SE467477B - Etsat glasfoeremaal och saett att tillverka det - Google Patents
Etsat glasfoeremaal och saett att tillverka detInfo
- Publication number
- SE467477B SE467477B SE8705040A SE8705040A SE467477B SE 467477 B SE467477 B SE 467477B SE 8705040 A SE8705040 A SE 8705040A SE 8705040 A SE8705040 A SE 8705040A SE 467477 B SE467477 B SE 467477B
- Authority
- SE
- Sweden
- Prior art keywords
- glass
- etched
- pattern
- radiation
- less
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000011521 glass Substances 0.000 claims description 135
- 238000005530 etching Methods 0.000 claims description 76
- 230000005855 radiation Effects 0.000 claims description 74
- 239000000463 material Substances 0.000 claims description 69
- 238000000034 method Methods 0.000 claims description 40
- 230000003287 optical effect Effects 0.000 claims description 30
- 239000011347 resin Substances 0.000 claims description 29
- 229920005989 resin Polymers 0.000 claims description 29
- 150000002500 ions Chemical class 0.000 claims description 18
- 239000011253 protective coating Substances 0.000 claims description 17
- -1 fluorine ions Chemical class 0.000 claims description 16
- 239000005341 toughened glass Substances 0.000 claims description 15
- 239000005329 float glass Substances 0.000 claims description 13
- 230000037303 wrinkles Effects 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 10
- 229910052731 fluorine Inorganic materials 0.000 claims description 10
- 230000009471 action Effects 0.000 claims description 9
- 238000013500 data storage Methods 0.000 claims description 9
- 229910001415 sodium ion Inorganic materials 0.000 claims description 9
- 238000005498 polishing Methods 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 238000001228 spectrum Methods 0.000 claims description 5
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 claims description 3
- 239000005338 frosted glass Substances 0.000 claims description 3
- 239000002250 absorbent Substances 0.000 claims description 2
- 230000002745 absorbent Effects 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 229910010272 inorganic material Inorganic materials 0.000 claims description 2
- 239000011147 inorganic material Substances 0.000 claims description 2
- 230000005012 migration Effects 0.000 claims description 2
- 238000013508 migration Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 89
- 239000000758 substrate Substances 0.000 description 33
- 230000008901 benefit Effects 0.000 description 25
- 239000000126 substance Substances 0.000 description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 229910052681 coesite Inorganic materials 0.000 description 10
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 230000001681 protective effect Effects 0.000 description 10
- 229910052682 stishovite Inorganic materials 0.000 description 10
- 229910052905 tridymite Inorganic materials 0.000 description 10
- 239000002344 surface layer Substances 0.000 description 7
- 239000000243 solution Substances 0.000 description 6
- 230000035882 stress Effects 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 4
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 4
- 238000002203 pretreatment Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 3
- 229910004014 SiF4 Inorganic materials 0.000 description 3
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000001976 improved effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 230000003252 repetitive effect Effects 0.000 description 3
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002221 fluorine Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000004571 lime Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 235000011007 phosphoric acid Nutrition 0.000 description 2
