RU2763388C1 - Multilayer protective optical diffraction-polarization device, a method for manufacturing the specified device, a protected product containing the specified multilayer protective optical diffraction-polarization device - Google Patents

Abstract

FIELD: counterfeit protection.

SUBSTANCE: invention relates to the field of protection against counterfeiting valuable documents and concerns a multilayer protective optical diffraction-polarization device. The protective device contains two information-bearing elements. The first element is made in the form of at least one diffraction grating and/or a relief hologram with the first pictorial distribution of strokes and with the provision of microcracks located along the strokes. The second element is made in the form of at least one relief hologram with the second pictorial distribution of strokes. The second information-bearing element also contains a solid-state optical anisotropic layer based on the LCD material, made with the possibility of providing a picture of the spatial distribution of optical anisotropy while preserving the spatially-pictorial molecular-oriented ordered state of the LCD material, corresponding to the pattern of the distribution of stroke directions in at least one relief hologram of the opaque metallized diffraction region of the second element and at least one diffraction grating and/or relief hologram in the transparent demetallized optically anisotropic region of the first element.

EFFECT: increase in the accuracy of combining the elements of the device and its improved protective properties.

40 cl, 2 dwg

Description

Technical field

The invention relates to the field of protection against counterfeiting and verification of the authenticity of valuable documents, in particular to a multilayer protective optical diffraction-polarization device for protecting valuable documents and to a method for manufacturing the said security device that exhibits diffraction, polarization and diffraction-polarization effects.

State of the art

Initially, diffraction and polarization-interference effects were widely used for advertising, information and entertainment purposes and in visual products, but with the development of technology in the field of technology, they have recently been widely used as security elements or devices to protect against forgery and authenticate valuable documents. , such as securities, banknotes, checks, credit cards and stamps and the like.

Many different technical solutions are known from the prior art that use relief-diffraction and/or polarization structures or holograms as the basic components of a security element.

In particular, from patent RU2480550C1, publ. 04/27/2013, IPC D21H21/48 known combined security element containing a multilayer structure, in the various layers of which visually distinguishable, conjugated images are formed, and one or more images are made in the form of holographic gratings placed in different layers of the multilayer structure, as well as printed images and images obtained by high-precision demetallization or embossing and a method for manufacturing the specified combined security element, including obtaining a multilayer polymer structure, applying lacquer, ink and photoresist masks to this structure using printing technologies and forming conjugated holographic, printed, embossed and etched masks based on masks images, while the application of the named masks and the formation of conjugate images are carried out in one technological cycle using a holographic relief as marks for optical registration, and the areas covered by the masks are located are located inside the areas with a holographic relief, and the distance between the boundaries of the areas sealed with masks and the boundaries of the areas with a holographic relief is 50–100 µm (see Fig. page 5, lines 23-27 of the patent RU 2480550C1).

The disadvantage of the known method of manufacturing this element is the specified limitation in the accuracy of registration of holographic and printed images, which makes it impossible to create complex holographic printed images with an accuracy of registration to each other of less than 50-100 microns, especially in the mass production of such security elements, which affects the quality and accuracy. reproducible security features.

Patent RU 2677967C2, publ. 22.01.2019, IPC B42D25.355 discloses a double-sided protective element having transparent and opaque areas. At the same time, on the one hand, the opaque areas are a metallized layer, while on the other side, the areas located opposite the first ones can be color-changing, changing color when the viewing angle is changed, or covered with photoresistive masks, magnetic pigments, or fluorescent ink. In this case, transparent and opaque areas can be the same in shape and relative position. The method for manufacturing such an element consists in successive demetallization of the first metal layer by means of partial masking with a resistive protective layer and subsequent chemical etching of exposed areas of the metal layer, applying a color-shifting and photoresistive layer on the reverse side of the film, exposing the photoresistive layer from the side of the partially demetallized layer, and subsequent chemical etching.

The disadvantage of the proposed double-sided protective element is the use as a basis for its placement on both sides of a commercially available anisotropic birefringent (BLR) film from the polyethylene terephthalate (PET) class, on both sides of which images are formed in the form of transparent and opaque areas, with a thickness ranging from 10 μm and higher: 1) the presence of DLP worsens the color-shifting protective properties of the layer 4, made, for example, from an LC material, both of the layer 4 itself and the protective properties of the GE as a whole;

2) the high thickness of industrially produced oriented PET films does not allow obtaining images in the form of demetallized and/or holographic areas of micron (less than 5 μm) topological sizes using the printing method for obtaining masks for demetallization of areas.

The closest technical solution to the claimed invention is a protective element with an image and a two-sided holographic effect, disclosed in the patent RU 2 685 791C2, publ. 04/23/2019, IPC B42D25/328, the specified protective element contains the first transparent layer with a holographic surface structure, the first metal layer located on the specified first transparent layer in the form of the first diffraction image, thus forming transparent and opaque areas and a holographic surface structure, the second a layer located on said first metal layer and having a second holographic surface structure, a second layer located on said first metal layer and having a second holographic surface structure, and a second metal layer located on said second layer in the form of a second image, thus forming transparent and opaque areas and a holographic surface structure. At the same time, said transparent areas of the first metal layer and the second metal layer are located so that the transparent and opaque areas of these layers coincide, so that when viewed in transmitted light on one side and when viewed in transmitted light on the other side of the protective element, the image on one side is revealed. and its mirror image on the other side, respectively. The holographic surface structure of the first metal layer is different from the holographic surface structure of the second metal layer, so that the security element exhibits a first holographic effect in opaque areas when viewed from one side in reflected light, and exhibits a second holographic effect in opaque areas different from the first holographic effect when viewed from the other side in reflected light.

In addition, this protective element provides the outermost transparent layer deposited on the protective element, which plays a protective role against mechanical and chemical damage of the resistive mask layer underlying it, deposited on the surface of the relief-structured information-carrying second metal layer, and its part, located in transparent gaps formed by two information-carrying metallized layers provides an ineffective visually visible "protective feature" in the form of its topographic spatial form with an almost invisible holographic effect from a diffraction grating (the function of which does not follow from the description) formed on the surface of the first transparent layer, shown in FIG. one.

Thus, the disadvantage of the closest analogue as a protective element with a transparent image in the form of a transparent light-transmitting stencil and two-sided reflective diffraction images based on holographic effects, claimed in patent RU 2 685 791C2, is the complexity of high-precision topological spatial alignment of at least one picture demetallized transparent area and at least one mirror-reflecting area with pattern holographic gratings placed in pairs on each of the two sides of this element in a single micro-demetallization stencil. In the technology of its manufacture, this combination is carried out in RU 2 685 791C2 using the specified resistive mask in the form of an image that is resistant to demetallization of the layer underlying it. The mask is obtained by local polygraphic printing on one of the sides of the metallized layer during the formation of the first picture metallized layer with a register accuracy of the order of 50-100 μm of both metallized and demetallized areas on this side and further on both sides of the protective element.

In addition, the disadvantage of the proposed technology for manufacturing a protective element using a resistive mask in the form of an image is a possible mismatch between the topologies of the transparent and opaque sections of both information-carrying layers, which degrades the quality of the security features stored in them. Moreover, the main disadvantage of this security element, disclosed in RU 2 685 791C2, is the limited functionality of its functionality only visible to the naked eye protective features, which significantly limits its degree of protection against unauthorized access.

At present, to protect against counterfeiting and as authenticity marks of protected objects, in addition to various means of printing protection, special means of protection and authenticity identification marks are used, which are built into the protected product in the form of a transparent or translucent polymer window bearing one or more security features, such as as different visible images, color-changing effect in transmitted and reflected light, diffraction, holographic and other optical effects. Among security elements with variable optical properties, the most difficult to reproduce are elements containing several security features of different physical nature.

The objective of the claimed invention is to eliminate the shortcomings of the above known technical solutions and to create a new method for manufacturing a protective optical diffraction-polarization device, and a protective device manufactured according to the specified method, which has several degrees of protection against forgery, visible to the naked eye, device-visible and machine-readable features, and at the same time being evidence of the authenticity of the protected object. At the same time, instrumental and especially machine-readable features are based on the active use of computer (digital) technology for the formation of diffraction-grating structures and the electronic-digital (pixel) structure of a reader such as simple household or complex industrial LCD devices, such as smartphones.

The inventors have created a method for manufacturing a multilayer, protective diffractive-polarizing device and a multilayer protective optical diffractive-polarizing device with significantly improved protective properties, which are provided by this manufacturing method, which provides the formation of two information-carrying elements with different diffraction-grating structures exhibiting different diffraction patterns. effects, as well as including an optical anisotropic layer, in which a predetermined picture orientation is provided, which in turn improves the quality of the diffraction, polarization and diffraction-polarization effects of the protective device.

At the same time, the diffraction-lattice structures formed in the information-carrying elements include diffraction gratings and / or holograms on both sides of the proposed multilayer protective device with an almost perfect spatial accuracy of relative positioning up to 5 microns, which is ensured by the unique technology used by the authors of the invention in the manufacture of the specified protective device, as a result of imparting to one of at least two metal layers with diffraction-lattice structures located on it, a property that prevents the effect of its demetallization at their locations and the formation of demetallized transparent areas of the other of at least two metal layers using a layer positive photoresist. At the same time, diffraction-lattice structures perform not only an information-bearing role, but also a purely technological role of a picture orienting layer of the LC material deposited on them.

