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TW200411655A - A structure for rewritable multi-level phase-change optical - Google Patents

A structure for rewritable multi-level phase-change optical Download PDF

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TW200411655A
TW200411655A TW91138182A TW91138182A TW200411655A TW 200411655 A TW200411655 A TW 200411655A TW 91138182 A TW91138182 A TW 91138182A TW 91138182 A TW91138182 A TW 91138182A TW 200411655 A TW200411655 A TW 200411655A
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recording medium
layer
item
optical recording
thickness
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TW91138182A
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Chinese (zh)
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TWI220521B (en
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Tun-Ying Fang
Mei-Rurng Tseng
Min-Jen Deng
Song-Yeu Tsai
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Ind Tech Res Inst
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Abstract

The invention provides a structure of multi-level reflection for rewritable phase-change optical recording medium. The characteristic is that the material of the recording layer of the structure is InxSbyTez, and the variable x is among 5.1~35.0(%), the variable y is among 57.5~71.7(%), and the variable z is among 7.5~23.2(%). This material has improvements which are high reflection ratio, discriminating partial recrystallization, high phase-change rate, and easily mark edge control, so it is suitable for multi-level reflection optical recording disk to increase data density, and the storage capacity of the recording medium.

Description

200411655 五、發明說明(1) 一" 【發明所屬之技術領域】 本發明係關於一種可覆寫相變I型光記錄媒體 (Phase-change Erasable 〇pti cal Recording Media) ’且特別係指具有多階反射率而能夠增加單位面積記錄密 度的相變化型光記錄媒體之結構。 【先前技術】 隨著多媒體的發展,對於記錄媒體的容量及品質之要200411655 V. Description of the invention (1)-"Technical field to which the invention belongs" The present invention relates to a Phase-change Erasable Opti cal Recording Media, and particularly refers to Structure of a phase-change optical recording medium capable of increasing the recording density per unit area by multi-order reflectance. [Previous technology] With the development of multimedia, the requirements for the capacity and quality of recording media

求不f提高’而目前市場剛萌芽的可覆寫相變化型光碟, 由於符合高容量、高品質、低成本及可攜帶等特性並具備 可寫擦的功能’預期未來必有其無可取代的應用領域及市 場。 相’變化光碟係採用雷射光照射碟片,使記錄層材料於 結晶相及非晶相結構間轉換,並藉著結晶相的高反射率及 非晶相的低反射率以辨識〇,1訊號。位元寫入係使用高功 率短脈衝雷射照射,使碟片局部熔化,並快速冷卻以形成 非晶相結構’而位元擦拭則是以低功率雷射脈衝照射,造"Do not increase f" and the rewritable phase-change optical discs that are just emerging in the market today, because they meet the characteristics of high capacity, high quality, low cost and portability, and have the function of writable erasing. Application fields and markets. The phase change disc uses laser light to illuminate the disc, so that the material of the recording layer is switched between the crystalline phase and the amorphous phase structure. The high reflectivity of the crystalline phase and the low reflectance of the amorphous phase are used to identify the 0,1 signal. . The bit writing system uses high-power short-pulse laser irradiation to locally melt the disc and quickly cool it to form an amorphous phase structure. The bit-wiping is irradiated with a low-power laser pulse.

成碟片局部退火結晶,並以更低功率雷射照射藉以偵測位 元反射率以讀取位元。 傳統相變化型光碟的記錄層材料因反射率對比較小, 並不具備足夠之反射率對比以供多階反射率碟片(Mu i t i 一 Level Recording )技術之使用。目前利用新的編碼與記 錄技術以提高記錄容量的多階反射率碟片技術棒案正蓬勃 發展中’其大致可分為:The disc is partially annealed and crystallized, and a lower power laser is used to detect the bit reflectance to read the bit. The material of the recording layer of a conventional phase-change optical disc has a small reflectance contrast, and does not have sufficient reflectance contrast for the use of multi-level reflectivity disc (Mu i t i-Level Recording) technology. At present, the multi-order reflectivity disc technology using the new encoding and recording technology to increase the recording capacity is being developed. It can be roughly divided into:

