SG10202000680TA - Etchant composition for silicon nitride layer - Google Patents
Etchant composition for silicon nitride layerInfo
- Publication number
- SG10202000680TA SG10202000680TA SG10202000680TA SG10202000680TA SG10202000680TA SG 10202000680T A SG10202000680T A SG 10202000680TA SG 10202000680T A SG10202000680T A SG 10202000680TA SG 10202000680T A SG10202000680T A SG 10202000680TA SG 10202000680T A SG10202000680T A SG 10202000680TA
- Authority
- SG
- Singapore
- Prior art keywords
- silicon nitride
- nitride layer
- etchant composition
- etchant
- composition
- Prior art date
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020190009299A KR102654224B1 (en) | 2019-01-24 | 2019-01-24 | An etchant composition for a silicon nitride layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10202000680TA true SG10202000680TA (en) | 2020-08-28 |
Family
ID=71746266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10202000680TA SG10202000680TA (en) | 2019-01-24 | 2020-01-23 | Etchant composition for silicon nitride layer |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102654224B1 (en) |
| CN (1) | CN111471462B (en) |
| SG (1) | SG10202000680TA (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111961472B (en) * | 2020-08-14 | 2022-06-21 | 上海新阳半导体材料股份有限公司 | High-selectivity silicon nitride etching solution, and preparation method and application thereof |
| KR102786637B1 (en) * | 2021-08-24 | 2025-03-25 | 삼성에스디아이 주식회사 | Etching composition for silicone nitride layer and method for etching silicone nitride layer using the same |
| KR102779496B1 (en) * | 2021-08-25 | 2025-03-10 | 삼성에스디아이 주식회사 | Etching composition for silicon nitride layer and method for etching silicon nitride layer using the same |
| CN115287069B (en) * | 2022-07-06 | 2023-06-09 | 湖北兴福电子材料股份有限公司 | C-free etching solution for inhibiting silicon dioxide etching |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050159011A1 (en) * | 2004-01-21 | 2005-07-21 | Thirumala Vani K. | Selective etching silicon nitride |
| KR101097277B1 (en) * | 2009-10-07 | 2011-12-22 | 솔브레인 주식회사 | A Composition for wet etching |
| JP2012099550A (en) * | 2010-10-29 | 2012-05-24 | Sanyo Chem Ind Ltd | Etchant for silicon nitride |
| US9368647B2 (en) * | 2011-10-18 | 2016-06-14 | Samsung Electronics Co., Ltd. | Compositions for etching |
| KR101782329B1 (en) * | 2011-10-18 | 2017-09-28 | 삼성전자주식회사 | Compositions for etching and methods for forming semiconductor memory devices using the same |
| KR101380487B1 (en) * | 2012-05-09 | 2014-04-01 | 오씨아이 주식회사 | Etching solution for silicon nitride layer |
| KR102365046B1 (en) * | 2012-12-18 | 2022-02-21 | 솔브레인 주식회사 | Composision for etching, method for etching and semiconductor device |
| US10269591B2 (en) * | 2013-10-23 | 2019-04-23 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method of selectively removing silicon nitride and single wafer etching apparatus thereof |
| US9868902B2 (en) * | 2014-07-17 | 2018-01-16 | Soulbrain Co., Ltd. | Composition for etching |
| KR102415960B1 (en) * | 2016-02-05 | 2022-07-01 | 동우 화인켐 주식회사 | Etching solution composition for a silicon nitride layer and method for manufacturing a semiconductor device and a TFT array substrate using the same |
| CN107345137A (en) * | 2016-05-04 | 2017-11-14 | Oci有限公司 | The etching solution of particle appearance can be suppressed |
| KR102079043B1 (en) * | 2016-05-27 | 2020-02-20 | 오씨아이 주식회사 | Etching solution for silicon nitride layer |
| KR102079042B1 (en) * | 2016-07-04 | 2020-02-20 | 오씨아이 주식회사 | Etching solution for silicon substrate |
| KR102079041B1 (en) | 2016-07-04 | 2020-02-20 | 오씨아이 주식회사 | Etching solution for silicon substrate |
| CN107573940A (en) * | 2016-07-04 | 2018-01-12 | Oci有限公司 | Silicon nitride film etching solution |
| US10995269B2 (en) * | 2016-11-24 | 2021-05-04 | Samsung Electronics Co., Ltd. | Etchant composition and method of fabricating integrated circuit device using the same |
| WO2018124705A1 (en) * | 2016-12-26 | 2018-07-05 | 솔브레인 주식회사 | Etching composition, and method for producing semiconductor element by utilizing same |
| KR20180106144A (en) * | 2017-03-17 | 2018-10-01 | 동우 화인켐 주식회사 | Etchant composition for etching nitride layer and methods of forming nitride pattern |
| KR101828437B1 (en) * | 2017-04-06 | 2018-03-29 | 주식회사 디엔에스 | A Composition for Wet Etching to Silicon Nitride |
| KR101769349B1 (en) | 2017-04-06 | 2017-08-18 | (주)제이씨아이 | A Composition for Wet Etching to Silicon Nitride |
| KR102336865B1 (en) * | 2017-07-06 | 2021-12-09 | 오씨아이 주식회사 | Etching compositions and etching method using the same |
| KR101932441B1 (en) * | 2018-03-23 | 2018-12-26 | 주식회사 제우스이엔피 | Etching composition for silicon nitride |
| KR102346832B1 (en) * | 2018-05-23 | 2022-01-03 | 삼성에스디아이 주식회사 | Etching composition for silicon nitride layer and etching process using the same |
-
2019
- 2019-01-24 KR KR1020190009299A patent/KR102654224B1/en active Active
- 2019-12-20 CN CN201911327311.8A patent/CN111471462B/en active Active
-
2020
- 2020-01-23 SG SG10202000680TA patent/SG10202000680TA/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN111471462B (en) | 2022-03-25 |
| KR20200092132A (en) | 2020-08-03 |
| CN111471462A (en) | 2020-07-31 |
| KR102654224B1 (en) | 2024-04-04 |
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