- 229910001414 potassium ion Inorganic materials 0.000 description 2
- 235000010333 potassium nitrate Nutrition 0.000 description 2
- 239000004323 potassium nitrate Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000003763 resistance to breakage Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 230000008093 supporting effect Effects 0.000 description 2
- 230000001960 triggered effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 101100004392 Arabidopsis thaliana BHLH147 gene Proteins 0.000 description 1
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 206010047700 Vomiting Diseases 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 210000000941 bile Anatomy 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000000834 fixative Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 244000045947 parasite Species 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000035755 proliferation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
- 230000008673 vomiting Effects 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
- G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
- G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
- G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
- G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing
- G11B11/10582—Record carriers characterised by the selection of the material or by the structure or form
- G11B11/10584—Record carriers characterised by the selection of the material or by the structure or form characterised by the form, e.g. comprising mechanical protection elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/2457—Parallel ribs and/or grooves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24595—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness and varying density
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LU86722A LU86722A1 (fr) | 1986-12-23 | 1986-12-23 | Feuille en matiere vitreuse portant un dessin grave et procede pour graver un dessin sur un substrat en matiere vitreuse |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| SE8705040D0 SE8705040D0 (sv) | 1987-12-17 |
| SE8705040L SE8705040L (sv) | 1988-06-24 |
| SE467477B true SE467477B (sv) | 1992-07-20 |
Family
ID=19730844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE8705040A SE467477B (sv) | 1986-12-23 | 1987-12-17 | Etsat glasfoeremaal och saett att tillverka det |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US4797316A (fr) |
| JP (1) | JPS63170249A (fr) |
| KR (1) | KR880007389A (fr) |
| CN (1) | CN1024182C (fr) |
| AU (1) | AU590187B2 (fr) |
| BE (1) | BE1003081A3 (fr) |
| CA (1) | CA1329507C (fr) |
| CH (1) | CH674201A5 (fr) |
| DE (1) | DE3742374A1 (fr) |
| DK (1) | DK685887A (fr) |
| ES (1) | ES2005764A6 (fr) |
| FR (1) | FR2608589B1 (fr) |
| GB (1) | GB2200595B (fr) |
| IE (1) | IE60072B1 (fr) |
| IT (1) | IT1211588B (fr) |
| LU (1) | LU86722A1 (fr) |
| NL (1) | NL8703054A (fr) |
| SE (1) | SE467477B (fr) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1313792C (fr) * | 1986-02-28 | 1993-02-23 | Junji Hirokane | Methode de fabrication de photomasques et photomasque fabrique selon cette methode |
| US4842633A (en) * | 1987-08-25 | 1989-06-27 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing molds for molding optical glass elements and diffraction gratings |
| JPS6486344A (en) * | 1987-09-29 | 1989-03-31 | Victor Company Of Japan | Information recording carrier and production thereof |
| JPH0770094B2 (ja) * | 1987-12-04 | 1995-07-31 | シャープ株式会社 | ディスク状光記録媒体の製造方法および製造用フォトマスク |
