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KR900004888A - 설팜산 및 그의 유도체를 사용하는 개선된 양이온 전착도장 조성물 - Google Patents

설팜산 및 그의 유도체를 사용하는 개선된 양이온 전착도장 조성물 Download PDF

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Publication number
KR900004888A
KR900004888A KR1019890013761A KR890013761A KR900004888A KR 900004888 A KR900004888 A KR 900004888A KR 1019890013761 A KR1019890013761 A KR 1019890013761A KR 890013761 A KR890013761 A KR 890013761A KR 900004888 A KR900004888 A KR 900004888A
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KR
South Korea
Prior art keywords
composition
electrodeposition coating
coating composition
cationic electrodeposition
group
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KR1019890013761A
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KR930005540B1 (ko
Inventor
제라드 코리간 빅터
랜돌프 짜와키 스티븐
Original Assignee
헬렌 에이. 파블릭크
피피지 인더스트리즈 인코포레이티드
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Publication of KR900004888A publication Critical patent/KR900004888A/ko
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Publication of KR930005540B1 publication Critical patent/KR930005540B1/ko
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • C09D5/4488Cathodic paints
    • C09D5/4492Cathodic paints containing special additives, e.g. grinding agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S524/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S524/901Electrodepositable compositions

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  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Detergent Compositions (AREA)

Abstract

내용없음

Description

설팜산 및 그의 유도체를 사용하는 개선된 양이온 전착도장 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 수성매질내에 분산된 수지상을 포함하는 양이온 전착도장 조성물(상기 조성물은 pH가 최소한 5이고 2,000ppm미만의 납을 함유하며, 상기 수지상은 일반식(여기에서, R은 H 또는 C1내지 C4알킬이다)의 산으로 최소한 부분 중화된 염기성 질소그룹을 갖는다)
  2. 제1항에 있어서, 상기 분산된 수지상이 전착도장 조성물의 총 중량을 기준으로 2내지 60중량%의 양으로 존재하는 양이온 전착도장 조성물.
  3. 제1항에 있어서, 상기 염기성 질소 그룹으로서 1차 아민 그룹을 함유하는 조성물.
  4. 제1항에 있어서, 상기 수지상이 에폭사이드 그룹-함유 수지와 1차 또는 2차 아민의 반응 생성물인 조성물.
  5. 제3항에 있어서, 상기 수지상이 에폭사이드 그룹-함유 수지와 케티민 그룹을 함유하는 2차 아민의 반응 생성물인 조성물.
  6. 제1항에 있어서, 상기 수지상이 아미노 그룹-함유 아크릴 중합체인 조성물.
  7. 제1항에 있어서, 차단된 폴리이소시아네이트 경화제를 추가로 함유하는 조성물.
  8. 수성 양이온 전착도장 조성물에 첨지된 양극과 음극사이에 전류를 흘려주어 전착도장 조성물을 음극상에 도막으로 침착시큼을 포함하여, 상기 음극과 상기 양극을 포함하는 전기회로에 음극으로 제공되는 전도성 기재를 도장하는 방법에 있어서, 상기 전착도장 조성물이 제1항의 조성물임을 특징으로 하는 방법.
  9. 제8항에 있어서, 상기 양이온 전착도장 조성물이 제4항의 조성물인 방법.
  10. 제8항에 있어서, 상기 양이온 전착도장 조성물이 제7항의 조성물인 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890013761A 1988-09-26 1989-09-25 설팜산 및 그의 유도체를 사용하는 개선된 양이온 전착도장 조성물 Expired - Lifetime KR930005540B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US248680 1988-09-26
US07/248,680 US4933056A (en) 1988-09-26 1988-09-26 Cationic electrodepositable compositions through the use of sulfamic acid and derivatives thereof

Publications (2)

Publication Number Publication Date
KR900004888A true KR900004888A (ko) 1990-04-13
KR930005540B1 KR930005540B1 (ko) 1993-06-23

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KR1019890013761A Expired - Lifetime KR930005540B1 (ko) 1988-09-26 1989-09-25 설팜산 및 그의 유도체를 사용하는 개선된 양이온 전착도장 조성물

Country Status (12)

Country Link
US (1) US4933056A (ko)
EP (1) EP0361882B1 (ko)
JP (1) JPH0689274B2 (ko)
KR (1) KR930005540B1 (ko)
CN (1) CN1016437B (ko)
AR (1) AR246543A1 (ko)
AU (1) AU595150B1 (ko)
BR (1) BR8901963A (ko)
CA (1) CA1334714C (ko)
DE (1) DE68913886T2 (ko)
ES (1) ES2052927T3 (ko)
MX (1) MX164740B (ko)

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Also Published As

Publication number Publication date
DE68913886T2 (de) 1994-10-06
CN1041376A (zh) 1990-04-18
EP0361882B1 (en) 1994-03-16
EP0361882A3 (en) 1992-03-11
ES2052927T3 (es) 1994-07-16
US4933056A (en) 1990-06-12
BR8901963A (pt) 1990-04-10
CA1334714C (en) 1995-03-07
JPH02127481A (ja) 1990-05-16
JPH0689274B2 (ja) 1994-11-09
DE68913886D1 (de) 1994-04-21
EP0361882A2 (en) 1990-04-04
AU595150B1 (en) 1990-03-22
CN1016437B (zh) 1992-04-29
KR930005540B1 (ko) 1993-06-23
MX164740B (es) 1992-09-21
AR246543A1 (es) 1994-08-31

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