KR970024303A - 액정 표시 장치용 박막 트랜지스터 기판 및 그 제조 방법 - Google Patents
액정 표시 장치용 박막 트랜지스터 기판 및 그 제조 방법 Download PDFInfo
- Publication number
- KR970024303A KR970024303A KR1019950035200A KR19950035200A KR970024303A KR 970024303 A KR970024303 A KR 970024303A KR 1019950035200 A KR1019950035200 A KR 1019950035200A KR 19950035200 A KR19950035200 A KR 19950035200A KR 970024303 A KR970024303 A KR 970024303A
- Authority
- KR
- South Korea
- Prior art keywords
- gate electrode
- insulating
- thin film
- transistor substrate
- film transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/031—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT]
- H10D30/0312—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] characterised by the gate electrodes
- H10D30/0314—Manufacture or treatment of FETs having insulated gates [IGFET] of thin-film transistors [TFT] characterised by the gate electrodes of lateral top-gate TFTs comprising only a single gate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6713—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device characterised by the properties of the source or drain regions, e.g. compositions or sectional shapes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
- H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
- H10D30/6731—Top-gate only TFTs
-
- H10P34/42—
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thin Film Transistor (AREA)
Abstract
Description
Claims (11)
- 기판 위에 형성되어 있는 다결정 실리콘막, 상기 다결정 실리콘막 위에 형성되어 있는 게이트 절연막, 상기 게이트 절연막 위에 형성되어 있는 게이트 전극, 상기 게이트 전극 위에 형성되어 있는 상기 게이트 전극의 손상을 방지하는 절연막을 포함하는 액정 표시 장치용 박막 트랜지스터 기판.
- 제1항에서, 상기 절연막은 레이저 빔을 투과할 수 있는 절연 물질로 형성되어 있는 액정표시 장치용 박막 트랜지스터 기판.
- 제1항에서, 상기 절연막은 밴드 갭이 조사 레이져의 에너지 밴드갭 보다 큰 절연 물질로 형성되어 있는 액정 표시 장치용 박막 트랜지스터 기판.
- 제1항에서, 상기 절연막은 SiO2로 형성되어 있는 액정 표시 장치용 박막 트랜지스터 기판.
- 제1항에서, 상기 절연막은 SiNx로 형성되어 있는 액정 표시 장치용 박막 트랜지스터 기판.
- 기판 위에 다결정 실리콘막을 형성하는 단계, 상기 다결정 실리콘막 위에 게이트 절연막을 형성하는 단계, 상기 절연막 위에 금속층을 적층하는 단계, 상기 금속층 위에 상기 레이저 빔을 투과시키고 게이트 전극의 손상을 방지하는 절연막을 적층하는 단계, 상기 금속층과 상기 절연막을 동시에 패터닝하는 단계, 상기 액티브층의 소스/드레인 영역에 불순물 이온 주입하는 단계, 상기 소스/드레인 영역에 이온 주입된 불순물을 레이저를 이용하여 어닐닝하는 단계, 를 포함하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.
- 제6항에서, 상기 절연막은 레이저 빔을 투과할 수 있는 절연 물질로 형성하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.
- 제6항에서, 상기 절연막은 밴드 갭이 조사 레이저 에너지 밴드 갭 보다 큰 절연 물질로 형성하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.
- 제6항에서, 상기 절연막은 SiO2로 형성하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.
- 제6항에서, 상기 절연막은 SiNx로 형성하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.
- 제6항에서, 상기 어닐닝하기 위해 조사하는 대표적인 레이저 빔으로 XeCl을 사용하는 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950035200A KR100188090B1 (ko) | 1995-10-12 | 1995-10-12 | 액정 표시 장치용 박막 트랜지스터 기판의 및 그 제조방법 |
| TW085110952A TWI246620B (en) | 1995-10-12 | 1996-09-07 | A thin film transistor for liquid crystal display and a method for manufacturing the same |
| JP27048196A JP3774278B2 (ja) | 1995-10-12 | 1996-10-14 | 液晶表示装置用薄膜トランジスタ基板の製造方法 |
| JP2005172379A JP4312741B2 (ja) | 1995-10-12 | 2005-06-13 | 液晶表示装置用薄膜トランジスタ基板およびその製造方法 |
| JP2008232509A JP2009048199A (ja) | 1995-10-12 | 2008-09-10 | 液晶表示装置用薄膜トランジスタ基板およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950035200A KR100188090B1 (ko) | 1995-10-12 | 1995-10-12 | 액정 표시 장치용 박막 트랜지스터 기판의 및 그 제조방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR970024303A true KR970024303A (ko) | 1997-05-30 |
| KR100188090B1 KR100188090B1 (ko) | 1999-07-01 |
Family
ID=19430017
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950035200A Expired - Lifetime KR100188090B1 (ko) | 1995-10-12 | 1995-10-12 | 액정 표시 장치용 박막 트랜지스터 기판의 및 그 제조방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (3) | JP3774278B2 (ko) |
| KR (1) | KR100188090B1 (ko) |
| TW (1) | TWI246620B (ko) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3318285B2 (ja) | 1999-05-10 | 2002-08-26 | 松下電器産業株式会社 | 薄膜トランジスタの製造方法 |
| KR101781175B1 (ko) * | 2015-08-31 | 2017-09-22 | 가천대학교 산학협력단 | 초박막 저결정성 실리콘 채널을 갖는 무접합 전계효과 트랜지스터 및 그 제조방법 |
| WO2019244665A1 (ja) * | 2018-06-22 | 2019-12-26 | 住友重機械工業株式会社 | 半導体装置のレーザーアニール方法、半導体装置、レーザーアニール方法、レーザーアニール装置の制御装置およびレーザーアニール装置 |
| CN109920731B (zh) * | 2019-03-20 | 2021-03-19 | 上海华虹宏力半导体制造有限公司 | 多晶硅薄膜晶体管及其制作方法 |
| CN115497816B (zh) * | 2022-10-19 | 2023-10-17 | 弘大芯源(深圳)半导体有限公司 | 一种半导体场效应集成电路及制备方法 |
-
1995
- 1995-10-12 KR KR1019950035200A patent/KR100188090B1/ko not_active Expired - Lifetime
-
1996
- 1996-09-07 TW TW085110952A patent/TWI246620B/zh not_active IP Right Cessation
- 1996-10-14 JP JP27048196A patent/JP3774278B2/ja not_active Expired - Fee Related
-
2005
- 2005-06-13 JP JP2005172379A patent/JP4312741B2/ja not_active Expired - Fee Related
-
2008
- 2008-09-10 JP JP2008232509A patent/JP2009048199A/ja not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| KR100188090B1 (ko) | 1999-07-01 |
| JP2009048199A (ja) | 2009-03-05 |
| TWI246620B (en) | 2006-01-01 |
| JP4312741B2 (ja) | 2009-08-12 |
| JP3774278B2 (ja) | 2006-05-10 |
| JPH09133928A (ja) | 1997-05-20 |
| JP2005326867A (ja) | 2005-11-24 |
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St.27 status event code: N-4-6-H10-H14-oth-PC1801 Not in force date: 20151013 Ip right cessation event data comment text: Termination Category : EXPIRATION_OF_DURATION |
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| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
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| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |
|
| P22-X000 | Classification modified |
St.27 status event code: A-4-4-P10-P22-nap-X000 |