The essence of the invention

According to the first aspect of the invention, a method is disclosed for manufacturing a multilayer, protective, optical, diffraction-polarizing device, comprising the steps, in which:

1) provide a carrier film;

2) apply a separating layer on one side of the carrier film;

3) evenly apply the first thermoplastic transparent isotropic polymer layer on the separating layer;

4) evenly apply the first metal layer on the specified first thermoplastic transparent isotropic polymer layer;

5) ensure the formation of the first information-carrying element containing at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized region, while:

5a1) by hot stamping, simultaneously, on the surface of the first thermoplastic transparent isotropic polymer layer and the first metal layer, relief microstructuring of the surface of the first thermoplastic transparent isotropic polymer layer with the first metal layer deposited on it is provided with the formation of diffractive structures containing high-depth diffraction-lattice structures and low-depth diffraction-lattice structures, wherein said structures contain at least one diffraction grating and/or at least one relief hologram with a predetermined first pattern distribution of stroke directions, with a predetermined depth and period of strokes in said diffraction gratings and/or relief holograms , while in areas with high-depth diffraction-lattice structures, microcracks are provided, located along the strokes over the entire area occupied by the indicated high-depth diffraction action-lattice structures; at the same time, the sections of the first thermoplastic transparent isotropic polymer layer with the first metal layer deposited on it, occupied by low-depth diffraction-lattice structures, correspond to at least one transparent demetallized area of the first information-carrying element, and the sections of the first thermoplastic transparent isotropic polymer layer with the first metal layer occupied by high-depth diffraction-lattice structures correspond to at least one opaque metallized diffractive region of the first information-bearing element,

5a12) at the same time, the diffraction structures of the first thermoplastic transparent isotropic polymer layer formed at step 5a1) completely repeat the diffraction structures of the first metal layer;

5a2) a layer of a liquid composition with chemically active additives is applied on the first metal layer with embossed diffractive structures to ensure the process of diffusion of the specified liquid composition through microcracks in the areas of the first thermoplastic transparent isotropic polymer layer with high-depth diffraction-lattice structures, providing in these areas intermolecularly cross-linked three-dimensional structure and ensuring resistance to demetallization of the sections of the first metal layer with embossed high-depth diffraction-lattice structures;

5a3) provide etching of the first metal layer to ensure demetallization in areas located in the region of the first thermoplastic transparent isotropic polymer layer, in which low-depth diffraction-lattice structures are formed;

5a4) provide processing of the first metal layer with areas with high-depth diffraction-lattice structures and with areas of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures, demetallized in step 5a3) to provide an insoluble single three-dimensional network structure in demetallized areas c at least one low-depth diffraction-lattice structure,

6) uniformly apply the second thermoplastic layer to the entire area of the first metal layer, and to the entire area of the protective device;

7) uniformly applied to the second thermoplastic transparent isotropic polymer layer of the second metal layer;

8) ensure the formation of a second information-carrying element containing at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized region, while:

8a) by hot stamping, simultaneously, on the surface of the second thermoplastic transparent isotropic polymer layer and the second metal layer, relief microstructuring of the surface of the second thermoplastic transparent isotropic polymer layer is provided with a second metal layer deposited on it in the form of diffractive structures, which are high-depth diffraction-lattice structures, and containing at least one relief hologram with a predetermined second picture distribution of stroke directions, with a predetermined depth and period of strokes in the specified relief holograms, while the areas not occupied by the specified diffractive structures correspond to the transparent demetallized area of the second information-carrying element;

8a1) while formed in step 8a) at least one relief hologram of the second thermoplastic transparent isotropic polymer layer completely repeats at least one relief hologram of the second metal layer;

8a2), the design of at least one diffraction grating and/or relief hologram with a predetermined first pattern distribution of stroke directions, depth and stroke periods in said diffraction gratings and/or relief holograms of the first information-bearing element differs from the design of at least one a relief hologram with a predetermined second pattern distribution of stroke directions, stroke depths and stroke periods in said relief hologram of the second information-bearing element.

9) apply a layer of positive photoresist evenly on the second metal layer and over the entire area of the protective device;

10) uniformly exposing the layer of positive photoresist deposited on the second metal layer with UV radiation directed from the side of the first metal layer through the demetallized areas of the said first metal layer, functioning as a transparent photomask;

11) remove the exposed areas of the positive photoresist layer in the areas of the second metal layer corresponding to the demetallized areas of the first metal layer through which the UV exposure was carried out;

12) demetallize the second metal layer on the remote exposed areas of the positive photoresist layer, with the formation of demetallized transparent areas;

13) removing the second thermoplastic polymer layer in the demetallized areas of the second metal layer;

14) over the second metal layer and the surface of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures, demetallized in step 5a3), a layer of surfactant is applied;

15) applying a layer of LC material in an isotropic state on a layer of surfactant on the entire surface of the second metal layer and the surface of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures;

15a) the layer of LC material deposited on the surfactant layer is transferred from the isotropic to the mesamorphic state, while the surfactant layer is designed so as to provide in the LC layer of the material in the mesomorphic state a predetermined pattern of the spatial distribution of the directions of the optical anisotropy axis, corresponding to a predetermined distribution pattern of stroke directions in said diffractive structures containing at least one relief hologram in the second metal layer and demetallized in step 5a3) area of the first thermoplastic transparent isotropic polymer layer;

15b) the LC material layer is cured with its transfer to a solid-state amorphous state, ensuring the formation of a solid-state optical anisotropic layer of a predetermined pattern of the spatial distribution of optical anisotropy while maintaining the spatial-picture molecularly oriented ordered state of the LC material;

16) apply a lacquer coating over the cured layer of the LC material in an anisotropic state and over the entire surface of the optical protective device.

In this case, the carrier film is made of polyethylene terephthalate (PET) or polypropylene (PP).

The separating layer is made from synthetic wax compositions or from an adhesive composition.

In the method, the application of the first thermoplastic transparent isotropic polymer layer on the separating layer is carried out by a printing method, which is one of: a gravure offset method or a flexographic printing method.

In this case, the first thermoplastic transparent isotropic polymer layer is made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, arylacrylate or acrylate, phenol-formaldehyde resin or combinations thereof.

And the first metal layer is made of at least one of: aluminum, copper, brass, bronze, steel, zinc, tin, or their alloys and has an optical transmission of 10% in the UV region of the spectrum.

In the method, the removal in step 13) of the second thermoplastic polymer layer in the demetallized areas of the second metal layer is performed by applying an acrylic solvent thereon.

At the same time, the curing of the LC material layer at step 15b) with its transfer to a solid-state amorphous state is performed with the provision of a predetermined pattern of the spatial distribution of optical anisotropy, which is a predetermined pattern of the spatial distribution of birefringence.

According to the first aspect of the invention, the depth of grooves in high-depth grating structures is from 100 to 500 nm, and the depth of grooves in low-depth grating structures is from 5 to 20 nm.

At the same time, the diffractive structures formed at the stage of the first relief microstructuring of the first thermoplastic transparent isotropic polymer layer form pictures with different designs, depending on the requirements of the manufacturer.

At the same time, the layer of liquid composition with chemically active additives deposited on the first metal layer in step 5.a2) is a liquid composition based on photoinitiators of radical polymerization of the type 2,2-dimethoxy-2-phenylacetophenone (Irgacure-651) with chemically active additives in the form of active diluents such as isobornyl acrylate.

In addition, the layer of liquid composition with chemically active additives applied to the first metal layer in step 5.a2) is a liquid composition based on photoinitiators containing a benzoyl group with substituents with a radical cationic curing mechanism, containing tanning agents, such as benzophenone and its alkyl derivatives.

In the method, in step 5.a3), etching is carried out by placing the carrier film with the first thermoplastic transparent isotropic polymer layer and the first metal layer applied into a solvent based on acetic and nitric acids.

And the second thermoplastic transparent isotropic polymer layer is made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, aryl acrylate, acrylate, phenol-formaldehyde resin and it has a thickness of about 1.5 microns.

In this case, the second metal layer is made of at least one of: aluminum, copper, brass, bronze, steel, zinc, tin, precious metals or their alloys and has a thickness of about 20 nm.

In the method, at the stage of performing relief microstructuring of the second thermoplastic transparent isotropic polymer layer, the formed relief holograms are holograms with non-positioned patterns, such as wallpaper holograms.

At the same time, at the stage of performing relief microstructuring of the second thermoplastic transparent isotropic polymer layer, the formed relief holograms have a predetermined picture angular and spatial distribution of strokes, and a predetermined pattern value of the spatial frequency of strokes in the area of location of holographic images and formed at the stage of relief microstructuring of the second thermoplastic transparent isotropic polymer layer, relief holograms are wallpaper holograms with a non-positional pattern and form pictures with different designs, depending on the manufacturer's requirements.

At the same time, in the method, the step of relief microstructuring of the surface of the first thermoplastic transparent isotropic polymer layer at step 5a1) is provided by means of a nickel matrix-hologram with the first predetermined relief structuring of the surface and the step of relief microstructuring of the surface of the second thermoplastic transparent isotropic polymer layer at step 6a1) by means of a nickel matrix holograms with a second predetermined relief structuring of the surface, wherein the relief structuring of the surface of the first thermoplastic transparent isotropic polymer layer differs from the second structuring of the surface of the second thermoplastic transparent isotropic polymer layer.

At the same time, the step of applying a positive photoresist layer to the second metal layer is carried out by a printing method, which is a gravure printing method, letterpress offset printing method, or a flexographic printing method.

And the step of removing the exposed areas of the positive photoresist layer on the specified areas of the second metal layer is carried out by washing off the specified exposed areas of the photoresist layer with an alkaline developer based on an aqueous solution of tetramethylammonium hydroxide or trimethyl (2-hydroxyethyl) ammonium hydroxide with a fluorine-containing surfactant,

In this case, the surfactant layer is made of materials based on silicon oxides, metal oxides or mixtures and combinations thereof, selected from the group consisting of oxides SiO, SiO ₂ , Al ₂ O ₃ , TiO ₂ , GeO ₂ , ZnO ₂ , in including their mixtures and combinations or ZnS, as well as from organic photoanisotropic materials, for example, azo dye Mordant Clear Yellow.

At the same time, the surfactant layer additionally contains in its composition at least one organic substance from the class of surfactants.

And the application of a layer of surfactant on the second metal layer is carried out by casting or thermal spraying.

In this case, the layer of the LC material is a lyotropic LC material (LLCM) or a thermotropic LC material (TLCM).

In addition, in the method, the transfer of a layer of LC material deposited on a layer of a surfactant, which is a thermotropic LC material (TLCM), from an isotropic state to a mesomorphic state is carried out by lowering the temperature of TLCM to a phase transition.

At the same time, the transfer of the LC material layer deposited on the surfactant layer, which is a thermotropic LC material (TLCM) or lyotropic LC material (LLCM), from an isotropic state to a mesomorphic state, is carried out by complete or partial evaporation of the solvent from the LC material layer, which is preliminarily added to the specified layer of the LC material.

