 in the Z-axis direction is called the Z2 axis, and the axis driven by the piezoelectric actuator Z3 in the z-axis direction is called the zj axis. It is the Z3 axis. The structure and operation of the Z3 axis will be described in detail. The piezoelectric fixing block 130 is provided on the bottom plate 100. The piezoelectric actuator Z3 is fixed at one end to the piezoelectric fixing block 130. It is used to drive the wedge-shaped stage 1 3 5. The so-called wedge-shaped stage, also known as a sliding oblique wedge, is a mechanism that transforms horizontal movement into vertical movement as described above. Wedge-shaped stage 1 3 5 In this example, 'equipped with a 45-degree right-angle conversion mechanism, as shown in Fig. 7], the horizontal displacement input and wedge load generated by the piezoelectric actuator Z3 The vertical displacement output of the platform I 3 5 is constituted one-to-one. The right-angle conversion mechanism includes a first inclined block with a 45-degree inclined surface on its top surface side 3 5_ 丨 and a bottom surface side with A combination of the second inclined block 1 3 5-2 with a 45-degree inclined surface. The first inclined block 135-1 has a guide portion for guiding the second inclined block 135-2. The second inclined block 1 3 5 -2, the inclined surface of which can be slid along the inclined surface of the first inclined block I 3 5 · 1 while being guided by the guide portion of the first inclined block 1 3 5-1. If the first tilting block} 3 5 ^ is displaced in the horizontal direction, the second tilting block 1 3 5 -2 slides along with the displacement, and only shifts in the vertical direction. Furthermore, the piezoelectric actuator Z3 is supported by the supporting member 13 provided on the bottom plate 100. -17-(15) 200427546 With such a wedge-shaped stage 135, it is fixed to the inclined flap 1 which is transported vertically. 3 7, driven in the direction of the Z axis. Furthermore, the inclined plate 2 0 1 at the front end of the inclined leaf 1 3 7 is inclined. Furthermore, in the direction of the Z 1 axis, the inclined plate 2 0 1 has an opening 2 0 1 a in the center. (No. 1) Figure 301 (No. 9 (Picture) is combined in the opening 201a. The top platform 1 3) is fixed to the X · Y plate 3 0 1. The details of the X-γ plate 3 0! And the stage 2 0 2 are described later. Z1 axis, Z 2 Although the axis also has the same structure as the Z 3 axis, it is arranged to extend opposite to the Z 3 axis at a predetermined interval. The Z 1 axis includes a piezoelectric fixing block 11 and a wedge-shaped stage 115 and a leaf 117; Z2 The shaft has a piezoelectric fixed block 120 and a wedge-shaped stage 1 with an oblique folding leaf 1 2 7. Z 1-axis wedge-shaped stage 1 1 5, Z2-axis wedge-shaped stage 1 Z 5-axis wedge-shaped stage 1 3 5 are arranged on the same circumference respectively. In this example, wedge-shaped stage 1 1 5, 1 2 5 , 1 3 5, the positions of the vertices of the regular triangle are arranged to be 20 degrees apart. The three axes can be displaced in the same direction (here, the X-axis direction), or can be displaced in the same direction (here, the Z-axis direction). The inclined plate 2 0 1 performs a translational movement in the Z-axis direction. . On the other hand, if the displacement of each axis of Zl, Z2, and Z3 is different, the tilting plate 2 0 1 performs rotation in the θ X-axis direction and θ y-axis direction. As described above, the rotational movement in the Θ X-axis direction means the rotation around the X-rotation 'axis direction means the movement around the γ-axis. Also, the rotational movement in the θ z-axis direction described later means a rotational movement around. The moving part is fixed to the drive. ) XY 202 (the top is flat, but the opposite side, tilt 25, tilt platform 125. Especially at the corresponding angle, vertical. With this plane, the difference gives the rotation of the rotation axis f z axis -18 · ( 16) (16) 200427546 The position in the Z-axis direction is measured here by a capacitance sensor. The capacitance sensor is located above the inclined plate 2 0 1. It is arranged on the final movable part, that is, the top platform 2 0 2 and the bottom plate] 〇〇. Hereinafter, the capacitance sensor for the Z 1 axis shown in FIG. 9 is referred to as a z 1 sensor 2 0, and the capacitance sensor for the Z 2 axis is referred to as a “z 1 sensor”. It is Z2 sensor 2 1 7. The