SU563826A1 - Device for depositing thin films - Google Patents

Description

Through the solenoid 7, a current is generated that creates a magnetic field of 20-50 E. A voltage of 40–80 V relative to cathode 4 is applied to chamber 1, and 2–30 V to valve. With these parameters, the configuration of the magnetic fields is as shown in FIG. 2. Power lines 10 the field of the solenoid 6 are included in cover 2, power lines 11 the fields of the solenoid 7 have a predominant component parallel to the inner surface of chamber 1. With this configuration of magnetic fields, the electronic current (arc current) tends to move along the power lines the floor A short-time contact of the cathode 4 by the igniting electrode 5 initiates an electric arc. In metal vapor, the arc burns at an arbitrarily low pressure of the residual gases. The voltage across the arc electrodes is established close to the cathode potential drop, since the voltage drop across the positive column of the vacuum arc is insignificant. The evaporation of the metal evaporated from the cathode 4 occurs through the flow of metal ions, which reflect from the potential

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Claims (1)

60-806 and one of the 1 st social barrier formed by the crossed AND and and Fields. The microparticles, the neutral atoms propagating promolyno from the surface of the cathode 4, fall on chamber 1, since the electric field does not affect them. Apparatus for applying thin films comprising a vacuum chamber and a lid, electrically insulated between themselves and made of non-magnetic materials, an electric arc evaporator placed in a vacuum chamber, and a solenoid placed on the lid, characterized in that, in order to improve the quality of thin films, it is equipped with an additional solenoid installed outside the vacuum chamber coaxially with the solenoid of the electric arc evaporator and connected opposite it, and the vacuum chamber is equipped with an electrically insulated screen Mr set inside an arc in front of the evaporator.