According to the second aspect of the invention, a multilayer protective optical diffraction-polarization device is claimed, comprising:

carrier film, and sequentially deposited on each other: the first thermoplastic transparent isotropic polymer layer, the first metal layer, the second thermoplastic transparent isotropic polymer layer, the second metal layer, a solid-state optical anisotropic layer based on LC material, and a varnish coating located on top of the entire surfaces of the optical protective device;

when these elements are made in such a way that the formation of at least two information-carrying elements is ensured;

wherein the first information-carrying element contains at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region, and is made in the form of at least one diffractive structure containing high-depth and low-depth diffraction-grating structure, and formed in the first thermoplastic transparent isotropic polymer layer and the second metal layer, respectively,

wherein said at least one diffraction structure is made in the form of at least one diffraction grating and/or at least one relief hologram with a predetermined first picture distribution of stroke directions, depth and periods of strokes in said diffraction gratings and/or relief holograms, and with the provision of microcracks in areas with high-depth diffraction-lattice structures, which are located along the strokes over the entire area occupied by areas with high-depth diffraction-lattice structures;

- the second information-carrying element contains at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region, and is made in the form of at least one diffractive structure, which is a high-depth diffraction-lattice structure, and formed on the second thermoplastic transparent isotropic polymer layer and the second metal layer, respectively, and also contains a solid-state optical anisotropic layer based on an LC material deposited over the entire surface of the second metal layer, while said at least one diffractive structure is made in the form of at least one embossed hologram with a predetermined second pattern distribution of stroke directions, depth and stroke periods in said relief holograms,

wherein the design of at least one diffraction grating and/or relief hologram of the first information carrier element differs from the design of at least one relief hologram of the second information carrier element,

at the same time, the solid-state optical anisotropic layer based on the LC material is configured to provide a predetermined pattern of spatial distribution of optical anisotropy while maintaining a spatially patterned molecularly oriented ordered state of the LC material corresponding to a predetermined pattern of distribution of stroke directions in the specified, at least one opaque relief hologram a metallized diffractive region of the second information carrier element, and at least one diffraction grating and/or relief hologram in a transparent demetallized diffractive optically anisotropic region of the first information carrier element;

wherein the first and second information-bearing elements are made in such a way that at least one diffractive feature is formed in at least one opaque metallized diffractive region of the first information-bearing element; at least one polarization feature in at least one transparent demetallized optically anisotropic region of the second information-carrying element of at least one diffractive-polarization feature in at least one opaque metallized diffractive region of the second information-carrying element.

In the specified security device, the opaque metallized diffractive regions of the first and second information-carrying elements are designed in such a way that the formation of a single holographic image and/or subject-independent and/or mutually dependent holographic images on each side of the multilayer protective optical diffraction-polarization device is ensured.

At the same time, said opaque metallized diffractive regions are mirrored on each side of the optical protective device and have one geometric shape in one location.

In addition, diffractive structures made on the surface of the first thermoplastic transparent isotropic polymer layer and the first metal layer in this way. that the spatial pictorial orientation of the strokes in these diffractive structures is made in such a way that the formation of different in shape and physical size sets of structures on an opaque metallized diffractive region on each side of the protective device is provided, which are sets or combinations of letters, numbers, fonts, two-dimensional barcodes that form at least one hidden security feature.

In the multilayer protective optical diffraction-polarization device, the depth of grooves in high-depth diffraction-grating structures is from 100 to 500 nm, and the depth of grooves in low-depth diffraction-grating structures is from 5 to 20 nm.

According to an additional aspect of the invention, a secure article is provided, comprising a multilayer, protective, optical, diffraction-polarizing device applied or embedded in it, which can be used as a transparent window in at least a part of the secure article and represent

valuable documents, including securities, banknotes, checks, credit cards, stamps.

According to yet another aspect of the invention, a value document is claimed comprising a multilayer, security, optical, diffraction-polarization device used as a transparent window in at least a portion of the value document.

The document of value may be securities, banknotes, checks, credit cards, stamps.

Description of drawings

The features, elements and advantages of the invention emerge from the following description of an embodiment of the invention with reference to the accompanying drawings, which show:

Fig.1 is a schematic top view on one side of a protected product with a multilayer protective optical diffraction-polarization device placed on it;

Fig.2 is a schematic view of the structure in cross section along the line A-A of a multilayer, protective optical diffraction-polarization device according to Fig.1, which is a bilaterally demetallized light-transmitting anisotropic section A-A, placed between two metallized diffraction-lattice fragments of a multilayer protective optical diffraction-polarization device according to the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENT

INVENTIONS

All documents mentioned in this application are an integral part of the description of the application, i.e. their disclosures are incorporated herein by reference in their entirety.

References to elements in the singular should be understood to include elements in the plural and vice versa, unless otherwise expressly stated or clear from the context.

In this application, the statement of the limits of values is not intended to be limiting, but is intended to apply individually to any and all values falling within the limits, unless otherwise indicated in this application, and each individual value within such limits is included in the description of the invention as if it were individually given in this application.

The use of specific compositions of compositions of materials used in the manufacture of structural elements that are part of the claimed invention is not limited to the examples presented, but allows the use of any other compositions with similar properties known to specialists in this field of technology.

The words "about", "approximately", or the like, when numerical, will be understood by one of ordinary skill in the art to indicate the variation that provides satisfactory performance in the intended application. Similarly, words referring to an approximate value, such as "approximately" or "substantially", when used in relation to physical characteristics, a person skilled in the art should be understood as expressing the limits of variation under which satisfactory operation is provided in the case of appropriate use, operation. , intended purpose or something similar.

Limits of values and/or numerical values are given in this application for example only and do not impose restrictions on the scope of the described embodiments. When ranges of values are given, they are intended to include each value within the range as if it were presented individually, unless otherwise noted. The use of any or all of the examples, or an introductory word before an example ("for example", "such as" or the like), provided in this application is only intended to better illuminate the embodiments and is not a limitation on the scope of the embodiments. No wording in the description should be construed as showing any unclaimed element to be essential in the practice of the embodiments.

In the present description, the terms "hologram", "diffraction grating" or "picture diffraction grating structure", diffraction grating structure, are used as two equivalent synonyms, and the terms "polarization structure" or "picture polarization structure" are used as two equivalent synonym.

The inventors have created a method for manufacturing a multilayer protective diffractive-polarizing device and a multilayer protective optical diffractive-polarizing device that has several degrees of protection against forgery and simultaneously provides diffraction, polarization and diffraction-polarization effects visible to the naked eye, visible with instrument-visible or machine-readable media, such as consumer or industrial LCD readers, such as smartphones, tablets, and the like.

The specified diffraction, polarization and diffraction-polarization effects provided by the claimed protective device are achieved by a set of technological methods implemented in the manufacture of a multilayer protective diffraction-polarization device, the features of which must be dwelled on for a more accurate understanding of the processes implemented in the claimed method, which are provided completely a new level of anti-counterfeit protection.

The inventors of the invention to eliminate the shortcomings of the technical solutions known from the prior art, in which during the manufacturing process the high-precision topological spatial alignment of the demetallized transparent or partially light-transmitting area and the mirror-reflecting area with diffractive structures is not sufficiently ensured, which degrades the quality of the security features stored in them, used a high-precision demetallization (HPMO) method with a spatial resolution of 5 µm to obtain a high-precision copy of the demetallized area of one of the optical elements of the security device used the metallized holographic area of another optical element of the security device as a photocopying mask, which ensures compatibility of boundaries between "metallized - demetallized" areas of the order of 1-2 microns.

Thus, in order to increase the spatial accuracy of combining both two metallized, and metallized and demetallized information-carrying structures, the inventors used the stage of high-precision microdemetallization of one (first) information-carrying element and its subsequent technological application as a photocopying mask when forming another ( second) information-carrying element in the implementation of mass production of a multilayer protective optical diffraction-polarization device according to the invention.

This decision made it possible to exclude a polygraphic mask from the manufacturing process of the protective device, which significantly increased the accuracy of registration between metallized and demetallized information-bearing structures (elements) on both sides of the protective device, which amounted to about 1-2 microns, compared with the prior art ( EN 2 685 791C2), where the registration of both metallized and demetallized areas of the protective element of the order of 50-100 microns is provided.

In addition, the authors of the invention, in addition to the above aspects of the invention, instead of a purely technological application of an isotropic transparent polymer varnish applied to the metallized diffraction-lattice surface of the second information-carrying element by the method of picture printing to demetallize certain sections of it, the authors proposed to use a transparent polymer layer solid-state amorphous molecularly ordered transparent or translucent anisotropic layer, made with the ability (mainly from substances that exhibit in certain solvents or in a certain temperature range, to show mesomorphic (liquid crystal) lyotropic or thermotropic properties.

The introduction of such an element significantly increases the number of security features in the proposed security device, due to the use of image-oriented, solid-state optically anisotropic layers based on transparent liquid crystal materials with at least absorbing and/or luminescent anisotropic substances dissolved in them. These image optically oriented layers are formed as part of at least a part of the spatially demetallized or metallized areas of the security device.

The use of optically anisotropic LC materials on the surface of the diffraction-grating metallized and/or in demetallized areas of the protective device further enhances the protective features of this device by visualizing them using additional, for example, non-polarized or polarized sources of UV radiation, and/or the simplest polarizing devices such as polarizing glasses , or household appliances with a polarized glow such as smartphones with an LCD screen.

Further, the authors consider it necessary to present some features of the processes occurring in the manufacture of the claimed protective device for a more detailed disclosure of the advantages of the method for manufacturing the protective device proposed by the authors of the present invention.

In the manufacture of a protective device using the method of high-precision microdemetallization with a spatial resolution of 5 μm, polymer materials based on linear macromolecules with functional active groups in the main or side chain, initially soluble in certain solvents. Such polymers can be polyurethane acrylates, epoxy acrylates, acrylacrylates, polyester acrylates, polyamides, phenol-formaldehyde, melamine-formaldehyde resins, etc.

However, they lose this property as a result of the formation of a single three-dimensional network structure when interacting, as a rule, with external chemically active substances that exhibit various physicochemical reactions such as three-dimensional condensation or, for example, physical exposure such as UV radiation, which forms free radicals inside macromolecules, leading to to the formation of cross-links and the formation of a network structure.

According to the claimed invention, such high-precision microdemetallization in space with a resolution of about 5 μm appears possible due to the fact that in the process of hot stamping of diffraction-lattice structures in a thermoplastic layer with an initial metal layer of uniform thickness deposited on it, the latter locally changes its thickness in correspondence with a periodic high-depth microrelief due to the occurrence of mechanical stresses in it.