第6頁 200411655Page 6 200411655

五、發明說明(2) 一、 美國Calimetric公司所發展的Pit Depth Modulation (PDM); 二、 University of Arizona 所發展的的Run-Length-Limited Modulation兩種技術。為對應於此種 Multi-Level Recording所採用之新記錄技術,記錄跡的 型式將不同於傳統記錄跡只有兩階反射率,而至少需有二 階或三階以上的反射率來達到訊號的分級(Level)以提高 單位面積記錄密度。 至於如何形成多階反射率,目前的作法大致可分為兩 種: 一、利用記錄跡大小效應,如TMMR (tangential mark-size modulation by recrystallization)技術係寫 入比雷射光點小且長度不同的記錄跡,以及MRWM (mark radial width modulation)係寫入固定長度但寬度不同的 記錄跡。在讀取時,雷射光點在固定時間内的反射率將因 記錄跡的大小差異而不同; 一、利用可部份結晶(partial crystal丨ine )材料 之特性,藉由寫錄功率的控制使材料形成不同程度的結晶 以得到不同的反射率,目前市場上尚未有可部份結晶材料 具體應用於可覆寫相變化型光碟上之實施例。 據此,本發明提出一種全新且具可部份結晶效應之記 錄層材料,以運用於未來採用MU1U— 術之多階反射率光碟片。V. Description of the invention (2) 1. Pit Depth Modulation (PDM) developed by Calimetric, USA; 2. Run-Length-Limited Modulation developed by University of Arizona. In order to correspond to the new recording technology used in this Multi-Level Recording, the type of recording track will be different from the traditional recording track with only two-order reflectance, and at least the second-order or third-order reflectance is required to achieve the signal classification ( Level) to increase the recording density per unit area. As for how to form multi-order reflectance, the current practice can be roughly divided into two types: First, the use of recording mark size effects, such as TMMR (tangential mark-size modulation by recrystallization) technology, writes smaller than laser light spots and has different lengths. Recording tracks, and MRWM (mark radial width modulation) are recording tracks of a fixed length but different widths. During reading, the reflectivity of the laser light spot within a fixed time will be different due to the difference in the size of the recorded traces. First, by using the characteristics of the partial crystal material, by controlling the writing power, The materials form different degrees of crystals to obtain different reflectances. At present, there are no embodiments in the market that can partially crystallize materials for rewritable phase change optical discs. Based on this, the present invention proposes a new recording layer material with partial crystallization effect for use in future multi-order reflectivity optical discs using MU1U technology.

200411655 五、發明說明(3) ' - 【發明内容】200411655 V. Description of the invention (3) '-[Summary of the invention]

圖1係本發明之可覆寫相t變化型光記錄媒體的結 。基板 10 係厚度為 〇·6 mm 或 的 p〇lycarb〇nate (P 、或pvc、或PMMA (Poly Mj^yl Methacrylate )材料, 其執溝100之深度範圍為3〇〜6〇 (nm),而軌溝1〇〇之* 度範圍為0.25〜0.74 (mm)。若基板1〇的厚度為〇·6_見 則須以網版印刷的方式塗上一層黏合膠,再將一空白 (Dummy)片與此片膠合,即成厚度為κ 2匪的光碟片。隔 絕層1士2,用以有效隔開基板1〇與記錄層14而防止寫錄動作 進行日守對基板1〇的破壞,其可使用厚度範圍為7〇 ~ 12〇 (run )的A1 203、AIN、ZnS(80%)-SiO2(20%)等材料,其中FIG. 1 shows the structure of a rewritable phase t-change type optical recording medium according to the present invention. The substrate 10 is a polycarbonate (P, PVC, or PMMA (Poly Mj ^ yl Methacrylate)) material having a thickness of 0.6 mm or more, and the depth of the groove 100 is 30 to 60 (nm). The range of the rail groove 100 degree is 0.25 ~ 0.74 (mm). If the thickness of the substrate 10 is 0.6, you must apply a layer of adhesive by screen printing, and then leave a blank (Dummy ) And this film are glued to form an optical disc with a thickness of κ 2 bands. The insulating layer 1 ± 2 is used to effectively separate the substrate 10 from the recording layer 14 to prevent the recording operation from destroying the substrate 10 , Which can use A1 203, AIN, ZnS (80%)-SiO2 (20%) and other materials with a thickness ranging from 70 to 12 (run), where

ZnS與Si02的成分比例為8 : 2。而本發明之記錄層14係使 用一種InxSbyTez材料,其中變數x之數值範圍為5. j〜 35.0(at %),變數y之數值範圍為57.5〜71.7 (at %), 變數z之數值範圍為7.5〜23.2(at %),其厚度範圍為1〇 〜30 (nm )。保熱層16,用以儲存雷射波長在紅光波段( 1= 650 nm或780 nm )照射時之雷射能量,並提供記錄層 1 4之材料由非晶悲轉變為晶態時所需之能量,其可使用厚 度範圍為 10 〜20 (nm)的 A1 203、A1N、ZnS(80%) - Si02 (2 0%)等材料,其中ZnS與S i Ο2的成分比例為8 : 2。反射層 18係採用厚度範圍為80〜120 (nm )的金、銀、銅、鋁或 其他合金材料。 本發明之可覆寫相變化型光記錄媒體的最佳實施方式 ’係將In50Sb50與Sb70Te30兩個合金把材以共丨賤鍍的方式The composition ratio of ZnS to Si02 is 8: 2. The recording layer 14 of the present invention uses an InxSbyTez material, where the value of the variable x ranges from 5.j to 35.0 (at%), the value of the variable y ranges from 57.5 to 71.7 (at%), and the value of the variable z ranges from 7.5 to 23.2 (at%), and its thickness ranges from 10 to 30 (nm). The heat retaining layer 16 is used to store the laser energy when the laser wavelength is irradiated in the red light band (1 = 650 nm or 780 nm), and to provide the materials needed for the material of the recording layer 14 to change from amorphous to crystalline. It can use materials such as A1 203, A1N, ZnS (80%)-Si02 (20%) and other materials with a thickness ranging from 10 to 20 (nm), where the composition ratio of ZnS to Si 0 is 8: 2. The reflective layer 18 is made of gold, silver, copper, aluminum or other alloy materials with a thickness ranging from 80 to 120 (nm). The best embodiment of the rewritable phase change type optical recording medium of the present invention ′ is a method of co-plating the two alloy handles of In50Sb50 and Sb70Te30.

