KR20180105000A - Deposition apparatus and deposition method using the same - Google Patents

Abstract

The present invention relates to a deposition apparatus and a deposition method using the same, and more particularly, to a deposition apparatus for depositing a raw material on a substrate and a deposition method using the same.
A deposition apparatus according to an embodiment of the present invention includes: a deposition chamber in which a process space is formed; A supply chamber connected to the deposition chamber; A discharge chamber connected to the deposition chamber; A transfer unit for transferring a storage container accommodated in the supply chamber to the deposition chamber or to move the deposition chamber to the discharge chamber; A substrate supporting unit installed inside the deposition chamber to seat the substrate; And a spray unit for spraying the raw material stored in the storage container to the substrate mounted on the substrate support.

Description

TECHNICAL FIELD [0001] The present invention relates to a deposition apparatus and a deposition method using the deposition apparatus.

The present invention relates to a deposition apparatus and a deposition method using the same, and more particularly, to a deposition apparatus for depositing a raw material on a substrate and a deposition method using the same.

Generally, the most important process in manufacturing an organic light emitting device (OLED) is a process of forming an organic thin film. In order to form such an organic thin film, vacuum deposition is mainly used.

In this vacuum deposition, a substrate such as glass and an evaporation source containing a powdery raw material are disposed in the chamber so as to oppose each other, and the raw material in powder form contained in the evaporation source is evaporated to spray the evaporated raw material onto the substrate Thereby forming an organic thin film.

The evaporation source is divided into a point evaporation source and a linear evaporation source depending on the shape of the outer shape. Herein, the use of the point evaporation source and the linear evaporation source in consideration of the conditions of the deposition process, the condition of the substrate, the form of the deposition film to be formed, and the like are determined. In recent years, however, A linear evaporation source secured is mainly used.

Here, when the amount of the raw material contained in the storage container in the evaporation source is reduced to a predetermined amount or less as the deposition process proceeds, the storage container should be replaced with a new storage container. However, replacement of the new storage vessel requires releasing the vacuum state in the chamber, mounting a new storage vessel, and then forming the inside of the chamber in a vacuum state. Therefore, Do.

That is, the replacement of the storage container is performed in the chamber for performing the deposition, and it takes a considerable time to exhaust the high-vacuum after the replacement of the storage container, thereby increasing the process time. Further, when the raw material is stored in a large quantity in the storage container, the raw material can be denatured by heat, and frequent replacement of the storage container is economically inefficient. Therefore, there is a demand for a deposition apparatus having a new structure for storing a large amount of organic substances and for depositing organic materials.

KR 10-2010-0034168 A

The present invention provides a deposition apparatus capable of replacing a storage container in which a raw material is stored in a vacuum state, and a deposition method using the same.

A deposition apparatus according to an embodiment of the present invention includes a deposition chamber in which a process space is formed; A supply chamber connected to the deposition chamber; A discharge chamber connected to the deposition chamber; A transfer unit for transferring a storage container accommodated in the supply chamber to the deposition chamber or to move the deposition chamber to the discharge chamber; A substrate supporting unit installed inside the deposition chamber to seat the substrate; And a spray unit for spraying the raw material stored in the storage container to the substrate mounted on the substrate support.

The supply chamber and the discharge chamber can be adjusted in internal pressure independently of the deposition chamber.

Wherein the transfer unit comprises: a first transfer unit installed inside the supply chamber to move the storage container in a first direction; A second transfer unit installed inside the deposition chamber to move the storage container in a first direction and a second direction intersecting the first direction; And a third transfer unit installed in the discharge chamber to move the storage container in a first direction.

The storage container may have a plate shape extending in the first direction and the second direction.

The spraying unit may include a nozzle detachably attached to the storage container and having a plurality of spray holes arranged in the first direction and installed in an inner space of the deposition chamber.

The plurality of nozzles may be provided in a direction crossing the first direction and the second direction.

The spraying unit may further include a heater installed in an inner space of the deposition chamber to heat the storage vessel, and the heater may be formed along the surface including the first direction and the second direction.

Wherein the storage container comprises: a housing having an inner space for accommodating the raw material and at least a part of which is opened; And a sealing member detachably coupled to the open top of the housing.

The sealing member includes a coupling portion, and a fixing member may be installed in the supply chamber so as to be coupled to the coupling portion.

The coupling portion may include a through hole, and the fixing member may include a hook extending to be inserted into the through hole.

The engaging portion may be formed at one end of the sealing member.

