LT5997B - METHOD OF PREPARING PLASTIC SURFACE FOR THEIR CHEMICAL METALIZATION - Google Patents
METHOD OF PREPARING PLASTIC SURFACE FOR THEIR CHEMICAL METALIZATION Download PDFInfo
- Publication number
- LT5997B LT5997B LT2012042A LT2012042A LT5997B LT 5997 B LT5997 B LT 5997B LT 2012042 A LT2012042 A LT 2012042A LT 2012042 A LT2012042 A LT 2012042A LT 5997 B LT5997 B LT 5997B
- Authority
- LT
- Lithuania
- Prior art keywords
- solution
- etching
- plastic
- plastics
- chlorate
- Prior art date
Links
- 239000004033 plastic Substances 0.000 title claims abstract description 46
- 229920003023 plastic Polymers 0.000 title claims abstract description 46
- 239000000126 substance Substances 0.000 title claims abstract description 24
- 238000001465 metallisation Methods 0.000 title claims abstract description 15
- 238000000034 method Methods 0.000 title claims abstract description 9
- 239000000243 solution Substances 0.000 claims abstract description 76
- 238000005530 etching Methods 0.000 claims abstract description 40
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 claims abstract description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 21
- 230000004913 activation Effects 0.000 claims abstract description 15
- 239000007800 oxidant agent Substances 0.000 claims abstract description 9
- 230000001590 oxidative effect Effects 0.000 claims abstract description 7
- 150000002941 palladium compounds Chemical class 0.000 claims abstract description 7
- 150000002940 palladium Chemical class 0.000 claims abstract description 5
- 239000012266 salt solution Substances 0.000 claims abstract description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 claims abstract description 3
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 3
- 230000003213 activating effect Effects 0.000 claims abstract 2
- 229940005989 chlorate ion Drugs 0.000 claims abstract 2
- 230000003647 oxidation Effects 0.000 claims abstract 2
- 238000007254 oxidation reaction Methods 0.000 claims abstract 2
- 238000000576 coating method Methods 0.000 abstract description 13
- 229910052751 metal Inorganic materials 0.000 abstract description 10
- 239000002184 metal Substances 0.000 abstract description 10
- 238000002360 preparation method Methods 0.000 abstract description 7
- 230000000711 cancerogenic effect Effects 0.000 abstract description 2
- 231100000315 carcinogenic Toxicity 0.000 abstract description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 239000004417 polycarbonate Substances 0.000 description 12
- 229920001944 Plastisol Polymers 0.000 description 11
- 239000004999 plastisol Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 7
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 7
- 238000009413 insulation Methods 0.000 description 7
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 6
- 239000000725 suspension Substances 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 4
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 239000012286 potassium permanganate Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 238000005234 chemical deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- 206010007269 Carcinogenicity Diseases 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 231100000260 carcinogenicity Toxicity 0.000 description 1
- 230000007670 carcinogenicity Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000009388 chemical precipitation Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- -1 chlorate ions Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- LBJNMUFDOHXDFG-UHFFFAOYSA-N copper;hydrate Chemical compound O.[Cu].[Cu] LBJNMUFDOHXDFG-UHFFFAOYSA-N 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M sodium chloride Inorganic materials [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229910001488 sodium perchlorate Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/78—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
- C23C18/24—Roughening, e.g. by etching using acid aqueous solutions
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/285—Sensitising or activating with tin based compound or composition
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
- C23C18/405—Formaldehyde
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
lšradimas priskiriamas prie plastikų paviršiaus paruošimo prieš cheminį metalizavimą ir gali būti panaudotas įvairiose pramonės srityse, kur reikalingos dekoratyvinės arba funkcinės metalų dangos ant plastikų. Siūlomo išradimo tikslas yra kokybiškas plastikų paviršiaus paruošimas prieš cheminį metalizavimą kuo mažesnėmis sąnaudomis, ėsdinimo tirpalo aktyvumui išliekant stabiliu ir nenaudojant kancerogeninių ir kitaip žalingų žmogui ir aplinkai medžiagų. Tikslas pasiekiamas tuo, kad plastikų paviršiaus paruošimo prieš cheminį metalizavimą būdas, apimantis plastiko ėsdinimą neorganinės rūgšties tirpalu su oksidatoriumi, aktyvavimą paladžio druskos tirpalu, bei apdorojimą redukuojančiu arba akceleruojančiu tirpalu, siūlomame būde plastiko paviršių ėsdina 0,5-5 g/l tirpaus chlorato tirpalu 50-80 tūrio% sieros rūgštyje, kambario temperatūroje, o prieš aktyvavimą paladžio junginių tirpalu bei apdorojimą redukuojančiu arba akceleruojančiu tirpalu dar apdoroja šarminių metalų hidroksidų tirpalu; papildomai į ėsdinimo tirpalą deda 2-20 g/l kito oksidatoriaus, kurio standartinis oksidacinis potencialas viršija chlorato jonų potencialą.The invention is attributed to the surface preparation of plastics prior to chemical metallization and can be used in various industries where decorative or functional metal coatings on plastics are required. The object of the present invention is to provide a high quality plastics surface prior to chemical metallization at the lowest possible cost, while maintaining the stability of the etching solution without the use of carcinogenic and otherwise harmful substances to humans and the environment. The objective is achieved by the method of preparing the surface of the plastics prior to chemical metallization involving etching the plastic with an inorganic acid solution with an oxidizing agent, activating with a palladium salt solution, and treating with a reducing or accelerating solution in the proposed manner with a 0.5 to 5 g / l soluble chlorate solution. 50-80% by volume of sulfuric acid at room temperature and before the activation of the solution of palladium compounds and treatment with a reducing or accelerating solution is further treated with an alkali metal hydroxide solution; additionally add 2-20 g / l of another oxidant to the etching solution with a standard oxidation potential exceeding the chlorate ion potential.
