SG165407A1 - Reticle pod - Google Patents
Reticle podInfo
- Publication number
- SG165407A1 SG165407A1 SG201006861-7A SG2010068617A SG165407A1 SG 165407 A1 SG165407 A1 SG 165407A1 SG 2010068617 A SG2010068617 A SG 2010068617A SG 165407 A1 SG165407 A1 SG 165407A1
- Authority
- SG
- Singapore
- Prior art keywords
- reticle
- wafer
- base
- gap
- protrusions
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/48—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for glass sheets
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- H10P72/10—
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- H10P72/1902—
-
- H10P72/1906—
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- H10P72/1921—
-
- H10P72/1922—
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Packages (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint.Dual containment pod embodiment provides further isolation and protection.
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US72077805P | 2005-09-27 | 2005-09-27 | |
| US72077705P | 2005-09-27 | 2005-09-27 | |
| US72076205P | 2005-09-27 | 2005-09-27 | |
| US77453706P | 2006-02-18 | 2006-02-18 | |
| US77439106P | 2006-02-18 | 2006-02-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG165407A1 true SG165407A1 (en) | 2010-10-28 |
Family
ID=37900391
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG201006861-7A SG165407A1 (en) | 2005-09-27 | 2006-09-27 | Reticle pod |
| SG10201400835QA SG10201400835QA (en) | 2005-09-27 | 2006-09-27 | Reticle Pod |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201400835QA SG10201400835QA (en) | 2005-09-27 | 2006-09-27 | Reticle Pod |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US8231005B2 (en) |
| EP (1) | EP1928764B1 (en) |
| JP (2) | JP5054012B2 (en) |
| KR (3) | KR101532893B1 (en) |
| CN (1) | CN101321674B (en) |
| MY (1) | MY154896A (en) |
| SG (2) | SG165407A1 (en) |
| TW (1) | TWI391304B (en) |
| WO (1) | WO2007038504A2 (en) |
Families Citing this family (91)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101321674B (en) * | 2005-09-27 | 2010-10-13 | 诚实公司 | mask box |
| TWI411563B (en) * | 2009-09-25 | 2013-10-11 | 家登精密工業股份有限公司 | Mask box |
| TWI378887B (en) * | 2009-12-29 | 2012-12-11 | Gudeng Prec Industral Co Ltd | Reticle pod and supporting components therebetween |
| TWI450324B (en) * | 2010-01-25 | 2014-08-21 | 家登精密工業股份有限公司 | Photomask cleaning method for lithography equipment and reticle cleaning system for lithography equipment |
| TWI414464B (en) * | 2011-01-11 | 2013-11-11 | 家登精密工業股份有限公司 | Extreme ultraviolet reticle storage transfer box with fixed structure |
| CN102789132B (en) * | 2011-01-28 | 2014-07-16 | 家登精密工业股份有限公司 | EUV mask storage transport box with fixed structure |
| KR101321873B1 (en) * | 2011-03-31 | 2013-10-25 | 이티알 주식회사 | A swash plate for compressor having friction sheet and a manufacturing method therefor |
| US8888086B2 (en) * | 2011-05-11 | 2014-11-18 | Sematech, Inc. | Apparatus with surface protector to inhibit contamination |
| US9859089B2 (en) | 2011-05-20 | 2018-01-02 | Hermes Microvision Inc. | Method and system for inspecting and grounding an EUV mask |
| US9485846B2 (en) | 2011-05-20 | 2016-11-01 | Hermes Microvision Inc. | Method and system for inspecting an EUV mask |
| US8575573B2 (en) | 2011-05-20 | 2013-11-05 | Hermes Microvision, Inc. | Structure for discharging extreme ultraviolet mask |
