TW200300512A - Diffusion reflection plate, transfer master, transfer base film and transfer film used for manufacturing the same, and method of manufacturing diffusion reflection plate - Google Patents

Abstract

A diffusion reflection plate for diffusing and reflecting light has a saw-tooth shaped cross-section composed of continuous and repeated saw teeth each of which constituted by a vertical surface (a) and an inclined surface (b), relative to a substrate surface of the diffusion reflection plate. The inclined surface (b) inclines 2~30 degrees relative to the substrate surface, the inclination angle of the vertical surface (a) dilative to the substrate surface is 75~105 degrees. A cross-section of the inclined surface (b), which is perpendicular to the saw-tooth shaped cross-section, has a waveform having amplitude, which presents on the surface of the diffusion reflection plate forming a continuous and rugged surface.

Description

200300512 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a diffuse reflection plate for reflective liquid crystal displays that can be used in reflective liquid crystal displays that do not require rear projection light or solar cells that require high efficiency. A diffuse reflection plate for a display substrate, and a transfer base film, a transfer film, and a transfer master used in the manufacture thereof. [Previous Technology] Liquid crystal displays (hereinafter referred to as LCD) can be used for display devices such as clocks, computers, TVs, personal computers, etc., because they can play light, thin, compact, and low power consumption. Especially in recent years, color LCDs have been completed. In addition to being used in many 0A · AV devices, they are also used in navigation systems, controllers, and personal computer screens. It is predicted that their market will continue to expand rapidly in the future. In particular, a reflective LCD that reflects externally incident light for display, because it does not require rear projection light, it has the characteristics of low power consumption, thinness, lightness, and compactness. Therefore, its use in portable terminals has received great attention. . Strange light Cgue's previous reflective LCDs use twisted structure and high twisted structure. These methods make the display darker because linear polarizers only use 1/2 of the incident light during display. Therefore, it has been proposed to reduce the number of polarizers and combine a phase difference plate, and to display the phase-conversion guest-host method. In order to effectively use incident light for bright display, reflective LCDs must increase the intensity of scattered light from incident light from various angles in the vertical direction of the display day. That is, the reflective film on the reflective plate must be controlled so that it has proper reflection

V characteristics. So you can try to use a high reflectivity metal reflector, such as Ming or

mm 314175.ptd page] 2003200312 V. Description of the invention (2) Silver, or a layer of sensitized reflective film laminated on the metal to increase the reflectivity of the metal surface. In addition, there is a proposal of a so-called photoetching method (Japanese Patent Application Laid-Open No. 4-2 4 3 2 2 6), in which a photosensitive resin is coated on a base material, and then a photo ink (ph ο ΐ 〇mask) is used to form the substrate. A method of forming a concave and convex surface of a pattern into a metal thin film to form a reflecting plate. When the inclination angle of the concave and convex surface is controlled at a certain angle, you can try to increase its reflectivity within a certain angle range with the specular reflection direction as the center. In terms of proper reflection characteristics, it is best to review and review the use of displays such as liquid crystal elements. For example, in a liquid crystal element, in order to reflect external incident light, the image of the light source is reflected like a mirror on the surface of the liquid crystal element and the interface existing parallel to the surface. Therefore, the bright angle of the non-reflection direction is used instead of the regular reflection direction. When most of the concave surfaces on the diffuse reflection plate forming a fine uneven surface on the surface of the substrate are irregularly distributed, the reflection characteristic becomes a viewing angle that depends on the amount of reflected light. Although the display in the direction of regular reflection should be the brightest, but as before The liquid crystal element does not use a regular reflection direction but uses an angle that is not a regular reflection direction. Therefore, the amount of reflected light is reduced, and the display quality of the liquid crystal element is reduced. ,-At the same time, most external incident light is not in the direction below the position of the user of the liquid crystal element. Below the display of liquid crystal elements and other displays, most of the fields are keyboards, desktops, and users of liquid crystal elements, which are difficult to introduce external incident light. That is, most externally incident light is incident from above the display, such as a liquid crystal element, and left and right. Therefore, it is possible to provide a bright reflected light quantity with excellent display quality of a liquid crystal element.

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314175.ptd Page 13 200300512 V. Description of the invention (3) The diffuse reflection plate must require its reflection characteristics so that the external incident light entering in various directions above the display and in the left and right directions can effectively reflect to the user direction. In order to solve the above problems, the present invention provides a diffusion reflection plate with excellent display quality and a method for manufacturing a transfer master, a transfer base film, a transfer film, and a diffusion reflection plate used in the manufacture thereof. The diffusion reflection plate has excellent display quality. It has directional reflection characteristics that allows external incident light that is incident in various directions, such as the upper direction and the left-right direction of the display, such as liquid crystal elements, to be reflected in the j-direction. [Except Cangming content] ^ The first aspect of the present invention is [1] A diffuse reflection plate characterized in that the diffuse reflection plate can diffuse and reflect light, and the diffuse reflection plate is composed of a substrate and a surface thereof. The formed thin film layer and the reflective layer are formed, and the cross-section of the thin film layer in a direction perpendicular to the surface of the substrate is a continuous and repeated vertical plane (a) and an inclined plane (b). The angle of inclination of the vertical surface (a) of the material surface is 75 to 105 degrees, and the angle of inclination of the inclined surface (b) to the substrate surface is 2 to 30 degrees, which is perpendicular to the sawtooth-shaped cross section and The inclined surface (b) whose cross section is perpendicular to the surface of the base material has a waveform having an amplitude and has an irregular surface. 2] The diffuse reflection plate according to the above [1], wherein the waveform of the inclined plane (b) of the inclined plane perpendicular to the dentate transverse plane is a sine wave. [3] The diffuse reflection plate according to the above [1], wherein the amplitude of the waveform of the inclined plane (b) of the inclined plane perpendicular to the sawtooth-shaped transverse plane is not constant. And [4] the diffuse reflection plate according to the above [1], wherein it is perpendicular to the zigzag cross section

314175.ptd Page 14 200300512 V. Description of the invention (4) ~ ^ 一 ^ ~~-The straight inclined surface (b) has a non-constant wavelength. [5] The diffuse reflection plate according to the above [1], wherein the arrangement interval of the vertical plane (&) is more than 2 // m and less than i50 // m. ^ ^ 6] The diffuse reflection plate according to the above [丨], in which the difference between the maximum south of the V-square β direction and the minimum height (that is, the maximum appearance of the concave-convex surface) in all zigzag cross-sections is below m. ) And the diffuse reflection plate [such as the above [丨], where the vertical plane (the interval is not a certain interval. Where the vertical 5 of the above Π] to [7] diffusion reflection plate 1] diffusion reflection The hairpin and inclined surface (b) are surface roughened. The shooting plate is [9] a transfer thick mold, which has formed the concave-convex surface of the shooting plate. The transfer thick mold 'system' is used to form For example, the transfer master and base m of the above [9] are those whose shapes are transferred by using the transfer ni and the original die of the above [9] or [1〇] to be embossed on the layer to be transferred. It uses the above-mentioned [1 1] transfer base film as the product of A:-the transfer of the temporary support body is from the original source of transfer: for the temporary base struggle: the; ?? The surface formed on the temporary support building is Formation of i :: thin < recipients., Beryllium transfer and thin layer] :::: The right side temporarily supports the transfer film of the above [12], and the person of the invention has a reflective film. "发 [ 12] The manufacturing method of the film with a wide variety of diffuse reflection plates is to press the j · Xi Pan / # film layer as the contact surface and press it on the substrate to be transferred.