According to another aspect of the present invention, there is provided a deposition method including: supplying a first storage container filled with a raw material to a supply chamber; Adjusting the internal pressure of the supply chamber to which the first storage container is supplied; Transferring the first storage container to a deposition chamber provided at one side of the supply chamber; Heating the first storage vessel to provide a raw material to the substrate; Adjusting the internal pressure of the discharge chamber provided at one side of the deposition chamber; And transferring the first storage container in which the raw material is exhausted to the discharge chamber.

Supplying a second storage container filled with a raw material to the supply chamber; And controlling the internal pressure of the supply chamber to which the second storage container is supplied, the method comprising: supplying the second storage container to the supply chamber; and supplying the second storage container to the inside of the supplied supply chamber The process of controlling the pressure may be performed simultaneously with the step of supplying the raw material to the substrate by heating the first storage container.

And transferring the second storage container to the deposition chamber, wherein transferring the second storage container to the deposition chamber includes transferring the first storage container in which the raw material is exhausted to the discharge chamber, Can be performed at the same time.

The process of adjusting the internal pressure of the discharge chamber may be performed simultaneously with the step of supplying the raw material to the substrate by heating the first storage container.

The first storage vessel is supplied to the supply chamber in a sealed state by a sealing member in the process of supplying the first storage vessel to the supply chamber, and the sealing member transfers the first storage vessel to the deposition chamber The first storage vessel may be detached from the first storage vessel.

The process of adjusting the internal pressure of the supply chamber supplied by the first storage container and the process of adjusting the internal pressure of the discharge chamber may adjust the internal pressure of the supply chamber and the discharge chamber to a vacuum state.

According to the deposition apparatus and the deposition method using the deposition apparatus according to the embodiment of the present invention, the supply chamber and the discharge chamber, each of which is controlled in internal pressure, are connected to one side and the other side of the deposition chamber, The chamber, the deposition chamber and the discharge chamber can be moved along to easily replace the storage vessel in a vacuum.

Further, the storage container may be formed to have a plate shape so that the interval between the nozzles to which the storage containers are coupled can be narrowed, thereby improving the deposition efficiency and the deposition uniformity.

In addition, it is possible to automatically remove the sealing member that seals the storage container by the fixing member during the transfer of the storage container from the supply chamber to the deposition chamber, thereby preventing denaturation of the raw material and automating the process for depositing the substrate .

BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic representation of a deposition apparatus according to an embodiment of the present invention.
2 is a view showing a state in which a substrate is deposited by a plurality of nozzles.
3 is a view showing a state of a storage container according to an embodiment of the present invention;
4 is a view showing a state in which the sealing member of the storage container is separated in the course of transferring the storage container from the supply chamber to the deposition chamber.
5 to 9 are views for explaining a deposition method using a deposition apparatus according to an embodiment of the present invention.

The deposition apparatus and the deposition method using the same according to the present invention are characterized in that a supply chamber and a discharge chamber in which the internal pressure is controlled are provided on one side and the other side of the deposition chamber, So that the storage container can be easily replaced in a vacuum state.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as being limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, Is provided to fully inform the user. Wherein like reference numerals refer to like elements throughout.

FIG. 1 is a view schematically showing a deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a view showing a state where a substrate is deposited by a plurality of nozzles 720.

Referring to FIGS. 1 and 2, a deposition apparatus according to an embodiment of the present invention includes a deposition chamber 100 in which a process space is formed; A supply chamber (200) connected to the deposition chamber (100); A discharge chamber 300 connected to the deposition chamber 100; A transfer unit for transferring the storage container 500 accommodated in the supply chamber 200 to the deposition chamber 100 or to move the deposition chamber 100 to the discharge chamber 300; A substrate support 800 installed in the deposition chamber 100 to support the substrate; And a spray unit for spraying a raw material stored in the storage container 500 onto a substrate mounted on the substrate support unit 800.

The deposition chamber 100 is provided with a predetermined space, that is, a processing space, for depositing the raw material on the substrate. Although not shown, a gate for entering and exiting the substrate may be formed on one side wall of the deposition chamber 100, and an exhaust pump for regulating the internal pressure of the deposition chamber 100 may be provided. Although the supply chamber 200 shown in FIG. 1 is formed integrally with the inner space of the lower supply chamber 200, the supply chamber 200 may include a lower supply chamber 200 having an open upper portion and an open upper portion It is also possible to separate the chamber lid from the chamber lid.

