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SG11201610321UA - Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film - Google Patents

Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film

Info

Publication number
SG11201610321UA
SG11201610321UA SG11201610321UA SG11201610321UA SG11201610321UA SG 11201610321U A SG11201610321U A SG 11201610321UA SG 11201610321U A SG11201610321U A SG 11201610321UA SG 11201610321U A SG11201610321U A SG 11201610321UA SG 11201610321U A SG11201610321U A SG 11201610321UA
Authority
SG
Singapore
Prior art keywords
block copolymer
copolymer film
nanostructured block
styrene
period
Prior art date
Application number
SG11201610321UA
Inventor
Christophe Navarro
Célia Nicolet
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11201610321UA publication Critical patent/SG11201610321UA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/002Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005Spin coating
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02Homopolymers or copolymers of hydrocarbons
    • C08J2325/04Homopolymers or copolymers of styrene
    • C08J2325/08Copolymers of styrene
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2353/00Characterised by the use of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
SG11201610321UA 2014-06-11 2015-06-01 Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film SG11201610321UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1455294A FR3022249B1 (en) 2014-06-11 2014-06-11 METHOD FOR CONTROLLING THE PERIOD OF A NANOSTRUCTUE BLOCK COPOLYMER FILM BASED ON STYRENE AND METHYL METHACRYLATE, AND NANOSTRUCTURE BLOCK COPOLYMER FILM
PCT/FR2015/051430 WO2015189495A1 (en) 2014-06-11 2015-06-01 Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film

Publications (1)

Publication Number Publication Date
SG11201610321UA true SG11201610321UA (en) 2017-01-27

Family

ID=51485681

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201610321UA SG11201610321UA (en) 2014-06-11 2015-06-01 Method for controlling the period of a nanostructured block copolymer film made of styrene and methyl methacrylate, and nanostructured block copolymer film

Country Status (9)

Country Link
US (1) US9976053B2 (en)
EP (1) EP3155028A1 (en)
JP (1) JP6449342B2 (en)
KR (1) KR101922353B1 (en)
CN (1) CN106661171A (en)
FR (1) FR3022249B1 (en)
SG (1) SG11201610321UA (en)
TW (1) TWI567127B (en)
WO (1) WO2015189495A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3029921B1 (en) * 2014-12-16 2018-06-29 Arkema France METHOD FOR CONTROLLING THE SYNTHESIS OF A BLOCK COPOLYMER CONTAINING AT LEAST ONE APOLAR BLOCK AND AT LEAST ONE POLAR BLOCK AND USE OF SUCH A BLOCK COPOLYMER IN DIRECT SELF-ASSEMBLY NANO-LITHOGRAPHY APPLICATIONS
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM
FR3045643A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR ENHANCING THE CRITICAL DIMENSIONAL UNIFORMITY OF ORDINATED BLOCK COPOLYMER FILMS
FR3045642A1 (en) * 2015-12-18 2017-06-23 Arkema France METHOD FOR REDUCING THE STRUCTURING TIME OF ORDINATED BLOCK COPOLYMER FILMS
FR3045644A1 (en) * 2015-12-18 2017-06-23 Arkema France PROCESS FOR OBTAINING THICK ORDERED FILMS AND HIGH PERIODS COMPRISING A BLOCK COPOLYMER
JP2021533214A (en) * 2018-07-29 2021-12-02 イッサム・リサーチ・ディベロップメント・カンパニー・オブ・ザ・ヘブルー・ユニバーシティ・オブ・エルサレム・リミテッド Polymorphic block copolymer film and its preparation process
CN109796567A (en) * 2018-12-30 2019-05-24 复旦大学 A kind of orientation self-assembled block copolymers and its synthesis and application method containing liquid crystal cells
CN115038731A (en) * 2019-12-31 2022-09-09 陶氏环球技术有限责任公司 Barrier coatings for substrates
KR20230119186A (en) * 2020-12-17 2023-08-16 메르크 파텐트 게엠베하 Tunable high chi diblock copolymers made of alternating copolymer segments for directional self-assembly and their applications
JP7506237B1 (en) 2023-09-04 2024-06-25 住友化学株式会社 Composition, polymer, cured product, molded product, and method for producing polymethyl methacrylate

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0757788B2 (en) * 1989-08-22 1995-06-21 旭化成工業株式会社 Block copolymer
FR2679237B1 (en) 1991-07-19 1994-07-22 Atochem PRIMING SYSTEM FOR THE ANIONIC POLYMERIZATION OF (METH) ACRYLIC MONOMERS.
FR2735480B1 (en) 1995-06-15 1997-07-18 Atochem Elf Sa CONTINUOUS ANIONIC POLYMERIZATION PROCESS OF AT LEAST ONE (METH) ACRYLIC MONOMER FOR THE OBTAINING OF POLYMERS WITH A HIGH SOLID RATE
JP4127682B2 (en) * 1999-06-07 2008-07-30 株式会社東芝 Pattern formation method
WO2010072595A1 (en) * 2008-12-23 2010-07-01 Basf Se Phase-separating block copolymers composed of incompatible hard blocks and molding materials with high stiffness
JP2010180353A (en) * 2009-02-06 2010-08-19 Kyoto Univ Preparation of block copolymer
US8398868B2 (en) * 2009-05-19 2013-03-19 International Business Machines Corporation Directed self-assembly of block copolymers using segmented prepatterns
US8304493B2 (en) 2010-08-20 2012-11-06 Micron Technology, Inc. Methods of forming block copolymers
FR2974094A1 (en) 2011-04-15 2012-10-19 Arkema France PROCESS FOR PREPARING SURFACES
WO2013019679A1 (en) 2011-07-29 2013-02-07 Wisconsin Alumni Research Foundation Block copolymer materials for directed assembly of thin films
KR20140064886A (en) * 2011-11-10 2014-05-28 제이엑스 닛코닛세키에너지주식회사 Phase difference film and liquid crystal display device provided with same
US8513356B1 (en) 2012-02-10 2013-08-20 Dow Global Technologies Llc Diblock copolymer blend composition
US9127113B2 (en) * 2012-05-16 2015-09-08 Rohm And Haas Electronic Materials Llc Polystyrene-polyacrylate block copolymers, methods of manufacture thereof and articles comprising the same

Also Published As

Publication number Publication date
WO2015189495A1 (en) 2015-12-17
EP3155028A1 (en) 2017-04-19
US9976053B2 (en) 2018-05-22
TW201609936A (en) 2016-03-16
TWI567127B (en) 2017-01-21
US20170145250A1 (en) 2017-05-25
CN106661171A (en) 2017-05-10
JP2017524760A (en) 2017-08-31
KR20170016482A (en) 2017-02-13
FR3022249B1 (en) 2018-01-19
JP6449342B2 (en) 2019-01-09
KR101922353B1 (en) 2018-11-26
FR3022249A1 (en) 2015-12-18

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