SU324303A1 - METHOD OF ELECTROCHEMICAL DEPOSITION OF L-ARGANESE - Google Patents
METHOD OF ELECTROCHEMICAL DEPOSITION OF L-ARGANESEInfo
- Publication number
- SU324303A1 SU324303A1 SU1266828A SU1266828A SU324303A1 SU 324303 A1 SU324303 A1 SU 324303A1 SU 1266828 A SU1266828 A SU 1266828A SU 1266828 A SU1266828 A SU 1266828A SU 324303 A1 SU324303 A1 SU 324303A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- manganese
- electrolyte
- electrochemical deposition
- arganese
- ammonium
- Prior art date
Links
- 238000000034 method Methods 0.000 title description 5
- 238000004070 electrodeposition Methods 0.000 title description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical group [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 11
- 229910052748 manganese Inorganic materials 0.000 description 7
- 239000011572 manganese Substances 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical class [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229940082569 selenite Drugs 0.000 description 1
- MCAHWIHFGHIESP-UHFFFAOYSA-L selenite(2-) Chemical compound [O-][Se]([O-])=O MCAHWIHFGHIESP-UHFFFAOYSA-L 0.000 description 1
- MCAHWIHFGHIESP-UHFFFAOYSA-N selenous acid Chemical compound O[Se](O)=O MCAHWIHFGHIESP-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Description
Изобретение относитс к области гальванических покрытий, в частности к электрохимическому осаждению марганца.The invention relates to the field of electroplating, in particular to the electrochemical deposition of manganese.
Известен снособ электрохимического осаждени марганца из электролита, содержащего сульфатные соли марганца, аммони , селенистую кислоту. Однако сцепление наносимого покрыти с легкоокисл ющимис металлами вл етс плохим.A known method for electrochemical deposition of manganese from an electrolyte containing sulphate salts of manganese, ammonium, selenous acid. However, adhesion of the applied coating to the light-oxidizing metals is poor.
Предложенный способ отличаетс от известного тем, что дл улучшени сценленн наносимого покрыти с легкоокисл ющимис металлами в электролит ввод т металлический марганец и процесс ведут нри температуре 15-38°С, катодной плотности тока 14- 15 а/дм рН 6-8.The proposed method differs from the well-known fact that, in order to improve the deposited coating with light-oxidizing metals, manganese metal is introduced into the electrolyte and the process is conducted at a temperature of 15-38 ° C, a cathode current density of 14-15 a / dm pH 6-8.
Электролит имеет следующий состав {в г/л):The electrolyte has the following composition {in g / l):
сульфат марганца70-80manganese sulphate70-80
сульфат аммони 10-150ammonium sulfate 10-150
селениста кислота0,,5selenite acid0,, 5
марганец (металлический)0,3-0,5manganese metal 0.3-0.5
Размер кусочков металлического марганца от 0,1 до нескольких миллиметров. Количество металлического марганца должно превышать в 2-3 раза вес выдел емого из электролита марганца и посто нно добавл тьс по мере расходовани . Металлический марганец можно вводить в любой электролит дл осаждени марганца.The size of the pieces of metallic manganese from 0.1 to several millimeters. The amount of manganese metal should be 2-3 times greater than the weight of manganese released from the electrolyte and continuously added as consumed. Manganese metal can be added to any electrolyte to precipitate manganese.
По предложенному способу на издели х из алюмини , берилли получают блест щие, прочно сцепленные покрыти марганцем толщиной 1,8-60 мк.According to the proposed method, on aluminum products, berylliums obtain brilliant, firmly adhered coatings with manganese of 1.8-60 microns thick.
Предмет изобретени Subject invention
Claims (2)
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU324303A1 true SU324303A1 (en) |
Family
ID=
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4159231A (en) | Method of producing a lead dioxide coated cathode | |
| CN109023461A (en) | Form zinc-iron laminated coating of modulation | |
| SU324303A1 (en) | METHOD OF ELECTROCHEMICAL DEPOSITION OF L-ARGANESE | |
| US3793162A (en) | Electrodeposition of ruthenium | |
| US4875984A (en) | Method for manufacturing electrolytically chromated steel sheet | |
| SU324302A1 (en) | METHOD OF ELECTROLYTIC CAMPERATION | |
| SU1177398A1 (en) | Method of chromium-plating in trivalent chromium sulfate-base electrolyte | |
| SU1344817A1 (en) | Method of preparing surface of aluminium and its alloys for applying electroplating | |
| SU985158A1 (en) | Electrolyte for deposition of ni-fe-p a alloy coatings | |
| Bhatgadde et al. | Preparation and optimization of pyrophosphate bath for copper electroplating of microwave components | |
| SU521360A1 (en) | Electrolyte for precipitating gallium-zinc alloys | |
| CN220450333U (en) | Plating layer structure of tin-plated cobalt alloy chromium substitution | |
| CN223458423U (en) | A white copper tin plating structure with polymerized thiocyanate copper plating as base plating layer | |
| SU222105A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF IRON-ALUMINUM ALLOYS | |
| SU316753A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF ALLOYSOLATION | |
| SU1565920A1 (en) | Electrolyte for depositing amorphous-phosphor alloy | |
| SU212687A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF BRILLIANT | |
| UA129281C2 (en) | METHOD OF APPLYING COBALT-VANADIUM ALLOY COATING | |
| SU368345A1 (en) | METHOD OF ELECTRIC SEDIMENTATION OF ZINC-CADMIUM ALLOY | |
| SU357268A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF ALLOYSOLATION | |
| SU1035097A1 (en) | Copper plating electrolyte | |
| SU402585A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF THE ALLOY | |
| SU1006546A1 (en) | Electrolyte for mirror-bright nickel plating | |
| SU333222A1 (en) | METHOD OF ELECTROLYTIC DEPOSITION OF COB.ALT-MOLYBDENE ALLOYS | |
| SU1640210A1 (en) | Electrolyte for nickel plating |