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KR890004201A - 포지티브 방사선-감수성 혼합물 - Google Patents

포지티브 방사선-감수성 혼합물 Download PDF

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Publication number
KR890004201A
KR890004201A KR1019880009933A KR880009933A KR890004201A KR 890004201 A KR890004201 A KR 890004201A KR 1019880009933 A KR1019880009933 A KR 1019880009933A KR 880009933 A KR880009933 A KR 880009933A KR 890004201 A KR890004201 A KR 890004201A
Authority
KR
South Korea
Prior art keywords
radiation
sensitive
sensitive mixture
coating
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1019880009933A
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English (en)
Inventor
룩케르트 한스
람베르트 가브리엘
Original Assignee
베틀라우퍼, 오일러
훽스트 아크티엔게젤샤프트
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 베틀라우퍼, 오일러, 훽스트 아크티엔게젤샤프트 filed Critical 베틀라우퍼, 오일러
Publication of KR890004201A publication Critical patent/KR890004201A/ko
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

내용 없음

Description

포지티브 방사선-감수성 혼합물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 필수성분으로서, a) 화학방사선의 작용하에서 강산을 생성시키는 화합물, b) 하기 일반식(Ⅰ) 또는 (Ⅱ)의 아세탈, 및 c) 물중에서는 불용성이지만, 유기용매 및 알칼리 수용액중에서는 가용성인 결합제를 함유하는 방사선-감수성 혼합물.
    상기식에서, R은 치환되거나 비치환된 알킬그룹을 나타내며, X는 수소 또는 할로겐원자, 또는 하이드록실, 알킬, 알콕시, 알콕시카보닐, 아릴옥시 또는 아릴 그룹을 나타내고, n은 0 또는 1 내지 3이다.
  2. 제 1 항에 있어서, n은 1 또는 2인 방사선-감수성 혼합물.
  3. 제 1 항에 있어서, 일반식(Ⅰ)의 화합물에서 하나이하의 X가 수소가 아닌 방사선-감수성 혼합물.
  4. 제 1 항에 있어서, R이 탄소수 2 내지 10인 방사선-감수성 혼합물.
  5. 제 1 항에 있어서, 비휘발성 성분에 대하여 25 내지 60중량%의 아세탈을 함유하는 방사선-감수성 혼합물.
  6. 제 1 항에 있어서, 30 내지 80중량%의 결합제를 함유하는 방사선-감수성 혼합물.
  7. 제 1 항에 있어서, 조사시에 산을 생성시키는 화합물을 0.1 내지 10중량% 함유하는 방사선-감수성 혼합물.
  8. 피복 기본물질 및, 필수성분으로 a) 화학 방사선의 작용하에서 강산을 생성시키는 화합물, b) 하기 일반식(Ⅰ) 또는 (Ⅱ)의 아세탈, 및 c) 물중에서는 불용성이지만, 유기용매 및 알칼리 수용액중에서는 가용성인 결합제를 함유하는 방사선-감수성 기록피복물로 이루어짐을 특징으로 하는 방사선-감수성 기록물지.
    상기식에서, R은 치환되건 비치환된 알킬 그룹을 나타내며, X는 수도 또는 할로겐원자, 또는 하이드록실, 알킬, 알콕시, 알콕시카보닐, 아릴옥시 또는 아릴 그룹을 나타내고, n은 0 또는 1 내지 3이다.
  9. 제 8 항에 따른 방사선-감수성 기록물질을, 액상 현상제중에서 피복물의 용해도를 증가시키는 양으로 화학 방사선을 사용하여 영상-조사시킨 다음, 피복물의 조사 부위를 알칼리성 현상제 수용액으로 세척함으로써 릴리이프 영상을 제조하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880009933A 1987-08-04 1988-08-04 포지티브 방사선-감수성 혼합물 Withdrawn KR890004201A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3725741A DE3725741A1 (de) 1987-08-04 1987-08-04 Positiv arbeitendes strahlungsempfindliches gemisch
DEP3725741.2 1987-08-04

Publications (1)

Publication Number Publication Date
KR890004201A true KR890004201A (ko) 1989-04-20

Family

ID=6332980

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880009933A Withdrawn KR890004201A (ko) 1987-08-04 1988-08-04 포지티브 방사선-감수성 혼합물

Country Status (5)

Country Link
US (1) US5015554A (ko)
EP (1) EP0302359A3 (ko)
JP (1) JPS6457258A (ko)
KR (1) KR890004201A (ko)
DE (1) DE3725741A1 (ko)

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DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
JP2661671B2 (ja) * 1989-03-20 1997-10-08 株式会社日立製作所 パタン形成材料とそれを用いたパタン形成方法
DE3930087A1 (de) * 1989-09-09 1991-03-14 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3930086A1 (de) * 1989-09-09 1991-03-21 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3940965A1 (de) * 1989-12-12 1991-06-13 Basf Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
DE4007924A1 (de) * 1990-03-13 1991-09-19 Basf Ag Strahlungsempfindliches gemisch
JPH06500645A (ja) * 1990-08-08 1994-01-20 イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー 単層の乾式処理可能な感光性組成物および調色方法
US5286595A (en) * 1990-08-08 1994-02-15 E. I. Du Pont De Nemours And Company Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation
US5229244A (en) * 1990-08-08 1993-07-20 E. I. Du Pont De Nemours And Company Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation
JP2919142B2 (ja) * 1990-12-27 1999-07-12 株式会社東芝 感光性組成物およびそれを用いたパターン形成方法
DE4214363C2 (de) * 1991-04-30 1998-01-29 Toshiba Kawasaki Kk Strahlungsempfindliches Gemisch zur Ausbildung von Mustern
JPH06230574A (ja) * 1993-02-05 1994-08-19 Fuji Photo Film Co Ltd ポジ型感光性組成物
JP3045053B2 (ja) * 1995-10-11 2000-05-22 株式会社村田製作所 振動ジャイロ
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GB9722862D0 (en) 1997-10-29 1997-12-24 Horsell Graphic Ind Ltd Pattern formation
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JP3755571B2 (ja) * 1999-11-12 2006-03-15 信越化学工業株式会社 化学増幅ポジ型レジスト材料及びパターン形成方法
US6248162B1 (en) * 1999-11-29 2001-06-19 Xerox Corporation Ink compositions containing malonaldehyde bis(dimethaylacetal)
JP2008037935A (ja) * 2006-08-02 2008-02-21 General Technology Kk インクジェットインクとそれを用いた印刷方法
EP2539316B1 (en) 2010-02-24 2019-10-23 Basf Se Latent acids and their use
EP3401708B1 (en) 2014-09-26 2022-11-16 Battelle Memorial Institute Image quality test article
US10871591B2 (en) 2014-09-26 2020-12-22 Battelle Memorial Institute Image quality test article set
CN107207456B (zh) 2015-02-02 2021-05-04 巴斯夫欧洲公司 潜酸及其用途

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DE1447963B2 (de) * 1965-11-24 1972-09-07 KaIIe AG, 6202 Wiesbaden Biebnch Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
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Also Published As

Publication number Publication date
US5015554A (en) 1991-05-14
JPS6457258A (en) 1989-03-03
DE3725741A1 (de) 1989-02-16
EP0302359A3 (de) 1991-01-23
EP0302359A2 (de) 1989-02-08

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Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19880804

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