The authors of the invention found that under certain modes of hot stamping (time, temperature and mechanical pressure) and the composition of the material of the metal layer in the embossed areas of this layer, nano- and microcracks are formed, located along the strokes over the entire area occupied by high-depth picture diffraction gratings of the protective element up to their geometric boundary of the order of several microns, depending on the grating period in the boundary region. The authors conducted research and identified the modes of the hot stamping process for the formation of microcracks in the metal layer, which consists in using a nickel matrix (matrix-hologram) at a stamping temperature in the range of 90-130°C and a pressure in the range of 3.5-4.5 kg /cm ² .

When applied to such an embossed hologram with microcracks, a layer of a liquid composition with chemically active additives through these microcracks, they diffuse into the volume of the polymeric relief carrier layer.

This ensures the insolubility of not only the cross-linked polymer layer with a holographic high-depth microrelief, but also the resistance to chemical etching of the metal layer itself, stitched by the cross-linked polymer layer located under it. This is due to the mutual penetration of cross-linked polymer structures into the metal layer. In this case, the boundary region between the metallized and demetallized areas is about 5 μm.

At the same time, in the mirror-reflecting areas of the metal layer with low-depth gratings, microcracks do not form under the embossing modes used, and there is no such penetration of crosslinking agent molecules, which makes it possible to carry out high-precision microdemetallization of these areas with subsequent removal, if necessary, of the thermoplastic transparent layer using a solvent. .

All this makes it possible to obtain protective elements with a resolution of spatial alignment above 5 μm, i.e. equal to or less than 5 µm.

As mentioned above, in the proposed application, in order to obtain a high-precision copy of the demetallized area of one of the optical elements of the security device, it is proposed to use photolithographic technology using the metallized holographic area of another optical element of the security device as a photocopying mask.

At the same time, since there is practically no gap between them (as in conventional photolithographic technology, it does not exceed 1-2 μm), which ensures the compatibility of the boundaries between the "metallized - demetallized" regions of the order of 1-2 μm and significantly improves the accuracy of the formed diffraction, polarization and diffraction - polarization features on both sides of the protective device.

A description of the optical security device will now be presented with reference to FIG. 1 and 2.

Figure 1 shows a schematic top view from one, for example the first, side of a multilayer double-sided security product, for example a document of value 10 in the form of a banknote, bank or credit card, payment document, or other official or unofficial document, etc., which has a carrier film 11 and a multilayer, protective optical diffraction-polarizing device 12 placed in a transparent section 13 of the carrier film 11 of a valuable document 10. protective device 12.

At the same time, the multilayer protective optical diffraction-polarizing device 12 includes at least two information-carrying optical elements located on each side of the optical protective device 12, while the first information-carrying element is at least one opaque metallized diffractive area 14 ₁ and at least one transparent and/or partially light-transmitting demetallized optically anisotropic area 15 ₁ . The second information-carrying element is at least one opaque metallized diffractive region 14 ₂ and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region 15 _2, the same topology as the region 15 ₁ . At the same time, the opaque metallized diffractive regions 14 ₁ , 14 _{2 are} made in such a way that the formation of a single holographic image and/or subject-independent and/or mutually dependent holographic images on each side of the multilayer protective optical diffraction-polarizing device 12 is ensured.

At the same time, said opaque metallized diffraction regions 14 ₁ , 14 ₂ are mirrored on each side of the optical protective device 12 and have one geometric shape at one location. Each of the two opaque metallized diffraction regions 14 ₁ , 14 ₂ is a high-depth relief-structured multilayer structure consisting of relief-structured thermoplastic transparent isotropic polymer layers with a thickness of 0.7 to 1 μm, with a corresponding metal layer deposited on each of them with identical relief-structured topology. At the same time, thermoplastic transparent isotropic polymer layers are made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, aryl acrylate or acrylate, phenol-formaldehyde resin, or combinations thereof.

And the metal layers are made from at least one of: aluminum, copper, brass, bronze, steel, zinc, tin, or their alloys. In this case, the thickness of these layers can be in the range from 10-20 nm. In this case, the composition and thickness of these metal layers is chosen in such a way that each of the metal layers provides optical transmission of 10% in the UV region of the spectrum.

The surfaces of the opaque metal diffraction regions 14 ₁ , 14 _{2 are} made relief-structured. At the same time, the opaque metal diffraction regions 14 _{1 are} structured in the form of a set of high-depth diffraction-lattice structures containing at least one diffraction grating and/or at least one relief hologram with a predetermined first picture distribution of stroke directions, depth and periods of strokes of the indicated diffraction gratings and/or relief holograms and providing microcracks located along the strokes over the entire area occupied by said diffraction gratings and/or relief holograms.

These diffraction structures can have a picture angular and spatial distribution of strokes in the range from 0 to 179 degrees, while the picture value of the spatial frequency of strokes in the area of location of holographic images according to a given law varies within 200 - 2000 lines / mm with a groove depth within 100 - 500 nm and given the shape of their profile within these grooves.

At the same time, opaque metal diffraction regions 14 _{2 are} structured in the form of a set of high-depth diffraction-lattice structures containing at least one relief hologram with non-positioned patterns such as wallpaper holograms, with a predetermined second picture distribution of stroke directions, depth and periods of strokes in the indicated relief holograms. At the same time, said holograms in the form of relief holograms of the wallpaper type can have a picture angular and spatial distribution of strokes in the range from 0 to 179 degrees, while the picture value of the spatial frequency of strokes in the area of location of holographic images in relief holograms can vary according to a given law within 200 - 2000 lines/mm with a groove depth in the range of 100-500 nm and a given shape of their profile within these grooves.

At the same time, the first and second information-carrying elements formed on different sides of the protective device and placed on the metal layers have a different design, i.e. the design of at least one diffraction grating and/or relief hologram with a predetermined first pattern distribution of stroke directions, depth and stroke periods in said diffraction gratings and/or relief holograms of the first information-bearing element differs from the design of at least one relief hologram with a predetermined a given second picture distribution of stroke directions, depth and periods of strokes in the specified relief hologram of the second information-carrying element.

In this case, transparent and/or partially light-transmitting optically anisotropic regions 15 ₁ , 15 ₂ represent the sides of a single demetallized information-carrying space. At the same time, on each side of the optical protective device 12, the area S ₂ occupied by the indicated transparent optically anisotropic regions 15 ₁ , 15 ₂ is equal to the difference between the total area S occupied by one side of the protective device 12 and the area S ₁ occupied by the opaque metallized diffraction region 14 ₁ , 14 ₂ i.e. on each side of the multilayer, protective optical diffractive-polarizing device 12, the following relation will be fulfilled:

S ₂ =SS ₁ .

Figure 2 shows a schematic view of the structure in cross section along the line A-A of a multilayer, protective optical diffraction-polarization device 12 (hereinafter referred to as a protective device) according to figure 1, which is a bilaterally demetallized light-transmitting optically anisotropic section A-A of regions 15 ₁ , 15 ₂ , placed between the opaque metallized diffractive regions 14 ₁ , 14 _{2 of the} multilayer protective optical diffraction-polarization device 12 according to the present invention.

In this case, shown in figure 2, the first thermoplastic transparent isotropic polymer layer 23 and the first metal layer 24 provide the formation of the first information-carrying element, consisting of areas (14 ₁ +15 ₁ ) (see figure 1), and the second thermoplastic transparent the isotropic polymer layer 25 and the second metal layer 26, as well as the solid-state optical anisotropic layer 27 based on the LC material provide the formation of the second information-carrying element, consisting of areas (14 ₂ +15 ₂ ) (see figure 1).

On the carrier, for example, polyethylene terephthalate (PET) carrier film 21 with a thickness ranging from 12-100 μm, through the separating layer 22 in direct contact with the carrier film 21, there is a first thermoplastic transparent isotropic polymer layer 23 with a thickness of about 0.7-1 μm, made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, aryl acrylate or acrylate, phenol-formaldehyde resin, or combinations thereof.

The carrier film 21 may be the base carrier 11 (see figure 1) or, depending on the type of protected product and its manufacturing technology, it can be removed when placed in the window 13 (see figure 1) of the protected product 10 or removed when placed on carrier base 11.

The security product 10 comprises a multilayer, protective, optical diffraction-polarization device 12 according to the invention applied or embedded in it, used as a transparent window 13 in at least a part of the security product. At the same time, a secure product can be any valuable documents, including securities, banknotes, checks, credit cards, stamps or products that are subject to protection from unauthorized access.

The separating layer 22 is made of synthetic wax compositions and has a thickness of 0.2-0.5 microns or can be made of an adhesive composition with a thickness of 3-5 microns, depending on the purpose of the protective device 12.

In this case, the surface of the first thermoplastic transparent polymer layer 23, together with the first metal layer 24 of the protective device 12, is structured in relief in the form of diffractive structures. The areas occupied by high-depth diffraction-lattice structures are designated as 23a, 23c on the first polymer layer 23 and areas 24a and 24c on the first metal layer, respectively. At the same time, these high-depth diffraction-lattice structures contain at least one diffraction grating and/or at least one relief hologram with a predetermined first picture distribution of stroke directions, a depth in the range of 100-500 nm and a period of strokes in the specified diffraction gratings and/or relief holograms and generated in accordance with predefined software algorithms, depending on the required design of the generated color diffraction images, which contain latent color security features that vary at the request of the manufacturer and transferred to the appropriate database by programs that provide the formation of color diffraction images stored in opaque metallized diffractive region 14 ₁ , including those containing hidden color security features.

At the same time, the spatial picture orientation of the strokes on the surface of the first thermoplastic transparent isotropic polymer layer 23 (hereinafter referred to as the first polymer layer 23) is made in such a way that the formation of different in shape and physical size sets of structures on the opaque metallized diffraction region 14 ₁ and 14 is ensured. ₂ on each side of the security device 12, which are sets or combinations of letters, numbers, fonts, two-dimensional barcodes, etc., containing at least one hidden security feature.