Description
Išradimas priskiriamas prie plastikų paviršiaus paruošimo prieš cheminį metalizavimą ir gali būti panaudotas įvairiose pramonės srityse, kur reikalingos dekoratyvinės arba funkcinės metalų dangos ant plastikinių detalių.The invention relates to the surface preparation of plastics prior to chemical metallization and can be used in a variety of industrial applications where decorative or functional metal coatings on plastic parts are required.
Tradicinį plastikų paviršiaus paruošimo prieš cheminį metalizavimą, dažniausiai cheminį nikeliavimą, būdą sudaro plastiko ėsdinimas chromo rūgšties tirpalu, po to sekantis aktyvinimas paladžio junginių joniniu arba koloidiniu tirpalu, ir galop, adsorbuotų ant plastiko paviršiaus paladžio jonų arba paladžio koloidinių dalelių atitinkamai redukavimas, dažniausiai natrio hipofosfito tirpalu, arba akceleracija rūgščiu, dažniausiai druskos rūgšties, tirpalu.The conventional method of surface preparation of plastics prior to chemical metallization, usually chemical nickelization, involves etching the plastic with chromic acid solution followed by activation with an ionic or colloidal solution of palladium compounds and, eventually, reducing adsorbed on the plastic surface with palladium or palladium colloidal particles. solution, or acid acceleration, usually hydrochloric acid solution.
Ėsdinimas reikalingas suteikti paviršiui hidrofiliškumą, kad kitose proceso stadijose jis drėkintųsi vandeniniais tirpalais, adsorbuodamas pakankamus paladžio druskų kiekius, ir užtikrinti gerą metalo dangos sukibimą su plastiku. Aktyvavimas su po to sekančiu redukavimu arba akceleracija atliekamas tam, kad ant plastiko paviršiaus prasidėtų cheminis metalo nusėdimas. Po to dengimasis metalu cheminio metalizavimo tirpale jau vyksta autokatalitiškai, t.y. pradžioje susiformavęs metalo sluoksnis katalizuoja tolimesnį metalo nusėdimą.Etching is required to give the surface hydrophilicity so that, at other stages of the process, it is wetted with aqueous solutions by adsorbing sufficient amounts of palladium salts and ensuring good adhesion of the metal coating to the plastic. Activation with subsequent reduction or acceleration is performed to initiate chemical deposition of the metal on the plastic surface. After that, the metal plating in the chemical metallization solution is already autocatalytic, i.e. the metal layer formed at the beginning catalyzes further metal deposition.
Pagrindiniai tradicinio būdo trūkumai yra chromo rūgšties ėsdinimo tirpalo kancerogeniškumas bei dažnai pasitaikantis cheminis metalo, dažniausiai nikelio, nusėdimas ant izoliuotų plastizoliu plokštelių pakabos dalių, dėl ko patiriami metalų nuostoliai tolimesniuose galvaninio dangos formavimo tirpaluose.The main disadvantages of the conventional method are the carcinogenicity of the chromic acid etching solution and the frequent chemical deposition of the metal, usually nickel, on the insulated portions of the plastisol plate suspensions, which results in metal losses in further electroplating solutions.