A substrate supporting part 800 on which a substrate is mounted is installed in an inner space of the deposition chamber 100. The substrate supporting unit 800 is provided on the upper part of the deposition chamber 100 and supports the substrate introduced into the deposition chamber 100 and moves the supported substrate in one direction in the process of depositing the source material on the substrate .

The substrate support 800 may include a substrate support for supporting the substrate on a lower surface thereof and a driving unit for moving the substrate support. The substrate support may be formed in a shape corresponding to the shape of the substrate. For example, when the substrate is circular, the substrate support may be formed in a corresponding circular shape. When the substrate is polygonal, As shown in FIG. In addition, the substrate supported on the substrate support may be a roll-to-roll substrate extending in one direction.

Inside the substrate support, a means for controlling the ambient temperature, for example, a resistance heating heater, a heating means such as a lamp heater, or a cooling means such as a cooling line may be additionally provided. The driving unit is connected to the upper part of the substrate support. In the process of depositing the source material on the substrate, the substrate support can be moved in one direction to move the substrate supported by the substrate support in one direction. The driving unit may move the substrate support along the extending direction of the substrate when the roll-to-roll substrate is supported on the substrate support.

In the inner space of the deposition chamber 100, a spray unit for spraying a raw material onto a substrate placed on the substrate support unit 800 is installed. The injection unit may be installed to be movable in one direction in the inner space of the deposition chamber 100. That is, when the substrate is not moved by the substrate supporting unit 800, the ejecting unit moves in one direction to eject the raw material. Even when the substrate is moved by the substrate supporting unit 800, The raw material can be sprayed. It goes without saying that it is also possible to movably move in all directions within the deposition chamber 100 in order to adjust the injection position of the raw material.

The ejection unit may include a nozzle 720 for ejecting the raw material, and the nozzle 720 may be supported by the substrate support and disposed so as to face the one surface of the substrate on which the thin film is deposited. The nozzle 720 is detachable from the storage container 500, and a plurality of ejection holes 710 are formed on an upper surface of the substrate 720 opposite to the one surface. The nozzle 720 can uniformly distribute and supply the evaporated raw material, for example, organic matter, to one surface of the substrate through a plurality of paths. For this, the nozzle 720 is formed with an inlet through which the raw material stored in the storage container 500 is supplied to the lower portion of the storage container 500. The inlet and the injection hole 710 communicate with each other, A predetermined diffusion space may be formed therein.

The inlet may be formed at one end of the nozzle 720 extending along the direction of arrangement of the spray holes 710. The inlet 720 may be formed at one end of the nozzle 720 for uniformly distributing the raw material stored in the storage container 500 and supplying the same to the substrate. In the present invention.

The injection unit may further include a heater (not shown) for heating the raw material. The heater may be installed in the inner space of the deposition chamber 100 to heat the storage vessel 500 moved to the deposition chamber 100. The heater can be installed to surround the outer circumferential surface of the attached storage container 500 when the storage container 500 is attached to the nozzle 720. The heater heats the storage container 500 to the storage container 500 And serves to vaporize the powdery raw material to be stored.

The supply chamber 200 is installed to be connected to the deposition chamber. For example, at one side of the deposition chamber 100, there may be provided a supply chamber 200 in which the internal pressure is controlled separately from the deposition chamber 100. The supply chamber 200 may be installed on one side of the deposition chamber 100 and a gate for supplying the storage vessel 500 may be installed on one side of the supply chamber 200. A first gate 620 is provided between the supply chamber 200 and the deposition chamber 100 for the movement of the storage vessel 500 and the first gate 620 is connected to the supply chamber 200 and the deposition chamber 100. [ (100) to form a movement path through which the storage container (500) moves from the supply chamber (200) to the deposition chamber (100). In addition, the supply chamber 200 may be provided with an exhaust pump for adjusting the internal pressure of the supply chamber 200 in order to adjust the internal pressure of the supply chamber 200 separately from the deposition chamber 100.

The supply chamber 200 serves to supply the storage container 500 in which the raw material is stored to the deposition chamber 100. Although not shown, the storage container 500 in which the raw material is stored is preliminarily heated or cooled A preheater, a cooling device, or the like can be installed inside.

