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SG81989A1 - Plasma treatment method - Google Patents

Plasma treatment method

Info

Publication number
SG81989A1
SG81989A1 SG9902503A SG1999002503A SG81989A1 SG 81989 A1 SG81989 A1 SG 81989A1 SG 9902503 A SG9902503 A SG 9902503A SG 1999002503 A SG1999002503 A SG 1999002503A SG 81989 A1 SG81989 A1 SG 81989A1
Authority
SG
Singapore
Prior art keywords
treatment method
plasma treatment
plasma
treatment
Prior art date
Application number
SG9902503A
Inventor
Fukiage Noriaki
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to SG9902503A priority Critical patent/SG81989A1/en
Publication of SG81989A1 publication Critical patent/SG81989A1/en

Links

SG9902503A 1999-05-19 1999-05-19 Plasma treatment method SG81989A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SG9902503A SG81989A1 (en) 1999-05-19 1999-05-19 Plasma treatment method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG9902503A SG81989A1 (en) 1999-05-19 1999-05-19 Plasma treatment method

Publications (1)

Publication Number Publication Date
SG81989A1 true SG81989A1 (en) 2001-07-24

Family

ID=20430364

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9902503A SG81989A1 (en) 1999-05-19 1999-05-19 Plasma treatment method

Country Status (1)

Country Link
SG (1) SG81989A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984301A (en) * 1973-08-11 1976-10-05 Nippon Electric Varian, Ltd. Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge
US4134817A (en) * 1977-01-11 1979-01-16 Alsthom-Atlantique Method of attacking a thin film by decomposition of a gas in a plasma
JPS6013065A (en) * 1983-07-01 1985-01-23 Stanley Electric Co Ltd Water repellent treatment method for solid surfaces

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984301A (en) * 1973-08-11 1976-10-05 Nippon Electric Varian, Ltd. Sputter-etching method employing fluorohalogenohydrocarbon etching gas and a planar electrode for a glow discharge
US4134817A (en) * 1977-01-11 1979-01-16 Alsthom-Atlantique Method of attacking a thin film by decomposition of a gas in a plasma
JPS6013065A (en) * 1983-07-01 1985-01-23 Stanley Electric Co Ltd Water repellent treatment method for solid surfaces

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