200411655 五、發明說明(4) 製備,藉由改變施予在In50Sb50與Sb70Te30兩個合金乾材 上的DC或RF磁流濺鍍之功率A小,%改變鍍膜成分而製備 出所需之I nxSbyTez合金成分〜。另外,隔絕層1 2、保熱層 1 6、反射層1 8亦可利用濺鍍機製作,其厚度可以濺鍍電^ 及錢鍍時間來控制。而本發明之可使用雷射丨丨波長範圍為 600〜780 (nm),光學透鏡13之數值孔徑範圍為〇· 55〜 0. 70 〇 為使熟悉該項技藝人士瞭解本發明之目的、特徵及功 效,兹藉由下述具體實施例,並配合所附之圖式,對本發 明詳加說明如後: 【實施方式】 茲揭露本發明之第一具體實施例如下··選擇基板丨〇為 PC7料’其厚度為1.2 mm ;隔絕層12為ZnS(80%)-Si02 (2〇%)材料,其厚度為90nm ;記錄層14為In 23.2 Sb 62 · 材料’其厚度為20nm ;保熱層16為ZnS(80%)-SiO2 (、20%)材料’其厚度為15nm ;反射層18為銀材質,其厚度 為9 〇nm °本發明利用濺鍍機製作隔絕層1 2、記錄層1 4、保 熱f 1 6、反射層1 8,厚度則以濺鍍電流及濺鍍時間來控制 ’ I製成之多階反射率相變化型光碟片以紅光雷射(1=78〇⑽ ’則δ式機寫入單一長度之結晶態記錄跡並量測得到5階不同 之反射率,如圖2所示。 絲再揭露本發明之第二具體實施例如下:選擇基板1 ◦ :…代材料’其厚度為1·2 mm ;隔絕層12為ZnS(80%)-Si〇2200411655 V. Description of the invention (4) Preparation. By changing the power A or DC magnetic flux sputtering applied to two dry alloys of In50Sb50 and Sb70Te30, the power A is small and the coating composition is changed to prepare the required I nxSbyTez. alloy composition~. In addition, the insulation layer 1, 2, the heat-retaining layer 16, and the reflective layer 18 can also be made by a sputtering machine, and the thickness thereof can be controlled by sputtering electroplating and money plating time. The usable laser of the present invention has a wavelength range of 600 to 780 (nm), and the numerical aperture of the optical lens 13 ranges from 0.55 to 0.70. In order for those skilled in the art to understand the objects and features of the present invention And effects, the following specific embodiments and the accompanying drawings are used to describe the present invention in detail as follows: [Embodiment] The first specific embodiment of the present invention is disclosed below. Selecting a substrate is as follows: PC7 material 'its thickness is 1.2 mm; insulation layer 12 is made of ZnS (80%)-Si02 (20%) material and its thickness is 90nm; recording layer 14 is made of In 23.2 Sb 62 · material' whose thickness is 20nm; heat preservation Layer 16 is made of ZnS (80%)-SiO2 (, 20%) material. Its thickness is 15nm. Reflective layer 18 is made of silver and its thickness is 90nm. The invention uses a sputtering machine to make an insulating layer. 1. The recording layer. 1 4. Thermal insulation f 1 6, Reflective layer 1 8. The thickness is controlled by the sputtering current and sputtering time. The multi-stage reflectivity phase-change optical disc made of I is red laser (1 = 78. ⑽ 'The delta-type machine writes a single-length crystalline record and measures 5 different reflectances, as shown in Figure 2. DETAILED second embodiment Ming for example: Select 1 ◦ substrate: ... generation materials' having a thickness of 1 · 2 mm; insulating layer 12 is ZnS (80%) - Si〇2