| US9669984B2 (en) | 2011-07-22 | 2017-06-06 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method |
| TWI501910B (en) * | 2011-11-17 | 2015-10-01 | 家登精密工業股份有限公司 | Extreme ultraviolet ray storage transfer box with drainage structure |
| US9851643B2 (en) * | 2012-03-27 | 2017-12-26 | Kla-Tencor Corporation | Apparatus and methods for reticle handling in an EUV reticle inspection tool |
| US8777007B2 (en) * | 2012-04-13 | 2014-07-15 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Packaging box for liquid crystal glass |
| USD712364S1 (en) * | 2012-05-09 | 2014-09-02 | Gudeng Precision Industrial Co., Ltd. | EUV pod |
| US9919863B2 (en) | 2012-10-19 | 2018-03-20 | Entegris, Inc. | Reticle pod with cover to baseplate alignment system |
| US8939289B2 (en) * | 2012-12-14 | 2015-01-27 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Packing box for liquid crystal display panel and waterproof structure thereof |
| JP6329252B2 (en) * | 2013-04-26 | 2018-05-23 | インテグリス・インコーポレーテッド | Wafer container, door latch mechanism for wafer container, and method for assembling door latch mechanism |
| JP5888287B2 (en) * | 2013-06-26 | 2016-03-16 | 株式会社ダイフク | Processing equipment |
| KR20150044714A (en) * | 2013-10-17 | 2015-04-27 | 삼성전기주식회사 | Apparatus for receiving substrate |
| TWI548107B (en) * | 2014-08-25 | 2016-09-01 | 財團法人工業技術研究院 | A sealing assembly, apparatus thereof and leak detection method thereof |
| JP6308676B2 (en) * | 2014-12-18 | 2018-04-11 | 信越化学工業株式会社 | Pellicle container for lithography. |
| CA2975806C (en) * | 2015-02-03 | 2024-11-19 | Asml Netherlands B.V. | Mask assembly and associated methods |
| KR101634797B1 (en) * | 2015-03-24 | 2016-07-01 | 주식회사 네오세미텍 | Photo mask transfering system |
| CN104698740B (en) * | 2015-03-31 | 2019-10-25 | 上海华力微电子有限公司 | A kind of mask plate carrying case |
| US10566225B2 (en) | 2015-07-13 | 2020-02-18 | Entegris, Inc. | Substrate container with enhanced containment |
| KR101725263B1 (en) * | 2015-10-16 | 2017-04-10 | (주)상아프론테크 | Support bar and substrate loading cassette having the same |
| WO2017139490A1 (en) * | 2016-02-09 | 2017-08-17 | Entegris, Inc. | Substrate shipper |
| KR102164153B1 (en) * | 2016-04-06 | 2020-10-12 | 엔테그리스, 아이엔씨. | Substrate container with window retention spring |
| JP6493339B2 (en) * | 2016-08-26 | 2019-04-03 | 村田機械株式会社 | Transport container and method for transferring contents |
| CN109690401B (en) * | 2016-08-27 | 2022-08-02 | 恩特格里斯公司 | Light cover cabin with side light cover restraint |
| KR20240063164A (en) * | 2016-09-29 | 2024-05-09 | 다이니폰 인사츠 가부시키가이샤 | Vapor deposition mask package and vapor deposition mask packaging method |
| CN108375872B (en) * | 2017-01-25 | 2022-04-15 | 家登精密工业股份有限公司 | Extreme ultraviolet light mask container |
| TWI634383B (en) | 2017-01-26 | 2018-09-01 | Gudeng Precision Industrial Co., Ltd | Mask box |
| KR102134639B1 (en) * | 2017-08-14 | 2020-07-17 | 구뎅 프리시젼 인더스트리얼 코포레이션 리미티드 | Method and system of measuring air-tightness and container measured thereby |
| US11237477B2 (en) * | 2017-09-29 | 2022-02-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Reticle container |
| TWI690771B (en) * | 2018-01-11 | 2020-04-11 | 家登精密工業股份有限公司 | Reticle pressing unit and euv reticle pod using same |
| US20190333797A1 (en) * | 2018-04-30 | 2019-10-31 | Stek Co., Ltd | Apparatus and method for opening snap-shot cases |