The discharge chamber 300 is installed to be connected to the deposition chamber. For example, the other side of the deposition chamber 100 may be provided with a discharge chamber 300 in which an internal pressure is controlled separately from the deposition chamber 100. The discharge chamber 300 may be installed on the other side of the deposition chamber 100 and a gate for discharging the storage vessel 500 may be installed on one side of the discharge chamber 300. A second gate 640 is provided between the deposition chamber 100 and the discharge chamber 300 for movement of the storage container 500 and a second gate 640 is provided between the deposition chamber 100 and the discharge chamber 300. [ (300) to form a movement path through which the storage container (500) moves from the deposition chamber (100) to the discharge chamber (300). In addition, the discharge chamber 300 is separately controlled from the deposition chamber 100, and an exhaust pump for adjusting the internal pressure of the discharge chamber 300 may be provided in the discharge chamber 300 for this purpose. The discharge chamber 300 serves to discharge the storage container 500 from which the raw material is exhausted from the deposition chamber 100.

A deposition apparatus according to an embodiment of the present invention includes a supply chamber 200 for supplying a storage container 500 filled with a raw material to a deposition chamber 100 and a storage container 500 having a raw material exhausted from the deposition chamber 100 The deposition chamber 100 is provided with a discharge chamber 300 for discharging the deposition chamber 100. That is, the supply and discharge of the storage container 500 are separately performed by the supply and discharge chambers 200 and 300 separately provided on both sides of the deposition chamber 100, and the storage container 500 filled with the raw material, And the discharging of the storage container 500 in which the raw material material is exhausted can be performed continuously or simultaneously during the replacement of the storage container 500, thereby greatly reducing the replacement time of the storage container 500 .

The deposition chamber 100, the supply chamber 200, and the discharge chamber 300 are formed in the shape of a cylindrical or rectangular box, and are formed on both sides of the deposition chamber 100, for example, on both sides of the deposition chamber 100 The overall shape in which the deposition chamber 100, the supply chamber 200, and the discharge chamber 300 are combined as shown in FIG. 1 may be formed to have a cylindrical or rectangular box shape. In this case, the deposition chamber 100, the supply chamber 200, and the discharge chamber 300 can be formed by independently partitioning the inner space of the entire chamber formed in the shape of a cylindrical or rectangular box, And it is possible to minimize the movement path of the storage container 500 moving the supply chamber 200, the deposition chamber 100, and the discharge chamber 300.

The transfer unit moves the storage container 500 accommodated in the supply chamber 200 to or from the deposition chamber 100. For example, the transfer unit can sequentially move the storage vessel 500 along the supply chamber 200, the deposition chamber 100, and the discharge chamber 300. That is, when the storage container 500 filled with the raw material is supplied from the outside into the interior of the supply chamber 200, the transfer unit may move the storage container 500 filled with the raw material from the supply chamber 200 to the deposition chamber 100 ). The transfer unit is configured such that the storage container 500 filled with the raw material is attached to the nozzle 720 in the deposition chamber 100 and attached to the nozzle 720 to perform a deposition process, (500) is detached from the nozzle (720). Further, the transfer unit discharges the storage container 500, which is detached from the nozzle 720 and has exhausted the raw material, from the deposition chamber 100 to the discharge chamber 300.

To this end, the transfer unit includes a first transfer part 410 installed inside the supply chamber 200 to move the storage container 500 in the first direction; A second transfer part 420 installed in the deposition chamber 100 to move the storage container 500 in a first direction and in a second direction crossing the first direction; And a third transfer part 430 installed in the discharge chamber 300 to move the storage container 500 in the first direction. Here, the first direction and the second direction may be defined as one direction and various directions intersecting with the first direction. However, as shown in the figure, the first direction is determined as the horizontal direction X axis direction, the second direction is defined as the first direction Axis direction, which is a vertical direction intersecting with the direction of the Y-axis, the storage container 500 can be efficiently moved in a deposition apparatus for depositing a raw material on the upper portion. Hereinafter, an example in which the first direction is the X-axis direction and the second direction is the Y-axis direction will be described as an example.

The first transfer part 410 moves the storage container 500 in the horizontal direction or the X axis direction to move the storage container 500 toward the deposition chamber 100 in the supply chamber 200. The second transfer unit 420 moves the storage container 500 supplied from the supply chamber 200 in the horizontal direction or the X axis direction to place the storage container 500 in the center of the nozzle 720 and to supply the storage container 500 Is moved upward in the vertical direction, that is, the Y-axis direction, and is attached to the nozzle 720. The second transfer unit 420 moves the storage container 500 in which the raw material is exhausted from the nozzle 720 in the vertical direction, that is, the Y axis direction, to the discharge chamber 300, That is, in the X-axis direction. The third transfer part 430 moves the storage container 500 in the horizontal direction, that is, in the X-axis direction, and moves it from the deposition chamber 100 in the discharge chamber 300. The storage container 500 may be supplied from the supply chamber 200 to the deposition chamber 100 by the first transfer unit 410 and the second transfer unit 420 and may be supplied to the deposition chamber 100 by the second transfer unit 420, 720 and can be discharged from the deposition chamber 100 to the discharge chamber 300 by the second transfer unit 420 and the third transfer unit 430. Each transfer portion may be constituted by an LM guide or a roller for movement in the X-axis direction, and may be constituted by an LM guide or a cylinder for movement in the Y-axis direction.

