RU2008128297A - METHOD FOR PRODUCING TRICHLOROSILANE - Google Patents
METHOD FOR PRODUCING TRICHLOROSILANE Download PDFInfo
- Publication number
- RU2008128297A RU2008128297A RU2008128297/15A RU2008128297A RU2008128297A RU 2008128297 A RU2008128297 A RU 2008128297A RU 2008128297/15 A RU2008128297/15 A RU 2008128297/15A RU 2008128297 A RU2008128297 A RU 2008128297A RU 2008128297 A RU2008128297 A RU 2008128297A
- Authority
- RU
- Russia
- Prior art keywords
- distillation
- stage
- separation
- silicon
- condensate
- Prior art date
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- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 title claims abstract 5
- 239000005052 trichlorosilane Substances 0.000 title claims abstract 5
- 238000004519 manufacturing process Methods 0.000 title claims abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract 8
- 238000004821 distillation Methods 0.000 claims abstract 8
- 238000000034 method Methods 0.000 claims abstract 8
- 238000000926 separation method Methods 0.000 claims abstract 8
- 229910052710 silicon Inorganic materials 0.000 claims abstract 8
- 239000010703 silicon Substances 0.000 claims abstract 8
- 239000005046 Chlorosilane Substances 0.000 claims abstract 6
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract 6
- 238000007038 hydrochlorination reaction Methods 0.000 claims abstract 6
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract 4
- 229910052796 boron Inorganic materials 0.000 claims abstract 4
- 239000001257 hydrogen Substances 0.000 claims abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims abstract 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract 4
- 239000002245 particle Substances 0.000 claims abstract 4
- 238000001179 sorption measurement Methods 0.000 claims abstract 4
- 239000002699 waste material Substances 0.000 claims abstract 4
- 238000006243 chemical reaction Methods 0.000 claims abstract 2
- 150000001875 compounds Chemical class 0.000 claims abstract 2
- 238000009833 condensation Methods 0.000 claims abstract 2
- 230000005494 condensation Effects 0.000 claims abstract 2
- 239000007789 gas Substances 0.000 claims abstract 2
- 239000012535 impurity Substances 0.000 claims abstract 2
- 239000003456 ion exchange resin Substances 0.000 claims abstract 2
- 229920003303 ion-exchange polymer Polymers 0.000 claims abstract 2
- 239000007788 liquid Substances 0.000 claims abstract 2
- 239000000203 mixture Substances 0.000 claims abstract 2
- 238000000746 purification Methods 0.000 claims abstract 2
- 239000007787 solid Substances 0.000 claims abstract 2
Landscapes
- Silicon Compounds (AREA)
Abstract
1. Способ получения трихлорсилана, включающий гидрохлорирование измельченного технического кремния хлористым водородом при повышенном давлении в реакторе с кипящим слоем, последующую сепарацию твердых частиц кремния, конденсацию парогазовой смеси с отделением водорода и хлористого водорода и получение конденсата, содержащего хлорсиланы, выделение трихлорсилана из полученного конденсата методами ректификации и «реакционной» ректификации в присутствии увлажненного газа, инертного к хлорсиланам, и переработку отходов производства, отличающийся тем, что гидрохлорированию подвергают фракцию технического кремния, содержащую, по крайней мере, 90% частиц с размером от 90 до 450 мкм и разницей в размерах, не превышающих величины 250 мкм, при этом весь жидкий конденсат, образующийся на стадии гидрохлорирования, на первом этапе выделения подвергают двухступенчатой очистке от борсодержащих примесей с помощью «реакционной» ректификации и адсорбции путем пропускания паров хлорсиланов через слой борселективных ионообменных смол, а отходы, образующиеся на всех стадиях процесса и содержащие кремний и его соединения, подвергают термогидролизу в водородном пламени. ! 