| CN109031893B (en) * | 2018-07-24 | 2020-02-14 | 武汉华星光电技术有限公司 | Mask plate storage area positioning device |
| CN109292280B (en) * | 2018-09-11 | 2021-01-26 | 京东方科技集团股份有限公司 | Cassette for loading film and method of loading film |
| TWI680086B (en) * | 2019-02-25 | 2019-12-21 | 家登精密工業股份有限公司 | Reticle pod and retainer thereof |
| CN109665185B (en) * | 2018-12-17 | 2020-06-16 | 惠州市华星光电技术有限公司 | Packing case of display panel |
| TWI707197B (en) * | 2018-12-27 | 2020-10-11 | 美商微相科技股份有限公司 | Photomask protective film assembly with moisture absorption and its surface treatment method |
| DE102019100951A1 (en) * | 2019-01-15 | 2020-07-16 | Osram Opto Semiconductors Gmbh | Storage device |
| KR101987741B1 (en) * | 2019-01-17 | 2019-06-12 | 피엠씨글로벌 주식회사 | Photo mask keeping box |
| US10775694B1 (en) * | 2019-04-30 | 2020-09-15 | Taiwan Semiconductor Manufacturing Company Ltd. | Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask |
| CN112241104B (en) * | 2019-07-19 | 2025-04-01 | 苏州光舵微纳科技股份有限公司 | A magnetic template cover fixture |
| TWI705522B (en) * | 2019-07-30 | 2020-09-21 | 家登精密工業股份有限公司 | Apparatus for containing a substrate and method of manufacturing the apparatus |
| TWD209928S (en) * | 2019-08-02 | 2021-02-21 | 家登精密工業股份有限公司 | The base of the mask transfer box |
| TWD209117S (en) * | 2019-08-02 | 2021-01-01 | 家登精密工業股份有限公司 | Top cover of reticle transfer box |
| TWD209927S (en) * | 2019-08-02 | 2021-02-21 | 家登精密工業股份有限公司 | Top cover of reticle transfer box |
| TWD209426S (en) * | 2019-08-02 | 2021-01-21 | 家登精密工業股份有限公司 | The base of the mask transfer box |
| US11104496B2 (en) * | 2019-08-16 | 2021-08-31 | Gudeng Precision Industrial Co., Ltd. | Non-sealed reticle storage device |
| EP3705943A1 (en) * | 2019-08-23 | 2020-09-09 | ASML Netherlands B.V. | Pod for housing patterning device |
| US11442370B2 (en) * | 2019-10-16 | 2022-09-13 | Gudeng Precision Industrial Co., Ltd | Reticle retaining system |
| KR20220124693A (en) * | 2019-11-25 | 2022-09-14 | 브룩스 오토메이션 (저머니) 게엠베하 | EUV reticle stocker and how it works |
| EP4579721A3 (en) * | 2019-12-24 | 2025-12-10 | Entegris, Inc. | Reticle pod having retention through baseplate |
| KR102863774B1 (en) * | 2019-12-31 | 2025-09-25 | 엔테그리스, 아이엔씨. | Reticle pod with retention through the reticle compartment wall |
| TWI779505B (en) * | 2020-05-14 | 2022-10-01 | 台灣積體電路製造股份有限公司 | Reticle pod and method for preventing reticle contamination |
| US11703754B2 (en) | 2020-05-14 | 2023-07-18 | Taiwan Semiconductor Manufacturing Company Ltd. | Particle prevention method in reticle pod |
| TWI760062B (en) * | 2020-05-14 | 2022-04-01 | 家登精密工業股份有限公司 | Reticle pod provided with holding pins and method for holding reticle |
| TWI767515B (en) * | 2020-05-14 | 2022-06-11 | 家登精密工業股份有限公司 | Container for accommodating substrate with effective hermetic sealing |
| US20210356858A1 (en) * | 2020-05-14 | 2021-11-18 | Gudeng Precision Industrial Co., Ltd. | Container for accommodating substrate with effective hermetic sealing |
| RU2745297C1 (en) * | 2020-08-05 | 2021-03-23 | Обществом с ограниченной ответственностью "Маппер" | Device for manual alignment of silicon wafers prior to temporary splicing |
| US12087605B2 (en) * | 2020-09-30 | 2024-09-10 | Gudeng Precision Industrial Co., Ltd. | Reticle pod with antistatic capability |
| US11874596B2 (en) * | 2020-09-30 | 2024-01-16 | Gudeng Precision Industrial Co., Ltd | Workpiece container system |
