KR20080088801A - Polishing liquid composition for color filter polishing - Google Patents

Abstract

A polishing solution composition for a color filter is provided to inhibit the interaction of a filter material such as a resin with a dye or a dispersant during polishing process, thereby preventing the deformation of the chemical properties of a pigment contained in a filter. A polishing solution composition for a color filter comprises 0.5-45 wt% of an abrasive selected from the group consisting of a carbon compound, diamond, a nitrogen compound and their mixture; a buffer solution used for controlling the pH; and an additive used for controlling the interface potential of the composition particle at a specific pH or less. Preferably the abrasive has a primary particle size of 10 nm to 1 micrometer; the carbon compound is selected from silicon carbide, boron carbide, titanium carbide, tungsten carbide, zirconium carbide and their mixture; and the nitrogen compound is selected from aluminum nitride, boron nitride, carbon nitride, titanium nitride, tantalum nitride and their mixture.

Description

Polishing liquid composition for color filter polishing {SLURRY COMPOSITION FOR POLISHING COLOR FILTER}

1 is a diagram showing the structure of a conventional color filter.

2 is a diagram showing the structure of a conventional color filter;

3 is a scanning electron microscope (SEM) photograph of diamond abrasive particles (0.50 um).

4A to 4B are SEM photographs of color filters after polishing using a color filter polishing liquid composition having diamond (50 nm) as abrasive grains.

5 is a SEM photograph of silicon carbide abrasive grain (0.65 um).

FIG. 6 is a color filter optical microscope (OM) photograph after polishing using a color filter polishing liquid composition using silicon carbide (0.65 um) as abrasive particles; FIG.

<Explanation of symbols for main parts of the drawings>

100: glass substrate

102, BM: Black Matrix

104a ~ 104c: Color Layer

106: Over Coat

108: transparent conductive film

R, R1, R2, B, B1, B2, G, G1, G2: Position

The present invention relates to a polishing liquid, and more particularly, to a polishing liquid composition for polishing a color filter.

As computer performance has improved significantly and network and multimedia technologies have advanced, most of the transmission of video information has shifted from analog to digital, and the volume of video or video equipment has become lighter and thinner in line with modern lifestyles. have. Although the conventional cathode ray tube monitor (CRT) still has advantages, the internal structure of the display not only takes up a lot of space due to the large volume of the display, but also has problems such as eye damage due to radiation when implementing the screen. Therefore, flat panel displays, such as liquid crystal monitors (LCDs), organic light emitting diodes (OLEDs), or plasma display panels (PDPs), which have been developed by combining photoelectric technology and semiconductor manufacturing technology, have become mainstream in the display industry. Appeared as.

All LCDs are currently developing full-color, large-sized, and high-resolution, and color filters (CFs) must be installed for color image functions. The color filter not only affects the color characteristics of the display panel, but also determines the performance of contrast, luminance, and surface reflection of the panel.

The main reason why LCDs can realize color images is because they are equipped with color filters, and three-color pigment photoresists of red, green, and blue are applied to the color filter surface. When the backlight forms a grayscale light source through the control of the liquid crystal and the driving IC, and the light source again forms a color filter, that is, red, green, and blue light, it is finally mixed in the human eye to realize a color image. Will be. The color filter is a major component of the thin-film transistor (TFT) panel, and in terms of material cost, the color filter has a higher cost than the backlight module or driver IC, and thus the largest share of the panel cost. It is a big part.

1 is a diagram illustrating the structure of an existing color filter. As shown in FIG. 1, the basic structure of the color filter includes a glass substrate 100, a black matrix 102, a color layer 104a to 104c, and an overcoat. Coat 106 and an indium tin oxide (ITO) transparent conductive film 108. Currently, the thickness of the glass substrate 100 has already been reduced to 0.63mm or 0.55mm to reduce the weight of the large LCD module. The black matrix 102 is a component that plays an important role in separating the color layers 104a to 104c into three colors of RGB and increasing color contrast. The black matrix 102 should generally have a low reflectance, and the lower the reflectance, the higher the color realization. The black matrix 102 is made of two materials, chromium and resin.

There are about 10 manufacturing methods for color filters, among which pigment dispersing method, dyeing method, printing method and electrodeposition method are relatively used. Among them, the pigment dispersion method is widely used because of its high reliability, high resolution, and good resistance to high temperatures.