In FIG. Fig. 2 conventionally shows only a fragment along the line A-A of the optical protective device 12. In view of the above, the first thermoplastic transparent isotropic polymer layer 23 is conventionally represented by only two of its sections 23a and 23c, but in practice the number of sections can be much larger over the entire area of the opaque metallized diffraction region 14 ₁ . In this case, the depth of the grooves between the grooves in high-depth diffraction-lattice structures in sections 23a and 23c is from 100 nm to 500 nm. Sections 23b of layer 23 conventionally located between sections 23a and 23c and occupied by low-depth diffraction-grating structures represent a transparent demetallized grating surface with a groove depth between the grooves of not more than 20 nm, conventionally indicated in figure 2 as one section 23b, (in fact , the number of sections is more than 2), which corresponds to the area 15 ₁ in Fig.1. On the surface of the first thermoplastic transparent polymer layer 23 is applied the first metal layer 24, consisting of sections 24a and 24c with a thickness of about 20 nm. At the same time, sections 24a and 24c repeat the diffraction structures formed on the indicated picture high-depth diffraction structures in sections 23a and 23c in the first thermoplastic transparent polymer layer 23 with groove depths between the grating strokes of 100-500 nm.

On the surface of sections 24a and 24c of the first metal layer 24 with a thickness of about 10-20 nm, a second thermoplastic transparent isotropic polymer layer 25 (hereinafter referred to as the second polymer layer 25) is deposited. In this case, the areas occupied by the diffractive structures are designated as 25a, 25c on the second polymer layer 25 and areas 26a and 26c on the second metal layer 26, respectively. The number of sections occupied by such high-depth diffraction-lattice structures is conditionally limited to two sections, but there may be more than 2. Sections of layer 25, conditionally located between sections 25a and 25c, and not occupied by diffraction structures, previously represent a flat transparent demetallized surface (not shown in figure 2), which corresponds to the area 15 ₂ in figure 1. The second polymeric layer 25 has a thickness of about 1.5 µm and may be made of linear macromolecules of the class one of polyurethane acrylates, epoxy acrylates, aryl acrylates or acrylates, phenol-formaldehyde resins, etc.

As already mentioned, on the specified second polymer layer 25, including areas 25a and 25c and the second metal layer 26 with areas 26a, 26c deposited on the second polymer layer, a diffractive structure is applied by hot stamping in the form of a relief hologram with non-positioned wallpaper patterns. type that forms a set of color-changing holographic images. Said diffractive structure in the form of a relief hologram ensures the formation of a non-positioned pattern of wallpaper type on an opaque metallized diffractive region 14 ₂ .

The specified second metal layer 26 (represented in figure 2 by sections 26a and 26c) has a thickness of about 20 nm and is made of a layer of metal or metal alloy, which is at least one element of aluminum, copper, brass, bronze, steel, zinc, tin, precious metal or their alloys and includes sections 26a and 26c (layer 26 is represented in figure 2 by sections 26a and 26c) completely repeating the relief-structured surface of sections 25a and 25c of the second polymer layer 25.

Further, on the surface of the protective device there is a solid-state optical anisotropic layer 27 based on an LC material, containing sections 27a and 27c, repeating the high-depth relief-structured surface of sections 26a and 26c of the second metal layer 26 and sections 27b, repeating the low-depth relief-structured surface of sections 23b of the first demetallized polymer layer

At the same time, both high-depth and low-depth spatial pattern-oriented diffraction-grating surface structures in layers 23 and 26 provide the formation of anisotropy pattern-oriented in the direction of the optical axis in the volume of the deposited layer of LC material 27. The formation of an anisotropic structure occurs in volume of the LC material, initially in the mesomorphic state, and then is retained when the LC layer is transferred to the solid-state amorphous anisotropic state.

On top of the optical anisotropic layer 27, a lacquer coating 28 is provided, which spatially coincides with the design of the optical protective device 12.

Further, a method for manufacturing a multilayer protective diffraction-polarization device is disclosed, comprising the following steps.

1) A carrier film 21 is provided with a release layer 22 applied thereto (see FIG. 2).

2) In this case, the carrier film is made of polyethylene terephthalate (PET) or polypropylene (PP) and can have a thickness ranging from 12 to 100 microns. The separating layer 22 is made of synthetic wax compositions and has a thickness of 0.2-0.5 microns or may be made of an adhesive composition with a thickness of 3-5 microns.

3) The first thermoplastic transparent isotropic polymer layer 23 (hereinafter referred to as the first thermoplastic layer 23) is evenly applied to the separating layer 22 .

Here, the application of the first thermoplastic layer 23 is carried out by means of a gravure offset printing method or a flexo printing method.

The first thermoplastic layer 23 has a thickness of 0.7-1.0 µm and is made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, arylacrylate or acrylate, phenol-formaldehyde resin, or combinations thereof.

4) The first metal layer 24 is uniformly applied to the first thermoplastic layer 23.

The first metal layer 24 is made of at least one of: aluminum, copper, brass, bronze, steel, zinc, tin, or their alloys and has a thickness of 10-20 nm with an optical density (D) equal to 0.8-1.2 . In this case, the optical transmission of the first metal layer is 10% in the UV region of the spectrum.

5) Provide the formation of the first information-carrying element containing at least one opaque metallized diffractive region and at least one transparent demetallized diffractive region, while:

5.a1) On the surface of the first thermoplastic layer 23 with the first metal layer 24, relief microstructuring of the surface of the first thermoplastic transparent isotropic polymer layer 23 with the first metal layer 24 deposited on it is provided by hot stamping with the formation of diffractive structures containing high-depth diffraction-lattice structures and low-depth diffraction-lattice structures while simultaneously forming in the first thermoplastic layer 23: sections 23a, 23b and 23c and in the first metal layer 24: sections 24a, 24c and 24b (not present in figure 2). In this case, the areas occupied by high-depth diffraction-lattice structures are designated as 23a, 23c, and the areas occupied by low-depth diffraction-grating structures are designated as 23b on the first polymer layer 23 and sections 24a, 24c with high-depth diffraction-grating structures and 24b (in Fig. 2 not shown) with low-depth grating structures on the first metal layer, respectively. At the same time, in sections 23a, 23c and 24a, 24c with high-depth diffraction-lattice structures, microcracks are provided during hot stamping, located along the strokes over the entire area occupied by these high-depth diffraction-lattice structures.

The number of sections occupied by both types of diffraction-lattice structures is conditionally limited to three sections, but there may be more than 3. Sections of layer 23, conditionally located between sections 23a and 23c, i.e. 23b and occupied by low-depth diffraction grating structures, further represent a transparent demetallized region 23b, which corresponds to region 15 ₁ in Fig.1.

In this case, the first information-carrying element will consist of an opaque metallized diffractive region 14 ₁ and a transparent region 15 ₁ in the form of a demetallized low-depth diffraction-lattice region in the form of 23b, made of a layer 23 of a thermoplastic polymer material.

At the same time, these high-depth and low-depth diffraction-lattice structures in sections 24a, 24c and 24b contain at least one diffraction grating and/or relief hologram with a picture distribution of stroke directions, depth and periods of strokes in the specified diffraction gratings and/or relief holograms. In this case, diffraction gratings can have a picture angular and spatial distribution of strokes in the range from 0 to 179 degrees. At the same time, the picture value of the spatial frequency of strokes in the area of location of holographic images according to a given law can vary within 200–2000 lines/mm with a groove depth within 100–500 nm for deep grooves (23a and 23c; 24a, 24c) and in the range from 5 to 20 nm for low-depth grating structures (23b and 24b) and a given shape of their profile within these grooves. Macroscopically, the pictures of these gratings can represent different designs, including those with protective features, depending on the purpose of the optical protective device 12.

5.a2) At the same time, sections 24a and 24c of the first metal layer 24 repeat the diffraction structures in the form of relief holograms formed on the indicated diffraction structures of sections 23a and 23c of the first thermoplastic layer 23. In the process of hot stamping using a nickel matrix hologram at a temperature in the range 90-130°C and a pressure in the range of 3.5-4.5 kg/cm ² ensures the formation of microcracks in high-depth (from 100 to 500 nm) gratings of the metal layer 24, which are absent in low-depth (less than 20 nm) gratings.

5.a3) Provide processing of the first metal layer 24 after the hot stamping process with a solution of chemical composition, for example, by means of photoinitiators of a radical cationic curing mechanism containing tanning agents, which, when penetrating through microcracks in sections 24a and 24c, form a single three-dimensional network structure of the first polymer layer 23, and providing resistance to demetallization of sections of at least one diffraction grating and/or relief hologram in sections 24a and 24c. At the same time, the above solution of the chemical composition is a liquid composition based on photoinitiators of radical polymerization of the type 2,2-dimethoxy-2-phenylacetophenone (Irgacure-651) with chemically active additives in the form of active diluents such as isobornyl acrylate or a liquid composition based on photoinitiators containing a group benzoyl with substituents with a radical cationic curing mechanism containing tanning agents, such as benzophenone and its alkyl derivatives.

5.a 4) Provide etching of areas 24b of the metal region of the first metal layer 24 by placing the carrier film 21 with layers 23, 24 in a chemical composition, for example an alkaline solution, to ensure demetallization of layer 23 in areas 23b in which low-depth diffraction gratings are present structures in the form of at least one diffraction grating and/or relief hologram. These areas correspond to the area 15 ₁ (figure 1) on the protective device 12.

5.a5) Processing of the first metal layer 24 with sections 24a and 24c and demetallized area 23b with a solution of chemical composition, for example, by means of photoinitiators of a radical cationic curing mechanism containing tanning agents, ensuring the formation of an insoluble single three-dimensional network structure in the demetallized area 23b c at least one diffraction grating and/or relief hologram.

6) A second thermoplastic transparent isotropic polymer layer 25 (hereinafter referred to as the second polymer layer 25) is evenly applied to the first metal layer 24 with sections 24a, 24c and 24b (not shown in FIG. 2).

The second polymeric layer 25 has a thickness of about 1.5 microns and is optionally made of linear macromolecules of the class of one of polyurethane acrylates, epoxy acrylates, aryl acrylates or acrylates, phenol-formaldehyde resins.

7) Apply evenly on the second polymer layer 25 a second metal layer 26 with a thickness of about 20 nm, made of a layer of metal or metal alloy, representing at least one element of: aluminum, copper, brass, bronze, steel, zinc, tin, precious metal or their alloys.

