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KR900006453A - 류코-염료 용액을 안정화시키는 방법 및 류코 염료를 포함하는 방사선-중합가능한 혼합물 - Google Patents

류코-염료 용액을 안정화시키는 방법 및 류코 염료를 포함하는 방사선-중합가능한 혼합물 Download PDF

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KR900006453A
KR900006453A KR1019890014354A KR890014354A KR900006453A KR 900006453 A KR900006453 A KR 900006453A KR 1019890014354 A KR1019890014354 A KR 1019890014354A KR 890014354 A KR890014354 A KR 890014354A KR 900006453 A KR900006453 A KR 900006453A
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South Korea
Prior art keywords
piperidine
compound
solution
leuco
radiation
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KR1019890014354A
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KR970007344B1 (ko
Inventor
프롬멜트 한스-디터
비제르 하르트무트
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오일러, 게르만
훽스트 아크티엔게젤샤프트
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0083—Solutions of dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0071—Process features in the making of dyestuff preparations; Dehydrating agents; Dispersing agents; Dustfree compositions
    • C09B67/0077—Preparations with possibly reduced vat, sulfur or indigo dyes
    • C09B67/0078—Preparations of vat, sulfur or indigo dyes in liquid form
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Hydrogenated Pyridines (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

내용 없음

Description

류코-염료 용액을 안정화시키는 방법 및 류코 염료를 포함하는 방사선-중합 가능한 혼합물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면의 일반식(I), (II), (III), (IV), (V) 및 (VI)은 본 실시예에 안정화제로서 사용된 피페리딘 화합물의 구조식을 나타낸다.

Claims (13)

  1. 하나 이상의 2,2,6,6-테트라알킬-피페리딘, 2,2-디알킬-피페리딘-6-스피로-사이클로알칸 또는 피페리딘-2,6-디스피로-사이클로알칸 그룹을 포함하는 화합물을 용액에 가하여, 공기중의 산화에 대해 유기용매 중의 류코(leuco)-염료 용액을 안정화시키는 방법.
  2. 제1항에 있어서, 질소원자상에 수소원자 또는 비치환되거나 치환된 알킬 그룹을 포함하는 피페리딘 화합물을 가하는 방법.
  3. 제1항에 있어서, 피페리딘 환의 4-위치에 치환체의 산소 또는 질소원자가 결합되는 화합물을 가하는 방법.
  4. 제1항에 있어서, 분자내에 1 내지 30개의 치환된 피페리딘 그룹을 포함하는 화합물을 가하는 방법.
  5. 하나 이상의 2,2,6,6-테트라알킬-피페리딘, 2,2-디알킬-피페리딘-6-스피로-사이클로알칸 또는 피페리딘-2,6-디스피로-사이클로알칸 그룹을 갖는 화합물을 포함하는 유기용매중의 류코 염료 용액.
  6. 제5항에 있어서, 유기용매가 알콜, 케톤, 에스테르, 에테르 또는 할로겐화된 탄화수소 또는 이들의 혼합물인 용액.
  7. 제5항에 있어서, 용매의 90%이상이 100℃미만의 비점을 갖는 용액.
  8. 제5항에 있어서, 류코 염료가 트리페닐메탄 또는 크산텐 염료인 용액.
  9. 제5항에 있어서, 방사선-민감성 트리할로메틸 화합물을 추가로 포함하는 용액.
  10. 제5항에 있어서, 류코 염료 100중량부당 피페리딘 화합물 0.1 내지 150중량부를 포함하는 용액.
  11. 필수 구성요소로서, 하나 이상의 말단 에틸렌계 이중결합을 가지며 정상압력하에서 비점이 100℃이상인 중합가능한 화합물, 화학방사선의 작용하에서 불포화 화합물의 중합화를 개시시킬 수 있는 화합물, 및 류코 염료를 포함하며, 하나 이상의 2,2,6,6-테트라알킬-피페리딘, 2,2-디알킬-피페리딘-6-스피로-사이클로알칸 또는 피페리딘-2,6-디스피로-사이클로알칸 그룹을 갖는 화합물이 추가로 존재하는 방사선-중합가능한 혼합물.
  12. 제11항에 있어서, 중합성 결합제를 추가로 포함하는 방사선-중합가능한 혼합물.
  13. 제11항에 있어서, 안정화제로서 에폭시 화합물을 추가로 포함하는 방사선-중합가능한 혼합물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890014354A 1988-10-08 1989-10-06 류코 염료 용액을 안정화시키는 방법 및 류코 염료를 함유하는 방사선 중합성 혼합물 Expired - Fee Related KR970007344B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3834299.5 1988-10-08
DE3834299A DE3834299A1 (de) 1988-10-08 1988-10-08 Verfahren zum stabilisieren einer leukofarbstoffloesung und durch strahlung polymerisierbares, einen leukofarbstoff enthaltendes gemisch