| US20220100106A1 (en) * | 2020-09-30 | 2022-03-31 | Gudeng Precision Industrial Co., Ltd | Workpiece container system |
| DE102020213422A1 (en) | 2020-10-23 | 2021-10-28 | Carl Zeiss Smt Gmbh | STORAGE ELEMENT FOR A RETICLE FOR MICROLITHOGRAPHY |
| WO2022106071A1 (en) * | 2020-11-18 | 2022-05-27 | Brooks Automation (Germany) Gmbh | Euv reticle stocker and method of operating the same |
| CN112830071B (en) * | 2021-01-13 | 2023-09-05 | 湖南康润药业股份有限公司 | Medicine reagent bin of easy transportation |
| US20220357650A1 (en) * | 2021-05-07 | 2022-11-10 | Entegris, Inc. | Metal plating with lubricant |
| CN113173316A (en) * | 2021-05-08 | 2021-07-27 | 安徽荣智联仪表有限公司 | Small-size instrument and meter strorage device of easily fixing |
| EP4356196A4 (en) * | 2021-06-18 | 2025-06-25 | Entegris, Inc. | Bonded layer on extreme ultraviolet plate |
| US12135499B2 (en) | 2021-08-30 | 2024-11-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Reticle enclosure for lithography systems |
| JP2024533399A (en) * | 2021-09-09 | 2024-09-12 | インテグリス・インコーポレーテッド | Reticle pod having latch including ramp surface - Patents.com |
| WO2023086297A1 (en) * | 2021-11-09 | 2023-05-19 | Entegris, Inc. | Reticle pod including motion limiting features and method of assembling same |
| TW202325869A (en) * | 2021-12-20 | 2023-07-01 | 日商大日本印刷股份有限公司 | Vapor deposition cover packing body and vapor deposition cover packing method wherein the vapor deposition cover package includes a receiving part, a first buffer sheet, a cover, and a first fixing part |
| KR20230115108A (en) * | 2022-01-26 | 2023-08-02 | 주식회사 엘지화학 | Separator for an electrochemical device and electrochemical device containing the same |
| CN114334757B (en) * | 2022-03-15 | 2022-05-24 | 广东高景太阳能科技有限公司 | A wafer carrier fixture and carrier device for silicon wafers |
| EP4258330A1 (en) * | 2022-04-08 | 2023-10-11 | Brooks Automation (Germany) GmbH | Stocker pod, method and stocker for storing a semiconductor fabrication article |
| EP4511872A1 (en) | 2022-04-19 | 2025-02-26 | Entegris, Inc. | Reticle container having rotating connector with spring force latching |
| TWI829427B (en) * | 2022-07-19 | 2024-01-11 | 家登精密工業股份有限公司 | Gas filter device and reticlecarrier provided with the same |
| TWI882393B (en) * | 2022-08-17 | 2025-05-01 | 美商恩特葛瑞斯股份有限公司 | Reticle container having plating with reduced edge build |
| TWI851335B (en) * | 2022-10-14 | 2024-08-01 | 家登精密工業股份有限公司 | Container for non-rectangular reticle |
| KR102888617B1 (en) * | 2023-07-05 | 2025-11-20 | 가부시키가이샤 교도 | Photomask case |
| KR102655758B1 (en) * | 2023-07-14 | 2024-04-12 | 이동욱 | Probe card carrier |
| TW202532960A (en) * | 2023-11-08 | 2025-08-16 | 美商恩特葛瑞斯股份有限公司 | Reticle pod with air flow management feature |
| TWI865389B (en) * | 2023-11-29 | 2024-12-01 | 家登精密工業股份有限公司 | Reticle pressing device and reticle box using the same |
| WO2025178777A1 (en) * | 2024-02-22 | 2025-08-28 | Entegris, Inc. | Reticle supports for reducing wear in a reticle container |
| US20250341774A1 (en) * | 2024-05-06 | 2025-11-06 | Entegris, Inc. | Multi-device containers useful with semiconductor processing devices of different dimensions, and related methods |
Family Cites Families (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615006A (en) * | 1969-06-26 | 1971-10-26 | Ibm | Storage container |
| JPS5895812A (en) * | 1981-12-01 | 1983-06-07 | Nippon Kogaku Kk <Nikon> | Cassette of base plate |
