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KR20190028646A - 감광성 조성물, 중합체의 제조 방법, 감광성 조성물의 제조 방법, 적층체의 제조 방법 - Google Patents

감광성 조성물, 중합체의 제조 방법, 감광성 조성물의 제조 방법, 적층체의 제조 방법 Download PDF

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Publication number
KR20190028646A
KR20190028646A KR1020187033585A KR20187033585A KR20190028646A KR 20190028646 A KR20190028646 A KR 20190028646A KR 1020187033585 A KR1020187033585 A KR 1020187033585A KR 20187033585 A KR20187033585 A KR 20187033585A KR 20190028646 A KR20190028646 A KR 20190028646A
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KR
South Korea
Prior art keywords
group
polymer
monomer
unit
carbon atoms
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Application number
KR1020187033585A
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English (en)
Korean (ko)
Inventor
마사키 오비
미야코 사사키
Original Assignee
에이지씨 가부시키가이샤
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Publication of KR20190028646A publication Critical patent/KR20190028646A/ko
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
KR1020187033585A 2016-07-08 2017-07-03 감광성 조성물, 중합체의 제조 방법, 감광성 조성물의 제조 방법, 적층체의 제조 방법 Withdrawn KR20190028646A (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2016136414 2016-07-08
JP2016136415 2016-07-08
JPJP-P-2016-136414 2016-07-08
JPJP-P-2016-136415 2016-07-08
JP2017090779 2017-04-28
JPJP-P-2017-090779 2017-04-28
PCT/JP2017/024403 WO2018008610A1 (ja) 2016-07-08 2017-07-03 感光性組成物、重合体の製造方法、感光性組成物の製造方法、積層体の製造方法

Publications (1)

Publication Number Publication Date
KR20190028646A true KR20190028646A (ko) 2019-03-19

Family

ID=60912609

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020187033585A Withdrawn KR20190028646A (ko) 2016-07-08 2017-07-03 감광성 조성물, 중합체의 제조 방법, 감광성 조성물의 제조 방법, 적층체의 제조 방법

Country Status (5)

Country Link
JP (1) JPWO2018008610A1 (ja)
KR (1) KR20190028646A (ja)
CN (1) CN109415467A (ja)
TW (1) TW201821456A (ja)
WO (1) WO2018008610A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019184716A (ja) * 2018-04-04 2019-10-24 東京応化工業株式会社 撥液処理剤、及び被処理体の位置選択的撥液化方法
WO2020188681A1 (ja) * 2019-03-18 2020-09-24 株式会社ニコン 露光システム、露光装置、及び露光方法
JP7511183B2 (ja) * 2020-09-17 2024-07-05 パナソニックＩｐマネジメント株式会社 機能デバイス、および、機能デバイスの製造方法
CN114276239B (zh) * 2021-12-29 2023-10-27 徐州博康信息化学品有限公司 一种含缩酮结构酸敏感光刻胶树脂单体的制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5516484A (en) 1978-07-24 1980-02-05 Tokyo Inst Of Technol Band semiconductor laser

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6366211A (ja) * 1986-09-05 1988-03-24 Sunstar Giken Kk ジヒドロキシル基含有縮合性マクロモノマ−
JPH06157983A (ja) * 1992-11-19 1994-06-07 Nissan Motor Co Ltd 塗料用樹脂組成物
CN100427516C (zh) * 2003-11-21 2008-10-22 大日本油墨化学工业株式会社 含氟光固化性组合物
JP5358005B2 (ja) * 2011-09-22 2013-12-04 富士フイルム株式会社 ポジ型感光性アクリル樹脂およびポジ型感光性樹脂組成物
KR101912158B1 (ko) * 2011-09-22 2018-10-26 후지필름 가부시키가이샤 포지티브형 감광성 아크릴 수지 및 포지티브형 감광성 수지 조성물
KR101511476B1 (ko) * 2014-02-28 2015-04-10 스미또모 가가꾸 가부시키가이샤 감광성 수지 조성물
JP5644970B1 (ja) * 2014-02-28 2014-12-24 住友化学株式会社 感光性樹脂組成物
JP2016018691A (ja) * 2014-07-09 2016-02-01 Jsr株式会社 表示又は照明装置
JP2016172835A (ja) * 2015-03-18 2016-09-29 東洋インキＳｃホールディングス株式会社 シリカ分散体、および、活性エネルギー線硬化性樹脂組成物
JPWO2017082307A1 (ja) * 2015-11-10 2018-10-18 Ａｇｃ株式会社 蛍光分析バイオチップ用感光性組成物、蛍光分析バイオチップの製造方法および蛍光分析バイオチップ
WO2017126570A1 (ja) * 2016-01-19 2017-07-27 旭硝子株式会社 バイオチップ用感光性樹脂組成物および撥液性膜の形成方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5516484A (en) 1978-07-24 1980-02-05 Tokyo Inst Of Technol Band semiconductor laser

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Publication number Publication date
CN109415467A (zh) 2019-03-01
JPWO2018008610A1 (ja) 2019-06-13
WO2018008610A1 (ja) 2018-01-11
TW201821456A (zh) 2018-06-16

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