Artimiausias siūlomam išradimui yra plastikų paviršiaus paruošimo būdas (žiūr. US paraiška 2005/0199587 Al), apimantis plastiko ėsdinimą rūgščiu, turinčiu 20-70 g/l kalio permanganato, tirpalu. Optimali KMnO4 koncentracija minėtame tirpale - apie 50 g/l. Kai koncentracija mažesnė negu 20 g/l - tirpalas neefektyvus, o viršutinę koncentracijos ribą sąlygoja kalio permanganato tirpumas. Po ėsdinimo, aktyvuojama paladžio druskos tirpalu su amino priedu, o vėliau plastikas apdorojamas reduktoriaus, pavyzdžiui, borhidrido, hipofosfito ar hidrazino tirpalu. Tačiau šis būdas turi esminių trūkumų:The closest embodiment of the present invention is a method of surface preparation of plastics (see U.S. Patent Application 2005/0199587 A1) which involves etching the plastic with an acid containing 20-70 g / l potassium permanganate solution. The optimal concentration of KMnO 4 in said solution is about 50 g / l. At concentrations below 20 g / l, the solution is ineffective and the upper limit is due to the solubility of potassium permanganate. After etching, it is activated with a palladium salt solution with an amino additive, and the plastic is then treated with a reducing agent such as borohydride, hypophosphite or hydrazine. However, this approach has its drawbacks:
- pirma: esant didelei permanganato koncentracijai ėsdinimo tirpale (rekomenduojama apie 50 g/l ir esant apie 45 tūrio% fosforo rūgšties), permanganatas labai greitai suskyla, ypač padidintoje temperatūroje (tai pažymėta išradimo aprašyme). Rekomenduojama temperatūra yra 100 °F, t.y. 37 °C. Kaip parodė atlikti bandymai, šioje temperatūroje tirpalas pasidaro neveiksmingas jau po 4 - 6 valandų, t.y. nedrėkina plastiko paviršiaus ir jis metalizacijos metu pasidengia ne visu plotu, o pasidengusioje vietoje metalo sukibimas su plastiku labai silpnas. Tirpalą tenka dažnai koreguoti naujomis nepigaus kalio permanganato porcijomis. Be to, susidaro netirpūs permanganato skilimo produktai, teršiantys metalizuojamą paviršių;- first: at high concentrations of permanganate in etching solution (about 50 g / l recommended and about 45% by volume of phosphoric acid), permanganate is rapidly degraded, especially at elevated temperatures (as noted in the specification). The recommended temperature is 100 ° F, i.e. 37 ° C. As shown by the tests performed at this temperature, the solution becomes ineffective after 4-6 hours, i.e. it does not wet the surface of the plastic and it does not cover the whole area during metallization, but the adhesion of the metal to the plastic in the exposed area is very weak. The solution often has to be adjusted with new portions of non-cheap potassium permanganate. In addition, insoluble permanganate decomposition products are formed, contaminating the metallizable surface;
- antra; ėsdinimas permanganatiniuose tirpaluose aktyvina plastizolinės pakabų izoliacijos paviršių, kadangi ėsdinimo metu šis pasidengia ėsdinimo reakcijos produktu - mangano dioksidu. Mangano dioksidas skatina paladžio junginių adsorbciją ant plastizolio ir todėl pastarasis linkęs metalizuotis cheminio metalų nusodinimo tirpaluose. Mangano dioksido susidarymas ant įvairių paviršių būdingas bet kokios sudėties permanganatiniams ėsdinimo tirpalams. Taip lieka neišspręstas labai svarbus, tausojantis metalus toliau, sekančio galvaninio dangos storinimo metu tikslas, - plastizolinės pakabų izoliacijos nesimetalizavimas.- second; etching in permanganese solutions activates the surface of the plastisol hanger insulation as it is exposed to the etching reaction product manganese dioxide during etching. Manganese dioxide promotes the adsorption of palladium compounds on plastisol and, as a result, the latter tends to be metallised in chemical precipitation solutions. The formation of manganese dioxide on various surfaces is typical of permanganate etching solutions of any composition. Thus, the very important goal of metal-sparing further, in the next galvanic coating thickening, remains unsymmetrical plastisol suspension insulation.
Siūlomo išradimo tikslas yra kokybiškas plastikų paviršiaus paruošimas prieš cheminį metalizavimą kuo mažesnėmis sąnaudomis, ėsdinimo tirpalo aktyvumui išliekant stabiliu ir nenaudojant kancerogeninių ir kitaip žalingų žmogui ir aplinkai medžiagų.The object of the present invention is to provide a high quality surface preparation of plastics prior to chemical metallization at the lowest possible cost, while maintaining the activity of the etching solution stable and free of carcinogenic and otherwise harmful substances for humans and the environment.