The storage container 500 includes a housing 501 having an inner space for accommodating and storing a raw material, for example, organic matter, and at least a portion of which is opened at an upper end. Here, the storage container 500 may include a crucible for storing the raw material. In addition, the storage container 500 may have a plate shape extending in the first direction, i.e., the X-axis direction and the second direction, i.e., the Y-axis direction. The inner space of the supply chamber 200 and the discharge chamber 300 can be minimized by forming the storage container 500 in a plate shape extending in the first direction and the second direction, The first gate 620 between the deposition chamber 100 and the discharge chamber 300 and the second gate 640 between the deposition chamber 100 and the discharge chamber 300 may be slit valves.

In the case where the storage container 500 is configured to have a plate shape such as a rectangular parallelepiped or an elliptic column as described above, when a plurality of nozzles 720 are installed in the deposition chamber 100, . 2, a plurality of nozzles 720 may be provided in the first direction, that is, the X-axis direction and the second direction, that is, the Z-axis direction intersecting with the Y-axis direction. The gap between the nozzles 720 can be narrowed by forming the thin plate-like shape in the axial direction, thereby improving the deposition efficiency and the deposition uniformity.

The length d1 of the storage container 500 in the direction of the X axis is set to be shorter than the length d1 of the nozzle 720 in the X- The nozzle 720 and the storage container 500 may be configured to have a shape of a T type evaporation source by being formed to be shorter than a distance d2 between the injection holes 710 located at both ends. When the nozzle 720 and the storage container 500 are in the form of a T-type evaporation source, the residual amount of the raw material stored in the storage container 500 can be reduced, and the raw material stored in the storage container 500 can be uniformly So that it can be dispensed.

When the storage container 500 is configured to have a plate shape extending in the first direction, that is, the X-axis direction and the second direction, i.e., the Y-axis direction, as described above, it is installed inside the deposition chamber 100 The heater may be formed along a plane including the first direction and the second direction. That is, in moving the storage container 500 from the supply chamber 200 to the deposition chamber 100 and moving the storage container 500 from the deposition chamber 100 to the discharge chamber 300, A heater provided inside the deposition chamber 100 is formed along the surface including the X-axis direction and the Y-axis direction, that is, the surface perpendicular to the Z-axis, and a heater perpendicular to the X- or Y- The surface can be configured so that no heater is installed. Even in this case, since the storage container 500 has a plate shape extending in the X-axis direction and the Y-axis direction, only the surface having a large area is heated by the heater, so that there is no problem in evaporating the raw material.

FIG. 3 is a view showing a state of a storage container 500 according to an embodiment of the present invention. FIG. 4 is a cross-sectional view of the storage container 500 in the process of transferring the storage container 500 from the supply chamber 200 to the deposition chamber 100 500 are separated from each other.

As described above, the storage container 500 includes a housing 501 having an inner space for accommodating the raw material, and at least a portion of the top thereof being opened. The storage container 500 may further include a sealing member 505 detachably coupled to an opened upper end of the housing 501 to prevent denaturation of the raw material, May be supplied into the supply chamber 200 with the attachment member 505 attached thereto. It is therefore necessary to remove the sealing member 505 from the housing 501 in order to deposit the storage container 500 in the deposition chamber 100 and to perform the deposition process by evaporation of the raw material have.

Therefore, the deposition apparatus according to the embodiment of the present invention is characterized in that the sealing member 505 includes the engaging portion 506 for automatically removing the sealing member 505 from the housing 501, A fixing member 900 may be installed to be fastened to the coupling portion 506. FIG.

