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SG11201907225RA - Plasma confinement system and methods for use - Google Patents

Plasma confinement system and methods for use

Info

Publication number
SG11201907225RA
SG11201907225RA SG11201907225RA SG11201907225RA SG11201907225RA SG 11201907225R A SG11201907225R A SG 11201907225RA SG 11201907225R A SG11201907225R A SG 11201907225RA SG 11201907225R A SG11201907225R A SG 11201907225RA SG 11201907225R A SG11201907225R A SG 11201907225RA
Authority
SG
Singapore
Prior art keywords
international
inner electrode
seattle
suite
outer electrode
Prior art date
Application number
SG11201907225RA
Inventor
Uri Shumlak
Brian Nelson
Raymond Golingo
Original Assignee
Univ Washington
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Washington filed Critical Univ Washington
Publication of SG11201907225RA publication Critical patent/SG11201907225RA/en

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/05—Thermonuclear fusion reactors with magnetic or electric plasma confinement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H5/00—Direct voltage accelerators; Accelerators using single pulses
    • H05H5/02—Details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic-beam generation, e.g. resonant beam generation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)

Abstract

INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 30 August 2018 (30.08.2018) WIP0 I PCT onion °nolo HE 11E111E11o° lio Elio oimIE (10) International Publication Number WO 2018/156860 Al (51) International Patent Classification: HO5H 1/06 (2006.01) G21B 1/05 (2006.01) HO5H 5/02 (2006.01) (21) International Application Number: PCT/US2018/019364 (22) International Filing Date: 23 February 2018 (23.02.2018) (25) Filing Language: English EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: with international search report (Art. 21(3)) before the expiration of the time limit for amending the claims and to be republished in the event of receipt of amendments (Rule 48.2(h)) (26) Publication Language: English (30) Priority Data: 62/462,779 23 February 2017 (23.02.2017) US (71) Applicant: UNIVERSITY OF WASHINGTON [US/US]; 4545 Roosevelt Way NE, Suite 400, Seattle, WA 98105-4721 (US). (72) Inventors: SHUMLAK, Uri; c/o University of Washing- ton, 4545 Roosevelt Way NE, Suite 400, Seattle, WA 98105-4721 (US). NELSON, Brian, A.; c/o University of Washington, 4545 Roosevelt Way NE, Suite 400, Seattle, WA 98105-4721 (US). GOLINGO, Raymond; c/o Univer- sity of Washington, 4545 Roosevelt Way NE, Suite 400, Seattle, WA 98105-4721 (US). = (74) Agent: KAMLER, Chad, A.; McDonnell Boehnen Hul- bert & Berghoff LLP, 300 South Wacker Drive, Chicago, IL 60606 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, O 00 00 O C (54) Title: PLASMA CONFINEMENT SYSTEM AND METHODS FOR USE (57) : An example method includes directing gas, via one or more first valves, from within an inner electrode to an acceleration region between the inner electrode and an outer electrode that substantially surrounds the inner electrode, directing gas, via two or more second valves, from outside the outer electrode to the acceleration region, and applying, via a power supply, a voltage between the inner electrode and the outer electrode, thereby converting at least a portion of the directed gas into a plasma saving a substantially annular cross section, the plasma flowing axially within the acceleration region toward a first end of the inner electrode and a first end of the outer electrode and, thereafter, establishing a Z-pinch plasma that flows between the first end of the outer electrode and the first end of the inner electrode. Related plasma confinement systems and methods are also disclosed herein.
SG11201907225RA 2017-02-23 2018-02-23 Plasma confinement system and methods for use SG11201907225RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762462779P 2017-02-23 2017-02-23
PCT/US2018/019364 WO2018156860A1 (en) 2017-02-23 2018-02-23 Plasma confinement system and methods for use

Publications (1)

Publication Number Publication Date
SG11201907225RA true SG11201907225RA (en) 2019-09-27

Family

ID=63253078

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201907225RA SG11201907225RA (en) 2017-02-23 2018-02-23 Plasma confinement system and methods for use

Country Status (16)

Country Link
US (3) US11581100B2 (en)
EP (2) EP4152896A1 (en)
JP (3) JP7122760B2 (en)
KR (2) KR102778989B1 (en)
CN (2) CN110326366B (en)
AU (1) AU2018225206A1 (en)
BR (1) BR112019017244A2 (en)
CA (1) CA3053933A1 (en)
DK (1) DK3586575T3 (en)
EA (1) EA201991680A1 (en)
ES (1) ES2953635T3 (en)
FI (1) FI3586575T3 (en)
IL (1) IL268802A (en)
PL (1) PL3586575T3 (en)
SG (1) SG11201907225RA (en)
WO (1) WO2018156860A1 (en)

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Also Published As

Publication number Publication date
CN110326366A (en) 2019-10-11
US11581100B2 (en) 2023-02-14
EA201991680A1 (en) 2020-01-28
US12245351B2 (en) 2025-03-04
JP7122760B2 (en) 2022-08-22
WO2018156860A1 (en) 2018-08-30
CN115460756A (en) 2022-12-09
AU2018225206A1 (en) 2019-09-05
JP2024001305A (en) 2024-01-09
EP3586575A1 (en) 2020-01-01
PL3586575T3 (en) 2023-10-02
BR112019017244A2 (en) 2020-04-14
US20200058411A1 (en) 2020-02-20
KR102778989B1 (en) 2025-03-11
EP3586575A4 (en) 2020-12-02
US20230223158A1 (en) 2023-07-13
JP7384478B2 (en) 2023-11-21
KR20230093551A (en) 2023-06-27
US20240161938A1 (en) 2024-05-16
EP4152896A1 (en) 2023-03-22
DK3586575T3 (en) 2023-09-04
JP2020509539A (en) 2020-03-26
FI3586575T3 (en) 2023-08-23
JP2022160556A (en) 2022-10-19
CA3053933A1 (en) 2018-08-30
IL268802A (en) 2019-10-31
KR20190121814A (en) 2019-10-28
KR102550496B1 (en) 2023-07-03
EP3586575B1 (en) 2023-08-09
ES2953635T3 (en) 2023-11-14
CN110326366B (en) 2022-10-18

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