Tikslas pasiekiamas tuo, kad plastikų paviršiaus paruošimo prieš cheminį metalizavimą būdas, apimantis plastiko ėsdinimą neorganinės rūgšties tirpalu su oksidatoriumi, aktyvavimą paladžio druskos tirpalu, bei apdorojimą redukuojančiu arba akceleruojančiu tirpalu, siūlomame būde plastiko paviršių ėsdina 0,5-5 g/1 tirpaus chlorato tirpalu 50-80 tūrio% sieros rūgštyje, kambario temperatūroje, o prieš aktyvavimą paladžio junginių tirpalu bei apdorojimą redukuojančiu arba akseleruojančiu tirpalu, dar apdoroja šarminių metalų hidroksidų tirpalu; papildomai į ėsdinimo tirpalą deda 2-20 g/1 kito oksidatoriaus kurio standartinis oksidacinis potencialas viršija chlorato potencialą.The object is achieved by a method of preparing the surface of plastics prior to chemical metallization, which comprises etching the plastic with an inorganic acid solution with an oxidant, activation with palladium salt solution and treatment with a reducing or accelerating solution, etching the plastic surface with 0.5-5 g / l soluble chlorate solution. 50-80% by volume in sulfuric acid at room temperature and further treatment with an alkali metal hydroxide solution before activation with palladium compound solution and treatment with a reducing or accelerating solution; additionally add 2-20 g / l of another oxidizing agent with a standard oxidizing potential above the chlorate potential to the etching solution.
Šarminio metalo chloratas sudaro su sieros rūgšties molekulėmis geltonos spalvos junginį, kurio normalinio oksidacinio potencialo dydžio H2SO4 tirpalo terpėje pakanka reakcijai su plastikų paviršiumi kambario temperatūroje. Šios reakcijos dėka plastiko paviršius tampa hidrofilišku ir adsorbuojančiu paladžio junginius pakankamai stipriai. Geltonos spalvos chlorato ir sieros rūgšties reakcijos produktas yra paladžio katalizatoriaus nuodas. Ėsdinimo metu šis junginys įsiskverbia į plastizolinės pakabų izoliacijos paviršinius sluoksnius ir neleidžia cheminės metalizacijos tirpaluose metalui nusėsti ant plastizolio, tačiau netrukdo šiam procesui vykti ant metalizuojamo plastiko paviršiaus.The alkali metal chlorate forms a yellow compound with sulfuric acid molecules which is capable of reacting with the surface of plastics at room temperature in the presence of a solution of normal oxidative potential in an H 2 SO 4 solution. As a result of this reaction, the plastic surface becomes hydrophilic and adsorbs the palladium compounds sufficiently strongly. The product of the reaction of yellow chlorate with sulfuric acid is a palladium catalyst poison. During etching, this compound penetrates the surface layers of the plastisol hanger insulation and prevents the metal from settling on the plastisol in chemical metallization solutions, but does not interfere with the process on the metallizable plastic surface.
Ištirpinus ėsdinimo tirpale 1-2 g/l natrio arba kalio chlorato ir dar papildomai ištirpinus ten pat 5-10 g/l stipraus oksidatoriaus, pavyzdžiui, NaBiO3, ėsdinamosios tirpalo savybės kambario temperatūroje išlieka kelias dienas ir leidžia naudoti tirpalą jo nekoreguojant. Tuo atveju, jeigu tirpale yra tik natrio arba kalio chloratas, tirpalo ėsdinamosios savybės išlieka gerokai trumpiau ir neviršija 1 paros.After dissolving 1-2 g / l of sodium or potassium chloride in etching solution and further dissolving there 5-10 g / l of a strong oxidizing agent such as NaBiO3, the corrosive properties of the solution remain at room temperature for several days and allow the solution to be used without correction. If the solution contains only sodium or potassium chlorate, the corrosive properties of the solution remain significantly shorter and do not exceed 1 day.
Svarbus siūlomo būdo bruožas, lyginant su permanganatiniu ėsdinimu yra tas, kad gaunamos labai didelės dangų sukibimo su plastiku (adhezijos) stiprumo reikšmės, neretai viršijančios 1,2-1,3 kg/cm. Šios reikšmės priklauso ne tik nuo ėsdinimo tirpalo sudėties ir ėsdinimo laiko (kiekvienai ėsdinimo tirpalo sudėčiai egzistuoja optimalus adhezijos atžvilgiu ėsdinimo laikas), bet ir nuo aktyvavimo tirpalo sudėties. Paprastai, panaudojant tikruosius aktyvavimo tirpalus, adhezijos reikšmės didesnės, negu koloidinių aktyvavimo tirpalų atveju.An important feature of the proposed process compared to permanganate etching is that very high adhesion strength values of the coatings, often exceeding 1.2-1.3 kg / cm, are obtained. These values depend not only on the etching solution composition and etching time (for each etching solution composition, there is an optimum etching time for adhesion) but also on the activation solution composition. Usually, with true activation solutions, adhesion values are higher than with colloidal activation solutions.
