KR20090081497A - 광중합수지를 이용한 입체이미지 형성방법 - Google Patents
광중합수지를 이용한 입체이미지 형성방법 Download PDFInfo
- Publication number
- KR20090081497A KR20090081497A KR1020080007396A KR20080007396A KR20090081497A KR 20090081497 A KR20090081497 A KR 20090081497A KR 1020080007396 A KR1020080007396 A KR 1020080007396A KR 20080007396 A KR20080007396 A KR 20080007396A KR 20090081497 A KR20090081497 A KR 20090081497A
- Authority
- KR
- South Korea
- Prior art keywords
- dimensional
- photopolymer resin
- resin
- dimensional image
- photopolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 52
- 239000011347 resin Substances 0.000 title claims abstract description 52
- 238000000034 method Methods 0.000 title claims abstract description 30
- 230000015572 biosynthetic process Effects 0.000 title claims description 3
- 239000002184 metal Substances 0.000 claims abstract description 23
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 23
- 239000000057 synthetic resin Substances 0.000 claims abstract description 23
- 239000002023 wood Substances 0.000 claims abstract description 22
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 230000000873 masking effect Effects 0.000 claims abstract description 8
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 230000001070 adhesive effect Effects 0.000 claims abstract description 4
- 239000010410 layer Substances 0.000 claims description 29
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims description 3
- 238000007639 printing Methods 0.000 claims description 3
- 239000000853 adhesive Substances 0.000 abstract description 3
- 239000000976 ink Substances 0.000 description 12
- 239000011247 coating layer Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000465 moulding Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 230000019612 pigmentation Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44F—SPECIAL DESIGNS OR PICTURES
- B44F7/00—Designs imitating three-dimensional effects
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Printing Methods (AREA)
Abstract
Description
Claims (3)
- 평면형상 또는 입체형상으로 된 금속물 또는 합성수지물 또는 목재의 표면에 광중합수지잉크를 도포하는 단계와, 상기 광중합수지잉크 도포면 위에 특정 문양이 형성된 점착특성을 갖는 마스크필름을 배치하는 단계와, 상기 마스크필름위에 빔을 조사하여 마스크필름상의 이미지 문양에 따라 광중합수지잉크 도포면을 선택적으로 노광하는 단계와, 노광된 부분을 현상하여 평면형상 또는 입체형상의 금속물 또는 합성수지물 또는 목재 표면에 상기 광중합수지층에 의한 높낮이 단차로 만들어지는 입체형상의 이미지를 형성하는 단계를 포함하는 것을 특징으로 하는 광중합수지를 이용한 입체 이미지 형성방법.
- 제1항에 있어서, 상기 광중합수지잉크 도포면 현상후 입체문양을 형성하는 상기 광중합수지층을 보호하기 위해 전면 탑코팅을 실시하는 것을 특징으로 하는 광중합수지를 이용한 입체 이미지 형성방법.
- 제1항에 있어서, 상기 마스크필름은 입체이미지 형성 대상물의 표면에 즉시 부착 가능한 스티커 형태를 가지도록 이미지 형상 인쇄후 마스킹 접촉면에 점착제를 도포하여 점착층을 만들어주는 것을 특징으로 하는 광중합수지를 이용한 입체 이미지 형성방법.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080007396A KR20090081497A (ko) | 2008-01-24 | 2008-01-24 | 광중합수지를 이용한 입체이미지 형성방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020080007396A KR20090081497A (ko) | 2008-01-24 | 2008-01-24 | 광중합수지를 이용한 입체이미지 형성방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20090081497A true KR20090081497A (ko) | 2009-07-29 |
Family
ID=41292760
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020080007396A Abandoned KR20090081497A (ko) | 2008-01-24 | 2008-01-24 | 광중합수지를 이용한 입체이미지 형성방법 |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR20090081497A (ko) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101064585B1 (ko) * | 2010-01-22 | 2011-09-15 | 주식회사 엘지화학 | 광배향막 배향 처리용 점착 필름 |
| WO2011090355A3 (ko) * | 2010-01-22 | 2012-01-05 | (주)Lg화학 | 광배향막 배향 처리용 점착 필름 |
-
2008
- 2008-01-24 KR KR1020080007396A patent/KR20090081497A/ko not_active Abandoned
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101064585B1 (ko) * | 2010-01-22 | 2011-09-15 | 주식회사 엘지화학 | 광배향막 배향 처리용 점착 필름 |
| WO2011090355A3 (ko) * | 2010-01-22 | 2012-01-05 | (주)Lg화학 | 광배향막 배향 처리용 점착 필름 |
| CN103777359A (zh) * | 2010-01-22 | 2014-05-07 | 株式会社Lg化学 | 用于光取向膜取向处理的粘性薄膜 |
| US9417367B2 (en) | 2010-01-22 | 2016-08-16 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
| US9417368B2 (en) | 2010-01-22 | 2016-08-16 | Lg Chem, Ltd. | Pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20080124 |
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| PA0201 | Request for examination | ||
| N231 | Notification of change of applicant | ||
| PN2301 | Change of applicant |
Patent event date: 20080827 Comment text: Notification of Change of Applicant Patent event code: PN23011R01D |
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| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20091112 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20100501 |
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| NORF | Unpaid initial registration fee | ||
| PC1904 | Unpaid initial registration fee |