3, the sealing member 505 is coupled to the opened upper end of the housing 501, and the engaging portion 506 is formed in a direction crossing a part of the sealing member 505 in the first direction, And can be formed by protruding upward. The fixing member 900 is disposed inside the supply chamber 200 and grips the sealing member 505 protruding in the direction crossing the first direction. The fixing member 900 may be configured in various configurations such as a grip for gripping the sealing member 505 and the like while the sealing member 505 is provided from the housing 501 during the movement from the supply chamber 200 to the deposition chamber 100. [ A through hole 507 is formed in the engaging portion 506 of the sealing member 505 and the fixing member 900 includes a hook extending to be inserted into the through hole 507 Can be configured. That is, a part of the sealing member 505 may protrude in the direction intersecting the first direction to form the engaging portion 506, and the engaging portion 506 may form the through-hole 507 along the first direction . Further, the fixing member 900 may be a hook extending in the first direction to be inserted into the through hole 507. The coupling portion 506 is formed at one end of the sealing member 505, that is, at one end of the sealing member 505 facing the deposition chamber 100, In the case of the present invention. To this end, the sealing member 505 may be formed of a flexible material, and may be formed of a metal sheet or a polymer sheet.

4, the process of separating and separating the sealing member 505 will be described in detail. First, the storage container 500 is provided with a sealing member (not shown) at the upper end of the housing 501 505 are attached to the inside of the supply chamber 200. As the storage container 500 is moved by the first transfer unit 410, the engaging portion 506 of the sealing member 505 is fastened to the fixing member 900 installed in the supply chamber 200. 4 (b), the storage container 500 is moved from the supply chamber 200 to the deposition chamber 100, as shown in FIG. 4 (b) And is separated from the upper end of the housing 501 and remains in the supply chamber 200. The remaining sealing member 505 can be removed when a new storage container 500 filled with the raw material is supplied to the supply chamber 200.

In addition, the storage vessel 500 may include an alignment unit to attach to the precise location of the injection unit, i.e., the nozzle 720. The reservoir 500 can be accurately attached to the center of the nozzle 720, for example, as shown by the dotted line in Fig. 4 (b). In this case, the aligning unit may include an aligning pin protruding from the upper surface of the storage container 500 to be inserted into a groove formed in the nozzle to guide the attachment position of the storage container 500.

Hereinafter, a deposition method for depositing a substrate by replacing the storage container 500 in a vacuum state using the above-described vapor deposition apparatus will be described in detail.

5 to 9 are views for explaining a deposition method using a deposition apparatus according to an embodiment of the present invention.

5 to 9, a deposition method according to an embodiment of the present invention includes the steps of supplying a first storage container 500 filled with a raw material to a supply chamber 200; Adjusting the internal pressure of the supplied supply chamber 200 by the first storage vessel 500; Transferring the first storage container (500) to a deposition chamber (100) installed at one side of the supply chamber (200); Heating the first storage container 500 to provide a raw material to the substrate; Adjusting the internal pressure of the discharge chamber (300) installed at one side of the deposition chamber (100); And transferring the first storage container 500 in which the raw material is exhausted to the discharge chamber 300.

First, in the process of supplying the first storage container 500 filled with the raw material to the supply chamber 200, the first storage container 500 filled with the raw material is supplied from the outside to the supply chamber 200. In the process of supplying the first storage container 500 from the outside to the supply chamber 200, the first storage container 500 is sealed and sealed by the sealing member 505 to prevent denaturation of the raw material. . The sealing member 505 is detachably coupled to the open upper portion of the housing 501 and the sealing member 505 can be formed at one end with the engaging portion 506 in which the through hole 507 is formed. As shown above.

The process of adjusting the internal pressure of the supplied supply chamber 200 by the first storage vessel 500 is performed by supplying the first storage vessel 500 from the outside to the supply chamber 200 in a non- Adjust the internal pressure to vacuum. This can be achieved by adjusting the exhaust pump of the supply chamber 200, and the internal pressure is adjusted separately from the deposition chamber 100 maintained in a vacuum state.

The process of transferring the first storage container 500 to the deposition chamber 100 installed at one side of the supply chamber 200 may be performed by the first transfer unit 410, ) To the deposition chamber (100). Here, the first gate 620 is opened so that the first storage container 500 is transferred from the supply chamber 200 to the deposition chamber 100, and the supply chamber 200 and the deposition chamber 100 are maintained in a vacuum state do. As described above, the first storage container 500 can be supplied in a sealed state by the sealing member 505, and the sealing member 505 attached to the housing 501 can be connected to the first storage container 500 Is separated from the first storage container 500 by the fixing member 900 installed inside the supply chamber 200 in the process of transferring the first storage container 100 to the deposition chamber 100. The process of separating and removing the sealing member 505 attached to the housing 501 in the process of transferring the first storage container 500 from the supply chamber 200 to the deposition chamber 100 is the same as the above- , And a duplicate description thereof will be omitted.