capacitance sensor for Z3 axis is called Z 3 sensor 2 2 7. Each sensor 2 0 7, 2 1 7, 2 2 7 is set at Adjacent to the wedge-shaped stage} 丨 5, 1 2 5 and I 3 5. The measuring principle of the capacitance sensor is as described above. In this form, these Z1 sensors 2 0 7 and Z 2 Sensor 217, Z3 sensor 227, measure the height of the final movable part, that is, the top platform 2002, and perform position control of the top platform 2 0 2 based on the measurement results (full-closed control) In general, in a tilted stage, the height of the inclined plate 201 from the bottom plate 100 is measured, and the position control (semi-closed control) is performed based on the measurement results. However, this method cannot measure the XY plate 301 to XY Positional error in the Z-axis direction when moving in the direction. This means that the position of the top platform 202 in the Z-axis direction, θχ-axis direction, and 0y-axis direction cannot be controlled. However, the position measurement system of the Z-axis direction position in this form The position control of the Z-axis direction, θχ-axis direction, and 0y-axis direction of the top platform 202 is possible. The guidance system of the tilting stage is installed on each wedge-shaped stage 1 1 5, 1 2 5, 1 3 5 inclined leaf 1 1 7, 1 2 7, 1 3 7 and a leaf spring 2 0 which can be displaced only in the Z-axis direction and is installed between the bottom plate 1 0 and the inclined plate 2 0 1 8, 2 1 8, 2 2 8 (Refer to Fig. 11 but the symbol 2 0 refers to-19- (17) 200427546 Fig. 18). These leaf springs 208 and 218 utilize a wedge-shaped stage. High rigidity guiding system impossible for the guide to limit the movement in the inclined X-Y plane Further, the leaf springs 20 8, 218, and 22 8 may be installed via spring mounting portions 20 8 -1 (refer to FIG. 18) and 218 · provided on 100, respectively. In this form, further such as As shown in FIG. 9, j-attenuator dampers 219, 229, 239, and 249 are installed on the support tables 219-1, 229-1, and 239_1 on the fixed substrate 100. As shown in Figure 12 for each damping plug rod, the front end of the piston rod is connected to the bottom surface of 202. Here, four shock absorbers 219, 229, and 239 are placed near the outer edge of the top platform 202, and particularly two are placed at the positions of 135. This is to consider at least three interrogators for balance, or more depending on the situation. As described above, the front ends of the shock absorbers 219, 229, 239, and 249 are connected to the bottom surface of the top platform 202. When the platform 202 is rotated in the θχ-axis direction and the 0y-axis direction through such a platform 202, the above-mentioned damper must be pressed in, and the damping effect can be obtained by the damper. Regarding the movement in the Z-axis direction of the top platform 202, the lower shock absorbers 219, 2 2 9 '2 3 9, and 249 exhibit a damping effect. When the second platform 202 moves upward in a horizontal state, the attenuation is not effectively reduced. However, the top platform 202 is not constructed completely, only the sloping plate 2 0 1 is constructed. Placed on the bottom plate -1, 22 8 -1. The bottom plate is a Z-axis device with a movable top platform 249. It is set close to a wedge-shaped problem. The damping configuration is equipped with five piston rods. There are actually two to the effective square. Those who are in the top method expect a horizontal state of -20- (18) (18) 200427546 to move in the z-axis direction, which must accompany the movement in the 0) ^ direction and the axial direction. Therefore, in fact, the top platform 202 can be effectively attenuated in any direction of the Z-axis direction, the θχ-axis direction, and the ey-axis direction. Next, the X-Y stage will be described with reference to FIG. 13. The top platform 202 is fixed to the top surface side of the X-Y plate 3 01. As shown in FIG. 13, the X _ γ plate 3 0 1 is attached to the opening 2 0 1 a in the central portion of the inclined plate 2 0 1. The X-Y plate 3 0 1 can be displaced from the tilted plate 2 0 1 to the Z-axis direction, θ X-axis direction, and Θ y-axis direction, but 尙 is made independent of the tilted plate 2 〇1 and can be shifted in the X-axis direction. Direction, Y-axis direction, and θζ-axis direction. In other words, the X-diaphragm 3 0 1 is driven by two XI piezoelectric actuators 3 02 and X 2 piezoelectric actuators 