KR900008700A - 포지티브 포토레지스트(Positive Photoresist)의 조성물 - Google Patents

포지티브 포토레지스트(Positive Photoresist)의 조성물

Info

Publication number: KR900008700A
Authority: KR; South Korea
Prior art keywords: composition; positive photoresist; photoresist; positive
Prior art date: 1988-11-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

KR1019880015498A

Other languages

English (en)

Other versions

KR910008708B1 (ko

Inventor

김광태

김정락

김대진

최영준

Original Assignee

제일합섬 주식회사

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-11-24

Filing date

1988-11-24

Publication date

1990-06-03

1988-11-24 Application filed by 제일합섬 주식회사 filed Critical 제일합섬 주식회사

1988-11-24 Priority to KR1019880015498A priority Critical patent/KR910008708B1/ko

1990-06-03 Publication of KR900008700A publication Critical patent/KR900008700A/ko

1991-10-19 Application granted granted Critical

1991-10-19 Publication of KR910008708B1 publication Critical patent/KR910008708B1/ko

Status Expired legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

KR1019880015498A 1988-11-24 1988-11-24 포지티브 포토레지스트(Positive Photoresist)의 조성물 Expired KR910008708B1 (ko)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
KR1019880015498A KR910008708B1 (ko)	1988-11-24	1988-11-24	포지티브 포토레지스트(Positive Photoresist)의 조성물

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
KR1019880015498A KR910008708B1 (ko)	1988-11-24	1988-11-24	포지티브 포토레지스트(Positive Photoresist)의 조성물

Publications (2)

Publication Number	Publication Date
KR900008700A true KR900008700A (ko)	1990-06-03
KR910008708B1 KR910008708B1 (ko)	1991-10-19

Family

ID=19279535

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
KR1019880015498A Expired KR910008708B1 (ko)	1988-11-24	1988-11-24	포지티브 포토레지스트(Positive Photoresist)의 조성물

Country Status (1)

Country	Link
KR (1)	KR910008708B1 (ko)

1988
- 1988-11-24 KR KR1019880015498A patent/KR910008708B1/ko not_active Expired

Also Published As

Publication number	Publication date
KR910008708B1 (ko)	1991-10-19

Publication	Publication Date	Title
DE68926516D1 (de)	1996-06-27	Lichtempfindliche Zusammensetzung
DE68927140D1 (de)	1996-10-17	Photolackzusammensetzung
BR8905204A (pt)	1990-05-15	Composicao colutoria
DE68915148D1 (de)	1994-06-09	Fotoresist-zusammensetzung.
BR8700056A (pt)	1987-12-01	Composicao organopolisiloxano
BR8900004A (pt)	1989-08-15	Composicoes herbicidas de compostos de heterociclicos-alcoilenos de quinoxaliniloxifenoxipropanoato
DE69031785D1 (de)	1998-01-22	Lichtempfindliche Zusammensetzung
KR900007237A (ko)	1990-05-09	투영장치
DE59010008D1 (de)	1996-02-08	Photoempfindliches Gemisch
BR8906787A (pt)	1990-09-18	Composicao
FI893623A7 (fi)	1990-01-29	Dendriittiä vastustavat koostumukset
DE69032715D1 (de)	1998-12-03	Lichtempfindliche Zusammensetzung
KR900006817A (ko)	1990-05-08	레지스트 조성물
FI893193A7 (fi)	1989-12-31	Koostumuksia
BR8704087A (pt)	1988-04-12	Composicao
DE69029222D1 (de)	1997-01-09	Lichtempfindliche Zusammensetzung
DE3855915D1 (de)	1997-06-26	Farbsensibilisierte photopolymerisierbare Zusammensetzungen
BR8902491A (pt)	1990-01-16	Composicao
BR8907528A (pt)	1991-06-11	Composicao crio-protetora
TR26099A (tr)	1993-12-28	Islah edilmis pestisid terkip
DE68922901D1 (de)	1995-07-06	Photoresistzusammensetzung.
DE69033790D1 (de)	2001-10-11	Photolackzusammensetzung
FI892217A7 (fi)	1989-11-11	Dendriittiä vastustava koostumus
LV5649A3 (lv)	1994-10-20	Herbicida kompozicija
RO95836A (ro)	1988-10-30	Compozitie erbicida lichida

Legal Events

Date	Code	Title	Description
1988-11-24	A201	Request for examination
1988-11-24	PA0109	Patent application	St.27 status event code: A-0-1-A10-A12-nap-PA0109
1988-11-24	PA0201	Request for examination	St.27 status event code: A-1-2-D10-D11-exm-PA0201
1988-11-24	R17-X000	Change to representative recorded	St.27 status event code: A-3-3-R10-R17-oth-X000
1990-06-03	PG1501	Laying open of application	St.27 status event code: A-1-1-Q10-Q12-nap-PG1501
1991-09-19	G160	Decision to publish patent application
1991-10-19	PG1605	Publication of application before grant of patent	St.27 status event code: A-2-2-Q10-Q13-nap-PG1605
1992-01-06	E701	Decision to grant or registration of patent right
1992-01-06	PE0701	Decision of registration	St.27 status event code: A-1-2-D10-D22-exm-PE0701
1992-04-06	GRNT	Written decision to grant
1992-04-06	PR0701	Registration of establishment	St.27 status event code: A-2-4-F10-F11-exm-PR0701
1992-04-06	PR1002	Payment of registration fee	St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1
1994-10-19	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4
1995-10-16	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5
1996-10-11	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6
1997-09-02	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7
1998-09-12	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8
1999-02-01	R18-X000	Changes to party contact information recorded	St.27 status event code: A-5-5-R10-R18-oth-X000
1999-04-26	PN2301	Change of applicant	St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301
1999-08-30	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9
2000-09-30	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10
2001-09-11	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 11
2002-08-28	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 12
2003-09-23	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 13
2004-09-30	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 14
2005-10-07	FPAY	Annual fee payment	Payment date: 20051007 Year of fee payment: 15
2005-10-07	PR1001	Payment of annual fee	St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 15
2006-08-29	R18-X000	Changes to party contact information recorded	St.27 status event code: A-5-5-R10-R18-oth-X000
2006-10-20	LAPS	Lapse due to unpaid annual fee
2006-10-20	PC1903	Unpaid annual fee	St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20061020 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE
2007-09-10	PC1903	Unpaid annual fee	St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20061020
2008-04-10	PN2301	Change of applicant	St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301
2008-04-11	PN2301	Change of applicant	St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301
2014-04-04	PN2301	Change of applicant	St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301
2018-10-18	P22-X000	Classification modified	St.27 status event code: A-4-4-P10-P22-nap-X000
2018-10-29	PN2301	Change of applicant	St.27 status event code: A-5-5-R10-R13-asn-PN2301 St.27 status event code: A-5-5-R10-R11-asn-PN2301
2025-01-02	P22-X000	Classification modified	St.27 status event code: A-4-4-P10-P22-nap-X000