The basic composition of the photoresist ink (also called color resist) used for the color filter manufactured by the pigment dispersion method is composed of monomers such as dispersants, additives, bonding resins and reactive diluents, photopolymerization initiators, and solvents. Photoresist inks of RGB trichromatic coloring materials are generally alkaline negative photoresist. Pigment structures include Azo-based, phthalocyanine organic pigments, and various mixed polycyclic systems, and mixtures are selected and used in consideration of their characteristics, product performance, and manufacturing process.

The color filter manufacturing process of the pigment dispersion method includes a black matrix process, an RGB process, and a post process. In the black matrix process, first, the surface of an alkali-free boron-free glass substrate coated with SiON overcoat is thinly coated, and a low-reflection two-layer film of chromium oxide / chromium is formed and used as a substrate. This low reflection two-layer film is called metal black. Next, a positive photoresist is formed on the metal black by spin coating. Thereafter, ultraviolet rays are irradiated and exposed through a black matrix TMA pattern. After the photoresist development, the metal black is etched to form a black matrix pattern.

The RGB process is performed after the pattern of the black matrix is formed. The so-called RGB process is a process of forming R, G, and B three-color patterns in the openings. First, the red (R) color resist is colored by spin coating, exposed to ultraviolet rays having a wavelength of 248 nm or less through the pattern gerber for R, and then exposed, and then a basic developer is used to remove the unexposed portions for the first color. Create an R pattern. It is then post-baked again above 200 degrees Celsius, making the pattern tolerant. Subsequently, the red (R) color resist is replaced with a green (G) color resist or a blue (B) color resist to repeat the same process as the R pattern to form a G pattern and a B pattern. Each pattern is separated by a black matrix, which is designed to increase contrast and prevent variegated light from appearing on the display. Finally, a post process is performed to form a color filter by forming an ITO transparent electrode layer of a counter electrode on a TFT array substrate.

In order for the surface of the color filter to have optical characteristics such as reflectance and spectral transmittance that are consistent and to produce excellent visual effects, the surface of the color filter after the RGB process must be flattened (usually using chemical mechanical polishing). The ITO transparent electrode layer should be layered. As shown in FIG. 2, when the process of forming the R, G, and B tricolor patterns is completed, all of the patterns are separated by the black matrix BM. According to the needs of various specifications, the height of the peak after polishing, that is, the positions of R1, R2, B1, B2, G1, and G2 must be lowered to below 5000Å, and the positions of Trpugh R, B, G should be polished. After that, the RGB loss must be suppressed to 500Å or less.

However, when the color filter is planarized by the chemical mechanical polishing method, the compound contained in the polishing liquid used may change the chemical properties of the pigment in the filter during the polishing process.

In view of such a situation, an object of the present invention is to prepare a color filter polishing liquid composition, and more specifically, to reduce the possibility that the material of a filter such as a resin may interact with dyes and dispersants during polishing. By preparing a polishing liquid, it is possible to maintain the stability of the filter material, thereby increasing the reliability, production efficiency and yield of the manufactured color filter.

In order to enhance the cutting function of the machine when the color filter is flattened by the chemical mechanical polishing method, the present invention improves the cutting force by using abrasive particles having a hardness higher than that of ordinary oxide, while reducing the influence of chemical action.

The present invention relates to a kind of color filter polishing liquid composition, and comprises at least an abrasive buffer solution and an additive. The abrasive is selected from carbon compounds, diamonds, nitrogen compounds, or mixtures thereof.

The carbon compound in the polishing liquid composition is selected from the group consisting of silicon carbide, boron carbide, vanadium carbide, titanium carbide, tungsten carbide, zirconium carbide, or mixtures thereof.

The nitrogen compound in the polishing liquid composition is selected from the group consisting of boron nitride, carbon nitride, aluminum nitride, titanium nitride, tantalum nitride, or mixtures thereof.

In the polishing liquid composition, the primary particle size of the abrasive particles is less than 1.0 micrometer, the most common particle diameter is 10 nanometers to 1 micrometer, and the most preferable particle diameter is 30 to 800 nanometers. The content of the abrasive in the color filter polishing liquid composition is 0.5 to 45 weight percent, and the preferred concentration is 2 to 25 weight percent.