03 03 which are parallel to each other in the X axis direction. . As shown in FIG. 9, the X1 piezoelectric actuator 3 0 2 and the X1 piezoelectric actuator 3 02 are arranged at predetermined intervals, and one end side of each of the X1 piezoelectric actuators 3 02-1, 3 03 -1, is fixed to the inclined plate 201, and the other end is connected to the X-Υ plate 30]. On the other hand, the X-Υ plate 301 is driven with respect to the Y-axis direction by a Y-piezoelectric actuator 304 extending in the Y-axis direction. One end of the Υ piezoelectric actuator 304 is also fixed to the inclined plate 201 via the mounting plate 3 04 -1, and the other end is connected to the X-Υ plate 301. The guidance system of the ballast stage is as follows. As shown in FIG. 15, in the guidance system of the XY plane, the XI flap 312 fixed on one end of the XI piezoelectric actuator 302 is fixed to the inclined plate 20]; it is fixed to X1 The X1 flap 3 Π on the other end of the piezoelectric actuator 3 02 is connected to the X-Υ plate 301. Similarly, an X2 flap 314 (not shown) fixed to one end of the X2 piezoelectric actuator 303-2 (19) 200427546 is fixed to 5 •, and is fixed to the X2 piezoelectric actuator 303. 3] 3 (not shown) on the other end of the cable is connected to the XY plate 301. On the other hand, the Y-folder 316 on one end of the Y-piezoelectric actuator 304 (not on the mounting plate 3 04 ″) is fixed to the Y-folder 315 (not shown) of the γ-piezoelectric actuator 304. The XY plate 301 is connected to the Z-axis direction guidance system as shown in Fig. 13. The three main lines, 322, 323, and two auxiliary lines are placed between the X-Y plate 3 0 1 and the inclined plate 201. The lever flaps 324 and 325 are shown in FIG. 17. Among these link flaps, for example, the main link flap is Ming. On the inclined plate 2 0 1, 3 2 Bu 1 extending vertically downward is provided. The lever folding leaf block 3 2 1-1 is provided with a folding leaf 321-2 connected to the XY plate 301 from this point. The folding leaf 321 is a well-known ball joint, so that the XY plate 301 can be displaced. In the Z-axis direction, the X · Y plate 3 0] is supported. The main link flaps 3 2 2, 3 2 3, the auxiliary link flaps 3 2 4, and the exact same structure. Furthermore, the first 7 The figure shows only the essential components. In Fig. 9, the main link leaf 3 22 composed of 3 22-1 and the leaf 3 22-2 is shown. As shown in Fig. 13, The three main link flaps 3 2 1 are arranged at positions corresponding to the vertices of the isosceles triangle ; Two leaves 3 24, 3 2 5, are arranged in the main link leaf 321 two leaves 32 1 ~ 3 2 3 and the auxiliary link leaf 3 3, 24, 3 2 5 with a narrow 30 1 free in the XT plane The function of freely displacing, the X2 folding leaf of the same mounting plate 3 03 -1, is fixed on the figure) The other end fixed is 0, and it is realized by setting the rod folding leaf 3 2 1. With reference to 3 21, the connecting rod folding leaf block is extended above and Z, which has the common XY plane, showing that the high rigidity 3 2 5 also has the necessary connecting rod folding leaf blocks 322, 323, and vice versa. Fold the link. The main link ί makes the X-Υ plate in the direction of the Z axis -22 > (20) (20) 200427546 has high rigidity. As a result, the rigidity is greatly improved compared with the conventional micro-motion stage device. The operation of the X-Y stage will be described. If the X1 piezoelectric actuator 302 and the X 2 piezoelectric actuator 303 move in the same direction, the X-γ plate 3 0 1 performs translational movement in the X-axis direction. XI piezoelectric actuator 302 and X2 pressure pen: tji [Dynamic benefit:> 03 Rightward and differential motion, that is, the amount of displacement is different, the X-Y plate 301 performs the movement in the θζ axis direction. On the other hand, when the γ piezoelectric actuator 304 is operated, the X-Υ plate 301 performs a translational movement in the Y-axis direction. Figure 1 Photo of the little brother 1 3 'The position of the X axis of the X-shaped plate 3 0 1 in the X-axis direction uses two electrostatic capacity sensors arranged between the inclined plate 2 0 1 and the X-shaped plate 3 0 1 3 2 6, 3 2 7 (hereinafter referred to as XI sensor, X2 sensor). The position of the X-axis plate 3 0 1 in the Z-axis direction is obtained by using a capacitance sensor j 2 8 (hereinafter referred to as a Υ sensor) arranged between the inclined plate 201 and the X-axis plate 301. Take measurements. The semi-closed position control of the top platform 202 is performed based on the position information in the X-γ plane measured by these X 1 sensors 3 26, X 2 sensors 3 27, and Y sensors 3 2 8. Next, referring to FIG. 13 and referring to FIG. 14, the attenuator in the x-axis direction and the Υ-axis direction will be described. The two holding tables 2 5 1 and 2 5 2 are fixedly arranged on the bottom plate 100 at intervals. A rectangular frame-shaped shock absorber holder 260 is fixed to these holding tables 251 and 252. The reason why the clamping tables 25m and 2 5 2 are arranged at intervals is that the piezoelectric actuator z 3 g passes between the two. On the other hand, the X-Y plate 301 has an opening p 3a] a in the center (see FIG. 9). An opening 202a is also provided on the top platform 2 02 corresponding to the opening 30] a -23-(21) (21) 200427546 '(Figure 13). On the inner wall of the opening 202a, a damping ring 270 is installed. The damping ring has an inner diameter smaller than that of the inner wall of the opening 2202 and larger than that of the shock absorber holder 260. The two dampers 261, 262, which are attenuators in the X-axis direction, are coaxially mounted in the X-axis direction and face opposite directions, and are installed in the damper holder 260. Two dampers 2 6 3 and 2 6 4 which are attenuators in the γ-axis direction are installed in the damper holder 260 on the coaxial in the γ-axis direction and facing in opposite directions. The piston rods of each of the shock absorbers 261 to 264 are connected to the inner diameter surface of the damping ring 270. With the arrangement of the above-mentioned four shock absorbers 261 to 264 in the same XY plane, when the top platform 202 moves in the X-axis direction and the γ-axis direction, more than one shock absorber must be in a pressed state. Can effectively reduce attenuation. Regarding the rotational movement in the θ z-axis direction of the top stage 2 0 2, the center of the shock absorber holder 2 60 and the center of gravity of the load (the load of the movable part such as the top stage and the mirror) do not coincide with each other. The contact points of the vibrators 2 6 1 to 2 64 are translated and acted to form a configuration and structure capable of exhibiting attenuation reduction performance. In addition, at least three attenuators in the X-axis direction and the Y-axis direction may be provided. That is, in the above example, four shock absorbers are arranged on the same plane with an angular interval of 90 degrees. However, even when three shock absorbers are arranged on the same plane (ideally an interval angle of 120 degrees), the attenuation performance in the X-axis direction and the Y-axis direction can be exhibited. The shock absorbers 219, 229, 239, 249, 26] to 264 all use the same thing. The structure of the shock absorber is generally called a shock absorber, and there are various types on the market -24- (22) 200427546. Figure 6 shows an example of this. In Fig. 16, the symbol 401 is a piston rod, the symbol 4 03 is a plug, the symbol 404 is an accumulator, the symbol 4 〇6 is oil, the symbol 4 0 7 is a piston ring, the symbol 4 09 is a rod material, and the symbol 410 Oil ring and symbol 4 1 2 are hexagon nuts. Usually, when this is used, the front end of the piston rod is rigidly fixed. However, in the present invention, the piston rod is not characterized. In the present invention, as the material for corresponding vacuum and use, structural changes such as the use of titanium, saucer bronze, beryllium bronze, and oil for attenuation, and the use of vacuum grease for the base line, and the use of vacuum seals of the expansion bladder, are implemented. Vacuum and non-magnetic support. For reference, in Fig. 18, the piezoelectric actuators Z 1 to Z 3 with the pitch f Z 3 axis and the associated 321 to 323 and the auxiliary link flaps 324 and 325, the sources 239 and 249, and the minus In the arrangement f of the vibrators 261 to 264 and the like, the vibration damper 2 6 1 is shown in a side sectional view. However, the components shown in Figs. 8 and 19 are not shown in Figs. 9 to 17. Also 202's opening 202A. As described above, the 'top platform 2 0 2 is fixed to the inclined plate 2 0 1 in the inclined platform, and can go to the z-axis:, the symbol 4 0 2 is a sleeve