314175.ptd Page 15 200300512 V. Description of the invention (5) Process, the process of peeling the aforementioned temporary support, and the process of forming a reflective film on the surface of a film to make a diffuse reflection plate.卩 Transferred and ^ 1 5] —A method for manufacturing a diffuse reflection plate is a transfer process in which the above-mentioned base film is pressed on the substrate with its transfer-formed surface as the interface], and the process of peeling the aforementioned transfer-based film And the engineer who shoots the film in the film layer. [1 6] —A method for manufacturing a diffuse reflection plate comprising a transfer film and a thin film layer as a contact surface pressed against the transferred substrate = [1 3], i. Engineer. ’And • [17] —A diffuse reflection plate made by the above-mentioned [14] to [The method of manufacturing a diffuse reflection plate]. Any one of [1 8] is a diffuse reflection plate, which is provided with a reflective film on the surface where [] shifts from the original mold to the original mold. Transfer on the base film, [9] 9 kinds of diffuse reflection plates, which are characterized by -1;] [1δ] of any-item of the diffuse reflection plate uses 4 2 [7], the beneficial one. [Laser-type liquid crystal display] 〇] 7 kinds of diffuse reflection plate, which is characterized by =] Straight up 7] of any-item of the diffuse reflection plate, 4, ⑺, 豢 inclination: shaped cross section The surface type of the c material table is the square of the square +, and the large difference between the high and low levels is the linear type used in the reflective liquid crystal display. 2. The second aspect of Bhutan's face slightly accounts for her last month as [2 1] —a diffuse reflection 4 after the light is expanded, 4 radiating plates, 苴 4 *… on the surface in step 1 diffusing reflecting plates What makes this diffuse reflection? The formed thin film layer and reflective layer are composed of a substrate,

314175.ptd Page 16 and the surface of the substrate Λ 200300512 V. Description of the invention (6) The cross-section of the film layer in the direction perpendicular to the zigzag formed by the continuous repeated vertical plane (a) and inclined plane (b), The vertical plane (a) with respect to the substrate surface has an inclination angle of 75 to 105 degrees, and the inclined plane (b) includes at least two types of inclination angle groups that are different from the surface of the substrate. One of the inclination angle groups is 0 to 20 degrees, another inclination angle group is 10 to 30 degrees, the inclined surface perpendicular to the sawtooth-shaped cross-section and perpendicular to the substrate surface (b) the cross-section has a waveform with amplitude and continuous unevenness surface. [2 2] The diffuse reflection plate as in [2 1] above, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the sawtooth cross section is a sine wave. [2 3] The diffuse reflection plate as in [2 1] above, in which all or part of the shape of the zigzag cross section of the inclined surface (b) is a curve. [2 4] The diffuse reflection plate according to [2 1] above, wherein the two or more different inclination lengths of the zigzag cross-sectional shape of the inclined surface (b) are not constant. [2 5] The diffuse reflection plate as in [2 1] above, wherein the amplitude of the cross-sectional waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. [2 6] The diffuse reflection plate as in [2 1] above, wherein the wavelength of the cross-sectional waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. And [2 7] The diffuse reflection plate as in [2 1] above, wherein the configuration interval of the vertical plane (a) is 2 // in and 1 5 0 // m or less. And [2 8] The diffuse reflection plate as in [2 1] above, wherein the difference between the maximum height and the minimum height in the zigzag cross-section of the vertical direction (that is, the maximum drop of the uneven surface) is less than 6 // m. And [2 9] The diffuse reflection plate as in [2 1] above, wherein the arrangement interval of the vertical plane (a) is not a certain interval.

314175.ptd Page 17 JJ 丄 A V. Description of the invention (7) and [30] As described in [21] to [29] above, the straight surface (a) and inclined surface (b) have passed through the present invention and are [31]. The above-mentioned and [32] are used to form the above-mentioned [3 丨] pattern. This note is again [3 3]-a transfer base t transfer master model, which will transfer the transfer master model ^ «t? Is also [34] a transfer membrane 22-inch-inch support, which temporarily supports the sacral membrane layer, Thin: Transferred substrate = body ^] 1 transfer film, attached to the upper part; reflections are formed between the stored film layers [34] is [36] a diffusion reverse, i). ^ Transfer film is a thin film layer, etc. The aforementioned temporary support is peeled off. [, The process of forming a reflective film is converted to the * surface of the diffused reflective plate made of 2 thin films, and the process of transferring the aforementioned surface to "it becomes a reflective film." Any of the engineering production of a diffuse reflection plate m +. 矣, diffusion diffusion transfer roughening treatment [21] of the diffusion anti-transfer original 榲 Xi Yin < concave film, using the printed on the transferred layer 'system using the above support The transfer of the body is self-contained in the film of the temporary support [34]. The process of making the board and pressing the interface and making the diffusion method, the method of making the interface close to the base film and diffusing the reflection, the transfer method is The cover and the reflection system are those that are pressed against the separation plate, including the reflection plate, and the vertical ones. The transfer original of the convex surface of the projection plate. [31] or [32] while transferring the shape in [3 3]. The surface on the surface of the original mold is transferred to the surface of the original mold to form a temporary support method on the film. The film layer is transferred to the board. The process of forming the above [3 3] on the substrate, and including the above [3 5] in Table 0.

200300512 V. Description of the invention (8) The project in which the transfer film uses the film layer as the interface to press the transferred substrate tightly, and the engineer who peels the temporary support. The present invention is also a [3 9] -type diffuse reflection plate, which is made by the method for manufacturing a diffuse reflection plate according to any one of [3 6] to [3 8] above. And [4 0] —a kind of diffuse reflection plate, which is provided with a reflection film on the surface of the transfer self-transfer original mold of the above [3 3]. And [4 1] A diffuse reflection plate characterized in that the diffuse reflection plate of any one of the above [2 1] to [2 9], [3 9], [4 0] is used in a reflective liquid crystal display. By. And [4 2] —a diffusive reflection plate characterized in that, in the diffusive reflection plate of any one of the above [2 1] to [2 9], [3 9], [4 0], Of the zigzag cross-section formed by the vertical surface (a) and inclined surface (b) of the surface of the wood, the larger the height difference caused by the inclination parallel to the line of the ridge top and the groove bottom of the surface faces the display screen The general method is used in a reflective liquid crystal display. The present invention is also a reflective liquid crystal display of [4 3], which is characterized by using the diffuse reflection plate of the above [1]. And [4 4] A reflective liquid crystal display, characterized by using the diffuse reflection plate of [2 1] above. [Embodiment] The present invention can provide a diffuse reflection plate with excellent display quality, and a transfer master, a transfer base film, a transfer film, a diffusion reflection plate, and a method for manufacturing the same. External input from various directions, such as above the LCD or other displays

314175.pid 页 Page 19,200,300,512 5. Description of the invention (9) The reflected light effectively reverses the present invention. It can be easily done, the surface shape can be transferred, or the surface transferred by the original mold can be transferred. Its its original plate. Then, the surface of the original support is transferred to form a temporary transfer film. Based on the temporary reflector, it reflects on the substrate that is being transferred, transfers the base film, transfers the film on the surface of the support, and works on the film layer. The orientation of the transfer film on the upper surface of the transfer film of the present invention is used to reverse the surface shape of the base film, such as transferring the surface shape on the substrate surface, and transferring the uneven shape to the original mold shape. When being transferred, a reverse thin film layer peeling process is formed on the support, and the temporary diffusion reflection and the aforementioned temporary diffusion reflection transfer are formed on the substrate, and a large number of surfaces of the reflective liquid crystal transfer method are formed into a fine transfer original mold. The opposite surface shape of the rotation is transferred to the rotation and then set to a temporary support into a thin film layer. After the substrate is connected to the thin film layer, the film is pressed tightly on the quilt and made into a thin diffusion film. Production of thin displays that have been converted. The slightly concave surface should be turned into a concave-convex shape. Transfer the base film, the film, the support, and the thin film to face, and then the shape will become the shape of the diffusion and convexity of the reflective substrate on the transfer base film layer. . This becomes a transfer on the temporary layer that does not immediately turn into a reflective film. It can also be used in thin film engineering, diffuse reflection plate, and plate manufacturing. Transfer the original mold, and then transfer the subtle unevenness of the rotation. When it is transferred, it is tightly pressed on the film-shaped transfer base film. The diffuse reflection support is turned up to form a temporary branching film. The field film is a transfer layer. Therefore, the engineering, the aforementioned surface is formed to be pressed on the substrate in a temporary support layer to make a diffusion, that is, the transfer base film which is compacted and moved by the transfer original mold, and then faces the project on the film layer, and the aforementioned transfer

314175.ptd Page 20 200300512 V. Description of the Invention (ίο) Stripping project of the base film and the project of forming a reflective film on the surface. The diffuse reflection plate of the present invention has a zigzag cross-section formed by a vertical surface (a) and an inclined surface (b) with respect to the surface of the base material, and a serrated tooth composed of a vertical surface (a) and an inclined surface (b) which are repeated repeatedly One of the uneven surfaces of the shape-like cross section is shown in FIG. 7, FIG. 10, FIG. 15, and FIG. 18, for example. The uneven surface can be formed by mechanical processing such as the vertical movement of the etching blade and the horizontal movement of the surface of the substrate to be etched, as shown in Figs. 1 and 12. Examples of the formation thereof include, for example, the following processes, but are not limited thereto. Laser cutting, photolithography, orthogonal etching, etc. may also be used, and combinations thereof may also be used. When the surface of the substrate or the surface of the transfer mold or the surface of the transfer mold is transferred in the xy plane on the xyz space, one side moves at a constant speed in the X direction, while the other is the end angle of the right half and the end angle of the left half. Etching knife with a combined angle of -15 to 15 degrees and 70 to 88 degrees (Figure 1), and one of the end angle of the right half and the end angle of the left half is -15 to 15 degrees and the other is 7 0 An etching knife (Figure 12) with a combination of angles of 90 to 60 degrees and 60 to 80 degrees can be moved up and down in the z direction to move the surface of the substrate or the surface of the original mold or the surface of the original mold. On the top, a set of concavo-convex surfaces in which a vertical surface (a) and an inclined surface (b) are arranged continuously and linearly are formed. When etching on the surface of the substrate or the surface of the transfer mold or the transfer mold of the transfer mold in the X direction at the same speed to the end, the knife returns to the original starting point of the engraving, from the starting point of the last name to the y direction. Move a certain distance, and then move in the direction of X on the surface of the substrate or the surface of the transfer mold or the surface of the transfer mold. Repeat this operation on the substrate surface or