The buffer solution is a solution that buffers the pH value by adjusting the pH value. The buffer solution is selected from the group consisting of inorganic acids, organic acids, bases, and mixtures or salts thereof, and the content in the color filter polishing liquid composition is 0.01 to 0.05 weight percent. The buffer solution is used differently depending on the abrasive. For example, the inorganic acid may be used for sulfuric acid, hydrochloric acid, nitric acid, and the like, and the organic acid may be selected from the group consisting of glycine, formic acid, acetic acid, propionic acid, malic acid, citric acid, succinic acid, and mixtures thereof. When using other organic acids, organic or inorganic salts containing sodium, potassium, calcium and iron can be added. Among the bases, sodium hydroxide, potassium hydroxide and the like can be used.

The additive of the polishing liquid composition contains a surfactant, which is used to control the surface potential of the polishing liquid composition, increase the degree of dispersion and flotation at a specific pH value, and ensure stability of the polishing liquid composition. . The surfactant may be selected from aluminum chloride, aluminum propane oxide or mixtures thereof, or may be selected from polycarboxylic acids, ammonium salts of polycarboxylic acids, alkaline salts, aliphatic polymers, or mixtures thereof. The content of the color filter in the color filter polishing liquid composition is 0.3 to 1.0 weight percent. The molecular weight of aliphatic polymer is 1000-5000 Daltons.

The additive of the polishing liquid composition is selected from N-methylpyrrolidone, gamma butyrolactone, menaacrylamide, N-vinyl pyrrolidone, and a composition in which these are mixed at a constant ratio, or methylacrylamide, N, N'-methylene-bis-acrylamide, polyethyleneglycol, methylmethacrylate, methoxy polyethyleneglycol monomethacrylate and a composition in which these are mixed at a constant ratio can be selected to increase the polishing rate and polishing quality. .

The polishing liquid composition of the present invention is suitable for the polishing filter, in particular, the polishing rate for the color filter is higher than that of the existing polishing liquid.

In addition, since the color filter polishing liquid composition of the present invention adds a special abrasive, it is possible to reduce chemical reaction with the photoresist material in the polishing process, thereby preventing excessive erosion of the filter and causing unnecessary erosion problems. By increasing the reliability of the color filter pattern, it is possible to manufacture a reliable optical component that is accurate, accurate in specifications and excellent in optical characteristics.

To help understand the above and other objects, features, and advantages of the present invention, the following description will be made in detail with reference to embodiments and drawings.

The color filter polishing liquid composition of the present invention is a chemical aid to assist in polishing the filter. This kind of color filter polishing liquid composition may be used alone as a polishing liquid of a color filter polishing process or in parallel with other color filter polishing liquids.

The color filter polishing liquid composition of the present invention includes at least one, or at least one abrasive, and the abrasive may be selected from carbon compounds, diamonds, nitrogen compounds, or mixtures thereof. When a carbon compound is used as an abrasive, a group consisting of silicon carbide, boron carbide, vanadium carbide, titanium carbide, tungsten carbide, zirconium carbide, or mixtures thereof may be used. Diamond can be used as the abrasive. When a nitrogen compound is used as the abrasive, a group consisting of boron nitride, carbon nitride, aluminum nitride, titanium nitride, tantalum nitride, or a mixture thereof can be used. The particle diameter is about 50 nanometers to 5 micrometers, and the abrasive concentration of the color filter polishing liquid composition of the present invention is 0.5 to 45 weight percent, most preferably 2 to 25 weight percent abrasive.

In the production of color filters, since the demand for the purity of the abrasive is strict, the abrasive is preferably high in purity. So-called high purity means that the underlying total impurity content (such as raw impurities or trace processed contaminants) is 100 ppm or less, and the purpose is to reduce the potential contamination of the polishing liquid to the filter, thus preventing its impact on performance and service life. It is.

An excellent abrasive can be used as an aqueous acid solution in combination with aqueous reforming (deionized water, etc.). Aqueous acid solutions of this kind of abrasive can be prepared by conventional techniques. For example, the abrasive is added to a suitable reforming, and the mixture is subjected to the existing high speed cutting dispersion to form a dispersion in a suspended state, and then the pH value of the dispersion is adjusted so that the dispersed polishing liquid has excellent stability. .