symbol 4 05 is a spring, No. 4 0 8 is a collar, Numeral 4 1 1 is a non-magnetic material such as a small screw, a structure in which a shock absorber is fixed to the front end of the attenuated element as a shock absorber and rigidly fixes a non-magnetic environment. oil. With this, it is not necessary to enter the Z 1 axis to the components and the main link hinges at the minimum cost: vibrators 2 1 9, 2 2 9, _ series. In addition, in the support structures of the 19th to 264th, it is not necessary to displace on the XY plate 301 without the top platform, ^ 'direction, θχ axis direction, -25- (23) (23) 200427546 ey axis direction displacement . Moreover, the plate 301 in the χ-γ stage can be displaced from the inclined plate 2 ο 1 and can be independent of the inclined plate 2 〇, and can be changed in the X-axis direction, Υ-axis direction, and θ Z-axis direction. Bit. Thereby, the top platform 202 can perform 6 degrees of freedom movement (X-axis direction, Υ-axis direction, ζ-axis direction, θχ-axis direction, ey-axis direction, Θζ-axis direction). In addition, the position measurement of the X-axis stage (X-axis direction, Y-axis direction, θ2 axis direction) is an X-mirror 331 extending in the γ-axis direction by being mounted on the top platform 202, and extending in the X-axis direction. Γ mirror 3 3 2 (see FIG. N) and a laser interferometer (not shown). Based on the position information obtained from this position measurement, it is possible to perform full-closed control with 6 degrees of freedom (χ-axis direction, Υ-axis direction, Z-axis direction, θχ-axis direction 'ey-axis direction' θζ-axis direction). Furthermore, regarding the θχ-axis direction and the ey-axis direction, the position can also be measured by a laser interferometer; according to this measurement, all positions other than the z-axis direction can be controlled based on the position information from the laser interferometer. However, in this case, since the size of the mirror is increased and the optical components of the laser interferometer are also increased, it is necessary to consider problems such as an increase in cost. As mentioned above, two embodiments of the present invention have been described, and each constituent element of the present invention is made of a non-magnetic material. In addition, as described above, the micro-motion stage device is used in a vacuum container that is arranged at a vacuum degree of about 10 (Pa) together with the coarse-motion stage device, but it can of course be used in the atmosphere. . That is, the operating environment of the micro-motion stage device according to the present invention is not limited to a vacuum environment, and may be operated in an atmosphere such as the atmosphere or N2. Therefore, the application field of the micro-movement or device according to the present invention can also be applied to a semiconductor manufacturing device and a liquid crystal manufacturing device; (26) (24) (24) 200427546; furthermore, it can be applied to a laser processing machine, a work machine, etc. Among the various stage devices that require high-precision positioning within a small range. [Effects of the invention] According to the first aspect of the present invention, a 6-degree-of-freedom micro-movement stage device can be provided, even if it exceeds 5 kg, such as 25 kg. Even when the load is carried on the movable part, high stopping performance and high responsiveness can be achieved. Specifically, according to the micro-movement stage device of the first embodiment, the load is assumed to be 2 5 kg. By designing a highly rigid guidance system, the X-Y stage portion can ensure that the intrinsic chirp is 1 5 0 Η z (5 times in the past). Wrong this way, stop the stability promotion to 5 ~ 6 n m (3 σ 値). In addition, a step response of several μm achieves a setting time of 21 to 30 m s e c. According to the second aspect of the present invention, the following effects can be obtained by adding the effects of the micro-motion stage device according to the first aspect. That is, in the conventional micro-motion stage device, since there are almost no vibration damping elements (elements) for vibration, in a state where position control is not performed, vibration due to external interference until the sorrow is reduced, 8 〇〇 ~ i200msec. On the other hand, according to the micro-motion stage device of the second aspect, by attenuating the attenuator, the vibration has been attenuated within a period of about 70 to U5 msec within a time of about ππο. With such an effect, the stopping stability of the tilting stage becomes 9 nm (3 σ) of less than 1/6 of that of Shirai, and the adjustment time when moving in steps of several μm is also achieved from 15 to 30 m sec. Also, regarding the χ_γ stage part, the stopping stability is also improved to 3. 