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314175.ptd Page 21 200300512 V. Description of the invention (11) The surface of the transfer master or its transfer master is fully formed with a continuous concave-convex surface composed of a vertical plane (a) and an inclined plane (b). When the surface of the substrate or the surface of the transfer mold or the transfer mold surface of the transfer mold is cylindrical, in addition to the constant velocity movement in the X direction, it can also perform a rotary motion with a certain angular velocity, or preferably at At the end of the etch circle, move a certain distance in the direction of the rotation axis and move at a predetermined speed, and the etch knife moves half-phase up and down in a spiral after a continuous circle, and the etch groove can be formed in the cylinder. Recess. ▲ The up and down movement of the etching knife does not need to be a constant speed movement. When the time axis is the transverse stomach and the displacement is the vertical axis, it can also be a sine wave movement, a triangle wave movement, a quadratic curve movement, etc. The above-mentioned various movements, horizontal movements, rotary movements, and up-and-down movements may be relative movements of the etching blade and the surface of the substrate to be etched, and the above are examples. After the surface of the substrate or the surface of the transfer mold or the surface of the transfer mold is subjected to the etching process, the surface formed by the recesses is further subjected to sand blasting, electroplating, and film lamination with fine particles to form fine unevenness. Roughening the surface. The surface of the substrate or the surface of the transfer master or the transfer master of the transfer master can be flattened and the surface roughened into concave or convex parts after the etching process. The screeding process can be exemplified by screed plating, ref 1 ow, soft etching, screed film lamination, and the like. After the surface is roughened and plated, polishing plating can be applied to optimize the shape of the concave or convex portions. The reflection characteristics can be optimized by selecting the shape of the etching blade. Can also

314175.pul Page 22 200300512 V. Description of the invention (12) Increase the hardness of the surface or protect the plating to prevent oxidation. The protection plating is preferably chromium, nickel, zinc and other plating. The material of the transfer master of the present invention or the transfer master of the transfer master is not limited to metal, resin, etc., but it is preferably an iron alloy such as stainless steel with excellent dimensional stability and electrical conductivity, or copper or Copper alloy stacker. The surface can be used after it has been uniformly polished by mechanical grinding, etching, and cleaning. The plate shape, sheet shape, and cylindrical shape can be used without any limitation, but a cylindrical shape that can be subjected to rotary processing is preferred. To form the transfer original mold or the transfer original mold of the concave-convex surface shape that can diffuse the light, a sheet, a flat plate, a cylindrical shape, and a part of a curved surface can be used. All or necessary parts of the surface can be formed. The shape of the uneven surface of the diffused light is affixed to the pressure device, or used between the uneven surface and the pressure device. The compacting project can also be heated and illuminated. The diffuse reflection plate of the present invention can easily adjust its diffusivity or reflection performance from the shape of the uneven surface. Therefore, the design of the uneven surface must consider the diffuse reflection characteristics of the diffuse reflection plate. The uneven surface shape of the diffuse reflection plate of the present invention is a zigzag cross-section formed by the vertical surface (a) and the inclined surface (b) of the substrate surface, and the inclined angle of the vertical surface (a) to the substrate surface is 7 5 To 105 degrees. In the first aspect of the present invention, the inclination angle of the inclined surface (b) is preferably 2 degrees or more and 30 degrees or less, and more preferably 2.5 degrees or more and 15 degrees or less. At this time, the inclined angle of the inclined surface (b) with respect to the surface of the substrate is a recording tooth-shaped cross-section (close to a right triangle) formed by the vertical surface (a) and the inclined surface (b), and passes through an inclined surface (b). The angle between the straight line at the two ends of the line and the surface of the diffuser reflector substrate. the same

314175.ptd Page 23 200300512 V. Description of the invention (13) The vertical angle (a) of the angle of inclination with respect to the surface of the substrate is a tooth-shaped cross-section formed by the vertical plane (a) and the inclined plane (b). The angle between the straight line at the two ends of the dividing line passing through a vertical plane (a) and the surface of the substrate of the diffuse reflection plate. The inclined surface (b) in the second aspect of the present invention, as shown in FIG. 16 and FIG. 17, includes at least two inclined angle groups different from the surface of the substrate, and one of the inclined angle groups is 0. To 20 degrees, the other is 0 to 30 degrees, and the angle of incidence light range corresponding to the best amount of incident light is a combination of 0 degrees to 15 degrees and 10 degrees to 25 degrees. The angle of the tilt angle group varies depending on the application of the diffuse reflection plate. #The length of the inclined angle group of the inclined surface (b) of the sawtooth-shaped cross-section can be the same length or irregular, so as to correspond to the angle of incident light with the best amount of incident light. . The shape of the inclined surface (b) on the cross-section of the medium tooth can also be all or part of a curve, and the inclined angle group is a person with a uniform angular distribution within a set angle range, and the reflected light can be uniformly reflected back to the direction of the user. In the second aspect of the uneven surface of the diffuse reflection plate, the inclined surface (b) is provided with a complex I number of inclined angle groups, and the cross section of the inclined surface (b) has a waveform with an amplitude. The incoming external incident light is effectively reflected back to the angle range observed by the user. The roughening of the surface of the concave-convex surface can smooth the peaks of the reflected light of the complex tilted 4 angle group, and can obtain a less visual loss and loss in the angle range Display state. In the first and second aspects of the present invention, the inclined plane (b) on the transverse plane perpendicular to the sawtooth transverse plane has a waveform with an amplitude, which can be a waveform as shown in FIG. 8. Waves formed by partial circles or ellipses, waveforms formed by partial parabolas, triangular waveforms, and the continuity of these waveform combinations

314175.pid Page 24 200300512 V. Description of the invention (14) The curved surface is more likely to be white and a wider range of the light source position diffuses the reflected light, and can reduce the manufacturing unit price. Among them, a sine wave is preferred. The wavelength of the waveform on the cross-section of the inclined surface (b) can be regular, but it can also be set at a non-constant interval S to suppress interference waves and beam splitting. That is, when the waveform is a sinusoidal waveform, the waveform of the sinusoidal waveform is not. Anyone can do it. The phase of the sine wave of the cross-section waveform of the vertical plane (a) adjacent to the inclined plane (b) may be constant, but it is better to move the half-phase to suppress interference waves and beam splitting, and the non-uniform is better. The inclined plane (b) is horizontal The amplitude of the slice waveform can be regular, but it is better to arrange it at a certain interval in order to suppress interference waves and spectral splitting. That is, it is also possible to combine the amplitude of the y sine waveform in a field where the waveform is a sine waveform to be non-constant. The peak angle Λ of the concavo-convex surface of the sawtooth-shaped cross-section formed by the vertical surface (a) and the inclined surface (: b) of the substrate surface of the diffuse reflection plate is a peak formed by the apex of the sag-shaped cross-section in the vertical direction. , Valley, can also be a person with a curvature shape. Observe that when the diffuse reflection plate reduces the area of each vertical plane (a), there is no parallax or astigmatism loss, and a diffuse reflection plate with excellent visibility can be obtained. Therefore, the interval at which the vertical plane (a) is arranged is less than 50 // in. It is better to be less than 70 # m. On the other hand, if the interval of the vertical plane (a) is too small, it is easy to cause light splitting, so it is better to be 2 // m or more, and the configuration interval is more than 5 // m. The interval of the vertical plane (a) may be regular, but it is better to prevent interference from spreading. 5 It is better to arrange it at a non-constant interval. 0 The uneven surface of the diffuse reflection plate 5 has unevenness on the surface. When the liquid crystal display is not formed between two glass plates, the dispersion difference must be reduced. When the diffusion reflection plate of the present invention is used in other displays, such as electric field light-emitting displays, the difference is small.