The color filter polishing liquid composition of the present invention contains at least one buffer solution. This buffer solution is used as a buffer solution for adjusting the pH value of the color filter polishing liquid composition. The buffer solution may be selected from the group consisting of inorganic acids, organic acids, bases and mixtures thereof, or salts thereof. The buffer solution is used according to the abrasive. In the case of inorganic acids, it can be selected from sulfuric acid, hydrochloric acid, nitric acid, etc., and in the case of organic acids, it can be selected from the group consisting of glycine, formic acid, acetic acid, propionic acid, malic acid, citric acid, succinic acid and mixtures thereof. In addition, the organic acid may contain organic salts such as potassium nitrate, potassium iodide, potassium carbonate, inorganic salts, or mixtures thereof. The buffer solution may include sodium, potassium, calcium, iron ions, and the base may be sodium hydroxide, potassium hydroxide, or the like.

The content of the buffer solution in the color filter polishing liquid composition is 0.01 to 0.05 weight percent. The color filter polishing liquid composition is excellent in that the pH value of the buffer solution can be adjusted to 2 to 10, and more excellent if the pH value can be adjusted to 5 to 9.

In addition to the above-described structures described in the present invention, other polishing liquid additives may be used in combination with the color filter polishing liquid composition of the present invention. These additives include surfactants.

The color filter polishing liquid composition of the present invention includes at least one additive, and this kind of additive stabilizes the growth of the particle size of the abrasive under acidic conditions, stabilizes the particle surface charge of the abrasive particles, Used to maintain long term stability under acidic conditions.

The surfactant may be selected from among polycarboxylic acids, ammonium salts of polycarboxylic acids, alkaline salts, aliphatic polymers, or mixtures thereof. The surfactant content of the color filter polishing liquid composition is 0.3 to 1.0 weight percent. The molecular weight of aliphatic polymer is 1000-5000 Daltons.

The additive is selected from N-methylpyrrolidone, gamma butyrolactone, menaacrylamide, N-vinyl pyrrolidone, and a composition in which these are mixed in a constant ratio, or methylacrylamide, N, N'-methylene-bis -Acrylamide, polyethyleneglycol, methylmethacrylate, methoxy polyethyleneglycol monomethacrylate, and a composition in which these are mixed at a constant ratio.

In the color filter polishing method of the present invention, the polishing liquid composition is placed on the surface of the color filter on the polishing table, and then the color filter is polished by using the relative motion between the color filter and the polishing base. In the polishing process, the polishing liquid is continuously supplied between the surface of the polishing base and the polished surface of the bottom. After polishing, the polishing liquid is washed thoroughly and dried.

In the color filter polishing liquid composition of the present invention, since a special polishing component is added, the polishing component generates a chemical reaction with the photoresist material of the filter unit during polishing, and thus does not affect the optical properties of the filter. Polished to avoid causing unnecessary erosion problems. By increasing the reliability of the color filter pattern, it is possible to manufacture a reliable color filter module that is accurate, accurate in specifications and excellent in optical characteristics.

Hereinafter, the present invention will be described with reference to Examples 1 to 9. However, the present invention is not only applicable to the following examples. Polishing liquid constitutions of Examples 1 to 9 are shown in Table 1. After the polishing liquid compositions of Examples 1 to 9 are prepared, polishing is performed on the color filter samples that have already been prepared. Polishing results of Examples 1 to 8 are shown in Table 2.

First, the height of the RGB tricolor peak must be measured and recorded, and measured again after polishing to verify the effect of the polishing liquid. The removal rate of the polishing liquid should be checked on the premise that the RGB loss must be suppressed below 500 Hz. The experimental conditions of this experiment are as follows.

Downforce on the grinder table = 0.03 psi or 0.08 psi

Rotation speed of the polishing table = 20 rpm

Polishing time = 20 sec

Polishing fluid flow rate = 60 ml / min

Then, the polishing rate is calculated by dividing the difference in the film thickness before polishing and after polishing by the polishing time. Here, the film thickness is measured using a P15 surface profiler manufactured by KLA Tencor. Δh _R , Δh _G , Δh _B represent the average polishing amounts of the R, G, and B color resists, respectively.

Next, Examples 1 to 9 and the experimental results will be described.