| DE3824889A1 (de) * | 1988-07-22 | 1990-01-25 | Leybold Ag | Optischer aufzeichnungstraeger |
| US5053106A (en) * | 1988-10-12 | 1991-10-01 | Occidental Chemical Corporation | Low friction, wear resistant plastic parts |
| US4909818A (en) * | 1988-11-16 | 1990-03-20 | Jones William F | System and process for making diffractive contact |
| JPH0692263B2 (ja) * | 1989-02-16 | 1994-11-16 | 伊藤忠商事株式会社 | 記録ディスク基板及びその製造方法 |
| US5357991A (en) * | 1989-03-27 | 1994-10-25 | Semitool, Inc. | Gas phase semiconductor processor with liquid phase mixing |
| US5238500A (en) * | 1990-05-15 | 1993-08-24 | Semitool, Inc. | Aqueous hydrofluoric and hydrochloric acid vapor processing of semiconductor wafers |
| FR2654864B1 (fr) * | 1989-11-21 | 1995-08-04 | Digipress Sa | Procede pour la fabrication d'un disque a lecture optique et disques obtenus par ce procede. |
| US6375741B2 (en) * | 1991-03-06 | 2002-04-23 | Timothy J. Reardon | Semiconductor processing spray coating apparatus |
| FR2663439A1 (fr) * | 1990-06-15 | 1991-12-20 | Digipress Sa | Procede pour le traitement et en particulier la gravure d'un substrat et substrat obtenu par ce procede. |
| DE4029099A1 (de) * | 1990-09-13 | 1992-04-09 | Technics Plasma Gmbh | Verfahren zum herstellen von spritzgussmatritzen |
| US5374291A (en) * | 1991-12-10 | 1994-12-20 | Director-General Of Agency Of Industrial Science And Technology | Method of processing photosensitive glass |
| DE4141869B4 (de) * | 1991-12-18 | 2005-11-10 | Director General Of Agency Of Industrial Science And Technology | Verfahren zur Bearbeitung von lichtempfindlichem Glas |
| US5246540A (en) * | 1992-04-01 | 1993-09-21 | Tru Vue, Inc. | Apparatus and method for etching glass |
| SG45390A1 (en) * | 1992-07-09 | 1998-01-16 | Pilkington Plc | Glass substrate for a magnet disc and manufacture thereof |
| US5417799A (en) * | 1993-09-20 | 1995-05-23 | Hughes Aircraft Company | Reactive ion etching of gratings and cross gratings structures |
| GB9400259D0 (en) * | 1994-01-07 | 1994-03-02 | Pilkington Plc | Substrate for a magnetic disc and manufacture thereof |
| US5954911A (en) * | 1995-10-12 | 1999-09-21 | Semitool, Inc. | Semiconductor processing using vapor mixtures |
| US6023318A (en) * | 1996-04-15 | 2000-02-08 | Canon Kabushiki Kaisha | Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device |
| DE19713014C2 (de) * | 1997-03-27 | 1999-01-21 | Heraeus Quarzglas | Bauteil aus Quarzglas für die Verwendung bei der Halbleiterherstellung |
| JPH10320835A (ja) * | 1997-05-19 | 1998-12-04 | Nikon Corp | 光ディスク |
| JP3938253B2 (ja) | 1997-12-26 | 2007-06-27 | 日本板硝子株式会社 | 樹脂正立等倍レンズアレイおよびその製造方法 |
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| US20220009824A1 (en) | 2020-07-09 | 2022-01-13 | Corning Incorporated | Anti-glare substrate for a display article including a textured region with primary surface features and secondary surface features imparting a surface roughness that increases surface scattering |
| EP3955248B1 (fr) | 2020-08-11 | 2025-12-17 | Ceramic Data Solutions GmbH | Enregistrement de données sur un matériau céramique |
| EP4435784A3 (fr) * | 2021-02-12 | 2025-01-08 | Ceramic Data Solutions GmbH | Support de donnees ultra-mince et procede de lecture |
| EP4044182B1 (fr) * | 2021-02-12 | 2025-12-31 | Ceramic Data Solutions GmbH | Support de données ultramince |
| EP4085455A1 (fr) | 2021-03-16 | 2022-11-09 | Ceramic Data Solutions GmbH | Support de données, système et procédé de lecture faisant appel à des techniques de super-résolution |
| CN113087404A (zh) * | 2021-04-07 | 2021-07-09 | 惠州市清洋实业有限公司 | 一种钢化玻璃大r角深度刻蚀液及其刻蚀方法 |