| US4776462A (en) * | 1985-09-27 | 1988-10-11 | Canon Kabushiki Kaisha | Container for a sheet-like article |
| JPS63178958A (en) * | 1986-12-27 | 1988-07-23 | キヤノン株式会社 | Dustproof vessel |
| US4842136A (en) * | 1987-02-13 | 1989-06-27 | Canon Kabushiki Kaisha | Dust-proof container having improved construction for holding a reticle therein |
| US5024329A (en) * | 1988-04-22 | 1991-06-18 | Siemens Aktiengesellschaft | Lockable container for transporting and for storing semiconductor wafers |
| JP3089590B2 (en) * | 1991-07-12 | 2000-09-18 | キヤノン株式会社 | Plate-shaped container and lid opening device |
| US5296893A (en) * | 1992-07-31 | 1994-03-22 | Vlsi Technology, Inc. | Box for an optical stepper reticle |
| JP3200776B2 (en) * | 1992-08-06 | 2001-08-20 | 大日本印刷株式会社 | PCB holding case |
| US5320225A (en) * | 1993-04-23 | 1994-06-14 | Hrc Products | Apparatus and method for securely carrying a substrate |
| JPH0758192A (en) * | 1993-08-12 | 1995-03-03 | Nikon Corp | Board storage case |
| US5695068A (en) * | 1994-09-09 | 1997-12-09 | Digital Equipment Corporation | Probe card shipping and handling system |
| US5474177A (en) | 1994-10-14 | 1995-12-12 | Capitol Vial, Inc. | Container for a wafer chip |
| US5593040A (en) * | 1995-12-04 | 1997-01-14 | Delco Electronics Corporation | Rotary clip for solder pallet |
| JP3280305B2 (en) * | 1998-04-13 | 2002-05-13 | 信越半導体株式会社 | Precision substrate transport container |
| JP3556480B2 (en) | 1998-08-17 | 2004-08-18 | 信越ポリマー株式会社 | Precision substrate storage container |
| US6216873B1 (en) * | 1999-03-19 | 2001-04-17 | Asyst Technologies, Inc. | SMIF container including a reticle support structure |
| US6247599B1 (en) * | 2000-01-14 | 2001-06-19 | Taiwan Semiconductor Manufacturing Company, Ltd | Electrostatic discharge-free container equipped with metal shield |
| US6196391B1 (en) * | 2000-01-20 | 2001-03-06 | Taiwan Semiconductor Manufacturing Company, Ltd | Electrostatic discharge-free container for insulating articles |
| US6421113B1 (en) | 2000-02-14 | 2002-07-16 | Advanced Micro Devices, Inc. | Photolithography system including a SMIF pod and reticle library cassette designed for ESD protection |
| JP2003004577A (en) * | 2001-06-19 | 2003-01-08 | Nsk Ltd | Method for correcting unbalance of rotating body and rotating body |
| US6682295B2 (en) * | 2001-06-21 | 2004-01-27 | Novellus Systems, Inc. | Flatted object passive aligner |
| JP2003045773A (en) * | 2001-07-27 | 2003-02-14 | Canon Inc | Storage container for substrate and X-ray exposure apparatus having the storage container |
| US7304720B2 (en) * | 2002-02-22 | 2007-12-04 | Asml Holding N.V. | System for using a two part cover for protecting a reticle |
| US6825916B2 (en) | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
| US6948619B2 (en) * | 2002-07-05 | 2005-09-27 | Taiwan Semiconductor Manufacturing Co., Ltd | Reticle pod and reticle with cut areas |
| JP2004071729A (en) * | 2002-08-05 | 2004-03-04 | Sendai Nikon:Kk | Reticle holding method, reticle holding apparatus, and exposure apparatus |
| US7258520B2 (en) * | 2002-08-31 | 2007-08-21 | Applied Materials, Inc. | Methods and apparatus for using substrate carrier movement to actuate substrate carrier door opening/closing |
| JP2004356478A (en) * | 2003-05-30 | 2004-12-16 | Tdk Corp | Article storage container and lid falling preventing mechanism in the same |