3] 4] 75.ptd Page 25 200300512 V. Description of the invention (15) The abundance on the reflecting plate means that the present invention is the highest and most suitable for expansion. 3.5 // m When the design is converted by the present invention, it usually requires a mold. It is better to transfer to a thin film, and it is better to transfer the original one layer with a smaller uneven shape ratio. The compacted film of the present invention can be the following base film. The specific examples are cellulose imines such as polyethlene, polyethylenimide, etc., polyimide, || glue, or aluminum, 4 biaxially stretched with a primer. The film layer is hardene, and ethylene is copolymerized with ethylene such as ethylene The manufacturing process is simpler when constructing the components of each display. In all the tooth-shaped cross-sections of the diffuse reflection plate, it is better that the vertical difference (that is, the maximum drop of the uneven surface) is less than 6 // m. The concave and convex surface of the original mold or the original mold is taken into consideration when the film layer is hardened. That is, in the process of transferring layers, the drop or inclination angle of the concave-convex surface of the deformed mold of the transferred shape must be considered to be greater than the top angle and peak of the concave-convex surface of the transferred original mold. The transferred original mold can be used. Transfer the original mold layer, transfer its shape to the transfer base film, transfer the base film, or provide a primer layer for chemical and thermal stabilization. It can be formed into polyethene such as polyethylene, polypropylene, etc. , Cellulose acetate, nitrate derivatives, polyamines, polystyrene, ABS, polyacetaldehyde, PP 0, polymaple, copper copper and other metals. Among them, ethylene glycol terephthalate is particularly preferred. The transfer layer of the base film is preferably a concave layer. Examples include, for example, polyvinyl acetate, ethylene and acrylate, polyethylene, vinyl chloride, and acetic acid with which they are transferred. After the transfer, the sheet-like shape, plate vinyl chloride, cellulose cellulose, polycarbonate, oxyresin, etc. were formed. After the stability was formed, polypropylene, ethylene, and vinyl esters were formed. Also under the histogram is, the base film is moved in the original mode of the thinnest valley of the original shift. Polyvinyl chloride, Sai, Poly, etc.

314175.pul Page 26 200300512 V. Description of the invention (16), copolymers of gaseous ethylene and vinyl alcohol, polyvinylidene chloride, polystyrene, styrene and (fluorenyl) acrylate copolymers such as styrene, Interpolymers of polyfluorenylstyrene, fluorenylstyrene and methylstyrene such as (fluorenyl) acrylate, poly (fluorenyl) acrylate, butyl (fluorenyl) butyl acrylate and vinyl acetate (formaldehyde) Base) Interpolymers of acrylic esters, synthetic rubber, cellulose derivatives, etc., and at least one type of organic polymer may be used. In order to harden after the unevenness is formed, a photoinitiator or a monomer containing an ethylenic double bond may be further added. Negative and positive photosensitive types are no problem. The transfer base film and the transfer base film provided with a primer layer can be made into a transfer-shaped transfer base film by using a transfer master mold and pressing the transfer master mold against the transferred layer. The present invention can also use the above-mentioned transfer base film as a temporary support, and then form a thin film layer on the surface of the temporary support to transfer the original mold, and the surface on which the temporary support is not formed constitutes the same as the substrate to be transferred. Then, it becomes a transfer film. The transfer base film is pressed against the thin film layer formed on the substrate so as to face the transferred surface, and the transfer base film is peeled off to form a diffuse reflection plate with a reflective film formed on the surface. As the film layer, a rollable film-like resin composition can be applied to a support or substrate of a transfer base film to form a rollable film. Where necessary, dyes, organic pigments, inorganic pigments, powders, or composites thereof can also be used in the film alone or in combination. In the film layer, a photocurable resin composition or a thermosetting resin composition may be used. The softening temperature of the film layer is not particularly limited, but it is preferably below 200 ° C. In addition, in order to obtain fluidity by heating, a low-melting substance having a molecular weight of 1,000 or less may be added.

__ 314175.ptd page 27 200300512 V. Description of the invention (17) Among these materials, those with good adhesion to the transfer base film or substrate and excellent peelability to the transfer base film are preferred. Examples of the organic polymer containing a photocurable resin composition include polyolefins such as propylene resin, polyethylene, and polypropylene; polyvinyl halide such as polyvinyl chloride and polyvinylidene chloride; cellulose acetate vinegar, and nitrocellulose Cellulose derivatives such as cellulose, selenium, etc., polyamic acid, polystyrene, polycarbonate, polyester, etc. In the field of TFT liquid crystal displays, in order to form contact holes on the substrate with the formed TFTs, the thin film layer of this part must be removed, and a photosensitive resin that can be used in alkali phase can also be used. At the same time, in order to increase its financial and thermal properties, solvent resistance, and shape stability, _ thermosetting resin composition can also be used. In addition, by adding a coupling agent and an adhesive, the adhesion with the transfer base film can be increased. For the purpose of adhering, an adhering agent may be formed on the adhering surface. The thin-film layer is obtained by heating, and a low-melting substance having a molecular weight of 1,000 or less may be added. For example, you can add a plasticizer as described in "Plastic Compounding Agent" (edited by Akira Endo and Makoto Sudo, issued by Daiseisha, published on November 30, 2008), or contain at least one vinylic double bond in the molecule Of the monomer. The amount of this component used is preferably 1 to 70% by weight based on the total solid content of the photosensitive composition. ^ Examples include trihydroxymethylpropane triacrylate, triethylene glycol diacrylate, diethylene glycol diacrylate, tetraethylene glycol diacrylate, hexamethylene glycol diacrylate, neopentyl Alcohol diacrylate, furanyl acrylate, tetramethylolmethane tetraacrylate, resorcinol diacrylate, p -'- dihydroxydiphenyl diacrylate, spirodiol diacrylate, ring Hexane dimethylol diacrylate, biphenol A diacrylate, polypropylene diacrylate

314175.ptd Page 28 200300512 V. Description of the invention (18) Alcohol dipropionate, pentaerythritol tetrapropionate, glycolized pentaerythritol tetraacrylate dipentaerythritol hexaacrylate, And the above-mentioned acrylic acid compounds, acrylic acid esters, acrylic acid esters, acrylic acid esters, acrylic acid esters, acrylic acid esters, acrylic acid, methylene dipropylene Polyfunctional monomers such as dilute ammonium urethane and diacrylate. Also, such as ECH denatured phthalenedicarboxylic acid diacrylate, 'tri (propyloxyethyl) isocyanate Λ tri (fluorenyl propylene oxide) Ethyl) isocyanate, tris (2-hydroxymethylethyl) isocyanate, polyethylene glycol dimethacrylate, i dibromophenyl acrylate, E 0 modified tribromophenol acrylate E0 denatured tetrabromo- ^ 'phenol dimethacrylic acid, SI, etc. Monomers or compounds which are solid at 25 ° C or have a viscosity above 100 Pa · s (100,000 csp) Polymer 〇 or Select Factory Sensitive Material § Recorded in j (Photopolymer Workshop Symposium, Bunsj [published and issued, March 3, 1996]] said issued) is better. Other examples include methyl acrylic, ethyl acrylate, n-butyl acrylate, isobutyl acrylate, isobutyl acrylate, 2-ethylhexyl acrylate, and cyclohexyl acrylate. , Tetrahydrofuran methyl methacrylate, Benzene methacrylate, methyl ester, acidic mono (2-methylpropenyloxyethyl:) ester, dimethylamino ethyl methacrylate Monofunctional monomers such as quaternary compounds. These components can be used alone or in combination of two or more of them. Ε) Photoinitiator of the photocurable resin composition can be exemplified by benzene, benzene, N, N, Ethyl--4,4, -Diaminobenzoic acid benzene, 4-methoxy--4, dimethylaminophenylbenzene benzene X phenylfluorenyl, 2, 2- "-ethoxyethyl Benzene, Benzoin, Benzoin, Toluene, Isobutyl Ether Benzyl dimethyl ketal, a-Hydroxyisobutyl ketone, Tiotonone, 2-Gasthione, Ketone Λ 1- Cyclohexyl benzophenone,

314175.ptd Page 29 200300512 V. Description of the invention (19) 2-fluorenyl-1- [4- (fluorenylthio) phenyl]-2 -morpholin-1 -clanine, third anthraquinone, 1-anthraquinone chloride, 2,3-digassed anthraquinone, 3-chloro-2-fluorenylanthraquinone, 2-ethylanthraquinone, 1,4-naphthoquinone, 9, 10-phenanthrenequinone, 1 2,2-benzoanthraquinone, 1,4-dimethylanthraquinone, 2-phenylanthraquinone, 2- (ortho-gasified phenyl) -4,5-diphenylimidazole dimer, and the like. These photoinitiators can be used alone or in combination of two or more kinds. The amount of this component used is preferably from 0.01 to 25% by weight, and more preferably from 1 to 20% by weight of the total solids content in the photosensitive resin composition. The coating method of the film layer and the primer layer can be exemplified by roll coater coating, spin coater coating, spray coating coater coating, dip coater coating, curtain cloth coating, wire rod coating machine coating, and rotary concave coating. Printing coating machine coating, pneumatic blade coating machine coating. The surface of the temporary support and the substrate is also coated with a film layer or a primer layer using the method described above. Examples of the coating substrate include glass plates, glass plates formed with inorganic compounds such as chromium or IT 0, silicone substrates, ceramic plates, polycarbonate resin films, acrylic resin films, and polyethylene terephthalate. Ester film, polyether resin film, fluorine resin film, etc. It is better to use a substrate with less birefringence (n = 0.01 or less). In the present invention, a # -emission film is formed on the transferred surface of the thin film layer or on the transferred base film. Figures 3 and 2 show an example of forming the reflective film on a thin film layer. The reflective film can be selected with a suitable material in the desired reflection wavelength range. For example, a reflective LCD display can have a visible light wavelength range of 300 nm to 800 nm. A highly reflective metal, such as aluminum or gold, silver, etc., is vacuum evaporated. By sputtering or sputtering. In addition, the reflection enhancement film (optical