Ėsdinimo tirpalą gauna sekančiu būdu:The etching solution is obtained as follows:
J 300 ml dejonizuoto vandens supila maišant 700 ml koncentruotos sieros rūgšties, leidžia tirpalui atvėsti. Po to tirpale ištirpina 2 g kalio chlorato ir dar papildomai 10 g natrio perchlorato. Tirpalas paruoštas naudojimui.Add 300 ml of deionised water with 700 ml of concentrated sulfuric acid, allowing the solution to cool. Subsequently, 2 g of potassium chlorate and 10 g of sodium perchlorate are dissolved in the solution. The solution is ready for use.
Kada tirpalo pagaminimui naudoja daugiau vandens, negu 50 tūrio%, lyginant su sieros rūgštimi, geltonos spalvos oksiduojantis plastiką junginys tarp chlorato jonų ir sieros rūgšties molekulių nesusidaro, todėl tirpale vandens gali būti ne daugiau, negu 50 tūrio%.When using more than 50% by volume of water for the preparation of the solution compared to sulfuric acid, the yellow oxidizing plastic does not form a compound between the chlorate ions and the sulfuric acid molecules, so that no more than 50% by volume of water can be present.
Kai tirpalo pagaminimui naudoja vandens mažiau, negu 20 tūrio %, lyginant su sieros rūgštimi, plastikų paviršius ėsdinimo metu suardomas dėl per didelės sieros rūgšties koncentracijos, ir todėl sukibimo tarp cheminio nikelio dangos ir plastiko nebegauname.When using less than 20% water by volume as sulfuric acid in the solution, the surface of the plastics is destroyed during etching due to the excessive concentration of sulfuric acid, and as a result the adhesion between the nickel chemical coating and the plastic is lost.
Jeigu tirpale ištirpina mažiau kalio chlorato, negu 0,5 g/l, plastiką ėsdinti tenka ilgiau negu 15 min ir todėl tokia koncentracija nepriimtina.If less than 0.5 g / l of potassium chlorate is dissolved in the solution, it will take more than 15 minutes for the plastic to corrode and such concentration is unacceptable.
Jeigu tirpale ištirpina kalio chlorato daugiau negu 5 g/l, plastiką ėsdinant minimalų laiką, t.y. 2-3 min, pasireiškia jo perėsdinimas, dėl ko sukibimo stiprumas žymiai mažesnis, todėl tokia didelė chlorato koncentracija taip pat nepriimtina.If more than 5 g / l of potassium chlorate is dissolved in the solution, the plastic will be etched for a minimum time, i.e. After 2-3 minutes, it becomes overstated, which results in a significantly lower adhesion strength, which is why such high chlorate concentration is also unacceptable.
PavyzdžiaiExamples
Plastikus ABS (akrilo-nitril butadien-stirolo kopolimeras) ir PC/ABS (55 % akrilo-nitril butadien-stirolo kopolimero ir 45 % polikarbonato mišinys) ėsdina pagal JAV paraišką patentui 2005/0199587 A1: 45 tūrio% fosforo rūgštyje, turinčioje 50 g/l KMnC>4 esant 37 °C temperatūrai 5 min (ABS plastikui) arba 15 min (PC/ABS plastikui) arba ėsdina 1-12 min 0,5-5 g/l KCIO3 ir 2-20 g/l papildomo oksidatoriaus turinčioje 50-80 tūrio% sieros rūgštyje, 20 °C temperatūroje. Po ėsdinimo plastikus pamerkia 1-2 min į kambario temperatūros neutralizavimo tirpalą, turintį 10 g/l NaOH ir toliau aktyvuoja tikrajame (5 min esant 20 °C temperatūrai) arba koloidiniame (2 min esant 35 °C) paladžio junginių tirpale (koloidinis tirpalas yra kompanijos D0W Chemicals firminis tirpalas). Tikrajame tirpale PdCI2 koncentracija yra 0,1 g/l, tirpalo pH 2,7. Po aktyvacijos tikrajame Pd tirpale plastikus išlaiko 5 min esant 60 °C temperatūrai tirpale, turinčiame 20 g/l natrio hipofosfito, kai tirpalo pH 9. Po aktyvacijos firminiame koloidiniame tirpale, plastikus apdoroja 2 min kompanijos D0W Chemicals firminiame akceleravimo tirpale, esant 40 °C temperatūrai. Po to plastikus dengia cheminiu nikeliu pagal kompanijos D0W Chemicals technologiją „Niposit-PM“. Dengimosi kokybę vertina pagal tai, ar visas plastiko paviršius dengiasi, ar nesidengia plastizoliu izoliuota pakabos dalis ir koks