| CN2626922Y (en) * | 2003-05-16 | 2004-07-21 | 朱寿会 | Silicon wafer storage box |
| TWI224719B (en) * | 2003-05-28 | 2004-12-01 | Gudeng Prec Ind Co Ltd | Reinforced structure device of mask frame |
| US6915906B2 (en) | 2003-07-14 | 2005-07-12 | Peak Plastic & Metal Products (International) Limited | Wafer storage container with wafer positioning posts |
| US6862817B1 (en) | 2003-11-12 | 2005-03-08 | Asml Holding N.V. | Method and apparatus for kinematic registration of a reticle |
| US7477358B2 (en) | 2004-09-28 | 2009-01-13 | Nikon Corporation | EUV reticle handling system and method |
| US7309460B2 (en) * | 2004-11-24 | 2007-12-18 | Entegris, Inc. | Photomask container |
| US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
| US7400383B2 (en) * | 2005-04-04 | 2008-07-15 | Entegris, Inc. | Environmental control in a reticle SMIF pod |
| CN101321674B (en) * | 2005-09-27 | 2010-10-13 | 诚实公司 | mask box |
| US7581372B2 (en) * | 2006-08-17 | 2009-09-01 | Microtome Precision, Inc. | High cleanliness article transport system |
| TWI308550B (en) * | 2006-12-29 | 2009-04-11 | Ind Tech Res Inst | A clean container with elastic fixing structure |
| JP5674314B2 (en) * | 2007-02-28 | 2015-02-25 | インテグリス・インコーポレーテッド | Reticle SMIF pod or substrate container and purge method thereof |
-
2006
- 2006-09-27 CN CN2006800441972A patent/CN101321674B/en active Active
- 2006-09-27 EP EP06815463A patent/EP1928764B1/en active Active
- 2006-09-27 JP JP2008533516A patent/JP5054012B2/en active Active
- 2006-09-27 TW TW095135787A patent/TWI391304B/en active
- 2006-09-27 KR KR1020147013210A patent/KR101532893B1/en active Active
- 2006-09-27 KR KR1020087009883A patent/KR101442264B1/en active Active
- 2006-09-27 US US12/088,120 patent/US8231005B2/en active Active
- 2006-09-27 SG SG201006861-7A patent/SG165407A1/en unknown
- 2006-09-27 WO PCT/US2006/037465 patent/WO2007038504A2/en not_active Ceased
- 2006-09-27 MY MYPI20080816A patent/MY154896A/en unknown
- 2006-09-27 KR KR1020137024088A patent/KR101442451B1/en active Active
- 2006-09-27 SG SG10201400835QA patent/SG10201400835QA/en unknown
-
2012
- 2012-05-01 JP JP2012104706A patent/JP5608702B2/en active Active
- 2012-07-30 US US13/562,087 patent/US8613359B2/en active Active
-
2013
- 2013-12-23 US US14/139,653 patent/US9745119B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101321674A (en) | 2008-12-10 |
| KR20080069969A (en) | 2008-07-29 |
| TWI391304B (en) | 2013-04-01 |
| KR20140069364A (en) | 2014-06-09 |
| US20140183076A1 (en) | 2014-07-03 |
| EP1928764A4 (en) | 2010-08-04 |
| US20090301917A1 (en) | 2009-12-10 |
| KR20130108676A (en) | 2013-10-04 |
| KR101442451B1 (en) | 2014-09-22 |
| JP2009510525A (en) | 2009-03-12 |
| SG10201400835QA (en) | 2014-07-30 |
| CN101321674B (en) | 2010-10-13 |
| KR101532893B1 (en) | 2015-07-02 |
| US8613359B2 (en) | 2013-12-24 |
| WO2007038504A2 (en) | 2007-04-05 |
| WO2007038504A3 (en) | 2007-06-28 |
| EP1928764B1 (en) | 2011-11-02 |
| EP1928764A2 (en) | 2008-06-11 |
| US20130020220A1 (en) | 2013-01-24 |
| TW200726706A (en) | 2007-07-16 |
| JP2012177930A (en) | 2012-09-13 |
| MY154896A (en) | 2015-08-14 |
| JP5608702B2 (en) | 2014-10-15 |
| JP5054012B2 (en) | 2012-10-24 |
| KR101442264B1 (en) | 2014-09-22 |
| US8231005B2 (en) | 2012-07-31 |
| US9745119B2 (en) | 2017-08-29 |
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