Table 1

Example Abrasive Buffers and Surfactants Name, particle size content pH designation One Diamond ， ~ 50 nm 0.5 wt% 5.0 Surfactants with 0.01 to 0.05 wt% hydrochloric acid or 0.01 to 0.05 wt% potassium hydroxide and 0.3 to 1.0 wt% 2 Diamond ， ~ 50 nm 0.5 wt% 7.0 3 Diamond ， ~ 50 nm 0.5 wt% 9.0 4 Diamond ， ~ 50 nm 5 wt% 7.0 5 (new) Diamond ， ~ 100 nm 10 wt% 4.3 6 Silicon carbide ， 0.65 um 20 wt% 5.0 7 Silicon carbide ， 0.65 um 20 wt% 7.0 8 Silicon carbide ， 0.65 um 20 wt% 9.0 9 (new) Boron nitride ， 0.65 um 10 wt% 5.0

Table 2

Example pH Down force psi Average polishing amount Δh _R Å / 20 sec Δh _G Å / 20 sec Δh _B Å / 20 sec One 5.0 0.05 259 383 206 2 7.0 0.05 154 211 160 3 9.0 0.05 473 580 384 4 7.0 0.08 1673 2239 1770 5 4.3 0.05 1288 1275 1604 6 5.0 0.05 3686 4697 4258 7 7.0 0.05 2707 3610 2852 8 9.0 0.05 3616 4217 3610 9 5.0 0.03 2674 3128 2828

Examples 1 to 3

As shown in Tables 1 to 2, Examples 1 to 3 used 0.5 wt% diamond (particle size about 50 nm) as an abrasive to prepare a polishing liquid (pH values of 5.0, 7.0, and 9.0, respectively). Examples 1 and 3 met the requirements of the color filter production process, although the average Δh _R / Δh _G / Δh _B polishing amount was low for 20 seconds under 0.05 psi of down force. 3 is a scanning electron microscope (SEM) photograph of diamond abrasive particles (0.50 um). 4A to 4B are SEM photographs of the color filter after polishing, showing a color filter polishing liquid composition having diamond (50 nm) as abrasive particles. 4A to 4B, there is no scratch on the surface of the color filter after polishing, the flatness is very excellent, and the surface roughness is very low.

Example 4

In Tables 1 to 2, Example 4 prepared a polishing liquid (pH = 7.0) using 5 wt% diamond (particle size about 50 nm) as an abrasive. It can be seen that the polishing amount of Δh _R / Δh _G / Δh _{B for} 20 seconds under a down force of 0.08 psi is superior to that in Example 2.

Example 5

In Tables 1 to 2, Example 5 prepared a polishing liquid (pH = 4.3) using 10 wt% diamond (particle size about 100 nm) as the abrasive. However, the manufacturing method and shape of the diamond abrasive is different from Examples 1 to 4. It can be seen that the amount of Δh _R / Δh _G / Δh _B polishing for 20 seconds under a down force of 0.05 psi satisfies the requirements of the color filter production process, and is superior to that of Example 1.

Examples 6-8

In Tables 1 to 2, Examples 6 to 8 prepared polishing liquids (pH values of 5.0, 7.0 and 9.0, respectively) using 20 wt% of silicon carbide (particle diameter of about 0.65 μm) as an abrasive. The average Δh _R / Δh _G / Δh _B polishing amount for 20 seconds under down force 0.05 psi met the requirements of the color filter production process. FIG. 5 is an SEM photograph of silicon carbide abrasive grain (0.65 um), and it can be seen that the cutting force is excellent when it is seen that the shape of the abrasive grain is a sharp polygon. 6 is a color filter optical microscope (OM) photograph after polishing, and is a color filter polishing liquid composition using silicon carbide (0.65 um) as polishing particles. 6 is a surface of the color filter after polishing, with no scratches on the surface, and relatively flat.

Example 9

In Tables 1 to 2, Example 9 prepared a polishing liquid (pH value 5.0) with 10 wt% of cubic boron nitride (CBN, Cubic Boron Nitride, particle size of about 0.65 μm) as an abrasive, and the shape of the abrasive particles was sharp. It has a polygon and shows that cutting force is excellent. Average Δh _R / Δh _G / Δh _B polishing for 20 seconds under down force 0.03psi met the requirements of the color filter production process.

Through the experimental results, the color filter polishing liquid composition of the present invention reduces the chemical reaction occurring between the photoresist material during the polishing process due to the characteristics of the abrasive and the component, and unexpected effects on the photoresist material occur, resulting in a TFT LCD. The impact on the service life of the panel can be prevented. It also prevents the filter from being excessively polished and causing unnecessary erosion problems. By increasing the reliability of the color filter pattern, it is possible to manufacture a reliable optical component that is accurate, accurate in specifications and excellent in optical characteristics.