5 ~ 4. 5ηηι (: 3σ). -27- (25) (25) 200427546 Micro-motion stage device, which has a large stroke in the χ-γ direction, is mostly carried in a coarse-motion stage device that performs high acceleration and deceleration step repeat (siep_and — repeat) motion . The high acceleration / deceleration movement of the coarse movement stage device is set to 5 for the fine movement load, which is an external disturbance. Increasing the level of mitigation of external disturbances ㉟ 'can increase the yield. In addition, the stability against vibrations from the vacuum exhaust system and vibrations when the gate valve is opened and closed is greatly improved. [Brief description of the drawings] FIG. 1 is a front view of a micro-motion stage device according to a first embodiment of the present invention. Brother 2 See the top view of the micro stage device in Figure 1 from the local position of line B in Figure 1 Fig. 3 is a side view of the micro-motion stage device of Fig. 1 viewed from the right of Fig. 1; Figure 4 is a plan view of the micro-motion stage device of Figure 1 from the local position of line A in Figure 1. Fig. 5 is a front cross-sectional view obtained by cutting the micro-motion stage device of Fig. 1 at line I of Fig. 4. Fig. 6 is a schematic diagram for explaining the structure of a drive mechanism of a tilt stage in the micro-motion stage device of Fig. 1; Fig. 7 is a schematic diagram for explaining an installation form of the tilt plate provided on the drive mechanism of the tilt stage shown in Fig. 6; Fig. 8 is a schematic diagram showing a combination of the -28- (26) (26) 200427546 between the inclined plate and the XI plate shown in Fig. 7. Fig. 9 is a perspective view showing a configuration of a main part of a micro-motion stage device according to a second embodiment of the present invention. Fig. 10 is a perspective view showing a configuration example of a main part of a z-axis driving mechanism in the micro-motion stage device of Fig. 9. Fig. 11 is a perspective view showing the configuration of Fig. 10 in which the components of the Z-axis drive mechanism are further added together with the inclined plate. Fig. 12 is a partial perspective view for explaining the attenuation effect in the z-axis direction in the micro-motion stage device of Fig. 9; FIG. 13 is a plan view of the micro-motion stage device of FIG. 9. Fig. 14 is an enlarged three-dimensional plaque for explaining the attenuation structures in the X-axis direction and Y-axis direction in the micro-motion stage device of Fig. 9). Fig. 15 is a plan view for explaining the guidance system of the X-Y stage in the micro-motion stage device of Fig. 9; Fig. 16 is a cross-sectional view for explaining a structural example of a damper used as a damper in the micro-motion stage device of Fig. 9; Fig. 17 is a side cross-sectional view illustrating the micro-motion stage device of Fig. 9 centering on the z 3-axis actuator, which is a component of the Z-axis drive mechanism. Figure 18 shows the piezoelectric actuator Z and its related components for Z 1 axis to z 3 axis in a plan view, three main link flaps 3 and two sub link flaps, and Z-axis attenuation reduction. Diagram of the arrangement of the four dampers and four dampers for X-axis and Y-axis attenuation. Fig. 19 is a side sectional view of a supporting structure of four dampers for X-axis attenuation and Y-axis attenuation. ≪ 29- (27) (27) 200427546. [Symbol description] 1 00: bottom plate 110, 120, 130, 203, 213, 223: piezoelectric fixing block 115, 125, 135, 205, 215, 225: wedge-shaped stage 2 0 1: inclined plate 202: top platform 204, 214, 224: 2 continuous stage 207, 217, 2 2 7: Z1 sensor, Z2 sensor, Z3 sensor 219, 229, 239, 249, 261 ~ 264: vibration damper 226: Tilt hinge 20 8 ′ 218, 228, 2 3 8: leaf spring 260: shock absorber holder 2 7 0: damping ring 3 0 1: X-Y plate 3 02: XI piezoelectric actuator 303: X2 piezoelectric actuator 3 04: Y piezoelectric actuator 3 2 1, 3 2 2, 3 2 3: main link flap 3 2 1 3 24, 3 2 5: sub link flap