Publications (2)

Publication Number Publication Date
KR900006453A true KR900006453A (ko) 1990-05-08
KR970007344B1 KR970007344B1 (ko) 1997-05-07

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KR1019890014354A Expired - Fee Related KR970007344B1 (ko) 1988-10-08 1989-10-06 류코 염료 용액을 안정화시키는 방법 및 류코 염료를 함유하는 방사선 중합성 혼합물

Country Status (10)

Country Link
US (1) US5085669A (ko)
EP (1) EP0363775B1 (ko)
JP (1) JPH0796650B2 (ko)
KR (1) KR970007344B1 (ko)
AT (1) ATE127821T1 (ko)
AU (1) AU628865B2 (ko)
CA (1) CA2000051C (ko)
DE (2) DE3834299A1 (ko)
ES (1) ES2076186T3 (ko)
FI (1) FI95477C (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2653458B2 (ja) * 1988-03-26 1997-09-17 旭化成工業株式会社 凸版印刷版用感光性樹脂組成物
US5599650A (en) * 1995-04-28 1997-02-04 Polaroid Corporation Photoreaction quenchers in on-press developable lithographic printing plates
US6723493B2 (en) * 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
US7923488B2 (en) * 2006-10-16 2011-04-12 Trillion Science, Inc. Epoxy compositions
KR100942439B1 (ko) * 2007-12-28 2010-02-17 전자부품연구원 마이크로 가스센서 및 제조방법
JP6152347B2 (ja) * 2012-02-09 2017-06-21 協和メデックス株式会社 ロイコ型色原体含有水溶液の保存方法
KR101197288B1 (ko) 2012-02-13 2012-11-05 금호석유화학 주식회사 탄소나노소재 분말의 펠릿과 그 제조 방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3042575A (en) * 1958-11-24 1962-07-03 Stiftelsen Svensk Cellulosafor Methods of improving the yield in alkaline digestion of cellulosic material
JPS5555335A (en) * 1978-10-19 1980-04-23 Fuji Photo Film Co Ltd Photosensitive composition
US4423139A (en) * 1980-12-22 1983-12-27 Minnesota Mining And Manufacturing Company Stabilizer combination for dye oxidation
DE3131448A1 (de) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse
JPS60239744A (ja) * 1984-05-14 1985-11-28 Fuji Photo Film Co Ltd 感光性組成物
JPS6187147A (ja) * 1984-09-27 1986-05-02 Fuji Photo Film Co Ltd 光重合性組成物
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
EP0241419B1 (de) * 1986-04-10 1993-05-19 Sandoz Ag Piperidylgruppen enthaltende Pigmente
DE3641014A1 (de) * 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
JPH06431B2 (ja) * 1987-09-25 1994-01-05 神崎製紙株式会社 多色感熱記録体
DE3735088A1 (de) * 1987-10-16 1989-04-27 Hoechst Ag Photopolymerisierbares gemisch

Also Published As

Publication number Publication date
AU628865B2 (en) 1992-09-24
DE58909432D1 (de) 1995-10-19
EP0363775A2 (de) 1990-04-18
AU4266589A (en) 1990-04-12
ATE127821T1 (de) 1995-09-15
JPH02142856A (ja) 1990-05-31
US5085669A (en) 1992-02-04
CA2000051A1 (en) 1990-04-08
JPH0796650B2 (ja) 1995-10-18
EP0363775A3 (de) 1991-11-13
FI894724L (fi) 1990-04-09
CA2000051C (en) 1997-09-16
ES2076186T3 (es) 1995-11-01
FI894724A0 (fi) 1989-10-05
FI95477C (fi) 1996-02-12
FI95477B (fi) 1995-10-31
EP0363775B1 (de) 1995-09-13
DE3834299A1 (de) 1990-04-12
KR970007344B1 (ko) 1997-05-07

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