In the color filter polishing liquid composition of the present invention, the structure of the polishing liquid can maintain stability and activity for a long time, and the pattern of the color filter thus prepared has high reliability, and is excellent in production efficiency and yield.

Although an exemplary embodiment of the present invention has been described above, it is not limited thereto, and those skilled in the art may make various modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention is defined on the basis of the following claims.

As described above, the color filter polishing liquid composition of the present invention reduces the chemical reaction between the photoresist material during the polishing process due to the characteristics of the abrasive and the component, and unexpectedly affects the photoresist material, thereby causing a TFT LCD. The impact on the service life of the panel can be prevented. It also prevents the filter from being excessively polished and causing unnecessary erosion problems. By increasing the reliability of the color filter pattern, it is possible to manufacture a reliable optical component that is accurate, accurate in specifications and excellent in optical characteristics.

In the color filter polishing liquid composition of the present invention, the structure of the polishing liquid can maintain stability and activity for a long time, and the pattern of the color filter thus prepared has high reliability, and is excellent in production efficiency and yield.

Claims (18)

In the color filter polishing liquid composition, Abrasives selected from the group consisting of carbon compounds, diamonds, nitrogen compounds or mixtures thereof; buffer solution used to adjust the pH value; And Color filter polishing liquid composition comprising one additive used to adjust the interfacial potential of the composition particles below a specific Ph value. The color filter polishing liquid composition of claim 1, wherein the carbon compound is selected from the group consisting of silicon carbide, boron carbide, vanadium carbide, titanium carbide, tungsten carbide, zirconium carbide, or mixtures thereof. The color filter polishing liquid composition of claim 1, wherein the nitrogen compound is selected from the group consisting of aluminum nitride, boron nitride, carbon nitride, titanium nitride, tantalum nitride, or a mixture thereof. The color filter polishing liquid composition of claim 1, wherein the primary particle diameter of the abrasive in the chemical polishing liquid composition is 10 nanometers to 1 micrometer. The color filter polishing liquid composition of claim 1, wherein the primary particle diameter of the abrasive in the chemical polishing liquid composition is 50 nanometers to 800 nanometers. The color filter polishing liquid composition of claim 1, wherein a content of the abrasive in the color filter polishing liquid composition is 0.5 to 45 weight percent. The color filter polishing liquid composition according to claim 1, wherein the content of the abrasive in the color filter polishing liquid composition is 2 to 25 weight percent. The color filter polishing liquid composition of claim 1, wherein a pH value of the color filter polishing liquid composition is 2 to 10. 3. The color filter polishing liquid composition of claim 1, wherein the pH value of the color filter polishing liquid composition is 5 to 9. 9. The color filter polishing liquid composition of claim 1, wherein the buffer solution is selected from the group consisting of inorganic acids, organic acids, bases, mixtures thereof, and salts thereof. The color filter polishing liquid composition of claim 10, wherein the inorganic acid is selected from the group consisting of sulfuric acid, hydrochloric acid, nitric acid, and mixtures thereof. The color filter polishing liquid composition of claim 10, wherein the organic acid is selected from the group consisting of glycine, formic acid, acetic acid, propionic acid, malic acid, citric acid, succinic acid, and mixtures thereof. The color filter polishing liquid composition of claim 12, wherein the salts include organic or inorganic salts of sodium, potassium, calcium, and iron. The color filter polishing liquid composition of claim 1, wherein the additive includes a surfactant. 15. The color filter polishing liquid composition of claim 14, wherein the amount of the surfactant is 0.3 to 1.0 weight percent. The color filter polishing liquid composition of claim 1, wherein the surfactant selects one of polycarboxylic acid, ammonium salt of polycarboxylic acid, alkaline salts, aliphatic polymer, or a mixture thereof. The color filter polishing liquid composition of claim 16, wherein the aliphatic polymer molecular weight is 1000 to 5000 Daltons. The method of claim 1, wherein the additive is N-methylpyrrolidone, gamma butyrolactone, menaacrylamide, N-vinyl pyrrolidone, methylacrylamide, N, N'-methylene-bis-acrylamide, polyethylene glycol Color filter polishing liquid composition which selects among methyl acrylate, methoxy polyethyleneglycol monomethacrylate, or mixtures thereof.

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