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SE8008768L - Framstellning av finfordelad kiseldioxid med speciellt god fortjockningsformaga - Google Patents

Framstellning av finfordelad kiseldioxid med speciellt god fortjockningsformaga

Info

Publication number
SE8008768L
SE8008768L SE8008768A SE8008768A SE8008768L SE 8008768 L SE8008768 L SE 8008768L SE 8008768 A SE8008768 A SE 8008768A SE 8008768 A SE8008768 A SE 8008768A SE 8008768 L SE8008768 L SE 8008768L
Authority
SE
Sweden
Prior art keywords
silicon dioxide
reaction
preparation
flame
good thickness
Prior art date
Application number
SE8008768A
Other languages
Unknown language ( )
English (en)
Other versions
SE431196B (sv
Inventor
Gosta Lennart Flemmert
Original Assignee
Flemmert Goesta Lennart
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flemmert Goesta Lennart filed Critical Flemmert Goesta Lennart
Priority to SE8008768A priority Critical patent/SE431196B/sv
Priority to CA000391730A priority patent/CA1175637A/en
Priority to EP81850241A priority patent/EP0054530B1/en
Priority to DE8181850241T priority patent/DE3169468D1/de
Priority to JP56199972A priority patent/JPS57140313A/ja
Publication of SE8008768L publication Critical patent/SE8008768L/sv
Publication of SE431196B publication Critical patent/SE431196B/sv
Priority to US06/575,476 priority patent/US4559218A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B7/00—Halogens; Halogen acids
    • C01B7/19—Fluorine; Hydrogen fluoride
    • C01B7/191—Hydrogen fluoride
    • C01B7/193—Preparation from silicon tetrafluoride, fluosilicic acid or fluosilicates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
    • B01J12/005—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out at high temperatures, e.g. by pyrolysis
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C01B33/184—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane by hydrolysis of tetrafluoride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
SE8008768A 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid SE431196B (sv)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE8008768A SE431196B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid
CA000391730A CA1175637A (en) 1980-12-12 1981-12-08 Process and apparatus for preparing finely-divided silicon dioxide having good thixotropic properties
EP81850241A EP0054530B1 (en) 1980-12-12 1981-12-11 Process and apparatus for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties
DE8181850241T DE3169468D1 (en) 1980-12-12 1981-12-11 Process and apparatus for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties
JP56199972A JPS57140313A (en) 1980-12-12 1981-12-11 Manufacture of fine silicon dioxide having highly thickened volume-good thixotropy and apparatus
US06/575,476 US4559218A (en) 1980-12-12 1984-01-30 Process and apparatus for preparing finely-divided silicon dioxide having good thixotropic properties

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8008768A SE431196B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid

Publications (2)

Publication Number Publication Date
SE8008768L true SE8008768L (sv) 1982-06-13
SE431196B SE431196B (sv) 1984-01-23

Family

ID=20342462

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8008768A SE431196B (sv) 1980-12-12 1980-12-12 Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid

Country Status (6)

Country Link
US (1) US4559218A (sv)
EP (1) EP0054530B1 (sv)
JP (1) JPS57140313A (sv)
CA (1) CA1175637A (sv)
DE (1) DE3169468D1 (sv)
SE (1) SE431196B (sv)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801437A (en) * 1985-12-04 1989-01-31 Japan Oxygen Co., Ltd. Process for treating combustible exhaust gases containing silane and the like
GB9410782D0 (en) * 1994-05-28 1994-07-27 British Nuclear Fuels Plc The reaction of gases
DE19511643A1 (de) * 1995-03-30 1996-10-02 Das Duennschicht Anlagen Sys Verfahren und Einrichtung zur Reinigung von schadstoffhaltigen Abgasen durch chemische Umsetzung
US6217840B1 (en) 1995-12-08 2001-04-17 Goldendale Aluminum Company Production of fumed silica
US6193944B1 (en) 1995-12-08 2001-02-27 Goldendale Aluminum Company Method of recovering fumed silica from spent potliner
US6248302B1 (en) 2000-02-04 2001-06-19 Goldendale Aluminum Company Process for treating red mud to recover metal values therefrom
US7022299B2 (en) * 2002-10-15 2006-04-04 National Chung-Hsing University Exfoliative clay and derivative thereof and method for producing the same
DE10340884A1 (de) * 2003-09-04 2005-03-31 Riebel, Ulrich, Prof. Dr.-Ing. Verfahren zur Herstellung von Ruß oder anderen Flammenaerosolen und Vorrichtung zur Durchführung des Verfahrens
DE102004019575A1 (de) * 2004-04-20 2005-11-24 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten
DE102006054156A1 (de) * 2006-11-16 2008-05-21 Wacker Chemie Ag Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität
DE102008054592A1 (de) * 2008-12-12 2010-06-17 Wacker Chemie Ag Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit kleiner Kapazität
CN105110344B (zh) * 2015-08-19 2017-02-01 六盘水师范学院 一种煤矸石制气相二氧化硅的方法与装置
US10112209B2 (en) * 2015-12-11 2018-10-30 VITRO S.A.B. de C.V. Glass drawdown coating system
US11912604B2 (en) * 2019-08-13 2024-02-27 Sterlite Technologies Limited Method for fabrication of glass preform

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2535036A (en) * 1946-09-03 1950-12-26 Cabot Godfrey L Inc Manufacture of finely divided silica
DE974793C (de) * 1952-04-02 1961-04-27 Degussa Verfahren zur Herstellung von feinverteilten Oxyden
US2819151A (en) * 1954-03-02 1958-01-07 Flemmert Gosta Lennart Process for burning silicon fluorides to form silica
BE609721A (fr) * 1960-11-03 1962-02-15 Goesta Lennart Flemmert Méthode de récupération du bioxyde de silicium finement divisé obtenu en faisant réagir en phase gazeuse des composés de silicium et de fluor avec de l'eau
US3233969A (en) * 1961-05-29 1966-02-08 Columbian Carbon Process for producing pigmentary silica
US3361525A (en) * 1961-11-03 1968-01-02 Laporte Titanium Ltd Manufacture of oxides of the elements titanium, zirconium, iron, aluminum and silicon
US3660025A (en) * 1970-07-01 1972-05-02 Cities Service Co Manufacture of pigmentary silica
US3969485A (en) * 1971-10-28 1976-07-13 Flemmert Goesta Lennart Process for converting silicon-and-fluorine-containing waste gases into silicon dioxide and hydrogen fluoride
US4292290A (en) * 1980-04-16 1981-09-29 Cabot Corporation Process for the production of finely-divided metal and metalloid oxides

Also Published As

Publication number Publication date
US4559218A (en) 1985-12-17
CA1175637A (en) 1984-10-09
JPS6117766B2 (sv) 1986-05-09
EP0054530B1 (en) 1985-03-20
DE3169468D1 (en) 1985-04-25
SE431196B (sv) 1984-01-23
JPS57140313A (en) 1982-08-30
EP0054530A1 (en) 1982-06-23

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