314175.pld Page 30 200300512 V. Description of Invention (20) Introduction 2, Shun Ping Shun Ping, Chao Cang Bookstore, issued in 1976). In the case where the difference in refractive index is used for reflection, in addition to metal, it can be reduced or reduced by vacuum evaporation; the plating method can form a film such as I T0 or tantalum pentoxide and an oxide film or nitride film such as silane or aluminum. Oxynitride film. Or a laminated film with a low refractive index is used as the thin film layer monomer. The thickness of the reflective film is preferably from 0.01 to 50 // m. The necessary part of the reflective film can also be patterned by photo-etching or mask evaporation. In order to protect the transfer surface of the thin film layer on the substrate, it is better to provide a surface film layer as a protective film. The surface film layer is preferably one which is chemically and thermally stable and easily peeled from the film layer. Specifically, those having a thin sheet shape such as polyethylene, polypropylene, polyethylene terephthalate, and polyvinyl alcohol and having a high surface smoothness are preferred. In order to impart releasability, the surface is also released. The thickness of these surface film layers is preferably 5 to 120 mm. When the thickness is less than 5 // m, the membrane is easily damaged, and therefore it is liable to become defective. When it exceeds 1 2 0 // m, creases are likely to occur when the film is wound in subsequent projects. Reduce its workability. As shown in FIG. 2 and FIG. 13, the transfer film of the present invention can be pressed on the transferred layer formed by the base film and the primer layer by the transfer original mold, and the shape of the transfer original film can be used as a temporary support. A film layer is formed on the surface of the temporary support body after the original mold is transferred (in Figs. 2 and 13, the surface film layer is laminated to form a protective film layer), and the surface of the temporary support body is not laminated with the film layer. Adhesion to the transferred substrate. The method of transferring the thin film layer on the transfer film to the substrate can be exemplified by peeling off the surface film layer as shown in Fig. 4 and then heating and pressing it on a transferred substrate such as a glass substrate. Where adhesion is required, the substrate can be cleaned with necessary chemicals, etc., or an adhesive can be applied to the substrate, or ultraviolet rays can be applied to the substrate. Device for film layer transfer,

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I 1 314175.ptcl page 31 200300512 V. Description of the invention (21) The film layer can be tightly pressed by using a roller that can clamp the substrate. It is better to surround the surface of the substrate. In this case, the uneven shape of the thin film layer can be easily reproduced. It will break through the thin film layer, so the highly efficient diffuse reflection plate can keep it diffusive. It can make the thin film layer such as carbon arc lamp, ultra-high metal lamp, fluorescent lamp, and Yan exposure. It can be re-passed after the temporary exposure. Wait for the heater. In the present invention, it is better to use (a) and inclined surface (b) to form the bottom line of the trench in parallel, which is slightly lower due to the inclination. The left side faces the display day and above. Reflective liquid plates can be used. [Example] Example _ Example 1 A roller laminator that rotates on a substrate between heated and pressurized rubber rollers and sends out the substrate is a film layer with a film thickness of 0.1 to 50 // m. When the maximum height difference between the uneven thickness of the film thickness is greater than that of the same or thinner film thickness, an unnecessary flat part is generated at the convex part of the original mold, and it is difficult to obtain a shape reflecting light. The exposure of the photocurable resin composition makes the It is photosensitive and hardened. Examples of exposure machines Pressurized mercury lamps, high-pressure mercury lamps, gas lamps, halogen lamps, and the like. The support is applied before or after peeling. Warm-air heating furnace, or infrared heating furnace, electric heating on the reflective liquid crystal display, on the vertical toothed cross-section of the cross-section, the top of the surface with the ridge top and the difference between the height difference is displayed on the day. 5 An example of a reflective LCD is shown. The fifth side is slightly below, and its reflection characteristics are better. The crystal display is explained, but the diffuse reflection of the present invention is a display device that diffusely reflects external light. Explain the invention.

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314175.ptd Page 32 200300512 V. Description of the invention (22) As shown in Figure 1, rotating a cylindrical iron substrate with a diameter of 130 mm and performing copper plating at the same time results in a stack of 2 0 on the iron. 0 // ra copper master mold substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a comprehensive shape with a wavelength of 27 // m and an amplitude of 2.5 // m. The inclined surface (b) with a sine wave bent at an inclination angle of 10 degrees is arranged at a distance of 2 5 // m from the vertical surface (a). Next, immerse it in the copper plating solution shown below and rotate it to adjust the current density (the current value of the plating area of 10 square centimeters) to a current of 8 A / square inch, and then polish the electric clock. After the surface roughening is carried out in the same electroplating bath with an adjusted current density of 2 A per square inch, it is washed with pure water for the purpose of removing the bath. Secondly, in order to suppress the oxidation of copper, it was immersed in the following recording key solution, and polished and nickel-plated at a current of 2A / cm2 to adjust the current density to obtain an original mold. Copper plating solution: 21 Og / litre 60 g / litre 0 · Olg / litre 0. Olg / litre 0. Olg / litre 3 0 ° C 2 4 0 g / litre 45g / litre 30g / litre copper sulfate thiourea sulfate paste Refined hydrochloric acid and warm nickel plating solution: nickel sulfate gasification and boric acid

314175.ptd Page 33 200300512 V. Description of the Invention (23)

Bath temperature 30 ° C Use a polyethylene terephthalate film with a thickness of 10 0 " m on the base film, and then coat the base film with a light-hardening coating with a thickness of 20 // m by a spin coater. The resin solution acts as a primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiated with ultraviolet rays to harden the photocurable resin and then separated from the original mold to form a transfer base film on the surface of the photocurable resin layer (that is, the primer layer) to form the uneven shape of the original transfer mold. . Photocurable resin (primer layer) solution: 5 parts by weight 8 parts by weight 2 parts by weight 0.3 parts by weight 0.2 parts by weight 2.5% by weight Acrylic acid-butyl acrylate-vinyl acetate copolymer butyl acetate ( Monomer) Ethyl acetate (monomer) Acrylic (monomer) Hexanediol acrylate (monomer) Benzoin isobutyl ether (starter) Secondly, on the photocurable resin (primer layer) The spin coating machine was used to apply the following solution for forming a thin film layer, and dried to a film with an average film thickness of 8 // m thick, and it became a transfer film overlying the surface layer of a polyethylene film (Fig. 2). Next, as shown in FIG. 4, the surface film layer of the transfer film was peeled off, and a laminator (roller laminator HLM1500, manufactured by Hitachi Chemical Technoplant, Inc., trade name: material temperature 90 ° C, roller temperature 80 ° ° C, roller pressure of 0,686 MPa (7 kg / cni2), and lamination at a speed of 0.5 m / min, to obtain a glass substrate with a laminated film layer, a photocurable resin layer (primer layer), and a base film. Substrate. Secondly, the photocurable resin layer (primer layer) and the base film are peeled off to obtain a thin film layer on the glass substrate containing the same uneven shape of the transferred original mold. Secondly, in the oven at 2 3 (TC Heat harden for 30 minutes, then steam under vacuum

___ 3] 4175.ptd page 34 200300512 V. Description of the invention (24) The aluminum thin film with a film thickness of 0.2 // m is formed by the plating method to form a reflective layer, and a diffuse reflection plate is made. Fig. 6 shows a device for measuring the reflection characteristics of the diffuse reflection plate of the present invention. The angle formed by the reflected light 20 and the incident light 19 is the reflection angle 0, and the observable brightness of the diffuse reflection plate normal direction within the necessary range of 0, that is, the greater the reflection intensity, the better the reflection characteristics. Diffuse reflector. Figure 11 shows the dependence of the reflection intensity (relative intensity on a standard white plate) of the diffuse reflection plate of this embodiment on the incident angle at the azimuth angle (0) 30 degrees. A reflection intensity of 40 at an azimuth angle of 30 degrees and a reflection angle of 0 = 3 at 30 degrees is 40, and a reflection reflection of 20 is obtained at an azimuth angle of 0 = 0 degrees. board. Solution for film layer formation: As the polymer, styrene, fluorenyl acrylate, ethyl acrylate, acrylic acid, and glycidyl methacrylate copolymer resin (polymer A) were used. The molecular weight is about 3 5 0 0 0 and the acid value is 1 1 0. Polymer A 70 parts by weight pentaerythritol tetraacrylate (monomer) 30 parts by weight was added -369 (Chiba Speciality Chemicals) (starter) 2.2 parts by weight N, N-tetraethyl- 4, 4'-diaminobenzylbenzene (initiator) 2.2 parts by weight 4 9 2 parts by weight 0.1 parts by weight 0.01 parts by weight propylene glycol monomethyl ether (solvent) p-methoxyphenol (inhibition of polymerization Agent) Perfluoroalcoholic acid ester (Surfactant Example 2

