[go: up one dir, main page]

PL444812A1 - ALD reactor reaction chamber - Google Patents

ALD reactor reaction chamber

Info

Publication number
PL444812A1
PL444812A1 PL444812A PL44481223A PL444812A1 PL 444812 A1 PL444812 A1 PL 444812A1 PL 444812 A PL444812 A PL 444812A PL 44481223 A PL44481223 A PL 44481223A PL 444812 A1 PL444812 A1 PL 444812A1
Authority
PL
Poland
Prior art keywords
ald reactor
reaction chamber
chamber
reactor reaction
input part
Prior art date
Application number
PL444812A
Other languages
Polish (pl)
Inventor
Bartłomiej WITKOWSKI
Marek GODLEWSKi
Original Assignee
Instytut Fizyki Polskiej Akademii Nauk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Instytut Fizyki Polskiej Akademii Nauk filed Critical Instytut Fizyki Polskiej Akademii Nauk
Priority to PL444812A priority Critical patent/PL444812A1/en
Publication of PL444812A1 publication Critical patent/PL444812A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0053—Details of the reactor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Przedmiotem zgłoszenia jest komora reakcyjna reaktora ALD, o zmiennej objętości. Komora ta posiada część wejściową (1), z podłączeniami prekursorów i gazów technicznych oraz część wyjściową (6) z odprowadzeniami gazów poprocesowych do układu pompowego. W komorze tej pomiędzy częścią wejściowa (1) a częścią wyjściowa (6) znajduje się co najmniej jeden wymienny moduł (4) zwiększający długość komory, a tym samym objętość roboczą reaktora ALD.The subject of the application is a reaction chamber of an ALD reactor, with a variable volume. This chamber has an input part (1), with connections for precursors and technical gases, and an output part (6) with discharges of post-process gases to the pumping system. In this chamber, between the input part (1) and the output part (6), there is at least one replaceable module (4) increasing the length of the chamber, and thus the working volume of the ALD reactor.

PL444812A 2023-05-05 2023-05-05 ALD reactor reaction chamber PL444812A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL444812A PL444812A1 (en) 2023-05-05 2023-05-05 ALD reactor reaction chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL444812A PL444812A1 (en) 2023-05-05 2023-05-05 ALD reactor reaction chamber

Publications (1)

Publication Number Publication Date
PL444812A1 true PL444812A1 (en) 2024-11-12

Family

ID=93432687

Family Applications (1)

Application Number Title Priority Date Filing Date
PL444812A PL444812A1 (en) 2023-05-05 2023-05-05 ALD reactor reaction chamber

Country Status (1)

Country Link
PL (1) PL444812A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6174377B1 (en) * 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
WO2016110407A1 (en) * 2015-01-11 2016-07-14 Soleras Advanced Coatings Bvba A cover with a sensor system for a configurable measuring system for a configurable sputtering system
CN115190820A (en) * 2019-12-18 2022-10-14 K·P·穆塞尔曼 Apparatus and method for thin film deposition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6174377B1 (en) * 1997-03-03 2001-01-16 Genus, Inc. Processing chamber for atomic layer deposition processes
WO2016110407A1 (en) * 2015-01-11 2016-07-14 Soleras Advanced Coatings Bvba A cover with a sensor system for a configurable measuring system for a configurable sputtering system
CN115190820A (en) * 2019-12-18 2022-10-14 K·P·穆塞尔曼 Apparatus and method for thin film deposition

Similar Documents

Publication Publication Date Title
Yu et al. On exact and∞-Rényi common informations
Charalambous et al. Minimal systems of binomial generators and the indispensable complex of a toric ideal
PL444812A1 (en) ALD reactor reaction chamber
Karafyllis et al. Global stabilization of nonlinear systems based on vector control Lyapunov functions
Brändén et al. Lorentzian polynomials on cones and the Heron-Rota-Welsh conjecture
Yu et al. Exact channel synthesis
Bao et al. A first order semi-discrete algorithm for backward doubly stochastic differential equations
d'Aquino Local behaviour of the Chebyshev theorem in models of I⊿ 0
Vecchio A bound for the inverse of a lower triangular Toeplitz matrix
Boyadzhiev Binomial transform of products
Strömberg The Hopf-Lax formula gives the unique viscosity solution
Mauth Log-concavity for partitions without sequences
Akdemir et al. On new conformable fractional integral inequalities for product of different kinds of convexity
Xu Some identities connecting Stirling numbers, central factorial numbers and higher-order Bernoulli polynomials
Wang et al. Simple Characteristic Decomposition of Polynomial Sets
Ozaki et al. Accelerating interval matrix multiplication by mixed precision arithmetic
Wang et al. Symmetrical solutions of backward stochastic Volterra integral equations and their applications
Fen et al. A novel criterion for unpredictable motions
Mihoubi et al. A NEW CLASS OF THE T-STIRLING NUMBERS AND THE GENERALIZED BERNOULLI POLYNOMIALS.
Banaschewski On the function rings of pointfree topology
Zahiri et al. Skew generalized power series rings and the McCoy property
Bernays A system of axiomatic set theory. Part V. General set theory (continued) 53
Hou k-Free recurrences of double hypergeometric terms
Mbirika et al. GCD of Sums of k Consecutive Squares of Generalized Fibonacci Numbers
Rabinovich et al. The finite sections approach to the index formula for band-dominated operators