8) Provide the formation of the second information-bearing element, which consists of an opaque metallized diffractive region 14 ₂ and a transparent and / or partially light-transmitting optically anisotropic region 15 ₂ , in the form of a flat demetallized region made of a layer of thermoplastic polymer material,

while in the process of forming the second information-carrying element:

8a) The method of hot stamping provides relief microstructuring of the surface of the second polymer layer 25 with the second metal layer 26 deposited on it by means of a nickel matrix-hologram with a second predetermined relief structuring of the surface with the formation of sections 25a and 25c and 26a, 26c in the form of high-depth diffraction-lattice structures on layers 25 and 26, respectively. Sections 25b of layer 25, conditionally located between sections 25a and 25c, and not occupied by diffraction-grating structures, represent a flat transparent demetallized surface, which corresponds to area 15 ₂ in Fig.1. The diffraction-lattice structures obtained by hot stamping by means of a nickel matrix-hologram contain at least one relief hologram with a picture distribution of stroke directions, depth and periods of strokes in said at least one relief hologram. At the same time, relief holograms have a patterned angular and spatial distribution of strokes. At the same time, the picture value of the spatial frequency of strokes in the area of location of holographic images in relief holograms varies according to a given law within 200–2000 lines/mm with a groove depth within 100–500 nm and a given shape of their profile within these grooves. Macroscopically, the pictures of these embossed holograms can represent a different design, including those with security features, depending on the purpose of the optical security device 12.

In this case, the relief hologram may be a relief hologram with non-positioned patterns. those. wallpaper hologram. In this case, the second information-carrying element consists of an opaque metallized diffractive region 14 ₂ and a transparent region 15 ₂ in the form of a flat demetallized region made of the second layer 25 of thermoplastic polymer material.

8a1) At the same time, at least one relief hologram of the second thermoplastic transparent isotropic polymer layer formed in step 8a) completely repeats at least one relief hologram of the second metal layer.

8a2) In this case, the design of at least one diffraction grating and/or relief hologram with a picture distribution of stroke directions, depth and stroke periods in said diffraction gratings and/or relief holograms of the first information-carrying element differs from the design of at least one relief hologram with non-positioned drawings, i.e. wallpaper hologram, and with a picture distribution of stroke directions, depth and periods of strokes in the specified relief hologram of the second information-bearing element.

9) The entire area of the protective device 12 is evenly applied to the second metal layer 26 by printing, for example, by gravure, letterpress offset printing or flexographic printing, a layer of positive photoresist (not shown in Fig. 1 and Fig. 2) with a thickness of 0.8 -1, 0 µm.

10) The layer of positive photoresist deposited on the second metal layer 26 is evenly exposed to UV radiation in the range of about 300-340 nm, directed from the side of the first metal layer through the demetallized areas of the said first metal layer 24, which act as a transparent photomask (the stage of demetallization of the first metal layer 24 was performed in step 5. a4). In this case, the demetallized areas of the first metal layer 24 coincide with the demetallized area 15 _{1 of the} protective device 12.

11) Remove the exposed areas of the positive photoresist layer in the areas 26b of the second metal layer 26 corresponding to the demetallized areas 24b of the first metal layer 24 through which UV exposure was performed. At the same time, the removal of the exposed areas of the positive photoresist layer on the specified areas of the second metal layer 26 is carried out by washing off the specified exposed areas of the photoresist layer with an alkali or a developer.

12) Demetallize, for example, using an alkaline solution, the second metal layer 26 in areas 26b corresponding to the removed exposed areas of the positive photoresist layer, with the formation of demetallized transparent areas corresponding to the transparent area 15 _{2 of the} protective device 12.

13) Remove the areas 25b of the second thermoplastic transparent isotropic polymer layer 25 at the locations of the demetallized transparent areas (areas 26b) by dissolving it with a solvent based on dimethylformamide.

14) On top of the second metal layer 26 and over the entire surface of the protective device 12, a layer of surfactant (not indicated in the drawing) is applied by casting or thermal spraying, which ensures the uniformity of the subsequent formation of an optically anisotropic layer 27 on it. The surfactant layer has a thickness of range from the monomolecular order of 10 Ä to 20 Ä and is made from materials based on silicon oxides, metal oxides or mixtures and combinations thereof, selected from the group consisting of oxides SiO, SiO ₂ , Al ₂ O ₃ , TiO ₂ , GeO ₂ , ZnO ₂ and others, including their mixtures and combinations or ZnS, as well as from organic photoanisotropic materials, for example, azo dye Mordant Pure Yellow, and may additionally contain at least one organic substance from the class of surfactants.

15) by pouring a layer of LC material in an isotropic state onto a layer of a surfactant. Note that the LC material layer 27 is a lyotropic or thermotropic material. In the present description, position 27 denotes a layer of LC material, which under various conditions can be in three different states: isotropic liquid, liquid crystalline and solid anisotropic amorphous state. In this case, one reference position 27 is used for all three states. At the same time, the layer of the LC material includes in its composition a composition that exhibits mesomorphic (liquid-crystal) properties in a certain temperature range and/or in certain solvents with its subsequent transfer initially into a transparent or partially light-transmitting liquid-crystal highly picture-molecularly oriented state.

In particular, the LC materials specified in more detail, as well as their compositions and conditions for the transition to an anisotropic state, are disclosed in EA patent No. 032083B1, IPC B42D 25/328(2012.01), publ. SCIENTIFIC AND PRODUCTION ASSOCIATION "CRYPTEN" (RU), used in the present description, as a reference, and the disclosure of this patent is an integral part of this description.

15a) The layer 27 of the LC material deposited on the surfactant layer is transferred from the isotropic state to the mesomorphic state, while the surfactant layer is designed so as to provide in the layer 27 of the LC material in the mesomorphic state a predetermined pattern of the spatial distribution of optical anisotropy (directions of the optical axis and the magnitude of absorption dichroism and/or phase delay) corresponding to a predetermined distribution pattern of the directions of the strokes in the diffraction-lattice structures containing at least one relief hologram in the second metal layer 26 and demetallized area 23b of the first thermoplastic layer 23.

In addition, the process of transferring the LC material layer 27 deposited on the surfactant layer, which is a thermotropic LC material (TFCM), from the isotropic state to the mesomorphic state, is carried out by lowering the temperature of the TFCM to a phase transition, or transferring the layer deposited on the surfactant layer LCD material constituting

thermotropic LC material (TLCM) or lyotropic LC material (LLCM),

from an isotropic state to a mesomorphic state, carried out by complete or

partial evaporation of the solvent from the layer of the LC material, which

previously added to the specified layer of the LC material.

15b) Carry out curing, in particular photo- or thermal curing of the layer 27 of the LC material with its transfer to a solid amorphous state while maintaining its spatially-patterned molecularly oriented ordered state. Thus, the layer 27 of the LC material is converted into

a uniform solid-state amorphous (glassy) optically anisotropic layer 27 (hereinafter referred to as optically transparent anisotropic layer 27). The specified layer 27 in sections 27a and 27c completely repeats the relief structuring of high-depth diffraction-lattice structures in sections 26a and 26c of the second metal layer 26 and low-depth diffraction-lattice structures 23b of the first thermoplastic polymer layer 23. In this case, sections 26a, 26c and 23b, along with with information-carrying properties, they also have technological properties, providing a spatial-pattern molecular orientation of the optical axis in the volume of the amorphous anisotropic layer 27 formed on them. The specified layer 27 has a thickness in the range from 0.2 μm to 2 μm.

16) A lacquer coating 28 is applied over the cured layer of the LC material in an anisotropic state - an optically anisotropic layer 27 over the entire surface of the optical protective device 12.

When observing in polarized light in reflection or “transmission” of a protective device 12 with such a layer 27 (27a and 27c) oriented using the indicated gratings, based on the LC material, bright polarization color images with a spatial-pattern structure of diffraction gratings are observed, stored, for example , on such sub-areas of layers 23 and 26. The images dynamically change when the mutual orientation of the visualized optical elements relative to each other changes. This significantly expands the functionality of the protective device 12.

The functionality is even more enhanced by the introduction of dichroic luminescent substances that dissolve in it, for example, under UV unpolarized or polarized radiation, and/or dichroic absorbing substances into the composition of the LC material. In this case, in the case of viewing the security device in unpolarized visible light, sections of the region 15, such as, for example, indicated in FIG. 2, subregion 27b is viewed as spatially completely transparent or uniformly colored (depending on the absorption spectrum of the dye and/or luminescence of the phosphor), but in polarized light, dynamically changing luminescent or absorbing images appear when changing the direction of the viewing angle, incidence and/or polarization state of the imaging radiation .

Next, examples of obtaining diffractive structures in diffractive polarization devices according to the invention will be described (in these examples 1 and 2, the features of applying a layer of LC material over a protective device according to the method described in this disclosure are omitted, which gives the protective device additional security features, which are described in detail above ).

Example 1

The authors of the invention made prototypes of a protective device, in the manufacture of which the holograms were recorded on the Dot Matrix installation with laser radiation with a generation wavelength of 405 nm on a positive photoresist with a different dose of radiation energy (J/cm2), by changing the exposure time, providing different depths diffraction grating structures with a grating period of more than 200 lines/mm and a groove depth of 100 nm, and low-depth diffraction grating structures with a grating period of more than 200 lines/mm and a groove depth of 5 nm were formed.

As a result, the obtained sample of the diffraction-polarization device without the presence of a layer of LC material on top exhibits only visually visible reflective or refractive (transmitting) diffraction effects in the area where high-depth diffraction-grating structures are located, while low-depth diffraction-grating structures are perceived only as uniformly transparent or reflective region.

In polarized light, low-depth diffraction-lattice structures exhibit only polarization effects, while high-depth diffraction-lattice structures also exhibit diffraction-polarization effects, which significantly improves the protective properties of the device.

Example 2

In addition, the inventors produced prototypes of a protective device, during the manufacture of which holograms were recorded on the Dot Matrix installation with laser radiation with a generation wavelength of 405 nm on a positive photoresist with a different dose of irradiation energy (J/cm2), by changing the exposure time, providing different groove depths, while diffraction structures with high-depth diffraction-grating structures with a diffraction grating period of more than 200 lines/mm and a groove depth of 500 nm, and low-depth diffraction-grating structures with a diffraction grating period of more than 200 lines/mm and a groove depth 20 nm. As a result, the resulting sample of the diffraction-polarization device exhibits diffraction effects in the region of high-depth diffraction-lattice structures without the presence of a layer of LC material on top, while low-depth diffraction-lattice structures are perceived only as a transparent transmissive or reflective (in the case of a metal layer) region without diffraction. In polarized light, low-depth diffraction-lattice structures exhibit only polarization effects, while high-depth diffraction-lattice structures also exhibit diffraction-polarization effects, which significantly improves the protective properties of the device.