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li illi 314175.ptd page 35 200300512 V. Description of the invention (25) A vacuum deposition method was used to form a film with a thickness of 0.2 2 m on the uneven surface of the transfer base film obtained in Example 1, and stacked to form a reflection Floor. It can be obtained that the reflection intensity at a reflection angle of 0 = 18 at azimuth angles of 0 = 30 degrees and -30 degrees is 1 °, and the reflection intensity at 40 degrees is 0, and the reflection angle at azimuth angles of 0 to 20 degrees is Θ = 18 degrees Diffusion reflector with a reflection intensity of 18 and excellent reflection characteristics. Example 1 has the same uneven shape as the transfer original mold, and Example 2 has the opposite shape of the unevenness of the transfer original mold. Example 3 # Using a glass substrate as a substrate, and then coating with the same film layer forming solution as in Example 1, and then spin-coating at 2000 rotation for 15 seconds at 90 ° C After heating for 2 minutes, a film layer of 8 // m was obtained. Next, a base film of 100 # m was formed from polyethylene terephthalate in the same manner as in Example 1. Then, a photo-curable resin solution was applied with a spin coater to dry the film to a thickness of 20 / m. Then, press the transfer original mold, irradiate ultraviolet rays to harden the photocurable resin layer (that is, the primer layer), and then separate it from the original mold to form a photocurable resin layer (that is, the primer layer). The transfer of the base film. The embossed surface of the transfer base film is laminated with a laminator (roller laminator HLM1500, manufactured by Hitachi Chemical Co., Ltd., trade name) as described above. 4 The substrate temperature is 90 ° C, and the roller temperature is 80 ° C. , Roller pressure (K 686MPa (7kg / cm2), speed of 0.5m / min, and lamination to obtain a glass substrate with a thin film layer, a photocurable resin layer (primer layer), and a base film substrate Then, the exposure device is irradiated with ultraviolet rays, and then the photocurable resin layer (primer layer) and the base film are peeled off to form a thin film layer on the glass substrate having the same uneven shape as the transferred original mold. Secondly, in the oven, the 2 3 0 ° C

314175.pid Page 36 200300512 V. Description of the invention (26) Heat harden for 30 minutes, and then stack aluminum film with a thickness of 0.2 // in by vacuum evaporation to form a reflective layer to make a diffuse reflection plate. In this way, a diffuse reflection plate with excellent reflection characteristics is obtained. The reflection intensity obtained when the reflection angle is 0 = 16 at azimuth angles of 0 and 30 degrees and at 30 degrees is 40, and the reflection angle at azimuth angle of 4 = 0 degrees. The reflection intensity obtained at 16 degrees is 20. Shigekui—4— In the same way as in the first figure shown in Example 1, a cylindrical iron substrate with a diameter of 130 mm is rotated and copper plating is performed at the same time to obtain a stack of 2 0 on the iron. 0 // m copper master substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of 80 degrees is continuously engraved spirally to obtain a comprehensive shape with a wavelength of 2 5 // m to 2 9 // m. Constant and irregular wavelengths with irregular and irregular amplitudes ranging from 2.3 // m to 2.5 // m. The inclination angle is 10 degrees into a sine wave of various waveforms, which are continuously arranged into an inclined surface with a curved waveform ( b), a cylindrical shape arranged at an irregular and irregular interval of 2 5 // m to 2 7 // m with the vertical plane (a). It is different from Example 1 in that the unevenness is non-periodic. Secondly, immersed in the same copper plating solution as in Example 1 while rotating and immersed in the same copper plating solution as in Example 1, and adjusted the current density (the current value of the plating area of 10 square centimeters) to 8A / square inch for polishing and plating. After roughening the surface of the plating solution with a current adjusted to a current density of 2 A / square inch, it is washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress copper oxidation, it was immersed in the same nickel plating solution as in Example 1 and polished and electroplated with a current adjusted to a current density of 2A / cm 2 to obtain a transfer master. Hereinafter, the same as in Example 1 is used to transfer the original mold to produce diffuse reflection.

314175.pid Page 37 200300512 V. Description of Invention (27) Board. This results in a diffuse reflection plate with excellent reflection characteristics. The reflection intensity at a reflection angle of 0 = 30 degrees at azimuth angles of 0 = 30 and -3 degrees is 0. The reflection intensity obtained at 8 degrees is 40, and the reflection angle of azimuth angle Θ = 0 degrees. The reflection intensity obtained at 18 degrees is 18. Comparative example of tb ”Rotating a cylindrical iron substrate with a diameter of 130 mm for copper plating in the same way as in the first figure shown in Example 1 to obtain a copper stack of 2 0 0 // m copper The master substrate. The surface is then ground to a mirror surface. Secondly, one side is rotated, and then the right half of the end angle is 0 degrees, and the left half of the end angle is 80 degrees. The stone needles are continuously engraved spirally. (A) Cylinders arranged at intervals of 2 5 // m. The difference from Embodiment 1 is that the cross section of the inclined surface (b) perpendicular to the zigzag cross section is not a waveform with an amplitude but a certain inclined plane. Next, while immersed in the copper plating solution shown below while rotating and polishing and plating with a current of 8 A / cm2 at a current density (current value of 10 square centimeters of electricity and ore area), After roughening the surface I * in the same plating solution at a current density of 2 A / cm², it was washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel electroplating solution as in Example 1, and polished and nickel-plated with a current of 2A / cm² to adjust the current density to obtain a transfer ▲ original mold. Hereinafter, it is the same as in Example 1, and a diffuse reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle Θ at 18 degrees is -18 degrees, the reflection intensity obtained is 2; therefore, sufficient reflection intensity cannot be obtained. The difference between Comparative Example 1 and Example 1 is the unevenness of the diffuse reflection plate and the transfer master.

314175.ptd Page 38 200300512 V. Description of the invention The inclined surface (b) on the surface (28) is an inclined plane. Example 5 As shown in Figure 12, except that the diamond needle with a combination of the right half end angle of 0 degrees and the left half end angle of the end portion is 85.5 degrees and 75.5 degrees, it is treated as in Example 1. The shape of the curved slope (b) with a period of 27 // m and a sine wave with an amplitude of 2.5 // m is obtained as shown in Figure 17 and the vertical plane (a) is 2 5 // Fully arranged barrels with m intervals. Secondly, immersed in the same copper electroplating solution used in Example 1 while rotating and adjusting the current density (current value of the key area 10 square centimeters) to 8 A / square centimeter for polishing and plating. Then, in the same plating solution, the surface is subjected to roughening electroplating with an adjusted current density of 2 A / square inch, and then washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same nickel plating solution as in Example 1, and polished and nickel-plated with a current adjusted to a current density of 2A / cm 2 to obtain a transfer master. On the base film, a polyethylene terephthalate with a thickness of 1 0 // // m was used. On the base film, a photo-curable resin solution was applied with a spin coater and dried to a thickness of 20 m. Primer layer. Next, it is pressed tightly on the original transfer mold, and then irradiates ultraviolet light to harden the photo-curable resin and then separates from the original transfer mold to form a photo-curable resin layer (that is, a primer layer). Base film. Next, the same film-layer-forming solution used in Example 1 was coated on the photocurable resin (primer layer) with a spin coater, and dried to form a film with an average film thickness of 8 // m. A transfer film covered with a polyethylene film surface layer (Fig. 13). Next, as shown in Fig. 4, peel the surface film layer of the transfer film 1 | 1 11 11 1 111 II 1 11 II III 1 III i 1 1! 314175.pul Page 39 200300512 V. Description of the invention (29) From a laminator (roller laminator HLM 1 500, manufactured by Hitachi Chemical Co., Ltd., trade name) at a substrate temperature of 90 ° C, a roller temperature of 80 ° C, and a roller pressure of 0.68 6MPa (7kg / cm2), lamination at a speed of 0.5 m / min, and the film layer is then adhered to the glass substrate, to obtain a glass substrate laminated with a film layer, a photocurable resin layer (primer layer), Substrate of base film. Next, the photocurable resin layer (primer layer) and the base film are peeled off to obtain a thin film layer on the glass substrate containing the same uneven shape of the transferred original mold. Next, heat-harden in an oven at 230 ° C for 30 minutes, and then use a vacuum evaporation method to form a reflective layer with a build-up film thickness of 0. 2 #m to form a diffuse reflection. The figure shows the dependence of the reflection intensity (relative intensity with respect to a standard white plate) on the reflection angle (that is, the incident angle) of the diffuse reflection plate of this embodiment when the azimuth angle (0) is 30 degrees. Obtain a reflection angle at azimuth angles of 0 = 30 degrees and -30 degrees (the reflection intensity obtained at 925 to 25 degrees is more than 20, and the reflection angle at an azimuth angle of 0 = 0 degrees Θ = 5 to 2 5 The reflection intensity obtained at 15 degrees is a diffuse reflection plate with excellent reflection characteristics. Real J 良 __ 例 _ The vacuum evaporation method was used to form the film on the uneven surface of the transfer base film obtained in Example 5 with a film thickness of 0.2 / / m of aluminum thin film is stacked to form a reflective layer to obtain a diffuse reflection plate. The obtained reflection angles are at azimuth angles of 0 = 30 degrees and reflection angles at -30 degrees (9 = 7 to 22 degrees) A diffuse reflection plate having a reflection intensity of θ = 7 to 22 degrees at a reflection angle Θ of 0 to 20 degrees and an azimuth angle of 0 to 20 degrees and a reflection intensity of 15 or more and excellent reflection characteristics. Example 5 is the same unevenness as that of the transfer original mold. The shape, Example 6 is a concave-convex shape in which the original mold is inverted.