dangos sukibimo su plastiku stiprumas (adhezija), Adhezijai įvertinti Ni dangos sluoksnis storinamas galvaninėje variavimo vonioje ir matuojama jėga, reikalinga atplėšti 1 cm pločio dangos juostelei nuo plastiko (kg/cm). ABS pavyzdžiams ėsdinimo laikas permanganatiniame tirpale buvo 5 min, PC/ABS pavyzdžiams - 15 min. Visiems pavyzdžiams ėsdinimo laikas chloratiniame tirpale buvo 5 min. Plastikų paruošimo metalizacijai sąlygos ir metalizacijos (cheminio nikeliavimo) rezultatai pateikti lentelėje.Corrosion of plastic ABS (acrylic-nitrile butadiene-styrene copolymer) and PC / ABS (55% acrylic-nitrile butadiene-styrene copolymer and 45% polycarbonate) according to US patent application 2005/0199587 A1: 45% by volume in phosphoric acid containing 50 g / l KMnC> 4 at 37 ° C for 5 min (ABS plastic) or 15 min (PC / ABS plastic) or corrosive for 1-12 min at 0.5-5 g / l KCIO3 and 2-20 g / l in auxiliary oxidant 50-80% by volume in sulfuric acid at 20 ° C. After etching, the plastic is immersed for 1-2 min in a room temperature neutralization solution containing 10 g / l NaOH and further activated in true (5 min at 20 ° C) or colloidal (2 min at 35 ° C) palladium compounds (colloidal solution is D0W Chemicals Branded Solution). The stock solution has a concentration of 0.1 g / l PdCl 2 and a pH of 2.7. After activation in true Pd solution, the plastics are kept for 5 min at 60 ° C in a solution containing 20 g / l sodium hypophosphite at pH 9. After activation in branded colloidal solution, the plastics are treated for 2 min in D0W Chemicals branded accelerator solution at 40 ° C. temperature. The plastics are then coated with chemical nickel in accordance with Niposit-PM technology from D0W Chemicals. The coating quality is assessed by the extent to which the plastic surface is covered or not by the plastisol insulated suspension and the adhesion strength of the coating. To assess adhesion, the Ni coating is thickened in a galvanic drive bath and the force required to tear a 1 cm wide strip of coating is measured. plastic (kg / cm). The etching time in the permanganate solution was 5 min for the ABS samples and 15 min for the PC / ABS samples. For all samples, the etching time in chlorine solution was 5 min. Preparation conditions for plastics and metallization (chemical nickel) results are shown in the table.
LentelėTable
* Aktyvavimas koloidiniame DOW firmos tirpale (likusieji aktyvuoti joniniame aktyvavimo tirpale)* Activation in colloidal DOW solution (remaining activated in ionic activation solution)
Iš pateiktų 1-4 pavyzdžių matosi, kad permanganatinio ėsdinimo atveju plastizolinė pakabos izoliacija dalinai pasidengia cheminiu nikeliu, tuo tarpu chloratinio ėsdinimo atveju plastizolinė izoliacija išlieka švari. Be to, tiek naudojant joninį aktyvavimo tirpalą, tiek koloidinį, gaunamos Ni dangos adhezijos su ABS plastiku reikšmės gerokai aukštesnės chloratinio ėsdinimo atveju.Examples 1-4 show that in the case of permanganate etching, the plastisol suspension insulation is partially covered with chemical nickel, while in the case of chlorate etching, the plastisol insulation remains clean. In addition, both ionic activation solution and colloidal give significantly higher values of Ni coating adhesion to ABS plastic in the case of chlorate etching.
PC/ABS plastiko cheminio nikeliavimo atveju (pavyzdžiai 5-8) stebimi tie patys rezultatai - chloratinio ėsdinimo atveju plastizolinė pakabos izoliacija visiškai nepasidengia, o gaunamos adhezijos reikšmės gerokai aukštesnės, ypač jeigu naudojamas joninis aktyvavimo tirpalas.For PC / ABS plastic nickel plating (Examples 5-8), the same results are observed - in the case of chlorate etching, the plastisol suspension insulation is completely uncoated and the resulting adhesion values are significantly higher, especially when using an ionic activation solution.
