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SG136903A1 - Materials and methods of forming controlled void - Google Patents

Materials and methods of forming controlled void

Info

Publication number
SG136903A1
SG136903A1 SG200702793-1A SG2007027931A SG136903A1 SG 136903 A1 SG136903 A1 SG 136903A1 SG 2007027931 A SG2007027931 A SG 2007027931A SG 136903 A1 SG136903 A1 SG 136903A1
Authority
SG
Singapore
Prior art keywords
materials
methods
forming controlled
controlled void
void
Prior art date
Application number
SG200702793-1A
Inventor
Raymond Nicholas Vrtis
Ding Jun Wu
Mark Leonard Oaeneill
Mark Daniel Bitner
Jean Louise Vincent
Joseph Karwacki Eugene Jr
Aaron Scott Lukas
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of SG136903A1 publication Critical patent/SG136903A1/en

Links

Classifications

    • H10W20/072—
    • H10W20/46—
SG200702793-1A 2006-04-18 2007-04-13 Materials and methods of forming controlled void SG136903A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79279306P 2006-04-18 2006-04-18
US11693707A 2007-03-29 2007-03-29

Publications (1)

Publication Number Publication Date
SG136903A1 true SG136903A1 (en) 2007-11-29

Family

ID=38805567

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200702793-1A SG136903A1 (en) 2006-04-18 2007-04-13 Materials and methods of forming controlled void

Country Status (1)

Country Link
SG (1) SG136903A1 (en)

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