314] 75.pld Page 40 200300512 V. Description of the invention (30) ~~ Using glass substrate as the substrate, and then coating with the same film layer forming solution as in Example 5, and then spin-coating at 2000 After coating for 15 seconds and heating on a hot plate of 90 ^ / for 2 minutes, a film layer of 8 // m was obtained. Next, as in Example | Example 5, the base film of i 〇 ## is formed with polyethylene terephthalate in the same manner, and the photocurable resin solution is applied to a 20 // m thick film by a spin coater. I. Press transfer the original mold, irradiate ultraviolet light to harden the photocurable resin, and then separate from the original mold to form a transfer base film with a concave and convex shape on the surface of the photocurable resin layer (that is, the primer layer). The embossed surface of the transfer base film was again laminated on the film layer using a laminator (roller laminator HLM 1 500, manufactured by Hitachi Chemical Co., Ltd., trade name) at a substrate temperature of 9 and a roller temperature of 80 ° C. , Lamination at 0.686 MPa (7 kg / cm2), roller speed at 0.5 μm / min, to obtain a glass substrate with a thin film layer, a photocurable resin layer (primer layer), and a base film substrate . Then, the exposure device was irradiated with ultraviolet rays, and then the photocurable resin layer (primer layer) and the base film were peeled off to form a thin film layer having the same uneven shape on the glass substrate as that of the transfer master. Next, heat-harden in an oven at 230 ° C for 30 minutes, and then vacuum-deposit an aluminum film with a film thickness of 0 · 2 // m to form a reflective layer. In this way, a diffuse reflection plate with excellent reflection characteristics was obtained. The reflection intensity obtained at a reflection angle of 0 to 30 degrees and a reflection angle of 0 to 30 degrees at 25 to 25 degrees was more than 20, and the reflection angle at an azimuth angle of $ 20 degrees < The reflection intensity obtained at 925 to 25 degrees is 15 or more. mm In the same way as in Figure 12 shown in Example 5, rotating a cylindrical iron substrate with a diameter of 130 mm in for copper plating results in a stack of 2 0 0 m 1 m on the iron. Ιί

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200300512 V. Description of the invention (31) The base material of copper master mold. The surface is then ground to a mirror surface. Secondly, while rotating one side, the diamond needle with a combination of the right half of the end angle of 0 degrees and the left half of the end of the angle is 85.5 degrees and 75.5 degrees, the spiral needle is continuously engraved, and the shape is cycle 2 7 / Im, non-amplitude, inclined planes and vertical planes (a) are arranged in a full array at 25 // m intervals. The difference from Example 5 is that the inclined plane (b) of the vertical dentate cross-section has no amplitude and has a certain inclined plane. Secondly, immersed in the same copper plating solution as in Example 5 while rotating and immersed in a current of 8 A / cm2 to adjust the current density (current value of the plating area of 10 square centimeters) to 8 A / square inch. After the surface roughening plating was performed in the same f plating solution with a current density of 2 A / square inch, it was washed with pure water for the purpose of removing the plating solution. Secondly, in order to suppress the oxidation of copper, it was immersed in the same recording key solution as in Example 1 and polished and nickel-plated with a current adjusted to a current density of 2 A / cm 2 to obtain a transfer master. Hereinafter, it is the same as in Example 5, and a diffuser reflection plate was produced from the transfer master of this comparative example. When the azimuth angle is 0 = 30 degrees and the reflection angle Θ = 18 degrees at -30 degrees, the reflection intensity obtained is 2, so it is impossible to obtain sufficient reflection intensity. The difference between Comparative Example 2 and Example 5 is that the inclined surface on the vertical sawtooth-shaped cross-section (b) on the uneven surface of the diffuse reflection plate and the transfer master mold has a constant inclined plane-plane. [Possibility of industrial use] The diffuse reflection plate of the present invention is characterized by a novel concave-convex surface shape, and its purpose is to improve the display quality of reflective liquid crystal displays, electric field light-emitting displays, electrophoretic displays, and the like. It is characterized by a curved inclined surface

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314175.ptd Page 43 200300512 Brief description of the drawings [Simplified illustration of the drawings] The cross-sectional view shown in Fig. 1 is an example of the transfer of the original mold manufacturing process in the first aspect of the present invention. The sectional view shown in FIG. 2 is the first aspect of the present invention: one of the intermediate transfer membranes.

3H175.ptd 页 Page 200200300512 Brief description of the diagram The sectional view shown in Fig. 13 is an example of the transfer film in the second aspect of the present invention. The sectional view shown in Fig. 14 is the second view of the present invention. # ^ 4 rows of the diffuse reflection plate in the aspect. The oblique view shown in FIG. 15 is an example of the shape of the uneven surface of the diffuse reflection plate in the second aspect of the present invention. This is an example of an alternate arrangement of the inclined surface (b) and the vertical surface (a) of the uneven surface of the diffuse reflection plate in the second aspect of the present invention. C) The sectional view shown in FIG. 17 is the diffuse reflection in Example 5. The shape of the inclined surface (b) and the vertical surface (a) alternately arranged on the uneven surface of the plate. The oblique view shown in FIG. 18 shows the shape of the concave and convex surfaces of the diffuser reflecting plate in the fifth embodiment. The graph shown in FIG. 19 is the dependence of the reflection intensity of the diffuse reflection plate on the reflection angle in Example 5. The copper substrate 2 the iron substrate 3 the diamond etching blade 4 the copper rough plating particles 5 the nickel 6 the glass substrate 7 the film layer 8 Reflective film 9 Base film (otherwise it is the color filter film in the 51st frame) 1 0 Surface layer (the other is only the black matrix in the fifth picture) 1 1 Primer layer (the other is only in the fifth picture For transparent electrodes) 1 2 leveling film 13 orientation film 1 i 4 liquid crystal layer 15 distance-adjusting layer

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Brief description of the drawing 16 retardation film layer 17 polarizer 18 sample 19 incident light 20 reflected light 21 photometer 22 reflection angle 23 azimuth angle 24 base material surface 25 μ tooth-shaped cross section 26 vertical surface (a) 27 inclined surface (b 314) 75.pld p. 46

Claims (1)