Tuo atveju, jeigu KCIO3 koncentracija ėsdinimo tirpale nesiekia 0,5 g/l, ABS plastikas nepasidengia cheminiu nikeliu arba pasidengia nepilnai (9 pavyzdys). Tuo atveju, jeigu KCIO3 koncentracija viršija 5 g/l (10 pavyzdys), po 5 min. ėsdinimo ABS plastikas yra perėsdintas, todėl adhezijos su chemine Ni danga reikšmė yra gerokai mažesnė (nepakankama praktiniam panaudojimui). Analogiški rezultatai išėjus iš rekomenduojamų KCIO3 koncentracijos ribų gaunami ir PC/ABS plastiko metalizacijos atveju (11-12 pavyzdžiai).In the case that the concentration of KCIO3 in the etching solution is less than 0.5 g / l, the ABS plastic is not covered with chemical nickel or not completely covered (Example 9). If the concentration of KCIO3 exceeds 5 g / l (Example 10), after 5 min. The etching ABS plastic is over-etched, so the value of chemical Ni coating adhesion is significantly lower (not enough for practical applications). Similar results at the recommended concentration range of KCIO 3 are obtained for PC / ABS plastic metallization (Examples 11-12).
Tuo atveju, jeigu ėsdinimo tirpale H2SO4 tūrio % koncentracija mažesnė negu 50, ėsdintojas yra nepakankamai efektyvus, ir todėl plastikas nepasidengia cheminiu nikeliu arba pasidengia nepilnai (13 pavyzdys). Kai H2SO4 tūrio % koncentracija viršija 80 (14 pavyzdys), plastikas perėsdinamas ir todėl cheminio nikelio dangos sukibimas su plastiku nepakankamas.In the case of a solution containing less than 50% H 2 SO 4 by volume in the etching solution, the etching agent is ineffective and therefore the plastic is not coated with nickel or incompletely coated (Example 13). When the concentration of H 2 SO 4 is greater than 80% by volume (Example 14), the plastic is over-etched and therefore the adhesion of the chemical nickel coating to the plastic is insufficient.
IŠRADIMO APIBRĖŽTISDEFINITION OF INVENTION
Claims (2)
Priority Applications (12)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LT2012042A LT5997B (en) | 2012-06-05 | 2012-06-05 | METHOD OF PREPARING PLASTIC SURFACE FOR THEIR CHEMICAL METALIZATION |
| KR1020147034195A KR102130947B1 (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| US14/399,987 US20150129540A1 (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| JP2015515506A JP6180518B2 (en) | 2012-06-05 | 2013-06-05 | Method for metallizing non-conductive plastic surfaces |
| PL13727595.4T PL2855731T3 (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| BR112014029353-8A BR112014029353B1 (en) | 2012-06-05 | 2013-06-05 | process for metallizing non-conductive plastic surfaces |
| EP13727595.4A EP2855731B1 (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| ES13727595.4T ES2575001T3 (en) | 2012-06-05 | 2013-06-05 | Procedure to metallize non-conductive plastic surfaces |
| CN201380029727.6A CN104364421B (en) | 2012-06-05 | 2013-06-05 | Method for metallizing non-conductive plastic surfaces |
| PT137275954T PT2855731E (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| CA2875323A CA2875323C (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
| PCT/EP2013/061568 WO2013182590A1 (en) | 2012-06-05 | 2013-06-05 | Process for metallizing nonconductive plastic surfaces |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| LT2012042A LT5997B (en) | 2012-06-05 | 2012-06-05 | METHOD OF PREPARING PLASTIC SURFACE FOR THEIR CHEMICAL METALIZATION |
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| LT2012042A LT2012042A (en) | 2013-12-27 |
| LT5997B true LT5997B (en) | 2014-02-25 |
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| LT2012042A LT5997B (en) | 2012-06-05 | 2012-06-05 | METHOD OF PREPARING PLASTIC SURFACE FOR THEIR CHEMICAL METALIZATION |
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| US (1) | US20150129540A1 (en) |
| EP (1) | EP2855731B1 (en) |
| JP (1) | JP6180518B2 (en) |
| KR (1) | KR102130947B1 (en) |
| CN (1) | CN104364421B (en) |
| BR (1) | BR112014029353B1 (en) |
| CA (1) | CA2875323C (en) |
| ES (1) | ES2575001T3 (en) |
| LT (1) | LT5997B (en) |
| PL (1) | PL2855731T3 (en) |
| PT (1) | PT2855731E (en) |
