SU1684084A1 - Method of modification of polymer product surface - Google Patents

Abstract

The invention relates to methods for the modification of polymer products operating under conditions of exposure to biochemical active media. The invention makes it possible to appreciate the mushroom resistance of the products. According to the invention, products made of insulating polyvinyl chloride plasticate, insulating varnish fabric based on ethyl cellulose and rubber based on butadiene rubber are exposed to a high-frequency capacitive discharge plasma first with a specific power (0.5-1) 10 W / cm in air at 10 60 Pa, and then with a specific power (0.2-0 5) x W / cm in the medium of fluoroquerine vapor at a partial pressure of 100-500 Pa at each of the stages. 2 tab.

Description

The invention relates to methods for the surface modification of polymer products operating under conditions of exposure to biochemical active media.

The purpose of the invention is to increase mushroom resistance.

Example. In accordance with the proposed method, surface modification of an insulating PVC plastic of the I-40-14 brand, a varnish-cloth insulating material, in which the braid is made of woven cotton fabric with ethylcellulose varnish EC 959 (TU 6-10-691- 74), rubber brand IRP-2043 based on butadiene rubber.

Samples of 10x50x1 mm are fastened in frames-clamps, equipped with a screw, with which they create a given amount of tensile stress in the sample. Then the frames with the samples are placed in the vacuum chamber of the UVN-73PZ installation, in which the capacitive high-frequency (EHF) discharge is generated from the HFD2, 5/13 RF installation. In the vacuum chamber, the samples are processed 5 ± 10 min in the plasma of a glowing EHF discharge in residual air at a pressure of 10–60 Pa and a specific discharge power (0.5–1) –10 W / cm3, and 5–10 min in this case. the vapor environment of fluorocarcosa CPH (CP2) pSPH. where p 7-10 (organofluorine balancing fluid B-1 according to OST 95-419-76), at a pressure of 100-500 Pa and a specific discharge power (0.2-0.5) x W / cm3. After plasma chemical treatment, the fungus resistance of the samples is evaluated.

To assess the fungus resistance of the initial and modified samples, the following types of microscopic fungi found on the products of the equipment under their operating conditions and recommended by GOST 9049-75 are used: Aspergillus flavus, Aspergillus nlger, Aspergillus terrous, Chactomlum globosum, Paccllomyces vaiioti, Penicilllum funicuumumumiumumbosum, Pencillomy funumusum chumomosum vaiioti, Penicillum funiculyusum chumomosum vaiioti, Penicillus nlger, asusumus globosum, Pencillomyces vaiioti, Penicillum funicusumium chromium osmosis, Penicillus nlger.

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About 00

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chrysogenum, Penicilllum cucloplurn, Trlchoderma vlrlde.

The strains of fungi-destroyers of polymeric materials deposited in the collection of cultures of the Academy of Sciences of the USSR are used.

The test of the resistance of polymeric materials to the effects of microscopic fungi is carried out according to the following procedure. A suspension of a mixture of spores of various microorganisms (or a suspension of spores of one type of microorganism) is uniformly applied to the sample surface. The concentration of spores in suspension is (1-2) x 10 6 spores / ml. The samples inoculated with spores are incubated in an atmosphere of tritium water (tritium oxide) with a specific activity of 35-75 Bq / µg. At such levels of activity, tritiated water does not affect the development of the microorganisms used. Test temperature 29 ± 2 ° С, relative humidity of air more than 90%.

Evaluation of the mushroom resistance of polymers (after 84 days of incubation) is carried out as follows:

visually according to the 4-point scale stipulated by GOST 9.048-75, which takes into account the external signs of the development of a fungus colony on the material (see Table 1);

by the amount of biomass on the sample with its micro-growth by microscopic fungi.

Biomass is determined by applying tritium hydroxide in growing mushrooms using the formula

М АТ / 0,85 Е- A- S, where М - biomass, µg / cm2;

AT is the increase in tritium content in the sample, Bq;

E is the counting efficiency of the device;

A - specific activity of tritium water, Bq / µg;

0.85 - the water content in the cells of the fungus;

S is the sample area, cm2.