第9頁 200411655 五、發明說明(5) (2〇心材料’其厚度為9〇nm ;記錄層14為In 5.1Sb 71.7Te 23·〇2材料,其厚度為2〇nm ;译熱層丄6為ZnS(8〇%卜si〇2 (、2(U)材料’其厚度為15nm 反射層18為銀材質,其厚度 = 9〇nm。本發明利用濺鍍機-έ作隔絕層12、記錄層14、保 熱^ 1 6、反射層1 8,厚度則以濺鍍電流及濺鍍時間來控制 ^成之多階反射率相變化型光碟片以紅光雷射(K8〇nm ’則忒機寫入單一長度之結晶態記錄跡並量測得到g階不同 之反射率,如圖3所示。 進一步歸納本發明之特點如後: •本發明之記錄層材料,晶相與非晶相之間有高度反 :且部分結晶效應明暴員,同時具有相變化速率快 之記錄層/ 適合運用在多階反射率光碟片 反射率本寫相變化型光記錄媒體結構具有多階 記:性高。因此’依據本發明而開發心 t山度的唯頃型光碟片或可覆寫型门 個人電腦、整今荆々# t ^ 尤峰片了應用於豕用 公-π二^筆型或旱上型電腦的資料儲存,亦可痄Η Μ Α司、企業之大咨 j J應用於 洁罄f 1貝抖儲存’另外亦適用於低成本I七 咱費性電子產品。 、瓜取不要未之 ”發明已以一較佳實施例 从限定本發明,任何孰籴 …、其並非用 神和她,當可作:不:離本發明之精 達範圍當視,附之申請專利範圍;斤界定者::本發明之保 200411655 圖式簡單說明 【圖式簡單說明】 圖1係本發明之可覆寫相變均型光記錄媒體的結構圖; 圖2係本發明之第一具體實多例的測試結果; 圖3係本發明之苐二具體實施例的測試結果。 圖號說明 10 100 11 12 13 14 16 18 基板 執溝 雷射 隔絕層 光學透鏡 記錄層 保熱層 反射層Page 9 200411655 V. Description of the invention (5) (20-core material 'its thickness is 90 nm; the recording layer 14 is an In 5.1Sb 71.7Te 23 · 02 material, its thickness is 20 nm; 6 is ZnS (80% SiO 2 (2, U) material; its thickness is 15 nm; the reflective layer 18 is made of silver and its thickness = 90 nm. The present invention uses a sputtering machine to manually create an insulating layer 12, The recording layer 14, thermal insulation ^ 16 and reflective layer 18, and the thickness is controlled by sputtering current and sputtering time. The multi-stage reflectance phase change type optical disc is red laser (K80 nm) The machine writes a single-length crystalline recording trace and measures the reflectance of different g-orders, as shown in Figure 3. The characteristics of the present invention are further summarized as follows: • The recording layer material, crystalline phase and amorphous of the present invention There is a high degree of reflection between the phases: and part of the crystal effect is obvious, and it also has a recording layer with a fast rate of phase change / suitable for multi-order reflectivity optical discs. High performance. Therefore, according to the present invention, the only type of optical discs or rewriteable door personal computers that have been developed in accordance with the present invention, ^ You Feng used the data storage of public-π binary pen or dry computer, and it can also be used by the company and the company's consultants J J to store the f 1 beating shake. It is also suitable for low-cost electronic products. The invention has been limited to the present invention in a preferred embodiment. Anything that ... does not use God and her, when: : Departure from the scope of the present invention, and attach the scope of patent application; Defined by :: The guarantee of the present invention 200411655 Brief description of the diagram [Schematic description of the diagram] Figure 1 is an overwritable phase change homogeneous type Structural diagram of an optical recording medium; Figure 2 is the test results of the first embodiment of the present invention; Figure 3 is the test results of the second embodiment of the present invention. Drawing number description 10 100 11 12 13 14 16 18 substrate Ditch laser insulation layer optical lens recording layer heat preservation layer reflection layer

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Claims (1)