| CN113087405A (zh) * | 2021-04-07 | 2021-07-09 | 惠州市清洋实业有限公司 | 一种钢化玻璃小r角深度刻蚀液及其刻蚀方法 |
| EP4101154B1 (fr) | 2021-04-29 | 2023-06-28 | Ceramic Data Solutions GmbH | Stockage de données hybrides numériques et analogiques |
| PL4092464T3 (pl) | 2021-05-17 | 2025-06-02 | Ceramic Data Solutions GmbH | Szybkie odczytywanie poprzez połączenie szerokokątnego widoku transmisyjnego z odblaskowym widokiem zogniskowanym |
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| US3817730A (en) * | 1969-12-29 | 1974-06-18 | Nippon Electric Co | Method of making optical lines in dielectric body |
| CH589306A5 (fr) * | 1975-06-27 | 1977-06-30 | Bbc Brown Boveri & Cie | |
| US4046619A (en) * | 1976-05-03 | 1977-09-06 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of treating the surface of a glass member |
| US4544443A (en) * | 1983-05-13 | 1985-10-01 | Shap Kabushiki Kaisha | Method for manufacturing an optical memory element |
| JPH0648546B2 (ja) * | 1984-07-14 | 1994-06-22 | 日本ビクター株式会社 | 情報記録担体の製造法 |
| DE3511712C2 (de) * | 1985-03-29 | 1995-09-07 | Polygram Gmbh | Plattenförmiger Informationsträger und Verfahren zu seiner Herstellung |
| JPS62128944A (ja) * | 1985-11-27 | 1987-06-11 | Sharp Corp | 光メモリ素子 |
| JPS62187143A (ja) * | 1986-02-13 | 1987-08-15 | Asahi Glass Co Ltd | ガラスの加工方法 |
-
1986
- 1986-12-23 LU LU86722A patent/LU86722A1/fr unknown
-
1987
- 1987-11-26 IE IE321787A patent/IE60072B1/en not_active IP Right Cessation
- 1987-12-03 AU AU82076/87A patent/AU590187B2/en not_active Ceased
- 1987-12-04 US US07/129,962 patent/US4797316A/en not_active Expired - Fee Related
- 1987-12-10 IT IT8768055A patent/IT1211588B/it active
- 1987-12-11 CA CA000554161A patent/CA1329507C/fr not_active Expired - Fee Related
- 1987-12-14 DE DE19873742374 patent/DE3742374A1/de not_active Withdrawn
- 1987-12-17 NL NL8703054A patent/NL8703054A/nl not_active Application Discontinuation
- 1987-12-17 BE BE8701459A patent/BE1003081A3/fr not_active IP Right Cessation
- 1987-12-17 SE SE8705040A patent/SE467477B/sv not_active IP Right Cessation
- 1987-12-17 KR KR870014627A patent/KR880007389A/ko not_active Ceased
- 1987-12-18 CH CH4961/87A patent/CH674201A5/fr not_active IP Right Cessation
- 1987-12-18 FR FR878717982A patent/FR2608589B1/fr not_active Expired - Lifetime
- 1987-12-22 GB GB8729912A patent/GB2200595B/en not_active Expired - Lifetime
- 1987-12-22 CN CN87108379A patent/CN1024182C/zh not_active Expired - Fee Related
- 1987-12-22 JP JP62325173A patent/JPS63170249A/ja active Pending
- 1987-12-23 ES ES8800191A patent/ES2005764A6/es not_active Expired
- 1987-12-23 DK DK685887A patent/DK685887A/da not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| AU590187B2 (en) | 1989-10-26 |
| CN1024182C (zh) | 1994-04-13 |
| GB2200595B (en) | 1990-10-24 |
| FR2608589A1 (fr) | 1988-06-24 |
| ES2005764A6 (es) | 1989-03-16 |
| NL8703054A (nl) | 1988-07-18 |
| DE3742374A1 (de) | 1988-07-07 |
| CA1329507C (fr) | 1994-05-17 |
| GB8729912D0 (en) | 1988-02-03 |
| SE8705040D0 (sv) | 1987-12-17 |
| SE8705040L (sv) | 1988-06-24 |
| BE1003081A3 (fr) | 1991-11-19 |
| JPS63170249A (ja) | 1988-07-14 |
| AU8207687A (en) | 1988-06-23 |
| IT8768055A0 (it) | 1987-12-10 |
| IE60072B1 (en) | 1994-06-01 |
| KR880007389A (ko) | 1988-08-27 |
| GB2200595A (en) | 1988-08-10 |
| FR2608589B1 (fr) | 1992-06-19 |
| US4797316A (en) | 1989-01-10 |
| CN87108379A (zh) | 1988-07-13 |
| DK685887D0 (da) | 1987-12-23 |
| DK685887A (da) | 1988-06-24 |
| IT1211588B (it) | 1989-11-03 |
| LU86722A1 (fr) | 1988-07-14 |
| CH674201A5 (fr) | 1990-05-15 |
| IE873217L (en) | 1988-06-23 |
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