| WO (1) | WO2013182590A1 (en) |
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|---|---|---|---|---|
| LT6070B (en) | 2012-12-07 | 2014-09-25 | Atotech Deutschland Gmbh | Preparation of plastic surface for chemical metallization process |
| WO2015183304A1 (en) * | 2014-05-30 | 2015-12-03 | Uab Rekin International | Chrome-free adhesion pre-treatment for plastics |
| US9506150B2 (en) | 2014-10-13 | 2016-11-29 | Rohm And Haas Electronic Materials Llc | Metallization inhibitors for plastisol coated plating tools |
| EP3181726A1 (en) | 2015-12-18 | 2017-06-21 | ATOTECH Deutschland GmbH | Etching solution for treating nonconductive plastic surfaces and process for etching nonconductive plastic surfaces |
| US20200087791A1 (en) * | 2017-06-01 | 2020-03-19 | Jcu Corporation | Multi-stage resin surface etching method, and plating method on resin using same |
| FR3074808B1 (en) | 2017-12-13 | 2020-05-29 | Maxence RENAUD | GALVANOPLASTY TOOLS |
| CN108624907A (en) * | 2018-04-26 | 2018-10-09 | 复旦大学 | Nonmetal basal body efficient catalytic electrode and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050199587A1 (en) | 2004-03-12 | 2005-09-15 | Jon Bengston | Non-chrome plating on plastic |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52112668A (en) * | 1976-03-18 | 1977-09-21 | Sony Corp | Etching solution for plastics |
| US4919768A (en) * | 1989-09-22 | 1990-04-24 | Shipley Company Inc. | Electroplating process |
| US5160600A (en) * | 1990-03-05 | 1992-11-03 | Patel Gordhanbai N | Chromic acid free etching of polymers for electroless plating |
| US6512182B2 (en) * | 2001-03-12 | 2003-01-28 | Ngk Spark Plug Co., Ltd. | Wiring circuit board and method for producing same |
| DE10259187B4 (en) * | 2002-12-18 | 2008-06-19 | Enthone Inc., West Haven | Metallization of plastic substrates and solution for pickling and activation |
| LT2008082A (en) * | 2008-10-28 | 2010-05-25 | Chemijos Institutas | Process for etching polyimide and other plastics |
| JP5552269B2 (en) * | 2009-07-02 | 2014-07-16 | トヨタ自動車株式会社 | Electroless plating method |
| CN102409320B (en) * | 2011-11-29 | 2015-02-25 | 沈阳工业大学 | Electroplating pretreatment method for acrylonitrile butadiene styrene (ABS) plastic surface |
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2012
- 2012-06-05 LT LT2012042A patent/LT5997B/en not_active IP Right Cessation
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2013
- 2013-06-05 US US14/399,987 patent/US20150129540A1/en not_active Abandoned
- 2013-06-05 CA CA2875323A patent/CA2875323C/en active Active
- 2013-06-05 CN CN201380029727.6A patent/CN104364421B/en not_active Expired - Fee Related
- 2013-06-05 JP JP2015515506A patent/JP6180518B2/en active Active
- 2013-06-05 EP EP13727595.4A patent/EP2855731B1/en not_active Not-in-force
- 2013-06-05 ES ES13727595.4T patent/ES2575001T3/en active Active
- 2013-06-05 PT PT137275954T patent/PT2855731E/en unknown
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- 2013-06-05 BR BR112014029353-8A patent/BR112014029353B1/en not_active IP Right Cessation
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Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050199587A1 (en) | 2004-03-12 | 2005-09-15 | Jon Bengston | Non-chrome plating on plastic |
Also Published As
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|---|---|
| CN104364421B (en) | 2017-07-21 |
| JP2015518924A (en) | 2015-07-06 |
| CN104364421A (en) | 2015-02-18 |
| US20150129540A1 (en) | 2015-05-14 |
| CA2875323A1 (en) | 2013-12-12 |
| CA2875323C (en) | 2020-08-25 |
| LT2012042A (en) | 2013-12-27 |
| ES2575001T3 (en) | 2016-06-23 |
| KR102130947B1 (en) | 2020-07-08 |
| PL2855731T3 (en) | 2016-09-30 |
| EP2855731B1 (en) | 2016-03-23 |
| JP6180518B2 (en) | 2017-08-16 |
| WO2013182590A1 (en) | 2013-12-12 |
| EP2855731A1 (en) | 2015-04-08 |
| KR20150024327A (en) | 2015-03-06 |
| PT2855731E (en) | 2016-06-15 |
| BR112014029353A2 (en) | 2017-06-27 |
| BR112014029353B1 (en) | 2021-04-20 |
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| MM9A | Lapsed patents |
Effective date: 20240605 |