PT3840024T - MODULE FOR THE CHEMICAL TREATMENT OF A SUBSTRATE - Google Patents
MODULE FOR THE CHEMICAL TREATMENT OF A SUBSTRATEInfo
- Publication number
- PT3840024T PT3840024T PT192185080T PT19218508T PT3840024T PT 3840024 T PT3840024 T PT 3840024T PT 192185080 T PT192185080 T PT 192185080T PT 19218508 T PT19218508 T PT 19218508T PT 3840024 T PT3840024 T PT 3840024T
- Authority
- PT
- Portugal
- Prior art keywords
- module
- substrate
- chemical treatment
- chemical
- treatment
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- H10P70/20—
-
- H10P72/0408—
-
- H10P72/0414—
-
- H10P72/0441—
-
- H10P72/3308—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
-
- H10P72/0416—
-
- H10P72/0426—
Landscapes
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- ing And Chemical Polishing (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP19218508.0A EP3840024B1 (en) | 2019-12-20 | 2019-12-20 | Module for chemically processing a substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PT3840024T true PT3840024T (en) | 2022-04-12 |
Family
ID=69411088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PT192185080T PT3840024T (en) | 2019-12-20 | 2019-12-20 | MODULE FOR THE CHEMICAL TREATMENT OF A SUBSTRATE |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US11938522B2 (en) |
| EP (2) | EP3840024B1 (en) |
| JP (2) | JP7760489B2 (en) |
| KR (1) | KR20220051004A (en) |
| CN (1) | CN114144869A (en) |
| MY (1) | MY195775A (en) |
| PL (1) | PL3840024T3 (en) |
| PT (1) | PT3840024T (en) |
| TW (1) | TWI819302B (en) |
| WO (1) | WO2021121949A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114318285B (en) * | 2021-12-31 | 2022-10-18 | 广东省新兴激光等离子体技术研究院 | Vacuum coating equipment and coating method thereof |
| EP4286560A1 (en) * | 2022-05-31 | 2023-12-06 | Semsysco GmbH | Module kit for a chemical and/or electrolytic surface treatment of a substrate |
| DE102023211090A1 (en) * | 2023-11-08 | 2025-05-08 | Semsysco Gmbh | A CLOSURE SYSTEM FOR A TREATMENT CHAMBER |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6227788U (en) * | 1985-08-06 | 1987-02-19 | ||
| US6240938B1 (en) * | 1996-05-29 | 2001-06-05 | Steag Microtech Gmbh | Device for treating substrates in a fluid container |
| JP2000308857A (en) * | 1999-04-27 | 2000-11-07 | Tokyo Electron Ltd | Method and device for liquid treatment |
| US6457199B1 (en) * | 2000-10-12 | 2002-10-01 | Lam Research Corporation | Substrate processing in an immersion, scrub and dry system |
| US6532974B2 (en) * | 2001-04-06 | 2003-03-18 | Akrion Llc | Process tank with pressurized mist generation |
| US6726848B2 (en) * | 2001-12-07 | 2004-04-27 | Scp Global Technologies, Inc. | Apparatus and method for single substrate processing |
| US20080000495A1 (en) * | 2001-12-07 | 2008-01-03 | Eric Hansen | Apparatus and method for single substrate processing |
| JP3948960B2 (en) * | 2002-01-16 | 2007-07-25 | 東京エレクトロン株式会社 | Ultrasonic cleaning equipment |
| US7156927B2 (en) * | 2002-04-03 | 2007-01-02 | Fsi International, Inc. | Transition flow treatment process and apparatus |
| US6875289B2 (en) * | 2002-09-13 | 2005-04-05 | Fsi International, Inc. | Semiconductor wafer cleaning systems and methods |
| KR20040041763A (en) * | 2002-11-11 | 2004-05-20 | 삼성전자주식회사 | semiconductor wafer washing system and method there of |
| JP2006093334A (en) * | 2004-09-22 | 2006-04-06 | Ses Co Ltd | Substrate processing equipment |
| US7775219B2 (en) * | 2006-12-29 | 2010-08-17 | Applied Materials, Inc. | Process chamber lid and controlled exhaust |
| US20080163890A1 (en) * | 2007-01-10 | 2008-07-10 | Applied Materials, Inc. | Tunable megasonics cavitation process using multiple transducers for cleaning nanometer particles without structure damage |
| JP2009125734A (en) | 2007-11-28 | 2009-06-11 | Nidec Sankyo Corp | Cleaning apparatus |
| JP2010125375A (en) | 2008-11-27 | 2010-06-10 | Nidec Sankyo Corp | Cleaning device |
| KR20100066010A (en) * | 2008-12-09 | 2010-06-17 | 세메스 주식회사 | Method and apparatus for cleaning and drying substrates |
| JP2011165694A (en) | 2010-02-04 | 2011-08-25 | Sumco Corp | Ultrasonic cleaning method and ultrasonic cleaning device for wafer |
| JP5923300B2 (en) * | 2011-12-28 | 2016-05-24 | 株式会社Screenホールディングス | Substrate processing apparatus and substrate processing method |
| JP6040092B2 (en) * | 2013-04-23 | 2016-12-07 | 株式会社荏原製作所 | Substrate plating apparatus and substrate plating method |
| JP2015185632A (en) * | 2014-03-24 | 2015-10-22 | 株式会社荏原製作所 | substrate processing apparatus |
| US11335550B2 (en) * | 2017-09-08 | 2022-05-17 | Acm Research (Shanghai) Inc. | Method and apparatus for cleaning semiconductor wafer |
-
2019
- 2019-12-20 PL PL19218508T patent/PL3840024T3/en unknown
- 2019-12-20 PT PT192185080T patent/PT3840024T/en unknown
- 2019-12-20 EP EP19218508.0A patent/EP3840024B1/en active Active
- 2019-12-20 EP EP22156530.2A patent/EP4016597A1/en not_active Withdrawn
-
2020
- 2020-12-01 JP JP2022508518A patent/JP7760489B2/en active Active
- 2020-12-01 US US17/787,876 patent/US11938522B2/en active Active
- 2020-12-01 KR KR1020227010347A patent/KR20220051004A/en not_active Ceased
- 2020-12-01 MY MYPI2022000527A patent/MY195775A/en unknown
- 2020-12-01 CN CN202080051525.1A patent/CN114144869A/en active Pending
- 2020-12-01 WO PCT/EP2020/084037 patent/WO2021121949A1/en not_active Ceased
-
2021
- 2021-04-30 TW TW110115820A patent/TWI819302B/en active
-
2025
- 2025-06-02 JP JP2025091632A patent/JP2025124795A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| PL3840024T3 (en) | 2022-05-09 |
| JP2022546224A (en) | 2022-11-04 |
| TW202224054A (en) | 2022-06-16 |
| KR20220051004A (en) | 2022-04-25 |
| WO2021121949A1 (en) | 2021-06-24 |
| MY195775A (en) | 2023-02-13 |
| CN114144869A (en) | 2022-03-04 |
| US20230226578A1 (en) | 2023-07-20 |
| US11938522B2 (en) | 2024-03-26 |
| EP3840024A1 (en) | 2021-06-23 |
| TWI819302B (en) | 2023-10-21 |
| JP7760489B2 (en) | 2025-10-27 |
| JP2025124795A (en) | 2025-08-26 |
| EP3840024B1 (en) | 2022-02-16 |
| EP4016597A1 (en) | 2022-06-22 |
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