The process of supplying the raw material to the substrate by heating the first storage container 500 may include the step of supplying the first storage container 500 transferred from the supply chamber 200 to the deposition chamber 100 as shown in FIG. 2 transferring unit 420 to the center of the nozzle 720, and is moved upward to be attached to the nozzle 720. Thereafter, the first storage container 500 is heated by a heater installed outside the first storage container 500 attached to the nozzle 720 to vaporize the raw material filled in the first storage container 500, Thereby performing the deposition process. In addition, when the deposition process is completed, the first storage container 500 is detached from the nozzle 720 by the second transfer unit 420 as shown in FIG.

The process of supplying the second storage container 510 filled with the raw material during the process of heating the first storage container 500 and supplying the raw material to the substrate may be performed simultaneously. That is, the deposition method according to the embodiment of the present invention includes a process of supplying the second storage container 510 filled with the raw material to the supply chamber 200, and a process of supplying the second storage container 510 to the supply chamber 200 and the second reservoir 510 to the supply chamber 200 and the second reservoir 510 is supplied to the supply chamber 200. In this case, 200 may be performed simultaneously with the step of supplying the raw material to the substrate by heating the first storage container 500. [ Here, the sealing member 505 separated from the first storage container 500 and remaining in the supply chamber 200 may be removed in the course of supplying the second storage container 510.

The process of adjusting the internal pressure of the discharge chamber 300 installed at one side of the deposition chamber 100 adjusts the internal pressure of the discharge chamber 300 to a vacuum state. This can be accomplished by adjusting the exhaust pump of the discharge chamber 300 and adjusting the internal pressure separately from the deposition chamber 100 maintained in the vacuum state. The process of controlling the internal pressure of the discharge chamber 300 may be performed after the first storage container 500 is heated to provide the raw material to the substrate. However, the first storage container 500 may be heated, Or simultaneously with the process of providing the material to the substrate. When the internal pressure of the discharge chamber 300 is adjusted to a vacuum state at the same time as the raw material is supplied to the substrate by heating the first storage container 500 as described above, immediately after the deposition process is completed, 1 storage vessel 500 from the deposition chamber 100 to the discharge chamber 300. [

The first storage container 500 having the exhausted raw material is transferred to the discharge chamber 300 as shown in FIG. 8 by moving the first storage container 500 in the first direction by the third transfer part 430 And transported to the discharge chamber 300. Here, the second gate 640 is opened so that the first storage vessel 500 is transferred from the deposition chamber 100 to the discharge chamber 300, and the deposition chamber 100 and the discharge chamber 300 are maintained in a vacuum state do. In addition, when the process of supplying the second storage container 510 filled with the raw material material is performed at the same time during the process of heating the first storage container 500 and providing the raw material to the substrate as described above, The deposition method according to the embodiment may further include transferring the second storage container 510 to the deposition chamber 100 and transferring the second storage container 510 to the deposition chamber 100 , And transferring the first storage container (500) in which the raw material is exhausted to the discharge chamber (300). That is, the first gate 620 and the second gate 640 are opened simultaneously with respect to the supply chamber 200, the deposition chamber 100, and the discharge chamber 300 controlled to the vacuum state, The discharge of the first storage container 500 in which the raw material is exhausted and the supply of the second storage container 510 filled with the raw material can be performed at the same time.

9, the first storage container 500 in which the raw material disposed in the discharge chamber 300 is exhausted is discharged to the outside of the discharge chamber 300. The vacuum of the discharge chamber 300 is broken and the internal pressure of the discharge chamber 300 is adjusted again before the second storage vessel 510 is transferred from the deposition chamber 100 to the discharge chamber 300. [ The second storage container 510 is attached to the nozzle 720 and the deposition process is continuously performed. At this time, the third storage container 520 filled with the raw material is supplied into the supply chamber 200, The deposition process is performed.

As described above, according to the deposition apparatus and the deposition method using the deposition apparatus according to the embodiment of the present invention, the supply chamber 200 and the discharge chamber 300, in which the internal pressure is controlled, are installed on one side and the other side of the deposition chamber 100, respectively , The storage container in which the raw material is stored can be moved along the supply chamber 200, the deposition chamber 100, and the discharge chamber 300 to easily replace the storage container in a vacuum state.

Further, the storage container may be formed to have a plate shape so that the interval between the nozzles 720 to which the storage containers are coupled can be narrowed, thereby improving the deposition efficiency and the deposition uniformity.

In addition, during the transfer of the storage container from the supply chamber 200 to the deposition chamber 100, the sealing member 505 for sealing the storage container by the fixing member 900 is automatically removed, And to automate the process for depositing the substrate.