Thus, thanks to the manufacturing method developed by the authors, a multilayer protective optical diffraction-polarizing device was created with significantly improved protective properties, which are ensured by the formation of various diffraction structures, including diffraction gratings and/or holograms on both sides of the proposed multilayer protective device with almost perfect spatial accuracy of mutual location up to 5 μm, as a result of imparting to one of at least two metal layers with diffractive structures located on it, a property that prevents the effect of its demetallization at their locations and the formation of demetallized transparent areas of the other of at least two metal layers using a layer of positive photoresist, which practically makes it impossible to unauthorized copy. And valuable objects, in the form of securities or other products, on which this multilayer, protective, optical diffractive device, manufactured by the method disclosed in the present description, is applied or embedded, have a unique multi-level degree of protection.

It should be noted that from the point of view of design, the claimed protective device consists of two information-carrying elements:

1. includes the first transparent isotropic polymer layer 23 with a spatially structured surface in the form of sections with high-depth diffraction gratings 23a and 23c with a metal layer 24 deposited on them with gratings 25a and 25c and a demetallized section of the layer 23 with low-depth diffraction gratings 23b;

2. includes a second transparent isotropic polymer layer 25 with a spatially structured surface in the form of sections with high-depth diffraction gratings 25a and 25c with a metal layer 26 deposited on them with gratings 26a and 26c and deposited on them and on the entire area of the protective device 12 transparent or partially light-transmitting optically anisotropic layer 27, picture-oriented along the orientation of the optical axis in its volume using gratings 26a, 26c and 23b

However, from the point of view of functionality, the specified device can be conditionally presented in the form of three information-carrying elements with protective features.

1. Purely diffractive security features are provided by the first information-bearing element, which includes the first transparent isotropic polymer layer 23 with a spatially structured surface in the form of areas with high-depth diffraction gratings 23a and 23c with a metal layer 24 deposited on them with gratings 25a and 25c and demetallized section of layer 23 with low depth gratings 23b.

2. Diffraction-polarization features are provided by the second information-carrying element, which includes a second transparent isotropic polymer layer 25 with a spatially structured surface in the form of sections with high-depth diffraction gratings 25a and 25c with a metal layer 26 deposited on them with gratings 26a and 26c and applied on them the first part of a transparent and/or partially light-transmitting optically anisotropic layer 27, picture-oriented along the orientation of the optical axis in its volume using gratings 26a, 26c;

3. Purely polarization features are provided by means of a third information-carrying element (this designation is made conventionally for a more accurate understanding of the nature of the resulting security features), which includes the second part of a transparent and/or partially light-transmitting optically anisotropic layer 27, pictorially oriented along the orientation of the optical axis in its volume with gratings 23b of the first polymer layer 23.

At the same time, the proposed design of the protective device is essentially one of the varieties of multilayer permanent optical memory with analog holographic or digital-holographic "dot-matrix" pixel information recording, including:

- with open, visually readable mono or polychrome diffractive security features formed in diffraction orders of isotropic diffraction gratings formed in the first polymer and first metal layers;

- with visually hidden, but visualized or read using the simplest polarization devices such as smartphones, mono- or polychrome diffraction-polarization protective features formed in diffraction orders of anisotropic gratings based on relief gratings with high-deep grooves filled with picture-oriented LC material, as well as mono- or polychrome polarization security features formed in zero (mirrored) orders of the specified set of gratings with a layer of LC material on top of the specified high-depth grooves;

- with visually hidden, but visualized or machine-readable using the simplest polarization devices such as smartphones with monochrome or polychrome polarization security features formed in the layer of LC material deposited on diffraction gratings with low-depth grooves that do not show any visible diffraction effect.

In this case, the color gamut of the rendered images depends on the spectral composition of the visualizing source of optical radiation and can be taken into account in the machine-readable method of reading security features.

Industrial Applicability

The invention can be used in the field of protecting objects or products to be protected, in particular for protecting valuable documents, any valuable products from forgery and copying and identifying their authenticity.

Claims (74)