LTs are determined by the difference between the radioactivity of the experimental and control (non-contaminated with fungal spores) samples.

The specific values of the processing modes and the obtained test results are presented in Table. 2

Claims (1)

Invention Formula The method of modifying the surface of polymeric products, including their plasma-chemical treatment, is distinguished by the fact that, in order to increase the fungus resistance, the products under the action of tensile stress 2-4 MPa are processed in plasma capacitive high-frequency discharge first with a specific power (0.5-1.0) W / cm in an air environment at a pressure of 10-60 Pa, and then with a specific power (0.2-0.5) - W / cm3 in an environment fluorokeroic vapors at their partial pressure of 100–500 Pa for 5–10 min at each stage of treatment. . Score About 1 2 3 4 5 When viewed under a microscope, the growth of mold fungi is not visible. When viewed under a microscope, sprouted spores and slightly developed mycelium in the form of non-branching hyphas are visible. When viewed under a microscope, you can see the mycelium in the form of branching hyphae, sporulation is possible. When viewed with a naked eye, the growth of the fungi is barely visible, but clearly visible under the microscope When viewed with the naked eye, the growth of fungi covering less than 25% of the test surface is clearly visible. When viewed with the naked eye, the growth of fungi covering more than 25% of the test surface is clearly visible. Table 1 Score Rubber IRP-2043 0.7 0.7 . O, 7 0.7 Notify the way 1,3 60 20 (pairs of esters of acrylic acid and fluorinated sprinter) 90 2 (1.5) (L on film, low cleaning About OE Ј. O 03 -C Cracking of the material under the film Low quality modif. layer thirty 30 30 30 5 7 10 0.3 0.3 0.3 0.3 300 300 300 300 2 (0.8) 0 (0) 0 (0) 0 (0) Low degree of cleaning, non-uniform film Low degree of cleaning, poor quality coating about h weak adhesion to top of OSTP Cracking of the modified layer, poor quality coating ocemate O CO-C O with jb With increasing time the biosity does not change Low degree of cleaning, defects on the film (cracking of the modified layer PVC degradation with gaseous compounds, 7 0.7 , 7 thirty 2 (1.5) Low degree of cleaning, non-uniform coating Low degree of cleaning, non-uniform film surface WITH thirty  2 (1.5) Destruction with gaseous components Low degree of cleaning, non-uniform film surface About WITH .S about with l With an increase in time, the biostonicity does not change Poor coating, non-uniform film thirty 2 (1.3) PVC destruction with gaseous components Poor quality coating, kc is sufficiently myomer, weak adhesion to the substrate The fluorocarcino monomer settles on the surface of the material, the porosity resistance does not change Note. Е1г - specific discharge power of the high-frequency generator, W / cm; P, residual pressure in the vacuum chamber, Pa; SG - unstacked voltage, kpa; t, is the sample processing time in the EHF plasma in residual air, min; t is the processing time of the sample in the EHF plasma in the environment of the fluorocarcin vapor. PJ, Pa 6, IPa E „. 1C 0.7 0.7 0.7 0.7 0.7 thirty 30 30 30 thirty 0.1 0.2 0.5 0.7 0.3 300 300 300 300 50 2 / 0.8 0 (0) 0 (0) 3 / 2.0 2 / 0.8 Heterogeneous monomer film, weak adhesion to the surface Lacquer cracking Poor coating, porosity ABOUT oh Ј ABOUT oh Ji 0.7 0.7 0.7 0.7 thirty 30 30 30 0.3 о.з 0.3 0.3 300 300 300 300 7 ten 15 2 / 1.4 0 (0) 0 (0) / 1 / 0.5 The fluorocarcino monomer settles on the surface of the material. Low degree of modification (little monomer) Prolonged exposure of the fluorocarcin vapor material to cracking of the modified layer