200300512 6. Scope of patent application 1. A diffuse reflection plate characterized in that the diffuse reflection plate can diffuse and reflect light. The diffuse reflection plate is composed of a substrate, a thin film layer formed on the surface, and a reflection layer. The cross-section of the film layer in a direction perpendicular to the surface of the substrate is a serrated shape composed of continuously repeated vertical surfaces (a) and inclined surfaces (b), and the inclination angle with respect to the vertical surface (a) of the substrate surface It is 75 to 105 degrees, and the inclined angle (b) of the inclined surface (b) inclined with respect to the substrate surface is 2 to 30 degrees. The inclined surface (b) is perpendicular to the sawtooth-shaped cross section and perpendicular to the substrate surface. The cross section has a wave shape with amplitude and has a continuous uneven surface. 2. If the diffuse reflection plate of item 1 of the patent application scope, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the sawtooth cross section is a sine wave. 3. For example, the diffuse reflection plate in the scope of patent application, wherein the amplitude of the cross-section waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 4. If the diffuse reflection plate of item 1 of the patent application scope, the wavelength of the cross-section waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 5. For example, the diffuse reflection plate in the scope of patent application, the vertical interval (a) is arranged at a distance of 2 // in above 1 5 0 // m. 6. For example, the diffuse reflection plate in the scope of patent application, in which the difference between the maximum height and the minimum height of the zigzag cross-section in the vertical direction (that is, the maximum drop of the uneven surface) is less than 6 // m. 7. The diffuse reflection plate according to item 1 of the patent application scope, wherein the arrangement interval of the vertical plane (a) is not a certain interval. 8. The diffuse reflection plate according to any one of claims 1 to 7, wherein the vertical plane (a) and the inclined plane (b) are subjected to surface roughening treatment. 314175.ptd Page 47 200300512 6. Those who apply for patent scope. 9. A transfer master, which has formed the concave-convex surface of the diffuser reflector of the first patent application. 1 0. — A transfer master, which is used to form the concave-convex surface of the transfer master in item 9 of the patent application. 1 1. A transfer base film is one that uses the transfer master of the 9th or 10th scope of the patent application, embossing the transfer master on the layer being transferred and transferring its shape. —A kind of transfer film, which uses the transfer base film β of the scope of application for patent No. 11 as a temporary support, and forms a thin film layer on the surface of the temporary transfer support self-transfer original mold, and the thin film layer is not formed on the temporary support. The upper surface is formed to be the surface adjoining the substrate to be transferred. 1 3. — A transfer film is one in which a reflective film is temporarily formed between the support and the thin film layer in the transfer film in item 12 of the patent application scope. 1 4. A method for manufacturing a diffuse reflection plate is a process of pressing a transfer film with a thin film layer as a contact surface on a transfer substrate with a thin film layer as a contact surface, a process of peeling the aforementioned temporary support, And the process of forming a reflective film on the surface where the thin film layer is transferred is to make a diffuse reflection plate. 1 5. —A method for manufacturing a diffuse reflection plate is a process in which the transfer base film of item 11 of the patent application is pressed against the thin film layer formed on the substrate with the transfer-formed surface as the interface, and the aforementioned The process of transferring the peeling of the base film and the process of forming a reflective film on the surface to produce a diffuse reflection plate. 3Η175.ptd Page 48 200300512 6. Application for Patent Range 1 6. — A method for manufacturing a diffuse reflection plate includes pressing the transfer film of item 13 of the patent application with the film layer as the interface to press the transferred substrate tightly The above project, and the engineer who peeled off the temporary support. 17. A diffuse reflection plate manufactured by the method for manufacturing a diffuse reflection plate according to any one of claims 14 to 16 in the scope of patent application. 18. A type of diffuse reflection plate, which is provided with a reflection film on the surface of the transfer self-transfer original mold of the transfer base film in item 11 of the scope of patent application. 19. A diffuse reflection plate characterized by using the diffuse reflection plate of the first patent application scope in a reflection type liquid crystal display. 2 0. — A diffuse reflection plate characterized by being in a zigzag cross-section formed by a vertical surface (a) and an inclined surface (b) with respect to the surface of the substrate of the diffuse reflection plate of the first patent application scope. Those used in reflection type liquid crystal displays in which the height difference caused by the slope parallel to the line of the ridge top or the bottom of the surface faces the lower part of the daylight surface are displayed. 2 1. A diffuse reflection plate characterized in that in a diffuse reflection plate that diffuses and reflects light, the diffuse reflection plate is composed of a base material, a thin film layer and a reflection layer formed on the surface, and the base material The cross-section of the film layer in the direction perpendicular to the surface of the material is a zigzag formed by the continuous repeated vertical plane (a) and inclined plane (b), and the inclination angle with respect to the vertical plane (a) of the substrate surface is 75 to 105 degrees, the inclined surface (b) contains at least two types of inclined angle groups different from the surface of the substrate, one of the inclined angle groups is 0 to 20 degrees, and the other of the inclined angle groups is 10 to 30. Degree, the cross section of the inclined surface (b) perpendicular to the zigzag cross section and perpendicular to the substrate surface has an amplitude 314175.ptd Page 49 200300512 VI. The waveform of the patent application has continuous uneven surface. 2 2. The diffuse reflection plate according to item 21 of the patent application, wherein the waveform of the cross section of the inclined surface (b) perpendicular to the zigzag cross section is a sine wave. 2 3. The diffuse reflection plate according to item 21 of the scope of patent application, wherein all or part of the shape of the sawtooth cross-section of the inclined surface (b) is a curve. 24. If the diffuse reflection plate according to item 21 of the scope of patent application, wherein the two or more different inclination lengths of the zigzag cross-section shape of the inclined surface (b) are not constant ~ '. I. The diffuse reflection plate according to item 21 of the patent application, wherein the amplitude of the cross-sectional waveform of the inclined surface (b) perpendicular to the sawtooth-shaped cross-section is not constant. 26. The diffuse reflection plate according to item 21 of the patent application scope, wherein the wavelength of the cross-sectional waveform of the inclined plane (b) perpendicular to the sawtooth-shaped cross-section is not constant. 2 7. The diffuse reflection plate according to item 21 of the patent application scope, wherein the vertical plane (a) | is arranged at intervals of 2 " m above 1 5 0 // Hi below. 28. If the diffuse reflection plate of item 21 of the patent application scope, wherein the difference between the maximum height and the minimum height of the zigzag 4-shaped cross section (the maximum difference between the concave and convex surfaces) is less than 6 // m . 2 9. The diffuse reflection plate according to item 21 of the scope of patent application, wherein the arrangement interval of the vertical plane (a) is not a certain interval. 30. The diffuse reflection plate according to any one of items 21 to 29 in the scope of patent application, wherein the vertical surface (a) and the inclined surface (b) are subjected to surface roughening treatment. 314175.ptd Page 50 200300512 is a diffuser that has formed the scope of patent application for item 2T. It is used to form the transferee of the 31st scope of the patent application. Department of using the patent application to transfer the original mold embossed in the patent application scope. 3 1. — A transfer original mold, the concave and convex surface of the reflecting plate 3 2. — A transfer original mold, the concave and convex surface of the original mold 3 3. — A transfer base film, the transfer of the original mold, will be around item 31 or 32 items transfer the layer and transfer its shape. 3 4. — The kind of transfer is the shape of the temporary surface, the shape is 3 5. — The kind of support during the transfer 3 6. — The kind of diffusion 3, the transfer project of 4 items, the film to be transferred is the support into a thin film The film and the film are used with the thin film reflective plate to transfer the film to the aforementioned temporary surface, and the layer is transferred when the thin film is applied. When the application is made on the temporary film substrate, please use the special shape layer for the support reflection patent scope. The unshaped bonding surface of the support layer is formed by the reflection method, which is the transfer of the transfer base film of item 33 of the project of the process of pressing and peeling the film tightly from the transfer to the temporary support. 3 4 of the temporary membrane transfer film. The process of making the scope of the patent application on the substrate to be transferred, and making the diffuse reflection plate on the thin film layer 3 7. A manufacturing method of the diffuse reflection plate is to make the transfer base film of the scope of the patent application No. 33 to The surface formed by the transfer is a process in which the interface is pressed against the thin film layer formed on the substrate, the process of peeling the aforementioned transfer base film, and the process of forming a reflective film on the surface. 314175.ptd Page 51 200300512 VI. Application for patent scope 38. — A method for manufacturing diffuse reflection plate, which covers the project of the transfer film of item 35 with a thin film layer as the interface, and peeling the aforementioned temporary support. 3 9. — A diffuse reflection plate, which is a method for manufacturing a diffuse reflection plate according to any one of the patent applications. 40. — A diffuse reflection plate, which is provided on the surface of the original mold for the transfer and transfer of the patent application film. Anti-reflective 41. A diffuse reflection plate characterized in that the application diffuse reflection plate is used in a reflective liquid crystal display. A diffuse reflection plate is characterized in that the diffuse reflection plate is applied so as to be inclined on the surface of the substrate (b). The formed silver tooth-shaped cross section or the bottom of the ditch is parallel to the slope, resulting in a high display of the daylight surface just below the use of the middle method. 4 3. — Reflective liquid crystal display The diffuse reflection plate of item 1. 4 4. A type of reflective liquid crystal display. The diffuse reflection plate of item 21 includes the engineer who pressed the applied patent range on the transferred substrate. Those created under items 36 to 38. The transfer base around the 33rd item. Applicable to the scope of the 21st patent. The vertical plane (a) of the surface of item 21 of the patent scope and the large difference between the tilt and the ridge top of the surface are facing the reflective liquid crystal display, which is characterized by using the patent application scope and is characterized by using the patent application scope III L mill Hi 3 I 314175.ptd Page 52