2. Способ по п.1, отличающийся тем, что перед проведением адсорбции конденсат, полученный на стадии «реакционной» ректификации, выдерживают в течение 48-72 ч.1. A method of producing trichlorosilane, including the hydrochlorination of powdered industrial silicon with hydrogen chloride at elevated pressure in a fluidized bed reactor, subsequent separation of silicon solid particles, condensation of a gas-vapor mixture with the separation of hydrogen and hydrogen chloride, and production of condensate containing chlorosilanes, separation of trichlorosilane from the obtained condensate by methods distillation and "reaction" distillation in the presence of humidified gas inert to chlorosilanes, and processing waste products, characterized in that the technical silicon fraction is subjected to hydrochlorination, containing at least 90% of particles with a size of from 90 to 450 microns and a difference in size not exceeding 250 microns, with all the liquid condensate formed in the hydrochlorination stage at the first the separation stage is subjected to two-stage purification from boron-containing impurities by means of “reactive” distillation and adsorption by passing chlorosilane vapors through a layer of boron-selective ion-exchange resins, and waste generated at all stages of the process and with silicon-containing and its compounds are thermo-hydrolyzed in a hydrogen flame. ! 2. The method according to claim 1, characterized in that before the adsorption, the condensate obtained at the stage of "reactive" distillation is kept for 48-72 hours.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2008128297/15A RU2394762C2 (en) | 2008-07-14 | 2008-07-14 | Method of producing trichlorosilane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2008128297/15A RU2394762C2 (en) | 2008-07-14 | 2008-07-14 | Method of producing trichlorosilane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2008128297A true RU2008128297A (en) | 2010-01-20 |
| RU2394762C2 RU2394762C2 (en) | 2010-07-20 |
Family
ID=42120295
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2008128297/15A RU2394762C2 (en) | 2008-07-14 | 2008-07-14 | Method of producing trichlorosilane |
Country Status (1)
| Country | Link |
|---|---|
| RU (1) | RU2394762C2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108069428A (en) * | 2016-11-18 | 2018-05-25 | 江苏中能硅业科技发展有限公司 | For handling the device and technique of polysilicon by-product slurry |
| WO2019201439A1 (en) | 2018-04-18 | 2019-10-24 | Wacker Chemie Ag | Method for producing chlorosilanes |
| CN113716570A (en) * | 2021-09-30 | 2021-11-30 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5886234B2 (en) | 2013-04-11 | 2016-03-16 | 信越化学工業株式会社 | Silane compound or chlorosilane compound purification method, polycrystalline silicon production method, and weakly basic ion exchange resin regeneration treatment method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3414603A (en) * | 1965-03-16 | 1968-12-03 | Tyco Laboratories Inc | Method of purifying organochlorosilanes |
| DE2546957C3 (en) * | 1975-10-20 | 1980-10-23 | Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen | Process for cleaning halosilanes |
| DE3809784C1 (en) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
| RU2214363C1 (en) * | 2002-04-24 | 2003-10-20 | Открытое акционерное общество "Химпром" | Method of production of chlorosilane |
| RU2280010C1 (en) * | 2004-12-10 | 2006-07-20 | Федеральное государственное унитарное предприятие "Государственный научно-исследовательский и проектный институт редкометаллической промышленности "Гиредмет" | Method of production 0f trichlorosilane |
| JP4780284B2 (en) * | 2005-06-21 | 2011-09-28 | 三菱マテリアル株式会社 | Purification method of silane trichloride |
-
2008
- 2008-07-14 RU RU2008128297/15A patent/RU2394762C2/en not_active IP Right Cessation
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108069428A (en) * | 2016-11-18 | 2018-05-25 | 江苏中能硅业科技发展有限公司 | For handling the device and technique of polysilicon by-product slurry |
| CN108069428B (en) * | 2016-11-18 | 2023-10-10 | 江苏中能硅业科技发展有限公司 | Device and process for treating polysilicon byproduct slag slurry |
| WO2019201439A1 (en) | 2018-04-18 | 2019-10-24 | Wacker Chemie Ag | Method for producing chlorosilanes |
| US11845667B2 (en) | 2018-04-18 | 2023-12-19 | Wacker Chemie Ag | Method for producing chlorosilanes |
| CN113716570A (en) * | 2021-09-30 | 2021-11-30 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
| CN113716570B (en) * | 2021-09-30 | 2023-08-01 | 四川永祥多晶硅有限公司 | Method for improving quality of trichlorosilane |
Also Published As
| Publication number | Publication date |
|---|---|
| RU2394762C2 (en) | 2010-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20160715 |