While the preferred embodiments of the present invention have been described and illustrated above using specific terms, such terms are used only for the purpose of clarifying the invention, and the embodiments of the present invention and the described terminology are intended to be illustrative, It will be obvious that various changes and modifications can be made without departing from the spirit and scope of the invention. Such modified embodiments should not be individually understood from the spirit and scope of the present invention, but should be regarded as being within the scope of the claims of the present invention.

100: deposition chamber 200: supply chamber
300: exhaust chamber 410: first conveyance part
420: second transfer part 430: third transfer part
500: storage container 500: housing
505: sealing member 506:
507: Through hole 620: First gate
640: second gate 710: injection hole
720: nozzle 800: substrate support
900: Fixing member

Claims (17)

A deposition chamber in which a process space is formed;
A supply chamber connected to the deposition chamber;
A discharge chamber connected to the deposition chamber;
A transfer unit for transferring a storage container accommodated in the supply chamber to the deposition chamber or to move the deposition chamber to the discharge chamber;
A substrate supporting unit installed inside the deposition chamber to seat the substrate; And
And a spray unit for spraying a raw material stored in the storage container to a substrate placed on the substrate support.
The method according to claim 1,
Wherein the supply chamber and the discharge chamber are controlled in internal pressure independently of the deposition chamber.
The method according to claim 1,
The transfer unit
A first transfer unit installed inside the supply chamber to move the storage container in a first direction;
A second transfer unit installed inside the deposition chamber to move the storage container in a first direction and a second direction intersecting the first direction; And
And a third transfer unit installed inside the discharge chamber to move the storage container in a first direction.
The method of claim 3,
Wherein the storage container has a plate shape extending in the first direction and the second direction.
The method of claim 3,
Wherein the injection unit comprises:
And a nozzle which is removably attachable to the storage container and has a plurality of spray holes arranged in the first direction and installed in an inner space of the deposition chamber.
The method of claim 5,
Wherein the plurality of nozzles are provided in a direction intersecting with the first direction and the second direction.
The method of claim 3,
Wherein the injection unit comprises:
And a heater installed in an inner space of the deposition chamber for heating the storage vessel,
Wherein the heater is formed along a plane including the first direction and the second direction.
The method of claim 3,
Wherein the storage container comprises:
A housing having an inner space for accommodating the raw material and at least a part of which is opened; And
And a sealing member detachably coupled to an open top of the housing.
The method of claim 8,
Wherein the sealing member includes a coupling portion,
And a fixing member is installed in the supply chamber so as to be fastened to the coupling portion.
The method of claim 9,
A through hole is formed in the coupling portion,
And the fixing member includes a hook extending to be inserted into the through hole.
The method of claim 9,
Wherein the engaging portion is formed at one end of the sealing member.
Supplying a first storage container filled with a raw material to a supply chamber;
Adjusting the internal pressure of the supply chamber to which the first storage container is supplied;
Transferring the first storage container to a deposition chamber provided at one side of the supply chamber;
Heating the first storage vessel to provide a raw material to the substrate;
Adjusting the internal pressure of the discharge chamber provided at one side of the deposition chamber; And
And transferring the first storage container having the exhausted raw material to the discharge chamber.
The method of claim 12,
Supplying a second storage container filled with a raw material to the supply chamber; And
And adjusting the internal pressure of the supply chamber to which the second storage container is supplied,
The process of supplying the second storage container to the supply chamber and the process of adjusting the internal pressure of the supply chamber supplied with the second storage container may include heating the first storage container to provide the raw material to the substrate, Lt; / RTI >
14. The method of claim 13,
And transferring the second storage container to the deposition chamber,
Wherein the step of transferring the second storage container to the deposition chamber is performed simultaneously with the transfer of the first storage container in which the raw material is exhausted to the discharge chamber.
The method of claim 12,
Wherein the step of controlling the internal pressure of the discharge chamber is performed simultaneously with the step of providing the raw material to the substrate by heating the first storage container.
The method of claim 12,
The first storage container is supplied to the supply chamber in a sealed state by the sealing member in the process of supplying the first storage container to the supply chamber,
Wherein the sealing member is separated from the first storage vessel in the course of transferring the first storage vessel to the deposition chamber.
The method of claim 12,
Wherein adjusting the internal pressure of the supply chamber and adjusting the internal pressure of the discharge chamber adjust the internal pressure of the supply chamber and the discharge chamber to a vacuum state.

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