1. A method for manufacturing a multilayer protective optical diffraction-polarization device, comprising steps in which: 1) provide a carrier film; 2) apply a separating layer on one side of the carrier film; 3) evenly apply the first thermoplastic transparent isotropic polymer layer on the separating layer; 4) evenly apply the first metal layer on the specified first thermoplastic transparent isotropic polymer layer; 5) provide the formation of the first information-carrying element containing at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region, while: 5a1) by hot stamping, simultaneously, on the surface of the first thermoplastic transparent isotropic polymer layer and the first metal layer, relief microstructuring of the surface of the first thermoplastic transparent isotropic polymer layer with the first metal layer deposited on it is provided with the formation of diffractive structures containing high-depth diffraction-lattice structures and low-depth diffraction-lattice structures, wherein said structures contain at least one diffraction grating and/or at least one relief hologram with a predetermined first pattern distribution of stroke directions, with a predetermined depth and period of strokes in said diffraction gratings and/or relief holograms , while in areas with high-depth diffraction-lattice structures, microcracks are provided, located along the grooves over the entire area occupied by the indicated high-depth diffraction rational-lattice structures; while the sections of the first thermoplastic transparent isotropic polymer layer with the first metal layer deposited on it, occupied by low-depth diffraction-lattice structures, correspond to at least one transparent and/or partially light-transmitting demetallized optically anisotropic area of the first information-carrying element, and sections of the first thermoplastic transparent an isotropic polymer layer with a first metal layer deposited on it, occupied by high-depth diffraction-lattice structures, correspond to at least one opaque metallized diffractive region of the first information-carrying element, 5a1.2), while the diffraction structures of the first thermoplastic transparent isotropic polymer layer formed in step 5a1) completely repeat the diffraction structures of the first metal layer; 5a2) a layer of a liquid composition with chemically active additives is applied to the first metal layer with embossed diffractive structures to ensure the process of diffusion of the specified liquid composition through microcracks in the areas of the first thermoplastic transparent isotropic polymer layer with high-depth diffraction-lattice structures, providing intermolecular cross-linked structures in these areas three-dimensional structure and ensuring resistance to demetallization of the sections of the first metal layer with embossed high-depth diffraction-lattice structures; 5a3) provide etching of the first metal layer to ensure demetallization in areas located in the region of the first thermoplastic transparent isotropic polymer layer, in which low-depth diffraction-lattice structures are formed; 5a4) provide processing of the first metal layer with areas with high-depth diffraction-lattice structures and with areas of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures, demetallized in step 5a3) to provide an insoluble single three-dimensional network structure in demetallized areas c at least one low-depth diffraction-lattice structure; 6) uniformly apply the second thermoplastic layer to the entire area of the first metal layer and to the entire area of the protective device; 7) uniformly applied to the second thermoplastic transparent isotropic polymer layer of the second metal layer; 8) ensure the formation of a second information-carrying element containing at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region, while: 8a) by hot stamping, simultaneously, on the surface of the second thermoplastic transparent isotropic polymer layer and the second metal layer, relief microstructuring of the surface of the second thermoplastic transparent isotropic polymer layer is provided with a second metal layer deposited on it in the form of diffractive structures, which are high-depth diffraction-lattice structures and containing at least one relief hologram with a predetermined second picture distribution of stroke directions, with a predetermined depth and period of strokes in the specified relief holograms, while the areas not occupied by the specified diffraction structures correspond to a transparent and/or partially light-transmitting demetallized optically anisotropic region of the second information-carrying element; 8a1) while formed in step 8a) at least one relief hologram of the second thermoplastic transparent isotropic polymer layer completely repeats at least one relief hologram of the second metal layer; 8a2) in this case, the design of at least one diffraction grating and/or relief hologram with a predetermined first pattern distribution of stroke directions, depth and stroke periods in said diffraction gratings and/or relief holograms of the first information-carrying element differs from the design of at least one a relief hologram with a predetermined second picture distribution of stroke directions, depth and periods of strokes in said relief hologram of the second information-bearing element; 9) apply a layer of positive photoresist evenly on the second metal layer and over the entire area of the protective device; 10) uniformly exposing the positive photoresist layer deposited on the second metal layer with UV radiation directed from the side of the first metal layer through the demetallized areas of the said first metal layer, functioning as a transparent photomask; 11) removing the exposed areas of the positive photoresist layer in the areas of the second metal layer corresponding to the demetallized areas of the first metal layer through which exposure to UV radiation was carried out; 12) demetallize the second metal layer on the remote exposed areas of the positive photoresist layer to form demetallized transparent areas; 13) removing the second thermoplastic polymer layer in the demetallized areas of the second metal layer; 14) over the second metal layer and the surface of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures, demetallized in step 5a3), a layer of surfactant is applied; 15) applying a layer of LC material in an isotropic state on a layer of surfactant on the entire surface of the second metal layer and the surface of the first thermoplastic transparent isotropic polymer layer with low-depth diffraction-lattice structures; 15a) the layer of LC material deposited on the surfactant layer is transferred from the isotropic to the mesamorphic state, while the surfactant layer is designed to provide in the LC layer of the material in the mesomorphic state a predetermined pattern of the spatial distribution of the directions of the axis of optical anisotropy , corresponding to a predetermined distribution pattern of stroke directions, in said diffractive structures containing at least one relief hologram in the second metal layer and demetallized in step 5a3) area of the first thermoplastic transparent isotropic polymer layer; 15b) curing the layer of the LC material with its transfer to a solid-state amorphous state, ensuring the formation of a solid-state optical anisotropic layer of a predetermined pattern of the spatial distribution of optical anisotropy while maintaining the spatial-picture molecular-oriented ordered state of the LC material; 16) apply a lacquer coating over the cured layer of the LC material in an anisotropic state and over the entire surface of the optical protective device. 2. The method according to claim 1, wherein the carrier film is made of polyethylene terephthalate (PET) or polypropylene (PP). 3. The method according to claim 1, in which the LC material layer is optically transparent in the visible region of the spectrum and includes as an impurity one or a mixture of monochrome anisotropic substances exhibiting spectrally selective or spectrally uniform (gray) absorption dichroism in the visible spectral region, and/or transparent anisotropic substances that provide anisotropic luminescence or phosphorescence in the visible or IR region of the spectrum under the action of the UV radiation they absorb. 4. The method according to claim 1, in which the separating layer is made of synthetic wax compositions or of an adhesive composition. 5. The method of claim 1, wherein the application of the first thermoplastic transparent isotropic polymer layer to the separating layer is carried out by a printing method which is one of a gravure offset printing method or a flexo printing method. 6. The method according to claim 1, in which the first thermoplastic transparent isotropic polymer layer is made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, arylacrylate or acrylate, phenol-formaldehyde resin, or combinations thereof. 7. The method according to claim 1, in which the first metal layer is made of at least one of: aluminum, copper, brass, bronze, steel, zinc, tin or their alloys and has an optical transmission of 10% in the UV region of the spectrum. 8. The method of claim. 1, in which the removal in step 13) of the second thermoplastic polymer layer in the demetallized areas of the second metal layer is performed by applying an acrylic solvent to it. 9. The method of claim 1, wherein curing the LC material layer in step 15b) into a solid amorphous state is performed to provide a predetermined optical anisotropy spatial distribution pattern, which is a predetermined birefringence spatial distribution pattern. 10. The method of claim 1, wherein the depth of the grooves in the high depth grating structures is 100 to 500 nm and the depth of the grooves in the low depth grating structures is 5 to 20 nm. 11. The method according to claim 1, in which the diffractive structures formed at the stage of the first relief microstructuring of the first thermoplastic transparent isotropic polymer layer form pictures with different designs depending on the requirements of the manufacturer. 12. The method according to claim 1, wherein the layer of the liquid composition with chemically active additives deposited on the first metal layer in step 5a2) is a liquid composition based on photoinitiators of radical polymerization such as 2,2-dimethoxy-2-phenylacetophenone (Irgacure -651) with chemically active additives in the form of active diluents such as isobornyl acrylate. 13. The method according to claim 1, in which the layer of liquid composition with chemically active additives deposited on the first metal layer in step 5a2) is a liquid composition based on photoinitiators containing a benzoyl group with substituents with a radical cationic curing mechanism containing tannins. substances such as benzophenone and its alkyl derivatives. 14. The method of claim 1, wherein the etching step 5a3) is carried out by placing the carrier film coated with the first thermoplastic transparent isotropic polymer layer and the first metal layer in a solvent based on acetic and nitric acids. 15. The method according to claim 1, in which the second thermoplastic transparent isotropic polymer layer is made of linear macromolecules of at least one of: polyurethane acrylate, epoxy acrylate, arylacrylate, acrylate, phenol-formaldehyde resin, or combinations thereof. 16. The method according to claim 1 or 15, wherein the second thermoplastic transparent isotropic polymeric layer has a thickness of about 1.5 microns. 17. The method of claim 1, wherein the second metal layer has a thickness of about 20 nm. 18. The method according to claim 1, in which the second metal layer is made of at least one of: aluminum, copper, brass, bronze, steel, zinc, tin, precious metals or their alloys. 19. The method according to claim 1, in which at the stage of performing relief microstructuring of the second thermoplastic transparent isotropic polymer layer, the formed relief holograms are holograms with non-positioned patterns such as wallpaper holograms. 20. The method according to claim 19, in which at the stage of performing relief microstructuring of the second thermoplastic transparent isotropic polymer layer, the formed relief holograms have a predetermined picture angular and spatial distribution of strokes and a predetermined pattern value of the spatial frequency of strokes in the area of the holographic images. 21. The method according to claim 19, in which the relief holograms formed at the stage of relief microstructuring of the second thermoplastic transparent isotropic polymer layer are wallpaper holograms with a non-positioned pattern and form pictures with different designs depending on the requirements of the manufacturer. 22. The method according to claim 1, which provides the step of embossing the surface of the first thermoplastic transparent isotropic polymer layer in step 5a1) by means of a nickel matrix-hologram with the first predefined relief structuring of the surface and the step of embossing the surface of the second thermoplastic transparent isotropic polymer layer in step 8a) by means of a nickel hologram matrix with a second predetermined surface relief structuring, wherein the surface relief structuring of the first thermoplastic transparent isotropic polymer layer differs from the second surface structuring of the second thermoplastic transparent isotropic polymer layer. 23. The method of claim 1, wherein the step of applying a positive photoresist layer to the second metal layer is carried out by a printing method which is a gravure letterpress offset printing method or a flexographic printing method. 24. The method according to claim 1, in which the step of removing the exposed areas of the positive photoresist layer on the specified areas of the second metal layer is carried out by washing off the specified exposed areas of the photoresist layer with an alkaline developer based on an aqueous solution of tetramethylammonium hydroxide or trimethyl (2-hydroxyethyl) ammonium hydroxide with a fluorine-containing surfactant. 25. The method according to claim 1, in which the surfactant layer is made of materials based on silicon oxides, metal oxides or mixtures and combinations thereof, selected from the group consisting of oxides SiO, SiO ₂ , Al ₂ O ₃ , TiO ₂ , GeO ₂ , ZnO ₂ , including their mixtures and combinations or ZnS, as well as from organic photoanisotropic materials, such as azo dye Mordant pure yellow. 26. The method of claim 25, wherein the surfactant layer further comprises at least one organic substance from the class of surfactants. 27. The method of claim. 1, in which the application of a layer of surfactant on the second metal layer is carried out by casting or thermal spraying. 28. The method of claim 1, wherein the LC material layer is a lyotropic LC material (LLCM) or a thermotropic LC material (TLCM). 29. The method according to claim 28, in which the transition of the layer of LC material deposited on the surfactant layer, which is a thermotropic LC material (TFCM), from an isotropic state to a mesomorphic state is carried out by lowering the temperature of the FACM to a phase transition. 30. The method according to p. 28, in which the transfer of the layer of LC material deposited on the surfactant layer, which is a thermotropic LC material (TGCM) or lyotropic LC material (LLCM), from an isotropic state to a mesomorphic state is carried out by complete or partial evaporation solvent from the layer of LC material, which is previously added to the specified layer of LC material. 31. Multilayer protective optical diffraction-polarization device, made according to the method according to one of paragraphs. 1-30 and containing carrier film and sequentially deposited on each other: the first thermoplastic transparent isotropic polymer layer, the first metal layer, the second thermoplastic transparent isotropic polymer layer, the second metal layer, a solid-state optical anisotropic layer based on LC material and a lacquer coating located over the entire surface of the optical protective device; while these elements are made in such a way that provides the formation of at least two information-carrying elements; wherein the first information-carrying element contains at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region and is made in the form of at least one diffractive structure containing high-depth and low-depth diffraction-grating structures and formed in the first thermoplastic transparent isotropic polymer layer and the second metal layer, respectively, wherein said at least one diffraction structure is made in the form of at least one diffraction grating and/or at least one relief hologram with a predetermined first picture distribution of stroke directions, depth and periods of strokes in said diffraction gratings and/or relief holograms, and with the provision of microcracks in areas with high-depth diffraction-lattice structures, which are located along the strokes over the entire area occupied by areas with high-depth diffraction-lattice structures; the second information-carrying element contains at least one opaque metallized diffractive region and at least one transparent and/or partially light-transmitting demetallized optically anisotropic region and is made in the form of at least one diffractive structure, which is a high-depth diffraction-lattice structures and formed on the second thermoplastic transparent isotropic polymer layer and the second metal layer, respectively, and also contains a solid-state optical anisotropic layer based on an LC material deposited over the entire surface of the second metal layer, while said at least one diffractive structure is made in the form of at least one relief hologram with a predetermined second picture distribution of stroke directions, stroke depths and stroke periods in said relief holograms, the design of at least one diffraction grating and/or relief hologram of the first information-carrying element differs from the design of at least one relief hologram of the second information-carrying element, at the same time, the solid-state optical anisotropic layer based on the LC material is configured to provide a predetermined pattern of spatial distribution of optical anisotropy while maintaining a spatially patterned molecularly oriented ordered state of the LC material corresponding to a predetermined pattern of distribution of stroke directions in the specified at least one opaque relief hologram a metallized diffractive region of the second information-carrying element and at least one diffraction grating and/or relief hologram in a transparent and/or partially light-transmitting demetallized optically anisotropic region of the first information-carrying element; wherein the first and second information-carrying elements are made in such a way that at least one diffractive feature is formed in at least one opaque metallized diffractive region of the first information-carrying element; at least one polarization feature in at least one transparent demetallized optically anisotropic region of the second information-carrying element; at least one diffraction-polarization feature in at least one opaque metallized diffractive region of the second information-carrying element. 32. A multilayer protective optical diffractive-polarizing device according to claim 31, in which the opaque metallized diffractive regions of the first and second information-carrying elements are made in such a way that the formation of a single holographic image and/or subject-independent and/or mutually dependent holographic images is ensured. images on each side of the multilayer protective optical diffraction-polarization device. 33. The multilayer diffractive polarization optical security device of claim 31, wherein said opaque metallized diffractive regions are mirrored on each side of the optical security device and have the same geometry at one location. 34. A multilayer protective optical diffractive-polarizing device according to claim 31, in which the diffractive structures are made on the surface of the first thermoplastic transparent isotropic polymer layer and the first metal layer in such a way that the spatial picture orientation of the strokes in these diffractive structures is made in such a way that the formation of different in shape and physical size sets of structures on an opaque metallized diffractive area on each side of the security device, which are sets or combinations of letters, numbers, fonts, two-dimensional barcodes, forming at least one hidden security feature. 35. The multilayer protective optical diffraction-polarization device according to claim 31, wherein the depth of the grooves in the high-depth diffraction-grating structures is from 100 to 500 nm, and the depth of the grooves in the low-depth diffraction-grating structures is from 5 to 20 nm. 36. A security product containing a multilayer protective optical diffraction-polarization device according to claim 31 applied or embedded in it. 37. A security product according to claim 36, comprising a multilayer protective optical diffraction-polarization device according to claim 31, which is used as a transparent window in at least a part of the security product. 38. Security item according to item 36, which is valuable documents, including securities, banknotes, checks, credit cards, stamps, passport pages, vouchers, shares, check books, excise stamps, identification documents. 39. A value document containing a multilayer protective optical diffraction-polarization device according to claim 31, used as a transparent window in at least a part of the value document. 40. A valuable document according to item 39, which is securities, banknotes, checks, credit cards, stamps, passport pages, vouchers, shares, check books, excise stamps, identification documents.

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