200411655200411655 :種ΐ有多階反射率的可覆寫相變化型光記錄媒體結 ,、至少係由一基板、二隔絕過、一記錄層、一保 熱層及一尿射層所組成,且係利用雷射穿過一光學透 鏡所產生的雷射光束照〜射該記錄層以記讀 之光記錄媒體,其特徵在於: 貝取貝氘 ^言己錄層係InxSbyTez材料,其中變數χ之數值範圍 ;、·〜35· 0(at %),而變數y之數值範圍為57· 5〜 71.7(at %),而變數z之數值範圍為7.5〜23·2(μ幻: A kind of rewritable phase-change optical recording medium junction with multi-order reflectance, which is composed of at least a substrate, two insulation layers, a recording layer, a thermal insulation layer, and a urinary ejection layer. A laser beam generated by a laser beam passing through an optical lens illuminates the recording layer to read the optical recording medium, which is characterized in that: the shell layer is made of Indium SbyTez material, in which the value range of the variable χ; , · ~ 35 · 0 (at%), and the value range of the variable y is 57.5 to 71.7 (at%), and the value range of the variable z is 7.5 to 23 · 2 (μ 幻 2· 2申請專利範圍第工項所述之具有多階反射率的可覆 寫相變化型光記錄媒體結構,其中該基板係pc (Polycarbonate)、或PVC 、或pMMA (p〇ly Methyl Methacrylate)材料,其厚度為,且其 軌溝之深度範圍為3〇〜β〇 (nm),而該軌溝之寬度 範圍為0· 25 〜〇· 74 (mm )。The structure of a rewritable phase change optical recording medium with multi-order reflectance as described in item 2 of the patent application in 2.2, where the substrate is pc (Polycarbonate), or PVC, or pMMA (p〇ly Methyl Methacrylate) The thickness of the material is, and the depth of the groove is in the range of 30 to β (nm), and the width of the groove is in the range of 0.25 to 74 (mm). 3·如申明專利範圍第1項所述之具有多階反射率的可覆 寫相、欠化型光記錄媒體結構,其中該隔絕層係A1 2 〇 3 、或A1N、或成分比例為8 ·· 2的ZnS —si〇2材料,豆厚 度範圍為70〜120 (nm )。 ’、 4 ·如申請專利範圍第1項所述之具有多階反射率的可覆 寫相變化型光記錄媒體結構,其中該記錄層之厚度範 圍為10〜30(nm)。 •如申明專利範圍第1項所述之具有多階反射率的可覆 寫相變化型光記綠媒體結構,其中該保熱層係A丨2⑽3. The structure of an overwritable phase, under-type optical recording medium with multi-order reflectance as described in item 1 of the declared patent scope, wherein the insulation layer is A1 2 0 3, or A1N, or the component ratio is 8 · · 2 ZnS-SiO2 material, the thickness of the beans is in the range of 70 ~ 120 (nm). ', 4 · The structure of a rewritable phase change optical recording medium having multi-order reflectance as described in item 1 of the scope of the patent application, wherein the thickness of the recording layer ranges from 10 to 30 (nm). • Writable phase-changeable optical recording green media structure with multi-order reflectance as described in item 1 of the declared patent scope, wherein the heat preservation layer is A 丨 2⑽ 第12頁 200411655 六、申請專利ί巳圍 、或Α1Ν、或成分比例為8 : 2的ZnS_Sl02材料,其厚 度範圍係10〜20 (nm ) ° 6·如申請專利範圍第1項戶t述之具有多階反射率的可覆 寫相變化型光記錄媒體-結構’其中該反射層係金、或 銀、或銅、或鋁、或其他合金材料’其厚度範圍係8 〇 〜120 (nm ) 〇 7·如申請專利範圍第1項所述之具有多階反射率的可覆 寫相變化型光記錄媒體結構,其中該雷射之波長範圍 為600 〜780 (nm )。Page 12 200411655 VI. Apply for a patent 巳 巳, or A1N, or ZnS_Sl02 material with a composition ratio of 8: 2, the thickness range is 10 ~ 20 (nm) ° 6. As described in the first item of the patent application scope Writable phase-change optical recording medium with multi-order reflectivity-structure 'wherein the reflective layer is gold, or silver, or copper, or aluminum, or other alloy materials' and its thickness ranges from 80 to 120 (nm) 〇7. The structure of a rewritable phase change optical recording medium with multi-order reflectance as described in item 1 of the scope of patent application, wherein the laser has a wavelength range of 600 to 780 (nm). 8· 圍第1項所述之具有多階反射率的可覆 孔徑範圍為〇=錄媒體結構,其中該光學透鏡之數值 Q 如由心奎1, 5〜0· 70。 9·如申%專利範 寫相變化型光a第1項所述之具有多階反射率的可覆 係藉由共濺贫°己錄媒體結構,其中該InxSbyTez材料 進行製備所^的方式對In50Sb50材料及Sb70Te30材料 I生〇8. The coverable aperture with multi-order reflectance as described in item 1 is 0 = recording medium structure, where the numerical value Q of the optical lens is from Xinkui 1, 5 ~ 0 · 70. 9 · The coverability with multi-order reflectance as described in item 1 of the phase change type light a of the patent %% is achieved by co-sputtering the structure of the recording medium, wherein the InxSbyTez material is prepared by In50Sb50 material and Sb70Te30 material are produced. 第13頁Page 13
TW91138182A 2002-12-31 2002-12-31 A structure for rewritable multi-level phase-change optical recording media TWI220521B (en)

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